JP2002287376A5 - - Google Patents

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Publication number
JP2002287376A5
JP2002287376A5 JP2001086757A JP2001086757A JP2002287376A5 JP 2002287376 A5 JP2002287376 A5 JP 2002287376A5 JP 2001086757 A JP2001086757 A JP 2001086757A JP 2001086757 A JP2001086757 A JP 2001086757A JP 2002287376 A5 JP2002287376 A5 JP 2002287376A5
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JP
Japan
Prior art keywords
film
magnetic
insulating film
insulating
photoresist
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Application number
JP2001086757A
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English (en)
Japanese (ja)
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JP2002287376A (ja
JP4176322B2 (ja
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Priority to JP2001086757A priority Critical patent/JP4176322B2/ja
Priority claimed from JP2001086757A external-priority patent/JP4176322B2/ja
Priority to US10/097,625 priority patent/US6935014B2/en
Publication of JP2002287376A publication Critical patent/JP2002287376A/ja
Publication of JP2002287376A5 publication Critical patent/JP2002287376A5/ja
Application granted granted Critical
Publication of JP4176322B2 publication Critical patent/JP4176322B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001086757A 2001-03-26 2001-03-26 薄膜形成方法、及び薄膜磁気ヘッドの製造方法 Expired - Fee Related JP4176322B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001086757A JP4176322B2 (ja) 2001-03-26 2001-03-26 薄膜形成方法、及び薄膜磁気ヘッドの製造方法
US10/097,625 US6935014B2 (en) 2001-03-26 2002-03-15 Method for fabricating a thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001086757A JP4176322B2 (ja) 2001-03-26 2001-03-26 薄膜形成方法、及び薄膜磁気ヘッドの製造方法

Publications (3)

Publication Number Publication Date
JP2002287376A JP2002287376A (ja) 2002-10-03
JP2002287376A5 true JP2002287376A5 (enExample) 2004-08-19
JP4176322B2 JP4176322B2 (ja) 2008-11-05

Family

ID=18942087

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001086757A Expired - Fee Related JP4176322B2 (ja) 2001-03-26 2001-03-26 薄膜形成方法、及び薄膜磁気ヘッドの製造方法

Country Status (2)

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US (1) US6935014B2 (enExample)
JP (1) JP4176322B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3886802B2 (ja) * 2001-03-30 2007-02-28 株式会社東芝 磁性体のパターニング方法、磁気記録媒体、磁気ランダムアクセスメモリ
JP2005018836A (ja) * 2003-06-23 2005-01-20 Hitachi Ltd 磁気ヘッド及びその製造方法
WO2005082377A1 (ja) * 2004-03-01 2005-09-09 Ajinomoto Co., Inc. 抗ヒトTNF-α抗体活性低下抑制剤
JP2009266340A (ja) * 2008-04-28 2009-11-12 Fujitsu Ltd 垂直磁気ヘッドの製造方法
JP2012099589A (ja) * 2010-11-01 2012-05-24 Hitachi High-Technologies Corp プラズマ処理方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5438747A (en) * 1994-03-09 1995-08-08 International Business Machines Corporation Method of making a thin film merged MR head with aligned pole tips
US5665251A (en) * 1994-11-23 1997-09-09 International Business Machines Corporation RIE image transfer process for plating
JP3790347B2 (ja) * 1997-11-26 2006-06-28 Ｔｄｋ株式会社 薄膜磁気ヘッドの製造方法
JP3503874B2 (ja) * 1998-09-29 2004-03-08 Ｔｄｋ株式会社 薄膜磁気ヘッドの製造方法
US6156487A (en) 1998-10-23 2000-12-05 Matsushita-Kotobuki Electronics Industries, Ltd. Top surface imaging technique for top pole tip width control in magnetoresistive read/write head processing
US6539610B1 (en) * 2000-07-14 2003-04-01 International Business Machines Corporation Method for manufacturing a magnetic write head

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