JP2002322556A5 - - Google Patents

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Publication number
JP2002322556A5
JP2002322556A5 JP2002042851A JP2002042851A JP2002322556A5 JP 2002322556 A5 JP2002322556 A5 JP 2002322556A5 JP 2002042851 A JP2002042851 A JP 2002042851A JP 2002042851 A JP2002042851 A JP 2002042851A JP 2002322556 A5 JP2002322556 A5 JP 2002322556A5
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JP
Japan
Prior art keywords
organic compound
light
deposited
film forming
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2002042851A
Other languages
English (en)
Japanese (ja)
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JP2002322556A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2002042851A priority Critical patent/JP2002322556A/ja
Priority claimed from JP2002042851A external-priority patent/JP2002322556A/ja
Publication of JP2002322556A publication Critical patent/JP2002322556A/ja
Publication of JP2002322556A5 publication Critical patent/JP2002322556A5/ja
Withdrawn legal-status Critical Current

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JP2002042851A 2001-02-21 2002-02-20 成膜方法及び成膜装置 Withdrawn JP2002322556A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002042851A JP2002322556A (ja) 2001-02-21 2002-02-20 成膜方法及び成膜装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001-44650 2001-02-21
JP2001044650 2001-02-21
JP2002042851A JP2002322556A (ja) 2001-02-21 2002-02-20 成膜方法及び成膜装置

Publications (2)

Publication Number Publication Date
JP2002322556A JP2002322556A (ja) 2002-11-08
JP2002322556A5 true JP2002322556A5 (zh) 2005-08-11

Family

ID=26609791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002042851A Withdrawn JP2002322556A (ja) 2001-02-21 2002-02-20 成膜方法及び成膜装置

Country Status (1)

Country Link
JP (1) JP2002322556A (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG114589A1 (en) * 2001-12-12 2005-09-28 Semiconductor Energy Lab Film formation apparatus and film formation method and cleaning method
JP3877613B2 (ja) 2002-03-05 2007-02-07 三洋電機株式会社 有機エレクトロルミネッセンス表示装置の製造方法
JP4265393B2 (ja) * 2003-02-24 2009-05-20 株式会社デンソー 有機elパネルの製造方法
JP4858169B2 (ja) * 2004-07-23 2012-01-18 コニカミノルタホールディングス株式会社 有機エレクトロルミネッセンス素子
CN100514707C (zh) * 2005-06-15 2009-07-15 株式会社爱发科 密封装置及密封方法
JP2007042914A (ja) * 2005-08-04 2007-02-15 Seiko Epson Corp 電子デバイスおよび電子機器
JP5173175B2 (ja) 2006-09-29 2013-03-27 東京エレクトロン株式会社 蒸着装置
WO2012077659A1 (ja) * 2010-12-07 2012-06-14 東京エレクトロン株式会社 表示デバイス製造装置、表示デバイスの製造方法、及び表示デバイス

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