JP2002251144A - Filter for display, display device and method for manufacturing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a filter for a display having desired filter characteristics such as a function of shielding against electromagnetic waves, a function to intercept near IR rays and a function to improve the picture quality so that improvements such as a low cost, a lightweight and thin device, panel protective property, workability on failure and increased productivity can be realized, and to provide a display device mounting the filter and a method for manufacturing the device. SOLUTION: The filter for a display is composed of successively stacked layers of a transparent pressure-sensitive adhesive layer (C) 31 containing dyes, a polymer film (B) 20, a transparent conductive layer (D) 10, a transparent pressure-sensitive adhesive layer (E) 40 and a functional transparent layer (A) having antireflection property, hard coating property, gas barrier property, antistatic property and contamination preventing property, and is stuck to the upper face of a display part 00. The transparent conductive layer (D) 10 is grounded to the ground terminal of the display through an electrode 50 and a conductive copper foil pressure-sensitive adhesive tape 80.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a display device such as a plasma display (PDP), a cathode ray tube (CRT), or a liquid crystal display (LCD). The present invention relates to a display filter having a filter characteristic capable of blocking electromagnetic waves and / or a filter characteristic capable of correcting a visible light spectrum, a display device equipped with the filter, and a method of manufacturing the same.

[0002]

2. Description of the Related Art Optoelectronics-related parts and devices have been remarkably advanced and spread with the advancement of information society. Among them, displays have become extremely popular for televisions, personal computers, and the like, and there is a demand for thinner and larger displays. A plasma display has attracted attention as a large thin display. A plasma display generates a strong leakage electromagnetic field and near-infrared rays from a display screen due to its structure and operation principle.

[0003] In recent years, the influence of a leakage electromagnetic field from an electronic device on the human body and other devices has been discussed. For example, the leakage electromagnetic field is referred to as VCCI (Vo) in Japan.
luntary Control Council for Interference by data p
It is necessary to keep within the standard value by rocessing equipment electronic office machine).

Further, near infrared rays from the display screen may act on peripheral electronic devices such as a cordless phone to cause malfunction. Remote control and transmission optical communication use near infrared rays having wavelengths of 820 nm, 880 nm, 980 nm, etc.
It is necessary to suppress light in the wavelength region of 1100 nm to a level at which there is no practical problem.

[0005]

With respect to cutting off near-infrared rays, it has been conventionally known to use a near-infrared absorbing filter made using a near-infrared absorbing dye. However, near-infrared absorbing dyes are susceptible to deterioration due to the environment such as humidity, heat, and light. It tends to cause a change in properties.

In particular, in a plasma display, since near-infrared rays having a high intensity are generated over a wide wavelength range, it is necessary to use a near-infrared absorption filter having a large absorption rate in the near-infrared range over a wide wavelength range. Conventional near-infrared absorption filters have only realized filters with low visible light transmittance.

On the other hand, in order to cut the leakage electromagnetic field, it is necessary to cover the surface of the display screen with a conductive material having high conductivity. As this method, a transparent conductive layer is used, and the transparent conductive layer is roughly classified into a conductive mesh and a transparent conductive thin film. As the conductive mesh, a grounded metal mesh, a synthetic fiber or a metal fiber mesh coated with a metal, or an etching film formed by forming a metal film and then performing an etching treatment in a lattice pattern is used. Although the mesh has high conductivity and excellent electromagnetic wave shielding performance, it is difficult to generate stripes due to light interference and to increase the cost due to poor yield.

There is a method in which a transparent conductive thin film made of a metal thin film, an oxide semiconductor thin film, or the like is used as the electromagnetic wave shielding layer instead of the conductive mesh. Although a metal thin film has good conductivity, a film having high visible light transmittance cannot be obtained due to reflection and absorption of metal over a wide wavelength range.
The oxide semiconductor thin film is superior in transparency to the metal thin film, but is inferior in conductivity and poor in near-infrared reflectivity. As described above, for the transparent conductive layer for the purpose of cutting off the leakage electromagnetic field, a conductive mesh is used when the shielding performance is important, and a transparent conductive thin film is used when the cost is important. Often.

As an attempt to improve the color purity of a display, a method using a dye is disclosed in, for example, JP-A-58-1.
No. 53904, JP-A-60-22102, JP-A-59
221943 and the like. JP-A-58-1
No. 53904 refers to application to a plasma display panel (plasma display panel).

However, in these prior arts, there is no mention of a combination of a transparent conductive layer as an electromagnetic wave shield, which is essential for use in a plasma display panel, and a dye. Nor.

It is conceivable that the plasma display filter is formed separately from the display and installed as a front panel of the display for the purpose of shielding near infrared rays, electromagnetic waves, and protecting the display screen. However, the front plate method has a large number of constituent members and a large number of manufacturing steps, so that the cost increases and it is difficult to reduce the thickness and weight.

Further, since the surface reflection of the plasma display unit is not generally reduced and has the reflectance of the glass substrate, it is difficult to install the front panel away from the display unit from the viewpoint of thermal design. In some cases, the reflected image is doubled or more due to external light reflection on the display surface and external light reflection on the front panel, and the visibility of the display may be reduced. In addition, the plasma display has a characteristic that a bright place contrast is low and a color reproduction range of light emission is narrow due to reflection of glass and reflection of a fluorescent substance on a screen surface.

On the other hand, it is disclosed in Japanese Patent Application Laid-Open No. H10 (1998) that the front plate is removed and an optical film is directly laminated on the display panel.
-156991, JP-A-10-188822, 2000
-98131. However, none of these prior arts specifies the total thickness of the entire transparent polymer film, and no specific reference is made to imparting impact resistance.

On the other hand, in Japanese Patent Application Laid-Open No. 10-211688,
There is a proposal to use an optical film for direct lamination laminated on a transparent polymer sheet having a thickness of 1 mm or more in order to absorb an external impact. However, 1m thick
m or more, it is practically difficult to perform a continuous laminating step from a roll form or directly laminating to a display, and even in the examples, a 3 mm thick acrylic sheet is laminated. It is clear that this is intended to improve a pasted filter of the pasting type.

In general, a transparent polymer film having various functions in the field of application of the present invention is used in the form of a roll.
100 μm is used. Therefore, when two transparent polymer films having a function are simply pasted together, the total thickness is less than 0.3 mm. As the anti-reflection film, a film having a thickness of 188 μm is used, but the base film is made of polyethylene terephthalate (P).
ET), and preferably used base film thickness 8
Since the antireflection property is inferior to that of 0 μm triacetylcellulose (TAC), it is not actively used for laminating films.

Further, when a film is directly attached to the display panel main body, the display itself is expensive, so that a film peeling treatment upon occurrence of a defect is indispensable. This workability is mentioned in the above-mentioned prior patent. Not. In addition, film bonding to displays has already been implemented on liquid crystal displays and flat TVs, but plasma displays require a greater force to peel than existing displays due to the large area. Therefore, there is a problem in work, such as troublesome work and adhesive residue on the display surface.

Further, in the electromagnetic wave shield, it is necessary to obtain continuity between the transparent conductive layer and the outside by using an electrode for extracting the electromagnetic wave as a current to the outside. As a method, when bonding a film on a transparent conductive layer for the purpose of protection or the like, bonding is performed such that the layer is partially exposed around the filter, and this portion is used as an electrode to conduct electricity to the outside. Site. Heretofore, an electromagnetic wave shield obtained by affixing a film to a front plate has been connected to the outside by this method. As a method for exposing the transparent conductive layer, a method has been used in which the area of the film bonded on the transparent conductive layer is slightly smaller than the area of the transparent conductive layer.

According to this method, a film having a transparent conductive layer is first adhered to a rigid plate or the like with a single sheet, and then a protective film having a smaller area is adhered with a single sheet. Since work is required, there is a problem in productivity.

Conventionally, in an electromagnetic wave shield obtained by attaching a film to a front plate, electrodes are provided on the entire circumference. If this method is used, it is necessary to perform the electrode forming operation on a single wafer, and there is a problem in productivity.

In view of the above-mentioned prior art, an object of the present invention is to have desired filter characteristics such as electromagnetic wave shielding ability, near-infrared ray cutting ability, image quality improving ability, low cost, light weight and thinness, panel protection, and occurrence of defects. It is an object of the present invention to provide a display filter capable of improving workability and productivity at the time of display, a display device equipped with the filter, and a method of manufacturing the same.

[0021]

The present inventors have conducted intensive studies to solve the above-mentioned problems. As a result, 1) To shield extremely intense electromagnetic waves generated from a plasma display, a sheet resistance is required. A transparent conductive layer of 0.01 to 30 Ω / □ is required. 2) By forming an electromagnetic wave shielding body having such a transparent conductive layer directly on the surface of a plasma display, electromagnetic wave shielding ability and near infrared ray cutting ability ,
A display device using a plasma display having excellent image, visibility, and cost can be obtained. 3) It has a specific layer structure, contains a dye, and has a visible light transmittance of 30 to 85.
% By directly forming the light control film on the display surface, it is possible to obtain a display device using a display with excellent image, visibility, and cost. 4) The total of the transparent polymer film constituting the optical filter The thickness is 0.3mm or more, and it is directly bonded to the front of the display to achieve both light weight and thinness and panel protection as well as improved workability. 5) Limit the electrode formation position However, for example, in the case of a rectangular optical filter, the electrodes can be formed by a roll-to-roll method having high production efficiency by forming electrodes only on a pair of two opposing sides and devising the shape of the electrodes. , And the like, leading to the present invention.

The present invention relates to a display filter which can be adhered to a display screen and has predetermined filter characteristics, and is provided on the outside air side and has a functional transparent layer (A) having an antireflection property and / or an antiglare property. ) And a transparent adhesive layer (C) provided on the display side for bonding to the screen
And a polymer film (B) provided as a substrate between the functional transparent layer (A) and the transparent adhesive layer (C).

Further, the present invention is provided between the functional transparent layer (A) and the polymer film (B) and / or between the polymer film (B) and the transparent adhesive layer (C). .01
It is preferable to provide a transparent conductive layer (D) having a sheet resistance of ３０30 Ω / □.

In the present invention, it is preferable that part or all of the transparent conductive layer (D) is formed of a conductive mesh.

Further, in the present invention, the transparent conductive layer (D) is formed two to four times by using a combination (Dt) / (Dm) of a high refractive index transparent thin film layer (Dt) and a metal thin film layer (Dm) as a repeating unit. It is preferable that the layers are repeatedly laminated, and a high refractive index thin film layer (Dt) is further laminated thereon.

Further, according to the present invention, at least one of the plurality of high-refractive-index transparent thin film layers (Dt) is formed of an oxide mainly containing at least one of indium, tin and zinc. Is preferred.

Further, the present invention provides a method for manufacturing a semiconductor device comprising a plurality of metal thin film layers (Dm).
Preferably, at least one of the layers is formed of silver or a silver alloy.

In the present invention, it is preferable that the functional transparent layer (A) further has at least one of a hard coat property, an antistatic property, an antifouling property, a gas barrier property and an ultraviolet ray cutting property.

In the present invention, it is preferable that an adhesive layer (E) is provided between the functional transparent layer (A) and the polymer film (B).

In the present invention, a hard coat layer (F) is preferably formed on both sides or one side of the polymer film (B).

The present invention also relates to a functional transparent layer (A), a polymer film (B), a transparent adhesive layer (C), a transparent conductive layer (D), an adhesive layer (E) and a hard coat layer (F). It is preferable that at least one layer contains one or more dyes.

In the present invention, a dye having an absorption maximum in a wavelength range of 570 to 605 nm is preferably contained.

In the present invention, the dye is preferably a tetraazaporphyrin compound.

In the present invention, the tetraazaporphyrin compound is preferably a compound represented by the following chemical formula (1).

[0035]

Embedded image

(Wherein A ^{1 to} A ⁸ each independently represent a hydrogen atom, a halogen atom, a nitro group, a cyano group, a hydroxy group, a sulfonic acid group, an alkyl group having 1 to 20 carbon atoms, a halogenoalkyl group, an alkoxy group, A group, an alkoxyalkyl group, an aryloxy group, a monoalkylamino group, a dialkylamino group, an aralkyl group, an aryl group, a heteroaryl group, an alkylthio group, or an arylthio group;
A ¹ and A ² , A ³ and A ⁴ , A ⁵ and A ⁶ , A ⁷ and A ⁸ may each independently form a ring excluding an aromatic ring via a linking group, and M is two A hydrogen atom, a divalent metal atom, a trivalent mono-substituted metal atom, a tetravalent di-substituted metal atom, or an oxy metal atom. Also, the present invention provides a wavelength of 800 to 1100 nm.
It is preferable that a near-infrared absorbing dye having an absorption maximum is contained in the range described above.

In the present invention, the visible light reflectance on the surface of the functional transparent layer (A) is preferably 2% or less.

The present invention preferably has a visible light transmittance of 30 to 85%. In addition, the present invention also provides a
It is preferable that the transmittance minimum at 0 to 1100 nm is 20% or less.

In the present invention, the total thickness of the polymer film in the whole filter is preferably 0.3 mm or more.

Further, the present invention preferably comprises a polymer film for increasing the thickness, which can contain a dye.

In the present invention, it is preferable that an electrode electrically connected to the transparent conductive layer (D) is formed.

Further, in the present invention, it is preferable that an electrode electrically connected to the transparent conductive layer (D) is continuously formed along the circumferential direction on the periphery of the filter.

In the present invention, it is preferable that an electrode is formed on a part of the conductive portion that is exposed. Further, in the present invention, it is preferable that the filter has a rectangular shape and electrodes are formed around two opposing peripheral portions.

In the present invention, it is preferable that an electrode electrically connected to the transparent conductive layer (D) is formed on the peripheral end surface of the filter.

Further, according to the present invention, a communication hole communicating with at least the transparent conductive layer (D) from the outermost surface along the thickness direction of the filter is formed, and the transparent conductive layer (D) is formed inside the communication hole.
It is preferable to form an electrode that is electrically connected to the electrode.

In the present invention, it is preferable that a conductive tape is interposed between the transparent conductive layer (D) and a layer adjacent thereto.

According to the present invention, there is provided a display device comprising a display for displaying an image, and the above-described display filter provided on the display screen.

The present invention also relates to a step of bonding the above-mentioned filter for display to a display screen of a display device via a transparent adhesive layer (C), and a method of bonding a ground conductor of the display device and an electrode of the transparent conductive layer (D). And a step of electrically connecting the display device.

According to the present invention, a laminated filter including a polymer film (B), a transparent conductive layer (D), and a transparent adhesive layer (C) is provided on a display screen of a display device via the transparent adhesive layer (C). A bonding step, and an anti-reflection property and / or directly on the laminated filter or via a second adhesive layer.
Alternatively, a method for manufacturing a display device, comprising a step of arranging a functional transparent layer (A) having an antiglare property and a step of electrically connecting a ground conductor and a transparent conductive layer (D) of the display apparatus. It is.

Further, according to the present invention, there is provided a step of arranging an adhesive layer on a display screen of a display device, a function of a polymer film (B), a transparent conductive layer (D), and an antireflection property and / or an antiglare property. A display device comprising: a step of bonding a laminated filter including a transparent conductive layer (A) via the adhesive layer; and a step of electrically connecting a ground conductor of the display device to the transparent conductive layer (D). It is a manufacturing method of.

Further, according to the present invention, a step of disposing an adhesive layer on a display screen of a display device comprises the steps of:
And a step of bonding a laminated filter including the transparent conductive layer (D) via the adhesive layer, and an anti-reflection property and / or directly or via a second adhesive layer on the laminated filter.
Alternatively, a method for manufacturing a display device, comprising a step of arranging a functional transparent layer (A) having an antiglare property and a step of electrically connecting a ground conductor and a transparent conductive layer (D) of the display apparatus. It is.

[0052]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A display filter according to the present invention comprises a dye having an absorption maximum in a wavelength range of 570 to 605 nm, thereby having a filter characteristic for correcting a visible light spectrum of a display screen. Function as

Further, the display filter according to the present invention has a transparent conductive layer having a sheet resistance of 0.01 to 30 Ω / □, and thus functions as an electromagnetic wave shield having a filter characteristic of blocking electromagnetic waves from the display screen. .

The display filter according to the present invention comprises a near infrared absorbing dye having an absorption maximum in a wavelength range of 800 to 1100 nm, thereby having a filter characteristic of blocking near infrared light from a display screen. Act as a filter.

By directly attaching a display filter having these functions to a display surface of a plasma display or the like, improvements such as low cost, light weight and thinness, panel protection, workability at the time of occurrence of trouble, and improvement in productivity can be achieved. Can be achieved.

The electromagnetic wave shield according to the present invention comprises at least a transparent conductive layer (D) having a sheet resistance of at least 0.01 to 30 Ω / □ formed on one main surface of a polymer film (B), It has a transparent adhesive layer (C) formed on the other main surface of the film (B), and is further formed on the transparent conductive layer (D) with a conductive portion and directly or via the transparent adhesive layer. It has a functional transparent layer (A).

Further, the electromagnetic wave shield according to the present invention comprises:
At least a transparent conductive layer (D) having a sheet resistance of 0.01 to 30 Ω / □ formed on one main surface of the polymer film (B), and a transparent conductive layer (D) formed on the other main surface of the polymer film (B). It has a functional transparent layer (A) formed, and further has a conductive adhesive layer and a transparent adhesive layer (C) on the transparent conductive layer (D).

Further, the electromagnetic wave shield according to the present invention comprises:
At least a polymer film (B), a transparent conductive layer (D) having a sheet resistance of at least 0.01 to 30 Ω / □ and a transparent adhesive layer (C) formed on one main surface of the polymer film (B). And a functional transparent layer (A) formed on the other main surface of the polymer film (B).

The light control film according to the present invention has at least the polymer film (B) and the antireflection property and / or the antiglare property formed on one main surface of the polymer film (B). A functional transparent layer (A), and a transparent adhesive layer (C) formed on the other main surface of the polymer film (B)
Having a dye, and having a visible light transmittance of 55 to 55.
90%.

1. Polymer Film (B) The polymer film (B) functions as a base of the filter, and is, for example, a base for forming the transparent conductive layer (B). In addition, the display filter of the present invention is directly on the display surface. Since it is formed, a transparent polymer film is used.

The polymer film (B) only needs to be transparent in the visible wavelength region. Specifically, polyethylene terephthalate, polyether sulfone, polystyrene, polyethylene naphthalate, polyarylate,
Polyether ether ketone, polycarbonate, polyethylene, polypropylene, polyamide such as nylon 6, polyimide, cellulose resin such as triacetyl cellulose, polyurethane, fluorine resin such as polytetrafluoroethylene, vinyl compound such as polyvinyl chloride,
Polyacrylic acid, polyacrylic acid ester, polyacrylonitrile, addition polymer of vinyl compound, vinylidene compound such as polymethacrylic acid, polymethacrylic acid ester, polyvinylidene chloride, vinylidene fluoride / trifluoroethylene copolymer, ethylene / acetic acid Examples thereof include, but are not limited to, copolymers of vinyl compounds or fluorine compounds such as vinyl copolymers, polyethers such as polyethylene oxide, epoxy resins, polyvinyl alcohol, polyvinyl butyral, and the like.

The polymer film usually has a thickness of 10 to 25.
0 μm. If it is too thin, it is difficult to form the filter directly on the display surface, limiting flexibility.
Therefore, the thickness of the polymer film (B) is preferably 50 μm or more, and more preferably 75 μm or more. On the other hand, if the thickness is 250 μm or more, the flexibility may be insufficient, and the film may not be suitable for use by being wound on a roll.
In the field where high transparency is required as in the field of the present invention, a polymer film having a thickness of about 100 μm is widely used.

The transparent polymer film used in the present invention has flexibility, and a transparent conductive film can be continuously formed by a roll-to-roll method.
A long and large-area transparent laminate can be produced. Further, the film-like filter can be easily formed directly on the display surface by lamination. Further, a filter having a polymer film as a base directly bonded to the display surface is preferable because it can prevent glass scattering when the substrate glass of the display is broken.

In the present invention, the polymer film (B)
The surface of the, sputtering, corona treatment, flame treatment, ultraviolet irradiation, etching treatment such as electron beam irradiation,
The adhesion of the transparent conductive layer (D) formed thereon to the polymer film (B) may be previously improved by the undercoating treatment. In addition, an inorganic layer such as an arbitrary metal may be formed between the polymer film (B) and the transparent conductive layer (D). A dustproof treatment such as sonic cleaning may be performed.

In order to improve the scratch resistance of the transparent laminate, a hard coat layer (F) may be formed on at least one main surface of the polymer film (B).

2. Hard coat layer (F) As the hard coat film to be the hard coat layer (F),
A thermosetting or light-curing resin such as an acrylic resin, a silicone resin, a melamine resin, a urethane resin, an alkyd resin, and a fluorine resin is exemplified, but the type and forming method are not particularly limited. The thickness of these films is 1-1.
It is about 00 μm. The hard coat layer (F) may contain one or more dyes described below.

3. Transparent conductive layer (D) In the electromagnetic wave shield of the present invention, the polymer film (B)
A transparent conductive layer (D) is formed on one of the main surfaces. The transparent conductive layer (D) in the present invention is a transparent conductive film composed of a single layer or a multilayer thin film. In addition, in this invention, what formed the transparent conductive layer (D) on the main surface of the polymer film (B) is called transparent laminated body (H).

Examples of the single-layer transparent conductive film include a conductive mesh such as the above-described metal mesh and a conductive lattice pattern film, and a transparent conductive thin film such as a metal thin film and an oxide semiconductor thin film.

As a multilayer transparent conductive film, there is a multilayer thin film in which a metal thin film and a high refractive index transparent thin film are laminated. A multilayer thin film consisting of a metal thin film and a high-refractive-index transparent thin film is formed by the conductivity of a metal such as silver and the near-infrared reflection characteristics of its free electrons, and the prevention of the reflection of the metal in a certain wavelength region by the high-refractive-index transparent thin film. , Conductivity, near infrared cut ability,
It has favorable characteristics in any of visible light transmittance.

In order to obtain a display filter having an electromagnetic wave shielding ability and a near-infrared cut ability, a metal thin film and a high refractive index transparent thin film having high conductivity for absorbing electromagnetic waves and many reflection interfaces for reflecting electromagnetic waves are required. A laminated multilayer thin film is preferred.

Incidentally, in VCCI, the radiated electric field strength is 50 dBμV in Class A which indicates the regulation value for business use.
/ M, and less than 40 dBμV / m in Class B, which indicates a regulation value for consumer use. However, the radiated electric field intensity of the plasma display exceeds 40 dBμV / m in a 20-inch diagonal type and exceeds 50 dBμV / m in a diagonal 40-inch type in a 20-90 MHz band. For this reason,
It cannot be used for home use as it is.

The radiated electric field strength of the plasma display is
As the size of the screen and the power consumption increase, an electromagnetic wave shielding material which is strong and has a high shielding effect is required.

As a result of intensive studies, the present inventors have found that the transparent conductive layer (D) must have a transparent conductive layer (D) in order to have a high visible light transmittance and a low visible light reflectance, as well as an electromagnetic wave shielding property required for a plasma display. Resistance 0.01 to 30Ω / □, more preferably 0.1 to 15Ω / □, further preferably 0.1
It has been found that it is necessary to have a low-resistance conductivity of about 5 Ω / □. The visible light transmittance and the visible light reflectance in the present invention are defined as J from the wavelength dependence of the transmittance and the reflectance.
Calculated according to IS (R-3106).

In order to block the near-infrared light emitted from the plasma display to a level that does not pose a practical problem, the present inventors set the minimum light transmittance in the near-infrared wavelength region of 800 to 1100 nm of the display filter to 20. % Or less, and in order to satisfy this requirement, the transparent conductive layer itself must have near-infrared cut properties due to the requirement of reducing the number of members and the limit of near-infrared absorption using dyes. Was found. In order to cut off near infrared rays by the transparent conductive layer, reflection by free electrons of metal can be used.

When the metal thin film layer is thick, the visible light transmittance is low, and when the metal thin film layer is thin, the reflection of near infrared rays is weak. However, the visible light transmittance is increased and the overall thickness of the metal thin film layer is increased by stacking one or more layers of a laminated structure in which a metal thin film layer of a certain thickness is sandwiched between high refractive index transparent thin film layers. Is possible. Further, by controlling the number of layers and / or the thickness of each layer, the visible light transmittance, the visible light reflectance, the transmittance of near-infrared light, the transmitted color, and the reflected color can be changed within a certain range. .

In general, when the visible light reflectance is high, the reflection of a lighting device or the like on the screen becomes large, the effect of preventing reflection on the display unit surface is reduced, and the visibility and contrast are reduced. The reflection colors are white, blue,
An inconspicuous purple color is preferred. from these things,
The transparent conductive layer is preferably a multilayer laminate that is easy to design and control optically.

In the electromagnetic wave shield of the present invention, it is preferable to use a transparent laminate (H) in which a transparent conductive layer (D) of a multilayer thin film is formed on one main surface of the polymer film (B).

The transparent conductive layer (D) preferred in the present invention
Are (D) a high refractive index transparent thin film layer (Dt) and a metal thin film layer (Dm) in this order on one main surface of the polymer film (B).
t) / (Dm) is repeated 2 to 4 times as a repeating unit, and further, at least a high-refractive-index transparent thin film layer (Dt) is further laminated thereon, and the transparent conductive layer has a sheet resistance of 0.1. ~ 5Ω / □, low resistance for electromagnetic wave shielding ability, near infrared cut ability, transparency,
Has excellent visible light reflectance. In the present invention, unless otherwise specified, the multilayer thin film means a transparent conductive film having a multilayer structure in which a metal thin film layer is sandwiched between high-refractive-index transparent thin film layers in one or more layers.

In the transparent conductive layer of the present invention, the number of repeated laminations is preferably 2 to 4 times. That is, the transparent laminate (D) of the present invention in which the transparent conductive layer is laminated on the main surface of the polymer film (B) is (B) / (Dt) / (Dm) / (D
t) / (Dm) / (Dt) or (B) / (Dt)
/ (Dm) / (Dt) / (Dm) / (Dt) / (Dm)
/ (Dt) or (B) / (Dt) / (Dm) /
(Dt) / (Dm) / (Dt) / (Dm) / (Dt) /
It has a layer configuration of (Dm) / (Dt). If the number of repetitive laminations is 5 or more, the limitation of the production apparatus and the problem of productivity increase, and the visible light transmittance tends to decrease and the visible light reflectance tends to increase. Also, if the number of repetitions is one, low resistance, near infrared cut ability,
It is difficult to make visible light reflectance sufficient at the same time.

In a multilayer thin film having two to four repetitions, the near-infrared cut ability, the visible light transmittance, and the visible light reflectivity must be simultaneously set to the characteristics suitable for the plasma display by the sheet resistance. The present inventors have found that is 0.1 to 5 Ω / □.

It is assumed that the intensity of electromagnetic waves emitted from the plasma display will decrease in the future.
In that case, the sheet resistance of the electromagnetic wave shielding body is 5 to 15 Ω /
It is expected that even □ can obtain sufficient electromagnetic wave blocking characteristics. It is also assumed that the intensity of electromagnetic waves emitted from the plasma display is further reduced. In that case, the sheet resistance of the electromagnetic wave shield is 15 to 30Ω / □.
However, it is expected that sufficient electromagnetic wave blocking characteristics can be obtained. On the other hand, as another viewpoint from the intensity of the emitted electromagnetic wave, when the plasma display is required to have a larger screen and thinner, the surface resistance of the electromagnetic wave shield may be required to be 0.01 to 1Ω / □. is assumed.

As a material for the metal thin film layer (Dm), silver is preferable because it has excellent conductivity, infrared reflectivity, and visible light transmittance when laminated in multiple layers. But,
Silver lacks chemical and physical stability, pollutants in the environment,
Since it is deteriorated by water vapor, heat, light, etc., alloys in which one or more environmentally stable metals such as gold, platinum, palladium, copper, indium, and tin are added to silver, and metals that are stable in these environments can also be suitably used. . In particular, gold and palladium are preferable because of their excellent environmental resistance and optical properties.

The silver content in the silver-containing alloy is not particularly limited, but is preferably not significantly different from the conductivity and optical properties of the silver thin film.
It is less than about 0% by weight. However, if another metal is added to silver, its excellent electrical conductivity and optical properties are impaired. Therefore, when having a plurality of metal thin film layers, at least one of the layers should not be alloyed with silver if possible. It is desirable to use it and to alloy only the first metal layer and / or the outermost metal thin film layer as viewed from the substrate.

The thickness of the metal thin film layer (Dm) is determined optically and experimentally from the viewpoint of conductivity, optical characteristics, etc., and is not particularly limited as long as the transparent conductive layer has the required characteristics. It is necessary that the thin film has a continuous state instead of an island structure from the viewpoint of properties and the like, and it is desirable that the thickness be 4 nm or more. Further, if the metal thin film layer is too thick, transparency becomes a problem. When there are a plurality of metal thin film layers, each layer is not necessarily all the same thickness, and all silver,
Alternatively, the alloys may not be the same alloy containing silver.

As the method of forming the metal thin film layer (Dm), any of the conventionally known methods such as sputtering, ion plating, vacuum deposition, plating and the like can be adopted.

The transparent thin film forming the high refractive index transparent thin film layer (Dt) is not particularly limited as long as it has transparency in the visible region and has an effect of preventing light reflection in the visible region of the metal thin film layer. However, a material having a high refractive index to visible light of 1.6 or more, preferably 1.8 or more, more preferably 2.0 or more is used. Specific materials for forming such a transparent thin film include indium, titanium, zirconium, bismuth, tin, zinc, antimony, tantalum, cerium,
Examples include oxides of neodymium, lanthanum, thorium, magnesium, gallium, and the like, a mixture of these oxides, and zinc sulfide.

These oxides or sulfides are composed of a metal,
Even if there is a deviation in the stoichiometric composition with an oxygen atom or a sulfur atom, it is acceptable as long as the optical characteristics are not largely changed. Among them, zinc oxide, titanium oxide, indium oxide and a mixture of indium oxide and tin oxide (I
TO) has a high film formation rate in addition to transparency and refractive index,
It can be suitably used because of good adhesion to the metal thin film layer.

The thickness of the high refractive index transparent thin film layer (Dt) depends on the optical properties of the polymer film (B) (also referred to as a transparent substrate),
The thickness of the metal thin film layer, optical properties, and optically designed and experimentally determined from the refractive index of the transparent thin film layer and the like, although not particularly limited, it is preferably 5 nm or more, 200 nm or less, More preferably 10 nm or more, 1
00 nm or less. In addition, the first layer of the high refractive index transparent thin film ...
The (n + 1) th layer (n ≧ 1) is not limited to the same thickness and may not be the same transparent thin film material.

As a method for forming the high refractive index transparent thin film layer (Dt), any of conventionally known methods such as sputtering, ion plating, ion beam assist, vacuum deposition, and wet coating can be employed.

In order to improve the environmental resistance of the transparent conductive layer (D), an optional organic or inorganic protective layer is provided on the surface of the transparent conductive layer to such an extent that conductivity and optical properties are not significantly impaired. Is also good. In addition, in order to improve the environmental resistance of the metal thin film layer and the adhesion between the metal thin film layer and the high refractive index transparent thin film layer, the conductivity and optical characteristics between the metal thin film layer and the high refractive index transparent thin film layer are improved. Arbitrary inorganic layers may be formed to the extent that they are not damaged. These specific materials include copper, nickel, chromium, gold, platinum, zinc, zirconium, titanium,
Tungsten, tin, palladium and the like, or alloys composed of two or more of these materials are mentioned. Its thickness is preferably about 0.2 nm to 2 nm.

In order to obtain a transparent conductive layer (D) having desired optical characteristics, a transparent polymer film (D) is required in consideration of the conductivity for shielding electromagnetic waves to be obtained, that is, the metal thin film material and thickness. B) and perform an optical design using a vector method using the optical constants (refractive index, extinction coefficient) of the thin film material, a method using an admittance diagram, and the like, and determine the thin film material, the number of layers, the film thickness, etc. of each layer. . At this time, it is good to consider an adjacent layer formed on the transparent conductive layer (D). This is because the incident medium of light to the transparent conductive layer formed on the transparent polymer film (B) is different from the incident medium having a refractive index of 1, such as air or vacuum, so that the transmitted color (and the transmittance and the reflected color) are different. , Reflectance). That is, when the functional transparent layer (A) is formed on the transparent conductive layer (D) via the transparent adhesive layer (C), a design is performed in consideration of the optical constant of the transparent adhesive layer (C). In the case where the functional transparent layer (A) is directly provided on the transparent conductive layer (D), a design is performed in consideration of the optical constant of a material in contact with the transparent conductive layer (D).

As described above, by designing the transparent conductive layer (D), in the high refractive index transparent thin film layer (Dt), the lowermost layer and the uppermost layer as viewed from the polymer film (B) are higher than the layers between them. In the metal thin film layer (Dm), the lowermost layer is thinner than the other layers when viewed from the polymer film (B), and has a refractive index of 1.45 to 1.65 and a extinction coefficient of almost 0 to 10 to 50.
When the pressure-sensitive adhesive of μm was the adjacent layer, it was found that the reflection of the transparent laminate did not significantly increase, that is, the increase in interfacial reflection due to the formation of the adjacent layer was 2% or less.

In particular, when the number of repetitions is three, that is, in the transparent conductive layer composed of a total of seven layers, if the second middle layer of the three metal thin film layers (Dm) is thicker than the other layers, the above-described case will be described. It has been found that when the adhesive is an adjacent layer, the reflection of the transparent laminate does not increase significantly.

The optical constant can be measured by ellipsometry (ellipsometry) or Abbe refractometer, and the film can be formed by controlling the number of layers and the film thickness while observing the optical characteristics. .

The atomic composition of the transparent conductive layer formed by the above method is determined by Auger electron spectroscopy (AES), inductively coupled plasma (ICP), Rutherford backscattering (RB).
S) and the like. The layer configuration and film thickness are
It can be measured by observation in the depth direction of Auger electron spectroscopy, cross-sectional observation with a transmission electron microscope, or the like.

The film thickness is controlled by clarifying the relationship between the film forming conditions and the film forming speed in advance and by monitoring the film thickness during the film formation using a quartz oscillator or the like. .

In addition to the above-described method using a transparent conductive thin film, there is also a method using a conductive mesh as a transparent conductive layer. The following single-layer metal mesh will be described as an example of the conductive mesh, but the conductive mesh in the present invention is not limited to this.

A single-layer metal mesh is generally formed by forming a copper mesh layer on a polymer film. Usually, a copper foil is stuck on a polymer film and then processed into a mesh shape.

As the copper foil used in the present invention, both rolled copper and electrolytic copper can be used, but a porous metal layer is preferably used, and the pore size is preferably 0.5 to 5 μm, more preferably, It is 0.5 to 3 μm, more preferably 0.5 to 1 μm. If the hole diameter is larger than this, patterning may be hindered. If the hole diameter is smaller than this, it is difficult to expect an improvement in light transmittance. The porosity of the copper foil is 0.01 to 2
The range of 0% is preferable, and more preferably 0.02%.
5%. The porosity in the present invention is a value defined by P / R, where P is a pore volume and R is a volume. For example, when the pore volume of a copper foil corresponding to a volume of 0.1 cc was measured by mercury porosity, it was 0.001.
If it is cc, the porosity can be said to be 1%. The copper foil used may be subjected to various surface treatments. Specifically, chromate treatment,
Surface treatment, pickling, zinc / chromate treatment, etc.

The thickness of the copper foil is preferably 3 to 30 μm, more preferably 5 to 20 μm, and further preferably 7 to 10 μm.
μm. If the thickness is larger than this, there is a problem that etching takes time. If the thickness is smaller than this, there is a problem that the electromagnetic wave shielding performance is inferior.

The aperture ratio of the light transmitting portion is not less than 60% and 95%
Or less, more preferably 65% or more and 90% or less, even more preferably 70% or more and 85% or less. The shape of the opening is not particularly limited,
It has a regular triangle, a regular square, a regular hexagon, a circle, a rectangle, a rhombus and the like, and is preferably arranged in a plane. It is preferable that a typical size of the opening of the light transmitting portion is one side or a diameter in a range of 5 to 200 μm. More preferably, it is 10 to 150 μm. If this value is too large, the electromagnetic wave shielding ability will be reduced, and if it is too small, the image on the display will be adversely affected. In addition, the width of the metal in the portion where the opening is not formed is 5 to 5.
50 μm is preferred. That is, the pitch is 10 to 250
μm is preferred. If the width is smaller than this, processing becomes extremely difficult. On the other hand, if the width is larger, the image is undesirably affected.

The substantial sheet resistance of a metal layer having a light transmitting portion is defined as a four-terminal method using an electrode that is at least five times as large as the above pattern and having an electrode spacing at least five times as large as the repeating unit of the above pattern. It refers to the sheet resistance measured more. For example, when the opening is a square having a side of 100 μm and a metal layer having a width of 20 μm and regularly arranged squares, the measurement can be performed by arranging electrodes of φ1 mm at an interval of 1 mm. Alternatively, the patterned film is processed into a strip shape, electrodes are provided at both ends in the longitudinal direction, and the resistance is measured (R). Sheet resistance = R × b /
a. The value measured in this way is
It is preferably from 0.01 Ω / □ to 0.5 Ω / □, more preferably from 0.05 Ω / □ to 0.3 Ω / □. If an attempt is made to obtain a value smaller than this value, the film becomes too thick and an opening cannot be sufficiently formed. On the other hand, if the value is set to a value larger than this, sufficient electromagnetic wave shielding performance cannot be obtained.

As a method of laminating a silver foil on a polymer film, a transparent adhesive is used. Examples of the type of the adhesive include an acrylic type, a urethane type, a silicone type, and a polyester type, but there is no particular limitation on the adhesive. Two-part and thermosetting types are preferably used. Preferably, the adhesive is excellent in chemical resistance. After applying the adhesive to the polymer film, the adhesive can be attached to the silver foil, or the adhesive may be attached to the silver foil.

As a method of forming the light transmitting portion, a printing method or a photoresist method can be used. In the printing method, a method of forming a pattern on a mask layer by a screen printing method using a printing resist material is generally used. In the method using a photoresist material, a roll coating method,
A photoresist material is solidly formed on a metal foil by a spin coating method, a full printing method, a transfer method, or the like, and is exposed and developed using a photomask to pattern the resist. After the completion of the resist patterning, the metal portion serving as the opening is removed by wet etching, whereby a metal mesh having a light transmitting portion with a desired opening shape and opening ratio can be obtained.

4. Transmission characteristics The visible light transmittance in the light-transmitting part of the electromagnetic wave shield is
30-85% is preferred. More preferably 50 to 80%
It is. If it is less than 30%, the luminance is too low, and the visibility deteriorates. Further, in order to obtain a contrast, it may be required that it is 85% or less, preferably 80% or less.

In the light control film, the visible light transmittance is preferably 55 to 90%. More preferably, 6
0 to 85%. If it is less than 55%, the luminance is too low and visibility is poor. Further, in order to obtain a contrast, it may be required to be 85% or less, preferably 80% or less.

In the present invention, the visible light transmittance (T
vis) and visible light reflectance (Rvis) are calculated according to JIS (R-3106) from the wavelength dependence of transmittance and reflectance.

5. Color characteristics and pigments By the way, in the transmission color of the display filter,
When the yellowish green to greenish color is strong, the contrast of the display is reduced, the color purity is reduced, and the white display may be greenish. This is because light having a wavelength of about 550 nm, which is yellowish green to green, has the highest visibility.

A multilayer thin film is generally inferior in transmission color tone when importance is placed on visible light transmittance and visible light reflectance. The higher the electromagnetic wave shielding ability, that is, the conductivity, and the near infrared cut ability,
The total thickness of the metal thin film needs to be large. However, as the total thickness of the metal thin film increases, the color tends to be green to yellowish green. Therefore, the electromagnetic wave shield used for the plasma display is required to have a transmission color of neutral gray or blue gray. This is due to a decrease in contrast due to strong green transmission, a weak blue emission compared to red and green emission colors, and a preference for white having a slightly higher color temperature than standard white. in addition,
Regarding the transmission characteristics of the electromagnetic wave shield, it is desirable that the chromaticity coordinates of the white display of the plasma display be as close as possible to the locus of the black body.

When a multilayer thin film is used for the transparent conductive layer (D), it is important to correct the color tone of the multilayer thin film so that the transmission color of the electromagnetic wave shield is neutral gray or blue gray. To correct the color tone, a dye that absorbs in the visible wavelength region may be used. For example, a transparent conductive layer (D)
If the transmitted color has a green tint, it is corrected to gray using a red dye, and if the transmitted color has a yellow tint, it is corrected using blue to purple dye.

In a color plasma display, a rare gas
Excited by vacuum ultraviolet light generated by DC or AC discharge
(Y, Gd, Eu) BO that emits light_ThreeRed light emitting phosphor such as (Z
n, Mn) _TwoSiO_FourSuch as green (Green) luminescent phosphor, (Ba, Eu) MgAl
_TenO₁₇: Blue light-emitting phosphor such as Eu constitutes the pixel
Is formed in the display cell. Phosphors are available in addition to color purity.
Coating properties on the discharge cells, short afterglow time, luminous efficiency,
Fluorescence that has been selected using thermal properties etc. as an index and is in practical use
Many bodies need improvement in their color purity. Especially red
The emission spectrum of the photophosphor is from 580 nm to 70 nm.
Showing several emission peaks extending to about 0 nm.
And the relatively strong emission peak on the short wavelength side is yellow to orange.
Because it is a color emission, the red emission has a color purity close to orange
There is a problem that it is not good. Xe for noble gas
When a mixed gas of Ne and Ne is used, light emission in the Ne excited state is reduced.
Orange light emission by sum also reduces color purity.
U. In addition, the peaks of green light emission and blue light emission
The position of the wavelength and the broadening of the emission are factors that lower the color purity.
Has become.

The high color purity is determined, for example, in a coordinate system representing hue and saturation by the horizontal axis chromaticity x and the vertical axis chromaticity y defined by the International Commission on Illumination (CIE). It can be represented by the size of the color reproduction range indicated by the size of the triangle.
Due to the low color purity, the color reproduction range of plasma display emission is based on NTSC (National Television System Committee).
tee) It is usually narrower than the color reproduction range indicated by the chromaticity of RGB three colors defined by the method.

Further, in addition to seepage of light emission between display cells, light emission of each color contains unnecessary light over a wide range. This is also a factor that lowers the contrast of images. Further, a plasma display generally has a lower contrast in a bright state in which external light due to room illumination or the like is present than in a dark state. This occurs because the substrate glass, the phosphor, and the like reflect external light, and unnecessary light does not make necessary light stand out. The contrast ratio of the plasma display panel is 100 to 200 in the hint, and 10 to 30 in the bright state with the ambient illuminance of about 100 lx. The low contrast is also a factor that narrows the color reproduction range.

In order to improve the contrast, there is a method of lowering the transmittance in the entire visible wavelength range and reducing the transmission of external light reflection and the like on the substrate glass and the phosphor by using a neutral density (ND) filter in front of the display. However, when the visible light transmittance is extremely low, the luminance and the sharpness of the image are reduced, and the improvement in color purity is not so much seen.

The present inventors have improved the color purity and contrast of the emission color of the color plasma display by reducing unnecessary light emission and reflection of external light which cause a reduction in the color purity and contrast of the emission color. I found what I could do.

Further, the present inventors not only use the pigment to adjust the electromagnetic wave shielding body to neutral gray or neutral blue, but also reduce unnecessary light emission and extraneous light which cause a reduction in color purity and contrast of emitted light. It has been found that light reflection can be reduced. In particular, red light emission near orange is remarkable, and it has been found that the color purity of red light emission can be improved by reducing the light emission having a wavelength of 580 nm to 605 nm.

In the display filter of the present invention, unnecessary light emission and external light reflection can be reduced at a wavelength of 570 nm to 570 nm.
It can be performed by incorporating a dye having an absorption maximum at 605 nm into the shield body. At this time, it is necessary that the display filter does not significantly impair the transmission of light having a wavelength of 615 nm to 640 nm having a red emission peak.

In general, a dye has a broad absorption range, and even a dye having a desired absorption peak may absorb light having a suitable wavelength due to absorption at the bottom. In the case where light due to Ne exists, orange light emission can be reduced, so that the color purity of light emitted from the RGB display cell is improved.

The green emission of the color plasma display is broad and its peak position is, for example, NT.
It may be slightly longer than green required by the SC system, that is, on the yellow-green side.

The present inventors have proposed a wavelength of 570 nm to 605 n.
The absorption on the short wavelength side of the dye having an absorption maximum at m
It has been found that the color purity can be improved by absorbing and reducing the long wavelength side of green light emission, further reducing unnecessary light emission, and / or shifting the peak.

In order to improve the color purity of red light emission and green light emission in addition, a dye having an absorption maximum at a wavelength of 570 nm to 605 nm is used.
It is preferable that the minimum transmittance of the electromagnetic wave shielding body in nm is 80% or less with respect to the transmittance at a required peak position of red light emission.

When the color purity of blue light emission is low, it is sufficient to use a dye that reduces unnecessary light emission, shifts its peak wavelength, and absorbs blue-green light emission, similarly to red light emission and green light emission. Further, absorption by the dye can reduce external light reflection on the phosphor by reducing the incidence of external light on the phosphor. This can also improve color purity and contrast.

The method for incorporating a dye into the display filter of the present invention includes (1) a polymer film obtained by kneading at least one or more dyes in a transparent resin;
(2) a polymer film produced by a casting method by dispersing and dissolving at least one or more dyes in a resin or a resin concentrate of a resin monomer / organic solvent, (3)
At least one or more dyes added to a resin binder and an organic solvent and coated on a transparent substrate as a coating material; or (4) a transparent adhesive containing at least one or more dyes. It is a method used as a form.

The term “content” as used in the present invention means not only that it is contained in a layer such as a substrate or a coating film or an adhesive material, but also that it is applied to the surface of a substrate or a layer.

The dye may be a general dye or pigment having a desired absorption wavelength in the visible region. The type of the dye is not particularly limited. And organic dyes such as azo, styryl, coumarin, porphyrin, dibenzofuranone, diketopyrrolopyrrole, rhodamine, xanthene, and pyromethene. The type and concentration are determined by the absorption wavelength and absorption coefficient of the dye, the color tone of the transparent conductive layer and the transmission characteristics and transmittance required of the electromagnetic wave shield, and the type and thickness of the medium or coating film to be dispersed.
There is no particular limitation.

When a multilayer thin film is used for the transparent conductive layer (D), it has a near-infrared cut ability in addition to an electromagnetic wave shielding ability. When the pigment does not have an infrared ray-cutting ability, one or more kinds of near-infrared ray absorbing pigments may be used in combination with the above-mentioned pigment in order to impart near-infrared ray-cutting ability to a display filter.

The near-infrared absorbing dye is not particularly limited as long as it supplements the near-infrared cut ability of the transparent conductive layer and absorbs near-infrared light emitted from the plasma display to a sufficiently practical level. However, the concentration is not limited. Examples of the near infrared absorbing dye include a phthalocyanine-based compound, an anthraquinone-based compound, a dithiol-based compound, and a diiminium-based compound.

The temperature of the panel surface of a plasma display panel is high, and particularly when the temperature of the environment is high, the temperature of the electromagnetic wave shielding body also rises. Therefore, the coloring matter used in the present invention has remarkable heat resistance, for example, decomposition at 80 ° C. due to decomposition or the like. It is preferable to have heat resistance that does not deteriorate.

Further, depending on the dye, in addition to heat resistance,
Some have poor lightfastness. If the emission of the plasma display or the deterioration of external light due to ultraviolet light or visible light becomes a problem, by using a member containing an ultraviolet absorber or a member that does not transmit ultraviolet light, it is possible to reduce the deterioration of the dye due to ultraviolet light, It is important to use a dye that does not significantly deteriorate due to visible light. In addition to heat and light, the same applies to humidity and a combined environment of these. Deterioration of the pigment changes the transmission characteristics of the electromagnetic wave shield.

Actually, the surface temperature of the plasma display panel is changed from 70.degree. C. to 80.degree.
No. 0303. The light generated from the plasma display panel is, for example, 300 cd / m
² (Fujitsu Limited Image Si
te catalog AD25-0061C Oct. 1
997M), when the solid angle is 2π, and this is irradiated for 20,000 hours, 2π × 20,000 × 300 = 38,000,000 (lx
・ Hours), tens of millions (lx ・ hours) for practical use
It can be seen that a certain degree of light resistance is required.

Furthermore, in order to disperse a dye in a medium or a coating film, solubility in an appropriate solvent is also important. Two or more dyes having different absorption wavelengths may be contained in one medium or coating film.

The display filter of the present invention has excellent transmission characteristics and transmittance without significantly impairing the brightness and visibility of the color plasma display, and can improve the color purity and contrast of the emission color of the color plasma display. it can. The present inventors have found that when at least one of the dyes to be contained is a tetraazaporphyrin compound, the main absorption wavelength is at or near the wavelength of the unnecessary emission of 570 to 605 nm which is particularly desired to be reduced. In addition, since the absorption wavelength width is relatively narrow, it is found that loss of luminance due to absorption of suitable light emission can be reduced, and excellent transmission characteristics, transmittance, color purity of emitted light and contrast are improved. A display filter with excellent ability was obtained.

The tetraazaporphyrin compound used in the present invention can be represented by the above formula (1). Hereinafter, the formula (1) is abbreviated as in the following structural formula (2) (Formula 3).

[0134]

Embedded image

[In the formula (2), ^Am and ^An are each independently
Hydrogen atom, halogen atom, nitro group, cyano group, hydroxy group, amino group, carboxyl group, sulfonic acid group, alkyl group having 1 to 20 carbon atoms, halogenoalkyl group, alkoxy group, alkoxyalkoxy group, aryloxy group, mono alkylamino group, a dialkylamino group, an aralkyl group, an aryl group, a heteroaryl group, an alkylthio group, or arylthio group, through a ^m and a ⁿ are each independently a linking group, the ring except an aromatic ring M may represent two hydrogen atoms, a divalent metal atom, a trivalent monosubstituted metal atom, a tetravalent disubstituted metal atom, or an oxymetal atom. Specific examples of the tetraazaporphyrin compound represented by the formula (1) are described below. In the formula, specific examples of A ^{1 to} A ⁸ include:
Each independently a hydrogen atom; a halogen atom such as fluorine, chlorine, bromine or iodine; a nitro group; a cyano group;
Amino group; carboxyl group; sulfonic group; methyl group;
Ethyl group, n-propyl group, iso-propyl group, n-butyl group, iso-butyl group, sec-butyl group, t-butyl group, n-pentyl group, 2-methylbutyl group, 1-methylbutyl group, neo- Pentyl group, 1,2-dimethylpropyl group, 1,1-dimethylpropyl group, cyclo-pentyl group, n-hexyl group, 4-methylpentyl group, 3-methylpentyl group, 2-methylpentyl group,
1-methylpentyl group, 3,3-dimethylbutyl group, 2,3-dimethylbutyl group, 1,3-dimethylbutyl group, 2,2-dimethylbutyl group, 1,2-dimethylbutyl group, 1,1- Dimethylbutyl, 3-ethylbutyl, 2-ethylbutyl, 1-ethylbutyl, 1,2,2-trimethylbutyl, 1,1,2-trimethylbutyl, 1-ethyl-2-methylpropyl, cyclo -Hexyl group, n-heptyl group, 2-methylhexyl group, 3-methylhexyl group, 4-methylhexyl group, 5-methylhexyl group, 2,4-dimethylpentyl group, n-octyl group, 2-ethylhexyl Group, 2,5-dimethylhexyl group, 2,5,5-trimethylpentyl group, 2,4-dimethylhexyl group, 2,2,4-trimethylpentyl group, n-nonyl group, 3,5,5-trimethyl Hexyl group, n-decyl group, 4-ethyloctyl group, 4-ethyl-4,5
-Dimethylhexyl group, n-undecyl group, n-dodecyl group, 1,3,5,7-tetramethyloctyl group, 4-butyloctyl group, 6,6-diethyloctyl group, n-tridecyl group, 6-methyl -4-butyloctyl group, n-tetradecyl group, n-pentadecyl group, 3,5-dimethylheptyl group, 2,6-dimethylheptyl group, 2,4-dimethylheptyl group, 2,2,5,5-tetra C1-C20 linear, branched or cyclic alkyl group such as methylhexyl group, 1-cyclo-pentyl-2,2-dimethylpropyl group, 1-cyclo-hexyl-2,2-dimethylpropyl group; chloro; C1-C20 halogenoalkyl groups such as methyl group, dichloromethyl group, fluoromethyl group, trifluoromethyl group, pentafluoroethyl group and nonafluorobutyl group; methoxy group, ethoxy group, n-propoxy group, iso- Propoxy, n-butoxy, iso-butoxy, sec-butoxy Alkoxy group, t-butoxy group, n- pentoxy group,
C1-C20 alkoxy groups such as iso-pentoxy group, neo-pentoxy group, n-hexyloxy group, n-dodecyloxy group; methoxyethoxy group, ethoxyethoxy group,
Methoxypropyloxy group, 3- (iso-propyloxy)
A C2-C20 alkoxyalkoxy group such as a propyloxy group; a phenoxy group, a 2-methylphenoxy group, a 4-methylphenoxy group, a 4-t-butylphenoxy group, a 2-methoxyphenoxy group, a 4-iso-propylphenoxy group An aryloxy group having 6 to 20 carbon atoms such as a group; a methylamino group, an ethylamino group, an n-propylamino group, an n-butylamino group,
C1-C20 monoalkylamino group such as n-hexylamino group; dimethylamino group, diethylamino group, di-n
-Propylamino group, di-n-butylamino group, N-methyl
A dialkylamino group having 2 to 20 carbon atoms such as -N-cyclohexylamino group; benzyl, nitrobenzyl, cyanobenzyl, hydroxybenzyl, methylbenzyl, dimethylbenzyl, trimethylbenzyl, dichlorobenzyl, methoxy 7 to 20 carbon atoms such as benzyl, ethoxybenzyl, trifluoromethylbenzyl, naphthylmethyl, nitronaphthylmethyl, cyanonaphthylmethyl, hydroxynaphthylmethyl, methylnaphthylmethyl, trifluoromethylnaphthylmethyl, etc. Aralkyl groups: phenyl, nitrophenyl, cyanophenyl, hydroxyphenyl, methylphenyl, dimethylphenyl, trimethylphenyl, dichlorophenyl, methoxyphenyl, ethoxyphenyl, trif An aryl group having 6 to 20 carbon atoms such as an olomethylphenyl group, an N, N-dimethylaminophenyl group, a naphthyl group, a nitronaphthyl group, a cyanonaphthyl group, a hydroxynaphthyl group, a methylnaphthyl group, a trifluoromethylnaphthyl group; Groups, thienyl groups, furanyl groups, oxazoyl groups, isoxazoyl groups, oxadiazoyl groups, imidazoyl groups, benzooxazoyl groups, benzothiazoyl groups, benzimidazoyl groups, heteroaryl groups such as benzofuranyl groups, indoyl groups; methylthio groups, ethylthio Group, n-propylthio group, iso-propylthio group, n-butylthio group, iso-butylthio group, se
c-butylthio group, t-butylthio group, n-pentylthio group,
1 carbon atom such as iso-pentylthio, 2-methylbutylthio, 1-methylbutylthio, neo-pentylthio, 1,2-dimethylpropylthio, 1,1-dimethylpropylthio, etc.
And alkylthio groups having from 20 to 20; examples thereof include arylthio groups having 6 to 20 carbon atoms such as phenylthio, 4-methylphenylthio, 2-methoxyphenylthio, and 4-t-butylphenylthio.

A ¹ and A ² , A ³ and A ⁴ , A ⁵ and A ⁶ , A ⁷ and A ⁸
There is an example having the form a ring through a linking group, -CH ₂ C
_{H 2 CH 2 CH 2 -,} - CH 2 CH 2 CH (NO 2) CH
_{2 -, - CH 2 CH (} CH 3) CH 2 CH 2 -, - CH 2 C
H (Cl) CH ₂ CH ₂ — and the like can be mentioned.

Examples of the divalent metal represented by M include C
u, Zn, Fe, Co, Ni, Ru, Rh, Pd, P
t, Mn, Sn, Mg, Hg, Cd, Ba, Ti, B
e, Ca and the like.

Examples of the mono-substituted trivalent metal include Al-
F, Al-Cl, Al-Br, Al-I, Ga-F, G
a-Cl, Ga-Br, Ga-I, In-F, InC
1, In-Br, In-I, Tl-F, Tl-Cl, T
l-Br, Tl-I, Al-C6H5, Al-C 6 H
₄ (CH ₃ ), In-C ₆ H ₅ , In-C ₆ H ₄ (C
H ₃ ), Mn (OH), Mn (OC ₆ H ₅ ), Mn [O
_{Si (CH 3) 3],} Fe-Cl, include Ru-Cl, etc..

Examples of the disubstituted tetravalent metal include CrCl
_Two , SiF_Two, SiCl_Two, SiBr_Two, SiI_Two, S
nF_Two, SnCl_Two, SnBr_Two, ZrCl_Two, GeF
_Two, GeCl_Two, GeBr_Two, GeI_Two, TiF_Two, T
iCl_Two, TiBr_Two, Si (OH)_Two, Sn (OH)
_Two, Ge (OH)_Two, Zr (OH)_Two, Mn (O
H) _Two, TiA_Two , CrA_Two , SiA_Two , SnA_Two , G
eA_Two [Where A is an alkyl group, a phenyl group, a naphthyl
Represents a group or a derivative thereof], Si (OA)_Two , Sn (O
A)_Two , Ge (OA)_Two , Ti (OA)_Two , Cr (O
A)_Two [Where A is an alkyl group, a phenyl group, a naphthyl
Group, trialkylsilyl group, dialkylalkoxysilyl
And its derivatives], Si (SA)_Two , Sn
(SA)_Two , Ge (SA)_Two [Where A is an alkyl group,
Represents a phenyl group, a naphthyl group and derivatives thereof].
I can do it.

Examples of oxymetals include VO, MnO,
TiO etc. are mentioned. Preferably, Pd, Cu, R
u, Pt, Ni, Co, Rh, Zn, VO, TiO, S
i (Y) ₂ , Ge (Y) ₂ (where Y is a halogen atom,
Alkoxy, aryloxy, acyloxy, hydroxy, alkyl, aryl, alkylthio, arylthio, trialkylsilyloxy, trialkyltinoxy or trialkylgermaniumoxy).

More preferably, Cu, VO, Ni, P
d, Pt, and Co. The present inventors have further found that the formula (1)
Azaporphyrin compound of, for example, tetra-t-butyl-tetraazaporphyrin complex or tetra-neo-
When the compound is a pentyl-tetraazaporphyrin complex, the production is relatively easy, the solubility in a solvent, the complex is stable, the absorption characteristics are excellent, and a t-butyl group or tetra-neo-pentyl is used. As a result of the addition of the group, the solubility in the solvent increases due to the stericity of the complex,
It was found that the pigment was easily contained, and an excellent electromagnetic wave shield was obtained.

In the display filter of the present invention, the above-mentioned methods (1) to (4) for containing a dye include a polymer film (B) containing a dye and a transparent adhesive layer (C) described later containing a dye. ) Or a second transparent adhesive layer, a functional transparent layer containing a dye (A) described below, and a hard coat layer containing a dye (F) described above. The functional transparent layer (A) described below containing a dye may be a film containing a dye and having each function, or a film containing a dye and having each function formed on a polymer film. Any of those in which a film having a function is formed on a substrate containing a dye may be used.

In the present invention, two or more dyes having different absorption wavelengths may be contained in one medium or coating film, or two or more dye layers may be provided.

First, the method of (1) in which a resin is kneaded with a dye and molded by heating will be described. The resin material is preferably as transparent as possible when formed into a plastic plate or a polymer film. Specifically, polyethylene terephthalate, polyether sulfone, polystyrene, polyethylene naphthalate, polyarylate, polyether ether ketone , Polycarbonate,
Polyamide, polypropylene, polyamide such as nylon 6, polyimide, cellulose resin such as triacetyl cellulose, polyurethane, fluorine resin such as polytetrafluoroethylene, vinyl compound such as polyvinyl chloride, polyacrylic acid, polyacrylate, Polyacrylonitrile, addition polymers of vinyl compounds, vinylidene compounds such as polymethacrylic acid, polymethacrylic acid esters, polyvinylidene chloride, vinyl compounds such as vinylidene fluoride / trifluoroethylene copolymer, ethylene / vinyl acetate copolymer, and fluorine Examples thereof include copolymers of system compounds, polyethers such as polyethylene oxide, epoxy resins, polyvinyl alcohol, polyvinyl butyral, and the like, but are not limited to these resins.

Although the processing temperature, film formation conditions, and the like are slightly different depending on the dye and base polymer used, the dye is usually added to the base polymer powder or pellet, After heating and melting at a temperature of 0 ° C., a method of forming a plastic plate by molding, (ii) a method of forming a film by an extruder, and (iii) preparing a raw material by an extruder, 2 to 5 at 30 to 120 ° C. A method in which the film is stretched uniaxially or biaxially into a film having a thickness of 10 to 200 μm. When kneading, an additive such as a plasticizer used for ordinary resin molding may be added. The amount of the dye to be added depends on the absorption coefficient of the dye, the thickness of the polymer molded article to be produced, the desired absorption intensity, the desired transmission characteristics and transmittance, etc., but is usually 1 ppm based on the weight of the base polymer molded article. ~ 20%.

In the casting method (2), a coloring matter is added and dissolved in a resin concentrate obtained by dissolving a resin or a resin monomer in an organic solvent, and if necessary, a plasticizer, a polymerization initiator and an antioxidant are added. In addition, by pouring onto a mold or drum having the required surface condition, and by solvent evaporation and drying or polymerization, solvent evaporation and drying, plastic plates,
Obtain a polymer film.

Normally, aliphatic ester resins, acrylic resins, melamine resins, urethane resins, aromatic ester resins, polycarbonate resins, aliphatic polyolefin resins, aromatic polyolefin resins, polyvinyl resins, polyvinyl alcohol resins, polyvinyl resins Modified resin (PV
B, EVA, etc.) or a resin monomer of a copolymer resin thereof. As the solvent, a halogen-based, alcohol-based, ketone-based, ester-based, aliphatic hydrocarbon-based, aromatic hydrocarbon-based, ether-based solvent, or a mixture thereof is used.

The concentration of the dye varies depending on the absorption coefficient of the dye, the thickness of the plate or film, the target absorption intensity, the target transmission characteristics / transmittance, etc., but is usually 1 ppm to 20% based on the weight of the resin monomer. It is.

The resin concentration is usually 1 to 90% based on the whole paint. As the method of (3) for forming a coating by coating, a method of dissolving a dye in a binder resin and an organic solvent to form a coating, and finely pulverizing an uncolored acrylic emulsion paint (50 to 500 nm)
And a method of dispersing the resulting dispersion to obtain an acrylic emulsion-based aqueous coating.

In the former method, an aliphatic ester resin, an acrylic resin, a melamine resin, a urethane resin,
An aromatic ester resin, a polycarbonate resin, an aliphatic polyolefin resin, an aromatic polyolefin resin, a polyvinyl resin, a polyvinyl alcohol resin, a modified polyvinyl resin (PVB, EVA, or the like), or a copolymer resin thereof is used as a binder resin. As the solvent, a halogen-based, alcohol-based, ketone-based, ester-based, aliphatic hydrocarbon-based, aromatic hydrocarbon-based, ether-based solvent, or a mixture thereof is used.

The concentration of the dye varies depending on the absorption coefficient of the dye, the thickness of the coating, the desired absorption intensity, the desired visible light transmittance, etc., but is usually 0.1 to 30% based on the weight of the binder resin. is there.

The concentration of the binder resin is usually 1 to 50% with respect to the whole paint. In the case of the latter acrylic emulsion-based water-based paint, the pigment is finely pulverized (50 to 5) into the uncolored acrylic emulsion paint in the same manner as described above.
(00 nm). Additives such as antioxidants and the like used in ordinary paints may be added to the paint.

The paint prepared by the above method is prepared by coating a known coating such as a bar coater, a blade coater, a spin coater, a reverse coater, a die coater or a spray on a transparent polymer film, a transparent resin, a transparent glass or the like. Thus, a substrate containing a dye is prepared.

A protective layer may be provided to protect the coating surface, or another component of the electromagnetic wave shield may be bonded to the coating surface to protect the coating surface.

In the method (4) of using as a pressure-sensitive adhesive containing a dye, an acrylic adhesive, a silicone adhesive, a urethane adhesive, a polyvinyl butyral adhesive (PV
B), sheet or liquid adhesives or adhesives such as polyvinyl ether, saturated amorphous polyester, melamine resin, etc., such as ethylene-vinyl acetate adhesive (EVA),
A dye is used by adding 10 ppm to 30%.

In these methods, an ultraviolet absorber may be added together with the dye in order to increase the light resistance of the dye-containing electromagnetic wave shield. The type and concentration of the ultraviolet absorber are not particularly limited.

6. Transparent pressure-sensitive adhesive layer, conductive pressure-sensitive adhesive layer In the present invention, lamination (lamination) is via an arbitrary transparent pressure-sensitive adhesive layer. The transparent pressure-sensitive adhesive layer (C) of the present invention includes
A layer made of any transparent adhesive or pressure-sensitive adhesive or pressure-sensitive adhesive. Specifically, an acrylic adhesive, a silicone adhesive, a urethane adhesive, a polyvinyl butyral adhesive (PVB), an ethylene-vinyl acetate adhesive (EVA)
And the like, polyvinyl ether, saturated amorphous polyester, melamine resin and the like. In this case, it is important that the adhesive used in the central portion, which is the light transmitting portion from the display, needs to be sufficiently transparent to visible light.

The conductive pressure-sensitive adhesive layer is a pressure-sensitive adhesive layer for electrically connecting the transparent conductive layer (D) and the ground portion (ground conductor) of the display device. There is no. The electromagnetic wave shield is a transparent conductive layer (D)
The transparent adhesive layer must not significantly impede the electrical connection to the outside by the conductive adhesive layer, since electrical connection between the transparent adhesive layer and the outside is necessary. That is, a conductive part in which the transparent adhesive layer is not formed on the transparent conductive layer (D) is required. For example, it is important to form the transparent adhesive layer so as to leave the peripheral portion of the transparent conductive layer (D) and leave a conductive portion.

The conductive adhesive and the conductive adhesive used for the conductive adhesive layer are acrylic adhesive, silicon adhesive, urethane adhesive, polyvinyl butyral adhesive (PV
B) Based on polyvinyl ether, saturated amorphous polyester, melamine resin, etc. as a base agent, such as ethylene-vinyl acetate adhesive (EVA), and dispersing carbon or metal particles such as Cu, Ni, Ag, Fe as conductive particles. It was made. When the conductivity of the dispersed particles is low, and the particle diameter is small and the number of particles is large and the contact area between the particles is large,
The volume specific resistance of the conductive adhesive and the conductive pressure-sensitive adhesive is reduced, which is preferable. The volume specific resistance of the conductive adhesive and conductive adhesive which can be used is 1 × 10 -4 to 1 × 10 3 Ω · c.
m. As long as it has practical adhesive strength, it may be a sheet or a liquid.

As the pressure-sensitive adhesive, a sheet-shaped pressure-sensitive adhesive can be suitably used. Lamination is performed after laminating the sheet-like adhesive or after applying the adhesive.

The liquid material is an adhesive which is cured by being left at room temperature or heated or irradiated with ultraviolet rays after application and bonding. Examples of the coating method include a screen printing method, a bar coating method, a reverse coating method, a gravure coating method, a die coating method, a roll coating method, and the like.
Considered and selected from viscosity, application amount, etc. The thickness of the layer is not particularly limited, but may be 0.5 μm to 50 μm, preferably 1 μm in consideration of the volume resistivity and the required conductivity.
m to 30 μm. A commercially available double-sided adhesive type conductive tape having conductivity on both sides can also be suitably used. This thickness is also not particularly limited, but is about several μm to several mm.

The pressure-sensitive adhesive may be in the form of a sheet or a liquid as long as it has practical adhesive strength. As the pressure-sensitive adhesive, a sheet-shaped pressure-sensitive adhesive can be suitably used. After adhering the sheet-like adhesive or after applying the adhesive, the members are laminated by laminating each member.

The liquid is an adhesive which is cured by being left at room temperature or heated after being applied and laminated.

Examples of the coating method include a bar coating method, a reverse coating method, a gravure coating method, a die coating method, and a roll coating method.

The thickness of the layer is not particularly limited, but is 0.5 μm to 50 μm, preferably 1 μm to 30 μm.
m. It is preferable that the surface on which the transparent pressure-sensitive adhesive layer is formed and the surface to be bonded are improved in wettability by an easy-adhesion coating or an easy-adhesion treatment such as corona discharge treatment in advance.

Further, after laminating via the transparent adhesive layer, air introduced between the members at the time of lamination is defoamed or solid-dissolved in the adhesive, and further, the adhesion between the members is improved. In addition, it is important to carry out curing under pressure and heating conditions if possible. At this time, the pressurizing condition is
The heating conditions are about 20 atm or less, and the heating conditions are about room temperature or more and about 80 ° C. or less, although they depend on the heat resistance of each member. A dye can be contained in at least one of the transparent adhesive layers.

7. Functional Transparent Layer (A) The display filter of the present invention has a hard coat property, an anti-reflection property, an anti-glare property, an anti-static property, an anti-fouling property, depending on a method of installing on a display and a required function. The functional transparent layer (A), which has at least one function of gas barrier properties and ultraviolet cut properties and transmits visible light, is directly or via a second transparent adhesive layer. ). One functional transparent layer (A)
However, it is preferable to have a plurality of functions.

The functional transparent layer (A) in the present invention may be a functional film having at least one of the above-mentioned functions, a transparent substrate formed by coating or printing a functional film or by various conventionally known film forming methods. A transparent substrate having various functions may be used.

In the case of the functional film itself, the functional film is formed directly on the main surface of the transparent conductive layer (D) forming the functional transparent layer (A) by coating or printing or conventionally known various film forming methods.

In the case of a transparent substrate having a functional film formed thereon, or a transparent substrate having various functions, it may be attached to the main surface of the transparent conductive layer (D) via an adhesive or an adhesive containing a dye. There are no particular restrictions on these fabrication methods.

The transparent substrate is a transparent polymer film, the type and thickness of which are not particularly limited, and the transparent substrate may contain a dye. Even if the functional transparent layer (A) is a functional film itself, a dye can be contained in the film.

Since the electromagnetic wave shield requires electrical connection between the transparent conductive layer (D) and the outside, the functional transparent layer (A) must not hinder this electrical connection. That is, a conductive portion where the functional transparent layer (A) is not formed on the transparent conductive layer (D) is required. For example, the functional transparent layer (A) can be formed so as to leave a peripheral portion of the transparent conductive layer, and the peripheral portion can be a conductive portion.

Since the display screen becomes difficult to see due to the reflection of lighting equipment and the like, the functional transparent layer (A) is provided with an anti-reflection (A) for suppressing external light reflection.
R: Anti-reflection anti-glare (AR) having anti-reflection property, anti-glare (AG: anti-glare) property or both properties
AG) function. If the visible light reflectance of the surface of the electromagnetic shield is low,
As described above, the incidence and reflection of external light on the phosphor of the plasma display are reduced, which not only prevents reflection but also improves contrast and color purity.

The functional transparent layer (A) having anti-reflection (AR) properties is formed by considering the optical characteristics of the substrate on which the anti-reflection film is formed and by designing the anti-reflection film and the film thickness of each component by optical design. To determine. Specifically, for example, a thin film of a fluorine-based transparent polymer resin, magnesium fluoride, silicon-based resin, or silicon oxide having a low refractive index of 1.5 or less, preferably 1.4 or less in the visible region is used. Inorganic compounds such as metal oxides, fluorides, silicides, borides, carbides, nitrides, sulfides, etc., silicon-based resins and acrylic resins, and fluorine-based materials with different refractive indexes When a thin film of an organic compound such as a resin is viewed from the substrate, two or more thin layers of a high refractive index layer and a low refractive index layer are laminated in this order.

The single-layer structure is easy to manufacture, but is inferior in anti-reflection properties to two or more layers. 4
The laminated structure has an antireflection ability over a wide wavelength range, and the optical design of the substrate is less limited in optical design.

For forming these inorganic compound thin films, any of conventionally known methods such as sputtering, ion plating, vacuum deposition, and wet coating can be employed. Conventionally known methods such as a method of drying and curing after wet coating such as a bar coating method, a reverse coating method, a gravure coating method, a die coating method, and a roll coating method can be used for forming the organic compound thin film.

The visible light reflectance of the surface of the functional transparent layer (A) having an antireflection property is 2% or less, preferably 1.3%.
Or less, more preferably 0.8% or less.

The functional transparent layer (A) having an antiglare (AG) property refers to a layer transparent to visible light having a surface state of minute irregularities of about 0.1 μm to 10 μm. Specifically, a thermosetting or photo-curing resin such as an acrylic resin, a silicon-based resin, a melamine-based resin, a urethane-based resin, an alkyd-based resin, a fluorine-based resin, and the like, silica, an organic silicon compound, melamine, acryl, etc. An inorganic compound or an organic compound particles dispersed and made into an ink are coated on a substrate by a bar coating method, a reverse coating method, a gravure coating method, a die coating method, a roll coating method, or the like,
Let it cure. The average particle size of the particles is 1 to 40 μm.
Alternatively, a thermosetting or photocurable resin such as an acrylic resin, a silicon resin, a melamine resin, a urethane resin, an alkyd resin, or a fluororesin is applied to a substrate, and a mold having a desired haze or surface state is provided. Can be hardened by pressing to obtain anti-glare properties. In short, it is important to have appropriate unevenness, and it is not necessarily limited to the above method.

The antiglare haze is 0.5% or more and 20% or less, preferably 1% or more and 10% or less. If the haze is too small, the antiglare property is insufficient, and if the haze is too large, the parallel light transmittance is reduced, and the visibility of the display is deteriorated.

The functional transparent layer (A) having anti-reflection and anti-glare (ARAG) properties can be obtained by forming the above-described anti-reflection film on a film or a substrate having anti-glare properties. In this case, when the film having antiglare properties is a film having a high refractive index, a relatively high antireflection property can be imparted even if the antireflection film is a single layer.

Antireflection by AR or ARAG can improve the light transmittance of the display filter.

Since the display filter of the present invention is bonded to the display unit via the transparent adhesive layer (C), the reflection of the substrate glass on the display unit surface is eliminated. Therefore, in addition to the above, the filter on which the functional transparent layer (A) having the function of AR or ARAG is formed has low reflection on its surface, and can further improve the contrast and color purity of the display. The visible light reflectance on the surface of the functional transparent layer (A) having the AR or ARAG function is 2% or less, preferably 1.3% or less, more preferably 0.8% or less.

It is also preferable that the functional transparent layer (A) has a hard coat property in order to impart abrasion resistance to the display filter. Examples of the hard coat film include an acrylic resin, a silicon resin, a melamine resin, a urethane resin, an alkyd resin, a thermosetting resin such as a fluororesin, and a photocurable resin. There is no particular limitation. The thickness of these films is 1-1.
It is about 00 μm. When the hard coat film is used as a high refractive index layer or a low refractive index layer of the transparent functional layer (A) having an antireflection property, or when an antireflection film is formed on the hard coat film, the functional transparent layer (A) May have both antireflection properties and hard coat properties. Similarly, it may have both antiglare properties and hard coat properties. In this case, the hard coat film may have irregularities due to the dispersion of particles and the like, and if an anti-reflection film is formed thereon, the functional transparent layer (A) having both anti-reflection anti-glare property and hard coat property ) Is obtained. The surface hardness of the functional transparent layer (A) having a hard coat property is
The pencil hardness according to JIS (K-5400) is at least H, preferably 2H, more preferably 3H or more.

Further, dust is likely to adhere to the display filter due to electrostatic charging, and may be subjected to an electric shock by being discharged when a human body comes into contact with the display filter. is there. Therefore, the functional transparent layer (A) may have conductivity in order to provide antistatic capability. The conductivity required in this case may be a sheet resistance of about 10 ¹¹ Ω / □ or less, but should not impair the transparency and resolution of the display screen. Examples of the conductive layer include a known transparent conductive film such as ITO and a conductive film in which conductive ultrafine particles such as ITO ultrafine particles and tin oxide ultrafine particles are dispersed.

The layer constituting the functional transparent layer (A) having at least one of the above-described anti-reflection properties, anti-glare properties, anti-reflection anti-glare properties and hard coat properties has conductivity. It is preferable to have.

When silver is used for the multilayer thin film, silver lacks chemical and physical stability and is deteriorated by contaminants in the environment, water vapor, etc., causing aggregation and whitening. It is important that the thin film forming surface of the body is covered with a functional transparent layer (A) having a gas barrier property so that the thin film is not exposed to pollutants and water vapor in the use environment. The required gas barrier property is 10 g / m2 in moisture permeability.
² · day or less. Specific examples of the film having gas barrier properties include silicon oxide, aluminum oxide, tin oxide,
Indium oxide, yttrium oxide, magnesium oxide, etc., or a mixture thereof, or a metal oxide thin film obtained by adding a trace amount of other elements thereto, polyvinylidene chloride, an acrylic resin, a silicon resin, a melamine resin, urethane Resins, fluorine resins and the like,
It is not particularly limited to these. The thickness of these films is about 10 to 200 nm in the case of a metal oxide thin film and about 1 to 100 μm in the case of a resin, and may be a single layer or a multilayer, but is not particularly limited. Examples of the polymer film having a low water vapor vapor transmission rate include polyethylene, polypropylene, nylon, polyvinylidene chloride, vinylidene chloride and vinyl chloride, a copolymer of vinylidene chloride and acrylonitrile, and a fluororesin. Is not particularly limited as long as it is 10 g / m ² · day or less. Even when the moisture permeability is relatively high, the moisture permeability decreases by increasing the thickness of the film or adding an appropriate additive.

The anti-reflection property, anti-glare property, anti-reflection anti-glare property, antistatic property, anti-Newton ring property,
The layer constituting the functional transparent layer (A) having any one or more functions of the hard coat property is a film having a gas barrier property, or the above-mentioned gas barrier property is used in combination with the whole or an adjacent transparent adhesive layer. It is suitable to have.

For example, as the functional transparent layer (A) having a dye-containing antireflection property, a hard coat property, an antistatic property, and a gas barrier property, a dye-containing polyethylene terephthalate film / hard coat film / ITO /
Silicon-containing compound / ITO / silicon-containing compound.

Further, anti-reflection and anti-glare properties, hard coat properties,
As the functional transparent layer (A) having an antistatic property and a gas barrier property, a triacetyl cellulose film /
ITO fine particle-dispersed hard coat film / silicon-containing compound compound.

Further, it is preferable that the surface of the functional transparent layer (A) has an antifouling property so as to prevent fingerprints and the like from being stained and to easily remove stains when they are attached. Those having antifouling properties have non-wetting properties with respect to water and / or fats and oils, and include, for example, fluorine compounds and silicon compounds. When combined with other functions such as antireflection properties and antistatic properties, those functions must not be hindered. In this case, the antireflection property and the antistatic property are maintained by using a fluorine compound having a low refractive index as a constituent material of the antireflection film or coating the outermost surface with one or several fluorine-based organic molecules. While imparting antifouling properties.

For example, the functional transparent layer (A) having antifouling property, antireflection property, hard coat property, antistatic property, and gas barrier property includes hard coat film / ITO / silicon-containing compound / ITO / containing And a monomolecular coat film of a silicon compound / fluorine-based organic molecule.

Furthermore, in order to prevent the dye contained in the electromagnetic wave shielding body from being radiated from the display or being deteriorated by the ultraviolet light included in the external light, the functional transparent layer (A) has an ultraviolet cut property. Good to be. For example, a functional transparent layer (A) having a hard coat film, a base material for forming a functional transparent film containing an ultraviolet absorber, or an antireflection film composed of a single layer or a multilayer of an inorganic thin film absorbing ultraviolet light. ). The type and concentration of the ultraviolet absorber are not particularly limited.

Further, at least one of the transparent adhesive layers may contain an ultraviolet absorber.

It is essential that the member that cuts ultraviolet rays is disposed between the surface on which ultraviolet rays are incident and the layer containing the dye, and the ultraviolet cut properties vary depending on the durability of the dye and are not particularly limited.

8. According to the "Dictionary of Adhesion and Adhesion (Asakura Shoten)", regarding the relationship between the thickness of the support and the adhesive strength, "Generally, the greater the thickness of the support, the greater the bending energy and the greater the adhesive strength. From a certain point, the adhesive strength is reduced due to the influence of bending moment and the like. " The present inventors have found that by setting the total thickness of the transparent polymer film to 0.3 mm or more, the optical filter film can be easily peeled from the glass surface. Since the rigidity of the optical filter film is mainly controlled by the total thickness of the transparent polymer film, the effect in the present invention is presumed to be due to the effect of the bending moment. Further, by increasing the rigidity of the optical filter film, continuous peeling with an average force becomes possible, and adhesive residue on the glass plate starting from the peeling interruption point is reduced.

Further, the impact resistance is improved by increasing the total thickness of the transparent polymer film. The greater the total thickness of the transparent polymer film, the greater its impact resistance, but the greater the number of laminated films, the lower the production efficiency. The greater the rigidity, the more difficult it is to directly attach to the display. become. Therefore, the total thickness of the transparent polymer film is not particularly specified,
To 1.0 mm, more preferably 0.4 m
m to 0.8 mm. The number of transparent polymer films to be laminated is not particularly specified, but is preferably 2 to 6 and more preferably 2 to 4.

FIGS. 12 to 17 are sectional views showing examples of the structure of a display filter according to the present invention.

In FIG. 12, the transparent adhesive layer 30 and the transparent polymer film (B) 23 (15
0 μm), a transparent adhesive layer 30, a transparent polymer film (B) 24 having a functional transparent layer (A) exhibiting an antireflection function
(188 μm) are sequentially laminated to form a display filter.

In FIG. 13, a transparent adhesive layer 30, a transparent polymer film for raising (B) 25 (200 μm), a transparent adhesive layer 30, a transparent polymer film (B) 23 having a near infrared shielding function (75 μm), A transparent adhesive layer 30 and a transparent polymer film (B) 24 (80 μm) having a functional transparent layer (A) having an anti-reflection function are sequentially laminated to form a display filter.

In FIG. 14, the transparent adhesive layer 30 and the transparent polymer film (B) 23 (75
μm), a transparent adhesive layer 30, a transparent polymer film for raising (B) 25 (200 μm), a transparent adhesive layer 30, and a transparent polymer film (B) 24 (A) having a functional transparent layer (A) having an antireflection function. 80 μm) are sequentially laminated to form a display filter.

In FIG. 15, a transparent adhesive layer 30, a transparent polymer film for raising (B) 25 (200 μm), a transparent adhesive layer 30, a functional transparent layer (A) having an antireflection function, and a transparent material having an infrared shielding function are provided. Polymer film (B) 2
6 (150 μm) are sequentially laminated to form a display filter.

In FIG. 16, a transparent polymer film (B) having a transparent adhesive layer 30, a transparent polymer film for raising (B) 25 (200 μm), a transparent adhesive layer 30, and a transparent conductive layer (D) having an electromagnetic wave shielding function. ) 23 (75 μm), transparent adhesive layer 30, functional transparent layer showing antiglare function (A)
(B) 24 (150 μm)
Are sequentially laminated, and the electrode 5 is placed on the transparent polymer film 23.
0 is formed to constitute a display filter.

In FIG. 17, a transparent adhesive layer 30, a transparent polymer film for raising (B) 25 (200 μm), a transparent adhesive layer 30, a functional transparent layer (A) having an antireflection function, and a transparent layer having an electromagnetic wave shielding function are shown. A transparent polymer film (B) 26 (188 μm) having a conductive layer (D) is sequentially laminated, and electrodes 50 are formed on the transparent polymer films 25 and 26 to form a display filter.

FIG. 18 is a sectional view showing the structure of the transparent polymer film (B) 23 having the electromagnetic wave shielding function shown in FIG. A transparent conductive layer (D) 10 having an electromagnetic wave shielding function is formed on the polymer film (B) 20. The transparent conductive layer (D) 10 is made of a high refractive index transparent thin film layer (Dt) 11 and silver or silver. The metal thin film layer (Dm) 12 made of an alloy is Dt
/ Dm / Dt / Dm / Dt. A transparent adhesive layer 30 is provided on the back surface of the filter, and can be adhered to a display screen.

FIG. 19 is a sectional view showing the structure of the transparent polymer film (B) 26 having the electromagnetic wave shielding function shown in FIG. A transparent conductive layer (D) 10 having an electromagnetic wave shielding function is formed on the polymer film (B) 20. The transparent conductive layer (D) 10 is made of a high refractive index transparent thin film layer (Dt) 11 and silver or silver. The metal thin film layer (Dm) 12 made of an alloy is Dt
/ Dm / Dt / Dm / Dt / Dm / Dt. On the opposite surface of the polymer film (B) 20, an antireflection film 61 is provided as a functional transparent layer (A). A transparent adhesive layer 30 is provided on the back surface of the filter, and can be adhered to a display screen.

FIG. 20 is a plan view of the display filter shown in FIG. 16 or FIG. The filter has a rectangular planar shape, and the image displayed on the display is observed through the center of the filter. An electrode 50 electrically connected to the transparent conductive layer is formed at a peripheral portion including the long side and the short side of the filter, and the electrode 50 is connected to a ground terminal of the display.

9. Electrodes For devices that require electromagnetic shielding, provide a metal layer inside the case of the device or use a conductive material for the case to block radio waves. When transparency is required as in the case of a display screen, a window-shaped electromagnetic wave shield having a transparent conductive layer is provided. Since the electromagnetic wave induces an electric charge after being absorbed in the conductive layer, if the electric charge is not escaped by grounding, the electromagnetic wave shielding body again acts as an antenna to oscillate the electromagnetic wave and reduce the electromagnetic wave shielding ability.
Therefore, it is necessary that the electromagnetic wave shielding body and the ground portion of the display main body are electrically connected. Therefore, FIG.
As shown in the above, a transparent adhesive layer (C) is formed on the transparent conductive layer (D).
And when the functional transparent layer (A) is formed, the transparent adhesive layer (C) and the functional transparent layer (A) are formed on the transparent conductive layer (D) so as to leave a conductive portion. Is preferred.

The shape of the conductive portion is not particularly limited, but it is important that there is no gap for leakage of electromagnetic waves between the electromagnetic wave shield and the display body.

[0209] The electrode in the present invention refers to a portion of the electromagnetic wave shield that is electrically connected to the outside. This may be an exposed portion of the transparent conductive layer, or on the exposed portion,
For the purpose of protection and good electrical contact, a conductive metal paste may be printed or a conductive material such as a conductive tape or a conductive adhesive may be attached. Further, it may be formed on the functional transparent layer in such a manner that it can be electrically connected to the transparent conductive layer. As described above, the shape and material of the electrode are not particularly limited, but it is preferable to form the electrode so that the exposed portion of the transparent conductive layer is covered with the conductive material.

However, the electrode in the present invention may be obtained by bringing a conductive material into contact with a cross-sectional portion of the film of the present invention including a transparent conductive layer. The cross-sectional portion is a cross-sectional portion of the film including the transparent conductive layer, and it can be observed that at least the transparent conductive layer and the film for protecting the same have a layered shape. A desired electrode can be obtained as long as it is in contact with the cross section.

In this case, if the end of the transparent adhesive layer formed on the transparent conductive layer is located inside the end of the transparent conductive layer, the gap may be formed when the electrode is formed using a conductive paste or the like. This is preferable because the conductive paste enters the portion and the contact area between the transparent conductive layer and the electrode increases.

FIGS. 21 to 25 are sectional views showing examples of the structure of a display filter according to the present invention.

In FIG. 21, a transparent pressure-sensitive adhesive layer 30, a transparent polymer film (B) 23, a transparent conductive layer (D) 10, and an antiglare film 71 as a functional transparent layer (A) are sequentially laminated. An electrode 50 is formed on the layer (D) 10 to constitute a display filter.

In FIG. 22, an antiglare film 71 as a functional transparent layer (A), a transparent polymer film (B) 23, and a transparent conductive layer (D) 10 are sequentially laminated from the outside air side to the display side. Then, an electrode 50 is formed around the transparent conductive layer (D) 10. On the back surface of the transparent conductive layer (D) 10, a transparent adhesive layer 30 is provided at a central portion excluding the electrode 50, and can be bonded to a display screen.

In FIG. 23, a transparent adhesive layer 30, a transparent polymer film (B) 23, a transparent conductive layer (D) 10, and an antiglare film 71 as a functional transparent layer (A) are sequentially laminated. The electrode 50 is formed on the side end surface of the substrate to constitute a display filter.

In FIG. 24, a transparent adhesive layer 30, a transparent conductive layer (D) 10, a transparent polymer film (B) 23, and an antiglare film 71 as a functional transparent layer (A) are sequentially laminated. A conductive tape 51 such as a copper tape is interposed between the layer 30 and the transparent conductive layer (D) 10 around the filter to ensure the electrical connection of the transparent conductive layer (D) 10.

In FIG. 25, a transparent adhesive layer 30, a transparent conductive layer (D) 10, a transparent polymer film (B) 23, and an antiglare film 71 as a functional transparent layer (A) are sequentially laminated, and Through-hole electrode 5 penetrating in the thickness direction
2 are formed to secure the electrical connection of the transparent conductive layer (D) 10.

FIG. 26 is a plan view of the display filter shown in FIGS. The filter has a rectangular planar shape, and the image displayed on the display is observed through the center of the filter. An electrode 50 electrically connected to the transparent conductive layer and a conductive tape 5 are provided on the two long sides of the filter.
One or through-hole electrodes 52 are formed, and these electrodes are connected to a ground terminal of the display. The electrodes of the display filter shown in FIGS. 21 to 25 may be arranged on the entire periphery of the filter as shown in the plan view of FIG.

As shown in FIG. 24, a conductive tape such as a copper tape is sandwiched between the transparent conductive layer and the transparent adhesive layer to be laminated thereon, and a part of the conductive tape is drawn out of the electromagnetic wave shielding body. Electrodes may be formed. In this case, the conductive tape pulled out to the outside substantially serves as an electrode.

As shown in FIG. 25, an electrode may be formed by providing a gap from the transparent conductive layer to the outermost surface of the electromagnetic wave shield. The shape of the gap seen from the surface is not particularly specified, and may be circular or square. Further, it may be formed in a linear shape. There is no particular designation for the size of each gap seen from the surface. However, it is not preferable that the size is too large because the portion is applied to a visible portion. The formation position of the gap is not particularly specified as long as the position avoids the visible portion. Inevitably, it is located near the end. There is no particular limitation on the number of gaps to be formed, but it is preferable to form as many gaps as possible over the entire circumference because the current extraction efficiency increases. The gap may be provided between the transparent conductive layer and the outermost surface of the electromagnetic wave shield, but preferably penetrates the transparent conductive layer from the viewpoint of increasing the contact area with the electrode to be formed.

There is no particular designation for the member that fills the gap. It may be filled with a metal member or with a conductive paste. In this case, the member filling the gap becomes an electrode substantially.

It is preferable that the conductive portion is provided continuously at the peripheral portion of the transparent conductive layer (D). That is, it is preferable that the conductive portion is provided in a frame shape except for a central portion which is a display portion of the display.

However, even if a conducting portion is not formed in the entire circumference, there is a certain electromagnetic wave blocking ability. There are many.

For example, if a design is adopted in which a conductive material is applied only to opposing sides of a rectangle to form an electrode, the electrode can be formed by a roll-to-roll method, or the electrode can be formed in a rolled state. Therefore, the optical filter can be manufactured with very high production efficiency, which is convenient. This technique can also be used in the case where a conductive tape is used as an electrode as described above.

In addition to the portion other than the two opposing sides of the rectangle, the electrode is formed on another portion or the opposing two sides.
There is no particular problem even if there is a part where the electrode is not formed in a part of the side.

The electrode covering the conductive portion also protects the transparent conductive layer (D), which is poor in environmental resistance and scratch resistance. The material used for the electrode is simple or two of silver, gold, copper, platinum, nickel, aluminum, chromium, iron, zinc, carbon, etc., from the viewpoints of conductivity, contact resistance, and adhesion to the transparent conductive film. It is possible to use an alloy composed of the above, a synthetic resin and a mixture of these simple substances or alloys, or a paste composed of a borosilicate glass and a mixture of these simple substances or alloys. For forming an electrode, a conventionally known method such as a printing method or a coating method can be adopted for a paste or the like such as a plating method, a vacuum evaporation method, and a sputtering method.

There is no particular limitation on the conductive material used as long as it can conduct electricity. Usually, a paste made of a conductive material such as a silver paste is used.

As a method of forming the electrode, if it is a paste-like material, it is applied to a cross section and dried. The conductive material may be applied to the side surface of the film in a roll state, or may be applied to the side surface while being fed out in a roll-to-roll manner. Alternatively, a tape-shaped conductive material can be used.

Further, after a transparent polymer film having a transparent conductive thin film layer formed thereon is attached to a transparent support substrate, it can be applied to a cross section.

As a coating method, a screen printing method is often used from the viewpoint of efficiency and accuracy.

When the gap is filled with a metal member to form an electrode, the electromagnetic wave shield itself may not be processed in advance. A metal ground having a screw hole is prepared in the outer peripheral portion of the display device in advance, and the electromagnetic wave shield body is pasted to the display portion of the display device including the metal ground portion, and then the electromagnetic wave shield body is penetrated. In this way, the conductive screw may be embedded in the screw hole of the metal ground. In this case, the conductive screw substantially serves as an electrode. By using this method, the electromagnetic wave shield can be manufactured by the roll-to-roll method with high productivity, and the electrodes can be easily formed over the entire circumference of the electromagnetic wave shield.

10. Electromagnetic wave shield In order to minimize the leakage of electromagnetic waves between the electromagnetic wave shield and the display device, it is necessary to reduce the insulating space between the conductive layer of the electromagnetic wave shield and the display device as much as possible. If air or other insulating material is interposed in the gap, electromagnetic waves leak from the gap to the outside, which is not preferable.

In the case where a transparent conductive film is pasted on a supporting base to form an electromagnetic wave shielding body as in the prior art, it is necessary that the supporting base, which is mainly an insulator, exist between the transparent conductive layer and the display device. In other words, a sufficient electromagnetic wave blocking effect cannot be obtained unless the transparent conductive layer and the display device are brought into contact with each other so as to maintain conductivity over the entire circumference. For this reason, in the manufacturing process of the electromagnetic wave shielding body, it was necessary to perform a step of sticking the sheet to the transparent support base and a step of forming an electrode on the entire outer week portion of the sheet.

In the present invention, when the electromagnetic wave shield in a film state is directly stuck to a display device, the distance between the conductive layer and the display device is very short, so that the insulating space is significantly narrower than the conventional method. Therefore, a sufficient electromagnetic wave shielding effect can be obtained without forming the electrode over the entire circumference, which is preferable. This is remarkable when the transparent conductive layer of the electromagnetic wave shield is formed on the display device side. That is, by forming electrodes only on the two long sides of the rectangle, a sufficient electromagnetic wave shielding effect can be obtained. In that case, a roll-to-roll method, which is a method with extremely high productivity, can be used as a manufacturing method, which is very preferable.

[0235] 11. Display device and manufacturing method thereof The display device of the present invention includes a display filter that functions as an electromagnetic wave shield and / or a light control film adhered to a display unit of the device. The electromagnetic wave shield electrically contacts the display device.

The method of manufacturing a display device according to the present invention mainly includes the following methods (1) to (10), but is not limited thereto.

Method (1): Functional transparent layer (A) and conductive part (and electrode) / transparent conductive layer (D) / polymer film (B) (and hard coat layer (F)) / transparent adhesive layer ( C) or functional transparent layer (A) and conductive part (and electrode) / transparent adhesive layer (C) / transparent conductive layer (D) / polymer film (B) (and hard coat layer (F)) / The electromagnetic wave shielding body of the present invention, which is the transparent adhesive layer (C), is attached to the display section of the display device with the transparent adhesive layer (C) as an attachment surface.

After bonding, the conductive portion of the electromagnetic wave shielding body of the present invention or the electrode formed on the conductive portion and the conductive portion, that is, the ground portion of the display device main body, are connected with a conductive tape, a conductive adhesive, a conductive paint or Electrically connected with conductive molded parts.

Method (2): Lamination in the order of transparent conductive layer (D) / polymer film (B) (and hard coat layer (F)) / transparent adhesive layer (C) on the display section of the display device. After bonding the body with the transparent adhesive layer (C) as a bonding surface, the functional transparent layer (A) is directly or transparent adhesive layer (C) leaving a conductive part on the transparent conductive layer (D). Formed through
In addition, the conductive portion of the laminated body and the conductive portion of the display device body, that is, the ground portion, are electrically connected by a conductive tape, a conductive adhesive, a conductive paint, or a conductive molded part.

Method (3): A transparent adhesive layer (C) is applied or pasted on the display section of the display device, and the functional transparent layer (A) and the conductive section (and electrode) / transparent conductive layer (D) / After laminating the laminated body composed of the polymer film (B) (and the hard coat layer (F)) in this order with the polymer film (B) as a laminating surface, the conductive portion of the laminated body and the display device body are bonded. Are electrically connected with a conductive tape, a conductive adhesive, a conductive paint, or a conductive molded part.

Method (4): A transparent adhesive layer (C) is applied or pasted on the display portion of the display device, and the transparent conductive layer (D) / polymer film (B) (and hard coat layer (F)) After bonding the transparent laminate composed in this order with the polymer film (B) as the bonding surface, the functional transparent layer (A) is directly or And a conductive portion of the laminate and a conductive portion, that is, a ground portion of the display device body, are electrically connected to each other with a conductive tape, a conductive adhesive, a conductive paint, or a conductive molded part. Connection.

Method (5): Functional transparent layer (A) / polymer film (B) / transparent conductive layer (D) / transparent adhesive layer (C)
And an electromagnetic wave shielding body composed of a conductive adhesive layer and a transparent adhesive layer (C) as a bonding surface on at least a display portion of a display device, and a conductive adhesive layer as a bonding surface on at least a ground portion of the display device. Paste.

Method (6): At least the display portion of the display device, or at least the transparent conductive layer of the laminate composed of the transparent conductive layer (D) / polymer film (B) / functional transparent layer (A) in this order. After forming a transparent adhesive layer (C) on the translucent portion on (D) and forming a conductive adhesive layer on at least the ground portion of the display device or on the transparent conductive layer (D) of the laminate. Then, the laminate and a display device are attached to each other.

Method (7): Functional transparent layer (A) / polymer film (B) / transparent conductive layer (D) / transparent adhesive layer (C)
And an electro-conductive adhesive layer, wherein at least one end of the electro-magnetic shield is sandwiched between the transparent electro-conductive layer (D) and the polymer film (B) at a portion thereof by a conductive tape such as a copper tape. The transparent adhesive layer (C) is bonded to the display unit, and the externally exposed portion of the conductive tape is bonded to at least the ground part of the display device.

Method (8): At least the display portion of the display device, or at least the transparent conductive layer (D) / polymer film (B) / functional transparent layer (A) in this order, and the transparent conductive layer A transparent adhesive layer (C) is formed on the transparent portion of the transparent conductive layer (D) of the laminate in which a portion of the conductive tape such as a copper tape is sandwiched between (D) and the polymer film (B). After forming a conductive adhesive layer on at least the ground portion of the display device or on the transparent conductive layer (D) of the laminate, the laminate and the display device are bonded to each other.

The electromagnetic wave shield of the present invention has a transmission characteristic,
Since it has excellent transmittance and visible light reflectance, it can be formed in a plasma display to improve the color purity and contrast without significantly impairing the brightness of the plasma display. Furthermore, it has excellent electromagnetic wave shielding ability to block electromagnetic waves that are said to be harmful to health generated from plasma display,
Since the near-infrared ray near 800 to 1100 nm emitted from the plasma display is efficiently cut, the wavelength used by the remote controller of the peripheral electronic device, the transmission system optical communication and the like are not adversely affected, and the malfunction thereof can be prevented. Further, it has excellent weather resistance and environmental resistance, and has anti-reflection properties and / or anti-glare properties, scratch resistance, anti-fouling properties, anti-static properties, etc., and can be provided at low cost. By providing the electromagnetic wave shield of the present invention, a plasma display having excellent characteristics can be provided.

The electromagnetic wave shield of the present invention has optical characteristics,
FED (Field Emission Display), which generates electromagnetic waves and / or near-infrared rays other than plasma displays, because of its excellent electromagnetic wave shielding ability and near-infrared cut ability
It can be suitably used for various displays such as RT (Cathode Ray Tube).

With respect to the method of manufacturing a display device having a light control film, the following two methods are mainly mentioned, but the method is not limited thereto.

Method (9): A light-adjusting film of the present invention, which is at least a functional transparent layer (A) / polymer film (B) / transparent adhesive layer (C), is provided on at least a display portion of a display device with a transparent adhesive layer ( C) is bonded as a bonding surface.

Method (10): A polymer film of a laminate in which a transparent adhesive layer (C) is formed at least on a display portion of a display device and at least a transparent conductive layer (D) / polymer film (B) is formed in this order. (B) The surface is bonded to the display device as a bonding surface.

The light control film of the present invention has excellent transmission characteristics, transmittance, and reflection characteristics. Therefore, when the light control film is directly formed on a display portion of a display such as a color plasma display, the brightness of the display is not significantly impaired. Its color purity and contrast can be improved.
Further, it has scratch resistance, antifouling property, antistatic property and the like, and can be provided at low cost.

Further, by forming and providing the light control film of the present invention directly on the display surface, a display device having excellent characteristics can be provided.

[0253]

Next, the present invention will be described in detail with reference to examples. The present invention is not limited by these.

The thin film constituting the transparent conductive layer (D) in the examples was formed on one main surface of the substrate by magnetron DC sputtering. The thickness of the thin film is a value obtained from film forming conditions, and is not an actually measured film thickness.

The high-refractive-index transparent thin film layer (Dt) is formed of an ITO thin film, and a target is an indium oxide / tin oxide sintered body (composition ratio In ₂ O ₃ : SnO ₂ = 90: 10 wt%).
Alternatively, a tin oxide sintered body was formed using an argon / oxygen mixed gas (total pressure: 266 mPa: oxygen partial pressure: 5 mPa) as a sputtering gas.

The metal thin film layer (Dm) is formed of a silver thin film or a silver-palladium alloy thin film, using silver or a silver-palladium alloy (palladium 10 wt%) as a target and argon gas (total pressure 266 mPa) as a sputtering gas. A film was formed.

The sheet resistance of the transparent conductive layer was measured by a four-point probe measurement method (probe interval: 1 mm). The visible light reflectance (Rvis) of the surface is determined by first cutting out a small side of the object to be measured, removing the transparent adhesive layer, roughening the surface of the polymer film (B) side with sandpaper, and then spraying with matte black spray. The reflection on the lever was eliminated, and the total light reflectance in the visible region was measured by a spectrophotometer (U-3400, manufactured by Hitachi, Ltd.) using a reflection integrating sphere (light incidence angle 6 °), and the value was calculated here. The calculated reflectance was calculated according to JISR3106.

Example 1 Biaxially stretched polyethylene terephthalate (PET) film (thickness: 188 μm)
Is a polymer film (A), on one of its main surfaces, PE
In order from the T film, an ITO thin film (thickness: 40 nm),
Silver thin film (thickness: 11 nm), ITO thin film (thickness: 95 n)
m), silver thin film (thickness: 14 nm), ITO thin film (thickness:
90 nm), a silver thin film (thickness: 12 nm), and an ITO thin film (thickness: 40 nm), a total of seven transparent conductive layers (B) were formed, and a transparent conductive layer (B) having a sheet resistance of 2.2 Ω / □ was formed. The transparent laminated body 1 which has this was produced.

The cross section of the PET film / transparent conductive layer was compared with the polymer film (B) / transparent conductive layer (D) in the present invention.
(FIG. 1) is a cross-sectional view showing one example. In FIG. 1, reference numeral 10 denotes a transparent conductive layer (D), reference numeral 11 denotes a high refractive index transparent thin film layer (Dt), and reference numeral 12 denotes a metal thin film layer (D).
m), reference numeral 20 denotes a polymer film (B).

Ethyl acetate / toluene (50:50 wt.
%) An organic dye was dispersed and dissolved in a solvent to prepare a diluent of an acrylic pressure-sensitive adhesive. Acrylic pressure-sensitive adhesive / dilution solution containing pigment (80:20 wt%) was mixed, coated on the polymer film (B) side of transparent laminate 1 with a comma coater to a dry film thickness of 25 μm, and then dried and adhered. A release film was laminated on the surface to form a transparent adhesive layer (C) (adhesive 1) sandwiched between the release film and the polymer film (B) of the transparent laminate. The adhesive material 1 has a refractive index of 1.51,
The extinction coefficient was 0.

As the organic dye, a wavelength of 595 nm for absorbing unnecessary light emitted from the plasma display is used.
Dye PD-31 manufactured by Mitsui Chemicals, Inc.
9 and red dye PS-Red-G manufactured by Mitsui Chemicals, Inc. for correcting the chromaticity of white light emission.
The diluent containing the acrylic pressure-sensitive adhesive / pigment was adjusted to be contained at 0 (wt) ppm. PD-319 is a tetra-t-butyl-tetraazaporphyrin / vanadyl complex represented by the following formula (3).

[0262]

Embedded image

On one main surface of a triacetyl cellulose (TAC) film (thickness: 80 μm), a coat obtained by adding a photopolymerization initiator to a polyfunctional methacrylate resin and further dispersing ITO fine particles (average particle size: 10 nm). The liquid is applied by a gravure coater, a conductive hard coat film (thickness: 3 μm) is formed by ultraviolet curing, and a fluorine-containing organic compound solution is applied thereon by a microgravure coater, dried at 90 ° C., and heated. After curing, an antireflection film (thickness: 100 nm) having a refractive index of 1.4 was formed, and hard coat properties (JI
SK5400 compliant pencil hardness: 2H), gas barrier properties (ASTM-E96 compliant, 1.8 g / m ² · day),
An antireflection film 1 was obtained as a functional transparent layer (E) having antireflection properties (Rvis on the surface: 1.0%), antistatic properties (surface resistance: 7 × 10 ⁹ Ω / □), and antifouling properties. . The other main surface of the antireflection film 1 is coated with an adhesive / diluent that does not contain a dye using the same material as the adhesive 1 and dried to form a 25 μm-thick transparent adhesive layer (adhesive 2). Then, a release film was further laminated.

The roll-shaped transparent laminate 1 / adhesive 1 / release film was cut into a size of 970 mm × 570 mm.
The transparent conductive layer (D) face was fixed to a glass support plate with its surface facing up. Further, using a laminator, the transparent conductive layer (D)
The antireflection film was laminated only on the inside, leaving a conductive portion so that the peripheral portion of 20 mm was exposed. A plan view seen from the transparent conductive layer (D) surface is shown in FIG. 2 as a plan view showing an example of the electromagnetic wave shield of the present invention. In FIG. 2, reference numeral 02 denotes a light transmitting portion of the electromagnetic wave shield, and reference numeral 03 denotes a conduction portion of the electromagnetic wave shield.

Further, a silver paste (MSP-600F, manufactured by Mitsui Chemicals, Inc.) was screen-printed in a range of 22 mm in the peripheral portion so as to cover the exposed conductive portion of the transparent conductive layer (D), dried, and dried. An electrode having a thickness of 15 μm was formed. After removing from the support plate, the electromagnetic wave shield of the present invention having a release film on the transparent adhesive layer (C) surface was produced.

Further, the release film of the electromagnetic wave shield was peeled off and bonded to the front surface of the plasma display panel (display section 920 mm × 520 mm) using a single-wafer laminator, and then heated at 60 ° C. and 2 × 10 5 Pa. Autoclave treatment was performed under pressure and heating conditions. The electrode part of the electromagnetic wave shielding body and the ground part of the plasma display panel,
Teraoka Seisakusho's conductive copper foil adhesive tape (510F
R) to obtain a display device provided with the electromagnetic wave shield of the present invention. A cross-section of the electromagnetic wave shield is shown in FIG. 3 as a cross-sectional view showing an example of the electromagnetic wave shield of the present invention and an attached state thereof. In FIG.
Reference numeral 0 denotes a display unit, reference numeral 10 denotes a transparent conductive layer (D), reference numeral 20 denotes a polymer film (B), reference numeral 31 denotes a transparent adhesive layer containing a dye (C), reference numeral 40 denotes a transparent adhesive layer (E), Reference numeral 50 denotes an electrode, reference numeral 60 denotes a functional transparent layer (A) having antireflection properties, hard coat properties, gas barrier properties, antistatic properties, and antifouling properties; reference numeral 61 denotes an antireflection film having antifouling properties; Is a hard coat film having antistatic properties, and reference numeral 63 is a hard coat film 62 and an antireflection film 6.
Reference numeral 80 denotes a transparent copper foil adhesive tape on which a transparent substrate 1 is formed.

Example 2 A red dye PS-R manufactured by Mitsui Chemicals, Inc. for correcting the chromaticity of white light emission on polyethylene terephthalate pellets 1203 (manufactured by Unitika).
0.01% by weight of ed-G, also purple dye PS-Vi
Olet-RC is mixed at 0.015 wt%,
The film was melted at 80 ° C., and a film having a thickness of 200 μm was produced by an extruder. Thereafter, this film is biaxially stretched to obtain a dye-containing PET containing a dye having a thickness of 100 μm.
A film [polymer film (B)] was produced.

A coating liquid obtained by hydrolyzing alkoxysilane with glacial acetic acid and adding a silicone-based surface smoothing agent to one main surface of the PET film was applied by a gravure coater and hard-coated by heat curing at 120 ° C. Film (thickness:
10 μm, pencil hardness: 3H) was formed to obtain a dye-containing PET film having a hard coat layer (F) formed thereon. On the hard coat layer, an SnO ₂ thin film (thickness: 40 n
m), silver thin film (thickness: 9 nm), SnO ₂ thin film (thickness:
80 nm), silver-palladium alloy thin film (film thickness: 11 n)
m), a transparent conductive layer (D) having a total surface resistance of 5.3 Ω / □ of SnO ₂ thin film (thickness: 40 nm) was formed, and a dye-containing PET film / hard coat layer (F) / transparent A transparent laminate 2 serving as the conductive layer (D) was produced.

An adhesive / diluent that does not contain a dye is coated and dried on the PET film surface of the transparent laminate 2 with the same material as the adhesive 1, and the transparent adhesive layer (C) having a thickness of 25 μm (adhesive 3 ) Was formed, and a release film was further laminated.

The roll-shaped transparent laminate 2 / adhesive 3 / release film was cut into a size of 970 mm × 570 mm.
The transparent conductive layer (D) face was fixed to a glass support plate with its surface facing up.

A photopolymerization initiator was added to the polyfunctional methacrylate resin, and organic silica fine particles (average particle size: 15 μm) were added.
A coating liquid in which m) was dispersed was prepared.

Flexographic printing was performed only on the inside of the transparent conductive layer (D) such that the conductive portion was left so that the peripheral portion of the transparent conductive layer (D) was exposed, and then cured by ultraviolet rays to prevent glare (haze value measured by a haze meter: 5%). , Hard coat properties (pencil hardness: 2
An antiglare layer was formed as a functional transparent layer (A) having H). Remove from the support plate, transparent adhesive layer (C)
The electromagnetic wave shield of the present invention having a release film on the surface was produced.

Further, the release film of the electromagnetic wave shield was peeled off and bonded to the front of the plasma display panel (display section 920 mm × 520 mm) using a single-wafer laminator, and then heated to 60 ° C. and 2 × 10 5 Pa. Autoclave treatment was performed under pressure and heating conditions. The conductive part of the electromagnetic wave shield and the ground part of the plasma display panel are
Teraoka Seisakusho's conductive copper foil adhesive tape (510F
R) to obtain a display device provided with the electromagnetic wave shield of the present invention.

A cross section of the electromagnetic wave shield is shown in FIG. 4 as a cross-sectional view showing an example of the electromagnetic wave shield of the present invention and a mounted state thereof. In FIG. 4, reference numeral 00 denotes a display unit, reference numeral 10 denotes a transparent conductive layer (D), and reference numeral 2 denotes a display unit.
1 is a polymer film containing a dye (B), 22 is a hard coat layer (F), 30 is a transparent adhesive layer (C),
Reference numeral 70 denotes an antiglare layer (a functional transparent layer (E) having antiglare properties and hard coat properties), and reference numeral 80 denotes a conductive copper foil adhesive tape.

Example 3 A laminate of a polymer film (B) and a transparent conductive layer (D) was produced in the same manner as in Example 1. Further, the next functional transparent film 1 as a functional transparent layer (A) is continuously formed on a main surface of the PET film / transparent conductive layer opposite to the PET film wound into a roll by a roll-to-roll method. Formed. That is, a photopolymerization initiator is added to a polyfunctional methacrylate resin, and a coating liquid in which ITO fine particles (average particle diameter: 10 nm) is dispersed is applied by a gravure coater, and the conductive hard coat film (film thickness) is cured by ultraviolet curing. : 3 μm), and a fluorinated organic compound solution is coated thereon with a microgravure coater.
After drying at 0 ° C. and heat curing, an antireflection film (thickness: 100 nm) having a refractive index of 1.4 was formed, and hard coat properties (JIS
Pencil hardness according to K5400: 2H), anti-reflective property (Rvis of surface: 0.9%), anti-static property (surface resistance: 7 × 1)
0 ⁹ Ω / □) to form a functional transparent layer (A) having antifouling properties. The roll-shaped functional transparent layer (A) / polymer film (B) / transparent conductive layer (D) was 970 mm × 57.
The sheet was cut into a size of 0 mm, and was fixed to a glass support plate with the transparent conductive layer (B) face up. The organic dye was dispersed and dissolved in a solvent of ethyl acetate / toluene (50:50 wt%) to obtain a diluted solution of an acrylic pressure-sensitive adhesive. An acrylic pressure-sensitive adhesive / dilution solution containing a pigment (80:20 wt%) was mixed, and after coating the transparent conductive layer (D) with a batch type die coater to a dry film thickness of 25 μm except for a peripheral portion of 22 mm, It dried and the adhesive material 1 was formed as a transparent adhesive layer (C).
The adhesive material 1 had a refractive index of 1.51 and an extinction coefficient of 0.

The organic dyes are dyes PD-319 manufactured by Mitsui Chemicals, Inc. having an absorption maximum at a wavelength of 595 nm for absorbing unnecessary light emitted from a plasma display, and
A red dye PS-Red-G manufactured by Mitsui Chemicals, Inc. for correcting the chromaticity of white light emission was 1150 (wt) ppm and 1050 (wt) ppm in the dried adhesive material 1 respectively.
A diluted solution containing an acrylic pressure-sensitive adhesive / dye was prepared so as to be contained. PD-319 is a tetra-t-butyl-tetraazaporphyrin / vanadyl complex represented by the formula (3).

[0277]

Embedded image

Further, a two-part cold-setting adhesive (3381, manufactured by Three Bond Co., Ltd.) was applied to the exposed portion of the transparent conductive layer (D) so as to cover the exposed conductive portion within a range of 22 mm in the peripheral portion.
Is printed using a metal mask and dried to a thickness of 25 μm.
Was formed.

After removing from the support, a release film was laminated on the transparent pressure-sensitive adhesive layer (C) and the conductive pressure-sensitive adhesive layer to prepare an electromagnetic wave shield of the present invention having a release film on one side.

Further, the release film of the electromagnetic wave shield was peeled off and bonded to the front surface of the plasma display panel (display section 920 mm × 520 mm) using a single-wafer laminator. At this time, the alignment was performed so that the transparent adhesive layer (C) portion was bonded to at least the display portion and the conductive adhesive layer was bonded to at least the ground portion. After lamination, 6
Autoclave treatment was performed under a pressure and heating condition of 0 ° C. and 2 × 10 ⁵ Pa to obtain a display device equipped with the electromagnetic wave shield of the present invention.

A plane viewed from the transparent adhesive layer side of the electromagnetic wave shield is shown in FIG. 5 as a plan view showing an example of the electromagnetic wave shield of the present invention. In FIG.
Reference numeral 1 denotes a transparent adhesive layer (C) containing a dye, and reference numeral 41 denotes a conductive adhesive layer.

A cross section of the electromagnetic wave shield is shown in FIG. 6 as a cross-sectional view showing an example of the electromagnetic wave shield of the present invention and a mounted state thereof. 6, reference numeral 00 denotes a display unit, reference numeral 10 denotes a transparent conductive layer (D), and reference numeral 2 denotes a display unit.
0 is a polymer film (B), 31 is a transparent adhesive layer containing a dye (C), 41 is a conductive adhesive layer, and 60 is an antireflection property, a hard coat property, an antistatic property, and an antifouling property. The functional transparent layer (A), reference numeral 61 denotes an antireflection film having antifouling properties, and reference numeral 62 denotes a hard coat film having antistatic properties.

Example 4 A polymer film (B) was produced in the same manner as in Example 3. A red dye PS-Re manufactured by Mitsui Chemicals, Inc. for correcting the chromaticity of white light emission on polyethylene terephthalate pellets 1203 (manufactured by Unitika).
0.01% by weight of d-G, also purple dye PS-Vio
Let-RC is mixed at 0.015 wt%,
The film was melted at 0 ° C. and a film having a thickness of 200 μm was produced by an extruder. Thereafter, this film was biaxially stretched to prepare a dye-containing PET film which is a polymer film (B) containing a dye having a thickness of 100 μm.

On one main surface of the PET film, S
nO ₂ thin film (thickness: 40 nm), silver thin film (thickness: 9 n)
m), SnO ₂ thin film (thickness: 80 nm), silver-palladium alloy thin film (thickness: 11 nm), SnO ₂ thin film (thickness:
The transparent conductive layer (D) having a total surface resistance of 5.3 Ω / □ (40 nm) was formed, and a transparent laminate 2 of a PET film / a transparent conductive layer (D) containing a dye was prepared by roll-to-roll. did.

The above PET wound in a roll form
The next functional transparent film 2 was continuously formed as a functional transparent layer (A) on a main surface of the film / transparent conductive layer opposite to the PET film by roll-to-roll. A photopolymerization initiator was added to the polyfunctional methacrylate resin, and a coating liquid in which organic silica fine particles (average particle size: 15 μm) were dispersed was prepared. After coating, the coating liquid was cured by ultraviolet light, and the antiglare property (measured by a haze meter). Haze value: 5%), hard coat property (pencil hardness:
An antiglare layer was formed as the functional transparent layer (A) having 2H).

The roll-shaped functional transparent layer (A) / polymer film (B) / transparent conductive layer (D) was 970 mm ×
It was cut to a size of 570 mm and fixed to a glass support plate with the transparent conductive layer (D) face up.

A pressure-sensitive adhesive material 2 similar to the pressure-sensitive adhesive material 1 of Example 1 but containing no dye was formed on a release film to a thickness of 25 μm. The adhesive 2 / release film was laminated on the transparent conductive layer and on the inside with the peripheral portion left at 20 mm using a frame laminator with the adhesive 2 as a bonding surface.
Further, a conductive double-sided adhesive tape (WMFT791 manufactured by Teraoka Seisakusho) is peeled off from the release film on one side so as to cover the exposed conductive part of the transparent conductive layer (D) in a range of 20 mm in the peripheral portion. Was.

The electromagnetic wave shield of the present invention having a release film on one side was prepared by removing the support from the support. Further, the release film of the electromagnetic wave shield was peeled off, and the front face of the plasma display panel (display section 920 mm × 5 mm) was removed.
20 mm) using a single-wafer laminator.
At this time, a transparent adhesive layer (C) portion is bonded to at least the display portion, and a conductive adhesive layer is bonded to at least the ground portion.
Alignment was performed. After bonding, 60 ℃, 2 × 10
Autoclave treatment was performed under a pressure and heating condition of ⁵ Pa to obtain a display device provided with the electromagnetic wave shield of the present invention.

A cross section of the electromagnetic wave shield is shown in FIG. 7 as a cross-sectional view showing an example of the electromagnetic wave shield of the present invention and a mounted state thereof. 7, reference numeral 00 denotes a display unit, reference numeral 10 denotes a transparent conductive layer (D), and reference numeral 2 denotes a display unit.
Reference numeral 1 denotes a dye-containing polymer film (B), reference numeral 30 denotes a transparent adhesive layer (C), reference numeral 41 denotes a conductive adhesive layer, and reference numeral 70 denotes an antiglare layer (a functional transparent layer having an antiglare property and a hard coat property). E)).

(Comparative Example 1) PET film (thickness: 18)
8 μm) as a polymer film (B), a transparent conductive layer having a sheet resistance of 15Ω / □ made of an ITO thin film (thickness: 400 nm) was formed on one main surface of the polymer film (B), and a transparent laminate 3 was produced. An electromagnetic wave shield was produced in the same manner as in Example 1 except that a dye was not used, using the transparent laminate 3, and a display device including the same was obtained.

The following evaluations were performed on the plasma displays, which are the display devices having the electromagnetic wave shield of the present invention, obtained in Examples 1 to 4 as described above.

1) Transmittance of Electromagnetic Wave Shield Body CRT Color Analyzer (CA10 manufactured by Minolta Co., Ltd.)
0), the spectral radiance of the plasma display before and after the formation of the electromagnetic wave shield was obtained, and the ratio of the luminance after formation to the luminance before formation was shown as a percentage.

2) Bright display contrast ratio (maximum / lowest luminance ratio) of plasma display Evaluation was made before and after forming the electromagnetic wave shield. The maximum luminance (cd / m ² ) in the white display and the minimum luminance (cd / m ² ) in the black display of the plasma display panel at the time of light with an ambient brightness of 100 lx are measured by a luminance meter (LS) manufactured by Minolta Co., Ltd. -110), and the ratio (highest luminance / lowest luminance) was determined.

3) Color purity of emission color of plasma display Evaluation was made before and after forming the electromagnetic wave shield. The measurement was performed when the display filter was not mounted on the plasma display and when the display filters of Examples 1 and 2 were mounted. In white (W), red (R), green (G), and blue (B) displays, a CRT color analyzer (CA1 manufactured by Minolta Co., Ltd.) was used.
00), the RGB chromaticity (x, y), the chromaticity of white, the color temperature, and the white deviation from the blackbody locus were measured. PD
It is preferable that the three primary colors of P emission be closer to the color reproduction range of the RGB colors defined by the NTSC system. Also, the NTSC of the area of the triangle connecting the three primary colors of PDP emission on the xy chromaticity diagram
When the percentage of the ratio of the color reproduction range to the area approaches 100%, it indicates that the color reproduction range is widened.

4) Electromagnetic Wave Shielding Ability The following measurements were performed on a plasma display having no electromagnetic wave shielding body and a plasma display provided with the electromagnetic wave shielding bodies of Examples 1 to 4 and Comparative Example 1. A dipole antenna was installed at a position 10 m away from the center of the display unit with a flush fragrance on the surface, and 30 to 230 MHz using an Advantest Spectral Analyzer (TP4172).
The radiated electric field intensity in the z band was measured. VCCI 3
In the m method, the allowable value in this area is 5 for Class A.
0 dBμV / m or less, Class B: 40 dBμV / m or less. The evaluation was performed at 33 MHz and 90 MHz.

5) Near-Infrared Transmittance of Electromagnetic Shield The electromagnetic shields of Examples 1 to 4 and Comparative Example 1 were evaluated. Cut out the transparent part of the electromagnetic wave shield into small pieces,
By Hitachi, Ltd. spectrophotometer (U-3400)
The parallel light transmittance at 800 to 1000 nm was measured and found to be 82
The transmittance at 0 nm, 850 nm, and 950 nm was evaluated.

6) Near-infrared cut-off capability The following measurements were performed on a plasma display having no electromagnetic wave shield and a plasma display provided with the electromagnetic wave shield of Examples 1, 2 and Comparative Example 1. A home VTR as an electronic device using an infrared remote controller was separated from a 0.2 to 5 m display, and its malfunction was confirmed. If there was a malfunction, the limit distance was determined. Practically, it is at least 3 m or less, preferably 1.5 m or less.

The electromagnetic wave shield of the present invention of Example 1
The transmittance of the plasma display emission is 50% in visible light transmittance, and a wavelength of 610 n with necessary emission is obtained by a dye having an absorption maximum at a wavelength of 595 nm with unnecessary emission.
The percentage of the transmission at 595 nm relative to the transmission at m is 3
8%. Further, the plasma display provided with the same uses an electromagnetic wave shield having a functional transparent layer (A) having anti-reflection properties, thereby suppressing reflection on the display surface. Due to the transmission characteristics of the body, the bright place contrast ratio under the condition of the ambient illuminance of 100 lx was improved to 45 compared to 20 before the electromagnetic wave shielding body was formed. In addition, since there was little reflection, a plasma display with good visibility was obtained.

The electromagnetic shield of the present invention in Example 2 has a plasma display emission transmittance of 5 visible light transmittance.
Since it was 8% and there was little reflection, a plasma display with good visibility was obtained. Bright place contrast ratio is 2
It was improved from 0 to 37.

The electromagnetic wave shield according to the third embodiment of the present invention has a plasma display emission transmittance of 5 visible light transmittance.
Since it was 8% and there was little reflection, a plasma display with good visibility was obtained. Bright place contrast ratio is 2
It was improved from 0 to 37.

The electromagnetic wave shield of the present invention of Example 4 has a plasma display emission transmittance of 5 in visible light transmittance.
Since it was 9% and there was little reflection, a plasma display with good visibility was obtained. Bright place contrast ratio is 2
It was improved from 0 to 37.

FIG. 8 is an xy chromaticity diagram showing the color reproduction range before and after the formation of the electromagnetic wave shield. (Fig. 8) is PD
White (W), red (R), before and after forming the electromagnetic wave shield of Example 1 on P (plasma display panel),
The chromaticity of green (G) and blue (B) emission is plotted on an xy chromaticity diagram. Further, the target chromaticity of NTSC is also plotted.

The white color can be evaluated at a position compared with a black body locus which is a locus of a suitable white chromaticity. It can be seen that when the electromagnetic wave shield of the present invention is used, the chromaticity deviation of white is small, and that the color temperature is higher than before forming the electromagnetic wave shield of Example 1. Color temperature is about 70
It increased from 00K to about 10,000K.

Also, triangles connecting the RGB points are shown in the figure. It can be said that the closer to NTSC, the better. By using the electromagnetic wave shield of the first embodiment,
It can be seen that the chromaticity of green approaches the chromaticity indicated by NTSC, and the triangle indicating the color reproduction range becomes larger. When the percentage of the area of the triangle with respect to the area of the triangle indicated by NTSC was calculated, it was 74% before forming the electromagnetic wave shield of Example 1, but 8% by forming it.
It was improved to 5%. The results of the above evaluations 4) to 6) are summarized in Table 1.

[0305]

[Table 1]

From Table 1, it can be seen that the use of the electromagnetic wave shield of the present invention makes it possible to use the Class B or Class
It turns out that A can be cleared. The lower the surface resistance of the transparent electrodynamic transmission, the better the electromagnetic wave shielding ability.

[0307] It is also found that the use of the electromagnetic wave shield of the present invention provides excellent near-infrared ray cutting performance. The electromagnetic wave shielding body of the present invention using a transparent conductive layer obtained by laminating a metal thin film and a high refractive index transparent thin film at a high rate has a low near-infrared transmittance, excellent near-infrared cut ability, and a sheet resistance of the transparent conductive layer. The lower the value, the better the near-infrared cut ability. Furthermore, the electromagnetic wave shielding body of the present invention is excellent in environmental resistance and / or scratch resistance and / or antifouling property and / or antistatic property by giving each function to the functional transparent layer (D). ing.

Example 5 Triacetylcellulose (T
AC) A film (thickness: 80 μm) is used as a polymer film (B), and the next functional transparent film 1 is continuously formed on one main surface as a functional transparent layer (A) by roll-to-roll. Formed. That is, a photopolymerization initiator is added to a polyfunctional methacrylate resin, and a coating liquid in which ITO fine particles (average particle diameter: 10 nm) is dispersed is applied by a gravure coater, and the conductive hard coat film (film thickness) is cured by ultraviolet curing. : 3 μm), and a fluorinated organic compound solution is coated thereon with a microgravure coater.
After drying at 0 ° C. and heat curing, an antireflection film (thickness: 100 nm) having a refractive index of 1.4 was formed, and hard coat properties (JIS
Pencil hardness according to K5400: 2H), anti-reflective property (Rvis of surface: 0.9%), anti-static property (surface resistance: 7 × 1)
0 ⁹ Ω / □), and a functional transparent film 1 having antifouling properties was formed.

Ethyl acetate / toluene (50:50 wt.
%) An organic dye was dispersed and dissolved in a solvent to prepare a diluent of an acrylic pressure-sensitive adhesive. Acrylic adhesive / dilution solution containing pigment (80:20 wt%) is mixed, and functional transparent film 1 / TA
An adhesive material 1 was formed as a transparent adhesive layer (C) on the TAC film surface of the C film by applying with a comma coater to a dry film thickness of 25 μm, followed by drying. A release film was laminated on the transparent pressure-sensitive adhesive layer surface and wound up in a roll to obtain a roll-shaped light control film of the present invention having a release film on the transparent pressure-sensitive adhesive layer surface.

As the organic dye, a wavelength of 595 nm for absorbing unnecessary light emitted from the plasma display is used.
Dye PD-31 manufactured by Mitsui Chemicals, Inc.
9, and a red dye PS-Red-G manufactured by Mitsui Chemicals, Inc. for correcting the chromaticity of white light emission.
An acrylic pressure-sensitive adhesive / dilution solution containing a dye was prepared so as to contain (wt) ppm. PD-319 is a tetra-t-butyl-tetraazaporphyrin of the formula (3)
It is a vanadyl complex.

[0311]

Embedded image

Further, the light control film was cut into a sheet, the release film was peeled off, and the film was bonded to the front surface of a plasma display panel (display section 920 mm × 520 mm) using a single-wafer laminator. At this time, the sheet was cut and the bonding position was adjusted so that the transparent adhesive layer (C) portion was bonded to at least the entire display portion. After lamination, 60
The mixture was subjected to autoclave treatment under pressure and heating conditions of 2 × 10 5 Pa at a temperature of 2 ° C. to obtain a display device equipped with the light control film of the present invention.

A cross section of the light control film is shown in FIG. 9 as a cross-sectional view showing an example of the light control film of the present invention and a mounted state thereof. 9, reference numeral 00 denotes a display unit, reference numeral 20 denotes a polymer film (B), reference numeral 31 denotes a transparent adhesive layer containing a pigment (C), reference numeral 60 denotes an antireflection property,
A functional transparent layer (A) having a hard coat property, an antistatic property, and an antifouling property;
Reference numeral 62 denotes a hard coat film having an antistatic property.

Example 6 Polyethylene terephthalate (PET) pellets 1203 (manufactured by Unitika Ltd.)
Dye PD manufactured by Mitsui Chemicals, Inc. represented by the above formula (3)
-319 is 0.018 wt%, and dye PD-311 manufactured by Mitsui Chemicals, Inc., which has an absorption maximum at a wavelength of 585 nm, is 0.0
18 wt%, 0.004 wt% of red dye PS-Red-G manufactured by Mitsui Chemicals, Inc. for correcting chromaticity of white light emission
The mixture was mixed and melted at 260 to 280 ° C., and a 250 μm-thick film was produced by an extruder. Thereafter, this film was biaxially stretched to prepare a dye-containing PET film which is a polymer film (B) containing a dye having a thickness of 125 μm. PD-311 is a tetra-t-butyl-tetraazaporphyrin / copper complex of the formula (4).

[0315]

Embedded image

The above PET wound in a roll form
The next functional transparent film 2 was continuously formed on one main surface of the film as a functional transparent layer (A) by roll-to-roll. That is, a photopolymerization initiator is added to a polyfunctional methacrylate resin, and organic silica fine particles (average particle diameter: 15 μm) are added.
m) was dispersed therein, a coating liquid was prepared, and after coating, it was cured by ultraviolet rays, and the film was subjected to an antiglare property (haze value measured by a haze meter: 5).
%) And a functional transparent film 2 which is an antiglare layer having a hard coat property (pencil hardness: 2H). Example 1
The adhesive material 2 containing the same material as the adhesive material 1 and containing no dye was formed on the PET film surface of the functional transparent film 2 / the PET film containing the dye. A release film was laminated on the transparent pressure-sensitive adhesive layer surface and wound up in a roll to obtain a roll-shaped light control film of the present invention having a release film on the transparent pressure-sensitive adhesive layer surface.

Further, the light control film was cut into a sheet, the release film was peeled off, and the film was bonded to the front surface of a plasma display panel (display section 920 mm × 520 mm) using a single-wafer laminator. At this time, the sheet was cut and the bonding position was adjusted so that the transparent adhesive layer (C) portion was bonded to at least the entire display portion. After lamination, 60
The mixture was subjected to autoclave treatment under pressure and heating conditions of 2 × 10 ⁵ Pa at a temperature of 2 ° C. to obtain a display device provided with the light control film of the present invention.

A cross section of the light control film is shown in FIG. 10 as a cross-sectional view showing an example of the light control film of the present invention and a mounted state thereof. In FIG. 10, reference numeral 00 denotes a display unit, reference numeral 21 denotes a transparent adhesive layer (C) containing a dye, reference numeral 30 denotes a transparent adhesive layer (C), and reference numeral 70 denotes an antiglare layer (has antiglare properties and hard coat properties). It is a functional transparent layer (A).

Examples 5 and 6 obtained as described above
The plasma display as the display device having the light control film of the present invention was evaluated as follows together with the plasma display before the light control film was formed.

1) Transmittance of light control film CRT color analyzer (CA10 manufactured by Minolta Co., Ltd.)
Using 0), the spectral radiance of the plasma display before and after forming the light control film was determined, and the ratio of the luminance after formation to the luminance before formation was expressed as a percentage.

2) Brightness contrast ratio (maximum / lowest luminance ratio) of plasma display Evaluation was made before and after forming a light control film. Ambient brightness 1
In the bright state of 00lx, the maximum luminance (cd / m ² ) in the white display and the minimum luminance (cd / m ² ) in the black display of the plasma display panel were measured by a luminance meter (LS-110) manufactured by Minolta Co., Ltd. And the ratio (maximum luminance /
(Lowest luminance).

3) Color purity of emission color of plasma display Evaluation was made before and after forming a light control film. In white (W) display, red (R) display, green (G) display, and blue (B) display, RGB chromaticity (x, y) and white are displayed using a CRT color analyzer (CA100) manufactured by Minolta Co., Ltd. , Chromaticity, color temperature, and white deviation from the blackbody locus were measured. It is preferable that the three primary colors of PDP emission be determined by the NTSC system and be closer to the color reproduction range of RGB colors. Also, the area of a triangle connecting the three primary colors of PDP light emission on the xy chromaticity diagram, NT
100% of the ratio of SC color gamut to surface responsibility
Indicates that the color reproduction range is widened as the value approaches.

The light control film of the present invention of Example 5 had a transmittance of 69% in visible light transmittance of plasma display emission.
The percentage of the transmittance at 595 nm with respect to the transmittance at 610 nm with the necessary light emission was 21% due to the dye having the absorption maximum at the wavelength of 595 nm with the unnecessary light emission. Also, a plasma display equipped with this is
By using a light control film having a functional transparent layer (A) having antireflection properties, the reflection on the display surface was suppressed, and due to the transmission characteristics of the light control film, an ambient illuminance of 100 lx was obtained. The bright place contrast ratio under the conditions was improved from 41 before forming the light control film to 41. Since the luminance was not significantly impaired and the reflection was small, a plasma display with good visibility was obtained. In addition, the color purity of the red and green luminescence is particularly significantly improved. The improvement in color purity of the green emission is due to the reduction of the yellow-green emission of the 595 nm absorbing dye.

Similarly, the light modulating film of the present invention of Example 6 has a plasma display transmittance of 70% in visible light transmittance, and the same wavelength of 585 nm as a dye having an absorption maximum at a wavelength of 595 nm where unnecessary light is emitted. The percentage of the transmittance at 595 nm with respect to the transmittance at 610 nm with the required light emission was 30% from the dye having the maximum absorption. Also, a plasma display equipped with this is
Due to the transmission characteristics of the light control film, the bright place contrast ratio under the condition of the ambient illuminance of 100 lx was improved to 37 compared to 20 before the light control film was formed. Since the luminance was not significantly impaired and the reflection was small, a plasma display with good visibility was obtained.
In addition, the color purity of the red and green luminescence is particularly significantly improved. The improvement in color purity of the green emission is due to the reduction of the yellow-green emission of the 595 nm and 585 nm absorbing dyes. In particular, the effect was great with a 585 nm absorption dye that absorbs shorter wavelengths.

FIG. 11 is an xy chromaticity diagram showing the color reproduction range before and after the formation of the light control film of the present invention.

FIG. 11 shows the chromaticity of white (W), red (R), green (G), and blue (B) emission before and after forming the light control film of Example 5 on a PDP (plasma display panel). Are plotted on an xy chromaticity diagram. Further, the target chromaticity of NTSC is also plotted.

White can be evaluated at a position compared with a black body locus which is a locus of a suitable white chromaticity. It can be seen that when the electromagnetic wave shield of the present invention is used, the chromaticity deviation of white is small, and the color temperature is higher than before forming the light control film of Example 5 or 6. The color temperature increased from about 7000K to about 9500K, and the white deviation indicating a deviation from the blackbody locus was almost zero.

A triangle connecting the RGB points is shown in the figure. It can be said that the closer to NTSC, the better. By using the light control film of Example 5 or Example 6, the chromaticity of red and green approaches the chromaticity indicated by NTSC,
It can be seen that the triangle indicating the color reproduction range is larger. When the percentage of the area of the triangle with respect to the area of the triangle indicated by NTSC was determined, it was 74% before forming the light control film of Example 5, but could be improved to 86% by forming. Also, when the light control film of Example 6 was formed, the improvement was 88%.

Further, the light modulating film of the present invention is excellent in abrasion resistance and / or antifouling property and / or antistatic property by giving each function to the functional transparent layer (A).

Example 7 Polyethylene terephthalate pellets 1203 (manufactured by Unitika Ltd.) are SIR-128 and SIR-1 manufactured by Mitsui Chemicals, Inc.
30 was mixed at about 280 ° C. and then extruded biaxially to produce a 150 μm thick near infrared shielding film. Further, ethyl acetate / toluene (50: 5
0 wt%) Using a solvent as a diluent, an acrylic pressure-sensitive adhesive and a diluent were mixed at a ratio of 80:20, coated on a near-infrared shielding film surface with a comma coater to a dry film thickness of 25 μm, and dried. Then, an adhesive layer was formed, and a release film was laminated.

On the near-infrared shielding film (B) produced as described above, an antireflection film having a base film thickness of 188 μm (Realok 1200, manufactured by NOF Corporation) was laminated and cut into a length of 960 mm and a width of 550 mm. Thereby, the total thickness of the transparent polymer film is 0.338.
mm was obtained.

This film is 980 mm long × 580 mm wide.
X: Affixed to a 2.5 mm thick semi-tempered glass plate.

Example 8 Polyethylene terephthalate pellets 1203 (manufactured by Unitika Ltd.) were used as near infrared absorbing dyes, SIR-128 and SIR-1 manufactured by Mitsui Chemicals, Inc.
30 was mixed at about 280 ° C. and then extruded biaxially to produce a near infrared shielding film having a thickness of 75 μm. Further, ethyl acetate / toluene (50:50 w
(t%) Using a solvent as a diluent, an acrylic pressure-sensitive adhesive and a diluent were mixed at a ratio of 80:20, coated on a near-infrared shielding film surface with a comma coater to a dry thickness of 25 μm, and dried Then, an adhesive layer was formed, and a release film was laminated.

A 200 μm thick transparent polymer film for raising was prepared by the same method without adding a near infrared absorbing dye.

A near-infrared shielding film was laminated with an antireflection film having a base film thickness of 80 μm (manufactured by Nippon Oil & Fat Co., Rialok 2200), and was 960 mm long × 550 wide.
After cutting to a thickness of 200 mm, the film was laminated on a transparent polymer film for raising a film having a thickness of 200 μm. Thus, an optical filter film having a total thickness of the transparent polymer film of 0.355 mm was obtained. This film has a length of 980
It was stuck to a semi-tempered glass plate having a size of 580 mm in width and 2.5 mm in thickness.

(Embodiment 9) The thickness 150 shown in Embodiment 7
The following functional transparent film was continuously formed as a functional transparent layer (A) on the main surface of the near-infrared shielding film having a thickness of μm by roll-to-roll. That is, a photopolymerization initiator is added to a polyfunctional methacrylate resin, and a coating liquid in which organic silica fine particles (average particle size: 15 μm) is dispersed is prepared. A functional transparent layer having an antiglare function having a measured haze value of 5% and a hard coat property (pencil hardness: 2H) was formed.

The transparent polymer film having the near-infrared shielding function and the anti-glare function has the thickness of 200 μm shown in Example 14.
An optical filter film having a total thickness of the transparent polymer film of 0.350 mm was obtained by laminating the transparent polymer film for raising m of m and cutting it into a length of 960 mm and a width of 550 mm. This film has a length of 980
It was stuck to a semi-tempered glass plate having a size of 580 mm in width and 2.5 mm in thickness.

Example 10 A polyethylene terephthalate film having a thickness of 75 μm was prepared by extrusion biaxial stretching, and a SnO ₂ thin film (film thickness: 40 nm) and a silver thin film (film thickness: : 9 nm), Sn
O ₂ thin film (thickness: 80 nm), silver-palladium alloy thin film (thickness: 11 nm), SnO ₂ thin film (thickness: 40 nm)
Were formed, and a transparent polymer film having an electromagnetic wave shielding function and having a transparent conductive thin film layer (D) having a sheet resistance of 5.3 Ω / □ was produced.

An adhesive layer was formed on the above-mentioned electromagnetic wave shielding film by the following method. Ethyl acetate / toluene (5
(0:50 wt%) An organic dye was dispersed and dissolved in a solvent to obtain a diluent of an acrylic pressure-sensitive adhesive. The organic dye is a dye PD- manufactured by Mitsui Chemicals, which has an absorption maximum at a wavelength of 595 nm for absorbing unnecessary emission emitted by the plasma display.
319 and a red dye PS-Red-G manufactured by Mitsui Chemicals for correcting the chromaticity of white light emission were 1150 (wt) ppm and 1050 (wt) p in a dried adhesive material, respectively.
The acryl-based pressure-sensitive adhesive / dilution solution containing the dye was adjusted to contain pm.

Acrylic adhesive / dilution containing dye (8
0:20 wt%), and coated with a comma coater to a dry film thickness of 25 μm on the surface of the electromagnetic wave shielding film side.
After drying and laminating a release film on the adhesive surface, a transparent adhesive layer was formed.

This film was prepared in the same manner as in Example 8 with a thickness of 20
A transparent conductive thin film layer is laminated on a transparent polymer film for raising 0 μm with a length of 960 mm × width of 5 mm.
It was cut to 50 mm.

Further, an antireflection film having a base film thickness of 188 μm (manufactured by NOF Corporation) was cut into a length of 920 mm and a width of 510 mm, and the antireflection film was exposed so that the periphery of the transparent conductive thin film layer was exposed at 20 mm. Pasted inside. Further, a silver paste (MSP-600F, manufactured by Mitsui Chemicals, Inc.) was applied to the peripheral portion in a width of 22 mm so as to cover the exposed conductive portion of the transparent conductive thin film layer.
Was screen-printed and dried to form an electrode having a thickness of 15 μm. Thus, an optical filter film having a total thickness of the transparent polymer film of 0.463 mm was obtained. This film was bonded to a semi-tempered glass plate having a length of 980 × width 580 mm × thickness 2.5 mm.

Example 11 A polyethylene terephthalate film having a thickness of 200 μm was prepared by extrusion biaxial stretching, and an ITO thin film (film thickness: 40 nm) and a silver thin film (film thickness: 11 nm), I
TO thin film (thickness: 95 nm), silver thin film (thickness: 14 n)
m), ITO thin film (thickness: 90 nm), silver thin film (thickness:
12 nm) and an ITO thin film (thickness: 40 nm), a total of seven transparent conductive thin film layers (F) were formed, and the sheet resistance was 2.2 Ω / □.
An electromagnetic wave shielding film having a transparent conductive layer was prepared.

Further, the next functional transparent layer was continuously formed on the other main surface of the electromagnetic wave shielding film on which the transparent conductive thin film layer was not formed by roll-to-roll. That is, a photopolymerization initiator is added to a polyfunctional methacrylate resin, and a coating liquid in which ITO fine particles (average particle diameter: 10 nm) is dispersed is applied by a gravure coater, and the conductive hard coat film (film thickness) is cured by ultraviolet curing. : 3 μm), and a fluorine-containing organic compound solution is coated thereon with a microgravure coater, dried at 90 ° C., and thermally cured to form an antireflection film having a refractive index of 1.4 (film thickness: 100 nm). , Hard coat properties (pencil hardness according to JIS K5400: 2H), antireflection properties (Rvis on the surface: 0.9%),
A functional transparent layer having antistatic properties (surface resistance: 7 × 10 ⁹ Ω / □) and antifouling properties was formed.

Further, ethyl acetate / toluene (50: 5
0 wt%) Using a solvent as a diluent, an acrylic pressure-sensitive adhesive and a diluent were mixed at a ratio of 80:20, and coated on a transparent conductive layer surface with a comma coater to a dry film thickness of 25 μm.
After drying, the release film was laminated to form a transparent adhesive layer.

The above-mentioned electromagnetic wave shielding film with a functional transparent layer was cut into a length of 920 mm × a width of 510 mm and a length of 960 m
On a transparent polymer film for raising having a thickness of 200 μm and cut to mx 550 mm in width, the film was internally adhered except for each peripheral portion of 20 mm.

Further, a silver paste (MSP-600F, manufactured by Mitsui Chemicals, Inc.) was screen-printed in a range of 22 mm in width of the peripheral portion so as to cover the conductive section in the thickness section of the transparent conductive layer, dried, and dried to a thickness of 15 μm. Electrodes were formed. Thus, an optical filter film having a total thickness of the transparent polymer film of 0.4 mm was obtained. This film was bonded to a semi-tempered glass plate having a length of 980 × width 580 mm × thickness 2.5 mm.

(Comparative Example 2) Thickness 150 shown in Example 9
μm near infrared shielding film, base film thickness 80
An optical filter film having a total thickness of 0.230 mm was obtained by laminating an antireflection film having a thickness of μm. This film was bonded to a semi-tempered glass plate having a length of 980 × width 580 mm × thickness 2.5 mm.

(Comparative Example 3) Thickness 75 shown in Example 10
μm electromagnetic wave shielding film and base film thickness 18
An 8 μm anti-reflection film was adhered to obtain an optical filter film having a total film thickness of 263 μm. This film was bonded to a semi-tempered glass plate having a length of 980 × width 580 mm × thickness 2.5 mm.

As described above, with respect to the sample obtained by laminating each optical filter film on a glass plate, the improvement in impact resistance, the releasability, and the state of the adhesive remaining on the glass plate were examined.

In the impact resistance test, the film sample bonded to the glass plate was placed on the upper surface and the height was from 1.5 m to a weight of 500 m.
g steel balls were dropped, and the damage state of the substrate glass was examined.
The test was performed for each of five sheets.

With respect to the test for peelability and adhesive residue on glass, the film was peeled off the glass plate one hour after bonding the optical film to the glass plate, and the state was examined. Table 2 shows the above results.

[0353]

[Table 2]

As can be seen from Table 2, in all the examples, the impact resistance, the peeling property, and the state of the adhesive residue on the glass plate are improved.

As described above, according to the present invention, by improving the total thickness of the transparent polymer film constituting the optical filter film to 0.3 mm or more, the protection function and the workability of the display panel can be improved. Therefore, it is possible to provide an optical filter film directly attached to the front surface of the display.

(Example 14) Transparent polymer film (B)
As polyethylene terephthalate film [width 558]
mm, length 500m, thickness 75μm] roll,
On one of the main surfaces, use a roll coater to
Transparent conductive thin film layer by netron sputtering
(D) was formed. The transparent conductive thin film layer is made of indium
A thin film layer (Dt) composed of an oxide with tin and a silver thin film layer (Dt)
m) is calculated as B / Dt [thickness 40 nm] / Dm [thickness 15 n
m] / Dt [thickness 80 nm] / Dm [thickness 20 nm] /
Dt [thickness 80 nm] / Dm [thickness 15 nm] / Dt
[Thickness 40 nm] / Dm [Thickness 15 nm] / Dt [Thickness
40 nm]. With indium and tin
The thin film layer composed of an oxide of
The thin film layer constitutes a metal thin film layer made of silver or a silver alloy.
You. Formation of thin film layer composed of oxide of indium and tin
Indium oxide / tin oxide firing
Consolidation [In_TwoO_Three: SnO _Two= 90:10 (weight ratio)],
Argon / oxygen mixed gas (total
Pressure 266 mPa, oxygen partial pressure 5 mPa). Also,
In forming the silver thin film layer, silver was used
Argon gas (total pressure 266 mPa)
Was. Titanium is used as a target for forming the titanium layer.
Argon gas (total pressure 266 mPa) for sputtering gas
Was used.

Next, a roll of an antiglare film [width 548 mm, length 500 m, thickness 100 μm] was prepared in a state where a transparent adhesive material [thickness 100 μm] was stuck on the side opposite to the antiglare layer.

Subsequently, the above-mentioned antiglare film was adhered on the transparent conductive thin film layer of the transparent conductive thin film via a transparent adhesive in a roll-to-roll manner to produce one roll. The measurement was performed so that the center positions of the transparent conductive film and the antiglare film in the width direction coincided with each other. Further, a transparent adhesive material (thickness: 100 μm) was bonded to the surface of the bonded body of the transparent conductive thin film and the antiglare film opposite to the antiglare layer by a roll-to-roll method. Then, roll each 5
A silver paste was applied to the transparent conductive thin film layer having a width of mm by a roll coating method. Roll sending speed is 0.5m / s
And

The film obtained above was cut into a length of 958 mm to produce an electromagnetic wave shield. FIG. 12 shows a sectional view. In FIG. 12, reference numeral 23 denotes a transparent polymer film (B) having an electromagnetic wave shielding function, reference numeral 30 denotes a transparent adhesive layer (C), and reference numeral 24 denotes a transparent polymer film (B) having a functional transparent layer (A). .

[0360] Among them, one electromagnetic wave shielding body,
The time required for electrode formation was examined. Subsequently, an electromagnetic wave shielding body was attached to the front surface of the plasma display panel [PX-42VP1 manufactured by NEC] via a transparent adhesive layer.

A metal member on a flat plate, which is wired so as to extract a current outside the display, was brought into contact with the electrode located on the viewing surface side.

By operating the plasma display panel, the intensity of electromagnetic waves emitted to the outside can be reduced by the FCC standard Pa.
The measurement was performed based on rt15J, and it was checked whether the class A standard was satisfied.

Example 15 Antiglare Film [Width 554]
mm, a length of 500 m, and a thickness of 100 μm], and a transparent conductive thin film layer was formed on the surface opposite to the antiglare layer in the same manner as in Example 14. Subsequently, a transparent adhesive [width of 548 mm, thickness of 100 μm] and a conductive adhesive [width of 3 mm, thickness of 10] are formed on the transparent conductive thin film layer by a roll-to-roll method.
0 μm]. The conductive pressure-sensitive adhesive was bonded at the positions of both ends of the roll, and the other portions were bonded with a transparent pressure-sensitive adhesive. As described above, an electromagnetic wave shield was produced.

A plasma display panel [manufactured by NEC
PX-42VP1] An electromagnetic wave shield was attached to the front surface. A copper foil tape having a width of 6 mm was attached to two long sides of the plasma display panel along the edges in advance. The portion where the conductive adhesive material and the copper foil tape are combined becomes a substantial electrode. A metal member on a flat plate, which is wired so as to extract a current outside the display, was brought into contact with the electrode located on the viewing surface side. Other than that, it carried out similarly to Example 14.

(Example 16) In the same manner as in Example 14, a transparent conductive thin film was prepared.

Next, a roll of an anti-glare film [width 558 mm, length 500 m, thickness 100 μm] was prepared, and the center position of the transparent conductive film and the anti-glare film in the width direction was set as follows.
Performed to match. Further, a transparent adhesive material [thickness of 100 μm]
m].

A silver paste was applied to the end face of the roll. As described above, an electromagnetic wave shield was produced. FIG. 17 is a sectional view.
It was shown to.

[0368] Among them, one electromagnetic wave shielding body
The time required for electrode formation was examined. Subsequently, an electromagnetic wave shield was attached to the front of the plasma display panel [PX-42VP1 manufactured by NEC]. A flat metal member, which is wired so as to extract a current outside the display, was brought into contact with the electrode.

[0369] By operating the plasma display panel, the intensity of electromagnetic waves emitted to the outside can be reduced by the FCC standard Pa.
The measurement was performed based on rt15J, and it was checked whether the class A standard was satisfied.

Comparative Example 4 As in Example 14, a polyethylene terephthalate film [width 558 mm, length 500 m, thickness 75 μm] was used as the transparent polymer film (B).
m] roll was prepared, and a transparent conductive thin film layer was formed on one main surface thereof.

The transparent adhesive [thickness 100
μm].

Further, while cutting the obtained film, a glass substrate [size 560 mm × 960 mm, thickness 3 m
m] via a weak adhesive material.

Subsequently, an antiglare film [width 548 mm,
A roll having a length of 500 m and a thickness of 100 μm] is prepared in a state where a transparent adhesive is stuck on the side opposite to the antiglare layer,
The laminated body was cut and bonded on the transparent conductive thin film layer. At this time, the transparent conductive thin film layers were bonded so that the end portions were located 5 mm inside from the outer peripheral portion.

A silver paste was applied by a screen printing method so as to cover the entire outer periphery of the exposed portion of the transparent conductive thin film layer, and was dried. After drying, it was peeled off from the glass substrate. As described above, an electromagnetic wave shield was produced. Other than that, it carried out similarly to Example 14. Table 3 shows the above results.
Raised.

[0375]

[Table 3]

As can be seen from Table 3, in all the examples, there is no problem with respect to the electromagnetic wave blocking effect as in the conventional case shown in Comparative Example 4. Further, it can be seen that the time required for forming the electrodes is greatly reduced, and the efficiency for production is greatly improved.

(Example 17) Transparent polymer film (B)
Polyethylene terephthalate film [thickness 75
μm] width 565 mm, length 500 m roll,
A transparent conductive layer (D) was formed on one main surface by a direct current magnetron sputtering method using a roll coater. The transparent conductive thin film layer is composed of a thin film layer (Dt) composed of an oxide of indium and tin, and a silver thin film layer (Dm) formed of B.
/ Dt [thickness 40 nm] / Dm [thickness 15 nm] / Dt
[Thickness 80 nm] / Dm [thickness 20 nm] / Dt [thickness 80 nm] / Dm [thickness 15 nm] / Dt [thickness 40 n]
m] / Dm [thickness 15 nm] / Dt [thickness 40 nm]. The thin film layer composed of an oxide of indium and tin constitutes a transparent high refractive index thin film layer, and the silver thin film layer constitutes a metal thin film layer composed of silver or a silver alloy. For the formation of a thin film layer composed of an oxide of indium and tin, a target indium oxide / tin oxide sintered body [In ₂
O ₃ : SnO ₂ = 90: 10 (weight ratio)] and an argon / oxygen mixed gas (total pressure 266 mP) as a sputtering gas
a, oxygen partial pressure 5 mPa). Silver was used as a target for forming the silver thin film layer, and argon gas (total pressure of 266 mPa) was used as a sputtering gas. In forming the titanium layer, titanium was used as a target, and argon gas (total pressure of 266 mPa) was used as a sputtering gas.

Next, a roll of 565 mm in width and 500 m in length of an antiglare film was prepared in a state where a transparent adhesive was stuck on the side opposite to the antiglare layer.

Subsequently, the above-mentioned antiglare film was adhered on a transparent conductive thin film layer of the transparent conductive thin film via a transparent adhesive material in a roll-to-roll manner to produce one roll. Further, a transparent pressure-sensitive adhesive was bonded by a roll-to-roll method to the surface of the bonded body of the transparent conductive thin film and the antiglare film opposite to the antiglare layer.

The film obtained above was bonded to a transparent support substrate via a transparent adhesive while cutting.

Further, a silver paste was applied using a screen printing method on the entire periphery of the end so that the side surface of the film was covered.
Let dry.

As described above, an electromagnetic wave shield was manufactured. A cross-sectional view is shown in FIG. 2 farthest from each other on the electrode
A point was selected, and the resistance value between them was checked.

Also, the bonding time required for one electromagnetic wave shield was examined. The bonding time per optical filter between the transparent conductive film and the anti-glare film is determined by dividing the total bonding time in all rolls to rolls by the number of films that can be cut out from the roll. Was.

(Example 18) Width 565 of antiglare film
A roll having a thickness of 500 mm and a length of 500 m was prepared, and a transparent conductive thin film layer was formed on the surface opposite to the antiglare layer in the same manner as in Example 17. Subsequently, a transparent adhesive was stuck on the transparent conductive thin film layer by a roll-to-roll method.

While the film obtained above was cut, it was bonded to a transparent support substrate via a transparent adhesive.

Further, a silver paste was applied to the entire periphery of the film using a screen printing method so as to cover the side surface of the film.
Let dry. As described above, an electromagnetic wave shield was produced. A cross-sectional view is shown in FIG.

At this time, two points farthest from each other on the electrode were selected, and the resistance value between them was examined. Further, the bonding time required for one electromagnetic wave shield was examined.

(Example 19) Width 565 of antiglare film
mm, a roll having a length of 500 m was prepared, and a transparent conductive thin film layer was formed on the surface opposite to the antiglare layer in the same manner as in Example 17.
A 500-m-long roll of the antiglare transparent conductive film was produced.

Two rolls of copper tape (width 15 mm, thickness 75 μm, length 500 m, with conductive adhesive on one side) were prepared.

A copper tape was attached to both ends of the antiglare transparent conductive film. Lamination was performed so that the conductive adhesive of the copper tape was in contact with the transparent conductive layer formed to have antiglare transparent conductivity. The overlap width between each copper tape and the antiglare transparent conductive film was set to 10 mm. Lamination was performed by a roll-to-roll method.

Transparent adhesive [575 mm wide, 25 μ thick
m, a length of 500 m]. While attaching this transparent adhesive to the anti-glare transparent conductive film having a copper tape attached to the side surface, the length is 958 mm.
Cut into sheets. An adhesive was stuck on the non-adhesive processed surface of the transparent conductive layer and the copper tape. Lamination was performed by a roll-to-roll method. As described above, an electromagnetic wave shield was produced. A cross-sectional view is shown in FIG.

At this time, two points farthest from each other on the electrode were selected, and the resistance value between them was examined. Further, the bonding time required for one electromagnetic wave shield was examined.

(Example 20) Width 565 of antiglare film
A roll having a thickness of 500 mm and a length of 500 m was prepared, and a transparent conductive thin film layer was formed on the surface opposite to the antiglare layer in the same manner as in Example 17. Subsequently, while bonding the transparent adhesive on the transparent conductive thin film layer by the roll-to-roll method, the length is 958 mm.
The sheet was cut into a sheet, and an electromagnetic wave shield was produced.

A glass substrate [size 545 mm × 960 m
m, thickness 3 mm] were prepared, and a copper plate [size 10 mm × 960 mm, thickness 3 mm] was set on two long sides thereof. The copper plate was drilled with holes for screwing. The holes for screwing were formed at an interval of 30 mm from the end in the longitudinal direction to the end. An electromagnetic wave shielding body was bonded to the supporting base including the glass plate and the copper plate. Screws were attached to screw holes formed in the copper plate. The mounting of the screw was performed by penetrating the electromagnetic wave shield from the outermost surface of the electromagnetic wave shield. At this time,
This screw becomes a substantial through-hole electrode. As described above, an electromagnetic wave shield was produced. A sectional view is shown in FIG.

At this time, two points furthest from each other on the electrode were selected, and the resistance value between them was examined. Further, the bonding time required for one electromagnetic wave shield was examined.

(Comparative Example 5) As in Example 18, a polyethylene terephthalate film (thickness: 75 μm) having a width of 565 mm and a length of 50 was used as the transparent polymer film (B).
A 0 m roll was prepared, and a transparent conductive thin film layer was formed on one main surface thereof.

[0397] A transparent pressure-sensitive adhesive was bonded to the surface of the film opposite to the surface on which the transparent conductive thin film was formed by a roll-to-roll method.

Further, the obtained film was bonded to a transparent supporting substrate via a transparent adhesive while being cut.

Subsequently, the width of the antiglare film was 565 mm,
A roll having a length of 500 m was prepared in a state in which a transparent adhesive was stuck on the side opposite to the antiglare layer, and cut and stuck on the transparent conductive thin film layer of the stuck body. At this time,
The transparent conductive thin film layers were bonded so that the end portions were located 5 mm inside from the outer peripheral portion.

[0400] A silver paste was applied by a screen printing method so as to cover the entire periphery of the exposed portion of the transparent conductive thin film layer, and was dried. As described above, an electromagnetic wave shield was produced.

At this time, two points farthest from each other on the electrode were selected, and the resistance value between them was examined. Further, the bonding time required for one electromagnetic wave shield was examined. Table 4 shows the above results.

[0402]

[Table 4]

As can be seen from Table 4, in all the examples, the electric resistance value between the electrodes is hardly lower than that of the conventional electrode shape shown in the comparative example. In addition, in all the examples, it can be seen that the time required for laminating a film per electromagnetic wave shield is greatly reduced, and the production efficiency of the electromagnetic wave shield is greatly increased.

(Example 21) Example 1 except for the following points.
Was performed in the same manner as described above.

[0405] Transparent laminate 1 was produced as follows. Dye absorbing near-infrared rays in polyethylene terephthalate pellets 1203 (manufactured by Unitika Ltd.), Mitsui Chemicals, Inc.
0.25% by weight of SIR128 and 0.1% of SIR130.
23% by weight and melted at 260-280 ° C.
A polymer film (B) having a thickness of 188 μm was produced by an axial stretching extruder.

On one main surface of the polymer film (B) produced above, a polyester-based adhesive containing a crosslinking material was applied to a thickness of 10 μm. Next, a thickness of 7 μm, a hole diameter of 1 μm,
A silver foil with a porosity of 12% was laminated. Note that molybdenum was previously coated on both principal surfaces of this silver foil with a thickness of 50 μm.
It was formed by a sputtering method so that
Next, using a thermosetting ink, a grid width of 20 μm and a mesh size of 150 μm × 15 are formed on the metal layer by screen printing.
A 0 μm grid pattern was printed. After the ink was cured by heating at 90 ° C. for 5 minutes, the portion of the metal layer not protected by the ink was removed with an aqueous ferric chloride solution, and then the ink was removed with a solvent. Thus, a laminate having a metal layer having a pattern shown in FIG. 27 and an aperture ratio of 75% was obtained. When the average transmittance of visible light was measured, 67
%Met. When the sheet resistance was measured, it was 0.11Ω.
/ □.

(Example 22) Example 3 except for the following points.
Was performed in the same manner as described above.

Polymer film (B) / Transparent conductive layer (D)
Was prepared by the following method. A dye that absorbs near-infrared light, polyethylene terephthalate pellet 1203 (manufactured by Unitika Ltd.) and SIR128 manufactured by Mitsui Chemicals, Inc.
% Of SIR130 and 0.23% by weight of SIR130.
The polymer film was melted at 0 to 280 ° C., and a polymer film (B) having a thickness of 188 μm was produced by a biaxial stretching extruder.

On the polymer film (B) prepared above, an acrylic adhesive was used to form a film having a thickness of 7 μm and a pore diameter of 1 μm.
8% porosity silver foil was laminated. Chromate treatment was performed on both sides of the silver foil in advance. Next, a photoresist of an alkali development type is coated on the copper layer, and after pre-baking, it is exposed and developed using a photomask to develop a grid width of 25 μm and a mesh size of 125 μm.
After providing a grid pattern of × 125 μm, the metal layer in a portion not protected by the resist was etched with an aqueous ferric chloride solution, and then the resist was removed in an alkaline solution. Thus, a laminate having a metal layer having the pattern shown in FIG. 27 and an aperture ratio of 69% was obtained. When the visible light transmittance was measured, it was 65%, and the sheet resistance was 0.07Ω /
It was □.

According to Table 5, the use of the electromagnetic wave shielding body of the present invention makes it possible to use the Class B or Class
It turns out that A can be cleared. The lower the sheet resistance of the transparent conductive layer, the better the electromagnetic wave shielding ability.

[0411] It can also be seen that the use of the electromagnetic wave shield of the present invention is excellent in near-infrared cut ability.

[0412] The electromagnetic wave shielding body of the present invention using the metal mesh layer has excellent visible light transmittance,
Excellent near-infrared shielding.

[0413] Further, the electromagnetic wave shielding body of the present invention has environmental resistance and / or abrasion resistance and / or antifouling property and / or antistatic property by imparting each function to the functional transparent layer (A). Are better.

[0414]

[Table 5]

[0415]

As described in detail above, according to the present invention, a filter for a display functioning as a light control film having excellent transmission characteristics, transmittance and reflection characteristics can be realized at low cost. By forming this directly on the screen of a display device such as a plasma display, the color purity and contrast of the display can be improved without significantly impairing the luminance of the display, and a display device having excellent image quality can be realized.

[0416] Further, it is possible to realize a display filter having excellent over-characteristics, transmittance, and visible light reflectance and functioning as an electromagnetic wave shield that blocks electromagnetic waves generated from a display device such as a plasma display at low cost. further,
Since the near-infrared ray emitted from the display in the vicinity of 800 to 1000 nm is efficiently cut, a wavelength used by a remote controller of a peripheral electronic device, a transmission optical communication, or the like is not adversely affected, and malfunctions thereof can be prevented. In addition, a display device having excellent weather resistance and environmental resistance, having anti-reflection properties and / or anti-glare properties, scratch resistance, anti-fouling properties, anti-static properties, and the like, and having excellent image quality can be realized.

Also, by setting the total thickness of the transparent polymer film constituting the display filter to 0.3 mm or more, the protection function and workability of the display panel can be improved, and the display panel can be directly adhered to the front surface of the display. An electromagnetic wave shield or a light control film can be provided.

Further, by devising the shape of the electrodes of the electromagnetic wave shield, a sufficient electromagnetic wave shielding effect can be obtained, and the time required for forming the electrodes can be greatly reduced, so that the production efficiency can be greatly improved.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view showing an example of a polymer film (B) / transparent conductive layer (D) in the present invention.

FIG. 2 is a plan view showing an example of the electromagnetic wave shield of the present invention.

FIG. 3 is a cross-sectional view illustrating an example (Example 1) of the electromagnetic wave shield of the present invention and a mounting state thereof.

FIG. 4 is a cross-sectional view showing an example (Example 2) of the electromagnetic wave shielding body of the present invention and its mounted state.

FIG. 5 is a plan view showing an example of the electromagnetic wave shield of the present invention.

FIG. 6 is a cross-sectional view illustrating an example (Example 3) of the electromagnetic wave shield of the present invention and a mounted state thereof.

FIG. 7 is a cross-sectional view showing one example (Example 4) of the electromagnetic wave shield of the present invention and its mounted state.

FIG. 8 is an xy chromaticity diagram showing a color reproduction range before and after forming an electromagnetic wave shield.

FIG. 9 is a cross-sectional view showing an example (Example 5) of the light control film of the present invention and a mounted state thereof.

FIG. 10 is a cross-sectional view showing an example (Example 6) of the light control film of the present invention and a mounted state thereof.

FIG. 11 shows x representing a color reproduction range before and after forming a light control film.
It is a -y chromaticity diagram.

FIG. 12 is a cross-sectional view illustrating a configuration example of a display filter according to the present invention.

FIG. 13 is a cross-sectional view illustrating a configuration example of a display filter according to the present invention.

FIG. 14 is a cross-sectional view illustrating a configuration example of a display filter according to the present invention.

FIG. 15 is a cross-sectional view illustrating a configuration example of a display filter according to the present invention.

FIG. 16 is a cross-sectional view illustrating a configuration example of a display filter according to the present invention.

FIG. 17 is a cross-sectional view illustrating a configuration example of a display filter according to the present invention.

18 is a cross-sectional view showing a configuration of a transparent polymer film (B) 23 having the electromagnetic wave shielding function shown in FIG.

19 is a cross-sectional view showing a configuration of a transparent polymer film (B) 26 having the electromagnetic wave shielding function shown in FIG.

20 is a plan view of the display filter shown in FIG. 16 or FIG. 17;

FIG. 21 is a cross-sectional view illustrating a configuration example of a display filter according to the present invention.

FIG. 22 is a cross-sectional view illustrating a configuration example of a display filter according to the present invention.

FIG. 23 is a cross-sectional view illustrating a configuration example of a display filter according to the present invention.

FIG. 24 is a cross-sectional view illustrating a configuration example of a display filter according to the present invention.

FIG. 25 is a cross-sectional view illustrating a configuration example of a display filter according to the present invention.

26 is a plan view of the display filter shown in FIGS. 21 to 25. FIG.

FIG. 27 is a diagram illustrating an example of a metal pattern.

[Explanation of symbols]

 00 Display display part 01 Display ground part 02 Transparent part of electromagnetic wave shield body 03 Conductive part of electromagnetic wave shield body 10 Transparent conductive layer (D) 11 High refractive index transparent thin film layer (Dt) 12 Metal thin film layer (Dm) 20 High Molecular film (B) 21 Dye-containing polymer film (B) 22 Hard coat layer (F) 23, 24, 26 Transparent polymer film (B) 25 Transparent polymer film for raising (B) 30 Transparent adhesive layer (C) 31) Dye-containing transparent adhesive layer (C) 40 Transparent adhesive layer (E) 41 Conductive adhesive layer 50 Electrode 51 Conductive tape 52 Through-hole electrode 60 Functional transparent layer (A) 61 Antireflection film 62 Hard coat film 63 Transparent Base material 70 Anti-glare layer (functional transparent layer (A)) 71 Anti-glare film 80 Conductive copper foil adhesive tape 110 Patterned It was Shirubehaku 120 light transmission portion

────────────────────────────────────────────────── ───

[Procedure amendment]

[Submission date] December 21, 2001 (2001.12.
21)

[Procedure amendment 1]

[Document name to be amended] Statement

[Correction target item name] 0003

[Correction method] Change

[Correction contents]

[0003] In recent years, the influence of leakage electromagnetic waves from electronic devices on the human body and other devices has been discussed.
luntary Control Council for Interference by data p
It is necessary to keep it within the standard value by rocessing equipment electronic office machine).

[Procedure amendment 2]

[Document name to be amended] Statement

[Correction target item name] 0007

[Correction method] Change

[Correction contents]

On the other hand, in order to cut off leakage electromagnetic waves, it is necessary to cover the surface of the display screen with a conductive material having high conductivity. As this method, a transparent conductive layer is used, and the transparent conductive layer is roughly classified into a conductive mesh and a transparent conductive thin film. As the conductive mesh, a grounded metal mesh, a synthetic fiber or a mesh of a metal fiber coated with a metal, or an etching film formed by forming a metal film and then performing an etching process in a lattice pattern is used.

[Procedure amendment 3]

[Document name to be amended] Statement

[Correction target item name] 0359

[Correction method] Change

[Correction contents]

The film obtained above was cut into a length of 958 mm to produce an electromagnetic wave shield. FIG. 21 shows a sectional view. In FIG. 21, reference numeral 23 denotes a transparent polymer film (B) having an electromagnetic wave shielding function, reference numeral 30 denotes a transparent adhesive layer (C), and reference numeral 24 denotes a transparent polymer film (B) having a functional transparent layer (A). .

[Procedure amendment 4]

[Document name to be amended] Statement

[Correction target item name] 0362

[Correction method] Change

[Correction contents]

When the plasma display panel is operated, the intensity of the electromagnetic wave emitted to the outside is determined according to the FCC standard Pa.
The measurement was performed based on rt15J, and it was checked whether the class A standard was satisfied. FIG. 22 shows a cross-sectional view.

[Procedure amendment 5]

[Document name to be amended] Statement

[Correction target item name] 0367

[Correction method] Change

[Correction contents]

A silver paste was applied to the end face of the roll. As described above, an electromagnetic wave shield was produced. FIG. 23 is a sectional view.
It was shown to.

[Procedure amendment 6]

[Document name to be amended] Statement

[Correction target item name] 0382

[Correction method] Change

[Correction contents]

As described above, an electromagnetic wave shield was manufactured. FIG. 23 shows a cross-sectional view. 2 farthest from each other on the electrode
A point was selected, and the resistance value between them was checked.

[Procedure amendment 7]

[Document name to be amended] Statement

[Correction target item name] 0386

[Correction method] Change

[Correction contents]

Further, a silver paste was applied to the entire periphery of the film using a screen printing method so as to cover the side surface of the film.
Let dry. As described above, an electromagnetic wave shield was produced.

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) G02B 5/22 G02B 5/28 5/26 H05K 9/00 V 5/28 G02B 1/10 A H05K 9 / 00Z (31) Priority claim number Japanese Patent Application No. 2000-180501 (P2000-180501) (32) Priority date June 15, 2000 (2000.6.15) (33) Priority claim country Japan (JP) ( 31) Priority claim number Japanese Patent Application 2000-213431 (P2000-213431) (32) Priority date July 13, 2000 (July 13, 2000) (33) Priority claim country Japan (JP) (31) Priority Claim number Japanese Patent Application No. 2000-384101 (P2000-384101) (32) Priority date December 18, 2000 (2000.18.18) (33) Priority claiming country Japan (JP) (72) Inventor Toshihisa Kitagawa 580-32 Nagaura, Sodegaura-shi, Chiba Mitsui Chemicals, Inc. (72) Inventor Hiroaki Saigo 580-32 Nagaura, Sodegaura-shi, Chiba Mitsui (72) Inventor Shin Fukuda 580-32 Nagaura, Sodegaura-shi, Chiba Mitsui Chemicals Inc. (72) Inventor Taizo Nishimoto 580-32 Nagaura, Sodegaura City, Chiba Prefecture Mitsui Chemicals Co., Ltd. Reference) 2H042 BA02 BA03 BA15 BA20 2H048 CA04 CA05 CA09 CA12 CA14 CA19 CA29 FA03 FA05 FA07 FA09 FA13 FA24 GA03 GA07 GA09 GA19 GA36 GA60 GA61 2K009 AA04 AA08 AA09 AA12 AA15 BB24 CC03 CC06 CC09 CC14 CC21 CC03 DD06 DD06 DD 5E321 AA04 AA14 BB25 CC16 GG05 GH01 5G435 AA16 BB02 BB06 BB12 GG11 GG33 GG43 KK05 KK07 KK10 LL08

Claims (31)

[Claims] 1. A display filter which can be adhered to a display screen and has predetermined filter characteristics, comprising: a functional transparent layer (A) provided on the outside air side and having an antireflection property and / or an antiglare property. A transparent adhesive layer (C) provided on the display side for bonding to a screen; and a polymer film (B) provided as a substrate between the functional transparent layer (A) and the transparent adhesive layer (C). And a display filter. 2. Provided between the functional transparent layer (A) and the polymer film (B) and / or between the polymer film (B) and the transparent adhesive layer (C), 30Ω / □
The display filter according to claim 1, further comprising a transparent conductive layer (D) having the following sheet resistance. 3. The display filter according to claim 2, wherein a part or all of the transparent conductive layer (D) is formed of a conductive mesh. 4. The transparent conductive layer (D) comprises a combination (Dt) / a combination of a high refractive index transparent thin film layer (Dt) and a metal thin film layer (Dm).
The display filter according to claim 2, wherein (Dm) is repeated two to four times as a repeating unit, and a high refractive index thin film layer (Dt) is further laminated thereon. 5. A method according to claim 1, wherein at least one of the plurality of high-refractive-index transparent thin film layers (Dt) is formed of an oxide mainly containing at least one of indium, tin and zinc. The display filter according to claim 4, wherein 6. The display filter according to claim 4, wherein at least one of the plurality of metal thin film layers (Dm) is formed of silver or a silver alloy. 7. The functional transparent layer (A) further has at least one of a hard coat property, an antistatic property, an antifouling property, a gas barrier property and an ultraviolet cut property. 7. The display filter according to any one of 6. 8. The display according to claim 1, wherein an adhesive layer (E) is provided between the functional transparent layer (A) and the polymer film (B). filter. 9. The display filter according to claim 1, wherein a hard coat layer (F) is formed on both surfaces or one surface of the polymer film (B). 10. A functional transparent layer (A), a polymer film (B), a transparent adhesive layer (C), a transparent conductive layer (D), an adhesive layer (E) and a hard coat layer (F).
The display filter according to any one of claims 1 to 6, wherein one layer contains one or more dyes. 11. The display filter according to claim 10, wherein a dye having an absorption maximum in a wavelength range of 570 to 605 nm is contained. 12. The display filter according to claim 11, wherein the dye is a tetraazaporphyrin compound. 13. The display filter according to claim 12, wherein the tetraazaporphyrin compound is a compound represented by the following chemical formula (1). Embedded image (Wherein, A ^{1 to} A ⁸ each independently represent a hydrogen atom, a halogen atom, a nitro group, a cyano group, a hydroxy group, a sulfonic acid group, an alkyl group having 1 to 20 carbon atoms, a halogenoalkyl group, an alkoxy group, an alkoxy group, Alkyl group, aryloxy group, monoalkylamino group, dialkylamino group,
An aralkyl group, an aryl group, a heteroaryl group, an alkylthio group, or arylthio group, A ¹ and A ^2, A ³
And A ⁴ , A ⁵ and A ⁶ , A ⁷ and A ⁸ may each independently form a ring other than an aromatic ring via a linking group, and M represents two hydrogen atoms and a divalent metal Atom, trivalent monosubstituted metal atom,
Represents a tetravalent disubstituted metal atom or an oxymetal atom. ) 14. The display filter according to claim 10, wherein a near-infrared absorbing dye having an absorption maximum in a wavelength range of 800 to 1100 nm is contained. 15. On the surface of the functional transparent layer (A),
The display filter according to any one of claims 1 to 6, wherein the visible light reflectance is 2% or less. 16. The display filter according to claim 1, having a visible light transmittance of 30 to 85%. 17. The method according to claim 1, wherein the transmittance minimum at a wavelength of 800 to 1100 nm is 20% or less.
17. The display filter according to any one of items 16 to 16. 18. The display filter according to claim 1, wherein the total thickness of the polymer film in the entire filter is 0.3 mm or more. 19. The display filter according to claim 1, further comprising a polymer film for raising the thickness capable of containing a dye. 20. The display filter according to claim 2, wherein an electrode electrically connected to the transparent conductive layer (D) is formed. 21. The display filter according to claim 20, wherein an electrode electrically connected to the transparent conductive layer (D) is continuously formed along a circumferential direction on a peripheral portion of the filter. 22. The display filter according to claim 20, wherein an electrode is formed on the conductive portion that is partially exposed. 23. The display filter according to claim 21, wherein the filter has a rectangular shape, and electrodes are formed around two opposing peripheral portions. 24. The display filter according to claim 21, wherein an electrode electrically connected to the transparent conductive layer (D) is formed on a peripheral end surface of the filter. 25. A communication hole communicating with at least the transparent conductive layer (D) from the outermost surface along the thickness direction of the filter, and an electrode electrically connected to the transparent conductive layer (D) inside the communication hole. The display filter according to any one of claims 1 to 6, wherein is formed. 26. The display filter according to claim 1, wherein a conductive tape is interposed between the transparent conductive layer (D) and a layer adjacent thereto. 27. A display device comprising: a display for displaying an image; and a display filter provided on a display screen and according to claim 1. Description: 28. A step of bonding the display filter according to claim 20 on a display screen of a display device via a transparent adhesive layer (C), and a ground conductor and a transparent conductive layer of the display device. (D) electrically connecting the electrodes to the electrodes. 29. A step of attaching a laminated filter including a polymer film (B), a transparent conductive layer (D), and a transparent adhesive layer (C) to a display screen of a display device via the transparent adhesive layer (C). Disposing a functional transparent layer (A) having an antireflection property and / or an antiglare property on the laminated filter directly or via a second adhesive layer; and a ground conductor of a display device. Electrically connecting the transparent conductive layer (D) to the transparent conductive layer (D). 30. A step of arranging an adhesive layer on a display screen of a display device, a polymer film (B), a transparent conductive layer (D), and a functional transparent layer having an antireflection property and / or an antiglare property. A method for manufacturing a display device, comprising: a step of attaching a laminated filter including (A) via the adhesive layer; and a step of electrically connecting a ground conductor of the display device to the transparent conductive layer (D). . 31. A step of disposing an adhesive layer on a display screen of a display device; and a step of bonding a laminated filter including a polymer film (B) and a transparent conductive layer (D) via the adhesive layer. Disposing a functional transparent layer (A) having an antireflection property and / or an antiglare property on the laminated filter directly or via a second adhesive layer; and a ground conductor and a transparent conductive layer of a display device. Electrically connecting the layer (D) to the layer (D).