JP2002313140A - Transparent conductive film, optical filter and its manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a transparent conductive film, an optical filter and its manufacturing method with excellent durability against a long-time use or storage, which can restrain deterioration especially at the end part of a transparent conductive layer. SOLUTION: The transparent conductive film 40 is a transparent conductive layer 60 formed on a transparent resin layer 10, and the transparent conductive layer 60 is structured with a high-refraction-rate thin film layer 20, a metal thin film layer 30, a high-refraction-rate thin film layer 20, a metal thin film layer 30, and a high-refraction-rate thin film layer 20 laminated in turn on the transparent resin layer 10. A sealing part is formed at an end face 50 of the transparent conductive film 40 for sealing the end face 50 airtightly and shielding from outside air.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent conductive material capable of blocking electromagnetic waves other than visible light among electromagnetic waves generated from a display screen when installed on a display screen such as a plasma display panel (PDP). The present invention relates to a film, an optical filter, and a method for producing the same.

[0002]

2. Description of the Related Art In recent years, as society has become more sophisticated, optoelectronics-related components and equipment have remarkably advanced.
Among them, displays for displaying images have been remarkably popularized for computer monitor devices in addition to conventional television devices. Among them, market demands for larger and thinner displays are increasing. 2. Description of the Related Art Recently, a plasma display panel (PDP) has attracted attention as a display that can be made large and thin. The plasma display panel emits strong electromagnetic waves outside the device in principle. Electromagnetic waves are known to cause damage to instruments, and it has recently been reported that electromagnetic waves may also cause damage to the human body. For this reason, the emission of electromagnetic waves is being regulated in a legal manner. For example,
Currently in Japan, VCCI (Voluntary Control Council f
or Interference by date processing equipment elect
ronicoffice machine), and in the United States,
There are product regulations by the FCC (Federal Communication Commission).

[0003] A plasma display panel emits strong near-infrared rays. The near-infrared rays cause malfunctions of cordless telephones, infrared remote controllers, and the like. Particularly problematic wavelengths are 800 to 1000
nm.

In order to suppress the emission of electromagnetic waves and near-infrared rays, there has recently been an increasing demand for optical filters for blocking electromagnetic waves and near-infrared rays. This optical filter is
The filter must be electrically conductive over the entire surface and have excellent transparency. Optical filters that satisfy these requirements and have been put into practical use can be broadly divided into two types. One is a so-called metal mesh type in which metal is thinly arranged in a grid pattern on the entire surface of a substrate. This is excellent in conductivity and has excellent electromagnetic wave blocking ability, but is not excellent in near-infrared reflection ability and transparency, and generates a moiré image. The other is a transparent film type in which a transparent conductive thin film is disposed on the entire surface of a substrate. The transparent conductive thin film type optical filter is inferior to the metal mesh type optical filter in electromagnetic wave blocking ability, but has excellent near-infrared ray blocking ability and transparency, and does not generate a moiré image. It can be suitably used.

[0005] The transparent conductive thin film type optical filter is
In many cases, a transparent conductive thin film is bonded to a transparent support substrate via a transparent adhesive material, or a transparent conductive thin film layer is directly formed on the transparent support substrate itself. In terms of weight reduction and safety of the display device itself, a transparent polymer molded body is often suitably used as the transparent support substrate. Since a transparent polymer molded article has a property of being deformed under the influence of heat or moisture, glass is often used.

It is generally said that one of the demanding measures for widespread use of the plasma display is to reduce the price. As for optical filters, too, the percentage of total material costs is high, so it is important to lower prices.
It is indispensable for the spread of plasma displays.
For this reason, an optical filter capable of reducing the number of members and simplifying the process has been proposed. A typical one is an optical filter of a type which is made of a film substrate and is used by being attached to a display.

[0007] The lower the sheet resistance of the optical filter, the better the ability of the optical filter to block electromagnetic waves. As for the transparent conductive thin film type optical filter, it is common practice to obtain a transparent conductive thin film by laminating a metal thin layer having a low resistance. Among them, a metal thin film made of silver having the lowest specific resistance among pure substances is preferably used. Further, for the purpose of increasing the transmittance and improving the stability of the metal thin film layer, the metal thin film layer is usually sandwiched between transparent high refractive index thin film layers to form a transparent conductive thin film laminate.

[0008] Silver, which is suitably used as a material of the metal thin film layer because of its low specific resistance, tends to cause atom aggregation. When silver atoms of the silver thin film layer aggregate, a silver white point is generated,
The original high transparency and low resistance are lost.

In the transparent conductive thin film laminate, a transparent high refractive index thin film layer of ITO or the like has an effect of preventing a silver aggregation promoting substance in the atmosphere from reaching the silver thin film layer. In order to maintain high transmittance, the thickness should be several nm.
In many cases, the prevention ability is insufficient. Therefore, it is necessary to protect the surface of the transparent conductive thin film laminate with a film or the like. The protective film often has a reflectance reducing function, an antiglare function, or a toning function.

[0010]

In the conventional thin film type optical filter, since the end face of the transparent conductive thin film laminate is not covered, the optical filter is installed on the display element, and the optical filter is used for a long time. The deterioration of the transparent conductive thin film laminate proceeds from the end of the filter. This means
This is a problem particularly in an optical filter of a type which is made of a film base material and is directly bonded to a display element.

An object of the present invention is to provide a transparent conductive film, an optical filter, and a method for producing the same, which have excellent durability for long-term use or storage, and in particular, can suppress deterioration at the edge of the transparent conductive layer. is there.

[0012]

Means for Solving the Problems The present inventors have made intensive studies to solve the above-mentioned problems, and as a result, have solved the above-mentioned problems by forming a sealing portion on the end face of the transparent conductive film. The present inventors have found that the present invention can be performed, and have arrived at the present invention.

The present invention is specified by the following items. [1] The present invention is a transparent conductive film having a transparent conductive layer (B) formed on a polymer film (A), wherein an end face of the transparent conductive layer is shielded from the outside air. Is a transparent conductive film.

[2] In the present invention, it is preferable that a sealing portion for hermetically sealing the end face is provided on the end face of the transparent conductive layer.

[3] In the present invention, the sealing portion is preferably formed of any one of an organic material, a hard coat material, a conductive material, and a fluoropolymer material.

[4] Further, according to the present invention, the sealing portion is formed of a hard coat material, and the hard coat material is mainly composed of a material mainly composed of an organic substance, a material mainly composed of an organic substance and silicon, and silicon. It is preferable to be composed of any of a material as a component and an inorganic material containing a metal oxide as a main component.

[5] In the present invention, the sealing portion is formed of a hard coat material composed of a material mainly composed of an organic substance, and the material mainly composed of the organic substance is a melamine resin, a urethane resin, a saturated polyester. It is preferable that the main component be any of a resin, an acrylate resin, a phenolic resin, a polyimide resin, an epoxy resin, and a sulfur-containing organic compound.

[6] In the present invention, the sealing portion is formed of a hard coat material composed of a material containing silicon as a main component.
The material containing silicon as a main component is preferably a material containing any of aminosilane, silane coupling agent, alkyl trialkoxysilane, colloidal silica, and silicon oxide as main components.

[7] In the present invention, the sealing portion is formed of a conductive material, and the conductive material is preferably made of any of silver, copper, gold, aluminum, platinum and palladium.

[8] Further, according to the present invention, the sealing portion is formed of a fluoropolymer material, and the fluoropolymer material is a polyfluorinated (PVF) resin, a polyvinylidene fluoride (PVdF)
Resin, polychlorinated ethylene trifluoride (PCTFE) resin,
Polytetrafluoroethylene (PTFE) resin, tetrafluoroethylene (FEP) -6-propylene fluoride (6F) copolymer, ethylene-tetrafluoroethylene copolymer, ethylene-
It is preferable to be composed of any one of ethylene chloride trifluoride copolymer and ethylene tetrafluoride-perfluoroalkyl vinyl ether copolymer.

[9] The present invention also relates to a transparent conductive layer (B).
Preferably has a sheet resistance of 0.1 to 30 Ω / □.

[10] The present invention also relates to a transparent conductive layer (B).
Are a high refractive index transparent thin film layer (Bt) and a metal thin film layer (B
It is preferable that the combination (Bt) / (Bm) of m) is repeated two to four times as a repeating unit, and further, a high refractive index transparent thin film layer (Bt) is further laminated thereon.

[11] In the present invention, the main component of at least one of the plurality of high-refractive-index transparent thin film layers (Bt) is an oxide of indium or zinc or an oxide of indium and tin. preferable.

[12] The present invention also relates to a metal thin film layer (B
Preferably, at least one layer of m) is silver or a silver alloy.

[13] The present invention is an optical filter using the above-mentioned transparent conductive film.

[14] The present invention preferably has a transparent pressure-sensitive adhesive layer (C) for bonding to the display viewing surface.

[15] The present invention also includes a functional transparent layer (E) having an anti-reflection function and / or an anti-glare function, a transparent adhesive layer (C), a polymer film (A), and a transparent conductive layer. (B), the functional transparent layer (E) is C / A / B / E or C / A from the display viewing surface side to the outside air side.
It is preferable to arrange them in the order of B / A / E.

[16] The present invention also relates to a transparent conductive layer (B).
It is preferable to provide an electrode electrically connected to the electrode.

[17] In the present invention, the electrodes are preferably formed continuously along the periphery of the filter.

[18] The present invention also relates to a transparent conductive layer (B).
Is partially exposed at a portion other than the periphery of the filter, and an electrode is preferably provided at the exposed portion.

[19] Further, in the present invention, it is preferable that the planar shape of the filter is rectangular, and electrodes are provided around two opposing peripheral portions.

[20] In the present invention, any one of the transparent adhesive layer (C), the polymer film (A), the transparent conductive layer (B) and the functional transparent layer (E) contains a dye. It is preferable.

[21] In the present invention, the dye preferably has an absorption maximum in a wavelength range of light of 570 to 605 nm.

[22] The present invention also relates to a method for producing a transparent conductive film in which a transparent conductive layer (B) is formed on a polymer film (A), wherein the transparent conductive film is formed into a roll. And a step of forming a sealing portion on an end face of the roll.

[23] The present invention also relates to a method for producing a transparent conductive film in which a transparent conductive layer (B) is formed on a polymer film (A), wherein the transparent conductive film is formed by a roll-to-roll method. And a step of forming a sealing portion on an end face between the first roll and the second roll, and a step of sending a transparent conductive film from the first roll to the second roll. is there.

[24] Further, in the present invention, in the step of forming the sealing portion on the end face, a method of dipping the end face in a coating liquid, a method of coating the end face with the coating liquid, or a vacuum film forming method is used. preferable.

[25] Further, the present invention is a plasma display device comprising: a plasma display for displaying an image; and an optical filter provided on a display viewing surface and having the above-described optical filter.

[0038]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention relates to a transparent conductive film having a sealing portion formed on an end face and an optical filter using the same, and for example, to a display device represented by a plasma display panel. It is used by being provided on the viewing surface. Since the transparent conductive film and the optical filter in the present invention have the sealing portion formed on the end face of the transparent conductive layer, the end does not deteriorate during storage or during long-term use.

(Transparent Conductive Film) The transparent conductive film of the present invention has a function of blocking electromagnetic waves by the transparent conductive layer (B), and may have an infrared ray blocking function if necessary. The transparent conductive layer (B) is a high refractive transparent thin film layer (B
t) and a metal thin film layer (Bm), which is formed on the polymer film (A).

FIG. 1 is a sectional view showing an example of a transparent conductive film, and FIG. 2 is a plan view thereof. The transparent conductive film 40 has a transparent conductive layer 60 formed on the transparent resin layer 10, and the transparent conductive layer 60 is formed from the high refractive index thin film layer 20, the metal thin film Layer 30,
The high refractive index thin film layer 20, the metal thin film layer 30, the high refractive index thin film layer 20, the metal thin film layer 30, and the high refractive index thin film layer 20 are laminated. As can be seen from FIG. 1, the end of the transparent conductive layer 60 is exposed to the outside air.

(Sealing Portion) The sealing portion in the present invention is formed on the end face of the transparent conductive film, and prevents the end portion of the transparent conductive layer from coming into contact with the outside air.

FIG. 3 is a perspective view showing an example of the transparent conductive film. The end face 50 is a side face of the transparent conductive film 40 formed in a planar shape as shown in FIG.

The place where the sealing portion is formed is the exposed portion of the transparent conductive layer. In the thickness direction of the transparent conductive film, it may be formed so as to cover at least only the layer where the transparent conductive layer exists. However, since the thickness of the transparent conductive layer is only a few μm, it is practically difficult to cover only the side surface of the transparent conductive layer, and a sealing portion is formed on almost all side surfaces of the transparent conductive film. Will be.

FIG. 4 is a sectional view showing an example of a transparent conductive film having a sealing portion formed on an end face. A sealing portion 70 is formed on the end face 50 of the transparent conductive film 40. The sealing portion 70 has a function of hermetically sealing the end face 50 and blocking the end face 50 from outside air.

Regarding the circumferential direction of the transparent conductive film,
It is preferable to form a sealing portion on an end face at least in a portion where the transparent conductive layer is exposed.

When the film is stored in the form of a film roll in the process of producing the transparent conductive film in the present invention, the exposed portion of the transparent conductive layer is only the end face of the roll. In this case, it is preferable to form a sealing portion only at the roll end in order to prevent deterioration of the transparent conductive layer from occurring at the end during storage.

There is no particular limitation on the thickness of the sealing portion. However, if the thickness is too small, a sufficient sealing effect against the outside air cannot be exerted. It is not preferable. The thickness of the sealing portion is usually 0.3 μm or more and 100 μm or less, preferably 0.5 μm or more and 50 μm or less, and more preferably 1 μm or more and 10 μm or less.

(Sealant) The material used for forming the sealing portion in the present invention can be attached to the end face of the transparent conductive film by any method, and the transparent conductive layer existing on the end face of the transparent conductive film can be used. There is no particular limitation as long as the frequency of contact between the exposed portion and the outside air can be reduced. Coating materials used for hard coats and the like widely used, sealing materials used for sealing electronic members, conductive coating materials used for conductive coating of electronic members, etc. Various materials can be used.

Examples of the material include a material mainly containing an organic substance, a material mainly containing an organic substance and silicon, a material mainly containing silicon, and an inorganic material mainly containing a metal.

Specific examples of materials mainly containing organic substances include melamine resins, urethane resins, saturated polyester resins, acrylate resins, polyfunctional acrylic resins, phenolic resins, polyimide resins, epoxy resins, sulfur-containing organic compounds, and the like. It is.

Organics generally have advantages such as one-coat treatment and easy handling, but have low hardness and durability.

Specific examples of the material containing silicon as a main component include aminosilane, silane coupling agent, alkyl trialkoxysilane, colloidal silica, silicon oxide and the like.

Specific examples of the inorganic material mainly containing a metal include silver, copper, gold, aluminum, platinum, and palladium.

(Method of Forming Sealing Portion) In the present invention, the sealing portion may be formed in the process of manufacturing the transparent conductive film, or may be formed separately after manufacturing. If it goes through a film roll state in the manufacturing process,
The film may be formed while the film is being sent out on a roll-to-roll basis, or may be formed at the end in the roll state. The former case is a state in which a plurality of transparent conductive films are not substantially laminated, and the latter case is a state in which a plurality of transparent conductive films are substantially laminated. When the film is formed in a film roll state, it is cut out to a desired length from the roll to finally obtain a transparent conductive film, but in this case, an exposed portion of the transparent conductive layer appears on the cut cross section. Therefore, it is desirable to form the sealing portion in the present invention also on this end face.

When forming a sealing portion after cutting, a transparent conductive film may be prepared one by one and a sealing portion may be formed on the end face thereof, or a plurality of transparent conductive films may be prepared and stacked. The sealing portions may be formed at once on the stacked end faces.

The forming method is not particularly specified as long as it is a method capable of adhering the above-mentioned sealing material to the end face of the transparent conductive film.

In the case where the sealing portion is formed while the film is fed out on a roll-to-roll basis, a general coating method can be used. In this case, coating is performed near both ends of the film to be fed. At this time, it is necessary to perform the coating under such a condition that the coating material is excessively applied. When the target transparent conductive film is in a film state, for example, when the thickness is as thin as 0.3 mm at the maximum, the excessively applied sealing portion forming material reaches the end face and is substantially sealed on the end face. A part will be formed. Examples of applicable coating methods include reverse roll coating, forward rotation roll coating, gravure coating, kiss roll coating, cast coating, spray coating, curtain coating, extrusion coating, air doctor coating, blade coating, rod coating, knife coating, Squeeze coat, impregnated coat and the like. Reverse roll coat, forward rotation roll coat, gravure coat, kiss roll coat, cast coat, spray coat, curtain coat, and extrusion coat are pre-measurement systems, and a desired coating is applied before applying a coating agent to a support. The coating liquid is transferred to the support while being weighed to obtain a working weight. On the other hand, air doctor coat, blade coat, rod coat, knife coat, squeeze coat, impregnated coat is a post-measurement system, and coats the support more than desired coat weight, Later, it is reduced to the specified coating weight. Further, the blade coat, the knife coat and the cast coat are flattening coats, and can produce a smooth coating surface regardless of the contour of the substrate surface to be coated. On the other hand, reverse coat, air doctor coat, gravure coat, spray coat, curtain coat, extrusion coat are contour coats,
The contour of the support surface easily appears on the coating film surface as it is. The rod coat, squeeze coat, forward roll coat, and kiss roll coat are located between the flattening coat and the contour coat.

Further, a vacuum film forming method can be used. In this case, it is necessary to prepare a film-forming target at a position where a film can be formed on an end face of a film flowing by a roll-to-roll method.

When a sealing portion is formed on the end face in the roll state, a coating method using a coating material, a spray coating, an immersion coating, a vacuum film forming method, or the like is used. be able to. The vacuum film formation method includes a vapor deposition method, an ion plating method, a sputtering method, a plasma chemical vapor deposition method, and the like.

The sealing portion according to the present invention is attached to the end surface of the cut portion obtained as a result of cutting the transparent conductive film prepared in a roll state into a desired size and the end surface of the transparent conductive film prepared in a sheet state in advance. The above method is also effective as a method for forming the In this case, the processing may be performed on each of the transparent conductive films, but in order to improve the productivity, a plurality of the transparent conductive films are laminated and the sealing portion forming operation is collectively performed. Is desirable.

(Polymer Film) The polymer film of the present invention is used by forming a functional layer such as a transparent conductive layer, an antireflection layer, and an antiglare layer or by containing a dye. It is intended to be.

The polymer film only needs to be transparent in the visible wavelength region. Here, “transparent” means that the average visible light transmittance is 50% when the thickness is 100 μm.
That is all. Specifically, polyethylene terephthalate, polyether sulfone, polystyrene,
Polyamide such as polyethylene naphthalate, polyarylate, polyether ether ketone, polycarbonate, polyethylene, polypropylene, nylon 6, cellulose resin such as polyimide, triacetyl cellulose, fluorine resin such as polyurethane, polytetrafluoroethylene, polyvinyl chloride Such as vinyl compound, polyacrylic acid, polyacrylate, polyacrylonitrile, addition polymer of vinyl compound, polymethacrylic acid,
Vinylidene compounds such as polymethacrylic acid esters and polyvinylidene chloride; vinylidene fluoride / trifluoroethylene copolymers; vinyl compounds such as ethylene / vinyl acetate copolymers; and copolymers of fluorine compounds; polyethers such as polyethylene oxide; Examples include, but are not limited to, epoxy resins, polyvinyl alcohol, polyvinyl butyral, and the like.

The polymer film used in the present invention usually has a thickness of 10 to 400 μm. If it is too thin, it is difficult to form a transparent conductive film directly on the display surface, and flexibility is limited. Therefore, the thickness of the polymer film is 50-250 μm, preferably 75-250 μm
Is preferred. On the other hand, if the thickness is 250 μm or more, the flexibility may be insufficient, and the film may not be suitable for use by being wound on a roll.

The transparent polymer film having a thickness of 50 to 250 μm has flexibility, and a transparent conductive film can be continuously formed by a roll-to-roll method. A transparent laminate having a large area can be produced.

In the present invention, the surface of the polymer film is subjected to an etching treatment such as a sputtering treatment, a corona treatment, a flame treatment, an ultraviolet irradiation, or an electron beam irradiation, or an undercoating treatment to form a transparent conductive layer formed thereon. The adhesion to the polymer film may be improved in advance. Further, an inorganic layer such as an arbitrary metal may be formed between the polymer film and the transparent conductive layer. Before forming the transparent conductive film, dust-proofing treatment such as solvent cleaning or ultrasonic cleaning is performed as necessary. May be applied.

Further, in order to improve the scratch resistance of the transparent laminate, a hard coat layer may be formed on at least one main surface of the polymer film.

(Transparent Conductive Layer) As described above, in the transparent conductive film used in the present invention, a transparent conductive layer is often formed on one main surface of any polymer film. The transparent conductive layer in the present invention is a transparent conductive film composed of a single layer or a multilayer thin film. In addition, in the present invention, the one in which the transparent conductive layer is formed on the main surface of the polymer film is referred to as a transparent laminate.

The single-layer transparent conductive film includes the above-described conductive mesh, conductive lattice pattern film, metal thin film, and oxide semiconductor thin film.

As a multilayer transparent conductive film, there is a multilayer thin film in which a metal thin film and a high refractive index transparent thin film are laminated. A multilayer thin film consisting of a metal thin film and a high-refractive-index transparent thin film is formed by the conductivity of a metal such as silver and the near-infrared reflection characteristics of its free electrons, and the prevention of the reflection of the metal in a certain wavelength region by the high-refractive-index transparent thin film. , Conductivity, near infrared cut ability,
It has favorable characteristics in any of visible light transmittance.

In order to obtain a display filter having electromagnetic wave shielding ability and near-infrared cut ability, a metal thin film and a high refractive index transparent thin film having high conductivity for absorbing electromagnetic waves and many reflection interfaces for reflecting electromagnetic waves are required. A laminated multilayer thin film is preferred.

By the way, in VCCI, the radiated electric field intensity is 50 dB in Class A indicating the regulation value for business use.
Less than μV / m, indicating a regulated value for consumer use
In sB, it is less than 40 dBμV / m. However, the radiated electric field intensity of the plasma display exceeds 40 dBμV / m in a 20-inch diagonal type and exceeds 50 dBμV / m in a diagonal 40-inch type in a 20-90 MHz band. Therefore, it cannot be used for home use as it is.

The radiated electric field strength of the plasma display is
As the size of the screen and the power consumption increase, an electromagnetic wave shielding material which is strong and has a high shielding effect is required.

In order to have a high visible light transmittance and a low visible light reflectance, and also to have an electromagnetic wave shielding property required for a plasma display, the transparent conductive layer must have a sheet resistance of 0.1 to 30 Ω.
/ □, more preferably 0.1 to 15 Ω / □, and still more preferably 0.1 to 5 Ω / □. The visible light transmittance and the visible light reflectance in the present invention are calculated from the wavelength dependence of the transmittance and the reflectance in accordance with JIS (R-3106).

Further, in order to cut off near-infrared light emitted from the plasma display to a level at which no practical problem occurs, the near-infrared wavelength region 8 of the display filter is required.
The light transmittance at 00 to 1000 nm needs to be 20% or less, and in order to satisfy this requirement, the transparent conductive layer itself is required to be in close proximity due to a requirement for a reduction in the number of members and a limit of near-infrared absorption using a dye. It is necessary to have infrared cut properties. In order to cut off near infrared rays by the transparent conductive layer, reflection by free electrons of metal can be used.

When the metal thin film layer is thick, the visible light transmittance is low, and when the metal thin film layer is thin, the reflection of near infrared rays is weak. However, the visible light transmittance is increased and the overall thickness of the metal thin film layer is increased by stacking one or more layers of a laminated structure in which a metal thin film layer of a certain thickness is sandwiched between high refractive index transparent thin film layers. Is possible. Further, by controlling the number of layers and / or the thickness of each layer, the visible light transmittance, the visible light reflectance, the transmittance of near-infrared light, the transmitted color, and the reflected color can be changed within a certain range. .

In general, when the visible light reflectance is high, the reflection of a lighting device or the like on the screen becomes large, the effect of preventing reflection on the display unit surface is reduced, and the visibility and contrast are reduced. The reflection colors are white, blue,
An inconspicuous purple color is preferred. from these things,
The transparent conductive layer is preferably a multilayer laminate that is easy to design and control optically.

In the transparent conductive film of the present invention,
It is preferable to use a transparent laminate in which a multilayer thin-film transparent conductive layer is formed on one main surface of a polymer film.

In the present invention, the transparent conductive layer is preferably formed such that a high refractive index transparent thin film layer (Bt) and a metal thin film layer (Bm) are formed on one main surface of a polymer film in the order of (Bt) / (Bt).
m) is repeated 2 to 4 times as a repeating unit,
Furthermore, at least a high refractive index transparent thin film layer (Bt)
And the sheet resistance of the transparent conductive layer is 1 to 5 Ω.
/ □, which is excellent in low resistance for electromagnetic wave shielding, near-infrared cut ability, transparency, and visible light reflectivity. In addition,
In the present invention, a multilayer thin film, unless otherwise specified,
This is a multi-layered transparent conductive film in which a laminated structure in which a metal thin film layer is sandwiched between transparent thin film layers having a high refractive index is stacked one or more times.

In the transparent conductive layer of the present invention, the number of repeated laminations is preferably 2 to 4 times. That is, the transparent laminate of the present invention, in which the transparent conductive layer is laminated on the main surface of the polymer film (A), is (A) / (Bt) / (Bm) / (Bt) /
(Bm) / (Bt) or (A) / (Bt) / (B
m) / (Bt) / (Bm) / (Bt) / (Bm) / (B
t) or (A) / (Bt) / (Bm) / (Bt)
/ (Bm) / (Bt) / (Bm) / (Bt) / (Bm)
/ (Bt). If the number of repetitive laminations is 5 or more, the limitation of the production apparatus and the problem of productivity increase, and the visible light transmittance tends to decrease and the visible light reflectance tends to increase. Also, if the number of repetitions is 1
If the number of times is low, it is difficult to simultaneously achieve low resistance, near-infrared cut ability, and visible light reflectance.

In a multilayer thin film having two to four repetitions, the near-infrared cut ability, the visible light transmittance, and the visible light reflectivity must be simultaneously set to the characteristics suitable for the plasma display by the sheet resistance. Of the present invention has been found to be 1 to 5 Ω / □.

It is assumed that the intensity of electromagnetic waves emitted from the plasma display will decrease in the future.
In that case, the sheet resistance of the transparent conductive film is 5 to 15Ω.
It is expected that sufficient electromagnetic wave blocking characteristics can be obtained even with //. It is also assumed that the intensity of electromagnetic waves emitted from the plasma display is further reduced. In that case, the sheet resistance of the transparent conductive film is 15 to 30Ω.
It is expected that sufficient electromagnetic wave blocking characteristics can be obtained even with //.

As a material of the metal thin film layer (Bm), silver is preferable because it has excellent conductivity, infrared reflectivity, and visible light transmittance when laminated in multiple layers. But,
Silver lacks chemical and physical stability, pollutants in the environment,
Since it is deteriorated by water vapor, heat, light, etc., alloys in which one or more environmentally stable metals such as gold, platinum, palladium, copper, indium, and tin are added to silver, and metals that are stable in these environments can also be suitably used. . In particular, gold and palladium are preferable because of their excellent environmental resistance and optical properties.

The silver content in the silver-containing alloy is not particularly limited, but is preferably not significantly different from the conductivity and optical properties of the silver thin film.
It is less than about 0% by weight. However, if another metal is added to silver, its excellent electrical conductivity and optical properties are impaired. Therefore, when having a plurality of metal thin film layers, at least one of the layers should not be alloyed with silver if possible. It is desirable to use it and to alloy only the first metal layer and / or the outermost metal thin film layer as viewed from the substrate.

The thickness of the metal thin film layer is determined optically and experimentally from the viewpoint of conductivity, optical characteristics, etc., and is not particularly limited as long as the transparent conductive layer has the required characteristics. It is necessary that the thin film has a continuous state, not an island-like structure, and preferably has a thickness of 4 nm or more. Also,
If the metal thin film layer is too thick, transparency becomes a problem.
m or less is desirable. When there are a plurality of metal thin film layers, each layer is not necessarily all the same thickness, and all silver or
The alloy does not need to be the same alloy containing silver.

For forming the metal thin film layer, sputtering,
Any of conventionally known methods such as ion plating, vacuum deposition, and plating can be employed.

The transparent thin film forming the high refractive index transparent thin film layer (Bt) is not particularly limited as long as it has transparency in the visible region and has an effect of preventing light reflection in the visible region of the metal thin film layer. However, a material having a high refractive index to visible light of 1.6 or more, preferably 1.8 or more, more preferably 2.0 or more is used. Specific materials for forming such a transparent thin film include indium, titanium, zirconium, bismuth, tin, zinc, antimony, tantalum, cerium,
Examples include oxides of neodymium, lanthanum, thorium, magnesium, gallium, and the like, a mixture of these oxides, and zinc sulfide.

These oxides or sulfides are composed of a metal,
Even if there is a deviation in the stoichiometric composition with an oxygen atom or a sulfur atom, it is acceptable as long as the optical characteristics are not largely changed. Among them, zinc oxide, titanium oxide, indium oxide and a mixture of indium oxide and tin oxide (I
TO) has a high film formation rate in addition to transparency and refractive index,
It can be suitably used because of good adhesion to the metal thin film layer.

The thickness of the high-refractive-index transparent thin film layer is determined based on the optical characteristics of the polymer film (also referred to as a transparent substrate), the thickness and optical characteristics of the metal thin film layer, the refractive index of the transparent thin film layer, and the like. In addition, it is determined experimentally and is not particularly limited, but is preferably 5 nm or more and 200 nm or less, more preferably 10 nm or more and 100 nm or less. The first layer of the high refractive index transparent thin film...
1) The layers (n ≧ 1) are not necessarily of the same thickness and need not be of the same transparent thin film material.

For forming the high refractive index transparent thin film layer, any of conventionally known methods such as sputtering, ion plating, ion beam assist, vacuum deposition, and wet coating can be employed.

In order to improve the environmental resistance of the transparent conductive layer, an organic or inorganic protective layer may be provided on the surface of the transparent conductive layer to such an extent that conductivity and optical properties are not significantly impaired. In addition, in order to improve the environmental resistance of the metal thin film layer and the adhesion between the metal thin film layer and the high refractive index transparent thin film layer, the conductivity,
An arbitrary inorganic layer may be formed to the extent that the optical characteristics are not impaired. These specific materials include copper, nickel,
Examples include chromium, gold, platinum, zinc, zirconium, titanium, tungsten, tin, palladium, and the like, or alloys of two or more of these materials. Its thickness is
Preferably, it is about 0.2 nm to 2 nm.

To obtain a transparent conductive layer having desired optical properties,
Conductivity for electromagnetic wave shielding ability to be obtained, that is,
Considering the metal thin film material and thickness, optical design using the vector method using the optical constants (refractive index, extinction coefficient) of polymer film and thin film material, the method using admittance diagram, etc. The material, the number of layers, the film thickness, etc. are determined. At this time, it is good to consider an adjacent layer formed on the transparent conductive layer. This is because the incident medium of light to the transparent conductive layer formed on the polymer film is different from the incident medium having a refractive index of 1, such as air or vacuum, so that the transmitted color (and the transmittance, the reflected color, and the reflectance) are different. Is changed. That is, in the case where the functional transparent layer is formed on the transparent conductive layer via the transparent adhesive layer, design is performed in consideration of the optical constant of the transparent adhesive layer. In the case where a functional transparent layer is directly formed on the transparent conductive layer, a design is performed in consideration of the optical constant of a material in contact with the transparent conductive layer.

As described above, by designing the transparent conductive layer, in the high refractive index transparent thin film layer (Bt), the lowermost layer and the uppermost layer are thinner than the layer between them when viewed from the polymer film.
In the metal thin film layer (Bm), when the lowermost layer is thinner than the other layers when viewed from the polymer film, and an adhesive layer having a refractive index of 1.45 to 1.65 and an extinction coefficient of almost 0 and a thickness of 10 to 50 μm is an adjacent layer. , That the reflection of the transparent laminate does not increase significantly,
That is, it was found that the increase in interfacial reflection due to the formation of the adjacent layer was 2% or less.

In particular, when the number of repetitions is three, that is, in the case of a transparent conductive layer composed of a total of seven layers, if the middle second layer of the three metal thin film layers (Bm) is thicker than the other layers, the above-mentioned condition is obtained. It has been found that when the adhesive is an adjacent layer, the reflection of the transparent laminate does not increase significantly.

The optical constant can be measured by ellipsometry (ellipsometry) or Abbe refractometer, and the film can be formed by controlling the number of layers and the film thickness while observing the optical characteristics. .

The atomic composition of the transparent conductive layer formed by the above method is determined by Auger electron spectroscopy (AES), inductively coupled plasma (ICP), Rutherford backscattering (RB).
S) and the like. The layer configuration and film thickness are
It can be measured by observation in the depth direction of Auger electron spectroscopy, cross-sectional observation with a transmission electron microscope, or the like.

The film thickness is controlled by clarifying the relationship between the film forming conditions and the film forming speed in advance and by monitoring the film thickness during the film formation using a quartz oscillator or the like. .

(Optical Filter) The optical filter of the present invention is prepared using the transparent conductive film of the present invention. When the configuration of the optical filter is specifically exemplified using the transparent adhesive layer (C), the polymer film (A), the transparent conductive layer (B), the antireflection layer or the antiglare layer (E), the visual recognition of the display element is possible. C / A / B / E in order from the surface side,
C / B / A / E and the like. Further, a raised film (F) for increasing the thickness may be provided. Specific configuration examples in that case are C / A / B / F / E, C / F / A / B / E,
C / B / A / F / E and C / F / B / A / E.

(Toning) In many cases, the optical filter has a function of adjusting the emission color from the display to a more preferable one.

In the transmission color of the optical filter,
When the green color is strong, the contrast of the display is reduced, the color purity is reduced, and the white display may be greenish. This is because light having a wavelength of about 550 nm, which is yellowish green to green, has the highest visibility.

The multilayer thin film is generally inferior in transmission color tone when importance is placed on visible light transmittance and visible light reflectance. The higher the electromagnetic wave shielding ability, that is, the conductivity, and the near infrared cut ability,
The total thickness of the metal thin film needs to be large. However, as the total thickness of the metal thin film increases, the color tends to be green to yellowish green. Therefore, the optical filter used for the plasma display is required to have a transmission color of neutral gray or blue gray. This is due to a decrease in contrast due to strong green transmission, a weak blue emission compared to red and green emission colors, and a preference for white having a slightly higher color temperature than standard white. In addition, regarding the transmission characteristics of the optical filter, it is desirable that the chromaticity coordinates of the white display of the plasma display be as close as possible to the locus of the black body.

When a multilayer thin film is used for the transparent conductive layer (B), it is important to correct the color tone of the multilayer thin film so that the transmission color of the optical filter becomes neutral gray or blue gray. To correct the color tone, a dye that absorbs in the visible wavelength region may be used. For example, when the transmission color of the transparent conductive layer (B) has a green tint, the color is corrected to gray using a red dye, and when the transmission color has a yellow tint, correction is performed using a blue to purple dye.

In a color plasma display, a red (R) light-emitting phosphor such as (Y, Gd, Eu) BO _{3 that} emits light by excitation with vacuum ultraviolet light generated by a DC or AC discharge of a rare gas, (Zn,
Mn) ₂ SiO _{4 and} other green (G) light-emitting phosphors, (Ba, Eu) MgAl
A blue (B) light-emitting phosphor such as ₁₀ O ₁₇ : Eu is formed in a display cell constituting a pixel. In addition to the color purity, the phosphor is selected based on the index of application to the discharge cell, short afterglow time, luminous efficiency, heat resistance, etc. Many require. In particular, the emission spectrum of the red light-emitting phosphor has a wavelength of 580 nm to 700 n.
It shows several emission peaks extending up to about m, and the emission peak on the short wavelength side with relatively high intensity is yellow to orange emission, so red emission has poor color purity close to orange. There's a problem. Xe and Ne for rare gases
In the case of using a mixed gas of the above, orange light emission due to light emission relaxation in the Ne excited state also deteriorates color purity. Regarding green light emission and blue light emission, the position of the peak wavelength and the broadening of the light emission are factors that lower the color purity.

For example, in a coordinate system that indicates hue and saturation by the horizontal axis chromaticity x and the vertical axis chromaticity y defined by the International Commission on Illumination (CIE), the three colors RGB are defined as the vertices of the color purity. It can be represented by the size of the color reproduction range indicated by the size of the triangle.
Due to the low color purity, the color reproduction range of plasma display emission is based on NTSC (National Television System Committee).
tee) It is usually narrower than the color reproduction range indicated by the chromaticity of RGB three colors defined by the method.

Further, in addition to bleeding of light emission between display cells, light emission of each color includes unnecessary light over a wide range. This is also a factor that lowers the contrast of images. Further, a plasma display generally has a lower contrast in a bright state in which external light due to room illumination or the like is present than in a dark state. This occurs because the substrate glass, the phosphor, and the like reflect external light, and unnecessary light does not make necessary light stand out. The contrast ratio of the plasma display panel is 100 to 200 in the hint, and 10 to 30 in the bright state with the ambient illuminance of about 100 lx. The low contrast is also a factor that narrows the color reproduction range.

In order to improve the contrast, there is a method of lowering the transmittance in the entire visible wavelength region and reducing the transmission of external light reflection and the like on the substrate glass and the phosphor by using a neutral density (ND) filter in front of the display. However, when the visible light transmittance is extremely low, the brightness and the sharpness of the image are reduced, and the improvement in color purity is hardly observed.

The present inventors have improved the color purity and contrast of the emission color of the color plasma display by reducing unnecessary light emission and reflection of external light which cause reduction in the color purity and contrast of the emission color. I found what I could do. In addition, by using a dye, the present inventors not only adjust the optical filter to neutral gray or neutral blue, but also reduce unnecessary light emission and external light reflection that cause a reduction in color purity and contrast of the emission color. I found what I could do. In particular,
It is remarkable that red light emission is close to orange, and it has been found that the color purity of red light emission can be improved by reducing the light emission at a wavelength of 580 nm to 605 nm, which is the cause.

In the optical filter of the present invention, unnecessary light emission and external light reflection can be reduced at a wavelength of 570 nm to 605 nm.
Can be carried out by incorporating a dye having an absorption maximum into the shield body. At this time, the wavelength of the light having a red emission peak of 6
It is necessary that the transmission of light from 15 nm to 640 nm is not significantly impaired.

In general, a dye has a broad absorption range, and even a dye having a desired absorption peak may absorb light having a suitable wavelength due to absorption at the tail. In the case where light due to Ne exists, orange light emission can be reduced, so that the color purity of light emitted from the RGB display cell is improved. The green emission of the color plasma display is broad, and its peak position is
For example, it may be on a slightly longer wavelength side than green required in the NTSC system, that is, on a yellow-green side.

The present inventors have proposed a wavelength of 570 nm to 605 nm.
The absorption on the short wavelength side of the dye having an absorption maximum at m
It has been found that the color purity can be improved by absorbing and reducing the long wavelength side of green light emission, further reducing unnecessary light emission, and / or shifting the peak.

In order to improve the color purity of red light emission and also green light emission, a dye having an absorption maximum at a wavelength of 570 nm to 605 nm is used.
The minimum transmittance of the optical filter in nm is preferably 80% or less of the transmittance at the peak position of the required red emission.

In the case where the color purity of blue light emission is low, a dye that reduces unnecessary light emission, shifts its peak wavelength, and absorbs blue-green light emission may be used similarly to red light emission and green light emission. Further, absorption by the dye can reduce external light reflection on the phosphor by reducing the incidence of external light on the phosphor. This can also improve color purity and contrast.

The method for incorporating a dye into the optical filter of the present invention includes (1) a polymer film obtained by kneading at least one kind of dye into a transparent resin, (2) a resin or a resin monomer / organic solvent. At least one or more dyes are dispersed and dissolved in the resin concentrate of (1), and a polymer film prepared by a casting method, (3) at least one or more dyes are added to a resin binder and an organic solvent,
Coated on a transparent substrate as a paint,
(4) A transparent pressure-sensitive adhesive containing at least one or more types of pigments.

The term “containing” as used in the present invention means not only that it is contained in a layer such as a substrate or a coating film, but also inside a pressure-sensitive adhesive, and also that it is applied to the surface of a substrate or a layer.

The dye may be a general dye or pigment having a desired absorption wavelength in the visible region, and the type thereof is not particularly limited. Examples thereof include anthraquinone type, phthalocyanine type, methine type, azomethine type and oxazine type. ,
Commercially available organic dyes such as azo, styryl, coumarin, porphyrin, dibenzofuranone, diketopyrrolopyrrole, rhodamine, xanthene, and pyrromethene are exemplified. The type and concentration are determined by the absorption wavelength and absorption coefficient of the dye, the color tone of the transparent conductive layer, the transmission characteristics and transmittance required for the optical filter, and the type and thickness of the medium or coating film to be dispersed, and are particularly limited. Not something.

When a multilayer thin film is used for the transparent conductive layer (B), it has a near-infrared cut ability in addition to an electromagnetic wave shielding ability. When the pigment does not have an infrared ray-cutting ability, one or more kinds of near-infrared ray absorbing pigments may be used in combination with the above-mentioned pigment in order to impart near-infrared ray-cutting ability to a display filter.

The near-infrared absorbing dye is not particularly limited, as long as it supplements the near-infrared cut ability of the transparent conductive layer and absorbs near-infrared light emitted from the plasma display to a sufficiently practical level. However, the concentration is not limited. Examples of the near infrared absorbing dye include a phthalocyanine-based compound, an anthraquinone-based compound, a dithiol-based compound, and a diiminium-based compound.

Since the temperature of the panel surface of a plasma display panel is high, especially when the temperature of the environment is high, the temperature of the optical filter is also high. It is preferable to have heat resistance that does not deteriorate.

Further, depending on the dye, in addition to heat resistance,
Some have poor lightfastness. If the emission of the plasma display or the deterioration of external light due to ultraviolet light or visible light becomes a problem, by using a member containing an ultraviolet absorber or a member that does not transmit ultraviolet light, it is possible to reduce the deterioration of the dye due to ultraviolet light, It is important to use a dye that does not significantly deteriorate due to visible light.

[0119] The same applies to humidity and environment in which these are combined, in addition to heat and light. When the dye deteriorates, the transmission characteristics of the optical filter change.

Actually, the surface temperature of the plasma display panel is changed from 70.degree. C. to 80.degree.
No. 0303. The light generated from the plasma display panel is, for example, 300 cd / m
² (Fujitsu Limited Image Si
te catalog AD25-0061C Oct. 1
997M), when the solid angle is 2π, and this is irradiated for 20,000 hours, 2π × 20,000 × 300 = 38,000,000 (lx
・ Hours), tens of millions (lx ・ hours) for practical use
It can be seen that a certain degree of light resistance is required.

Furthermore, in order to disperse a dye in a medium or a coating film, solubility in an appropriate solvent is also important. Two or more dyes having different absorption wavelengths may be contained in one medium or coating film.

The optical filter of the present invention has excellent transmission characteristics and transmittance without significantly impairing the brightness and visibility of the color plasma display, and can improve the color purity and contrast of the emission color of the color plasma display. The present inventors, of the dye to be contained one or more,
In the case where at least one is a tetraazaporphyrin compound, it has a main absorption wavelength at or near the wavelength of unnecessary emission of 570 to 605 nm to be reduced,
In addition, since the absorption wavelength width is relatively narrow, it has been found that loss of luminance due to absorption of suitable light emission can be reduced, and excellent transmission characteristics, transmittance, ability to improve color purity of emitted light and contrast can be obtained. Excellent optical filters could be obtained.

In the optical filter of the present invention, the methods (1) to (4) for containing the dye include the polymer film (A) containing the dye and the transparent adhesive layer (C) described later containing the dye. Alternatively, it can be carried out in any one or more of (D), a functional transparent layer (E) described below containing a dye, and the aforementioned hard coat layer (F) containing a dye. The functional transparent layer (E) described below containing a dye,
The film containing the dye and having each function, the film containing the dye and having each function was formed on the polymer film, and the film having each function was formed on the substrate containing the dye. Or any of them.

In the present invention, two or more dyes having different absorption wavelengths may be contained in one medium or coating film, or two or more dye layers may be provided.

First, the method (1) in which a resin is kneaded with a dye and molded by heating will be described. The resin material is preferably as transparent as possible when formed into a plastic plate or a polymer film. Specifically, polyethylene terephthalate, polyether sulfone, polystyrene, polyethylene naphthalate, polyarylate, polyether ether ketone , Polycarbonate,
Polyamide, polypropylene, polyamide such as nylon 6, polyimide, cellulose resin such as triacetyl cellulose, polyurethane, fluorine resin such as polytetrafluoroethylene, vinyl compound such as polyvinyl chloride, polyacrylic acid, polyacrylate, Polyacrylonitrile, addition polymers of vinyl compounds, vinylidene compounds such as polymethacrylic acid, polymethacrylic acid esters, polyvinylidene chloride, vinyl compounds such as vinylidene fluoride / trifluoroethylene copolymer, ethylene / vinyl acetate copolymer, and fluorine Examples thereof include copolymers of system compounds, polyethers such as polyethylene oxide, epoxy resins, polyvinyl alcohol, polyvinyl butyral, and the like, but are not limited to these resins.

Although the processing temperature, film forming conditions and the like are slightly different depending on the dye and the base polymer used, the dye is usually added to the powder or pellet of the base polymer (150). After heating and melting at a temperature of ℃, a method of forming a plastic plate by molding, (ii) a method of forming a film by an extruder, (iii) preparing a raw material by an extruder, 2 to 5 at 30 to 120 ℃ A method in which the film is stretched uniaxially or biaxially into a film having a thickness of 10 to 200 μm. When kneading, an additive such as a plasticizer used for ordinary resin molding may be added. The amount of the dye to be added depends on the absorption coefficient of the dye, the thickness of the polymer molded article to be produced, the desired absorption intensity, the desired transmission characteristics and transmittance, etc., but is usually 1 ppm based on the weight of the base polymer molded article. ~ 20%.

In the casting method (2), a dye is added and dissolved in a resin concentrate obtained by dissolving a resin or a resin monomer in an organic solvent, and if necessary, a plasticizer, a polymerization initiator and an antioxidant are added. In addition, by pouring onto a mold or drum having the required surface condition, and by solvent evaporation and drying or polymerization, solvent evaporation and drying, plastic plates,
Obtain a polymer film.

Usually, aliphatic ester resins, acrylic resins, melamine resins, urethane resins, aromatic ester resins, polycarbonate resins, aliphatic polyolefin resins, aromatic polyolefin resins, polyvinyl resins, polyvinyl alcohol resins, polyvinyl resins Modified resin (PV
B, EVA, etc.) or a resin monomer of a copolymer resin thereof. As the solvent, a halogen-based, alcohol-based, ketone-based, ester-based, aliphatic hydrocarbon-based, aromatic hydrocarbon-based, ether-based solvent, or a mixture thereof is used.

The concentration of the dye varies depending on the absorption coefficient of the dye, the thickness of the plate or film, the desired absorption intensity, the desired transmission characteristics and the desired transmittance, and is usually 1 ppm to 20% based on the weight of the resin monomer. It is. Further, the resin concentration is usually 1 to 90% with respect to the whole paint.

As the method (3) for coating and coating, a method of dissolving a dye in a binder resin and an organic solvent to form a coating, or a method of pulverizing (50 to 500 nm) a non-colored acrylic emulsion paint. A method of dispersing things into an acrylic emulsion-based aqueous paint,
Etc.

In the former method, an aliphatic ester resin, an acrylic resin, a melamine resin, a urethane resin,
An aromatic ester resin, a polycarbonate resin, an aliphatic polyolefin resin, an aromatic polyolefin resin, a polyvinyl resin, a polyvinyl alcohol resin, a modified polyvinyl resin (PVB, EVA, or the like), or a copolymer resin thereof is used as a binder resin. As the solvent, a halogen-based, alcohol-based, ketone-based, ester-based, aliphatic hydrocarbon-based, aromatic hydrocarbon-based, ether-based solvent, or a mixture thereof is used.

The concentration of the dye varies depending on the absorption coefficient of the dye, the thickness of the coating, the desired absorption intensity, the desired visible light transmittance, etc., but is usually 0.1 to 30% based on the weight of the binder resin. is there. Further, the binder resin concentration is usually 1 to 50% with respect to the whole paint.

In the case of the latter acrylic emulsion-based water-based paint, similarly, a pigment obtained by finely pulverizing (50 to 500 nm) a pigment is dispersed in an uncolored acrylic emulsion paint. Additives such as antioxidants and the like used in ordinary paints may be added to the paint.

The coating material prepared by the above method is prepared by coating a known coating such as a bar coater, a blade coater, a spin coater, a reverse coater, a die coater or a spray on a transparent polymer film, a transparent resin, a transparent glass or the like. Thus, a substrate containing a dye is prepared.

A protective layer may be provided to protect the coated surface, or another component of the optical filter may be bonded to the coated surface to protect the coated surface.

In the method (4) of using as a pressure-sensitive adhesive containing a dye, an acrylic adhesive, a silicone adhesive, a urethane adhesive, a polyvinyl butyral adhesive (PV
B), sheet or liquid adhesives or adhesives such as polyvinyl ether, saturated amorphous polyester, melamine resin, etc., such as ethylene-vinyl acetate adhesive (EVA),
A dye is used by adding 10 ppm to 30%.

In these methods, an ultraviolet absorber may be added together with the dye in order to increase the light resistance of the dye-containing optical filter. Type of UV absorber,
The concentration is not particularly limited.

(Electrode) For a device requiring an electromagnetic wave shield, a metal layer is provided inside the case of the device, or a radio wave is blocked by using a conductive material for the case. When transparency is required as in a display, an optical filter having a window-like electromagnetic wave shielding function and having a transparent conductive layer is provided. Since the electromagnetic wave induces electric charge after being absorbed in the conductive layer, if the electric charge is not escaped by grounding, the optical filter again becomes an antenna to oscillate the electromagnetic wave and reduce the electromagnetic wave shielding ability. Therefore, it is necessary that the optical filter and the ground part of the display body are electrically connected. Therefore, when the transparent adhesive layer (C) and the functional transparent layer (E) are formed on the transparent conductive layer (B), the transparent adhesive layer (C) and the functional transparent layer (E) Is preferably formed on the transparent conductive layer (B) so that An electrode is formed using this conductive part. The shape of the conductive portion is not particularly limited, but it is important that there is no gap for leakage of electromagnetic waves between the optical filter and the display body.

In order to improve the electrical contact, a conductive material may be applied to the conductive portion to form an electrode. The shape to be provided is not particularly limited. However, it is preferable that it is formed so as to cover all the conductive portions.

The electrode according to the present invention may be obtained by bringing a conductive material into contact with a cross section of the film of the present invention including a transparent conductive layer.

In this case, if the end of the transparent adhesive layer formed on the transparent conductive layer is located inside the end of the transparent conductive layer, the gap may be formed when the electrode is formed using a conductive paste or the like. This is preferable because the conductive paste enters the portion and the contact area between the transparent conductive layer and the electrode increases.

Also, a conductive tape such as a copper tape may be sandwiched between the transparent conductive layer and the transparent adhesive layer to be laminated thereon, and a part of the conductive tape may be drawn out of the electromagnetic wave shield to form an electrode. good. In this case, the conductive tape pulled out to the outside substantially serves as an electrode.

Further, an electrode may be formed by providing a gap from the transparent conductive layer to the outermost surface of the electromagnetic wave shield.
The shape of the gap seen from the surface is not particularly specified, and may be circular or square. Further, it may be formed in a linear shape. There is no particular designation for the size of each gap seen from the surface. However, it is not preferable that the size is too large because the portion is applied to a visible portion. The formation position of the gap is not particularly specified as long as the position avoids the visible portion. Inevitably, it is located near the end. There is no particular limitation on the number of gaps to be formed, but it is preferable to form as many gaps as possible over the entire circumference because the current extraction efficiency increases. The gap may be provided between the transparent conductive layer and the outermost surface of the electromagnetic wave shield, but preferably penetrates the transparent conductive layer from the viewpoint of increasing the contact area with the electrode to be formed.
There is no particular designation for the member that fills the gap. It may be filled with a metal member or with a conductive paste. In this case, the member filling the gap becomes an electrode substantially.

In this case, the optical filter itself may not be processed in advance. A metal ground with a screw hole is prepared in advance on the outer periphery of the display device, and the electromagnetic wave shield is pasted to the display portion of the display including the metal ground, and then penetrates the electromagnetic wave shield. Then, a conductive screw may be embedded in the screw hole of the metal ground. In this case, the conductive screw substantially serves as an electrode. Using this method, an optical filter can be manufactured with high productivity by a roll-to-roll method, and it is easy to form electrodes over the entire periphery of the electromagnetic wave shield.

It is preferable that the electrodes are provided continuously on the periphery of the transparent conductive layer (B). That is, it is preferable that the conductive portion is provided in a frame shape except for a central portion which is a display portion of the display. However,
Even if electrodes are not formed on the entire circumference, there is a certain electromagnetic wave blocking ability. Therefore, in many cases, it can be used by comprehensively considering the amount of electromagnetic waves generated from the device and the amount of allowable electromagnetic wave leakage.

For example, if a design is adopted in which a conductive material is applied only to opposing sides of a rectangle to form an electrode, the electrode can be formed by a roll-to-roll method, or the electrode can be formed in a rolled state. Therefore, the optical filter can be manufactured with very high production efficiency, which is convenient. This technique can also be used in the case where a conductive tape is used as an electrode as described above.

[0147] In addition to the portion other than the two opposing sides of the rectangle, the electrode is formed in another portion or the opposing two sides.
There is no particular problem even if there is a part where the electrode is not formed in a part of the side.

In the electrode forming process, covering the conductive portion also protects the transparent conductive layer (B), which is inferior in environmental resistance and scratch resistance. The material used to cover the conductive portion is, from the viewpoint of conductivity, contact resistance and adhesion with the transparent conductive film,
Silver, gold, copper, platinum, nickel, aluminum, chrome,
An alloy composed of one or more of iron, zinc, carbon and the like, a synthetic resin and a mixture of these simple substances or alloys, or a paste composed of borosilicate glass and a mixture of these simple substances or alloys can be used. For forming an electrode, a conventionally known method such as a printing method or a coating method can be adopted for a paste or the like such as a plating method, a vacuum evaporation method, and a sputtering method.

A method in which a paste is used to cover a conductive portion will be described. In the case of a single-wafer method, a screen printing method can be used, and in the case of a roll-to-roll method, a general coating method can be used.
Alternatively, a tape-shaped conductive material can be attached and used.

(Anti-reflection layer) The anti-reflection layer is formed on the substrate to reduce the light reflectance on the surface of the substrate.

As the antireflection layer, specifically, a fluorine-based transparent polymer resin, magnesium fluoride, silicon-based, or the like having a refractive index of 1.5 or less, preferably 1.4 or less in the visible light region. For example, 1 /
Four-wavelength optical film with a single layer, different refractive index, inorganic compounds such as metal oxides, fluorides, silicides, borides, carbide nitrides, sulfides, etc. or silicon-based resins, acrylic resins, fluorine Thin films of organic compounds such as
There are those in which a plurality of layers are laminated. What was formed as a single layer,
Although it is easy to manufacture, its antireflection property is inferior to that of a multilayer laminate. The multilayer laminate has an antireflection function over a wide wavelength range, and there is little restriction on optical design due to the optical characteristics of the base film. For the formation of these inorganic compound thin films, conventionally known methods such as sputtering, ion plating, ion beam assist, vacuum deposition, and room-type coating method may be used.

The film on which the antireflection layer is formed is an antireflection film. In the present invention, the antireflection film is also included in the antireflection layer.

(Anti-glare layer) The anti-glare layer is a layer formed on a substrate to prevent transmitted light passing through the substrate and reflected light from the surface from being glare-proof.

The antiglare layer has fine irregularities of about 0.1 to 10 μm on the surface. Specifically, an acrylic resin, a silicon resin, a melamine resin, a urethane resin, an alkyd resin, a thermosetting resin or a photocurable resin such as a fluorine resin, silica, melamine, an inorganic compound such as acrylic or The ink obtained by dispersing the particles of the organic compound to form an ink is applied and cured on a transparent polymer film by a bar coating method, a reverse coating method, a gravure coating method, a die coating method, a roll coating method or the like. The average particle size of the particles is 1 to 40
μm. Alternatively, a thermosetting or photocurable resin such as an acrylic resin, a silicon resin, a melamine resin, a urethane resin, an alkyd resin, or a fluororesin is applied to a substrate, and a mold having a desired haze or surface state is provided. The antiglare layer can also be obtained by pressing and curing.
Further, the antiglare layer can be obtained by treating the base film with a chemical, such as etching the glass plate with hydrofluoric acid or the like. In this case, the haze can be controlled by the processing time and the etching property of the chemical. In the above-mentioned antiglare layer, it suffices if appropriate irregularities are formed on the surface, and the forming method is not limited to the above-mentioned method. The antiglare layer accounts for 0.5% or more and 20% or less, preferably 1% or more and 10% or less. If the haze is too small, the antiglare performance is insufficient, and if the haze is too large, the parallel light transmittance is reduced, and the visibility of the display deteriorates.

The film on which the antiglare layer is formed is an antiglare film. In the present invention, the antiglare film is also included in the antiglare layer.

(Analysis Method) The composition and thickness of the sealing portion in the present invention can be determined by a conventionally used general method.

With respect to the composition, when the sealing portion forming material is an organic substance, nuclear magnetic resonance (NMR), infrared spectroscopy (IR), Raman spectroscopy, mass spectroscopy (MAS), etc. may be used. In the case of inorganic substances, Auger electron spectroscopy (AES), X-ray fluorescence (XRF), X-ray microanalysis (XMA), and charged particle excitation X-ray analysis (R
BS), X-ray photoelectron spectroscopy (XPS), vacuum ultraviolet photoelectron spectroscopy (UPS), infrared absorption spectroscopy (IR), Raman spectroscopy, secondary ion mass spectroscopy (SIMS), low energy ion scattering spectroscopy (ISS) or the like can be used. The sample needs to be appropriately prepared according to the state used for each measurement.

Regarding the thickness, Auger electron spectroscopy (A
It can be checked by performing ES) or secondary ion mass spectrometry (SIMS) in the depth direction.

The layer structure of the optical filter and the state of each layer were determined by measuring the cross section with an optical microscope and using a scanning electron microscope (SE).
M) Measurement, which can be examined using transmission electron microscope measurement (TEM).

The surface atomic composition of the transparent conductive film is determined by Auger electron spectroscopy (AES), X-ray fluorescence (XRF), X-ray microanalysis (XMA), charged particle excitation X-ray analysis (RBS), X-ray photoelectron spectroscopy (XPS), vacuum ultraviolet photoelectron spectroscopy (UPS), infrared absorption spectroscopy (IR), Raman spectroscopy, secondary ion mass spectrometry (SIMS), low energy ion scattering spectroscopy (ISS), etc. Can be measured. Further, the atomic composition and the film thickness in the film can be examined by performing Auger electron spectroscopy (AES) or secondary ion mass spectrometry (SIMS) in the depth direction.

When an antiglare film, an antireflection film, or the like is bonded on the transparent conductive film, peel it off,
After exposing the surface of the transparent conductive film, the above-described method may be used for the examination.

The composition and structure of the polymer and dye used in the present invention can be determined by dissolving the dye in an appropriate solvent and using a general composition or structure analysis technique. For example, nuclear magnetic resonance (NMR),
Infrared spectroscopy (IR), Raman spectroscopy, mass spectroscopy (M
AS) can be used.

(Evaluation Method for Transparent Conductive Film and Optical Filter) In the present invention, the evaluation of the transparent conductive film and the optical filter on which the sealing portion is formed is performed for an appropriate period.
Leave it in the environment or equip it with a display device for an appropriate period,
It is sufficient to operate the apparatus or to check whether or not deterioration occurs at the end of the optical filter.

However, the above-mentioned method is not preferable as a method that is used for rapid development with a long evaluation period. In the present invention, the acceleration evaluation method described below is used as an alternative to the above-described method.

The method for evaluating the transparent conductive film and the optical filter in the present invention is carried out by examining the state of the optical filter after being placed in a high-temperature and constant-humidity environment for a certain period of time. Conditions must be determined according to the application. For example, when used in a display portion of a plasma display panel, it is necessary that after exposure to an environment at a temperature of 60 ° C. and a humidity of 90% for 100 hours, a defect that poses a practical problem does not occur.

In the present invention, a temperature of 60 ° C. and a humidity of 90
%, After 100 hours exposure, a white spot defect having a diameter of 0.1 mm or more was generated in an area within 3 mm from the end, and the test was judged as unacceptable.

[0167]

EXAMPLES (Preparation of Transparent Conductive Film) <Preparation 1> A biaxially stretched polyethylene terephthalate (PET) film [thickness: 188 μm] was used as a polymer film (A) on one main surface of which was formed from a PET film. In this order, an ITO thin film (thickness: 40 nm), a silver thin film (thickness: 11 nm), an ITO thin film (thickness: 95 nm), a silver thin film (thickness: 14 nm), and an ITO thin film (thickness: 90 n)
m), silver thin film (thickness: 12 nm), ITO thin film (thickness:
A total of seven transparent conductive layers (B) (40 nm) are formed, and a transparent conductive film having a transparent conductive layer (B) with a sheet resistance of 2.2 Ω / □ is prepared. The produced thing was used as the transparent conductive film 1.

The transparent conductive film is prepared by a roll-to-roll method. PET film is 570m wide
m, a film roll having a length of 10 m is used.

The film is formed over the entire length of the roll. A cross-sectional view of the transparent conductive film is as shown in FIG.

<Preparation 2> Anti-reflection film [manufactured by Nippon Oil & Fat: Rialok 8201UV, without an adhesive layer, a protective film made of polyethylene was previously attached to the anti-reflection layer to protect the layer. A transparent conductive layer is formed on the surface opposite to the surface on which the antireflection layer is formed in the same manner as in <Preparation 1> to form a transparent conductive film.
The prepared film was used as a transparent conductive film 2. This film is substantially a transparent conductive film having an antireflection function.

The transparent conductive film having an antireflection function is prepared by a roll-to-roll method.

As the antireflection film, a film roll having a width of 570 mm and a length of 10 m is used. The film is formed over the entire length of the roll.

(Preparation of Dye-Containing Adhesive Material) <Preparation 3> Ethyl acetate / toluene (50:50 wt.)
%) An organic dye is dispersed and dissolved in a solvent to prepare a diluent of an acrylic pressure-sensitive adhesive. Acrylic adhesive / dilution solution containing pigment (80:20 wt%) is mixed, and the surface of the transparent laminate 1 on the polymer film (A) side is coated with a comma coater to a dry film thickness of 25 μm, and then dried and adhered. A transparent adhesive layer (C) (adhesive) sandwiched between the release film and the polymer film (A) of the transparent laminate by laminating a release film on the surface
To form

The refractive index of the adhesive is 1.51, and the extinction coefficient is 0. As the organic dye, a wavelength of 595 n for absorbing unnecessary light emitted from the plasma display is used.
m-Dye PD-31 having absorption maximum at m
9 and red dye PS-Red-G manufactured by Mitsui Chemicals, Inc. for correcting the chromaticity of white light emission.
The acrylic adhesive / dye-containing diluent is adjusted so as to be contained at 0 (wt) ppm.

(Sealing Part Forming Material) In each embodiment, the sealing part forming material is selected from the following and carried out.

1. 1. Silicone epoxy [manufactured by Toshiba Silicone Co., product name: TSR194] Silicone urethane [product name: TSR175, manufactured by Toshiba Silicone Co., Ltd.]
3. 3. Silicone acrylic [product name: TSR171, manufactured by Toshiba Silicone Co., Ltd.] 4. Silane coupling agent [manufactured by Toshiba Silicone Co., product name: TSL8310] Silicon oxide target [composition formula: SiO2], 6.4-fluoroethylene [product of Daikin Industries, product name: Zeffle GK],
7. Vinylidene fluoride [Kureha Chemical Co., Ltd., product name: K
F], 8. Silver paste [Mitsui Chemicals, product name: MSP
-600F]

(Sealing Part Forming Method) In each embodiment, the sealing part forming method is selected from the following <type> and carried out.
The conditions used in each method are as described in the section of <condition> below.

<Type> 2. knife coat, 2 gravure coat, 3. reverse coat; Brushing; 5. Spray coat, 6. Dip coat, 7. Sputtering, 8. Deposition <Conditions> Knife shape: arc knife, knife angle (angle at vertical exit between web and knife): 92 °, coating speed: 4
0 m / min 2. 2. Coater type: direct gravure coater, gravure roll cell type: oblique line type, coating speed 200 m / min 3. Coating speed: 250 m / min 4. Brush width: 100 mm Method: Airless method Pulling speed: 1 mm / sec, post-treatment drying temperature 100
6.degree. C., time 5 minutes 7. Method: RF plasma, gas: mixed gas of argon and oxygen [pressure ratio: argon: oxygen = 9: 1], deposition pressure: 0.5
Pa8. Method: EB plasma, gas: argon / oxygen mixed gas [pressure ratio: argon: oxygen = 9: 1], deposition pressure: 0.5
Pa In each embodiment, the following operations are sequentially performed.

<Work 1> (Lamination of masking film) Work content 1: Roll-to-roll method, protective film [made of polyethylene, thickness: 50 μm, transparent adhesive film surface; That has been done). Work content 2: No work is performed.

<Work 2> (Preparation for electrode formation) Work content 1: No work is performed. Work content 2: A copper foil tape [width: 10 mm, thickness: 100 μm, conductive adhesive on one side] is attached to both ends by a roll-to-roll method.

<Work 3> (Lamination of adhesive material) Work content 1: A transparent adhesive material containing a dye [acrylic resin] prepared in preparation 3 on a surface opposite to the transparent conductive layer forming surface of the transparent conductive film by a roll-to-roll method Made, thickness: 25 μm,
Double-tack system with PET film separators on both sides]. Work content 2: No work is performed.

<Work 4> (Formation of Sealing Part 1) Work content 1: A sealing part is formed at both ends while feeding a transparent conductive film or a transparent conductive film with an antireflection function by a roll-to-roll method. Work content 2: forming sealing portions at both ends of a transparent conductive film prepared in a roll state or a transparent conductive film with an antireflection function. Work content 3: No work is performed.

<Work 5> (Preparation of Optical Filter 1: Basic Structure) Work content 1: Roll-to-roll transparent conductive film and anti-reflection film [manufactured by NOF CORPORATION, Realoc 820
[1UV]. Work content 2: A transparent conductive film with an antireflection function is used as an optical filter as it is.

<Work 6> (Formation of Sealed Part 2) Work content 1: A sealed part is formed at both ends while a transparent conductive film or a transparent conductive film with an antireflection function is fed by a roll-to-roll method. Work content 2: Form sealing portions at both ends of a transparent conductive film prepared in a roll state or a transparent conductive film with an antireflection function. Work content 3: No work is performed.

<Work 7> (Preparation of optical filter 2: cutting) The film in a roll state is cut into a length of 970 mm while being sent out.

<Operation 8> (Formation of Sealing Portion 3) The optical filters in a sheet state are stacked, and a sealing portion is formed on the cut surface generated in Operation 6.

<Work 9> (Installation of optical filter) Work content 1: Plasma display panel [42 inch diagonal size, ground take-out part is provided around display part, and screw hole (size M5, The distance from the end of each display portion is 5 mm. Is prepared. Attach the optical filter to the display part of the plasma display. In the outer peripheral portion of the optical filter, the screw hole formed in advance is entirely covered with the optical filter. Screw the screw holes so that they pass through the optical filter. Work 2: Plasma display panel [42 inch diagonal,
A ground take-out portion is formed in a plane around the display portion. Is prepared. Attach the optical filter to the display part of the plasma display. The copper foil tape portion attached to the outer peripheral portion of the optical filter is brought into contact with the ground take-out portion.

(Example 1) to (Example 16) Preparations 1 to 3 and operations 1 to 9 are sequentially performed.

If a plurality of work contents are listed in each work process, one work content is selected and executed. In each example, the selected transparent conductive film, the method for forming the sealing portion, the material for forming the sealing portion, and the content of the operation selected in each operation are listed in (Table 1) and (Table 2).

In Examples 1 to 16, the transparent conductive film is used as the final form. In the roll state of the created one,
High temperature and high humidity treatment. Conditions are temperature 60 °, humidity 90%,
100 hours.

While unrolling the roll, it is checked whether or not a white dot-like defect having a diameter of 0.1 mm or more occurs at the end of the film. If it occurs, it will be rejected, otherwise it will be passed.

(Comparative Example 1) Except that no sealing portion was formed,
This is performed in the same manner as in the second embodiment. The selected transparent conductive film and the content of the operation selected in each operation are listed in (Table 1) and (Table 2).

(Examples 17 to 48) Preparations 1 to 3 and operations 1 to 9 are sequentially performed.

When a plurality of work contents are listed in each work process, one work content is selected and executed. In each example, the selected transparent conductive film, the method for forming the sealing portion, the material for forming the sealing portion, and the content of the operation selected in each operation are listed in (Table 1) and (Table 2).

In Examples 17 to 48, an optical filter and a display device having the same are used as final forms.

The display device provided with the optical filter was subjected to high temperature and high humidity treatment. The conditions are temperature 60 °, humidity 90%, 10
0 hours.

It was examined whether or not a white dot-like defect having a diameter of 0.1 mm or more was generated at the end of the optical filter. If it occurs, it will be rejected, otherwise it will be passed.

(Comparative Example 2) The same operation as in Example 18 was carried out except that the sealing portion was not formed. The selected transparent conductive film and the content of the operation selected in each operation are listed in (Table 1) and (Table 2).

The results of Examples 1 to 48 and Comparative Examples 1 and 2 are shown in (Table 1) and (Table 2).

Tables 1 and 2 show the film thickness at the sealing position and the evaluation results. It can be seen that the transparent conductive films and optical filters obtained in all the examples are less likely to cause white defects at the ends and pass the pass / fail evaluation as compared with the comparative examples.

[0201]

[Table 1]

[0202]

[Table 2]

[0203]

As described in detail above, according to the present invention, a transparent conductive film and an optical filter which are excellent in durability for long-term use and storage and which can suppress deterioration particularly at the edge of the transparent conductive layer are realized. it can.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view illustrating an example of a transparent conductive film.

FIG. 2 is a plan view showing an example of a transparent conductive film.

FIG. 3 is a perspective view showing an example of a transparent conductive film.

FIG. 4 is a cross-sectional view showing an example of a transparent conductive film having a sealing portion formed on an end face.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 Transparent resin layer 20 High refractive index thin film layer 30 Metal thin film layer 40 Transparent conductive film 50 End face 60 Transparent conductive layer 70 Sealing part

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) G09F 9/00 302 G09F 9/00 313 5G323 309 H01B 13/00 503B 5G435 313 H05K 9/00 V H01B 13 / 00503 G02B 1/10 A H05K 9/00 Z (72) Inventor Toshihisa Kitagawa 580-32 Nagaura, Sodegaura-shi, Chiba Mitsui Chemicals, Inc. (72) Inventor Hiroaki Saigo 580-32 Nagaura, Sodegaura-shi, Chiba Mitsui Chemicals (72) Inventor Shin Fukuda 580-32 Nagaura, Sodegaura City, Chiba Prefecture Mitsui Chemicals Co., Ltd.F-term (reference) AA33 AB10C AB24C AB25C AH06C AK01A AK01C AK17C AK25C AK33C AK36C AK41 AK41C AK49C AK51C AK53C BA02 BA03 D B16C DB17C GB41 JG01B JG01C JN01B 5E321 BB23 BB25 BB41 BB60 GG05 GH01 5G307 FA02 FB01 FB02 FC02 5G323 BC03 5G435 AA13 AA14 BB06 DD12 GG11 GG33 HH03 HH12 KK07

Claims (25)

[Claims] 1. A transparent conductive film having a transparent conductive layer (B) formed on a polymer film (A), wherein an end face of the transparent conductive layer is shielded from outside air. Transparent conductive film. 2. The transparent conductive film according to claim 1, wherein a sealing portion for hermetically sealing the end surface is provided on an end face of the transparent conductive layer. 3. The transparent conductive film according to claim 2, wherein the sealing portion is formed of any one of an organic material, a hard coat material, a conductive material, and a fluoropolymer material. 4. The sealing portion is formed of a hard coat material, wherein the hard coat material is a material mainly containing an organic substance, a material mainly containing an organic substance and silicon, a material mainly containing silicon, and a metal. The transparent conductive film according to claim 3, wherein the transparent conductive film is made of any one of inorganic materials containing an oxide as a main component. 5. The sealing portion is formed of a hard coat material made of a material mainly composed of an organic substance, and the material mainly composed of an organic substance is a melamine resin, a urethane resin, a saturated polyester resin, an acrylate resin, a phenol resin. The transparent conductive film according to claim 4, wherein the main component is any one of a base resin, a polyimide resin, an epoxy resin, and a sulfur-containing organic compound. 6. The sealing portion is formed of a hard coat material composed of a material containing silicon as a main component, and the material containing silicon as a main component is an aminosilane, a silane coupling agent, an alkyl trialkoxysilane, a colloidal silica. 5. The transparent conductive film according to claim 4, wherein the transparent conductive film contains any one of silicon oxide and silicon oxide as a main component. 7. The sealing portion is formed of a conductive material, wherein the conductive material is silver, copper, gold, aluminum, platinum,
The transparent conductive film according to claim 3, wherein the transparent conductive film is made of any one of palladium. 8. The sealing portion is formed of a fluoropolymer material, wherein the fluoropolymer material is a polyfluorinated (PVF) resin, a polyvinylidene fluoride (PVdF) resin, a polychlorinated ethylene trifluoride (PCTFE) resin. , Polytetrafluoroethylene (PTFE) resin, tetrafluoroethylene (FEP) -6-propylenepropylene (6F) copolymer, ethylene-tetrafluoroethylene copolymer, ethylene-chlorotrifluoroethylene copolymer The transparent conductive film according to claim 3, comprising any one of a tetrafluoroethylene-perfluoroalkylvinyl ether copolymer. 9. The transparent conductive layer (B) has a thickness of 0.1 to 30 Ω /
The transparent conductive film according to claim 1, wherein the transparent conductive film has a sheet resistance value of □. 10. The transparent conductive layer (B) comprises a combination (Bt) of a high refractive index transparent thin film layer (Bt) and a metal thin film layer (Bm).
t) / (Bm) is repeated 2 to 4 times as a repeating unit, and a high refractive index transparent thin film layer (B
2. The method according to claim 1, wherein t) is laminated.
10. The transparent conductive film according to any one of claims 9 to 9. 11. The main component of at least one of the plurality of high-refractive-index transparent thin film layers (Bt) is an oxide of indium or zinc or an oxide of indium and tin. 11. The transparent conductive film according to 10. 12. The transparent conductive film according to claim 10, wherein at least one of the metal thin film layers (Bm) is made of silver or a silver alloy. 13. An optical filter using the transparent conductive film according to claim 1. 14. A transparent adhesive layer (C) for bonding to a display viewing surface.
4. The optical filter according to 3. 15. Having a functional transparent layer (E) having an antireflection function and / or an antiglare function, a transparent adhesive layer (C), a polymer film (A), a transparent conductive layer (B), and a functional layer. The transparent layer (E) is C / A / B / E or C / B / E from the display viewing surface side to the outside air side.
The optical filter according to claim 14, wherein the filters are arranged in the order of A / E. 16. The optical filter according to claim 13, further comprising an electrode electrically connected to the transparent conductive layer (B). 17. The optical filter according to claim 16, wherein the electrodes are formed continuously along the periphery of the filter. 18. The optical filter according to claim 16, wherein the transparent conductive layer (B) is partially exposed at a portion other than the periphery of the filter, and an electrode is provided on the exposed portion. 19. The optical filter according to claim 16, wherein a planar shape of the filter is rectangular, and electrodes are provided around two opposing peripheral portions. 20. The method according to claim 1, wherein any one of the transparent adhesive layer (C), the polymer film (A), the transparent conductive layer (B) and the functional transparent layer (E) contains a dye. Item 16. The optical filter according to Item 15, 21. The dye according to claim 1, wherein the light wavelength is 570 to 605 n.
3. An absorption maximum in a range of m.
The optical filter according to 0. 22. A method for producing a transparent conductive film in which a transparent conductive layer (B) is formed on a polymer film (A), comprising the steps of: forming a transparent conductive film into a roll; Forming a sealing portion on an end surface of the transparent conductive film. 23. A method for producing a transparent conductive film having a transparent conductive layer (B) formed on a polymer film (A), wherein the transparent conductive film is rolled from a first roll to a second roll by a roll-to-roll method. A method for producing a transparent conductive film, comprising: a step of sending to two rolls; and a step of forming a sealing portion on an end face between the first roll and the second roll. 24. The method of forming a sealing portion on an end face, wherein a method of dipping the end face in a coating liquid, a method of applying a coating liquid on the end face, or a vacuum film forming method is used. 25. The method for producing a transparent conductive film according to 23 or 24. 25. A plasma display device comprising: a plasma display for displaying an image; and an optical filter according to claim 13 provided on a display viewing surface.