JP2002326827A5 - - Google Patents

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Publication number
JP2002326827A5
JP2002326827A5 JP2002073332A JP2002073332A JP2002326827A5 JP 2002326827 A5 JP2002326827 A5 JP 2002326827A5 JP 2002073332 A JP2002073332 A JP 2002073332A JP 2002073332 A JP2002073332 A JP 2002073332A JP 2002326827 A5 JP2002326827 A5 JP 2002326827A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002073332A
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Japanese (ja)
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JP4462808B2 (ja
JP2002326827A (ja
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Publication date
Priority claimed from US09/808,719 external-priority patent/US6510707B2/en
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Publication of JP2002326827A publication Critical patent/JP2002326827A/ja
Publication of JP2002326827A5 publication Critical patent/JP2002326827A5/ja
Application granted granted Critical
Publication of JP4462808B2 publication Critical patent/JP4462808B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002073332A 2001-03-15 2002-03-15 石英ガラスるつぼの製造方法 Expired - Fee Related JP4462808B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/808719 2001-03-15
US09/808,719 US6510707B2 (en) 2001-03-15 2001-03-15 Methods for making silica crucibles

Publications (3)

Publication Number Publication Date
JP2002326827A JP2002326827A (ja) 2002-11-12
JP2002326827A5 true JP2002326827A5 (https=) 2005-09-08
JP4462808B2 JP4462808B2 (ja) 2010-05-12

Family

ID=25199527

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002073332A Expired - Fee Related JP4462808B2 (ja) 2001-03-15 2002-03-15 石英ガラスるつぼの製造方法

Country Status (6)

Country Link
US (1) US6510707B2 (https=)
EP (1) EP1241141B1 (https=)
JP (1) JP4462808B2 (https=)
KR (1) KR100495772B1 (https=)
DE (1) DE60220112T2 (https=)
TW (1) TWI238204B (https=)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4592037B2 (ja) * 2000-05-31 2010-12-01 信越石英株式会社 石英ガラスルツボの製造方法
US6755049B2 (en) * 2001-03-08 2004-06-29 Heraeus Quarzglas Gmbh & Co. Kg Method of producing a quartz glass crucible
US20040118156A1 (en) * 2001-03-08 2004-06-24 Gabriele Korus Method of producing a quartz glass crucible
US20030024467A1 (en) * 2001-08-02 2003-02-06 Memc Electronic Materials, Inc. Method of eliminating near-surface bubbles in quartz crucibles
US20040258496A1 (en) * 2002-04-08 2004-12-23 Marusich Troy D. High frequency tooth pass cutting device and method
US7383696B2 (en) * 2005-09-08 2008-06-10 Heraeus Shin-Etsu America, Inc. Silica glass crucible with bubble-free and reduced bubble growth wall
US7427327B2 (en) * 2005-09-08 2008-09-23 Heraeus Shin-Etsu America, Inc. Silica glass crucible with barium-doped inner wall
US7837955B2 (en) * 2006-03-08 2010-11-23 Unimin Corporation Continuous reactor system for anoxic purification
US7716948B2 (en) * 2006-12-18 2010-05-18 Heraeus Shin-Etsu America, Inc. Crucible having a doped upper wall portion and method for making the same
JP5143520B2 (ja) * 2007-09-28 2013-02-13 ジャパンスーパークォーツ株式会社 シリカガラスルツボとその製造方法および引き上げ方法
DE102008030310B3 (de) * 2008-06-30 2009-06-18 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Quarzglastiegels
JP5523018B2 (ja) * 2008-08-30 2014-06-18 株式会社Sumco 石英ルツボの製造装置
JP5377930B2 (ja) * 2008-10-31 2013-12-25 株式会社Sumco シリコン単結晶引上用石英ガラスルツボの製造方法
US8272234B2 (en) * 2008-12-19 2012-09-25 Heraeus Shin-Etsu America, Inc. Silica crucible with pure and bubble free inner crucible layer and method of making the same
JP4975012B2 (ja) * 2008-12-29 2012-07-11 ジャパンスーパークォーツ株式会社 シリコン単結晶引き上げ用石英ガラスルツボ及びその製造方法
JP5047227B2 (ja) 2009-05-27 2012-10-10 ジャパンスーパークォーツ株式会社 シリコン単結晶の製造方法及びシリコン単結晶引き上げ装置
JP4922355B2 (ja) * 2009-07-15 2012-04-25 信越石英株式会社 シリカ容器及びその製造方法
US9003832B2 (en) * 2009-11-20 2015-04-14 Heraeus Shin-Etsu America, Inc. Method of making a silica crucible in a controlled atmosphere
FR2954764B1 (fr) * 2009-12-30 2011-12-30 Saint Gobain Quartz Sas Creuset en silice
JP4854814B1 (ja) * 2011-04-28 2012-01-18 Ftb研究所株式会社 シリコン結晶成長用石英坩堝のコーティング方法及びシリコン結晶成長用石英坩堝
US8713966B2 (en) 2011-11-30 2014-05-06 Corning Incorporated Refractory vessels and methods for forming same
EP3371119A4 (en) 2015-11-04 2019-07-03 Sibelco North America, Inc. CLEANED, FOR PUNCHING A FIBER CABLE MODIFIED QUARTZ POWDER
JP7379054B2 (ja) * 2018-12-27 2023-11-14 モメンティブ・テクノロジーズ・山形株式会社 石英ガラスるつぼの製造方法および光学ガラス溶融用石英ガラスるつぼ
JP7282022B2 (ja) * 2019-12-24 2023-05-26 クアーズテック株式会社 シリカガラスの製造方法

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US4116657A (en) * 1977-05-05 1978-09-26 Corning Glass Works Process for increasing the annealing point of 96% silica glass
US4102664A (en) * 1977-05-18 1978-07-25 Corning Glass Works Method for making glass articles with defect-free surfaces
DE2928089C3 (de) 1979-07-12 1982-03-04 Heraeus Quarzschmelze Gmbh, 6450 Hanau Verbundtiegel für halbleitertechnologische Zwecke und Verfahren zur Herstellung
DE3014311C2 (de) 1980-04-15 1982-06-16 Heraeus Quarzschmelze Gmbh, 6450 Hanau Verfahren zur Herstellung von Quarzglastiegeln und Vorrichtung zur Durchführung dieses Verfahrens
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GB8427915D0 (en) 1984-11-05 1984-12-12 Tsl Thermal Syndicate Plc Vitreous silica products
US4632686A (en) * 1986-02-24 1986-12-30 Gte Products Corporation Method of manufacturing quartz glass crucibles with low bubble content
US4713104A (en) * 1986-03-31 1987-12-15 Gte Products Corporation Quartz glass crucibles
JPH085739B2 (ja) 1986-12-26 1996-01-24 東芝セラミツクス株式会社 石英ガラスルツボの製造方法
US4935046A (en) 1987-12-03 1990-06-19 Shin-Etsu Handotai Company, Limited Manufacture of a quartz glass vessel for the growth of single crystal semiconductor
JPH0692276B2 (ja) 1988-02-03 1994-11-16 三菱マテリアル株式会社 シリコン単結晶引上げ用石英ルツボ
JP2602442B2 (ja) 1988-02-03 1997-04-23 三菱マテリアル 株式会社 シリコン単結晶引上げ用石英ルツボ
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US5100452A (en) * 1990-05-17 1992-03-31 Corning Incorporated Making glass articles with defect-free surfaces
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CA2142282A1 (en) * 1992-08-13 1994-03-03 Paul Ducheyne Bioactive material template for in vitro synthesis of bone tissue
US5449887A (en) * 1993-03-25 1995-09-12 Martin Marietta Energy Systems, Inc. Thermal insulation for high temperature microwave sintering operations and method thereof
US5342426A (en) * 1993-07-16 1994-08-30 Corning Incorporated Making glass sheet with defect-free surfaces and alkali metal-free soluble glasses therefor
JP3124674B2 (ja) 1993-12-28 2001-01-15 東芝セラミックス株式会社 シリコン単結晶引上げ用石英ガラス製ルツボの製造方法
JP2830987B2 (ja) * 1994-07-19 1998-12-02 信越石英株式会社 石英ガラスルツボ及びその製造方法
DE19541372A1 (de) * 1994-11-15 1996-05-23 Gen Electric Tiegel aus geschmolzenem Quarz sowie Verfahren zu dessen Herstellung
EP0737653B1 (en) * 1995-04-10 1998-01-14 Heraeus Quarzglas GmbH Process for continuously refining of quartz powder
US5976247A (en) 1995-06-14 1999-11-02 Memc Electronic Materials, Inc. Surface-treated crucibles for improved zero dislocation performance
JP3533416B2 (ja) * 1996-02-06 2004-05-31 三菱住友シリコン株式会社 単結晶引上装置
JP3764776B2 (ja) * 1996-03-18 2006-04-12 信越石英株式会社 単結晶引き上げ用石英ガラスるつぼ及びその製造方法
DE19917288C2 (de) * 1999-04-16 2001-06-28 Heraeus Quarzglas Quarzglas-Tiegel
JP3672460B2 (ja) * 1999-06-18 2005-07-20 東芝セラミックス株式会社 シリコン単結晶引上用石英ガラスルツボの製造方法

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