JP2002293567A - Glass substrate for flat panel display - Google Patents
Glass substrate for flat panel displayInfo
- Publication number
- JP2002293567A JP2002293567A JP2001103484A JP2001103484A JP2002293567A JP 2002293567 A JP2002293567 A JP 2002293567A JP 2001103484 A JP2001103484 A JP 2001103484A JP 2001103484 A JP2001103484 A JP 2001103484A JP 2002293567 A JP2002293567 A JP 2002293567A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- mgo
- glass substrate
- cao
- flat panel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、フラットパネルディス
プレイ装置、特にプラズマディスプレイ装置に適したガ
ラス基板に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat panel display device, and more particularly to a glass substrate suitable for a plasma display device.
【０００２】[0002]
【従来の技術】プラズマディスプレイ装置は、一般にＩ
ＴＯ膜、ネサ膜等からなる透明電極が形成された前面ガ
ラス基板表面に誘電体材料を塗布し、Ａｌ、Ａｇ、Ｎｉ
からなる電極が形成された背面ガラス基板表面にリブペ
ーストを塗布してから５００〜６００℃程度の温度で焼
成することにより回路を形成し、その後、前面ガラス基
板と背面ガラス基板を対向させ、周囲を５００〜６００
℃程度の温度でフリットシールすることにより作製され
る。従来、ガラス基板としては、建築用または自動車用
として広く用いられているソーダ石灰ガラス（熱膨張係
数 約８４×１０ -7／℃）が一般的に用いられてきた。2. Description of the Related Art In general, a plasma display device has an I
A front panel on which a transparent electrode made of a TO film, a Nesa film or the like is formed.
A dielectric material is applied to the surface of a glass substrate, and Al, Ag, Ni
Ribs on the surface of the rear glass substrate on which the electrodes consisting of
After applying the paste, bake at a temperature of about 500-600 ° C.
Circuit, and then the front glass substrate
The plate and the back glass substrate face each other, and the surrounding area is 500 to 600
Manufactured by frit sealing at a temperature of about ℃
You. Conventionally, glass substrates are used for construction or automobile
Lime glass, which is widely used as
Number about 84 × 10 -7/ ° C) has been commonly used.
【０００３】ところが、ソーダ石灰ガラスは歪点が５０
０℃程度と低く、５８０℃程度の温度で熱処理する際、
熱変形や熱収縮により、寸法が著しく変化するため、前
面ガラス基板と背面ガラス基板を対向させる際、電極の
位置合わせを精度よく実現することが難しく、特に大型
高精細のプラズマディスプレイ装置を作製する上で困難
を生じていた。[0003] However, soda-lime glass has a strain point of 50%.
When performing heat treatment at a temperature of about 580 ° C, which is as low as about 0 ° C,
The dimensions change significantly due to thermal deformation and thermal shrinkage, making it difficult to accurately align the electrodes when the front glass substrate and the rear glass substrate face each other. In particular, a large and high-definition plasma display device is manufactured. Had difficulty on.
【０００４】また、ソーダ石灰ガラスは、１５０℃での
体積電気抵抗率（ｌｏｇ ρ）が８．４Ω・ｃｍと低
く、ガラス中のアルカリ成分の移動度が大きい。従っ
て、ガラス中のアルカリ成分がＩＴＯ膜やネサ膜等の薄
膜電極と反応し、電極材料の電気抵抗値を変化させる問
題も有している。[0004] Soda lime glass has a low volume electrical resistivity (log ρ) at 150 ° C of 8.4 Ω · cm, and has a high mobility of alkali components in the glass. Therefore, there is also a problem that an alkali component in the glass reacts with a thin film electrode such as an ITO film or a Nesa film to change the electric resistance value of the electrode material.
【０００５】これらの事情から、現在では、ガラス基板
の熱変形、熱収縮及び体積電気抵抗率の問題を解決する
ために、歪点及び体積電気抵抗率の高いプラズマディス
プレイ装置用ガラス基板が広く使用されている。[0005] Under these circumstances, glass substrates for plasma display devices having a high strain point and high volume electrical resistivity are widely used at present to solve the problems of thermal deformation, thermal shrinkage and volume electrical resistivity of glass substrates. Have been.
【０００６】[0006]
【発明が解決しようとする課題】しかしながら、前記し
た従来の歪点、体積電気抵抗率の高いプラズマディスプ
レイ装置用ガラス基板は、製造工程において、ソーダ石
灰ガラスに比べ、クラックが発生し割れが生じやすい。
そのため、装置の歩留まりが低く、生産性向上を妨げる
原因の一つとなっている。従って、生産性向上のため、
ガラス基板を割れにくくする必要がある。つまり、耐ク
ラック性の高いガラス基板が望まれている。However, the above-mentioned conventional glass substrate for a plasma display device having a high strain point and a high volume electrical resistivity is more likely to cause cracks and cracks in the manufacturing process than soda-lime glass. .
For this reason, the yield of the apparatus is low, which is one of the causes that hinders improvement in productivity. Therefore, to improve productivity,
It is necessary to make the glass substrate hard to break. That is, a glass substrate having high crack resistance is desired.
【０００７】また、従来のプラズマディスプレイ装置用
ガラス基板は、熱膨張係数が８０〜９０×１０-7／℃で
あるため、５７０〜６００℃の温度で熱処理したあと、
急冷すると熱応力に起因する割れが生じる。そのため、
熱工程の冷却速度が制限され、工程の所要時間が長くな
り、生産性を低下させていた。生産性向上のために、ガ
ラス基板の熱膨張係数を小さくし、熱応力を発生しにく
くさせれば良いが、熱膨張係数を小さくしすぎると、絶
縁ペースト、リブペースト、フリットシールといった周
辺材料との整合性が取れなくなる。Further, since the conventional glass substrate for a plasma display device has a thermal expansion coefficient of 80 to 90 × 10 −7 / ° C., it is heat-treated at a temperature of 570 to 600 ° C.
Rapid cooling causes cracks due to thermal stress. for that reason,
The cooling rate of the heating process is limited, the time required for the process is increased, and the productivity is reduced. In order to improve productivity, the thermal expansion coefficient of the glass substrate should be reduced to make thermal stress less likely to occur.However, if the thermal expansion coefficient is too low, it becomes difficult to use peripheral materials such as insulating paste, rib paste, and frit seal. Will not be consistent.
【０００８】熱応力に起因する割れを抑え、しかも、周
辺材料と整合性が取れるように、ガラス基板の熱膨張係
数を６５〜８０×１０-7／℃にしたガラス組成が特開平
１１−３１０４３３号及び特開平１１−３１４９３３号
で開示されている。ところが、特開平１１−３１０４３
３号は、Ａｌ2Ｏ3を１０％以上含有しているため、高温
粘度が高く、ガラスの成形が困難であった。また、特開
平１１−３１４９３３号では、高温粘度を低下させるた
めに、ＭｇＯとＣａＯを比較的多く含有するため液相温
度が高く、ガラスが失透しやすいという問題があった。The glass composition in which the glass substrate has a coefficient of thermal expansion of 65 to 80 × 10 −7 / ° C. is disclosed in Japanese Patent Application Laid-Open No. H11-310433 in order to suppress cracks caused by thermal stress and to ensure consistency with surrounding materials. And JP-A-11-314933. However, Japanese Patent Application Laid-Open No. 11-31043
No. 3 contained 10% or more of Al 2 O 3, and therefore had a high viscosity at high temperature and was difficult to form glass. Japanese Patent Application Laid-Open No. H11-314933 has a problem that the liquidus temperature is high because MgO and CaO are contained in a relatively large amount in order to lower the high-temperature viscosity, and the glass is easily devitrified.
【０００９】本発明の目的は、耐熱衝撃性、耐クラック
性、及び成形性に優れ、５７０〜６００℃の温度で熱処
理しても熱変形や熱収縮が問題とならず、しかも、１５
０℃における体積電気抵抗率（ｌｏｇ ρ）が１０．５
Ω・ｃｍ以上の特性を有するフラットパネルディスプレ
イ装置用ガラス基板を提供することである。It is an object of the present invention to provide excellent heat shock resistance, crack resistance, and moldability, and no problem of thermal deformation or heat shrinkage even when heat-treated at a temperature of 570 to 600 ° C.
Volume resistivity (log ρ) at 0 ° C. is 10.5
An object of the present invention is to provide a glass substrate for a flat panel display device having a characteristic of Ω · cm or more.
【００１０】[0010]
【課題を解決するための手段】本発明のフラットパネル
ディスプレイ装置用ガラス基板は、質量百分率で、Ｓｉ
Ｏ2 ５５〜７１％、Ａｌ2Ｏ3 ０〜５％、ＭｇＯ ５
〜１０％、ＣａＯ ０〜５％、ＳｒＯ ２〜１６％、Ｂ
ａＯ ０〜３％、ＭｇＯ＋ＣａＯ ５〜１０％、ＭｇＯ
＋ＣａＯ＋ＳｒＯ＋ＢａＯ １５〜２１％、Ｎａ2Ｏ
０〜８％、Ｋ2Ｏ２〜９％、Ｎａ2Ｏ＋Ｋ2Ｏ ８〜１２
％、ＺｒＯ2 ０〜２％の組成を有し、且つ、ＭｇＯ／
Ａｌ2Ｏ3の値が１．５０以上であることを特徴とする。According to the present invention, a glass substrate for a flat panel display device according to the present invention has a mass percentage of Si.
O 2 55~71%, Al 2 O 3 0~5%, MgO 5
-10%, CaO 0-5%, SrO 2-16%, B
aO 0-3%, MgO + CaO 5-10%, MgO
+ CaO + SrO + BaO 15-21%, Na 2 O
0~8%, K 2 O2~9%, Na 2 O + K 2 O 8~12
%, ZrO 2 0-2%, and MgO /
It is characterized in that the value of Al 2 O 3 is 1.50 or more.
【００１１】[0011]
【作用】本発明のフラットパネルディスプレイ装置用ガ
ラス基板は、熱膨張係数を６５〜８０×１０-7／℃未満
に設定しているため、熱応力に起因する割れを抑え、し
かも、周辺材料の熱膨張係数との整合性が良好である。The glass substrate for a flat panel display device of the present invention has a coefficient of thermal expansion of less than 65 to 80 × 10 −7 / ° C., so that cracks caused by thermal stress can be suppressed, and the peripheral materials Good consistency with the coefficient of thermal expansion.
【００１２】また、ＭｇＯを５％以上含有し、ＭｇＯ／
Ａｌ2Ｏ3の値を１．５０以上にしているため、歪点を５
７０℃以上と高くすることができ、しかも、成形温度を
１２００℃以下と低くすることができる。ＭｇＯの含有
量が高くなると失透しやすくなることが懸念されるが、
ＭｇＯ＋ＣａＯの合量を１０％以下にすることで、失透
を抑えることができる。Further, MgO is contained at 5% or more, and MgO /
Since the value of Al 2 O 3 is 1.50 or more, the strain point is 5
It can be as high as 70 ° C. or higher, and the molding temperature can be as low as 1200 ° C. or lower. It is feared that when the content of MgO is high, the glass tends to be devitrified.
By setting the total amount of MgO + CaO to 10% or less, devitrification can be suppressed.
【００１３】更に、現在、フラットパネルディスプレイ
装置に使用されている高い歪点、高い体積電気抵抗率を
有するガラス基板は、ソーダ石灰ガラスに比べ割れが生
じやすいが、ＭｇＯ、ＣａＯ、ＳｒＯ、ＢａＯの合量を
２１％以下、ＺｒＯ2を２％以下に抑え、耐クラック性
を向上させているため、割れを抑えることができる。Further, glass substrates having a high strain point and a high volume resistivity, which are currently used in flat panel display devices, are more susceptible to cracking than soda-lime glass, but MgO, CaO, SrO, and BaO the total amount of 21% or less, to suppress the ZrO 2 2% or less, since the improved crack resistance, it is possible to suppress cracking.
【００１４】本発明のガラス基板において、各成分の割
合を上記のように限定した理由を以下に述べる。The reason why the proportion of each component in the glass substrate of the present invention is limited as described above will be described below.
【００１５】ＳｉＯ2は、ガラスのネットワークフォー
マーであるが、５５％より少なくなるとガラスの歪点が
低くなり、熱変形や熱収縮が大きくなるため問題とな
る。一方、７１％より多くなると熔融性が悪化するため
好ましくない。好ましい範囲は６３．５〜７０％であ
る。[0015] SiO 2 is a glass network former. However, if it is less than 55%, the strain point of the glass will be low, and thermal deformation and thermal shrinkage will be problematic. On the other hand, if it is more than 71%, the meltability deteriorates, which is not preferable. The preferred range is 63.5-70%.
【００１６】Ａｌ2Ｏ3は、ガラスの歪点を高める成分で
あるが、５％より多くなると、高温粘度が高くなり、ガ
ラスの成形が困難となるため好ましくない。好ましい範
囲は１〜４％である。Al 2 O 3 is a component that increases the strain point of glass. However, if it is more than 5%, the viscosity at high temperature becomes high, and molding of glass becomes difficult, which is not preferable. A preferred range is 1-4%.
【００１７】ＭｇＯは、ガラスの高温粘度を低下させて
ガラスの成形性や熔融性を高めたり、ガラスの体積電気
抵抗率を高める成分であるが、５％より少なくなると前
記効果が得られない。一方、１０％より多くなるとガラ
スが失透したり、ガラスの耐クラック性が著しく低下す
るため好ましくない。好ましい範囲は５〜８％である。MgO is a component that lowers the high-temperature viscosity of glass to increase the formability and meltability of the glass and increases the volume resistivity of the glass. However, if the content is less than 5%, the above effects cannot be obtained. On the other hand, if it exceeds 10%, the glass is devitrified or the crack resistance of the glass is remarkably reduced, which is not preferable. The preferred range is 5-8%.
【００１８】ＣａＯは、ガラスの高温粘度を低下させて
ガラスの成形性や熔融性を高めたり、ガラスの体積電気
抵抗率を高める成分であるが、５％より多くなるとガラ
スが失透したり、ガラスの耐クラック性が著しく低下す
るため好ましくない。好ましい範囲は０〜３％である。CaO is a component that lowers the high-temperature viscosity of the glass to increase the formability and meltability of the glass, and increases the volumetric electrical resistivity of the glass. It is not preferable because crack resistance of the glass is significantly reduced. The preferred range is 0-3%.
【００１９】ＳｒＯは、ガラスの高温粘度を低下させて
ガラスの成形性や熔融性を高めたり、体積電気抵抗率を
高める成分であるが、２％より少なくなると前記効果が
得られない。一方、１６％以上になるとガラスの耐クラ
ック性が低下するため好ましくない。好ましい範囲は
６．５％〜１４％である。SrO is a component that lowers the high-temperature viscosity of the glass to enhance the formability and melting property of the glass and increases the volume resistivity, but if the content is less than 2%, the above effects cannot be obtained. On the other hand, when the content is 16% or more, the crack resistance of the glass is undesirably reduced. The preferred range is 6.5% to 14%.
【００２０】ＢａＯは、ガラスの高温粘度を低下させて
ガラスの成形性や熔融性を高めたり、体積電気抵抗率を
高める成分であるが、３％より多くなるとガラスの歪点
が低下するため好ましくない。好ましい範囲は０〜２．
５％である。BaO is a component that lowers the high-temperature viscosity of the glass to increase the formability and meltability of the glass and increases the volume resistivity, but if it is more than 3%, the strain point of the glass is lowered. Absent. The preferred range is 0-2.
5%.
【００２１】ＭｇＯ及びＣａＯの合量が、５％より少な
くなると、歪点が低くなったり、ガラスの熔融性が低下
する。一方、１０％より多くなるとガラスが失透しやす
くなり成形が困難になるため好ましくない。好ましい範
囲は５〜９．５％である。When the total content of MgO and CaO is less than 5%, the strain point becomes low and the melting property of the glass decreases. On the other hand, if it is more than 10%, the glass tends to be devitrified and molding becomes difficult, which is not preferable. The preferred range is 5 to 9.5%.
【００２２】また、ＭｇＯ、ＣａＯ、ＳｒＯ及びＢａＯ
の合量が、１５％より少なくなるとガラスの熔融性が低
下し、２１％より多くなるとガラス基板の耐クラック性
が著しく低下する。これらの成分の合量は１６〜２０％
であることが好ましい。Also, MgO, CaO, SrO and BaO
If the total amount is less than 15%, the melting property of the glass decreases, and if it exceeds 21%, the crack resistance of the glass substrate significantly decreases. The total amount of these components is 16-20%
It is preferred that
【００２３】Ｎａ2Ｏは、ガラスの熱膨張係数を制御し
たり、ガラスの熔融性を高める成分であるが、８％より
多くなるとガラスの歪点が低下するため好ましくない。
好ましい範囲は１〜６％である。Na 2 O is a component that controls the coefficient of thermal expansion of the glass and enhances the meltability of the glass. However, if it exceeds 8%, the strain point of the glass is undesirably lowered.
The preferred range is 1-6%.
【００２４】Ｋ2Ｏは、Ｎａ2Ｏと同様、ガラスの熱膨張
係数を制御したり、ガラスの熔融性を高める成分である
が、２％より少なくなると前記効果が得られない。一
方、９％より多くなると歪点が低下するため好ましくな
い。好ましい範囲は、３〜８％である。より好ましくは
４〜８％である。K 2 O, like Na 2 O, is a component that controls the coefficient of thermal expansion of the glass and enhances the meltability of the glass. However, if it is less than 2%, the above effects cannot be obtained. On the other hand, if it exceeds 9%, the strain point is undesirably lowered. A preferred range is 3-8%. More preferably, it is 4 to 8%.
【００２５】Ｎａ2Ｏ及びＫ2Ｏの合量が、８％より少な
くなると熔融性が低下し、１２％より多くなると歪点が
低下するため好ましくない。これらの成分の合量は９〜
１１％の範囲にあることが好ましい。If the total amount of Na 2 O and K 2 O is less than 8%, the meltability decreases, and if it exceeds 12%, the strain point decreases, which is not preferable. The total amount of these components is 9 to
It is preferably in the range of 11%.
【００２６】ＺｒＯ2は、ガラスの歪点を高める成分で
あるが、２％より多くなるとガラスの耐クラック性が著
しく低下するため好ましくない。好ましい範囲は０〜
１．５％である。ZrO 2 is a component that increases the strain point of the glass. However, if it exceeds 2%, the crack resistance of the glass is remarkably reduced. The preferred range is 0 to
1.5%.
【００２７】高歪点を維持し、成形温度を低下させるた
めには、ＭｇＯ／Ａｌ2Ｏ3の割合を１．５０以上にする
必要がある。この割合が１．５０未満になると、前期効
果が得られない。好ましくは１．８０以上である。In order to maintain the high strain point and lower the molding temperature, the ratio of MgO / Al 2 O 3 needs to be 1.50 or more. If the ratio is less than 1.50, the effect cannot be obtained. Preferably it is at least 1.80.
【００２８】また、本発明においては、上記成分以外に
も種々の成分を添加することができる。例えば紫外線に
よる着色を防止するためにＴｉＯ2を３％まで、耐クラ
ック性を向上させるためにＰ2Ｏ5を２％まで添加するこ
とが可能である。更に、Ａｓ 2Ｏ3、Ｓｂ2Ｏ3、ＳＯ3、
Ｃｌ等の清澄剤成分を合量で１％まで、Ｆｅ2Ｏ3、Ｃｏ
Ｏ、ＮｉＯ、Ｃｒ2Ｏ3、ＣｅＯ3等の着色剤成分を各１
％まで添加することが可能である。In the present invention, in addition to the above components,
Also, various components can be added. For example, to ultraviolet light
TiO2 to prevent coloringTwoUp to 3%
P to improve lockabilityTwoOFiveUp to 2%
And it is possible. Furthermore, As TwoOThree, SbTwoOThree, SOThree,
Cl and other refining components up to 1% in totalTwoOThree, Co
O, NiO, CrTwoOThree, CeOThreeColorant components such as 1 each
% Can be added.
【００２９】上記組成を有する本発明のガラス基板は、
板ガラスの成形方法として知られているフロート法、ロ
ールアウト法等の方法によって製造できる。The glass substrate of the present invention having the above composition is
It can be manufactured by a method such as a float method or a roll-out method which is known as a method of forming a sheet glass.
【００３０】[0030]
【実施例】以下、本発明を実施例に基づいて説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to embodiments.
【００３１】本発明の実施例（試料Ｎｏ．１〜８）と比
較例（試料Ｎｏ．９〜１１）を表１及び２に示す。尚、
試料Ｎｏ．１１は、ソーダ石灰ガラスである。Tables 1 and 2 show Examples (Samples Nos. 1 to 8) and Comparative Examples (Samples Nos. 9 to 11) of the present invention. still,
Sample No. 11 is a soda-lime glass.
【００３２】[0032]
【表１】 [Table 1]
【００３３】[0033]
【表２】 [Table 2]
【００３４】表中の各試料は、次のようにして作製し
た。Each sample in the table was prepared as follows.
【００３５】まず、表の組成となるようにガラス原料を
調合し、白金ポットを用いて１４５０〜１６００℃で４
時間熔融した。その後、熔融ガラスをカーボン板の上に
流し出して板状に成形し、徐冷後、板厚が２．８ｍｍに
なるように両面研磨して、得られた板ガラスを２００ｍ
ｍ角の大きさに切断加工することで試料ガラスを作製し
た。First, a glass raw material was prepared so as to have the composition shown in the table, and was heated at 1450 to 1600 ° C. using a platinum pot.
Melted for hours. Thereafter, the molten glass was poured out onto a carbon plate, formed into a plate shape, cooled slowly, and polished on both sides so that the plate thickness became 2.8 mm.
A sample glass was prepared by cutting into a size of m square.
【００３６】このようして得られた各試料について、ク
ラック抵抗、密度、熱膨張係数、歪点、成形温度、液相
温度、体積電気抵抗率を測定し、表に示した。The samples thus obtained were measured for crack resistance, density, thermal expansion coefficient, strain point, molding temperature, liquidus temperature, and volume resistivity, and the results are shown in the table.
【００３７】本発明におけるガラスの耐クラック性の評
価は、和田らが提案した方法（Ｍ．Ｗａｄａ ｅｔ ａ
ｌ． Ｐｒｏｃ．， ｔｈｅ Ｘｔｈ ＩＣＧ， ｖｏ
ｌ．１１， Ｃｅｒａｍ． Ｓｏｃ．， Ｊａｐａｎ，
Ｋｙｏｔｏ， １９７４，ｐ３９）を用いた。この方
法は、ビッカース硬度計のステージに試料ガラスを置
き、試料ガラスの表面に菱形状のダイヤモンド圧子を種
々の荷重で１５秒間押し付ける。そして、除荷後１５秒
までに圧痕の四隅から発生するクラック数をカウント
し、最大発生しうるクラック数（４ヶ）に対する割合を
求め、クラック発生率とし、このクラック発生率が５０
％になる時の荷重を「クラック抵抗」とした。クラック
抵抗が大きいということは、高い荷重でもクラックが発
生しにくい、つまり、耐クラック性に優れているという
ことである。In the present invention, the evaluation of the crack resistance of the glass is performed by the method proposed by Wada et al. (M. Wada et a).
l. Proc. , The Xth ICG, vo
l. 11, Ceram. Soc. , Japan,
(Kyoto, 1974, p39) was used. In this method, a sample glass is placed on a stage of a Vickers hardness tester, and a diamond-shaped diamond indenter is pressed against the surface of the sample glass with various loads for 15 seconds. By 15 seconds after unloading, the number of cracks generated from the four corners of the indentation was counted, and the ratio to the maximum number of possible cracks (four) was determined.
% Was defined as "crack resistance". High crack resistance means that cracks are unlikely to occur even under a high load, that is, the crack resistance is excellent.
【００３８】尚、クラック発生率の測定は、同一荷重で
２０回測定し、その平均値を求めた。また、クラック抵
抗は湿度の影響を受けるため、測定は気温２５℃、湿度
３０％の条件で行った。The crack occurrence rate was measured 20 times under the same load, and the average value was obtained. Further, since the crack resistance is affected by the humidity, the measurement was performed at a temperature of 25 ° C. and a humidity of 30%.
【００３９】密度については、周知のアルキメデス法
で、熱膨張係数については、ディラトメーターで３０〜
３８０℃における平均熱膨張係数を測定した。また、歪
点については、ＡＳＴＭ Ｃ３３６−７１に基づいて測
定した。The density is determined by a well-known Archimedes method, and the coefficient of thermal expansion is determined by a dilatometer of 30 to
The average coefficient of thermal expansion at 380 ° C. was measured. The strain point was measured based on ASTM C336-71.
【００４０】成形温度については、ガラスの粘度が１０
4ｄＰａ・ｓに相当する温度を白金球引き上げ法により
測定した。この成形温度が熔融ガラスを板状のガラス基
板に成形する際の目安となり、この温度が低い方が良
く、具体的には、１２００℃以下であることが好まし
い。As for the molding temperature, the viscosity of the glass is 10
A temperature corresponding to 4 dPa · s was measured by a platinum ball pulling-up method. This molding temperature is a standard when molding the molten glass into a plate-like glass substrate, and the lower the temperature, the better, specifically, it is preferably 1200 ° C. or less.
【００４１】液相温度については、以下の要領で行っ
た。まず、各試料をそれぞれ３００〜５００μｍの大き
さに粉砕、混合し、これを白金製のボートに入れて９０
０〜１２００℃の温度勾配炉に移して４８時間保持し、
温度勾配炉より白金製のボートを取り出した。その後、
白金製のボートからガラスを取り出した。このようにし
て得られたサンプルを偏光顕微鏡で観察し、結晶の析出
点を測定した。液相温度も低い方が方が良く、具体的に
は１１００℃以下であることが好ましい。The liquidus temperature was measured as follows. First, each sample was pulverized to a size of 300 to 500 μm and mixed, and this was put in a platinum boat,
Transfer to a temperature gradient furnace of 0 to 1200 ° C. and hold for 48 hours,
A boat made of platinum was taken out of the temperature gradient furnace. afterwards,
The glass was taken out of the platinum boat. The sample thus obtained was observed with a polarizing microscope, and the crystal precipitation point was measured. The lower the liquidus temperature is, the better, specifically, it is preferably 1100 ° C. or lower.
【００４２】体積電気抵抗率については、ＡＳＴＭ Ｃ
６５７−７８に基づいて１５０℃における値を測定し
た。As for the volume resistivity, ASTM C
The value at 150 ° C. was measured based on 657-78.
【００４３】表から明らかなように、実施例である試料
Ｎｏ．１〜８の各試料は、クラック抵抗が８８０ｍＮ以
上で、ソーダ石灰ガラスと同等以上であり、耐クラック
性に優れていた。また、熱膨張係数は７２．５〜７３．
７×１０-7／℃の範囲で、周辺材料と良好に整合するこ
とができ、しかも、熱応力に起因する割れを抑えること
ができる。さらに、成形温度は１１９８℃以下、液相温
度は１０８０℃以下と低く、ガラスの成形性にも優れて
いた。さらに、密度は２．６３ｇ／ｃｍ3以下と低く、
歪点は５７７℃以上、体積電気抵抗率（ｌｏｇ ρ）は
１１．６Ω・ｃｍ以上であった。As is clear from the table, the sample No. Each of samples 1 to 8 had a crack resistance of 880 mN or more, which was equal to or more than that of soda-lime glass, and was excellent in crack resistance. The thermal expansion coefficient is 72.5 to 73.
In the range of 7 × 10 −7 / ° C., good matching with the surrounding material can be achieved, and cracks due to thermal stress can be suppressed. Further, the molding temperature was 1198 ° C. or less, the liquidus temperature was 1080 ° C. or less, and the glass was excellent in moldability. Further, the density is as low as 2.63 g / cm 3 or less,
The strain point was 577 ° C. or more, and the volume resistivity (log ρ) was 11.6 Ω · cm or more.
【００４４】これに対して、比較例である試料Ｎｏ．９
は、ＭｇＯ含有量が４．０％であるため、試料Ｎｏ．１
０は、ＭｇＯ／Ａｌ2Ｏ3の値が質量比で１．４であるた
め、いずれも成形温度が１２２０℃程度で高く、ガラス
の成形性に劣っていた。また、試料Ｎｏ．１２は、ソー
ダ石灰ガラスであるため、歪点が５１２℃と低く、ま
た、体積電気抵抗率（ｌｏｇ ρ）も８．４Ω・ｃｍ低
かった。On the other hand, the sample No. 9
Since the MgO content of the sample No. is 4.0%, 1
In the case of No. 0, since the value of MgO / Al 2 O 3 was 1.4 in mass ratio, the molding temperature was as high as about 1220 ° C., and the moldability of the glass was inferior. In addition, the sample No. Since No. 12 is soda-lime glass, the strain point was as low as 512 ° C., and the volume electrical resistivity (log ρ) was as low as 8.4 Ω · cm.
【００４５】[0045]
【発明の効果】以上のように本発明のフラットパネルデ
ィスプレイ装置用ガラス基板は、耐熱衝撃性、耐クラッ
ク性、及び成形性に優れ、しかも、歪点及び体積電気抵
抗率も高いため、フラットパネルディスプレイ装置、特
にプラズマディスプレイ装置のガラス基板として好適で
ある。As described above, the glass substrate for a flat panel display device of the present invention is excellent in thermal shock resistance, crack resistance, and moldability, and has a high strain point and a high volume electrical resistivity. It is suitable as a glass substrate for a display device, particularly a plasma display device.
フロントページの続き Ｆターム(参考） 4G062 AA01 BB03 CC04 DA06 DA07 DB01 DB02 DB03 DC01 DD01 DE01 DF01 EA01 EB01 EB02 EB03 EC03 ED03 EE03 EF03 EF04 EG01 EG02 EG03 FA01 FA10 FB01 FC01 FC02 FC03 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM27 MM40 NN30 NN31 NN33 NN34 NN40 5C040 GA09 KA10 Continued on front page F term (reference) 4G062 AA01 BB03 CC04 DA06 DA07 DB01 DB02 DB03 DC01 DD01 DE01 DF01 EA01 EB01 EB02 EB03 EC03 ED03 EE03 EF03 EF04 EG01 EG02 EG03 FA01 FA10 FB01 FC01 FC01 GA01 F01 FF01 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM27 MM40 NN30 NN31 NN33 NN34 NN40 5C040 GA09
Claims (2)
％、Ａｌ2Ｏ3 ０〜５％、ＭｇＯ ５〜１０％、ＣａＯ
０〜５％、ＳｒＯ ２〜１６％、ＢａＯ ０〜３％、
ＭｇＯ＋ＣａＯ ５〜１０％、ＭｇＯ＋ＣａＯ＋ＳｒＯ
＋ＢａＯ １５〜２１％、Ｎａ2Ｏ ０〜８％、Ｋ2Ｏ
２〜９％、Ｎａ2Ｏ＋Ｋ2Ｏ ８〜１２％、ＺｒＯ2 ０
〜２％の組成を有し、且つ、ＭｇＯ／Ａｌ2Ｏ3の値が
１．５０以上であることを特徴とするフラットパネルデ
ィスプレイ装置用ガラス基板。1. The method according to claim 1, wherein the weight percentage of SiO 2 is 55-71.
%, Al 2 O 3 0~5% , 5~10% MgO, CaO
0-5%, SrO 2-16%, BaO 0-3%,
MgO + CaO 5-10%, MgO + CaO + SrO
+ BaO 15~21%, Na 2 O 0~8%, K 2 O
2~9%, Na 2 O + K 2 O 8~12%, ZrO 2 0
It has a 2% composition, and a glass substrate for a flat panel display device, wherein the values of MgO / Al 2 O 3 is 1.50 or more.
満であることを特徴とする請求項１記載のフラットパネ
ルディスプレイ装置用ガラス基板。2. The glass substrate for a flat panel display device according to claim 1, wherein the glass substrate has a coefficient of thermal expansion of less than 65 to 80 × 10 −7 / ° C.
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|---|---|---|---|
| JP2001103484A JP4756428B2 (en) | 2001-04-02 | 2001-04-02 | Glass substrate for flat panel display |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004244257A (en) * | 2003-02-13 | 2004-09-02 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display device |
| JP2005162536A (en) * | 2003-12-03 | 2005-06-23 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display device |
| WO2006080292A1 (en) * | 2005-01-25 | 2006-08-03 | Central Glass Company, Limited | Substrate glass for display |
| JP2007031263A (en) * | 2005-06-22 | 2007-02-08 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display device |
| CN100366560C (en) * | 2005-11-25 | 2008-02-06 | 中国洛阳浮法玻璃集团有限责任公司 | Sodium calcium silicon series fire-proofing glass |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10152338A (en) * | 1996-03-14 | 1998-06-09 | Asahi Glass Co Ltd | Glass composition for substrate |
| JPH10152339A (en) * | 1996-09-27 | 1998-06-09 | Nippon Sheet Glass Co Ltd | Heat-resistant class composition |
-
2001
- 2001-04-02 JP JP2001103484A patent/JP4756428B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10152338A (en) * | 1996-03-14 | 1998-06-09 | Asahi Glass Co Ltd | Glass composition for substrate |
| JPH10152339A (en) * | 1996-09-27 | 1998-06-09 | Nippon Sheet Glass Co Ltd | Heat-resistant class composition |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004244257A (en) * | 2003-02-13 | 2004-09-02 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display device |
| JP2005162536A (en) * | 2003-12-03 | 2005-06-23 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display device |
| WO2006080292A1 (en) * | 2005-01-25 | 2006-08-03 | Central Glass Company, Limited | Substrate glass for display |
| JP2007031263A (en) * | 2005-06-22 | 2007-02-08 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display device |
| CN100366560C (en) * | 2005-11-25 | 2008-02-06 | 中国洛阳浮法玻璃集团有限责任公司 | Sodium calcium silicon series fire-proofing glass |
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| Publication number | Publication date |
|---|---|
| JP4756428B2 (en) | 2011-08-24 |
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