JPH10114538A - Alkali-free glass and its production - Google Patents

Alkali-free glass and its production

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Publication number
JPH10114538A
JPH10114538A JP11646497A JP11646497A JPH10114538A JP H10114538 A JPH10114538 A JP H10114538A JP 11646497 A JP11646497 A JP 11646497A JP 11646497 A JP11646497 A JP 11646497A JP H10114538 A JPH10114538 A JP H10114538A
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Prior art keywords
glass
alkali
sno
free glass
free
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JP11646497A
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Japanese (ja)
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JP3861271B2 (en )
Inventor
Atsushi Naka
Shigeru Yamamoto
淳 中
山本  茂
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Nippon Electric Glass Co Ltd
日本電気硝子株式会社
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium

Abstract

PROBLEM TO BE SOLVED: To provide an alkali-free glass in which bubbles causing display defects do not exist without using As2O3 as a refining agent.
SOLUTION: This alkali-free glass has a compsn. consisting of, by weight, 40-70% SiO2, 6-25% Al2O3, 5-20% B2O3, 0-10% MgO, 0-15% CaO, 0-30% BaO, 0-10% SrO, 0-10% ZnO, 0.05-2% SnO2 and 0.05-3% Sb2O3 and does not practically contain an alkali metal oxide.
COPYRIGHT: (C)1998,JPO

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【産業上の利用分野】本発明は、無アルカリガラス、特にディスプレイ等の透明ガラス基板として使用される無アルカリガラスとその製造方法に関するものである。 The present invention relates to an alkali-free glass, and more particularly to a non-alkali glass and a manufacturing method thereof which is used as a transparent glass substrate such as a display.

【0002】 [0002]

【従来の技術】従来、液晶ディスプレイ等の透明ガラス基板として、無アルカリガラスが使用されている。 Conventionally, as a transparent glass substrate such as a liquid crystal display, an alkali-free glass is used. ディスプレイ用途に用いられる無アルカリガラスには、耐熱性、耐薬品性等の特性の他に、表示欠陥となる泡のないことが要求される。 The alkali-free glass used in display applications, heat resistance and other properties such as chemical resistance, is required to be free from bubbles as a display defects.

【0003】このような無アルカリガラスとして、従来より種々のガラスが提案されており、本出願人も特開昭63−74935号においてSiO 2 −Al 23 −B As such a non-alkali glass, and various glasses conventionally been proposed, SiO 2 -Al 2 O 3 -B in the applicant also JP 63-74935
2 2 O 3 −CaO−BaO系の無アルカリガラスを提案している。 3 has proposed an alkali-free glass of -CaO-BaO system.

【0004】 [0004]

【発明が解決しようとする課題】泡のないガラスを得るためには、ガラス化反応時から均質化溶融時にかけての温度域で清澄ガスを発生する清澄剤を使用することが重要である。 To obtain a free glass THE INVENTION It is an object Solved Foam, it is important to use a refining agent which generates a fining gas in a temperature range of subjected during homogenization melting by the glass during reaction. つまりガラスの清澄は、ガラス化反応時に発生するガスを清澄ガスによってガラス融液中から追い出し、さらに均質化溶融時に残った微小な泡を再び発生させた清澄ガスによって泡径を大きくして浮上させて除去する。 That fining of the glass, expel gas generated during the vitrification reaction from the glass melt in the fining gas, and further floated by increasing the bubble size at the remaining fine fining gas bubbles were allowed to occur again in the homogenization melting to remove Te.

【0005】ところで液晶ディスプレイ用ガラス基板に使用されるような無アルカリガラスでは、ガラス融液の粘度が高く、アルカリ成分を含有するガラスに比べて溶融がより高温で行われる。 [0005] In the alkali-free glass, such as those used in LCD glass substrates, the viscosity of the glass melt is high, melt than glass containing an alkali component is more performed at a high temperature. このため、清澄剤には幅広い温度域(1200〜1600℃程度)で清澄ガスを発生することができるAs 23が広く使用されている。 Therefore, it As 2 O 3 has been widely used which is capable of generating a fining gas in a wide temperature range (about 1200 to 1600 ° C.) in the fining agent.

【0006】しかしながらAs 23は毒性が非常に強く、ガラスの製造工程や廃ガラスの処理時等に環境を汚染する可能性があり、その使用が制限されつつある。 However As 2 O 3 is highly toxic, may contaminate the environment when processing in manufacturing processes or waste glass of the glass, its use is being restricted.

【0007】本発明の目的は、清澄剤としてAs 23 An object of the present invention, As 2 O 3 as a fining agent
を使用せず、しかも表示欠陥となる泡が存在しない無アルカリガラスとその製造方法を提供することである。 The without, moreover it is to provide an alkali-free glass having no bubble to be display defects and the manufacturing method thereof.

【0008】 [0008]

【課題を解決するための手段】本出願人は、種々の実験を行った結果、清澄剤としてAs 23の代わりにSn Applicant Means for Solving the Problems] As a result of various experiments, Sn in place of As 2 O 3 as a fining agent
2とSb 23を併用することによって上記目的が達成できることを見いだし、本発明として提案するものである。 Found that the object can be achieved by a combination of O 2 and Sb 2 O 3, it is to propose a present invention.

【0009】即ち、本発明の無アルカリガラスは、重量百分率でSiO 2 40〜70%、Al 23 6〜2 [0009] That is, the alkali-free glass of the present invention, SiO 2 40 to 70% by weight percentage, Al 2 O 3 6 to 2
5%、B 23 5〜20%、MgO 0〜10%、C 5%, B 2 O 3 5~20 %, 0~10% MgO, C
aO0〜15%、BaO 0〜30%、SrO 0〜1 aO0~15%, BaO 0~30%, SrO 0~1
0%、ZnO 0〜10%、SnO 2 0.05〜2 0%, 0~10% ZnO, SnO 2 0.05~2
%、Sb 23 0.05〜3%の組成を有し、本質的にアルカリ金属酸化物を含有しないことを特徴とする。 %, It has a composition of Sb 2 O 3 0.05 to 3%, essentially characterized in that it does not contain alkali metal oxides.

【0010】また本発明の無アルカリガラスの製造方法は、重量百分率でSiO 2 40〜70%、Al 23 [0010] manufacturing method of alkali-free glass of the present invention, SiO 2 40 to 70% by weight percentage, Al 2 O 3
6〜25%、B 23 5〜20%、MgO 0〜1 6~25%, B 2 O 3 5~20 %, MgO 0~1
0%、CaO 0〜15%、BaO 0〜30%、Sr 0%, CaO 0~15%, BaO 0~30%, Sr
O 0〜10%、ZnO 0〜10%の組成を有し、本質的にアルカリ金属酸化物を含有しないガラスとなるように調合したガラス原料調合物を溶融した後、成形する無アルカリガラスの製造方法において、ガラス原料調合物に清澄剤としてSnO 2を0.05〜2重量%及びS O 0%, has a composition of 0% ZnO, prepared essentially after melting the alkali metal oxide glass material formulation which is prepared to have a glass containing no alkali-free glass for molding in the method, the SnO 2 in the glass batch formulation as a refining agent 0.05-2 wt% and S
23を0.05〜3重量%添加することを特徴とする。 The b 2 O 3, characterized in that the addition of 0.05 to 3 wt%.

【0011】 [0011]

【作用】本発明において使用するSnO 2とSb 23 SnO 2 and Sb 2 O 3 used in [action] The present invention
は、1200℃以上の温度域でSnイオンとSbイオンの価数変化による化学反応により多量の酸素ガスを発生する。 Generates a large amount of oxygen gas by a chemical reaction due to valence change of Sn ions and Sb ions at a temperature range of not lower than 1200 ° C.. 特にSnO 2は1400℃以上で、Sb 23は1200〜1300℃付近で酸素ガスを多量に発生する。 Especially in SnO 2 is 1400 ° C. or higher, Sb 2 O 3 generates a large amount of oxygen gas in the vicinity of 1200 to 1300 ° C.. 従って清澄剤としてSnO 2とSb 23を併用することにより、比較的低温で起こるガラス化反応時から高温の均質化溶融時にかけての広い温度域で高い清澄効果が得られるため、表示欠陥となる泡が存在しない無アルカリガラスを得ることができる。 The combined use of SnO 2 and Sb 2 O 3 is therefore as a fining agent, relatively for wide high temperature region refining effect of low temperatures during vitrification reaction occurring over the time of homogenization melting hot is obtained, and display defects alkali-free glass consisting bubbles are not present can be obtained.

【0012】次に、本発明の無アルカリガラスの製造方法を述べる。 [0012] Next, described a method for producing alkali-free glass of the present invention.

【0013】まず、所望の組成を有するガラスとなるようにガラス原料調合物を用意する。 [0013] First, a glass batch formulation to be a glass having a desired composition. ガラスの組成範囲及びその限定理由を以下に述べる。 The composition of the glass range and reasons for limitation will be described below.

【0014】SiO 2はガラスのネットワークとなる成分であり、その含有量は40〜70%、好ましくは45 [0014] SiO 2 is a component serving as a network of the glass, the content thereof is 40% to 70%, preferably 45
〜65%である。 It is 65%. SiO 2が40%より少ないと耐薬品性が悪化するとともに、歪点が低くなって耐熱性が悪くなり、70%より多いと高温粘度が大きくなって溶融性が悪くなるとともに、クリストバライトの失透物が析出し易くなる。 And SiO 2 is less than 40% with the chemical resistance is deteriorated, the heat resistance is deteriorated and strain point becomes lower, with a high temperature viscosity is more than 70%, the melting property deteriorates increases, devitrification of cristobalite thing is likely to precipitate.

【0015】Al 23はガラスの耐熱性、耐失透性を高める成分であり、その含有量は6〜25%、好ましくは10〜20%である。 The Al 2 O 3 is heat-resistant glass, or to enhance the devitrification resistance, the content is 6-25%, preferably 10-20%. Al 23が6%より少ないと失透温度が著しく上昇してガラス中に失透が生じ易くなり、25%より多いと耐酸性、特に耐バッファードフッ酸性が低下してガラス基板表面に白濁が生じ易くなる。 Al 2 O 3 tends to occur devitrification during glass less devitrification temperature than 6% is significantly increased, 25% greater than the acid resistance, the glass substrate surface decreases especially resistance to buffered hydrofluoric acid cloudiness is likely to occur.

【0016】B 23は融剤として働き、粘性を下げて溶融を容易にする成分であり、その含有量は5〜20 [0016] B 2 O 3 is acts as a flux, a component for facilitating melt by lowering the viscosity, the content thereof is 5 to 20
%、好ましくは6〜15%である。 %, Preferably 6 to 15%. 23が5%より少ないと融剤としての効果が不十分となり、20%より多いと耐塩酸性が低下するとともに、歪点が低下して耐熱性が悪化する。 B 2 O 3 is less than 5% and insufficient effect as a flux, greater than 20% and with hydrochloric acid is reduced, the heat resistance is deteriorated strain point is lowered.

【0017】MgOは歪点を下げずに高温粘度を下げてガラスの溶融を容易にする成分であり、その含有量は0 [0017] MgO is a component to facilitate melting of the glass by lowering the high temperature viscosity without lowering the strain point, the content thereof is 0
〜10%、好ましくは0〜7%である。 10%, preferably 0 to 7%. MgOが10% MgO 10%
より多いとガラスの耐バッファードフッ酸性が著しく低下する。 Greater the resistance to buffered hydrofluoric acid in the glass is significantly lowered. CaOもMgOと同様の働きをし、その含有量は0〜15%、好ましくは0〜10%である。 CaO also functions similarly to MgO, the content of 0 to 15%, preferably 0 to 10%. CaOが15%より多いとガラスの耐バッファードフッ酸性が著しく低下する。 CaO is often a resistance to buffered hydrofluoric acid in the glass is significantly lowered than 15%. BaOはガラスの耐薬品性を向上させるとともに失透性を改善する成分であり、その含有量は0 BaO is a component that improves the devitrification resistance improves the chemical resistance of the glass, the content thereof is 0
〜30%、好ましくは0〜20%である。 30%, preferably 0 to 20%. BaOが30 BaO is 30
%より多いと歪点が低下して耐熱性が悪くなる。 % More than the strain point is the heat resistance is deteriorated and reduced. SrO SrO
はBaOと同様の効果があり、その含有量は0〜10 There is the same effect as BaO, the content is 0 to 10
%、好ましくは0〜7%である。 %, Preferably 0 to 7%. SrOが10%より多いと失透性が増すため好ましくない。 SrO is not preferable to increase often the devitrification than 10%. ZnOは耐バッファードフッ酸性を改善するとともに失透性を改善する成分であり、その含有量は0〜10%、好ましくは0〜7 ZnO is a component that improves the devitrification resistance as well as improving the resistance to buffered hydrofluoric acid, the content thereof is 0-10%, preferably 0-7
%である。 It is%. ZnOが10%より多いと逆にガラスが失透し易くなり、また歪点が低下して耐熱性が得られなくなる。 ZnO is liable glass devitrification in the opposite is more than 10%, also the heat resistance can not be obtained strain point is lowered. なおMgO、CaO、BaO、SrO及びZnOの合量が5%より少ないと高温粘性が高くなって溶融性が悪化するとともに、ガラスが失透し易くなり、30%より多いと耐熱性及び耐酸性が悪くなり好ましくない。 Note MgO, CaO, BaO, with the total content of SrO and ZnO is less than 5% high-temperature viscosity becomes meltable by deteriorates high, glass is likely to devitrify, more than 30%, the heat resistance and acid resistance It is poor undesirably.

【0018】また上記成分の他に、ZrO 2 、TiO [0018] In addition to the above components, ZrO 2, TiO
2 、Fe 23等を合量で5%まで添加することができる。 The 2, Fe 2 O 3, etc. may be added up to 5% in total.

【0019】次にガラス原料調合物にSnO 2とSb 2 [0019] SnO 2 in the glass raw material preparation was then and Sb 2
3を添加する。 The O 3 is added. SnO 2及びSb 23の添加量は、 Amount of SnO 2 and Sb 2 O 3 content of,
ガラス原料調合物100重量%に対して0.05〜2重量%及び0.05〜3重量%である。 Is 0.05 to 2% by weight and 0.05 to 3% by weight relative to the glass batch formulation to 100 weight%. その理由は、Sb The reason for this is that, Sb
23が0.05%より少ないとガラス化反応時に発生したガスを追い出し難くなり、またSnO 2が0.05 2 O 3 is hard expel gas generated during the vitrification reaction with less than 0.05%, also SnO 2 0.05
%より少ないと均質化溶融時にガラス融液中に残った泡を除去し難くなる。 At% less than the homogenized melt is difficult to remove the bubbles remaining in the glass melt. またSnO 2が2%及びSb 23 The SnO 2 is 2%, and Sb 2 O 3
が3%より多いと揮発量が増えてガラスが変質し易くなるためである。 There is because often the volatile loss than 3% is easily deteriorated glass is increased.

【0020】続いて調合したガラス原料を溶融する。 [0020] followed by melting the glass raw materials was prepared. ガラス原料を加熱していくとまずガラス化反応が起こるが、このときSb 23の価数変化による化学反応によって多量の酸素ガスが発生し、ガラス化反応時に発生したガスが融液中から追い出される。 Although first glass reaction As you heat the glass material occurs, a large amount of oxygen gas is generated by a chemical reaction by the valence change at this time Sb 2 O 3, the gas generated during the vitrification reaction from the melt Get kicked out. さらにより高温の均質化溶融時には、SnO 2の価数変化による化学反応で多量の酸素ガスが発生してガラス融液中に残存する微小な泡が除去される。 During further higher temperature homogenization melting, fine bubbles remaining in the glass melt a large amount of the oxygen gas in a chemical reaction by the valence change of SnO 2 is generated is removed.

【0021】その後、溶融ガラスを所望の形状に成形する。 [0021] Thereafter, forming the molten glass into a desired shape. ディスプレイ用途に使用する場合、フュージョン法、ダウンドロー法、フロート法、ロールアウト法等の方法を用いて薄板状に成形する。 When used in display applications, molded into a thin plate using a fusion method, a down draw method, float method, a method of roll-out method or the like.

【0022】このようにして、重量百分率でSiO 2 [0022] In this way, SiO 2 in a weight percentage
40〜70%、Al 23 6〜25%、B 23 40~70%, Al 2 O 3 6~25 %, B 2 O 3 5
〜20%、MgO 0〜10%、CaO 0〜15%、 ~20%, 0~10% MgO, CaO 0~15%,
BaO 0〜30%、SrO 0〜10%、ZnO 0 BaO 0~30%, SrO 0~10%, ZnO 0
〜10%、SnO 2 0.05〜2%、Sb 23 ~10%, SnO 2 0.05~2%, Sb 2 O 3
0.05〜3%の組成を有し、本質的にアルカリ金属酸化物を含有しない本発明の無アルカリガラスを得ることができる。 It has a composition 0.05 to 3% essentially can be obtained alkali-free glass of the present invention containing no alkali metal oxide.

【0023】 [0023]

【実施例】以下、実施例に基づいて本発明を説明する。 EXAMPLES Hereinafter, the present invention will be described based on examples.

【0024】(実施例1)表1は、SnO 2とSb 2 [0024] (Example 1) Table 1, SnO 2 and Sb 2 O
3の効果を示したものであり、試料aはAs 23を清澄剤として添加した従来の無アルカリガラス、試料bは試料aからAs 23を除いて作製した無アルカリガラス、試料cはSnO 2のみを添加した無アルカリガラス、試料dはSb 23のみを添加した無アルカリガラス、試料eはSnO 2とSb 23を併用した本発明の無アルカリガラスを示している。 And shows a third effect, sample a is As 2 O 3 conventional alkali-free glass was added as a refining agent, the sample b is non-alkali glass was prepared except As 2 O 3 from the sample a, sample c the alkali-free glass doped with only SnO 2, sample d is alkali-free glass doped only Sb 2 O 3, sample e represents an alkali-free glass of the present invention in combination with SnO 2 and Sb 2 O 3.

【0025】 [0025]

【表1】 [Table 1]

【0026】各試料は次のようにして調製した。 [0026] Each sample was prepared in the following manner.

【0027】表の組成を有するようにガラス原料を調合し、電気炉にて溶融した。 [0027] The glass material formulated to have a composition of Table were melted in an electric furnace. このとき、ガラス化反応時の清澄性を評価するために1500℃で1時間溶融したものと、均質化溶融時の清澄性を評価するために1550 At this time, in order to evaluate as those 1 hour melted at 1500 ° C. in order to evaluate the clarity during vitrification reaction, the clarity during homogenization melting 1550
℃で1時間溶融したものの2種類を用意した。 We were prepared two kinds of those melted 1 hour at ° C.. 次いで、 Then,
溶融ガラスをカーボン台上に流しだし、徐冷した後、ガラス中に残存している泡の個数を計数し、ガラス100 Out flowing molten glass on a carbon base, after gradual cooling, and counts the number of bubbles remaining in the glass, the glass 100
g中の泡が1000個を越えるものを×、101〜10 × what bubbles in the g is more than 1000, 101-10
00個のものを△、100個以下のものを○で評価した。 00 pieces of things △, was evaluated by ○ those of 100 or less. 結果を表1に示す。 The results are shown in Table 1.

【0028】表1から明らかなように、SnO 2とSb [0028] As is evident from Table 1, SnO 2 and Sb
23を添加しない試料bのガラスは清澄性が著しく悪かった。 Glass samples b without added 2 O 3 is clarity was significantly poor. SnO 2のみを添加した試料cのガラスはガラス化反応時の清澄性が良くなかった。 Glass samples c with the addition of only SnO 2 was not good clarity during vitrification reaction. Sb 23のみを添加した試料dのガラスはガラス化反応時及び均質化溶融時の清澄性が良くなかった。 Glass samples d that adding only a Sb 2 O 3 content was not good clarity upon time and homogenizing the molten glass reaction. 一方、SnO 2とSb 2 On the other hand, SnO 2 and Sb 2
3の両方を添加した試料eのガラスは、As 23を添加した試料aのガラスと同様、ガラス化反応時及び均質化溶融時の何れにおいても清澄性が良好であった。 Glass samples e both added was the O 3 is similar to the glass of the sample a obtained by adding As 2 O 3, was good clarity in either the time during vitrification reaction and homogenizing the melt.

【0029】(実施例2)表2は、本発明の方法により得られる無アルカリガラスの実施例(試料No.1〜 [0029] (Example 2) Table 2, an embodiment of an alkali-free glass obtained by the process of the present invention (Sample No.1~
6)を示している。 Shows a 6).

【0030】 [0030]

【表2】 [Table 2]

【0031】各試料は次のようにして調製した。 [0031] Each sample was prepared in the following manner.

【0032】表の組成を有するガラスとなるようにガラス原料を調合し、実施例1と同様にして清澄性を評価した。 The glass raw materials were blended so that the glass having a composition of table was evaluated clarity in the same manner as in Example 1. またこれらのガラス原料調合物を電気炉にて155 Also these glass raw materials preparation in an electric furnace 155
0〜〜1600℃で16〜24時間溶融し、成型して試料を得た。 Melted 16-24 hours at 0 ° C., was molded to obtain a sample.

【0033】このようにして得られた各試料について、 [0033] For each sample obtained in this way,
耐熱性及び耐薬品性を評価した。 And evaluate the heat resistance and chemical resistance. 結果を表2に示す。 The results are shown in Table 2.

【0034】表2から明らかなように、各試料とも清澄性に優れ、しかも耐熱性、耐薬品性の特性についても良好であった。 As it is apparent from Table 2, in each sample excellent clarity, yet the heat resistance was also good characteristics of chemical resistance.

【0035】なお耐熱性は、歪点をASTM C336 It should be noted heat resistance, the strain point ASTM C336
−71の方法に基づいて測定した。 It was measured based on the -71 of the way. 耐薬品性は、耐塩酸性について各試料を80℃に保持された10重量%塩酸水溶液に24時間浸漬した後、ガラス基板の表面状態を観察することによって評価し、ガラス基板表面の変色したものを×、全く変色のないものを○で示した。 Chemical resistance after immersion for 24 hours in 10 weight percent hydrochloric acid solution held Each sample 80 ° C. for hydrochloric acid, and evaluated by observing the surface state of the glass substrate, a material obtained by discoloration of the glass substrate surface ×, shown by ○ having no discoloration at all. また耐バッファードフッ酸性は、各試料を20℃に保持された38.7重量%フッ化アンモニウムと1.6重量%フッ酸からなるバッファードフッ酸に30分間浸漬した後、 The resistance to buffered hydrofluoric acid, after immersion for 30 minutes in buffered hydrofluoric acid composed of each sample from 38.7 wt% ammonium fluoride and 1.6 wt% hydrofluoric acid which is held in 20 ° C.,
ガラス基板の表面状態を観察することによって評価し、 Evaluated by observing the surface state of the glass substrate,
ガラス基板表面が白濁したものを×、全く変化しなかったものを○で示した。 × those glass substrate surface became cloudy, indicated by ○ what was completely changed.

【0036】 [0036]

【発明の効果】以上説明したように、本発明の方法によれば、清澄剤としてSnO 2とSb 23を併用するために清澄性に優れ、表示欠陥となる泡が存在しない無アルカリガラスを製造することが可能である。 As described in the foregoing, according to the method of the present invention, excellent clarity for a combination of SnO 2 and Sb 2 O 3 as a fining agent, an alkali-free glass having no bubble to be display defects it is possible to produce.

【0037】また、本発明の無アルカリガラスは、表示欠陥となる泡がなく、かつ優れた耐熱性、耐薬品性を有しており、特にディスプレイ用透明ガラス基板として好適である。 Further, the alkali-free glass of the present invention, no bubbles become display defects, and excellent heat resistance, has a chemical resistance, is suitable especially as a transparent glass substrate for displays.

Claims (2)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】 重量百分率でSiO 2 40〜70%、 1. A SiO 2 40 to 70% in weight percent,
    Al 23 6〜25%、B 23 5〜20%、Mg Al 2 O 3 6~25%, B 2 O 3 5~20%, Mg
    O 0〜10%、CaO 0〜15%、BaO 0〜3 O 0~10%, CaO 0~15%, BaO 0~3
    0%、SrO 0〜10%、ZnO 0〜10%、Sn 0%, SrO 0~10%, 0~10% ZnO, Sn
    2 0.05〜2%、Sb 23 0.05〜3%の組成を有し、本質的にアルカリ金属酸化物を含有しないことを特徴とする無アルカリガラス。 O 2 0.05 to 2%, has a composition of Sb 2 O 3 0.05~3%, essentially alkali-free glass, characterized in that does not contain an alkali metal oxide.
  2. 【請求項2】 重量百分率でSiO 2 40〜70%、 Wherein SiO 2 40 to 70% in weight percent,
    Al 23 6〜25%、B 23 5〜20%、Mg Al 2 O 3 6~25%, B 2 O 3 5~20%, Mg
    O 0〜10%、CaO 0〜15%、BaO 0〜3 O 0~10%, CaO 0~15%, BaO 0~3
    0%、SrO 0〜10%、ZnO 0〜10%の組成を有し、本質的にアルカリ金属酸化物を含有しないガラスとなるように調合したガラス原料調合物を溶融した後、成形する無アルカリガラスの製造方法において、ガラス原料調合物に清澄剤としてSnO 2を0.05〜2 0%, SrO 0%, has a composition of 0% ZnO, essentially after melting the glass raw material formulation which is prepared to have a glass containing no alkali metal oxide, alkali-free shaping the method of manufacturing a glass, a SnO 2 in the glass raw material formulation as a refining agent 0.05-2
    重量%及びSb 23を0.05〜3重量%添加することを特徴とする無アルカリガラスの製造方法。 Method for producing an alkali-free glass, which comprises adding weight% and Sb 2 O 3 0.05 to 3 wt%.
JP11646497A 1996-08-21 1997-04-18 Alkali-free glass and a manufacturing method thereof Expired - Fee Related JP3861271B2 (en)

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US08911945 US6508083B1 (en) 1996-08-21 1997-08-20 Alkali-free glass and method for producing the same
KR19970039767A KR100406021B1 (en) 1996-08-21 1997-08-21 Alkali-free glass and method for producing the same
US09907288 US6546753B2 (en) 1996-08-21 2001-07-17 Method of producing an alkali-free glass
US10298811 US6933253B2 (en) 1996-08-21 2002-11-18 Alkali-free glass and method for producing the same
KR20030042403A KR100424420B1 (en) 1996-08-21 2003-06-27 Alkali-free glass and method for producing the same

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EP1044932A1 (en) * 1999-04-12 2000-10-18 CARL-ZEISS-STIFTUNG trading as SCHOTT GLAS Alkali-free aluminoborosilicate glass and its use
DE19939789A1 (en) * 1999-08-21 2001-02-22 Schott Glas Alkali-free aluminoborosilicate and their uses
DE10000839C1 (en) * 2000-01-12 2001-05-10 Schott Glas Alkali-free aluminoborosilicate glass used as substrate glass in displays and in thin layer photovoltaics contains oxides of silicon, boron, aluminum, magnesium, calcium, strontium, barium and zinc
DE10000837C1 (en) * 2000-01-12 2001-05-31 Schott Glas Alkali-free alumino-borosilicate glass used as substrate glass in thin film transistor displays and thin layer solar cells contains oxides of silicon, boron, aluminum, magnesium, strontium, and barium
DE10000836A1 (en) * 2000-01-12 2001-07-26 Schott Glas Alkali-free aluminoborosilicate and its uses
DE10034985C1 (en) * 2000-07-19 2001-09-06 Schott Glas Production of an alkali-free aluminosilicate glass used as a substrate glass for displays comprises adding tin oxide as refining agent to the starting materials, melting the glass and hot molding the glass
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US6852658B2 (en) 2000-01-12 2005-02-08 Schott Glas Flat panel liquid-crystal display, such as for a laptop computer
US7833919B2 (en) 2006-02-10 2010-11-16 Corning Incorporated Glass compositions having high thermal and chemical stability and methods of making thereof
US8007913B2 (en) 2006-02-10 2011-08-30 Corning Incorporated Laminated glass articles and methods of making thereof
US8156763B2 (en) 2005-11-15 2012-04-17 Avanstrate, Inc. Method of producing glass
US8713967B2 (en) 2008-11-21 2014-05-06 Corning Incorporated Stable glass sheet and method for making same
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JP2016525058A (en) * 2013-07-16 2016-08-22 コーニング インコーポレイテッド Alkali-free aluminosilicate glasses suitable as induction cooking top plate substrate

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US8007913B2 (en) 2006-02-10 2011-08-30 Corning Incorporated Laminated glass articles and methods of making thereof
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