JPH1025129A - Glass for substrate - Google Patents
Glass for substrateInfo
- Publication number
- JPH1025129A JPH1025129A JP20307396A JP20307396A JPH1025129A JP H1025129 A JPH1025129 A JP H1025129A JP 20307396 A JP20307396 A JP 20307396A JP 20307396 A JP20307396 A JP 20307396A JP H1025129 A JPH1025129 A JP H1025129A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- substrate
- thermal expansion
- coefficient
- density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、基板用ガラスに関し、
特にプラズマディスプレイパネルの基板材料として好適
な基板用ガラスに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to glass for substrates,
Particularly, the present invention relates to a glass for a substrate suitable as a substrate material for a plasma display panel.
【０００２】[0002]
【従来の技術】従来よりプラズマディスプレイパネルの
基板としては、建築窓用ソーダライムガラス板が使用さ
れており、この基板表面に、Ａｌ、Ｎｉ、Ａｇ、ＩＴ
Ｏ、ネサ膜等からなる電極や絶縁ペーストを５００〜６
００℃の温度で焼き付けることによって回路が形成され
る。その後、５００〜６００℃の温度でフリットシール
することによってプラズマディスプレイが作製される。2. Description of the Related Art Conventionally, a soda lime glass plate for an architectural window has been used as a substrate of a plasma display panel, and Al, Ni, Ag, IT
O, Nesa film or other electrode or insulating paste
A circuit is formed by baking at a temperature of 00 ° C. Thereafter, a plasma display is manufactured by frit sealing at a temperature of 500 to 600 ° C.
【０００３】そのためこの種の基板用ガラスには、一般
に次のような特性を満足することが要求される。For this reason, this kind of substrate glass is generally required to satisfy the following characteristics.
【０００４】５００〜６００℃、特に５７０℃以上の
温度で熱処理する際の熱収縮を小さくするため、歪点が
５７０℃以上であること。[0004] The strain point must be 570 ° C or higher in order to reduce thermal shrinkage during heat treatment at a temperature of 500 to 600 ° C, especially 570 ° C or higher.
【０００５】熱膨張係数が、絶縁ペーストやシーリン
グフリットのそれと整合しているため反りが発生しない
こと。つまり７５〜９５×１０-7／℃の熱膨張係数を有
すること。Since the coefficient of thermal expansion matches that of the insulating paste or the sealing frit, no warpage occurs. That is, it has a coefficient of thermal expansion of 75 to 95 × 10 −7 / ° C.
【０００６】ネサ膜等の薄膜電極と、ガラス中のアル
カリ成分が反応すると、電極材料の電気抵抗値が変化し
てしまうため、ガラスの体積抵抗率が、１５０℃で１０
10Ω・ｃｍ以上と高く、アルカリ成分が薄膜電極と反応
しないこと。When a thin film electrode such as a Nesa film reacts with an alkali component in the glass, the electrical resistance of the electrode material changes, so that the volume resistivity of the glass at 150 ° C.
It is as high as 10 Ω · cm or more, and the alkali component does not react with the thin film electrode.
【０００７】[0007]
【発明が解決しようとする課題】建築窓用ソーダライム
ガラスは、約８９×１０-7／℃の熱膨張係数を有してお
り、これをプラズマディスプレイパネルの基板として用
いても反りは発生しないが、歪点が５００℃程度と低い
ため、５７０〜６００℃の温度で熱処理する際の熱収縮
が大きいという欠点を有している。The soda-lime glass for architectural windows has a thermal expansion coefficient of about 89 × 10 −7 / ° C., and no warpage occurs even when it is used as a substrate of a plasma display panel. However, since the strain point is as low as about 500 ° C., there is a disadvantage that the heat shrinkage when performing the heat treatment at a temperature of 570 to 600 ° C. is large.
【０００８】またソーダライムガラスは、体積抵抗率が
比較的低く、しかも化学的耐久性に乏しいため、長期間
の保管、使用によって表面に焼けが発生し、プラズマデ
ィスプレイの表示画面が見づらくなるという欠点も有し
ている。[0008] Soda lime glass has a relatively low volume resistivity and poor chemical durability. Therefore, the surface of the soda lime glass is burned by long-term storage and use, so that the display screen of the plasma display becomes difficult to see. Also have.
【０００９】このような事情から特開平３−４０９３３
号には、熱膨張係数が７５〜９０×１０-7／℃程度で、
ソーダライムガラスに比べて、歪点と体積抵抗率の高い
プラズマディスプレイパネル用ガラス基板が提案されて
いる。[0009] Under such circumstances, Japanese Patent Application Laid-Open No. 3-40933 is disclosed.
No. has a coefficient of thermal expansion of 75 to 90 × 10 -7 / ° C.
Glass substrates for plasma display panels having a higher strain point and higher volume resistivity than soda lime glass have been proposed.
【００１０】しかしながら特開平３−４０９３３号のガ
ラス基板は、ソーダライムガラスに比べて、かなり密度
が高いため、重量が大きくなるという問題がある。すな
わちプラズマディスプレイパネルは、３０〜５０インチ
程度の大画面で、しかも壁掛けテレビとなるため、これ
に用いられるガラス基板には、できるだけ軽量であるこ
とが要求される。ガラス基板を軽量化するためには、そ
の厚みを薄くすれば良いが、強度面を考慮すると、薄板
化については自ずと限界がある。そこでガラス基板の軽
量化を図るためには、ガラスの密度を低くする方法を採
らざるを得ないが、特開平３−４０９３３号には、ガラ
スの密度について何ら配慮されていない。However, the glass substrate disclosed in JP-A-3-40933 has a problem in that the glass substrate is considerably higher in density than soda-lime glass, so that the weight is increased. That is, since the plasma display panel has a large screen of about 30 to 50 inches and is a wall-mounted television, the glass substrate used for this is required to be as light as possible. In order to reduce the weight of the glass substrate, it is only necessary to reduce its thickness. However, considering the strength, there is naturally a limit to the reduction in thickness. Therefore, in order to reduce the weight of the glass substrate, a method of reducing the density of the glass has to be adopted. However, JP-A-3-40933 does not consider the density of the glass at all.
【００１１】本発明は、上記事情に鑑みなされたもので
あり、その目的とするところは、密度が２．７５ｇ／ｃ
ｍ3 以下と低く、５７０℃以上の温度で熱処理しても熱
収縮が小さく、また７５〜９５×１０-7／℃の熱膨張係
数を有し、しかもソーダライムガラスに比べて体積抵抗
率が高く、化学的耐久性に優れた基板用ガラスを提供す
ることである。The present invention has been made in view of the above circumstances, and has as its object to achieve a density of 2.75 g / c.
m 3 or less as low as low thermal shrinkage and heat-treated at 570 ° C. or higher, also has a thermal expansion coefficient of 75 to 95 × 10 -7 / ° C., yet the volume resistivity as compared with soda lime glass An object of the present invention is to provide a glass for a substrate which is high and has excellent chemical durability.
【００１２】[0012]
【課題を解決するための手段】本発明の基板用ガラス
は、重量百分率で、ＳｉＯ2 ５０〜６５％、Ａｌ2 Ｏ
3 １〜１５％、ＣａＯ ０〜２．９％、ＣａＯ＋Ｍｇ
Ｏ＋ＳｒＯ＋ＢａＯ １７％未満、ＺｒＯ2 １〜９
％、Ｌｉ2 Ｏ ０〜１％、Ｎａ2 Ｏ ２〜１２％、Ｋ2
Ｏ ２〜１３％、Ｌｉ2 Ｏ＋Ｎａ2 Ｏ＋Ｋ2 Ｏ ８〜１
６％、ＴｉＯ2 ０〜５％の組成を有し、密度が２．７
５ｇ／ｃｍ3 以下であることを特徴とする。According to the present invention, there is provided a glass for a substrate comprising 50 to 65% of SiO 2 and Al 2 O by weight percentage.
3 1~15%, CaO 0~2.9%, CaO + Mg
O + SrO + BaO Less than 17%, ZrO 2 1-9
%, Li 2 O 0~1%, Na 2 O 2~12%, K 2
O 2 to 13%, Li 2 O + Na 2 O + K 2 O 8 to 1
It has a composition of 6%, TiO 2 0-5%, and a density of 2.7.
It is not more than 5 g / cm 3 .
【００１３】[0013]
【作用】以下、本発明の基板用ガラスの各成分を上記の
ように限定した理由を説明する。The reasons why the components of the glass for a substrate of the present invention are limited as described above will be described below.
【００１４】ＳｉＯ2 は、ガラスのネットワークフォー
マーである。その含有量は５０〜６５％である。５０％
より少ないと、ガラスの歪点が低くなるため、熱収縮が
大きくなり、一方、６５％より多いと、熱膨張係数が小
さくなりすぎる。[0014] SiO 2 is a glass network former. Its content is 50-65%. 50%
If the amount is smaller, the glass has a lower strain point, so that the heat shrinkage becomes large. On the other hand, if it is more than 65%, the coefficient of thermal expansion becomes too small.
【００１５】Ａｌ2 Ｏ3 は、ガラスの歪点を高めるため
の成分であり、その含有量は１〜１５％である。１％よ
り少ないと、上記効果が得られず、一方、１５％より多
いと、ガラスが失透しやすく、成形が困難となる。すな
わちガラスが失透しやすいと、失透物の発生を抑えるた
め溶融温度を高くする必要があるが、溶融温度を高くす
ると、成形時のガラスが軟らかくなる。その結果、ガラ
ス板の表面にうねりが発生したり、寸法精度が低下しや
すくなり、高い表面精度や寸法精度が要求されるプラズ
マディスプレイパネルの基板として使用することが不可
能となる。Al 2 O 3 is a component for increasing the strain point of glass, and its content is 1 to 15%. If it is less than 1%, the above effect cannot be obtained, while if it is more than 15%, the glass tends to be devitrified, and molding becomes difficult. That is, if the glass is easily devitrified, it is necessary to increase the melting temperature in order to suppress the generation of the devitrified material. However, if the melting temperature is increased, the glass at the time of molding becomes soft. As a result, undulation occurs on the surface of the glass plate, and dimensional accuracy is likely to be reduced, and it is impossible to use the glass plate as a substrate of a plasma display panel that requires high surface accuracy and dimensional accuracy.
【００１６】ＣａＯは、ガラスを溶融しやすくすると共
に熱膨張係数を制御するための成分であり、その含有量
は、０〜２．９％である。２．９％より多いと、ガラス
が失透しやすく、成形が困難となる。CaO is a component for facilitating melting of the glass and for controlling the coefficient of thermal expansion, and its content is 0 to 2.9%. If it is more than 2.9%, the glass tends to be devitrified and molding is difficult.
【００１７】またＣａＯ、ＭｇＯ、ＳｒＯ及びＢａＯの
合量が、１７％以上になると、ガラスの密度が高くな
り、軽量化を図ることが困難となるため好ましくない。
ただしこれらの成分が、少なくなりすぎると、７５×１
０-7／℃以上の熱膨張係数が得られ難くなるため、合量
で１０％以上含有させることが望ましい。On the other hand, if the total amount of CaO, MgO, SrO, and BaO is 17% or more, the density of the glass increases and it is difficult to reduce the weight, which is not preferable.
However, if these components become too small, 75 × 1
Since it is difficult to obtain a thermal expansion coefficient of 0 −7 / ° C. or more, it is desirable to contain 10% or more in total.
【００１８】尚、ＭｇＯ、ＳｒＯ及びＢａＯも、ＣａＯ
と同様、ガラスを溶融しやすくすると共に熱膨張係数を
制御するという作用を有している。ただしＭｇＯの含有
量が４％より多くなると、ガラスが失透しやすく、成形
が困難となるため好ましくない。またＳｒＯは、上記し
た作用以外にも、失透性を改善し、且つ、歪点を高める
という作用も有するため、２％以上、好ましくは５．５
％以上含有させることが望ましい。ただしＳｒＯとＢａ
Ｏの含有量が増加するほど、ガラスの密度の上昇が著し
くなるため、ＳｒＯは１３％以下、ＢａＯは５％以下、
好ましくは１．９％以下に抑えることが望ましい。Incidentally, MgO, SrO and BaO are also CaO
Similarly to the above, it has the effect of making the glass easier to melt and controlling the thermal expansion coefficient. However, when the content of MgO is more than 4%, the glass is apt to be devitrified and molding is difficult, which is not preferable. In addition, SrO has an effect of improving devitrification and increasing a strain point, in addition to the above-described effect, so that it is 2% or more, preferably 5.5.
% Is desirably contained. However, SrO and Ba
As the O content increases, the density of the glass increases significantly, so that SrO is 13% or less, BaO is 5% or less,
It is desirable to keep the content to 1.9% or less.
【００１９】ＺｒＯ2 は、ガラスの化学的耐久性を向上
させるのに効果のある成分であり、その含有量は、１〜
９％である。１％より少ないと、化学的耐久性を向上さ
せる効果に乏しくなると共に、歪点が低くなりすぎ、一
方、９％より多いと、熱膨張係数が小さくなりすぎると
共に、ガラスの溶融時に失透物が生成しやすく、成形が
困難となる。ZrO 2 is a component effective for improving the chemical durability of glass.
9%. If it is less than 1%, the effect of improving the chemical durability becomes poor, and the strain point becomes too low. Are easily formed, and molding is difficult.
【００２０】Ｌｉ2 Ｏ、Ｎａ2 Ｏ及びＫ2 Ｏは、いずれ
も熱膨張係数を制御するための成分であり、Ｌｉ2 Ｏの
含有量は、０〜１％である。Ｌｉ2 Ｏが１％より多い
と、歪点が低くなる。Li 2 O, Na 2 O and K 2 O are all components for controlling the coefficient of thermal expansion, and the content of Li 2 O is 0 to 1%. If the content of Li 2 O is more than 1%, the strain point becomes low.
【００２１】またＮａ2 Ｏの含有量は、２〜１２％であ
る。２％より少ないと、熱膨張係数が小さくなりすぎ、
一方、１２％より多いと、歪点が低くなりすぎる。The content of Na 2 O is 2 to 12%. If it is less than 2%, the coefficient of thermal expansion becomes too small,
On the other hand, if it is more than 12%, the strain point is too low.
【００２２】Ｋ2 Ｏの含有量は、２〜１３％である。２
％より少ないと、熱膨張係数が小さくなりすぎ、一方、
１３％より多いと、歪点が低くなりすぎる。The content of K 2 O is 2 to 13%. 2
%, The coefficient of thermal expansion becomes too small, while
If it is more than 13%, the strain point becomes too low.
【００２３】ただしＬｉ2 Ｏ、Ｎａ2 Ｏ及びＫ2 Ｏの合
量が、８％より少ないと、熱膨張係数が小さくなりやす
く、一方、１６％より多いと、歪点が低くなりやすいた
め好ましくない。この合量の好ましい範囲は、１２．５
〜１５．５％である。However, when the total amount of Li 2 O, Na 2 O and K 2 O is less than 8%, the coefficient of thermal expansion tends to be small. On the other hand, when the total amount is more than 16%, the strain point tends to be low. Absent. The preferred range of this total amount is 12.5
１５15.5%.
【００２４】ＴｉＯ2 は、ガラスの紫外線による着色を
防止するための成分であり、その含有量は０〜５％であ
る。プラズマディスプレイの場合、放電時に紫外線が発
生するが、基板が紫外線によって着色すると、長期間使
用している間に徐々に表示画面が見づらくなる。従って
本発明においては、ＴｉＯ2 を０．１％以上含有させる
ことが望ましい。しかしながら５％より多くなると、ガ
ラスが失透しやすく、成形が困難となるため好ましくな
い。TiO 2 is a component for preventing glass from being colored by ultraviolet rays, and its content is 0 to 5%. In the case of a plasma display, ultraviolet rays are generated at the time of discharge. However, if the substrate is colored by the ultraviolet rays, the display screen gradually becomes difficult to see during long-term use. Therefore, in the present invention, it is desirable that TiO 2 be contained at 0.1% or more. However, if it is more than 5%, the glass is apt to be devitrified and molding becomes difficult, which is not preferable.
【００２５】また本発明においては、上記成分以外に
も、ガラスの溶融性を向上させ、熱膨張係数を調整する
目的で、ＺｎＯを５％まで添加することが可能であり、
紫外線によってガラスが褐色に着色するのを防止する目
的で、Ｂｉ2 Ｏ3 を５％まで添加することが可能であ
る。さらに清澄剤として、Ａｓ2 Ｏ3 、Ｓｂ2 Ｏ3 、Ｓ
Ｏ3 、Ｃｌ等の成分を１％まで添加することが可能であ
り、着色剤として、Ｆｅ2Ｏ3 、ＣｏＯ、Ｃｒ2 Ｏ3 、
ＮｉＯ、ＣｅＯ2 等の成分を１％まで添加することが可
能である。In the present invention, in addition to the above components, ZnO can be added up to 5% for the purpose of improving the melting property of the glass and adjusting the thermal expansion coefficient.
For the purpose of preventing the glass from being colored brown by ultraviolet rays, Bi 2 O 3 can be added up to 5%. As fining agents, As 2 O 3 , Sb 2 O 3 , S
Components such as O 3 and Cl can be added up to 1%, and as a coloring agent, Fe 2 O 3 , CoO, Cr 2 O 3 ,
Components such as NiO and CeO 2 can be added up to 1%.
【００２６】しかしながら本発明においては、Ｂ2 Ｏ3
を含有すると、歪点が低下しやすくなるため好ましくな
い。またＰｂＯは、一般に融剤として作用するが、ガラ
スの化学的耐久性を低下させると共に、溶融時に融液の
表面から揮発し、環境を汚染する虞れもあるため好まし
くない。However, in the present invention, B 2 O 3
Is not preferred because the strain point tends to decrease. In addition, PbO generally acts as a flux, but is not preferred because it lowers the chemical durability of the glass and may volatilize from the surface of the melt at the time of melting to pollute the environment.
【００２７】[0027]
【実施例】以下、本発明の基板用ガラスを実施例に基づ
いて詳細に説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the glass for a substrate of the present invention will be described in detail based on embodiments.
【００２８】表１は、実施例の基板用ガラス（試料Ｎ
ｏ．１〜６）と、比較例の基板用ガラス（試料Ｎｏ．
７、８）を示すものである。因に試料Ｎｏ．８は、一般
の建築窓用ソーダライムガラスである。Table 1 shows the glass for a substrate (sample N
o. 1 to 6) and the glass for a substrate of the comparative example (sample No. 1).
7, 8). Note that the sample No. 8 is a soda lime glass for general architectural windows.
【００２９】[0029]
【表１】 [Table 1]
【００３０】表１の各試料は、次のようにして調製し
た。Each sample in Table 1 was prepared as follows.
【００３１】まず表中のガラス組成となるように原料を
調合し、これを白金坩堝に入れた後、電気炉中で１４５
０〜１５５０℃の温度で４時間溶融し、この溶融ガラス
をカーボン上に流し出して板状に成形した。次いで、こ
のガラス板の両面を光学研磨することによってガラス基
板を作製した。First, raw materials were prepared so as to have the glass composition shown in the table, and this was put in a platinum crucible.
It was melted at a temperature of 0 to 1550 ° C. for 4 hours, and the molten glass was poured out onto carbon and formed into a plate. Next, a glass substrate was produced by optically polishing both surfaces of the glass plate.
【００３２】こうして得られた各試料について、密度、
歪点、液相温度、熱膨張係数、体積抵抗率及び紫外線に
よる着色の度合いを調べた。For each of the samples thus obtained, the density,
The strain point, the liquidus temperature, the coefficient of thermal expansion, the volume resistivity, and the degree of coloring by ultraviolet light were examined.
【００３３】表１から明らかなように、実施例であるＮ
ｏ．１〜６の各試料は、密度が２．６８ｇ／ｃｍ3 以下
であるため、軽量化を図ることが可能であり、歪点が５
７６℃以上であるため、熱収縮が小さく、液相温度が１
０２０℃以下であるため、失透し難いことが明らかであ
る。またこれらの試料は、熱膨張係数が８０〜８９×１
０-7／℃であり、１５０℃における体積抵抗率が１０
11.1Ω・ｃｍ以上と高く、しかも紫外線による着色度合
いが小さかった。As is clear from Table 1, the N
o. Since each of the samples 1 to 6 has a density of 2.68 g / cm 3 or less, the weight can be reduced, and the strain point is 5%.
Since the temperature is 76 ° C. or higher, the heat shrinkage is small and the liquidus temperature is 1
Since the temperature is 020 ° C. or lower, it is clear that devitrification is difficult. These samples have a coefficient of thermal expansion of 80 to 89 × 1.
0 −7 / ° C. and a volume resistivity at 150 ° C. of 10
It was as high as 11.1 Ω · cm or more, and the degree of coloring by ultraviolet rays was small.
【００３４】それに対し、比較例であるＮｏ．７の試料
は、密度が２．８７ｇ／ｃｍ3 と高く、しかも液相温度
が１２００℃と高いことから、失透しやすく、成形し難
いものと考えられる。またＮｏ．８の試料は、歪点が５
００℃と低く、体積抵抗率が低いため、アルカリ成分が
薄膜電極と反応しやすいものと考えられ、しかも紫外線
による着色の度合いも大きかった。On the other hand, the comparative example No. Sample No. 7 has a high density of 2.87 g / cm 3 and a high liquidus temperature of 1200 ° C., and thus is considered to be easily devitrified and difficult to mold. No. The sample of 8 has a strain point of 5
Since the temperature was as low as 00 ° C. and the volume resistivity was low, it was considered that the alkali component was likely to react with the thin-film electrode, and the degree of coloring by ultraviolet rays was large.
【００３５】尚、表中の密度は、周知のアルキメデス法
によって測定し、歪点は、ＡＳＴＭＣ３３６−７１の方
法に基づいて測定し、液相温度は、白金ボートに２９７
〜５００μｍの粒径を有するガラス粉末を入れ、温度勾
配炉に４８時間保持した後の失透観察によって求めたも
のである。The density in the table is measured by the well-known Archimedes method, the strain point is measured based on the method of ASTM C336-71, and the liquidus temperature is 297 in a platinum boat.
It was determined by observing devitrification after putting glass powder having a particle size of ~ 500 µm and holding it in a temperature gradient furnace for 48 hours.
【００３６】また熱膨張係数は、ディラトメーターによ
って３０〜３８０℃における平均熱膨張係数を測定した
ものであり、体積抵抗率は、ＡＳＴＭ Ｃ６５７−７８
に基づいて１５０℃における値を測定したものである。The coefficient of thermal expansion is obtained by measuring the average coefficient of thermal expansion at 30 to 380 ° C. using a dilatometer, and the volume resistivity is determined by ASTM C657-78.
The value at 150 ° C. was measured based on.
【００３７】さらに紫外線による着色の度合いは、各ガ
ラス基板を４００Ｗの水銀ランプで４８時間照射し、照
射前後の波長４００ｎｍにおける紫外線透過率を測定
し、その透過率の差を示したものである。この値が大き
いほど、紫外線によって着色しやすいということにな
る。Further, the degree of coloring by ultraviolet rays is obtained by irradiating each glass substrate with a 400 W mercury lamp for 48 hours, measuring the transmittance of ultraviolet rays at a wavelength of 400 nm before and after the irradiation, and showing the difference in transmittance. The larger this value is, the more easily it is colored by ultraviolet rays.
【００３８】[0038]
【発明の効果】以上のように本発明の基板用ガラスは、
密度が２．７５ｇ／ｃｍ3 以下と低く、５７０℃以上の
温度で熱処理しても熱収縮が小さく、７５〜９５×１０
-7／℃の熱膨張係数を有し、また体積抵抗率が高く、し
かも化学的耐久性に優れ、紫外線による着色も少ないた
め、プラズマディスプレイパネルの基板材料として好適
である。As described above, the glass for a substrate of the present invention is
The density is as low as 2.75 g / cm 3 or less, and the heat shrinkage is small even when heat-treated at a temperature of 570 ° C. or more, and 75 to 95 × 10
It has a coefficient of thermal expansion of −7 / ° C., has a high volume resistivity, is excellent in chemical durability, and has little coloring by ultraviolet rays, so that it is suitable as a substrate material of a plasma display panel.
【００３９】さらに本発明の基板用ガラスは、失透し難
いため、一般にガラス板の成形方法として知られている
フロート法、フュージョン法、ロールアウト法等のいず
れの方法によっても製造することが可能である。Further, since the glass for a substrate of the present invention is hardly devitrified, it can be produced by any of the methods generally known as a method for forming a glass sheet, such as a float method, a fusion method, and a roll-out method. It is.
Claims (1)
％、Ａｌ2 Ｏ3 １〜１５％、ＣａＯ ０〜２．９％、
ＣａＯ＋ＭｇＯ＋ＳｒＯ＋ＢａＯ １７％未満、ＺｒＯ
2 １〜９％、Ｌｉ2 Ｏ ０〜１％、Ｎａ2 Ｏ ２〜１
２％、Ｋ2 Ｏ２〜１３％、Ｌｉ2 Ｏ＋Ｎａ2 Ｏ＋Ｋ2 Ｏ
８〜１６％、ＴｉＯ2 ０〜５％の組成を有し、密度
が２．７５ｇ／ｃｍ3 以下であることを特徴とする基板
用ガラス。1. The composition according to claim 1, wherein the weight percentage of SiO 2 is 50-65.
%, Al 2 O 3 1~15% , CaO 0~2.9%,
CaO + MgO + SrO + BaO Less than 17%, ZrO
2 1~9%, Li 2 O 0~1 %, Na 2 O 2~1
2%, K 2 O2~13%, Li 2 O + Na 2 O + K 2 O
8-16%, has a composition of TiO 2 0 to 5% glass substrate, wherein the density is 2.75 g / cm 3 or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20307396A JPH1025129A (en) | 1996-07-12 | 1996-07-12 | Glass for substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20307396A JPH1025129A (en) | 1996-07-12 | 1996-07-12 | Glass for substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH1025129A true JPH1025129A (en) | 1998-01-27 |
Family
ID=16467908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20307396A Withdrawn JPH1025129A (en) | 1996-07-12 | 1996-07-12 | Glass for substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1025129A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0879800A1 (en) * | 1997-05-24 | 1998-11-25 | Schott Glas | Aluminosilicate glass for flat display services |
| US6268304B1 (en) | 1998-04-28 | 2001-07-31 | Asahi Glass Company Ltd. | Plate glass and substrate glass for electronics |
| US6297182B1 (en) | 1998-08-11 | 2001-10-02 | Asahi Glass Company Ltd. | Glass for a substrate |
| US6303528B1 (en) * | 1998-01-27 | 2001-10-16 | Schott Glas | Glass for rigid disk substrates |
| JP2003054984A (en) * | 2001-08-13 | 2003-02-26 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display unit |
| WO2004052799A1 (en) * | 2002-12-06 | 2004-06-24 | Nippon Sheet Glass Co., Ltd. | Glass for flat panel display substrate and flat panel display substrate |
| JP2007246365A (en) * | 2006-03-17 | 2007-09-27 | Nippon Electric Glass Co Ltd | Glass substrate for display |
| CN102320742A (en) * | 2007-03-23 | 2012-01-18 | 旭硝子株式会社 | Substrate glass for data storage medium and glass substrate |
| US10683231B2 (en) | 2015-03-26 | 2020-06-16 | Pilkington Group Limited | Glasses |
-
1996
- 1996-07-12 JP JP20307396A patent/JPH1025129A/en not_active Withdrawn
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0879800A1 (en) * | 1997-05-24 | 1998-11-25 | Schott Glas | Aluminosilicate glass for flat display services |
| US6087284A (en) * | 1997-05-24 | 2000-07-11 | Schott Glas | Aluminosilicate glass for flat display devices |
| US6303528B1 (en) * | 1998-01-27 | 2001-10-16 | Schott Glas | Glass for rigid disk substrates |
| US6268304B1 (en) | 1998-04-28 | 2001-07-31 | Asahi Glass Company Ltd. | Plate glass and substrate glass for electronics |
| US6297182B1 (en) | 1998-08-11 | 2001-10-02 | Asahi Glass Company Ltd. | Glass for a substrate |
| JP2003054984A (en) * | 2001-08-13 | 2003-02-26 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display unit |
| WO2004052799A1 (en) * | 2002-12-06 | 2004-06-24 | Nippon Sheet Glass Co., Ltd. | Glass for flat panel display substrate and flat panel display substrate |
| JP2007246365A (en) * | 2006-03-17 | 2007-09-27 | Nippon Electric Glass Co Ltd | Glass substrate for display |
| CN102320742A (en) * | 2007-03-23 | 2012-01-18 | 旭硝子株式会社 | Substrate glass for data storage medium and glass substrate |
| US10683231B2 (en) | 2015-03-26 | 2020-06-16 | Pilkington Group Limited | Glasses |
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