JP2002353616A - Method of manufacturing flexible double-sided circuit board - Google Patents

Method of manufacturing flexible double-sided circuit board

Info

Publication number
JP2002353616A
JP2002353616A JP2001154980A JP2001154980A JP2002353616A JP 2002353616 A JP2002353616 A JP 2002353616A JP 2001154980 A JP2001154980 A JP 2001154980A JP 2001154980 A JP2001154980 A JP 2001154980A JP 2002353616 A JP2002353616 A JP 2002353616A
Authority
JP
Japan
Prior art keywords
conductive layer
base material
hole
insulating base
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001154980A
Other languages
Japanese (ja)
Inventor
Fumihiko Matsuda
文彦 松田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Mektron KK
Original Assignee
Nippon Mektron KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mektron KK filed Critical Nippon Mektron KK
Priority to JP2001154980A priority Critical patent/JP2002353616A/en
Publication of JP2002353616A publication Critical patent/JP2002353616A/en
Pending legal-status Critical Current

Links

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  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method of manufacturing a flexible double-sided circuit board which has circuit wiring patterns on both faces of a flexible insulation base material, with the circuit wiring pattern on one face being a fine one, and which has fine via hole or through hole continuity parts at specified places of the circuit wiring patterns on the front and the rear faces. SOLUTION: A continuity layer 2 formed on one face of the insulation base material 1 is formed with openings 3 at the places where holes for continuity are to be formed, and a resist layer 5 having openings 4 at the places corresponding to the openings 3 is formed on the outer surface of the insulation base material 1. After removing the insulation base material 1 existing in the openings 3 and 4 to form holes 6 for continuity, a conductivity layer 7 including the through holes is formed on the entire surface including the holes 6 for continuity by a plating means. Then, the continuity layer 7 and the conductive layer 2 are etched by an etching means into a specified circuit wiring pattern 8.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、可撓性回路基板に
於いて、可撓性絶縁ベース材の両面に回路配線パターン
を有すると共に、一方面には微細な回路配線パターンを
有し、それら表裏の回路配線パターンに於ける所要位置
に、微細なヴァイアホール又はスルーホール導通部を有
する可撓性両面回路基板の製造法に関する。
The present invention relates to a flexible circuit board having a circuit wiring pattern on both sides of a flexible insulating base material and a fine circuit wiring pattern on one side. The present invention relates to a method for manufacturing a flexible double-sided circuit board having fine via-holes or through-hole conductive portions at required positions in circuit wiring patterns on the front and back sides.

【0002】[0002]

【従来技術】スルーホール導通部を有する従来の可撓性
両面回路基板は、ポリイミドフィルム等の可撓性絶縁ベ
ース材の両面に銅箔等に対するフォトエッチング手段で
所要の回路配線パターンを形成し、それら両面の回路配
線パターンに於ける所要部位に対しては可撓性絶縁ベー
ス材を含めてドリリング等の手段で貫通形成したスルー
ホール用透孔を設け、この透孔の内壁及び両面の回路配
線パターンの上面には無電解メッキを含むメッキ手段で
スルーホール導電層を形成することによって、両面の回
路配線パターンの所要部位に対する相互導通構造を形成
している。
2. Description of the Related Art A conventional flexible double-sided circuit board having a through-hole conductive portion is formed by forming a required circuit wiring pattern on both surfaces of a flexible insulating base material such as a polyimide film by a photo-etching means for copper foil or the like. Through holes for through holes formed by drilling or the like including a flexible insulating base material are provided for required portions in the circuit wiring patterns on both surfaces, and the inner wall of the holes and the circuit wiring on both surfaces are provided. By forming a through-hole conductive layer on the upper surface of the pattern by plating means including electroless plating, an interconnecting structure is formed with respect to a required portion of the circuit wiring pattern on both surfaces.

【0003】また、上記両面の回路配線パターンの表面
には、上記スルーホール導通部等の必要な部分を除いて
接着剤による表面保護フィルムを被着形成して表面保護
層を形成する事が出来る。このような表面保護層は、そ
の使用条件等に応じて絶縁性樹脂や絶縁性塗料等を用い
た印刷手法など他の通常の被覆手段でも形成することが
可能である。
On the surfaces of the circuit wiring patterns on both sides, a surface protection film can be formed by applying an adhesive to a surface protection layer except for necessary portions such as the through-hole conducting portions and the like to form a surface protection layer. . Such a surface protective layer can be formed by other ordinary coating means such as a printing method using an insulating resin or an insulating paint depending on the use conditions and the like.

【0004】このような可撓性両面回路基板を製作する
には、ポリイミドフィルム等の可撓性絶縁ベース材の両
面に銅箔等の導電層を有する両面金属張積層板を用意
し、その所要個所にドリリング等の手段でスルーホール
用透孔を形成する。
To manufacture such a flexible double-sided circuit board, a double-sided metal-clad laminate having a conductive layer such as a copper foil on both sides of a flexible insulating base material such as a polyimide film is prepared. A through hole for a through hole is formed at a location by means such as drilling.

【0005】次に、上記透孔の内壁及び両導電層の上面
には無電解メッキを含むメッキ手段でスルーホール導電
層を形成し、次いで、上記導電層に対するエッチング処
理を施して所望の回路配線パターンを形成し、必要に応
じて、表面保護層を形成する製造方法が採用されてい
る。
Next, a through-hole conductive layer is formed on the inner wall of the through hole and the upper surface of both conductive layers by plating means including electroless plating, and then the conductive layer is subjected to an etching treatment to obtain a desired circuit wiring. A manufacturing method of forming a pattern and, if necessary, forming a surface protective layer is employed.

【0006】また、上記のスルーホール導通部に代えて
ヴィアホール導通構造を採用する場合には、先ず、ポリ
イミドフィルム等の可撓性絶縁ベース材の両面に銅箔等
の導電層を有する両面金属張積層板を用意し、その導電
層に対するエッチング処理により所要の位置に開口を形
成する。
When a via-hole conducting structure is employed in place of the through-hole conducting portion, a double-sided metal having a conductive layer such as a copper foil on both sides of a flexible insulating base material such as a polyimide film is first used. An open laminate is prepared, and an opening is formed at a required position by etching the conductive layer.

【0007】次に、開口部に露出する絶縁ベース材を、
樹脂エッチング手法或いはプラズマエッチング手法やレ
ーザー加工等の手法を用いて除去することにより導通用
孔を形成する。
Next, the insulating base material exposed at the opening is
The hole for conduction is formed by removing using a resin etching technique, a plasma etching technique, a laser processing technique, or the like.

【0008】次いで、導通用孔の底部、側壁部及び導電
層の表面に対して、無電開メッキ等の導電化処理と電解
メッキ手法により、メッキ層を形成した段階で、上記導
電層に対しエッチング処理を施して所望の回路配線パタ
ーンを形成し、必要に応じて、表面保護層を形成する製
造方法が採用されている。
Next, the conductive layer is etched at the stage of forming a plated layer on the bottom, side walls, and the surface of the conductive layer of the conductive hole by a conductive treatment such as electroless plating and an electrolytic plating technique. A manufacturing method is employed in which a desired circuit wiring pattern is formed by performing a treatment, and a surface protective layer is formed as necessary.

【0009】[0009]

【発明が解決しようとする課題】上記の如き従来構造の
可撓性両面回路基板によれば、表裏の回路配線パターン
を導通させる為のスルーホール又はヴィアホール導電層
で形成される導通部は、回路配線パターンの表面にも形
成されている為、回路配線パターン全体の厚さは相当厚
いものとなり、微細な回路配線パターンを形成する場合
の支障となる。
According to the flexible double-sided circuit board having the conventional structure as described above, the conductive portion formed by the through-hole or via-hole conductive layer for conducting the circuit wiring patterns on the front and back sides is formed by: Since it is also formed on the surface of the circuit wiring pattern, the thickness of the entire circuit wiring pattern becomes considerably thick, which hinders the formation of a fine circuit wiring pattern.

【0010】例えば、厚さ17.5μmの銅箔に、3〜
6μmの厚さの化学メッキを施し、これに更に厚さ10
〜20μmの電解メッキを施してヴィアホール又はスル
ーホール導電層を形成するような場合には、回路配線パ
ターン全体の厚みは30.5〜43.5μmとなる。そ
こで、形成可能な回路配線パターンの幅を、仮に、導体
厚みの2.5倍とすると、その回路配線パターンの幅は
76.25〜108.75μm程度と大きくなるので、
微細な回路配線パターンを高密度に形成することは困難
となる。
For example, for a copper foil having a thickness of 17.5 μm,
Chemical plating with a thickness of 6 μm is applied, and a further 10
When a via hole or a through-hole conductive layer is formed by performing electroplating of 2020 μm, the thickness of the entire circuit wiring pattern is 30.5-43.5 μm. Therefore, if the width of the circuit wiring pattern that can be formed is assumed to be 2.5 times the conductor thickness, the width of the circuit wiring pattern becomes as large as about 76.25 to 108.75 μm.
It becomes difficult to form fine circuit wiring patterns at high density.

【0011】[0011]

【課題を解決する為の手段】本発明は、上記問題を好適
に解決する為の可撓性両面回路基板の製造法を提供する
ものである。
SUMMARY OF THE INVENTION The present invention provides a method of manufacturing a flexible double-sided circuit board for suitably solving the above problems.

【0012】その為に、本発明に於いては、絶縁ベース
材の一方の面に第一の導電層を有する片面金属張積層板
を用い、第一の導電層には導通用孔の形成位置に開口を
形成すると共に、前記絶縁ベース材の面には、上記導電
層に形成された開口に対応する位置に開口を有するレジ
スト層を形成し、前記絶縁ベース材に対する両面からの
化学エッチング処理又はプラズマエッチング処理により
前記絶縁ベース材に導通用孔を形成し、該導通用孔の側
壁部、前記絶縁ベース材の表面及び前記第一の導電層に
対してメッキ皮膜を形成してスルーホールを含む第二の
導電層を形成し、これら第一の導電層と第二の導電層に
対してエッチング処理を施し、回路配線パターンを形成
する各工程を有する可撓性両面回路基板の製造法が採用
される。
For this purpose, in the present invention, a single-sided metal-clad laminate having a first conductive layer on one surface of an insulating base material is used, and the first conductive layer is provided with a conductive hole forming position. While forming an opening, on the surface of the insulating base material, a resist layer having an opening at a position corresponding to the opening formed in the conductive layer is formed, and the insulating base material is subjected to a chemical etching process from both sides or A conductive hole is formed in the insulating base material by a plasma etching process, and a plating film is formed on a side wall portion of the conductive hole, the surface of the insulating base material, and the first conductive layer, and includes a through hole. A method of manufacturing a flexible double-sided circuit board having steps of forming a second conductive layer, performing an etching process on the first conductive layer and the second conductive layer, and forming a circuit wiring pattern is employed. Is done.

【0013】また、本発明の他の製造法では、絶縁ベー
ス材の一方の面に第一の導電層を有する片面金属張積層
板の前記絶縁ベース材の面に、所定の通用孔の形成位置
に開口を有するレジスト層を形成し、このレジスト開口
部位に露出した前記絶縁ベース材を、化学エッチング処
理又はプラズマエッチング処理にてエッチング除去し、
前記レジスト層を剥離した後、前記導通用孔の底部、側
壁及び前記絶縁ベース材の表面に第二の導電層を形成
し、これら第一の導電層と第二の導電層に対するエッチ
ング処理により回路配線パターンを形成する工程を有す
る可撓性両面回路基板の製造法が採用される。
According to another manufacturing method of the present invention, a predetermined through hole is formed on a surface of the insulating base material of a single-sided metal-clad laminate having a first conductive layer on one surface of the insulating base material. A resist layer having an opening is formed, and the insulating base material exposed at the resist opening portion is removed by chemical etching or plasma etching.
After peeling the resist layer, a second conductive layer is formed on the bottom of the conductive hole, the side wall, and the surface of the insulating base material, and a circuit is formed by etching the first conductive layer and the second conductive layer. A method for manufacturing a flexible double-sided circuit board having a step of forming a wiring pattern is employed.

【0014】ここで、前記導電層形成工程に於いて、該
導通用孔の側壁部、前記絶縁ベース材表面及び前記第一
の導電層、或いは、前記導通用孔の底部、側壁及び前記
絶縁ベース材の表面に導電化処理を施した後、前記絶縁
ベース材面側に、前記導通用孔部と回路配線パターン形
成部を露出するようにレジスト層を形成し、メッキ手法
にて回路配線パターンと、表裏導通の為のスルーホール
導通部又はヴィアホール導電層を形成した後、前記レジ
スト層を除去し、次いで前記回路配線パターン間の導電
化処理層を除去する手法を採用できる。
Here, in the conductive layer forming step, the side wall portion of the conductive hole, the surface of the insulating base material and the first conductive layer, or the bottom portion, the side wall of the conductive hole and the insulating base. After performing a conductive treatment on the surface of the material, on the insulating base material surface side, a resist layer is formed so as to expose the conductive hole and the circuit wiring pattern forming portion, and a circuit wiring pattern is formed by plating. After the formation of the through-hole conductive portion or the via-hole conductive layer for front-to-back conduction, the method of removing the resist layer and then removing the conductive layer between the circuit wiring patterns can be adopted.

【0015】更に、前記第二の導電層の形成工程に於い
ては、該導通用孔の側壁部及、前記絶縁ベース材表面及
び前記第一の導電層、或いは、前記導通用孔の底部、側
壁及び前記絶縁ベース材の表面に、触媒を付与した後、
前記絶縁ベース材面側に、前記導通用孔部と回路配線パ
ターン形成部を露出するようにレジスト層を形成し、メ
ッキ手法により前記回路配線パターンと表裏導通の為の
スルーホール又はヴィアホール導電層を形成する工程を
採用できる。
Further, in the step of forming the second conductive layer, a side wall portion of the conductive hole, a surface of the insulating base material and the first conductive layer, or a bottom portion of the conductive hole, After applying a catalyst to the side walls and the surface of the insulating base material,
On the insulating base material surface side, a resist layer is formed so as to expose the conduction hole and the circuit wiring pattern formation portion, and a through hole or via hole conductive layer for front and back conduction with the circuit wiring pattern by a plating technique. Can be adopted.

【0016】[0016]

【発明の実施の形態】以下、図示の実施例を参照しなが
ら本発明を更に詳述する。図1は、本発明の一実施例に
よる可撓性両面回路基板の製造工程図であって、先ず、
同図(1)に示す様に、絶縁ベース材1の一方面に銅箔
等の第一の導電層2を有する片面金属張積層板を用意す
る。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in more detail with reference to the illustrated embodiments. FIG. 1 is a manufacturing process diagram of a flexible double-sided circuit board according to an embodiment of the present invention.
As shown in FIG. 1A, a single-sided metal-clad laminate having a first conductive layer 2 such as a copper foil on one surface of an insulating base material 1 is prepared.

【0017】次に同図(2)に示す様に、第一の導電層
2に対してエッチング処理を施し、導通用孔の形成位置
に開口3を形成すると共に、該開口3に対応する位置の
絶縁ベース材1の面側に開口4を有するレジスト層5を形
成する。
Next, as shown in FIG. 2B, the first conductive layer 2 is subjected to an etching process to form an opening 3 at a position where a conduction hole is to be formed, and a position corresponding to the opening 3. A resist layer 5 having an opening 4 on the surface side of the insulating base material 1 is formed.

【0018】次いで同図(3)に示す様に、両面からの
樹脂エッチング手法又はプラズマエッチング手法により
導通用穴6を形成する。
Then, as shown in FIG. 3C, a conduction hole 6 is formed from both sides by a resin etching technique or a plasma etching technique.

【0019】そこで、同図(4)に示す様に、レジスト
層5を剥離し、導通用穴6の側壁部及び絶縁ベース材1
の表面、そして第一の導電層2に対して、化学メッキ処
理に続く電解メッキ手法によりメッキ皮膜からなる第二
の導電層となる導通層7を形成する。
Then, as shown in FIG. 4 (4), the resist layer 5 is peeled off, and the side wall of the conduction hole 6 and the insulating base material 1 are removed.
A conductive layer 7 serving as a second conductive layer made of a plating film is formed on the surface of the first conductive layer 2 and the first conductive layer 2 by an electrolytic plating method following the chemical plating process.

【0020】次に、同図(5)に示す様に、上記第一の
導電層2及び導通層7に対して通常のフフォトリソ法を
用いてエッチング処理を施し、回路配線パターン8を形
成してスルーホール導通部により表裏の回路配線パター
ン8が導通された可撓性両面回路基板を得る事が出来
る。
Next, as shown in FIG. 5 (5), the first conductive layer 2 and the conductive layer 7 are subjected to an etching process using a normal photolithography method to form a circuit wiring pattern 8. A flexible double-sided circuit board in which the circuit wiring patterns 8 on the front and back are conducted by the through-hole conducting portions can be obtained.

【0021】また、他の実施例による可撓性両面回路基
板の製造法としては、図2(1)に示す様に、絶縁ベー
ス材1の一方面に銅箔等の第一の導電層2を有する片面
金属張積層板を用意する。
As a method of manufacturing a flexible double-sided circuit board according to another embodiment, as shown in FIG. 2A, a first conductive layer 2 such as a copper foil is Is prepared.

【0022】次に同図(2)に示す様に、導通用孔の形
成位置に開口4を有するレジスト層5を絶縁ベース材1
の面側に形成する。
Next, as shown in FIG. 2B, a resist layer 5 having an opening 4 at the position where the conduction hole is formed is placed on the insulating base material 1.
Is formed on the surface side.

【0023】次いで同図(3)に示す様に、片面からの
樹脂エッチング手法又はプラズマエッチング手法により
底部が第一の導電層2で塞がれた導通用孔9を形成す
る。
Next, as shown in FIG. 3C, a conduction hole 9 whose bottom is closed by the first conductive layer 2 is formed by a resin etching technique or a plasma etching technique from one side.

【0024】次に、同図(4)に示す様に、レジスト層
5を剥離し、導通用孔9の側壁部及び絶縁ベース材1の
表面、そして導通用孔9の底部に露出する第一の導電層
2に対して、化学メッキ処理に続く電解メッキ手法にて
メッキ皮膜からなる第二の導電層となる導通層10を形
成する。
Next, as shown in FIG. 4D, the resist layer 5 is peeled off, and the first side exposed on the side wall of the conduction hole 9 and the surface of the insulating base material 1 and on the bottom of the conduction hole 9 is formed. A conductive layer 10 serving as a second conductive layer made of a plating film is formed on the conductive layer 2 by a plating method following the chemical plating process.

【0025】そこで、同図(5)に示す様に、上記第一
の導電層2及び導通層10に対して通常のフォトリソグ
ラフ手法を用いてエッチング処理を施し、回路配線パタ
ーン11を形成して、ヴィアホールにより表裏の回路配
線パターン11が導通された可撓性両面回路基板を得る
事が出来る。
Then, as shown in FIG. 5 (5), the first conductive layer 2 and the conductive layer 10 are subjected to an etching process by using a usual photolithographic method to form a circuit wiring pattern 11. Thus, a flexible double-sided circuit board in which the circuit wiring patterns 11 on the front and back are conducted by the via holes can be obtained.

【0026】上記に於いて、導通層10の形成手段とし
ては、上記の化学メッキ処理に続く電解メッキ手法以外
に、クロム又は銅のイオンビームスパッタリング若しく
は蒸着手段とこれに続く電解銅メッキ手段も採用する事
が出来る。
In the above, as the means for forming the conductive layer 10, in addition to the electrolytic plating method following the above-described chemical plating, ion beam sputtering or vapor deposition of chromium or copper and electrolytic copper plating means subsequent thereto are also employed. You can do it.

【0027】更に、導通層により回路配線パターンを形
成する他の方法としては、図3に示す様にセミアディテ
ィブ手法を用いる事も可能である。図3に於いては、ヴ
ィアホールによる導通構造における一実施例を示す。
Further, as another method for forming a circuit wiring pattern using a conductive layer, a semi-additive method can be used as shown in FIG. FIG. 3 shows an embodiment of a conductive structure using via holes.

【0028】この場合は、同図(1)から(4)に示す
様に、絶縁ベース材1の一方面に銅箔等の第一の導電層
2を有する片面銅張積層板を用意し、導通用孔の形成位
置に開口4を有するレジスト層5を絶縁ベース材1の面
側に形成し、両面からの樹脂エッチング手法又はプラズ
マエッチング手法にて底部が第一の導電層2で塞がれた
導通用孔9を形成した後、レジスト層5を剥離する。
In this case, a single-sided copper-clad laminate having a first conductive layer 2 such as a copper foil on one surface of an insulating base material 1 is prepared as shown in FIGS. A resist layer 5 having an opening 4 at a position where a conduction hole is formed is formed on the surface side of the insulating base material 1, and the bottom is closed with the first conductive layer 2 by a resin etching method or a plasma etching method from both surfaces. After forming the conduction holes 9, the resist layer 5 is peeled off.

【0029】次に、同図(5)に示す様に、導通用孔9
の側壁部及び絶縁ベース材1の表面、導通用孔9の底部
に露出する第一の導電層2に対して、化学メッキ処理或
いはスパッタ処理や蒸着処理等の手法を用いて薄膜の導
通層10を形成する。
Next, as shown in FIG.
The first conductive layer 2 exposed on the side wall portion, the surface of the insulating base material 1, and the bottom of the conductive hole 9 is subjected to a chemical plating process, a sputtering process, a vapor deposition process, or the like to form a thin conductive layer 10. To form

【0030】そこで、図4の(1)に示す様に、絶縁ベ
ース材1の面側の、導通用孔部と回路配線パターンの形
成部を露出させるようにレジスト層12を形成する。
Therefore, as shown in FIG. 4A, a resist layer 12 is formed so as to expose the conductive hole and the portion where the circuit wiring pattern is formed on the surface side of the insulating base material 1.

【0031】次いで、同図(2)に示す様に、露出して
いる薄膜の導通層10の領域にメッキ処理を施して回路
配線パターン13と表裏導通の為のヴィアホール導通層
14を形成する。
Then, as shown in FIG. 2B, the exposed thin film conductive layer 10 is plated to form a via hole conductive layer 14 for front and back conduction with the circuit wiring pattern 13. .

【0032】次に、同図(3)に示す様に、レジスト層
12を剥離することで露出した薄膜の導通層10の領域
をエッチング除去して所要の回路配線パターン15,1
6を電気的に分離する。
Next, as shown in FIG. 3 (3), the region of the thin conductive layer 10 exposed by stripping the resist layer 12 is removed by etching to obtain the required circuit wiring patterns 15, 1.
6 are electrically separated.

【0033】最後に、同図(4)に示す様に、第一の導
電層2に対するエッチング処理によって回路配線パター
ン17を形成する。
Finally, a circuit wiring pattern 17 is formed by etching the first conductive layer 2 as shown in FIG.

【0034】ここで、図示しないが、上記薄膜の導通層
に代えて、触媒を用いる無電解メッキ手法によるフルア
ディティブ手法での回路形成法を採用する事も出来る。
Here, although not shown, a circuit formation method by a full additive method by an electroless plating method using a catalyst may be employed instead of the conductive layer of the thin film.

【0035】なお、上記各工程に於いては、表面保護層
に関して記述していないが、従来と同様に適宜実施する
事が出来、また、外形加工も上記各工程に続いて適宜実
施する事が出来る。
In each of the above steps, the surface protective layer is not described. However, the steps can be appropriately performed as in the conventional case, and the outer shape processing can be appropriately performed after the above steps. I can do it.

【0036】[0036]

【発明の効果】本発明による可撓性両面回路基板の製造
法によれば、従来の両面金属張積層板に代えて片面金属
張積層板を用いて、絶縁ベース材の面側に於ける回路配
線パターンの厚みを薄く構成できるから、微細な回路配
線パターンを形成する事が容易になり、電子部品を高密
度に実装するような高密度実装基板を提供する事が可能
となる。
According to the method of manufacturing a flexible double-sided circuit board according to the present invention, a circuit on the surface side of the insulating base material is replaced by a single-sided metal-clad laminate instead of the conventional double-sided metal-clad laminate. Since the thickness of the wiring pattern can be reduced, it is easy to form a fine circuit wiring pattern, and it is possible to provide a high-density mounting board on which electronic components are mounted at a high density.

【0037】また、片面金属張積層板を用いる為、従来
の手法よりも材料費を低減する事が出来、安価な基板を
提供する事が可能となる。
Further, since a single-sided metal-clad laminate is used, the material cost can be reduced as compared with the conventional method, and an inexpensive substrate can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例による可撓性両面回路基板の
製造工程図。
FIG. 1 is a manufacturing process diagram of a flexible double-sided circuit board according to one embodiment of the present invention.

【図2】本発明の他の実施例による可撓性両面回路基板
の製造工程図。
FIG. 2 is a manufacturing process diagram of a flexible double-sided circuit board according to another embodiment of the present invention.

【図3】本発明の他の実施例による可撓性両面回路基板
の製造工程図。
FIG. 3 is a manufacturing process diagram of a flexible double-sided circuit board according to another embodiment of the present invention.

【図4】図3に続く製造工程図。FIG. 4 is a manufacturing process diagram following FIG. 3;

【符号の説明】[Explanation of symbols]

1 絶縁べース材 2 導電層 3 開口 4 開口 5 レジスト層 6 導通用穴 7 導通層 8 回路配線パターン DESCRIPTION OF SYMBOLS 1 Insulation base material 2 Conductive layer 3 Opening 4 Opening 5 Resist layer 6 Conducting hole 7 Conducting layer 8 Circuit wiring pattern

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 5E317 AA24 BB01 BB12 CC31 CC51 CD12 CD15 CD18 CD25 CD32 GG14 5E339 AA02 AB02 AC01 AD03 AE01 BC02 BD03 BD08 BD11 BE11 CD01 CE12 CE15 CG01 GG10 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 5E317 AA24 BB01 BB12 CC31 CC51 CD12 CD15 CD18 CD25 CD32 GG14 5E339 AA02 AB02 AC01 AD03 AE01 BC02 BD03 BD08 BD11 BE11 CD01 CE12 CE15 CG01 GG10

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】絶縁ベース材の一方の面に第一の導電層を
有する片面金属張積層板を用い、前記第一の導電層には
導通用穴の形成位置に開口を形成すると共に、前記絶縁
ベース材の面には前記導電層に形成した前記開口に対応
する位置に開口を有するレジスト層を形成し、前記開口
に位置する前記絶縁ベース材を除去して導通用穴を形成
した後、該導通用穴の側壁部、前記絶縁ベース材の表面
及び前記第一の導電層に対してメッキ皮膜を形成してス
ルーホールを含む第二の導電層を形成し、次に前記第一
の導電層と第二の導電層に対してエッチング処理を施
し、回路配線パターンを形成する各工程を有する可撓性
両面回路基板の製造法。
1. A single-sided metal-clad laminate having a first conductive layer on one surface of an insulating base material, wherein an opening is formed in the first conductive layer at a position where a conduction hole is formed, and After forming a resist layer having an opening at a position corresponding to the opening formed in the conductive layer on the surface of the insulating base material, forming the conduction hole by removing the insulating base material located at the opening, A second conductive layer including a through hole is formed by forming a plating film on the side wall of the conduction hole, the surface of the insulating base material, and the first conductive layer, and then forming the first conductive layer. A method for producing a flexible double-sided circuit board, comprising the steps of performing an etching process on a layer and a second conductive layer to form a circuit wiring pattern.
【請求項2】絶縁ベース材の一方の面に第一の導電層を
有する片面金属張積層板に於ける前記絶縁ベース材の面
に、所定の導通用孔の形成位置に開口を有するレジスト
層を形成し、該レジスト層の前記開口部位に露出した前
記絶縁ベース材を除去して導通用孔を形成し、前記レジ
スト層を剥離した後、前記導通用孔の底部、側壁及び前
記絶縁ベース材の表面に第二の導電層を形成し、前記第
一の導電層と第二の導電層に対するエッチング処理を施
して回路配線パターンを形成する各工程を有する可撓性
両面回路基板の製造法。
2. A single-sided metal-clad laminate having a first conductive layer on one surface of an insulating base material, a resist layer having an opening at a position where a predetermined conduction hole is formed on the surface of the insulating base material. Forming a conduction hole by removing the insulating base material exposed at the opening portion of the resist layer, peeling the resist layer, and then forming a bottom portion, a side wall, and the insulating base material of the conduction hole. A method for manufacturing a flexible double-sided circuit board, comprising the steps of: forming a second conductive layer on the surface of the substrate; and performing an etching process on the first conductive layer and the second conductive layer to form a circuit wiring pattern.
【請求項3】前記第二の導電層の形成工程は、前記導通
用穴の側壁部、前記絶縁ベース材の表面及び前記第一の
導電層、或いは、前記導通用孔の底部、側壁及び前記絶
縁ベース材の表面に、導通化処理層を形成した後、前記
絶縁ベース材の面側に、前記導通用孔と回路配線パター
ンの形成部を露出するようにレジスト層を形成し、メッ
キ手法により回路配線パターンと、表裏導通の為のスル
ーホール又はヴィアホール導通層とを形成し、前記レジ
スト層を除去し、次いで、前記回路配線パターン間の導
通化処理層を除去して行われる事を特徴とする請求項1
又は2に記載の可撓性両面回路基板の製造法。
3. The step of forming the second conductive layer includes the step of forming a side wall portion of the conduction hole, a surface of the insulating base material and the first conductive layer, or a bottom portion, a side wall of the conduction hole and the conductive hole. After forming a conductive treatment layer on the surface of the insulating base material, a resist layer is formed on the surface side of the insulating base material so as to expose the conductive hole and a portion where the circuit wiring pattern is formed, and plating is performed. Forming a circuit wiring pattern and a through-hole or via-hole conductive layer for front-to-back conduction, removing the resist layer, and then removing the conductive processing layer between the circuit wiring patterns is performed. Claim 1
Or the method for producing a flexible double-sided circuit board according to 2.
【請求項4】前記第二の導電層の形成工程は、前記導通
用穴の側壁部、前記絶縁ベース材の表面及び前記第一の
導電層、或いは、前記導通用孔の底部、側壁及び前記絶
縁ベース材の表面に、触媒を付与した後、前記絶縁ベー
ス材の面側に、前記導通用孔と回路配線パターン形成部
を露出するようにレジスト層を形成し、メッキ手法にて
回路配線パターンと、表裏導通の為のスルーホール又は
ヴィアホール導通層を形成して行われる事を特徴とする
請求項1又は2に記載の可撓性両面回路基板の製造法。
4. The step of forming the second conductive layer includes the step of forming a side wall portion of the conduction hole, a surface of the insulating base material and the first conductive layer, or a bottom portion, a side wall of the conduction hole and the side wall of the conduction hole. After applying a catalyst to the surface of the insulating base material, a resist layer is formed on the surface side of the insulating base material so as to expose the conductive hole and the circuit wiring pattern forming portion, and the circuit wiring pattern is formed by plating. 3. The method for producing a flexible double-sided circuit board according to claim 1, wherein the method is performed by forming a through-hole or via-hole conductive layer for front-to-back conduction.
JP2001154980A 2001-05-24 2001-05-24 Method of manufacturing flexible double-sided circuit board Pending JP2002353616A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001154980A JP2002353616A (en) 2001-05-24 2001-05-24 Method of manufacturing flexible double-sided circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001154980A JP2002353616A (en) 2001-05-24 2001-05-24 Method of manufacturing flexible double-sided circuit board

Publications (1)

Publication Number Publication Date
JP2002353616A true JP2002353616A (en) 2002-12-06

Family

ID=18999237

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001154980A Pending JP2002353616A (en) 2001-05-24 2001-05-24 Method of manufacturing flexible double-sided circuit board

Country Status (1)

Country Link
JP (1) JP2002353616A (en)

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