KR20020055439A - Abrasives for dry blasting - Google Patents

Abstract

PURPOSE: A polishing material for a dry blast processing is provided to effectively prevent troubles caused by water as the coagulation or agglomeration of the polishing material, or the adhesion of the polishing material to an article to be polished, and to achieve high polishing efficiency and high processing accuracy. CONSTITUTION: A polishing material for a dry blast processing is characterized by treating the surfaces of spherical inorganic particles with a water repellency-imparting substance. Fluid reformed substance being below a tenth of the spherical inorganic particles is added 0.01 or 0.5 percent weight to the spherical inorganic particles. The polishing material is used in semiconductor field demanding super precision machining by controlling the shape of the polishing material, maximum particle diameter, and average particle diameter.

Description

Abrasive for Dry Blast Processing {ABRASIVES FOR DRY BLASTING}

The present invention relates to an abrasive using spherical inorganic particles used for dry precise sand blasting, and more particularly to effectively prevent troubles such as agglomeration of abrasives due to moisture, solidification, and adhesion to an abrasive, The present invention relates to an abrasive having excellent polishing efficiency and processing accuracy.

Blast processing is a widely used industry for spraying abrasive particles on the surface of a workpiece at high speed to remove the surface of the workpiece or to remove dirts on the surface, or to impart impact on the surface of the workpiece to improve its properties. It's the enemy. In recent years, this method has been used for the processing of micro-regions of several micrometers, which have not been conventionally considered.

For example, the sand blasting method is also accepted as a viable method for forming a partition of a plasma display panel (hereinafter referred to as PDP), and is in practical use in some cases. A low melting point glass layer having a blast property of 1 mm or less is formed on a glass substrate provided with electrodes, and fine grooves having a width of 50 to 1000 µm are ground in the low melting point glass layer to the depth of the electrode on the glass substrate or the glass substrate. . In this case, the groove width is blasted by spraying an abrasive on the surface side of the masking tape to blast the low melting point glass layer to form partition walls. This partition is calcined in a later step to form an inorganic glass partition. Phosphors or the like are provided in the spaces between the partitions to form a PDP.

In the manufacturing of a solar cell in which a plurality of solar cell elements are electrically connected in series, a method of separating and integrating each solar cell element, including a transparent conductive film having an opening formed in a predetermined pattern, a photoelectric conversion layer, a back electrode, and the like. A sand blasting method has been tried to scribe a conductive film exposed to an opening by blowing particulate powder, which is an abrasive, on each conductive film as a gas flow. Similarly, the sand blasting method has been attempted for fine grinding to obtain electrical connection such as via hole processing for multi-layer wiring boards mounted at high density or removal of oxide film of semiconductor circuit elements.

In the sand blasting method used for forming the barrier rib of the PDP back substrate or removing the oxide film of the electrode or semiconductor such as a solar cell, the injected abrasive material is ground in the grinding portion together with the grinding debris (grinded paste material or film formation). It is removed and obtained by separating processes such as sieves, and is first stored in a reservoir tank or the like and reused for blast processing.

As the abrasive particles, glass beads, alanthanum, corundum, ceramic beads, stainless steel, copper, etc. of various compositions have been proposed according to the purpose, and are currently used. This particle shape is said to be preferably a spherical shape or a shape close to a spherical shape.

The advantage of using spherical or nearly spherical particles as the abrasive is that the coarse particles are easily removed during the manufacturing process of the abrasive, and there is no adhesion to the workpiece in blasting, fluidity, and abrasive wear. This is less.

However, when an inorganic abrasive material having an average particle diameter of several tens to several micrometers is used in the sand blasting method, for example, even if the shape of the abrasive grains is extremely close to the true sphere, the fluidity is not good, or after stopping the apparatus once, At the same time, there is no flow in the middle of the conveyance circuit of the abrasive from the supply tank to the nozzle. In such a case, the abrasive may start to flow when an impact is applied to the blocked portion, but in many cases, the apparatus is dismantled, such as disassembling the apparatus, and after removing all of the abrasive in the apparatus, a part or all of the new abrasive is replaced and restarted. By doing so, the workability and productivity are markedly hindered. In particular, a plurality of nozzles (abrasive injection parts) are incorporated, and a recovery device for abrasives is incorporated, and a large blasting device requires a great deal of time and effort to replace the abrasive.

This is caused by the closing of the abrasive even in a device in which static electricity is prevented, so that a small amount of moisture causes ubiquitous during blasting or stopping, resulting in fine grinding debris of each contact or part of the abrasive grain. It is presumed to be caused by liquid crosslinking between particles.

That is, in the sand blasting process by the blast machine, the abrasive is injected at high pressure and high speed by the injection nozzle, and the low temperature part by the injection is generated at the nozzle tip, and water droplets due to the temperature difference are generated at the nozzle tip. Then, after the blast machine stops, a case in which the abrasive aggregates due to moisture in the machine sometimes occurs. In particular, in a large sand blasting apparatus, the nozzle tip and the abrasive in the machine must be discharged out of the system once by the aggregation and solidification of the abrasive in the machine. This not only reduces production efficiency, but also makes it difficult when the machine is in a clean room. In addition, a case has been reported in which water generated at the tip of the injection nozzle of the blast machine acts as a binder of the abrasive, causing the abrasive to adhere to the surface of the workpiece.

On the other hand, in the case of grinding deeper than the groove width such as the formation of the partition wall of the PDP, the abrasive particles are spherical or close to the spherical shape. There is also a problem in that the shape of the partition wall (or groove) is hard to be constant (side edge becomes large) because it is likely to spring up and collide with the groove wall surface. This problem can be somewhat improved by lowering the abrasive pressure of the abrasive, but at the expense of the grinding speed.

Furthermore, regarding the size of the abrasive grains, the larger the abrasive grain, the larger the mass, the higher the grinding speed, but the larger the curvature of the abrasive grain, which makes fine machining difficult, so that the qualitative selection is made. However, the abrasive has a grain size configuration that can increase the processing precision and increase the processing speed depending on the shape of the workpiece.

As described above, in the sand blasting method, the fluidity of the abrasive, which is an important factor in terms of work efficiency, in particular, the fluidity at restart, or the side edges that affect both the processing precision and the work efficiency, Abrasive materials with good work efficiency have been obtained.

This invention is made | formed in view of the said situation, The subject solved the said problem, Especially it is used suitably in dryness, such as removal of the oxide film of a semiconductor, such as partition formation processing of PDP, grinding of scribe brine of a solar cell, Abrasives that can be ground efficiently and precisely, without damaging the surface of the workpiece bottom, while preventing agglomeration of abrasive particles due to moisture, for example, even after stopping the blast machine for at least one night Is to provide.

The present inventors have diligently studied to surface-treat a substance which imparts water repellency to spherical inorganic particles, thereby preventing agglomeration due to liquid crosslinking caused by moisture in the abrasive grains, and restarting it even after stopping the blast machine for one night or more. Abrasives can be provided, and furthermore, by adding fine particles having a diameter of less than one tenth of the particle size to the abrasive particles, the fluidity can be improved, and the grinding minimum groove width (μm), the shape of the abrasive, the maximum particle diameter, and the average particle diameter are provided. By controlling such and the like, the present invention has been found by finding an abrasive which can be used in semiconductor fields and the like requiring ultra-precision processing.

That is, the present invention is directed to a dry blasting abrasive, characterized in that the surface-treated material which imparts water repellency to spherical inorganic particles (claim 1).

In the present invention, the term grinding is used as a term including grinding cleaning in addition to grinding.

A preferred embodiment is an abrasive according to claim 1, wherein a fluidity modifier composed of an average particle diameter of one tenth or less of the average particle diameter of the spherical inorganic particles is added in an amount of 0.01 to 5 wt% based on the spherical inorganic particles (claim 2).

As a preferable aspect, spherical inorganic particle is the abrasive | polishing material of Claim 1 or Claim 2 which satisfy | fills following formula (1)-(3) (claim 3).

10 ≤ A ≤ 0.8 C (1)

0.02C ≤B ≤0.5C (2)

50 ≤C ≤1000 (3)

only,

A: maximum particle diameter of the abrasive (μm)

B: average particle diameter of the abrasive (µm)

C: minimum groove width (μm) for grinding or polishing

As a preferable aspect, it is the abrasive | polishing material in any one of Claims 1-3 used for the removal of the oxide film of a semiconductor (claim 4).

As a preferable aspect, it is the abrasive | polishing material of any one of Claims 1-3 used for formation of the rib material on the back substrate of PDP (claim 5).

As a preferable aspect, it is the abrasive | polishing material in any one of Claims 1-3 used for formation of the scribe line for series connection of a solar cell element (claim 6).

Embodiment of the invention

EMBODIMENT OF THE INVENTION Hereinafter, this invention is demonstrated in detail.

The present invention is a dry blasting abrasive characterized in that the surface-treated material to impart water repellency to the spherical inorganic particles, thereby agglomeration, solidification or The adhesion of the abrasive to the workpiece can be effectively prevented, and the grinding efficiency and the grinding precision can be significantly improved.

Examples of the spherical inorganic particles used in the present invention include spherical inorganic particle powders such as glass beads, alanthanum, corundum, cellaric beads, stainless steel and copper. In the present invention, spherical means a case where the area ratio with respect to the circumscribed circle of the particle transparent area is preferably 50% or more, more preferably 80% or more, as defined in the following formula (4).

(4)

As a substance which imparts water repellency used in the present invention, any substance which imparts water repellency can be used without particular limitation. Specific examples include fatty acids such as oleic acid, lauric acid, myristic acid, myristic acid isotridecyl, palmitic acid, behenic acid, stearic acid and isostearic acid; Amides and bisamides of the fatty acids; Higher alcohols or branched higher alcohols such as stearyl alcohol; Fatty acid ester lubricants such as higher fatty acid esters of monohydric alcohols, higher fatty acid esters of polyhydric alcohols, very long-chain esters of montan wax type or partial gas decomposition products thereof; Metal soap-based lubricants such as barium stearate, calcium stearate, aluminum stearate, zinc stearate, magnesium stearate or a composite thereof; C ₁₆ or more liquid paraffin, microcrystalline wax, natural paraffin, synthetic paraffin, polyolefin wax and aliphatic hydrocarbon type lubricants such as partial oxides, fluorides and chlorides thereof, silicone oil, soybean oil, palm oil, palm kernel oil, linseed oil, rapeseed oil, Emulsions such as cottonseed oil, paulownia oil, castor oil, tallow, scalan, lanolin, hardened oil; HLB is 9 or less surfactant, such as carboxylates, such as N-acylamino acid salt, an alkyl ether carboxylate salt, and an acylated peptide; Sulfonates such as alkyl sulfonates, alkyl benzenes and alkyl naphthalene sulfonates, sulfon succinates, α-olefin sulfonates and N-acyl sulfonates; Sulfate ester salts such as sulfated oil, alkyl sulfate, alkyl ether sulfate, alkyl allyl ether sulfate, and alkylamide sulfate; Anionic surfactants such as phosphate ester salts such as alkyl phosphate, alkyl ether phosphate and alkyl aryl ether phosphate; Cationic surfactants such as aliphatic amine salts, aliphatic quaternary ammonium salts, benzalkonium salts, benzetonium chlorides, pyridinium salts, and imidazolinium salts; Amphoteric surfactants such as carboxybetaine type, aminocarboxylate, imidazolinium betaine and lecithin; Polyoxyethylene alkyl ether, polyoxyethylene secondary alcohol ether, polyoxyethylene alkyl phenyl ether, polyoxyethylene sterol ether, polyoxyethylene lanolin derivative, ethylene oxide derivative of alkyl phenol formalin condensate, polyoxyethylene polyoxypropylene block polymer , Polyoxyethylene polyoxypropylene alkyl ether, polyoxyethylene glycerin fatty acid ester, polyoxyethylene castor oil and hardened castor oil, polyoxyethylene sorbitan fatty acid ester, polyoxyethylene sorbitol fatty acid ester, polyethylene glycol fatty acid ester, fatty acid mono Nonionic systems such as glycerides, polyglycerin fatty acid esters, polyglycerin fatty acid esters, sorbitan fatty acid esters, fatty acid alkanolamides, polyoxyethylene fatty acid esteramides, polyoxyethylene alkylamines, alkylamine oxides, and the like Surfactants; Fluorine-based surfactants; Reaction system surfactants such as polyoxyethylene allylglycidyl nonylphenyl ether; γ-chloropropyltrimethoxysilane, vinyltriethoxysilane, vinyltrimethoxysilane, vinyl tris (β-methoxyethoxy) silane, γ-methacryloxypropyltrimethoxysilane, β- (3, 4-epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-melcaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N-β- (aminoethyl) silane coupling agents such as -γ-aminopropyltrimethoxysilane and γ-euraidpropyltriethoxysilane; Isopropyltriisostearoyl titanate, isopropyltri-n-dodecylbenzenesulfonyl titanate, isopropyl tris (thiooctyl pyrophosphite) titanate, tetraisopropylbis (ditridecyl phosphate) titanate, Tetra (2,2-diallyloxymethyl-1-butyl) bis (di-tridecyl) phosphite titanate, bis (dioctylpyrophosphate) ethylene titanate, isopropyltri (N-aminoethyl-aminoethyl) Titanium coupling agents, such as titanate, are mentioned, These are used individually or in combination of 2 or more types. Among them, cheap stearic acid is preferable.

The surface treatment amount of the material imparting water repellency is preferably in the range of 0.01 to 5% by weight, more preferably 0.1 to 4% by weight based on the spherical inorganic particles. If the surface treatment amount of the material imparting water repellency is less than 0.01% by weight, the surface treatment effect is not sufficient, while even if it exceeds 5% by weight, the surface treatment effect does not improve and is not economical. There is a case.

In the abrasive of the present invention, by adding and mixing a fluidity improving agent comprising an average particle diameter of one tenth or less of the average particle diameter of the spherical inorganic particles, the abrasive in the blast machine is fluid and dispersibility of the abrasive during blast processing. It is possible to further improve the resistance and to further reduce the residual property to the workpiece at the end of the blast processing. Specific examples of the fluidity improving agent include talc, silicic anhydride, bentonite, kaolin, magnesium oxide, magnesium carbonate, magnesium silicate, zinc oxide, magnesium hydroxide, colloidal silica, diatomaceous earth, magnesium stearate, molten silica powder, fumed silica, and silica. And ultrafine powders such as corn starch, starch and calcium silicate, and these can be used alone or in combination of two or more thereof. Among them, silicic anhydride and colloidal silica are preferable because of the high improvement effect. The addition amount of the fluidity improver is preferably in the range of 0.01 to 5% by weight, more preferably 0.1 to 4% by weight based on the spherical inorganic particles which are abrasives. If the addition amount of the fluidity improver is less than 0.01% by weight, the addition effect is not sufficient, while if it exceeds 5% by weight, the addition effect is rather impaired.

In addition, in addition of the fluidity modifier, the fluidity modifier may be attached to the spherical inorganic particle surface through the binder using a substance that imparts water repellency to the spherical inorganic particles as a binder. In this case, the fluidity improver functions as a cushion material and suppresses the repulsive force of the abrasive during grinding, thereby preventing side edges in forming the partition walls of the PDP, or improving scribing accuracy in solar cell manufacturing. Get Furthermore, the fluidity in the blast machine and the dispersibility of the abrasive during the blasting process are further improved and added, and at the end of the blasting process, there is an effect of reducing the residual of the abrasive on the workpiece.

In addition, a preferred maximum particle size exists according to the grinding minimum groove width (minimum grinding cleaning groove width in the case of grinding cleaning) (C) (µm) with respect to the particle diameter of the abrasive, after the blasting process, and the abrasive of the present invention constitutes the abrasive. The maximum particle diameter (A) (µm) of the spherical inorganic particles to be described is preferably in the following formula (1), more preferably in the following formula (5), more preferably in relation to the grinding minimum groove width (C) (µm). Preferably, spherical inorganic particles satisfying the following formula (6) are selected.

10 ≤ A ≤ 0.8 C (1)

11 ≤ A ≤ 0.7 C (5)

12 ≤ A ≤ 0.6C (6)

In other words, if the maximum particle diameter in the spherical inorganic particles exceeds 0.8C, the probability of the presence of particles larger than the groove width to be ground is high, and large abrasive particles are caught in the grooves to be ground to some extent, and as a result, It tends to hinder the grinding of the lower part, and in some cases breakage of the partition wall, leading to a decrease in machining accuracy and production efficiency. When the maximum particle diameter of the spherical inorganic particles is smaller than 10 µm, the average particle diameter of the spherical inorganic particles also becomes extremely small, and the grinding ability of one abrasive grain decreases, which tends not to obtain an abrasive having good grinding efficiency. That is, by setting it as the said structure, damage of a partition is prevented and the precision of a partition is improved remarkably.

In addition, the average particle diameter of the spherical inorganic particles affects the processing speed and the dispersibility of the abrasive during blasting. In consideration of these characteristics, in the present invention, the average particle diameter (B) (µm) of the spherical inorganic particles is preferably in the following formula (2), preferably in the following relationship with the minimum grinding groove width (C) (µm). It is selected to satisfy the formula (7), more preferably the following formula (8).

0.02C ≤B ≤0.5C (2)

0.04C ≤B ≤0.4C (7)

0.05C ≤B ≤0.3C (8)

In other words, in the precise blast grinding process such as the partition formation using the sandblasting method of PDP or the scribe line of the solar cell, the preferred average particle size exists according to the grinding minimum groove width (C). When the average particle diameter exceeds 0.5C, the mass per abrasive particle increases and the grinding force increases in one collision of the particles, but as a result, it is installed on a substrate made of glass or the like at the bottom of the workpiece. The risk of damaging the electrode and substrate surface also tends to be high. Moreover, when the average particle diameter is smaller than 0.02C, the mass per one of the abrasive grains is also small, and the grinding force tends to decrease in one collision of the particles. As a result, in the case of the PDP, the risk of damaging the surface of the electrode and the substrate provided on the substrate made of glass or the like at the bottom of the workpiece can be avoided, but the polishing efficiency may be significantly reduced. In other words, the above structure allows the polishing efficiency to be maintained even if the minimum processing groove width is small. Moreover, the same thing can be said about scribing of a solar cell.

In addition, the maximum particle diameter and the average particle diameter of spherical inorganic particles are substantially the same as the spherical inorganic particles surface-treated with the substance which gives water repellency, ie, the maximum particle diameter and average particle diameter of abrasive grain, and are substantially the same.

In forming PDP bulkheads using sandblasting and grinding scribe lines in solar cells, the top processing groove width C is usually blasted in the range of 50 to 1000 µm, and this range is also suitable for the present invention.

As described above, the abrasive prepared by adding a fluidity modifier to the surface-treated particles surface-treated in the material imparting water repellency, or to the surface-treated spherical inorganic particles, moreover, the maximum particle diameter, average particle diameter and the like for the grinding minimum groove width are controlled. The abrasive of the present invention can be suitably used for removing an oxide film in the semiconductor field. For example, in order to achieve high definition and high opening ratio of the TFT panel, further fine processing is required, and the conventional polishing method has been shifted to dry, but the abrasive of the present invention is effectively applied to this dry polishing method. In particular, in polishing for which high energy such as metal or oxide film is required, the efficiency is good and the precision is good.

Further, the abrasive of the present invention can be applied as an abrasive for forming partition walls of a PDP back substrate having good efficiency and precision. In the process of forming the barrier ribs of the PDP, the barrier ribs are formed by sandblasting, and a rib material layer having a blast property is formed on a glass substrate, and patterned by a resin layer having a blast resistance, and the blast process is performed from above. Is formed.

Moreover, the abrasive of the present invention can be applied as an abrasive for solar cell scribe processing with good efficiency and precision.

As described above, the abrasive of the present invention is surface-treated with a material that imparts water repellency, thereby effectively preventing troubles such as agglomeration of the abrasive due to moisture, solidification, and adhesion to the workpiece, and for example, forming a partition of a PDP panel. In the process and scribing of a solar cell, it is useful as an abrasive having high polishing efficiency and processing accuracy by controlling the maximum particle size and the average particle diameter in accordance with the target minimum groove width.

In addition, the abrasive of the present invention is surface treated with a substance which imparts water repellency, thereby achieving the effect of preventing the aggregation of spherical inorganic particles by liquid crosslinking, and also preventing the mixing of the abrasive into the workpiece by a metal abrasive or the like. Get For example, in the manufacturing process of the PDP panel back substrate, when stainless powder or the like is used, a partition wall made of white low melting lead glass or the like, which is a polished material, is discolored by being rubbed with a metal abrasive material, thereby lowering the brightness of the PDP. There is a case of letting, but such trouble is prevented. Furthermore, the effect of improving the separation efficiency between the low melting point glass and the metal abrasive materials such as stainless steel using magnetic force is obtained. This makes it possible to regenerate and use the low melting point glass, which is the abrasive, and to reduce the production cost of the PDP.

(Example)

Hereinafter, although an Example and a comparative example are given and this invention is demonstrated further more concretely, the scope of the present invention is not limited at all by this.

In addition, according to the following partition formation method, a partition formation test is carried out by adjusting the injection pressure of the abrasive and the injection weight per hour using the experimental PDP back panel, and the glass-based surface of the bottom of the workpiece. The appearance and partition wall shape were observed.

Bulkhead Forming Method:

(A) Preparation of Experimental PDP Back Panel:

An electrode is formed on a soda-lime glass substrate (electrode surface is protected by a magnesium oxide layer), a low melting glass paste is coated with a coater on it, dried, and the grinding groove width (constant, In other words, a partition pattern having a partition spacing constant) of 100 µm was formed.

(B) blasting:

Using the experimental PDP back panel manufactured as described above, grinding experiments were carried out with various abrasives of the following examples and comparative examples. The processing conditions were set as follows, and the partition wall formation time of various abrasives was measured, and partition shape and polishing precision were observed.

Injection nozzle diameter: 10 mm

Abrasive injection pressure: 3.0㎏ / ㎠ (290㎪)

Abrasive Injection: 100g / min

Distance to panels: 10 cm

Using the backing base for PDP testing, as the abrasive, the injection pressure of the blast machine and the injection weight per hour of the abrasive were constantly adjusted to perform the partition formation test, and the processing density was determined by the glass-based surface properties of the workpiece bottom. It evaluated by observing partition shape. Moreover, evaluation of the restartability was also performed. Table 1 shows the composition and evaluation results of the spherical abrasive.

In addition, the measuring method and evaluation of the characteristic of the abrasive grain of Table 1 were performed by the following method.

The maximum particle diameter and average particle diameter of the inorganic particle powder which comprise an abrasive | polishing material were measured using Nigiso Micro Co., Ltd. micro track FRA.

As an evaluation of polishing efficiency, the cutting speed of each abrasive was measured in seconds by the copper spraying pressure.

The index showing the spherical shape was randomly selected 20 particles of the electron micrograph taken to calculate the average value of the measured value. The processing accuracy was evaluated using an electron microscope while observing the scratches on the bottom of the grooves of the PDP back panel after polishing, and the surface properties of the grooves or side edges thereof, with the following criteria.

Good: No scratches, uniform groove shape and no side edges.

Slightly defective: Slightly injured and / or grooved shape is slightly uneven and there is a slight tendency of side edges.

Poor: Many wounds and / or grooves are uneven in shape and side edges are generated.

Impossible: Cannot form bulkhead by machining.

(Example 1)

Using a glass beads having an average particle diameter of 26 µm and a maximum particle diameter of 53 µm, 1% by weight of stearic acid (TST: manufactured by Miyoshi Yu Co., Ltd.) was added to 100 parts by weight of the glass beads as a substance to impart water repellency thereto. Furthermore, 0.5 wt% of white carbon (Statyl-S; manufactured by Kamishima Chemical Co., Ltd.) having an average particle diameter of 0.03 µm was added to 100 parts by weight of the glass beads, and the mixture was heated and mixed with a Henschel mixer as a fluidity improving agent. Got it.

By sandblasting using this abrasive, the partitions of the PDP were formed, but the partitions could be processed with high accuracy without damaging the partitions. In addition, the blast machine could be stopped and restarted smoothly without clogging the nozzle or the like with regard to starting the blast machine after overnight.

(Example 2)

Using glass beads having an average particle diameter of 30 µm and a maximum particle diameter of 53 µm, stearic acid (TST: manufactured by Miyoshi Yushi Co., Ltd.) was added 0.5% by weight with respect to 100 parts by weight of glass beads. Furthermore, 1 wt% of white carbon (Stasil-S; manufactured by Kamishima Chemical Co., Ltd.) having an average particle diameter of 0.03 µm was added to 100 parts by weight of glass beads, and the mixture was heated and mixed with a Henschel mixer as a fluidity improving agent. Got it.

By sandblasting using this abrasive, the partitions of the PDP were formed, but the partitions could be processed with high accuracy without damaging the partitions. In addition, the blast machine was stopped and restarted smoothly without clogging the nozzle or the like with regard to starting the blast machine after standing overnight.

(Example 3)

Using alanthanum having an average particle diameter of 20 µm and a maximum particle diameter of 44 µm, 2 wt% of stearic acid (TST: manufactured by Miyoshi Yushi Co., Ltd.) was added to 100 parts by weight of alanthanum as a substance to impart water repellency thereto. The mixture was heated and mixed with a Henschel mixer to obtain an abrasive.

By sandblasting using this abrasive, the partitions of the PDP were formed, but the partitions could be processed with high accuracy without damaging the partitions. In addition, the blast machine was stopped and restarted smoothly without clogging the nozzle or the like with regard to starting the blast machine after standing overnight.

(Example 4)

3 wt% of stearic acid (TST: manufactured by Miyoshi Yu Co., Ltd.) with respect to 100 parts by weight of carborandum is used as a substance to impart water repellency using carborandum having an average particle diameter of 15 µm and a maximum particle diameter of 37 µm. Furthermore, 0.3 wt% of white carbon (Stasil-S; manufactured by Kamishima Chemical Co., Ltd.) having an average particle diameter of 0.03 μm was added to 100 parts by weight of carborandum, and mixed by heating with a Henschel mixer as a fluidity improving agent. To obtain an abrasive.

By sandblasting using this abrasive, the partitions of the PDP were formed, but the partitions could be processed with high accuracy without damage to the partitions. In addition, the blast machine was stopped and restarted smoothly without clogging the nozzle or the like with regard to starting the blast machine after standing overnight.

(Example 5)

Using glass beads having an average particle diameter of 35 µm and a maximum particle diameter of 74 µm, 0.1 wt% of stearic acid (TST: manufactured by Miyoshi Yushi Co., Ltd.) was added to 100 parts by weight of the glass beads as a substance to impart water repellency thereto. Further, as a fluidity improving agent, 0.3 wt% of white carbon (Statyl-S; manufactured by Kamishima Chemical Co., Ltd.) having an average particle size of 0.03 µm was added to 100 parts by weight of glass beads, followed by heating and mixing with a Henschel mixer to prepare an abrasive. Got it.

By sandblasting using this abrasive, the partitions of the PDP were formed. However, the partitions could be processed with high accuracy without any side edges without damaging the partitions. In addition, the blast machine was stopped and restarted smoothly without clogging the nozzle or the like with regard to starting the blast machine after standing overnight.

(Example 6)

Glass beads adjusted to an average particle diameter of 10 µm and a maximum particle diameter of 74 µm were used. As a substance to impart water repellency thereto, stearic acid (TST: manufactured by Miyoshi Yushi Co., Ltd.) is added 3% by weight to 100 parts by weight of glass beads, and further, as a fluidity improver, white carbon (star) having an average particle size of 0.03 µm (star) 2 wt% of Sil-S (manufactured by Kamishima Kakaku Co., Ltd.) was added to 100 parts by weight of the glass beads, followed by heating and mixing with a Henschel mixer to obtain an abrasive.

By sandblasting using this abrasive, the partitions of the PDP were formed, but the partitions could be processed with high accuracy without damaging the partitions. In addition, the blast machine was stopped and restarted smoothly without clogging the nozzle or the like with regard to starting the blast machine after standing overnight.

(Example 7)

A stainless powder adjusted to an average particle diameter of 20 µm and a maximum particle diameter of 52 µm was used. As a substance which imparts water repellency thereto, stearic acid (TST: Miyoshi Yushi Co., Ltd.) was added 0.4% by weight based on 100 parts by weight of stainless steel, followed by heat mixing with a Henschel mixer to obtain an abrasive.

PDP partitions were formed by sandblasting using this abrasive, but the partitions could be processed with high accuracy without damaging the partitions. In addition, there is no phenomenon of mixing into the partition wall peculiar to the metal abrasive material, and the effect of enhancing the separation efficiency between the low melting point glass using magnetic force and the metal abrasive material such as stainless steel is obtained. Moreover, the blast machine was stopped and the blast machine could be restarted smoothly without clogging of the nozzle or the like after starting the blast machine overnight.

(Example 8)

Dense limestone is roasted, digested and carbonated to produce whisker calcium carbonate having a maximum particle size of 75 µm and an average particle diameter of 2 µm, and stearic acid (TST: manufactured by Miyoshi Yushi Co., Ltd.) Whisker-like calcium carbonate particles were added by adding 1.3% by weight to 100 parts by weight of the particle powder and using fumed silica (Leosilyl CP-102: manufactured by Tokuyama Soda Co., Ltd.) having an average particle diameter of 0.05 μm as a fluidity improving agent. 2 weight% of 100 weight parts of powders were added, and the mixture was heated and mixed with a Henschel mixer to obtain an abrasive.

PDP partitions were formed by sandblasting using this abrasive, but the tendency of side edges was observed, and the partitions were partially damaged, and the partition walls were slightly poor in accuracy. It was slightly difficult to restart after the blast machine was stopped and left overnight.

(Comparative Example 1)

Glass beads having an average particle diameter of 60 µm and a maximum particle diameter of 74 µm were used. As a fluidity improving agent, 0.3 weight% of white carbon (Stasil-S: Kamishima Kagaku Co., Ltd.) of 0.03 micrometer of average particle diameter was added with respect to 100 weight part of glass beads, and it heat-mixed by the Henschel mixer and obtained the abrasive.

By sandblasting using this abrasive, the partitions of the PDP were formed, but the partitions collapsed. In addition, in the case of restarting after stopping the blast machine for one night, agglomeration of abrasives occurred in the blast machine and in the vicinity of the nozzle, and restarting was impossible.

(Comparative Example 2)

The glass beads adjusted to the average particle diameter of 10 micrometers and the maximum particle diameter of 105 micrometers were used. As a fluidity improving agent, 2 weight% of white carbon (Stasil-S: Kamishima Kakaku Co., Ltd.) of 0.03 micrometer of average particle diameters were added with respect to 100 weight part of glass beads, and the abrasive material heated and mixed with the Henschel mixer was obtained.

The sandblasting process using this abrasive material formed the partition wall of a PDP, and the site | part which the part of the partition wall collapses generate | occur | produced. In addition, in the case of restarting after stopping the blast machine for one night, agglomeration of abrasives occurred in the blast machine and near the nozzle, and restarting was impossible.

(Comparative Example 3)

Glass beads adjusted to an average particle diameter of 20 µm and a maximum particle diameter of 62 µm were used. 2 wt% of white carbon (Statyl-S: manufactured by Kamishima Chemical Co., Ltd.) having an average particle size of 0.03 µm was added to this, and the mixture was mixed with a Henschel mixer to obtain an abrasive.

The partition formation of PDP was carried out by sandblasting using this abrasive, but the partition was formed, but there was a tendency of side edge. In addition, when the blast machine was stopped and left to stand overnight, agglomeration of abrasives occurred in the blast machine and in the vicinity of the nozzle, and restarting was impossible.

(Comparative Example 4)

Glass beads adjusted to an average particle diameter of 15 µm and a maximum particle diameter of 44 µm were used as the abrasive.

PDP partitions were formed by sandblasting using this abrasive, and a tendency of strong side edges was observed, and partition walls were not formed with high accuracy. In addition, when the blast machine was stopped and restarted overnight, agglomeration of abrasives occurred in the blast machine and near the nozzle, and restarting was impossible.

(Comparative Example 5)

The stainless powder adjusted to 25 micrometers of average particle diameters and 150 micrometers of maximum particle diameters was used as an abrasive.

PDP partitions were formed by sandblasting using this abrasive, and a tendency of side edges was observed, and the partitions were partially damaged and the partitions were not formed accurately. In addition, the phenomenon of the rubbing and adhesion to the partition which is a defect of the metallic abrasive material occurred. Moreover, the separation efficiency between the low melting point glass and the metal abrasive materials such as stainless steel using magnetic force was bad and the low melting point glass could not be reused. It was slightly difficult to restart after the blast machine was stopped and left overnight.

Yes Spherical weapons Hydrophobic Contributor (%) Liquidity improver (%) B average particle diameter (㎛) A maximum particle diameter (㎛) Spherical Index (%) Restartability Machining precision Example 1 Glass beads One 0.5 26 53 98 possible Good Example 2 Glass beads 0.5 One 30 53 98 possible Good Example 3 Alandom 2 0 20 44 96 possible Good Example 4 Caborandom 3 0.3 15 37 97 possible Good Example 5 Glass beads 0.1 0.3 35 74 98 possible Good Example 6 Glass beads 3 2 10 74 99 possible Good Example 7 stainless 0.4 0 20 52 58 possible Good Example 8 Calcium carbonate 1.3 2 2 75 32 Slightly troubled Slightly defective Comparative Example 1 Glass beads 0 0.3 60 74 98 Impossible Incapacity Comparative Example 2 Glass beads 0 2 10 105 98 Impossible Bad Comparative Example 3 Glass beads 0 2 20 62 98 Impossible Slightly defective Comparative Example 4 Glass beads 0 0 15 44 98 Impossible Bad Comparative Example 5 stainless 0 0 25 150 55 Slightly troubled Bad A: Maximum particle diameter of spherical inorganic particles (μm) B: Average particle diameter of spherical inorganic particles (μm) C: Minimum grinding groove width (μm) (Note) 10≤A≤80 (μm) 3≤B≤50 (μm) C = 1000 (μm)

As described above, the abrasive of the present invention is surface-treated with a material that imparts water repellency, thereby effectively preventing troubles such as agglomeration of the abrasive due to moisture, solidification, and adhesion to the workpiece, for example, partition walls of PDP panels. In forming processes, scribing of solar cells, etc., it is useful as an abrasive having high polishing efficiency and processing precision by controlling the maximum particle diameter and the average particle diameter in accordance with the target minimum groove width.

Claims (6)

An abrasive for dry blasting, characterized by surface treatment of a substance that imparts water repellency to spherical inorganic particles. The abrasive for blasting according to claim 1, wherein a fluid improving agent comprising an average particle diameter of one tenth or less of the average particle diameter of the spherical inorganic particles is added by 0.01 to 5% by weight based on the spherical inorganic particles. The abrasive according to claim 1, wherein the spherical inorganic particles satisfy the following formulas (1) to (3). 10 ≤ A ≤ 0.8 C (1) 0.02C ≤B ≤0.5C (2) 50 ≤C ≤1000 (3) only, A: maximum particle diameter (micrometer) of a spherical inorganic particle B: Average particle diameter of the spherical inorganic particles (µm) C: Grinding minimum groove width (㎛) The abrasive according to any one of claims 1 to 3, which is used for removing an oxide film of a semiconductor. The abrasive according to any one of claims 1 to 3, which is used for forming a rib material on the back substrate of the PDP. The abrasive according to any one of claims 1 to 3, which is used for forming a scribe line for series connection of a solar cell element.