JPH10114538A - Alkali-free glass and its production - Google Patents

Alkali-free glass and its production

Info

Publication number
JPH10114538A
JPH10114538A JP9116464A JP11646497A JPH10114538A JP H10114538 A JPH10114538 A JP H10114538A JP 9116464 A JP9116464 A JP 9116464A JP 11646497 A JP11646497 A JP 11646497A JP H10114538 A JPH10114538 A JP H10114538A
Authority
JP
Japan
Prior art keywords
glass
alkali
free glass
sample
free
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9116464A
Other languages
Japanese (ja)
Other versions
JP3861271B2 (en
Inventor
Atsushi Naka
淳 中
Shigeru Yamamoto
山本  茂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Electric Glass Co Ltd
Original Assignee
Nippon Electric Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Glass Co Ltd filed Critical Nippon Electric Glass Co Ltd
Priority to JP11646497A priority Critical patent/JP3861271B2/en
Priority to US08/911,945 priority patent/US6508083B1/en
Priority to KR1019970039767A priority patent/KR100406021B1/en
Publication of JPH10114538A publication Critical patent/JPH10114538A/en
Priority to US09/907,288 priority patent/US6546753B2/en
Priority to US10/298,811 priority patent/US6933253B2/en
Priority to KR1020030042403A priority patent/KR100424420B1/en
Application granted granted Critical
Publication of JP3861271B2 publication Critical patent/JP3861271B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Liquid Crystal (AREA)
  • Glass Compositions (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an alkali-free glass in which bubbles causing display defects do not exist without using As2 O3 as a refining agent. SOLUTION: This alkali-free glass has a compsn. consisting of, by weight, 40-70% SiO2 , 6-25% Al2 O3 , 5-20% B2 O3 , 0-10% MgO, 0-15% CaO, 0-30% BaO, 0-10% SrO, 0-10% ZnO, 0.05-2% SnO2 and 0.05-3% Sb2 O3 and does not practically contain an alkali metal oxide.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、無アルカリガラス、特
にディスプレイ等の透明ガラス基板として使用される無
アルカリガラスとその製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an alkali-free glass, particularly to an alkali-free glass used as a transparent glass substrate for a display or the like, and a method for producing the same.

【0002】[0002]

【従来の技術】従来、液晶ディスプレイ等の透明ガラス
基板として、無アルカリガラスが使用されている。ディ
スプレイ用途に用いられる無アルカリガラスには、耐熱
性、耐薬品性等の特性の他に、表示欠陥となる泡のない
ことが要求される。
2. Description of the Related Art Conventionally, non-alkali glass has been used as a transparent glass substrate for a liquid crystal display or the like. Alkali-free glass used for display applications is required to be free from bubbles that cause display defects, in addition to properties such as heat resistance and chemical resistance.

【0003】このような無アルカリガラスとして、従来
より種々のガラスが提案されており、本出願人も特開昭
63−74935号においてSiO2 −Al23 −B
2 3 −CaO−BaO系の無アルカリガラスを提案し
ている。
[0003] As such an alkali-free glass,
More various glasses have been proposed, and the present applicant has
No. 63-74935, SiOTwo -AlTwo OThree -B
Two O Three -Propose alkali-free glass based on CaO-BaO
ing.

【0004】[0004]

【発明が解決しようとする課題】泡のないガラスを得る
ためには、ガラス化反応時から均質化溶融時にかけての
温度域で清澄ガスを発生する清澄剤を使用することが重
要である。つまりガラスの清澄は、ガラス化反応時に発
生するガスを清澄ガスによってガラス融液中から追い出
し、さらに均質化溶融時に残った微小な泡を再び発生さ
せた清澄ガスによって泡径を大きくして浮上させて除去
する。
In order to obtain a bubble-free glass, it is important to use a fining agent that generates a fining gas in the temperature range from the vitrification reaction to the homogenization and melting. In other words, the fining of the glass drives out the gas generated during the vitrification reaction from the glass melt by the fining gas, and further increases the diameter of the bubbles by the fining gas that regenerated the fine bubbles remaining during homogenization and melting, and floats the glass. To remove.

【0005】ところで液晶ディスプレイ用ガラス基板に
使用されるような無アルカリガラスでは、ガラス融液の
粘度が高く、アルカリ成分を含有するガラスに比べて溶
融がより高温で行われる。このため、清澄剤には幅広い
温度域(1200〜1600℃程度)で清澄ガスを発生
することができるAs23 が広く使用されている。
By the way, in alkali-free glass used for a glass substrate for a liquid crystal display, the viscosity of a glass melt is high, and melting is performed at a higher temperature than glass containing an alkali component. For this reason, As 2 O 3 that can generate a fining gas in a wide temperature range (about 1200 to 1600 ° C.) is widely used as a fining agent.

【0006】しかしながらAs23 は毒性が非常に強
く、ガラスの製造工程や廃ガラスの処理時等に環境を汚
染する可能性があり、その使用が制限されつつある。
However, As 2 O 3 is very toxic, and may pollute the environment during the glass manufacturing process or the treatment of waste glass, and its use is being restricted.

【0007】本発明の目的は、清澄剤としてAs23
を使用せず、しかも表示欠陥となる泡が存在しない無ア
ルカリガラスとその製造方法を提供することである。
An object of the present invention is to provide As 2 O 3 as a fining agent.
It is an object of the present invention to provide a non-alkali glass and a method for producing the same, which do not use any of them, and which do not have bubbles serving as display defects.

【0008】[0008]

【課題を解決するための手段】本出願人は、種々の実験
を行った結果、清澄剤としてAs23 の代わりにSn
2 とSb23 を併用することによって上記目的が達
成できることを見いだし、本発明として提案するもので
ある。
The present applicant has conducted various experiments and found that Sn was used as a fining agent instead of As 2 O 3.
The inventors have found that the above object can be achieved by using O 2 and Sb 2 O 3 together, and propose the present invention.

【0009】即ち、本発明の無アルカリガラスは、重量
百分率でSiO2 40〜70%、Al23 6〜2
5%、B23 5〜20%、MgO 0〜10%、C
aO0〜15%、BaO 0〜30%、SrO 0〜1
0%、ZnO 0〜10%、SnO2 0.05〜2
%、Sb23 0.05〜3%の組成を有し、本質的
にアルカリ金属酸化物を含有しないことを特徴とする。
That is, the alkali-free glass of the present invention comprises 40 to 70% of SiO 2 and 6 to 2 of Al 2 O 3 by weight percentage.
5%, B 2 O 3 5~20 %, 0~10% MgO, C
aO 0 to 15%, BaO 0 to 30%, SrO 0 to 1
0%, ZnO 0-10%, SnO 2 0.05-2
%, Has a composition of Sb 2 O 3 0.05 to 3%, essentially characterized in that it does not contain alkali metal oxides.

【0010】また本発明の無アルカリガラスの製造方法
は、重量百分率でSiO2 40〜70%、Al23
6〜25%、B23 5〜20%、MgO 0〜1
0%、CaO 0〜15%、BaO 0〜30%、Sr
O 0〜10%、ZnO 0〜10%の組成を有し、本
質的にアルカリ金属酸化物を含有しないガラスとなるよ
うに調合したガラス原料調合物を溶融した後、成形する
無アルカリガラスの製造方法において、ガラス原料調合
物に清澄剤としてSnO2 を0.05〜2重量%及びS
23 を0.05〜3重量%添加することを特徴とす
る。
[0010] manufacturing method of alkali-free glass of the present invention, SiO 2 40 to 70% by weight percentage, Al 2 O 3
6~25%, B 2 O 3 5~20 %, MgO 0~1
0%, CaO 0-15%, BaO 0-30%, Sr
Production of alkali-free glass which has a composition of 0 to 10% of O and 0 to 10% of ZnO and which is formed by melting a glass raw material mixture prepared so as to be essentially free of an alkali metal oxide and then molding. In the method, 0.05 to 2 % by weight of SnO2 as a fining agent and S
The b 2 O 3, characterized in that the addition of 0.05 to 3 wt%.

【0011】[0011]

【作用】本発明において使用するSnO2 とSb23
は、1200℃以上の温度域でSnイオンとSbイオン
の価数変化による化学反応により多量の酸素ガスを発生
する。特にSnO2 は1400℃以上で、Sb23
1200〜1300℃付近で酸素ガスを多量に発生す
る。従って清澄剤としてSnO2 とSb23 を併用す
ることにより、比較的低温で起こるガラス化反応時から
高温の均質化溶融時にかけての広い温度域で高い清澄効
果が得られるため、表示欠陥となる泡が存在しない無ア
ルカリガラスを得ることができる。
The SnO 2 and Sb 2 O 3 used in the present invention
Generates a large amount of oxygen gas by a chemical reaction due to a change in the valence of Sn ions and Sb ions in a temperature range of 1200 ° C. or higher. In particular, SnO 2 generates a large amount of oxygen gas at 1400 ° C. or higher, and Sb 2 O 3 generates a large amount of oxygen gas at around 1200 to 1300 ° C. Therefore, by using SnO 2 and Sb 2 O 3 together as a fining agent, a high fining effect can be obtained in a wide temperature range from the time of vitrification reaction occurring at a relatively low temperature to the time of homogenization melting at a high temperature. An alkali-free glass free from bubbles can be obtained.

【0012】次に、本発明の無アルカリガラスの製造方
法を述べる。
Next, a method for producing an alkali-free glass of the present invention will be described.

【0013】まず、所望の組成を有するガラスとなるよ
うにガラス原料調合物を用意する。ガラスの組成範囲及
びその限定理由を以下に述べる。
First, a glass raw material mixture is prepared so as to obtain a glass having a desired composition. The composition range of the glass and the reason for the limitation are described below.

【0014】SiO2 はガラスのネットワークとなる成
分であり、その含有量は40〜70%、好ましくは45
〜65%である。SiO2 が40%より少ないと耐薬品
性が悪化するとともに、歪点が低くなって耐熱性が悪く
なり、70%より多いと高温粘度が大きくなって溶融性
が悪くなるとともに、クリストバライトの失透物が析出
し易くなる。
[0014] SiO 2 is a component that forms a glass network, and its content is 40 to 70%, preferably 45 to 70%.
~ 65%. When the content of SiO 2 is less than 40%, the chemical resistance is deteriorated, and the strain point is lowered, whereby the heat resistance is deteriorated. When the content is more than 70%, the high-temperature viscosity is increased, the melting property is deteriorated, and the cristobalite is devitrified. It becomes easier for substances to precipitate.

【0015】Al23 はガラスの耐熱性、耐失透性を
高める成分であり、その含有量は6〜25%、好ましく
は10〜20%である。Al23 が6%より少ないと
失透温度が著しく上昇してガラス中に失透が生じ易くな
り、25%より多いと耐酸性、特に耐バッファードフッ
酸性が低下してガラス基板表面に白濁が生じ易くなる。
Al 2 O 3 is a component for improving the heat resistance and devitrification resistance of the glass, and its content is 6 to 25%, preferably 10 to 20%. If Al 2 O 3 is less than 6%, the devitrification temperature rises remarkably and devitrification tends to occur in the glass. If it is more than 25%, the acid resistance, especially the buffered hydrofluoric acid resistance, decreases and the glass substrate surface is deteriorated. Cloudiness is likely to occur.

【0016】B23 は融剤として働き、粘性を下げて
溶融を容易にする成分であり、その含有量は5〜20
%、好ましくは6〜15%である。B23 が5%より
少ないと融剤としての効果が不十分となり、20%より
多いと耐塩酸性が低下するとともに、歪点が低下して耐
熱性が悪化する。
B 2 O 3 is a component that acts as a flux, lowers the viscosity and facilitates melting, and has a content of 5 to 20%.
%, Preferably 6 to 15%. If the content of B 2 O 3 is less than 5%, the effect as a flux will be insufficient, and if it is more than 20%, the hydrochloric acid resistance will be reduced, and the strain point will be lowered, thus deteriorating heat resistance.

【0017】MgOは歪点を下げずに高温粘度を下げて
ガラスの溶融を容易にする成分であり、その含有量は0
〜10%、好ましくは0〜7%である。MgOが10%
より多いとガラスの耐バッファードフッ酸性が著しく低
下する。CaOもMgOと同様の働きをし、その含有量
は0〜15%、好ましくは0〜10%である。CaOが
15%より多いとガラスの耐バッファードフッ酸性が著
しく低下する。BaOはガラスの耐薬品性を向上させる
とともに失透性を改善する成分であり、その含有量は0
〜30%、好ましくは0〜20%である。BaOが30
%より多いと歪点が低下して耐熱性が悪くなる。SrO
はBaOと同様の効果があり、その含有量は0〜10
%、好ましくは0〜7%である。SrOが10%より多
いと失透性が増すため好ましくない。ZnOは耐バッフ
ァードフッ酸性を改善するとともに失透性を改善する成
分であり、その含有量は0〜10%、好ましくは0〜7
%である。ZnOが10%より多いと逆にガラスが失透
し易くなり、また歪点が低下して耐熱性が得られなくな
る。なおMgO、CaO、BaO、SrO及びZnOの
合量が5%より少ないと高温粘性が高くなって溶融性が
悪化するとともに、ガラスが失透し易くなり、30%よ
り多いと耐熱性及び耐酸性が悪くなり好ましくない。
MgO is a component that lowers the viscosity at high temperature without lowering the strain point and facilitates melting of the glass.
-10%, preferably 0-7%. MgO is 10%
If the amount is larger, the buffered hydrofluoric acid resistance of the glass is remarkably reduced. CaO also functions similarly to MgO, and its content is 0 to 15%, preferably 0 to 10%. When the content of CaO is more than 15%, the buffered hydrofluoric acid resistance of the glass is significantly reduced. BaO is a component that improves the chemical resistance of the glass and also improves the devitrification property.
-30%, preferably 0-20%. BaO is 30
%, The strain point is lowered and the heat resistance is deteriorated. SrO
Has the same effect as BaO, and its content is from 0 to 10
%, Preferably 0 to 7%. If the content of SrO is more than 10%, the devitrification will increase, which is not preferable. ZnO is a component that improves buffered hydrofluoric acid resistance and also improves devitrification, and its content is 0 to 10%, preferably 0 to 7%.
%. On the other hand, if the content of ZnO is more than 10%, the glass is liable to be devitrified, and the strain point is lowered, so that heat resistance cannot be obtained. If the total amount of MgO, CaO, BaO, SrO, and ZnO is less than 5%, the high-temperature viscosity becomes high and the melting property deteriorates, and the glass is easily devitrified. Becomes worse, which is not preferable.

【0018】また上記成分の他に、ZrO2 、TiO
2 、Fe23 等を合量で5%まで添加することができ
る。
In addition to the above components, ZrO 2 , TiO
2 , Fe 2 O 3 and the like can be added up to 5% in total.

【0019】次にガラス原料調合物にSnO2 とSb2
3 を添加する。SnO2 及びSb23 の添加量は、
ガラス原料調合物100重量%に対して0.05〜2重
量%及び0.05〜3重量%である。その理由は、Sb
23 が0.05%より少ないとガラス化反応時に発生
したガスを追い出し難くなり、またSnO2 が0.05
%より少ないと均質化溶融時にガラス融液中に残った泡
を除去し難くなる。またSnO2 が2%及びSb23
が3%より多いと揮発量が増えてガラスが変質し易くな
るためである。
Next, SnO 2 and Sb 2 were added to the glass raw material mixture.
The O 3 is added. The addition amounts of SnO 2 and Sb 2 O 3 are as follows:
It is 0.05 to 2% by weight and 0.05 to 3% by weight based on 100% by weight of the glass raw material preparation. The reason is Sb
2 O 3 is hard expel gas generated during the vitrification reaction with less than 0.05%, also SnO 2 0.05
%, It is difficult to remove bubbles remaining in the glass melt during homogenization and melting. Also, 2% of SnO 2 and Sb 2 O 3
If it exceeds 3%, the amount of volatilization increases and the glass is liable to deteriorate.

【0020】続いて調合したガラス原料を溶融する。ガ
ラス原料を加熱していくとまずガラス化反応が起こる
が、このときSb23 の価数変化による化学反応によ
って多量の酸素ガスが発生し、ガラス化反応時に発生し
たガスが融液中から追い出される。さらにより高温の均
質化溶融時には、SnO2 の価数変化による化学反応で
多量の酸素ガスが発生してガラス融液中に残存する微小
な泡が除去される。
Subsequently, the prepared glass raw material is melted. When the glass raw material is heated, a vitrification reaction occurs first. At this time, a large amount of oxygen gas is generated by a chemical reaction due to a change in the valence of Sb 2 O 3 , and the gas generated during the vitrification reaction is removed from the melt. Get kicked out. Further, at the time of homogenization melting at a higher temperature, a large amount of oxygen gas is generated by a chemical reaction due to a change in the valence of SnO 2 , and fine bubbles remaining in the glass melt are removed.

【0021】その後、溶融ガラスを所望の形状に成形す
る。ディスプレイ用途に使用する場合、フュージョン
法、ダウンドロー法、フロート法、ロールアウト法等の
方法を用いて薄板状に成形する。
Thereafter, the molten glass is formed into a desired shape. When used for display applications, it is formed into a thin plate using a method such as a fusion method, a downdraw method, a float method, or a rollout method.

【0022】このようにして、重量百分率でSiO2
40〜70%、Al23 6〜25%、B23
〜20%、MgO 0〜10%、CaO 0〜15%、
BaO 0〜30%、SrO 0〜10%、ZnO 0
〜10%、SnO2 0.05〜2%、Sb23
0.05〜3%の組成を有し、本質的にアルカリ金属酸
化物を含有しない本発明の無アルカリガラスを得ること
ができる。
Thus, the weight percentage of SiO 2
40~70%, Al 2 O 3 6~25 %, B 2 O 3 5
-20%, MgO 0-10%, CaO 0-15%,
BaO 0-30%, SrO 0-10%, ZnO 0
-10%, SnO 2 0.05-2%, Sb 2 O 3
The alkali-free glass of the present invention having a composition of 0.05 to 3% and containing essentially no alkali metal oxide can be obtained.

【0023】[0023]

【実施例】以下、実施例に基づいて本発明を説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below based on embodiments.

【0024】(実施例1)表1は、SnO2 とSb2
3 の効果を示したものであり、試料aはAs23 を清
澄剤として添加した従来の無アルカリガラス、試料bは
試料aからAs23 を除いて作製した無アルカリガラ
ス、試料cはSnO2 のみを添加した無アルカリガラ
ス、試料dはSb23 のみを添加した無アルカリガラ
ス、試料eはSnO2 とSb23 を併用した本発明の
無アルカリガラスを示している。
Example 1 Table 1 shows that SnO 2 and Sb 2 O
And shows a third effect, sample a is As 2 O 3 conventional alkali-free glass was added as a refining agent, the sample b is non-alkali glass was prepared except As 2 O 3 from the sample a, sample c Is an alkali-free glass to which only SnO 2 is added, sample d is an alkali-free glass to which only Sb 2 O 3 is added, and sample e is an alkali-free glass of the present invention in which both SnO 2 and Sb 2 O 3 are used.

【0025】[0025]

【表1】 [Table 1]

【0026】各試料は次のようにして調製した。Each sample was prepared as follows.

【0027】表の組成を有するようにガラス原料を調合
し、電気炉にて溶融した。このとき、ガラス化反応時の
清澄性を評価するために1500℃で1時間溶融したも
のと、均質化溶融時の清澄性を評価するために1550
℃で1時間溶融したものの2種類を用意した。次いで、
溶融ガラスをカーボン台上に流しだし、徐冷した後、ガ
ラス中に残存している泡の個数を計数し、ガラス100
g中の泡が1000個を越えるものを×、101〜10
00個のものを△、100個以下のものを○で評価し
た。結果を表1に示す。
Glass raw materials were prepared to have the compositions shown in the table, and were melted in an electric furnace. At this time, one melted at 1500 ° C. for 1 hour to evaluate clarity during the vitrification reaction, and 1550 to evaluate clarity during homogenization and melting.
Two types were prepared which were melted at 1 ° C. for 1 hour. Then
After the molten glass was poured on a carbon table and cooled slowly, the number of bubbles remaining in the glass was counted, and the glass 100
g when the number of bubbles in g exceeds 1,000, x: 101 to 10
00 samples were evaluated as Δ, and 100 or less were evaluated as ○. Table 1 shows the results.

【0028】表1から明らかなように、SnO2 とSb
23 を添加しない試料bのガラスは清澄性が著しく悪
かった。SnO2 のみを添加した試料cのガラスはガラ
ス化反応時の清澄性が良くなかった。Sb23 のみを
添加した試料dのガラスはガラス化反応時及び均質化溶
融時の清澄性が良くなかった。一方、SnO2 とSb2
3 の両方を添加した試料eのガラスは、As23
添加した試料aのガラスと同様、ガラス化反応時及び均
質化溶融時の何れにおいても清澄性が良好であった。
As is clear from Table 1, SnO 2 and Sb
The glass of sample b to which 2 O 3 was not added had extremely poor clarity. The glass of Sample c to which only SnO 2 was added had poor clarity during the vitrification reaction. The glass of Sample d to which only Sb 2 O 3 was added had poor clarity during the vitrification reaction and during homogenization and melting. On the other hand, SnO 2 and Sb 2
Glass samples e both added was the O 3 is similar to the glass of the sample a obtained by adding As 2 O 3, was good clarity in either the time during vitrification reaction and homogenizing the melt.

【0029】(実施例2)表2は、本発明の方法により
得られる無アルカリガラスの実施例(試料No.1〜
6)を示している。
Example 2 Table 2 shows examples of alkali-free glass obtained by the method of the present invention (sample Nos. 1 to 5).
6).

【0030】[0030]

【表2】 [Table 2]

【0031】各試料は次のようにして調製した。Each sample was prepared as follows.

【0032】表の組成を有するガラスとなるようにガラ
ス原料を調合し、実施例1と同様にして清澄性を評価し
た。またこれらのガラス原料調合物を電気炉にて155
0〜〜1600℃で16〜24時間溶融し、成型して試
料を得た。
Glass raw materials were prepared so as to obtain a glass having the composition shown in the table, and the clarity was evaluated in the same manner as in Example 1. In addition, these glass raw material preparations were placed in an electric furnace for 155 hours.
The sample was melted at 0 to 1600 ° C. for 16 to 24 hours and molded to obtain a sample.

【0033】このようにして得られた各試料について、
耐熱性及び耐薬品性を評価した。結果を表2に示す。
For each sample thus obtained,
Heat resistance and chemical resistance were evaluated. Table 2 shows the results.

【0034】表2から明らかなように、各試料とも清澄
性に優れ、しかも耐熱性、耐薬品性の特性についても良
好であった。
As is clear from Table 2, each sample was excellent in clarity, and also excellent in heat resistance and chemical resistance.

【0035】なお耐熱性は、歪点をASTM C336
−71の方法に基づいて測定した。耐薬品性は、耐塩酸
性について各試料を80℃に保持された10重量%塩酸
水溶液に24時間浸漬した後、ガラス基板の表面状態を
観察することによって評価し、ガラス基板表面の変色し
たものを×、全く変色のないものを○で示した。また耐
バッファードフッ酸性は、各試料を20℃に保持された
38.7重量%フッ化アンモニウムと1.6重量%フッ
酸からなるバッファードフッ酸に30分間浸漬した後、
ガラス基板の表面状態を観察することによって評価し、
ガラス基板表面が白濁したものを×、全く変化しなかっ
たものを○で示した。
The heat resistance was determined by setting the strain point to ASTM C336.
It measured based on the method of -71. Chemical resistance was evaluated by observing the surface condition of the glass substrate after immersing each sample in a 10% by weight aqueous hydrochloric acid solution maintained at 80 ° C. for 24 hours. X, those without any discoloration were indicated by o. The buffered hydrofluoric acid resistance was determined by immersing each sample in buffered hydrofluoric acid composed of 38.7% by weight ammonium fluoride and 1.6% by weight hydrofluoric acid kept at 20 ° C. for 30 minutes.
Evaluated by observing the surface condition of the glass substrate,
When the surface of the glass substrate became cloudy, the result was x, and when the surface did not change, the result was o.

【0036】[0036]

【発明の効果】以上説明したように、本発明の方法によ
れば、清澄剤としてSnO2 とSb23 を併用するた
めに清澄性に優れ、表示欠陥となる泡が存在しない無ア
ルカリガラスを製造することが可能である。
As described above, according to the method of the present invention, since SnO 2 and Sb 2 O 3 are used in combination as fining agents, the fining properties are excellent, and the alkali-free glass free of bubbles that cause display defects does not exist. Can be manufactured.

【0037】また、本発明の無アルカリガラスは、表示
欠陥となる泡がなく、かつ優れた耐熱性、耐薬品性を有
しており、特にディスプレイ用透明ガラス基板として好
適である。
Further, the alkali-free glass of the present invention has no bubbles as display defects and has excellent heat resistance and chemical resistance, and is particularly suitable as a transparent glass substrate for a display.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 重量百分率でSiO2 40〜70%、
Al23 6〜25%、B23 5〜20%、Mg
O 0〜10%、CaO 0〜15%、BaO 0〜3
0%、SrO 0〜10%、ZnO 0〜10%、Sn
2 0.05〜2%、Sb23 0.05〜3%の
組成を有し、本質的にアルカリ金属酸化物を含有しない
ことを特徴とする無アルカリガラス。
1. 40% to 70% by weight of SiO 2 ,
Al 2 O 3 6~25%, B 2 O 3 5~20%, Mg
O 0-10%, CaO 0-15%, BaO 0-3
0%, SrO 0-10%, ZnO 0-10%, Sn
O 2 0.05 to 2%, has a composition of Sb 2 O 3 0.05~3%, essentially alkali-free glass, characterized in that does not contain an alkali metal oxide.
【請求項2】 重量百分率でSiO2 40〜70%、
Al23 6〜25%、B23 5〜20%、Mg
O 0〜10%、CaO 0〜15%、BaO 0〜3
0%、SrO 0〜10%、ZnO 0〜10%の組成
を有し、本質的にアルカリ金属酸化物を含有しないガラ
スとなるように調合したガラス原料調合物を溶融した
後、成形する無アルカリガラスの製造方法において、ガ
ラス原料調合物に清澄剤としてSnO2 を0.05〜2
重量%及びSb23 を0.05〜3重量%添加するこ
とを特徴とする無アルカリガラスの製造方法。
2. SiO 2 40 to 70% by weight,
Al 2 O 3 6~25%, B 2 O 3 5~20%, Mg
O 0-10%, CaO 0-15%, BaO 0-3
After melting a glass raw material composition having a composition of 0%, SrO 0-10%, and ZnO 0-10% and containing essentially no alkali metal oxide, the mixture is melted and then molded. In the method for producing glass, 0.05 to 2 SnO2 is used as a fining agent in the glass raw material mixture.
Method for producing an alkali-free glass, which comprises adding weight% and Sb 2 O 3 0.05 to 3 wt%.
JP11646497A 1996-08-21 1997-04-18 Alkali-free glass and method for producing the same Expired - Fee Related JP3861271B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP11646497A JP3861271B2 (en) 1996-08-21 1997-04-18 Alkali-free glass and method for producing the same
US08/911,945 US6508083B1 (en) 1996-08-21 1997-08-20 Alkali-free glass and method for producing the same
KR1019970039767A KR100406021B1 (en) 1996-08-21 1997-08-21 Alkali-free glass and method for producing the same
US09/907,288 US6546753B2 (en) 1996-08-21 2001-07-17 Method of producing an alkali-free glass
US10/298,811 US6933253B2 (en) 1996-08-21 2002-11-18 Alkali-free glass and method for producing the same
KR1020030042403A KR100424420B1 (en) 1996-08-21 2003-06-27 Alkali-free glass and method for producing the same

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP23971296 1996-08-21
JP8-239712 1996-08-21
JP11646497A JP3861271B2 (en) 1996-08-21 1997-04-18 Alkali-free glass and method for producing the same

Publications (2)

Publication Number Publication Date
JPH10114538A true JPH10114538A (en) 1998-05-06
JP3861271B2 JP3861271B2 (en) 2006-12-20

Family

ID=26454793

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11646497A Expired - Fee Related JP3861271B2 (en) 1996-08-21 1997-04-18 Alkali-free glass and method for producing the same

Country Status (1)

Country Link
JP (1) JP3861271B2 (en)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1143350A (en) * 1997-07-24 1999-02-16 Nippon Electric Glass Co Ltd Non-alkali glass and its production
EP1044932A1 (en) * 1999-04-12 2000-10-18 Schott Glas Alkali-free aluminoborosilicate glass and its use
DE19939789A1 (en) * 1999-08-21 2001-02-22 Schott Glas Alkali-free aluminoborosilicate glasses and their uses
DE10000839C1 (en) * 2000-01-12 2001-05-10 Schott Glas Alkali-free aluminoborosilicate glass used as substrate glass in displays and in thin layer photovoltaics contains oxides of silicon, boron, aluminum, magnesium, calcium, strontium, barium and zinc
DE10000837C1 (en) * 2000-01-12 2001-05-31 Schott Glas Alkali-free alumino-borosilicate glass used as substrate glass in thin film transistor displays and thin layer solar cells contains oxides of silicon, boron, aluminum, magnesium, strontium, and barium
DE10000836A1 (en) * 2000-01-12 2001-07-26 Schott Glas Alkali-free aluminoborosilicate glass and its uses
DE10034985C1 (en) * 2000-07-19 2001-09-06 Schott Glas Production of an alkali-free aluminosilicate glass used as a substrate glass for displays comprises adding tin oxide as refining agent to the starting materials, melting the glass and hot molding the glass
US6319867B1 (en) 1998-11-30 2001-11-20 Corning Incorporated Glasses for flat panel displays
DE10064804A1 (en) * 2000-12-22 2002-07-11 Schott Glas Alkali-free aluminoborosilicate glasses and their use
DE10114581A1 (en) * 2001-03-24 2002-10-10 Schott Glas Alkali-free aluminoborosilicate glass and uses
US6852658B2 (en) 2000-01-12 2005-02-08 Schott Glas Flat panel liquid-crystal display, such as for a laptop computer
SG115438A1 (en) * 2000-12-25 2005-10-28 Nippon Sheet Glass Co Ltd Alkali free glass, production method therefor, and flat display panel using the same
US7833919B2 (en) 2006-02-10 2010-11-16 Corning Incorporated Glass compositions having high thermal and chemical stability and methods of making thereof
US8007913B2 (en) 2006-02-10 2011-08-30 Corning Incorporated Laminated glass articles and methods of making thereof
US8156763B2 (en) 2005-11-15 2012-04-17 Avanstrate, Inc. Method of producing glass
US8713967B2 (en) 2008-11-21 2014-05-06 Corning Incorporated Stable glass sheet and method for making same
CN104276755A (en) * 2013-10-31 2015-01-14 东旭集团有限公司 Alkali-free aluminium borosilicate glass with high chemical durability
JP2016525058A (en) * 2013-07-16 2016-08-22 コーニング インコーポレイテッド Alkali-free aluminosilicate glass suitable as base material for induction heating cooking top plate
CN115849707A (en) * 2022-11-30 2023-03-28 成都光明光电股份有限公司 Glass material

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001500098A (en) * 1996-07-19 2001-01-09 コーニング インコーポレイテッド Arsenic-free glass

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001500098A (en) * 1996-07-19 2001-01-09 コーニング インコーポレイテッド Arsenic-free glass

Cited By (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1143350A (en) * 1997-07-24 1999-02-16 Nippon Electric Glass Co Ltd Non-alkali glass and its production
US7524784B2 (en) 1998-11-30 2009-04-28 Corning Incorporated Glasses for flat panel displays
US7365038B2 (en) 1998-11-30 2008-04-29 Corning Incorporated Glasses for flat panel displays
US6831029B2 (en) 1998-11-30 2004-12-14 Corning Incorporated Glasses for flat panel displays
US6319867B1 (en) 1998-11-30 2001-11-20 Corning Incorporated Glasses for flat panel displays
EP1044932A1 (en) * 1999-04-12 2000-10-18 Schott Glas Alkali-free aluminoborosilicate glass and its use
US6329310B1 (en) 1999-04-12 2001-12-11 Schott Glas Alkali-free aluminoborosilicate glass and uses thereof
US6417124B1 (en) 1999-08-21 2002-07-09 Schott Glas Alkali-free aluminoborosilicate glass, and uses thereof
DE19939789A1 (en) * 1999-08-21 2001-02-22 Schott Glas Alkali-free aluminoborosilicate glasses and their uses
DE10000838B4 (en) * 2000-01-12 2005-03-17 Schott Ag Alkali-free aluminoborosilicate glass and its uses
DE10000837C1 (en) * 2000-01-12 2001-05-31 Schott Glas Alkali-free alumino-borosilicate glass used as substrate glass in thin film transistor displays and thin layer solar cells contains oxides of silicon, boron, aluminum, magnesium, strontium, and barium
JP2011132125A (en) * 2000-01-12 2011-07-07 Schott Ag Alkali metal-free alumino-borosilicate glass and use thereof
DE10000839C1 (en) * 2000-01-12 2001-05-10 Schott Glas Alkali-free aluminoborosilicate glass used as substrate glass in displays and in thin layer photovoltaics contains oxides of silicon, boron, aluminum, magnesium, calcium, strontium, barium and zinc
JP2007197321A (en) * 2000-01-12 2007-08-09 Schott Ag Alkali metal-free aluminoborosilicate glass and use thereof
US6671026B2 (en) 2000-01-12 2003-12-30 Schott Glas Flat panel liquid-crystal display such as for a laptop computer
DE10000836B4 (en) * 2000-01-12 2005-03-17 Schott Ag Alkali-free aluminoborosilicate glass and its uses
US6852658B2 (en) 2000-01-12 2005-02-08 Schott Glas Flat panel liquid-crystal display, such as for a laptop computer
US6867158B2 (en) 2000-01-12 2005-03-15 Schott Glas Flat panel liquid-crystal display such as for a laptop computer
DE10000836A1 (en) * 2000-01-12 2001-07-26 Schott Glas Alkali-free aluminoborosilicate glass and its uses
DE10034985C1 (en) * 2000-07-19 2001-09-06 Schott Glas Production of an alkali-free aluminosilicate glass used as a substrate glass for displays comprises adding tin oxide as refining agent to the starting materials, melting the glass and hot molding the glass
EP1301445B2 (en) 2000-07-19 2008-07-23 Schott Ag Method for producing aluminosilicate glass
DE10064804A1 (en) * 2000-12-22 2002-07-11 Schott Glas Alkali-free aluminoborosilicate glasses and their use
DE10064804C2 (en) * 2000-12-22 2003-03-20 Schott Glas Alkali-free aluminoborosilicate glasses and their use
SG115438A1 (en) * 2000-12-25 2005-10-28 Nippon Sheet Glass Co Ltd Alkali free glass, production method therefor, and flat display panel using the same
DE10114581C2 (en) * 2001-03-24 2003-03-27 Schott Glas Alkali-free aluminoborosilicate glass and uses
DE10114581A1 (en) * 2001-03-24 2002-10-10 Schott Glas Alkali-free aluminoborosilicate glass and uses
US8156763B2 (en) 2005-11-15 2012-04-17 Avanstrate, Inc. Method of producing glass
US8007913B2 (en) 2006-02-10 2011-08-30 Corning Incorporated Laminated glass articles and methods of making thereof
US7833919B2 (en) 2006-02-10 2010-11-16 Corning Incorporated Glass compositions having high thermal and chemical stability and methods of making thereof
US8753993B2 (en) 2006-02-10 2014-06-17 Corning Incorporated Glass compositions having high thermal and chemical stability and methods of making thereof
US8763429B2 (en) 2006-02-10 2014-07-01 Corning Incorporated Glass compositions having high thermal and chemical stability and methods of making thereof
US10364177B2 (en) 2006-02-10 2019-07-30 Corning Incorporated Glass compositions having high thermal and chemical stability and methods of making thereof
US8713967B2 (en) 2008-11-21 2014-05-06 Corning Incorporated Stable glass sheet and method for making same
JP2016525058A (en) * 2013-07-16 2016-08-22 コーニング インコーポレイテッド Alkali-free aluminosilicate glass suitable as base material for induction heating cooking top plate
JP2019163209A (en) * 2013-07-16 2019-09-26 コーニング インコーポレイテッド Alkali-free aluminosilicate glasses, suitable as substrate for induction heating cooktops
CN104276755A (en) * 2013-10-31 2015-01-14 东旭集团有限公司 Alkali-free aluminium borosilicate glass with high chemical durability
CN115849707A (en) * 2022-11-30 2023-03-28 成都光明光电股份有限公司 Glass material

Also Published As

Publication number Publication date
JP3861271B2 (en) 2006-12-20

Similar Documents

Publication Publication Date Title
KR100424420B1 (en) Alkali-free glass and method for producing the same
US6468933B1 (en) Alkali-free glass and method of producing the same
JP3800440B2 (en) Alkali-free glass and method for producing the same
JP3800443B2 (en) Non-alkali glass substrate for display and method for producing the same
US4994415A (en) SiO2 -Al2 O3 -BaO glass substrates with improved chemical resistance for use in display panels and others having thin films
EP0769481B1 (en) Glass composition for a substrate, and substrate for plasma display made thereof
JP3861271B2 (en) Alkali-free glass and method for producing the same
JP3800438B2 (en) Alkali-free glass and method for producing the same
JP4306044B2 (en) Alkali-free glass and method for producing the same
JP2005053712A (en) Alkali-free glass
JP3897194B2 (en) Alkali-free glass and method for producing the same
JP2012505813A (en) High refractive index low dispersion optical glass
JPH08290938A (en) Glass for substrate
JP2000128572A (en) Borosilicate glass and its production
JP3861272B2 (en) Alkali-free glass and method for producing the same
JP3765594B2 (en) Optical glass
JP3460298B2 (en) Glass composition for substrates
JP3804111B2 (en) Alkali-free glass and display substrate
JP4305025B2 (en) Alkali-free glass
JP2003137591A (en) Process for making no-alkali glass
JP3867817B2 (en) Substrate glass
JP4219012B2 (en) Optical glass
JP2987039B2 (en) Glass for bonding and sealing
JPS61295256A (en) Glass for substrate
JP2002173334A (en) Optical glass

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050616

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060519

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060707

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20060904

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060917

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101006

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101006

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111006

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111006

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121006

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131006

Year of fee payment: 7

LAPS Cancellation because of no payment of annual fees