JP2002256255A - Polishing material for dry blast processing - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a polishing material which can effectively prevent troubles caused by water such as the coagulation or agglomeration of the polishing material, or the adhesion of the polishing material to an article to be polished, and can achieve high polishing efficiency and high processing accuracy. SOLUTION: The polishing material is characterized by treating the surfaces of spherical inorganic particles with a water repellency-imparting substance.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an abrasive using spherical inorganic particles for use in dry and precise sandblasting, and more particularly to agglomeration, consolidation and polishing of abrasives caused by moisture. The present invention relates to an abrasive material that effectively prevents troubles such as adhesion to a workpiece and has excellent polishing efficiency and processing accuracy.

[0002]

2. Description of the Related Art In blasting, abrasive particles are sprayed at high speed onto the surface of a workpiece to grind the surface of the workpiece, remove dirt attached to the surface, and apply an impact force to the surface of the workpiece. It is a widely used industrial technique to give and improve the properties of its surface. Recently, this method has been used for processing a fine region of several tens of μm, which has not been considered before. For example, the sandblasting method has been taken up as an effective method for forming the partition walls of a plasma display panel (hereinafter, referred to as PDP), and some of them are in a practical stage. A low-melting glass layer having a thickness of 1 mm or less having a blast property is formed on a glass substrate provided with an electrode, and a fine groove having a width of 50 to 1000 μm is formed on the glass substrate or the electrode on the glass substrate. Grind to depth. In this case, the low-melting glass layer is ground by spraying an abrasive onto the surface side of the masking tape and blasting the groove to form a partition wall. This diaphragm is fired in a later step to become an inorganic glass partition.
A phosphor or the like is provided in a space between the partition walls to form a PDP.

In the production of solar cells in which a plurality of solar cell elements are electrically connected in series, a method of separating and integrating each solar cell element includes a transparent conductive film having openings formed in a predetermined pattern, A sand blast method has been attempted in which fine powder, which is an abrasive, is sprayed as a gas flow onto each conductive film such as a conversion layer and a back electrode to scribe a conductive film exposed at an opening. Similarly, a sand blast method has been tried for fine grinding for obtaining electrical connection such as via hole processing for a multilayer wiring board mounted at high density and removal of an oxide film of a semiconductor circuit element.

In the sand blasting method used for forming the partition walls of the PDP back substrate or removing the oxide film of the electrodes and semiconductors of the solar cell or the like, the blasted abrasive is used to remove grinding chips (ground paste material or film formation). Together with the material), removed from the grinding portion, obtained by a separation process such as a sieve, collected, temporarily stored in a reservoir tank or the like, and reused for blasting. As abrasive particles, depending on the purpose,
Glass beads, alundum, corundum, ceramic beads, stainless steel, copper, etc. of various compositions have been proposed and are currently used. It is said that these particles preferably have a spherical shape or a shape close to a spherical shape.

The advantages of using spherical or nearly spherical shaped particles as an abrasive are that coarse particles can be easily removed in the process of manufacturing the abrasive and that the abrasive does not adhere to the workpiece during blasting. Good flowability and low abrasive wear.

However, the average particle size is several tens μm to several μm.
If the inorganic abrasive of m is used in the sandblasting method, even if the abrasive particles have a shape very close to a true sphere, the fluidity is not good, or the device should be stopped once and then restarted after a while. In some cases, for example, the flow of the abrasive from the supply tank to the nozzle may not flow at all in the conveying circuit. In such a case, if an impact is applied to the clogged portion, the abrasive may start to flow, but in many cases, after removing the abrasive in the apparatus by disassembling the apparatus, etc. In this case, part or all of the material is replaced with a new abrasive, and restarting is performed. This significantly impairs workability and productivity. In particular, in a large-sized blasting apparatus having a plurality of nozzles (abrasive material spraying parts) and incorporating an abrasive collecting device, replacing the abrasive requires a great deal of time and labor.

[0007] The cause of this is that, even in a device in which measures for removing static electricity are taken, the abrasive material is clogged, so that a small amount of water is unevenly distributed with time during blasting or stopping, and as a result, abrasive particles It is presumed that liquid cross-linking occurs between the contact portions and some of the fine grinding dust and the abrasive particles.

That is, in sand blasting by a blast machine, an abrasive is injected from an injection nozzle at a high pressure and at a high speed, and a low-temperature portion is generated at the nozzle end by the injection, and a water drop due to a temperature difference is generated at the nozzle end. Then, after the blast machine is stopped, the case in which the abrasive is agglomerated by water in the machine often occurs. Also,
In particular, in a large-sized sandblasting apparatus, the abrasive in the machine must be once discharged out of the system in order to restart the abrasive and the abrasive in the machine by agglomeration and solidification of the abrasive in the machine. Not only does this reduce production efficiency, but it can be extremely difficult if the machine is in a clean room. In addition, there has been reported a case in which moisture generated at the tip of an injection nozzle of a blast machine acts as a binder for the abrasive, and a phenomenon occurs in which the abrasive adheres to the surface of the workpiece.

On the other hand, in the grinding such as the formation of the partition walls of the PDP, in which the depth of the groove is deeper than the width of the groove, the abrasive particles have a spherical shape or a shape close to a spherical shape. In this case, there is a problem that the shape of the partition walls (or grooves) is difficult to be constant (the side edge becomes large) because the abrasive particles rebound at the bottom of the groove of the object to be polished and collide with the groove wall surface. This problem can be significantly improved by lowering the abrasive injection pressure, but at the expense of grinding speed.

Further, regarding the size of the abrasive particles,
The larger the abrasive particles, the greater the mass and hence the grinding speed, but the curvature of the abrasive particles is so large that fine processing is difficult, and qualitative selection is currently being made. However, the abrasive should have a grain size configuration that allows high processing accuracy and high processing speed according to the shape of the workpiece.

As described above, in the fine processing by the sand blast method, the fluidity of the abrasive, which is an important factor regarding the working efficiency, particularly the fluidity at the time of restarting, and both the working accuracy and the working efficiency are affected. There is a need for a polishing material that eliminates side edges and has high accuracy and high work efficiency.

[0012]

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an object of the present invention is to solve the above-mentioned problems, and in particular, to form a partition of a PDP and grind a scribe line of a solar cell. It is preferably used in a dry process for removing an oxide film, etc., without impairing the properties of the bottom surface of the workpiece, efficiently and accurately grinding, and preventing aggregation of abrasive particles caused by moisture, for example, An object of the present invention is to provide an abrasive which can be restarted even after the blast machine has been stopped for at least one day.

[0013]

Means for Solving the Problems As a result of intensive studies, the present inventors have conducted a surface treatment of a substance that imparts water repellency to spherical inorganic particles, thereby causing agglomeration due to liquid crosslinking caused by moisture of abrasive particles. For example, it is possible to provide an abrasive which can be restarted even after stopping the blast machine for one day or more, and furthermore, adding fine particles having a diameter of 1/10 or less to the abrasive particles. By controlling the minimum groove width (μm), abrasive shape, maximum particle diameter, average particle diameter, etc., the abrasive can be used in the semiconductor field that requires ultra-precision processing. And arrived at the present invention.

That is, the present invention includes an abrasive for dry blasting, which is obtained by subjecting spherical inorganic particles to a surface treatment with a substance that imparts water repellency (claim 1).
In the present invention, the term grinding is used as a term including not only grinding but also blasting.

In a preferred embodiment, a fluidity improver having an average particle diameter of 1/10 or less of the average particle diameter of the spherical inorganic particles is added in an amount of 0.01 to 5% by weight based on the spherical inorganic particles. An abrasive according to claim 1 (claim 2).

In a preferred embodiment, the abrasive material according to claim 1 or 2, wherein the spherical inorganic particles satisfy the following formulas (1) to (3) (claim 3). 10 ≦ A ≦ 0.8C (1) 0.02C ≦ B ≦ 0.5C (2) 50 ≦ C ≦ 1000 (3) where A: maximum particle diameter (μm) of abrasive material B: average particle of abrasive material Diameter (μm) C: Minimum groove width to be ground or polished (μm)

In a preferred embodiment, the polishing material according to any one of claims 1 to 3 is used for removing an oxide film of a semiconductor (claim 4).

In a preferred embodiment, the polishing material according to any one of claims 1 to 3 is used for forming a rib material on a rear substrate of a PDP.

In a preferred embodiment, the abrasive according to any one of claims 1 to 3 is used for forming a scribe line for connecting solar cells in series (claim 6).

[0020]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail. The present invention is characterized in that it is an abrasive for dry blasting characterized by being subjected to a surface treatment with a substance that imparts water repellency to spherical inorganic particles, thereby causing the interparticle liquid crosslinking phenomenon caused by moisture. Effectively prevents agglomeration, consolidation of the abrasive or adhesion of the abrasive to the workpiece, grinding efficiency,
The grinding accuracy can be greatly improved.

Examples of the spherical inorganic particles used in the present invention include spherical inorganic particles such as glass beads, alundum, corundum, ceramic beads, stainless steel, and copper. In the present invention, the term “spherical” means that the area ratio of the projected area of the particle to the circumscribed circle is preferably 50% or more, more preferably 8%, as defined by the following formula (4).
0% or more.

The substance imparting water repellency used in the present invention can be used without any particular limitation as long as it is a substance imparting water repellency. Specifically,
Fatty acids such as oleic acid, lauric acid, myristic acid, isotridecyl myristate, palmitic acid, behenic acid, stearic acid, isostearic acid; amides and bisamides of the above fatty acids; higher alcohols such as stearyl alcohol or branched higher alcohols; Fatty acid ester lubricants such as higher fatty acid esters, higher fatty acid esters of polyhydric alcohols, very long-chain esters of montan wax type or partial hydrolysates thereof; barium stearate, calcium stearate,
Metal soap-based lubricants such as aluminum stearate, zinc stearate, magnesium stearate or a complex thereof; liquid paraffin of C ₁₆ or more, microcrystalline wax, natural paraffin, synthetic paraffin, polyolefin wax and partial oxides and fluorides thereof ,
Aliphatic hydrocarbon lubricants such as chlorides; silicone oils,
Oil agents such as soybean oil, coconut oil, palm kernel oil, linseed oil, rapeseed oil, cottonseed oil, kiri oil, castor oil, beef tallow, squalane, lanolin, and hydrogenated oil; surfactants having an HLB of 9 or less, for example, N-acyl amino acids Carboxylates such as salts, alkyl ether carboxylates and acylated peptides; alkyl sulfonates, alkylbenzenes and alkylnaphthalene sulfonates, sulfonatesuccinates, α-olefin sulfonates, N-acyl sulfonates, etc. Sulfonates; sulfates such as sulfated oils, alkyl sulfates, alkyl ether sulfates, alkyl allyl ether sulfates, alkyl amide sulfates; alkyl phosphates, alkyl ether phosphates, alkyl allyl ether phosphates Surfactants such as phosphoric acid ester salts, etc .; aliphatic amine salts, aliphatic quaternary Ammonium salts, benzalkonium salts, benzethonium chloride, pyridinium salts, cationic surfactants such as imidazolinium salts; carboxy betaine type, aminocarboxylate, imidazolinium betaine,
Amphoteric surfactants such as lecithin; polyoxyethylene alkyl ether, polyoxyethylene secondary alcohol ether, polyoxyethylene alkyl phenyl ether,
Polyoxyethylene sterol ether, polyoxyethylene lanolin derivative, ethylene oxide derivative of alkylphenol formalin condensate, polyoxyethylene polyoxypropylene block polymer, polyoxyethylene polyoxypropylene alkyl ether, polyoxyethylene glycerin fatty acid ester, polyoxyethylene castor Oil and hydrogenated castor oil, polyoxyethylene sorbitan fatty acid ester, polyoxyethylene sorbitol fatty acid ester, polyethylene glycol fatty acid ester, fatty acid monoglyceride, polyglycerin fatty acid ester, polyglycerin fatty acid ester, sorbitan fatty acid ester, fatty acid alkanolamide, polyoxyethylene fatty acid ester Amide, polyoxyethylene alkylamine, Fluorinated surfactant; reaction-based surfactants such as polyoxyethylene allyl glycidyl nonyl phenyl ether; .gamma.-chloropropyl trimethoxy silane, non-ionic surfactants such as Le Kill amine oxide
Vinyl triethoxy silane, vinyl trimethoxy silane, vinyl tris (β-methoxy ethoxy) silane,
γ-methacryloxypropyltrimethoxysilane, β-
(3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-
Aminopropyltriethoxysilane, N-β- (aminoethyl) -γ-aminopropyltrimethoxysilane, γ
Silane coupling agents such as ureidopropyltriethoxysilane; isopropyltriisostearoyl titanate, isopropyltri-n-dodecylbenzenesulfonyltitanate, isopropyltris (dioctylpyrophosphite) titanate, tetraisopropylbis (ditridecylphosphite) Titanate, tetra (2,2-diallyloxymethyl-1-butyl) bis (di-tridecyl) phosphite titanate, bis (dioctyl pyrophosphate) ethylene titanate,
Isopropyl tri (N-aminoethyl-aminoethyl)
Titanium coupling agents such as titanates are used, and these are used alone or in combination of two or more. Among them, inexpensive stearic acid is preferable.

The surface treatment amount of the substance imparting water repellency is preferably in the range of 0.01 to 5% by weight, more preferably 0.1 to 4% by weight, based on the spherical inorganic particles. If the amount of the surface treatment of the substance imparting water repellency is less than 0.01% by weight, the surface treatment effect is not sufficient. On the other hand, if the amount exceeds 5% by weight, the surface treatment effect is not improved and it is not economical. The physical properties of the object to be polished may be impaired.

The abrasive of the present invention comprises the above-mentioned surface-treated particles,
By adding and mixing a fluidity improver having an average particle diameter of one-tenth or less of the average particle diameter of the spherical inorganic particles, the flowability in the blast machine and the dispersibility of the abrasive during blasting are further improved. In addition, it is possible to further reduce the residual property on the workpiece at the end of the blast processing. Specific examples of the fluidity improver include talc, silicic anhydride, bentonite, kaolin, magnesium oxide, magnesium carbonate, magnesium silicate, zinc oxide, magnesium hydroxide, colloidal silica, diatomaceous earth,
Examples include ultrafine powders such as magnesium stearate, fused silica powder, fumed silica, silica, constarch, starch, calcium silicate, and the like, and these may be used alone or in combination of two or more. Above all, silicic anhydride and colloidal silica are preferred from the viewpoint of high improvement effect. The addition amount of the fluidity improver is 0.0% with respect to the spherical inorganic particles as the abrasive.
It is preferably in the range of 1 to 5% by weight, particularly 0.1 to 4% by weight.
Is more preferred. If the amount of the fluidity improver is less than 0.01% by weight, the effect of the addition is not sufficient, while if it exceeds 5% by weight, the effect of the addition is impaired.

When the flow improver is added and mixed,
It is also possible to use, as a binder, a water-repellent substance surface-treated on the spherical inorganic particles, and attach the fluidity improver to the surface of the spherical inorganic particles via the binder.
In this case, the fluidity improver functions as a cushion material, and by suppressing the repulsive force of the abrasive during grinding, it is possible to prevent side edges in forming partition walls of the PDP or to improve scribe accuracy in solar cell production. The effect of improving is obtained. Further, the fluidity in the blast machine, the dispersibility of the abrasive at the time of blast processing are further improved, and in addition, there is an effect of reducing the persistence of the abrasive on the workpiece at the end of the blast processing. .

In performing the blasting, a preferable maximum particle diameter is determined according to the minimum groove width (minimum polishing groove width in the case of polishing) C (μm) with respect to the particle diameter of the abrasive. In the abrasive of the present invention, the maximum particle diameter A (μm) of the spherical inorganic particles constituting the abrasive has a minimum grinding groove width C (μm).
In view of the above, spherical inorganic particles are preferably selected so as to satisfy the following formula (1), more preferably the following formula (5), and further preferably the following formula (6).

10 ≦ A ≦ 0.8C (1) 11 ≦ A ≦ 0.7C (5) 12 ≦ A ≦ 0.6C (6)

That is, when the maximum particle diameter of the spherical inorganic particles exceeds 0.8 C, the probability that particles larger than the width of the groove to be ground increases is present, and large abrasive particles are interposed between grooves which have been ground to some extent. As a result, it tends to hinder the grinding of the lower part of the portion where the particles are sandwiched, possibly causing breakage of the partition walls, and causing a reduction in processing accuracy and production efficiency. Further, when the maximum particle diameter of the spherical inorganic particles is smaller than 10 μm, the average particle diameter of the spherical inorganic particles also becomes extremely small, the grinding ability of one abrasive particle is reduced, and there is a tendency that an abrasive having good grinding efficiency cannot be obtained. There is. That is, with the above configuration, breakage of the partition is prevented, and the accuracy of the partition is significantly improved.

The average particle diameter of the spherical inorganic particles affects the processing speed and the dispersibility of the abrasive during blasting. In consideration of these characteristics, in the present invention,
The average particle diameter B (μm) of the spherical inorganic particles is preferably the following equation (2), preferably the following equation (7), and more preferably the following equation (8) in relation to the minimum grinding groove width C (μm). Is selected to satisfy.

0.02C≤B≤0.5C (2) 0.04C≤B≤0.4C (7) 0.05C≤B≤0.3C (8)

That is, in a precise blast grinding process such as formation of a partition wall using a PDP sandblast method or a scribe line of a solar cell, a preferable average particle diameter is present in accordance with the minimum groove width C of grinding. If the average particle diameter exceeds 0.5C, the mass per abrasive particle increases, and the grinding force in one collision of the particles also increases. There is a tendency that the risk of damaging the electrodes provided on the substrate made of and the surface of the substrate also increases. On the other hand, when the average particle diameter is smaller than 0.02C, the mass per one abrasive particle also decreases, and the grinding force in one collision of the particles tends to decrease. As a result, in the case of the PDP, the risk of damaging the electrodes and the substrate surface provided on the substrate made of glass or the like, which is the bottom of the workpiece, can be avoided, but the polishing efficiency may be significantly reduced. That is, with the above configuration, the polishing efficiency can be maintained even when the minimum processing groove width is reduced. The same can be said for the scribe processing of the solar cell. still,
The maximum particle diameter and the average particle diameter of the spherical inorganic particles are substantially the same as the maximum particle diameter and the average particle diameter of the spherical inorganic particles obtained by surface-treating a substance imparting water repellency, that is, the abrasive particles.

The minimum processing groove width C in the formation of the partition walls of the PDP using the sand blasting method and the grinding of the scribe line of the solar cell is usually blasted mainly in the range of 50 to 1000 μm. Is preferred.

As described above, a surface-treated particle surface-treated with a substance imparting water repellency, or an abrasive obtained by adding a fluidity improver to the surface-treated spherical inorganic particle, and a maximum particle with respect to the minimum grinding groove width. The abrasive of the present invention having a controlled diameter, average particle diameter and the like can be suitably used for removing oxide films in the field of semiconductors. For example, in order to achieve higher definition and higher aperture ratio of a TFT panel, further fine processing is required, and a polishing method which has been conventionally performed by a wet method is shifting to a dry method. The method can be effectively applied to this dry polishing method, and is particularly efficient and highly accurate in polishing that requires high energy such as a metal or an oxide film.

The abrasive of the present invention can be applied as a highly efficient and accurate abrasive for forming barrier ribs on a PDP rear substrate. In the process of forming the barrier ribs of the PDP, the barrier ribs are formed by a sand blast method, a blast-resistant rib material layer is provided on a glass substrate, and a blast-resistant resin layer is patterned and blasted from above. Thereby, a partition is formed.

Further, the abrasive of the present invention can be applied as an efficient and accurate abrasive for solar cell scribing.

As described above, since the abrasive of the present invention is surface-treated with a substance imparting water repellency, troubles such as agglomeration and solidification of the abrasive due to moisture and adhesion to the object to be polished are caused. For example, in the step of forming a partition of a PDP panel, the scribing of a solar cell, etc., the polishing efficiency is controlled by controlling the maximum particle diameter and the average particle diameter according to the target minimum groove width. And it is useful as an abrasive with high processing accuracy.

Further, the abrasive of the present invention is not only capable of preventing the spherical inorganic particles from agglomerating due to liquid crosslinking, but also being coated with a metal abrasive or the like, by performing a surface treatment with a substance that imparts water repellency. An effect of preventing rubbing into a workpiece is obtained. For example, when stainless powder or the like is used in the process of manufacturing the rear substrate of the PDD panel, the partition walls made of white low-melting-point lead glass or the like to be polished are discolored by being rubbed by the metal abrasive, thereby lowering the brightness of the PDP. However, such troubles are prevented. Further, the effect of increasing the separation efficiency of the low-melting glass and the metal abrasive such as stainless steel using the magnetic force can be obtained. This makes it possible to reuse the low-melting glass, which is the object to be polished, and to reduce the manufacturing cost of the PDP.

[0038]

EXAMPLES Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples, but the scope of the present invention is not limited by these. In addition, according to the following partition wall forming method, an experimental PDP back panel was used as a polishing target, and the partition pressure forming test was performed by adjusting the jetting pressure of the abrasive and the jetting weight per hour to be constant. The surface properties and the partition shape of the bottom glass substrate were observed.

Method for forming partition walls: (A) Production of back panel for experimental PDP: An electrode is formed on a soda-lime glass substrate (electrode surface is protected with a magnesium oxide layer), and a low-melting glass paste is coated thereon with a coater. After application and drying, a partition pattern having a grinding groove width (constant, that is, constant partition interval) of 100 μm was formed on the surface thereof with a mask material having blast resistance.

(B) Blasting: Using the experimental PDP back panel manufactured as described above, grinding experiments were performed with various abrasives of the following examples and comparative examples. The processing conditions were set as follows, the partition wall formation time of various abrasives was measured, and the partition wall shape and polishing accuracy were observed. Injection nozzle diameter: 10 mm Abrasive ejection pressure: 3.0 kg / cm ² (290 kPa) Abrasive ejection: 100 g / min Distance to panel: 10 cm

As the object to be polished, a back substrate for a PDP test was used, the injection pressure of the blast machine and the injection weight per hour of the abrasive were adjusted to be constant, and a partition wall formation test was performed.
The processing accuracy was evaluated by observing the surface properties and partition shape of the glass substrate at the bottom of the workpiece. The restartability was also evaluated. Table 1 shows the composition and evaluation results of the spherical abrasive. In addition, the measurement method and evaluation of the characteristics of the abrasive particles in Table 1 were performed by the following methods.

The maximum particle diameter and the average particle diameter of the inorganic particles constituting the abrasive are determined by Nikkiso Co., Ltd. Microtrack F
Measured using RA.

For the evaluation of the polishing efficiency, the cutting speed (seconds) of each abrasive at the same injection pressure was measured.

The index indicating a sphere was calculated by averaging the values obtained by randomly selecting 20 points of particles taken in an electron micrograph and measuring them.

The processing accuracy was evaluated by visually observing the scratches at the bottom of the groove of the back panel of the PDP after polishing and the surface properties of the groove and its side edges using an electron microscope, and by the following criteria. Good: No scratches, uniform groove processing shape, no side edges. Slightly poor: slightly flawed, and / or slightly uneven processing profile of grooves, with some tendency to side edges. Defective: Many scratches, and / or the processed shape of the groove is uneven and side edges are generated. Impossible: The partition cannot be formed by processing.

Example 1 Glass beads having an average particle diameter of 26 μm and a maximum particle diameter of 53 μm were used, and stearic acid (TST: manufactured by Miyoshi Oil & Fat Co., Ltd.) was added as a substance for imparting water repellency to 100 parts by weight of glass beads. 1% by weight, and as a fluidity improver, 0.5% by weight of white carbon (Starsil-S: manufactured by Kamishima Chemical Co., Ltd.) having an average particle diameter of 0.03 μm based on 100 parts by weight of the glass beads. The mixture was heated and mixed with a Henschel mixer to obtain an abrasive.

Although the partition walls of the PDP were formed by sandblasting using this abrasive, the processing could be performed accurately without damaging the partition walls. In addition, the blast machine was stopped, and the blast machine after being left overnight was able to be restarted without clogging of the nozzle and the like.

Example 2 Glass beads having an average particle diameter of 30 μm and a maximum particle diameter of 53 μm were used, and stearic acid (TST; manufactured by Miyoshi Oil & Fats Co., Ltd.) was added as a substance for imparting water repellency to 100 parts by weight of glass beads. 0.5% by weight based on the weight of the mixture, and as a fluidity improver, white carbon having an average particle size of 0.03 μm (Starsil-S: manufactured by Kamishima Chemical Co., Ltd.)
Was added in an amount of 1% by weight based on 100 parts by weight of glass beads, and heated and mixed with a Henschel mixer to obtain an abrasive.

Although the partition walls of the PDP were formed by sandblasting using this abrasive, the processing could be performed accurately without damaging the partition walls. In addition, the blast machine was stopped, and the blast machine after being left overnight was able to be restarted smoothly without clogging with nozzles or the like.

Example 3 Alundum having an average particle diameter of 20 μm and a maximum particle diameter of 44 μm was used, and stearic acid (TST; manufactured by Miyoshi Oil & Fat Co., Ltd.) was used as a substance for imparting water repellency in an amount of 100 parts by weight. And 2% by weight thereof, and mixed by heating with a Henschel mixer to obtain an abrasive.

Although the partition walls of the PDP were formed by sandblasting using this abrasive, the processing could be performed accurately without damaging the partition walls. In addition, the blast machine was stopped, and the blast machine after being left overnight was able to restart smoothly without any clogging of nozzles.

Example 4 A carborundum having an average particle diameter of 15 μm and a maximum particle diameter of 37 μm was used.
Stearic acid (TST: manufactured by Miyoshi Oil Co., Ltd.) is added in an amount of 3% by weight based on 100 parts by weight of carborundum, and as a fluidity improver, white carbon having an average particle size of 0.03 μm (Starsil-S: Kamijima Chemical Co., Ltd.) Was added to 100 parts by weight of carborundum and heated and mixed with a Henschel mixer to obtain an abrasive.

When a PDP partition wall was formed by sandblasting using this abrasive, the partition wall could be processed accurately without damage to the partition wall without side edges. In addition, when the blast machine was stopped and left for a day and night, the blast machine was able to be restarted smoothly without clogging of nozzles and the like.

Example 5 Glass beads having an average particle diameter of 35 μm and a maximum particle diameter of 74 μm were used. In addition, as a substance that imparts water repellency,
Stearic acid (TST: manufactured by Miyoshi Oil Co., Ltd.) is added in an amount of 0.1% by weight based on 100 parts by weight of glass beads, and as a fluidity improver, white carbon having an average particle diameter of 0.03 μm (Starsil-S: Kamishima Chemical) Co., Ltd.)
Was added to 100 parts by weight of glass beads, and the mixture was heated and mixed with a Henschel mixer to obtain an abrasive.

When a PDP partition wall was formed by sandblasting using this abrasive, the partition wall could be processed accurately without damage to the partition wall without side edges. In addition, the blast machine was stopped, and the blast machine after being left overnight was smoothly restarted without clogging of nozzles and the like.

Example 6 Glass beads adjusted to have an average particle diameter of 10 μm and a maximum particle diameter of 74 μm were used. As a substance that imparts water repellency, stearic acid (TST: manufactured by Miyoshi Oil Co., Ltd.)
Is added to 100 parts by weight of glass beads, and as a fluidity improver, white carbon having an average particle size of 0.03 μm (Starsil-S: manufactured by Kamishima Chemical Co., Ltd.) is added to 100 parts by weight of glass beads. 2% by weight was added and mixed by heating with a Henschel mixer to obtain an abrasive.

When a PDP partition wall was formed by sandblasting using this abrasive, the partition wall could be processed accurately without damage to the partition wall without side edges. In addition, when the blast machine was stopped and left for a day and night, the blast machine was able to be restarted smoothly without clogging of nozzles and the like.

Example 7 Stainless steel powder adjusted to an average particle diameter of 20 μm and a maximum particle diameter of 52 μm was used. As a substance that imparts water repellency, stearic acid (TST: manufactured by Miyoshi Oil Co., Ltd.)
Was added in an amount of 0.4% by weight based on 100 parts by weight of stainless steel powder, and heated and mixed with a Henschel mixer to obtain an abrasive.

When a partition wall of PDP was formed by sandblasting using this abrasive, the partition wall could be processed accurately without damage to the partition wall without side edges. In addition, there was no rubbing phenomenon on the partition wall peculiar to the metal abrasive, and the effect of increasing the separation efficiency between the low-melting glass and the metal abrasive such as stainless steel using magnetic force was obtained. Furthermore, when the blast machine was stopped and left for a day and night, the blast machine could be restarted smoothly without any clogging of nozzles and the like.

Example 8 The dense limestone was roasted, digested, and carbonated to a maximum particle size of 75.
A whisker-like calcium carbonate having an average particle diameter of 2 μm was prepared, and stearic acid (TST: manufactured by Miyoshi Oil & Fats Co., Ltd.) was added to 1.3 parts by weight based on 100 parts by weight of the whisker-like calcium carbonate particles as an abrasive. Whisker-like calcium carbonate particle powder 1 containing fumed silica having an average particle size of 0.05 μm (Reloseal CP-102: manufactured by Tokuyama Soda Co., Ltd.) as a fluidity improver.
2% by weight based on 00 parts by weight, and heated and mixed with a Henschel mixer to obtain an abrasive.

When the partition walls of the PDP were formed by sandblasting using this abrasive, the tendency of the side edges was observed, the partition walls were partially damaged, and the accuracy of the partition walls was somewhat poor. It was somewhat difficult to restart the blast machine after stopping it and leaving it overnight.

Comparative Example 1 Glass beads having an average particle diameter of 60 μm and a maximum particle diameter of 74 μm were used. As a fluidity improver, the average particle size is 0.
0.3% by weight of 03 μm white carbon (Starsil-S: manufactured by Kamishima Chemical Co., Ltd.) was added to 100 parts by weight of glass beads, and heated and mixed with a Henschel mixer to obtain an abrasive.

When a PDP partition wall was formed by sandblasting using this abrasive, the partition wall collapsed. In addition, when restarting after stopping the blast machine and allowing it to stand overnight, it was impossible to restart because the abrasive aggregated in the blast machine and near the nozzles.

Comparative Example 2 Glass beads adjusted to an average particle diameter of 10 μm and a maximum particle diameter of 105 μm were used. As a fluidity improver, white carbon having an average particle diameter of 0.03 μm (Starsil-S: manufactured by Kamishima Chemical Co., Ltd.) was added at 2% by weight based on 100 parts by weight of glass beads, and heated and mixed with a Henschel mixer to obtain an abrasive. Was.

When the partition wall of the PDP was formed by sandblasting using this abrasive, a portion where the partition wall partially collapsed occurred. In addition, when restarting after stopping the blast machine and allowing it to stand overnight, it was impossible to restart because the abrasive aggregated in the blast machine and near the nozzles.

Comparative Example 3 Glass beads adjusted to an average particle diameter of 20 μm and a maximum particle diameter of 62 μm were used. As a fluidity improver, 2% by weight of white carbon (Starsil-S: manufactured by Kamishima Chemical Co., Ltd.) having an average particle diameter of 0.03 μm was added to 100 parts by weight of the glass beads and mixed with a Henschel mixer to prepare an abrasive. Obtained.

When the partition walls of the PDP were formed by sandblasting using this abrasive, the partition walls could be formed, but the tendency of the side edges was observed. In addition, when restarting after stopping the blast machine and allowing it to stand overnight, it was impossible to restart because the abrasive aggregated in the blast machine and near the nozzles.

Comparative Example 4 Glass beads adjusted to an average particle diameter of 15 μm and a maximum particle diameter of 44 μm were used as an abrasive.

When the partition walls of the PDP were formed by sandblasting using this abrasive, strong side edges tended to be observed, and the partition walls could not be formed with high accuracy. In addition, when restarting after stopping the blast machine and allowing it to stand overnight, it was impossible to restart because the abrasive aggregated in the blast machine and near the nozzles.

Comparative Example 5 Stainless steel powder adjusted to an average particle diameter of 25 μm and a maximum particle diameter of 150 μm was used as an abrasive.

When the partition walls of the PDP were formed by sandblasting using this abrasive, the tendency of the side edges was observed, the partition walls were partially damaged, and the partition walls could not be formed accurately. In addition, rubbing phenomenon and adhesion to partition walls, which are defects of the metal abrasive, occurred. Further, the efficiency of separating the low-melting glass using a magnetic force from the metal abrasive such as stainless steel was poor, and the low-melting glass could not be reused. It was somewhat difficult to restart the blast machine after stopping it and leaving it overnight.

[0072]

[Table 1]

[0073]

As described above, since the abrasive of the present invention is surface-treated with a substance that imparts water repellency, the abrasive agglomerates, solidifies, and adheres to the object to be polished due to moisture. Effectively prevent the trouble of, for example, in the partition wall forming step of the PDP panel, scribe processing of the solar cell, etc., by controlling the maximum particle diameter, the average particle diameter according to the intended minimum groove width, It is useful as an abrasive having high polishing efficiency and high processing accuracy.

Claims (6)

[Claims] An abrasive for dry blasting, characterized in that spherical inorganic particles are surface-treated with a substance that imparts water repellency. 2. One-tenth of the average particle diameter of the spherical inorganic particles
The blasting abrasive according to claim 1, wherein a fluidity improver having the following average particle size is added in an amount of 0.01 to 5% by weight based on the spherical inorganic particles. 3. The abrasive according to claim 1, wherein the spherical inorganic particles satisfy the following formulas (1) to (3). 10 ≦ A ≦ 0.8C (1) 0.02C ≦ B ≦ 0.5C (2) 50 ≦ C ≦ 1000 (3) where A: maximum particle diameter (μm) of spherical inorganic particles B: particle diameter of spherical inorganic particles Average particle diameter (μm) C: Minimum grinding groove width (μm) 4. The abrasive according to claim 1, which is used for removing an oxide film of a semiconductor. 5. The polishing material according to claim 1, which is used for forming a rib material on a rear substrate of the PDP. 6. The abrasive according to claim 1, which is used for forming a scribe line for connecting solar cells in series.