JP2002311588A5 - - Google Patents

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Publication number
JP2002311588A5
JP2002311588A5 JP2001112174A JP2001112174A JP2002311588A5 JP 2002311588 A5 JP2002311588 A5 JP 2002311588A5 JP 2001112174 A JP2001112174 A JP 2001112174A JP 2001112174 A JP2001112174 A JP 2001112174A JP 2002311588 A5 JP2002311588 A5 JP 2002311588A5
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JP
Japan
Prior art keywords
improved
unit
group
resist film
solubility
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001112174A
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English (en)
Japanese (ja)
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JP2002311588A (ja
JP4418605B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001112174A priority Critical patent/JP4418605B2/ja
Priority claimed from JP2001112174A external-priority patent/JP4418605B2/ja
Priority to US10/034,366 priority patent/US6753132B2/en
Publication of JP2002311588A publication Critical patent/JP2002311588A/ja
Publication of JP2002311588A5 publication Critical patent/JP2002311588A5/ja
Application granted granted Critical
Publication of JP4418605B2 publication Critical patent/JP4418605B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001112174A 2001-04-11 2001-04-11 パターン形成材料及びパターン形成方法 Expired - Fee Related JP4418605B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001112174A JP4418605B2 (ja) 2001-04-11 2001-04-11 パターン形成材料及びパターン形成方法
US10/034,366 US6753132B2 (en) 2001-04-11 2002-01-03 Pattern formation material and pattern formation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001112174A JP4418605B2 (ja) 2001-04-11 2001-04-11 パターン形成材料及びパターン形成方法

Publications (3)

Publication Number Publication Date
JP2002311588A JP2002311588A (ja) 2002-10-23
JP2002311588A5 true JP2002311588A5 (enExample) 2008-02-28
JP4418605B2 JP4418605B2 (ja) 2010-02-17

Family

ID=18963633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001112174A Expired - Fee Related JP4418605B2 (ja) 2001-04-11 2001-04-11 パターン形成材料及びパターン形成方法

Country Status (2)

Country Link
US (1) US6753132B2 (enExample)
JP (1) JP4418605B2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3891257B2 (ja) * 2001-06-25 2007-03-14 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
TW584786B (en) * 2001-06-25 2004-04-21 Shinetsu Chemical Co Polymers, resist compositions and patterning process
KR100863984B1 (ko) * 2001-07-03 2008-10-16 후지필름 가부시키가이샤 포지티브 레지스트 조성물
JP4164643B2 (ja) * 2002-07-17 2008-10-15 日本ゼオン株式会社 ドライエッチング方法及びパーフルオロ−２−ペンチンの製造方法
JPWO2009011364A1 (ja) * 2007-07-18 2010-09-24 旭硝子株式会社 電子線、ｘ線またはｅｕｖ光を用いたリソグラフィー法に用いられるレジスト組成物
JP5039493B2 (ja) * 2007-09-28 2012-10-03 富士フイルム株式会社 ポジ型レジスト組成物およびこれを用いたパターン形成方法
JP7445467B2 (ja) * 2019-03-15 2024-03-07 住友化学株式会社 樹脂、レジスト組成物及びレジストパターンの製造方法
JP7459636B2 (ja) * 2019-06-14 2024-04-02 Jsr株式会社 感放射線性樹脂組成物及びレジストパターン形成方法
US20210318613A9 (en) * 2019-06-14 2021-10-14 Jsr Corporation Radiation-sensitive resin composition and resist pattern-forming method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6610456B2 (en) * 2001-02-26 2003-08-26 International Business Machines Corporation Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions

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