JP2001353810A - Transparent laminate and filter for plasma display panel - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a transparent laminate which is of a comparatively simpler structure and satisfies electromagnetic wave shielding properties near infrared rays cutting properties, permeability to visible light, low visible light reflecting properties, resistance to surface marring, resistance to heat and moisture keeping quality and the like which are requirements for a PDP filter and shows a color such as neutral gray or neutral blue without the use of an absorbing material such as dye. SOLUTION: A transparent substrate 10, metal thin films (1A, 2A, 3A and 4A), each having a thickness of 1-30 nm and transparent thin films (1B, 2B, 3B and 4B), each having a thickness of 10-150 nm, are alternately laminated, these thin films being joined to the surface of the transparent substrate 10 to form a transparent laminar block 200. At least one of the metal thin films (1A, 2A, 3A and 4A) in the transparent laminar block 200 is not of a continuous film structure and thus the transparent laminar block 200 makes up the transparent laminate.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent laminate, a plasma display panel (hereinafter, referred to as PDP) filter using the transparent laminate, a front panel for a PDP using the filter, and a PDP display device. It is about.

[0002]

2. Description of the Related Art In recent years, PDPs have been developed as thin, lightweight and large-screen displays that can replace conventional display devices such as televisions and displays using cold cathode tubes. PDP is a rare gas sealed in the panel,
In particular, a discharge is generated in a gas mainly composed of neon, and the R, G, B phosphors provided in the cells inside the panel are generated by the vacuum ultraviolet rays generated at that time. In this light emission process, electromagnetic waves and near infrared rays unnecessary for the operation of the PDP are simultaneously emitted.

[0003] As for electromagnetic waves, radiated electromagnetic waves are regulated by VCCl, FCC, and the like. In addition, there is a concern that harmful effects on the human body have been raised in recent years. Near infrared
With a wavelength of 800 to 1,200 nm, the light receiving element of an infrared sensor used in a remote control device such as home appliances, karaoke equipment, and audio-visual equipment has a light receiving element of about 700 to
Since many devices have a peak of the light receiving sensitivity at 1,300 nm, there is a problem that this control device malfunctions.
After all it is necessary to cut.

From such a background, various filters for cutting electromagnetic waves and near-infrared rays generated from a PDP have been studied. Conventionally, for example, an acrylic plate in which a metal mesh is embedded or an etching mesh is processed; Electromagnetic / near-infrared cut-molded plates having a dye that absorbs near-infrared light added to the plate have been used. However, although a low surface resistance value can be easily obtained with these mesh types, there are problems such as blurring of an image due to a moire phenomenon generated between a pixel pitch and a conductive mesh, and heat resistance and light resistance of a near infrared absorbing dye. Further, in order to increase the near-infrared cut ratio, it is necessary to increase the amount of the near-infrared absorbing dye to be added. However, the disadvantages of a decrease in visible light transmittance and coloring have been avoided.

As another method for cutting electromagnetic waves and near infrared rays, for example, a transparent laminate having a structure in which a metal thin film is sandwiched between transparent dielectric thin films has been studied. This transparent laminate can utilize the infrared reflection characteristics of the metal thin film,
The function of preventing reflection of visible light on the metal surface can be imparted by the transparent dielectric thin film. For this reason, it is used for transparent thermal insulation for solar cells that transmits visible light but reflects heat rays, greenhouses for agriculture, window materials for construction, and food cases, etc. Since it is transparent and has high conductivity, it is also used for electrodes for liquid crystal displays, electrodes for electroluminescent materials, electromagnetic shield films, antistatic films, and the like.

[0006] Application of such a transparent laminate to a PDP filter has been studied. Unlike other displays, PDPs generate strong electromagnetic waves and near-infrared rays, so that the higher the performance of cutting them, the better.
At the same time, since the filter is a display filter, the optical performance with respect to the visible light transmittance, the low visible light reflectivity, and the color of the filter is also important. In particular, with respect to the color of the filter, it is preferable that the filter be a new tolral grey or a new tolable bull.

However, if the material and thickness of each layer in the above transparent laminate are selected so as to satisfy the electromagnetic shielding property, near infrared cut property, visible light transmittance, visible light low reflectivity and the like, generally, However, it does not have the color of New-Tralgre and New-Tralbull, and tends to be a green filter. For this reason, it has been necessary to adjust the color by dispersing a dye or dye that absorbs light in a specific wavelength range in a transparent substrate for forming a thin film such as a metal thin film. However, the above-mentioned pigments and dyes generally have poor durability, and in order to adjust a desired color, it is necessary to add a plurality of absorbing materials with their addition amounts delicately adjusted. The technique of dispersing the material is not always easy, and there is a problem that an extra manufacturing process is required.

[0008] In addition to the above optical characteristics, a filter for a PDP is required to have surface scratch resistance and wet heat storage resistance. The transparent laminate described above sufficiently satisfies these characteristics. At present, nothing has been obtained.

In recent years, the development of PDPs has progressed, and their performance has reached a level that does not hinder practical use. However, PDPs are more expensive than conventional displays such as cathode ray tubes.
This is a drawback of DP, and further development is underway to reduce costs. Against this background, demands for lower cost filters for PDPs have been increasing year by year, and the electromagnetic shielding, near-infrared cut, visible light transmittance, visible light low reflectivity, color tone, etc. There is an urgent need for a PDP filter that satisfies various characteristics such as weather resistance and environmental resistance with a relatively simple structure that can contribute to cost reduction.

[0010]

SUMMARY OF THE INVENTION In view of such circumstances, the present invention has a relatively simple structure, and is capable of shielding electromagnetic waves, near-infrared light, and visible light required for a PDP filter. Satisfies various properties such as low reflectivity of visible light, color tone, surface scratch resistance, and heat and moisture storage stability.Especially with regard to color tone, there is little wavelength dependence of transmittance in the visible light region,
Without using an absorbent such as a dye, a transparent laminate exhibiting the color of Neutralugre or Neutralubl-
It is an object of the present invention to provide a PDP filter, a PDP front panel, and a PDP display device which are excellent in visibility, lightweight and thin using the same.

[0011]

In a transparent laminate, a metal thin film or a transparent thin film is formed by a vacuum drive process, but a metal thin film having a thickness of several to several tens nm is formed in a continuous film structure by the growth process. It has an island-like structure. The growth process is affected by the substrate temperature during film formation, the film formation rate, the wettability between the substrate material and the metal thin film, the film formation method, and the like. For example, when the substrate temperature is high, agglomeration inside the thin film easily occurs, and it is difficult to form a continuous film structure even with a relatively large film thickness.
When the deposition rate is high, the deposition of metal atoms due to agglomeration inside the thin film is fast, so that a continuous film structure can be easily formed even with a relatively small thickness. In addition, even when the wettability between the base material and the metal is good, it is easy to form a continuous film structure with a relatively small film thickness (“thin film”, Kanbara et al., Published by Shokabo, 1979).
Year).

It is known that an abnormal light absorption called surface plasma resonance absorption occurs when a metal thin film has an island structure ("Thin Film Handbook", written by Haoka, published by Ohmsha, 1983). In particular, in a silver-based thin film, visible light transmittance in a certain wavelength region is greatly reduced due to surface plasma resonance absorption, and light absorption has a maximum value at a certain wavelength. The wavelength giving the maximum value varies depending on the volume fraction occupied by the metal particles in the thin film, the ratio of the major axis to the minor axis when the island-like particles are regarded as a spheroid, and the like.

In general, when a thin film has a complete island structure, theoretically, the maximum value of light absorption is 500 nm.
It appears near and shows large light absorption. On the other hand, as amorphous island-shaped particles are connected to each other and gradually shift to a continuous film structure (that is, the volume fraction occupied by metal particles, the ratio of the major axis to the minor axis when considered as a spheroid increases) ), The wavelength showing the maximum value shifts to the longer wavelength side, and the absorption itself also decreases. Of course, when it can be regarded as a complete continuous film structure, light absorption due to surface plasma resonance absorption does not occur. Also, when the metal thin film has an island structure,
Although the electrical conductivity in the film direction is remarkably reduced, the electrical conductivity is smaller than that of a continuous film if a structure in which island-shaped particles are connected to some extent is adopted.

Based on such knowledge, the present inventors controlled the surface morphology in a structure in which a transparent layered block formed by repeatedly laminating a metal thin film and a transparent thin film was joined to the surface of a transparent substrate. When a metal thin film has light absorption in a certain wavelength range caused by surface plasma resonance absorption,
It has been found that the color tone of the transparent laminate can be set to a neutral gray (or blue) color tone without using an absorbing material such as a dye.

Further, the transparent laminate maintains a sufficiently high value as the transmittance in the entire visible light range, and has the above-described simple structure, and is capable of shielding electromagnetic waves and near infrared rays required for a PDP filter. , Visible light transmittance, visible light low reflectivity, surface abrasion resistance and wet heat storage stability, etc., can all be satisfied, and by using this transparent laminate, each of the above characteristics is provided. , Good visibility,
The inventors have learned that a lightweight and thin PDP filter can be obtained, and have completed the present invention.

That is, the present invention provides a transparent substrate,
A transparent thin film having a thickness of 10 to 150 nm and a transparent thin film having a thickness of 10 to 150 nm, which are repeatedly laminated and bonded to the surface of the transparent substrate; and at least one of the metal thin films in the transparent layered block. Is not a continuous film structure. In particular, the present invention comprises a combination of a metal thin film and a transparent thin film as one unit to constitute a transparent layered block with four units, a visible light transmittance of 50% or more, and a surface resistance of the conductive surface of 3Ω / □ or less. , 800-1 and 2,
The light transmittance in the wavelength range of 00 nm is 20% or less;
An object of the present invention is to provide a transparent laminate having the above-described configuration in which only a metal thin film adjacent to a transparent substrate does not have a continuous film structure.

The thickness of each layer constituting the transparent laminate,
In other words, the thickness of a metal thin film or a transparent thin film provided on the surface of the transparent substrate is measured by a stylus-type film thickness measuring device or the like by measuring the thickness of a sample formed as a thick film for a long time under the same conditions,
The film formation time is calculated from the film thickness, and indicates a thickness (mass film thickness) set to a predetermined film thickness.

The above-mentioned "not a continuous film structure" means that
When the surface or cross section of the metal thin film is observed with a transmission electron microscope, a scanning electron microscope, or the like, it has an island-like structure,
Alternatively, the irregular island-shaped particles are connected to each other to partially form a network structure, or the network structure is further grown and the gaps are smaller than those of the metal portion. Therefore, even if the electric conductivity in the film direction is almost the same as that of the continuous film structure, it is not regarded as a continuous film structure.

Further, the present invention provides an antireflection layer and / or an antireflection layer on the back surface of the transparent substrate in the transparent laminate having the above-mentioned structure, and an electrode is formed around the surface of the transparent layered block. By providing a transparent adhesive layer on the surface of the transparent layered block avoiding the above, or by providing a transparent adhesive layer on the back surface of the transparent substrate in the transparent laminate having the above structure, and forming an electrode around the surface of the transparent layered block. By providing an antireflection layer and / or an antireflection layer or another transparent protective layer on the surface of the transparent layered block avoiding this electrode, electromagnetic wave shielding, near-infrared cut, visible light transmission can be achieved. The present invention can provide a filter for PDP having excellent properties such as low reflectivity of visible light, surface scratch resistance, and heat and moisture storage stability.

Furthermore, the present invention provides a method for producing
By joining the PDP filter having the above configuration with the transparent adhesive layer on the back surface thereof, a PDP front plate can be formed. Also, by providing this front plate on the front side of the PDP via an air layer, , PDP display device. In addition, by joining the PDP filter having the above configuration to the front display glass portion of the PDP with the transparent adhesive layer, the performance of the PDP filter is sufficiently utilized, and the double reflection by the air layer is eliminated. It is possible to provide a PDP display device that utilizes the inherent characteristics of a PDP, such as improved visibility, thinness and light weight. Further, the present invention provides a PDP display device in which the electromagnetic wave shielding property is further enhanced by electrically connecting the PDP housing and the electrode of the PDP filter in both the PDP display devices. be able to.

[0021]

Embodiments of the present invention will be described below with reference to the drawings. In FIG. 1, a transparent laminate 1
00 denotes a transparent substrate 10, a metal thin film (1A, 2A, 3A, 4A) having a thickness of 1 to 30 nm and a thickness of 10 to 150
a transparent thin film (1B, 2B, 3B, 4B) is repeatedly laminated and provided with a transparent layered block 200 bonded to the surface of the transparent substrate 10. At least one of the metal thin films in the transparent layered block is provided. It is not a continuous film structure.

The mode of the metal thin film and the transparent thin film is as follows.
A configuration of a transparent thin film, a transparent thin film / a metal thin film / a transparent thin film, a metal thin film / a transparent thin film / a metal thin film, or a configuration in which these are further repeated. These metal thin films (1A, 2A, 3A, 4A) and transparent thin films (1B, 2A)
B, 3B, 4B) may be all the same material or different materials. Further, for example, one layer may be formed by laminating two or more kinds of materials.

In the present invention, it is important that at least one of the metal thin films (1A, 2A, 3A, 4A) in the transparent layered block 200 does not have a continuous film structure. The metal thin film having no continuous film structure may be formed in any part of the transparent layered block 200, and the degree of the island film structure is not particularly limited. However, if the island-shaped particles are isolated, large light absorption occurs due to surface plasma resonance absorption, and the transmittance of the transparent laminate 100 may be significantly reduced. The gist of the present invention is to adjust the color tone of the transparent laminate 100 using the surface plasma resonance absorption. Therefore, the island-like structure or the irregular-shaped island-like particles are connected to each other to form a partial network structure, and further, the network structure grows, and the gap is smaller than that of the metal part. It is preferably a structure.

When the structure of the metal thin film (1A, 2A, 3A, 4A) is controlled in this way, the electric conductivity in the film direction can be maintained at a sufficiently high level, which is preferable from the viewpoint of electromagnetic shielding.
As described above, as the structure of the metal thin film (1A, 2A, 3A, 4A) approaches the network structure, the maximum value of the surface plasma resonance absorption appears on the long wavelength side, that is, in the visible light wavelength region of the red region. Light absorption is not so large in producing the transparent laminate 100. For this reason,
The same effect can be obtained as in the case where a dye that exquisitely absorbs light in the red region is dispersed in, for example, the transparent substrate 10.

In order to make the color of the transparent laminate 100 neutral, it is effective to lower the transmittance in the red region with respect to the transmittance in the blue region. Even if the thickness of each layer is designed so as to increase the reflectance in the red region and reduce the transmittance by optical design, it is possible to make the color tone neutral, but the reflection color becomes red and the filter for PDP is used. And visibility deteriorates due to an increase in reflection of external light. On the other hand, in the present invention, the color tone can be made neutral without using an absorbing material such as a dye and without increasing the reflection of red color.

The order of lamination of the metal thin films (1A, 2A, 3A, 4A) and the transparent thin films (1B, 2B, 3B, 4B), the number of repetitions, the respective film thicknesses, etc. are set so that desired optical characteristics can be obtained. What is necessary is just to design using optical thin film design software etc., and it is not specifically limited. When performing optical design, the refractive index and the absorbance of each film, that is, the wavelength dependence of the optical constant is required. At this time, a value obtained by measuring the wavelength dependence of the optical constant with a spectroscopic ellipsometer or the like using a sample formed on a glass substrate, for example, under the same conditions and under the same conditions as when forming the transparent layered block 200 is used. do it.

In producing such a sample, the thickness of each film is measured by measuring the thickness of a sample formed into a thick film for a long time under the same conditions using a stylus-type film thickness measuring instrument or the like. The film formation time may be calculated from the thickness and set to a predetermined film thickness (mass film thickness). In addition, metal thin films (1A, 2A, 3A,
If 4A) is not a continuous film structure, the measurement of optical constants is not easy, so a continuous film is prepared using the same metal material,
Based on the optical data obtained from the optical data, an optical design is performed, and the tendency of the difference between the calculated value and the actually measured value is experimentally grasped to obtain a transparent laminate 100 having desired optical characteristics. Can be made.

As the transparent substrate 10 in the present invention, any material having transparency in the visible light region and having a somewhat smooth surface may be used. For example, polymer films such as polyethylene terephthalate, triacetyl cellulose, polyethylene naphthalate, polyether sulfone, polycarbonate, polyacrylate, polyether ether ketone, polypropylene, polystyrene, polyimide, etc. Are preferred, but not limited thereto. The thickness is not particularly limited as long as there is no problem such as wrinkles in the drive process, but it is usually preferably 10 to 250 μm.

A hard coat layer may be provided on one or both sides of the transparent substrate 10. Hard coat material is
An ultraviolet curing type or a thermosetting type may be used. UV-curable types include ester, acrylic, urethane,
Examples thereof include amide-based, silicone-based, epoxy-based, acrylic-urethane-based, acrylic-epoxy-based monomers and oligomers, and photopolymerization initiators.
The thermosetting type includes resins such as phenolic, urea, melamine, unsaturated polyester, polyurethane, and epoxy resins, if necessary, with a crosslinking agent, polymerization initiator, polymerization accelerator, solvent, and viscosity. Those containing a regulator and the like are included. The thickness of the hard coat layer is suitably from 1 to 10 μm, and more preferably from 2 to 7 μm.

The surface of the transparent substrate 10 is subjected to an etching treatment such as a sputtering treatment or a corona treatment,
It may be formed with an easy-adhesion layer for improving the adhesion between the transparent layered block 200 and the transparent substrate 10.

The metal thin film (1A, 2A, 3
The material of A, 4A) is composed of 80% by weight or more of silver and at least one element selected from gold, copper, palladium, platinum, manganese, and cadmium, but is not particularly limited. From the viewpoint of optical transparency, electrical conductivity, and deterioration resistance, a material in which 90 to 99% by weight of silver and 1 to 10% by weight of the above metal are dissolved is preferable. In particular, a solid solution of 1 to 10% by weight of gold in silver is preferable from the viewpoint of preventing deterioration of silver. If gold is added in excess of 10% by weight, transparency tends to be impaired due to coloring, and if it is less than 1% by weight, silver is likely to deteriorate.

Means for forming the metal thin films (1A, 2A, 3A, 4A) include a sputtering method, a vacuum evaporation method,
A vacuum drive process such as an ion plating method is used. In particular, the sputtering method can be suitably used because not only the film thickness can be easily controlled, but also the uniformity in the width direction can be easily obtained. Metal thin film thickness is 1-30n
m, particularly preferably 5 to 20 nm. The thickness of each layer does not need to be particularly equal, but may be a value calculated by optical design.

The structure of the metal thin film is affected by the substrate temperature during film formation, the film forming speed, the wettability between the substrate material and the metal thin film, the film forming method, and the like. Above all, in order to control the structure of the metal thin film, a method of adjusting the substrate temperature and the film forming rate is simple, has good reproducibility, and can be suitably used. For example, in the case of a continuous film structure, a substrate having a continuous film structure can be formed even at a thin metal thin film of several to several tens nm by forming a film at a relatively high film formation rate while maintaining the substrate temperature at room temperature or lower. Can be formed.

In order to form a metal thin film which is not a continuous film structure and which is important for the present invention, it is only necessary to maintain a substrate temperature at room temperature or higher and to form a film at a relatively low film forming rate. When forming a film by roll-to-roll, the temperature of the substrate can be controlled by applying a tension to the main roll, which is adjusted by flowing a heating medium into the transparent substrate, by applying tension thereto. Further, the film formation rate can be controlled by adjusting the power applied to the target in the case of the sputtering method. Since these structures change remarkably depending on the film thickness, the changes in the surface morphology, optical characteristics, and surface resistance of the metal thin film with respect to the film forming conditions such as the substrate temperature, film forming rate, and film thickness must be experimentally sufficient. It is better to check.

As another method, for example, in the sputtering method, the gas pressure during film formation, the type of gas, the distance from the target to the substrate, and the like may be controlled, but what is important is the present invention. There is no particular limitation on the method because the method is to separate the non-continuous film structure from the continuous film structure.

The transparent thin film (1B, 2B, 3) of the present invention
As the materials B and 4B), any material having optical transparency can be widely used. In the optical design, the refractive index of the film should be selected so as to easily achieve the desired optical characteristics.
The material and the refractive index of each film may be different. Further, a single material or a material obtained by sintering a plurality of materials may be used. Further, a material having a migration preventing effect on the metal thin film (1A, 2A, 3A, 4A) and a barrier effect of water and oxygen is more preferable.

Preferred materials include indium oxide, tin oxide, titanium dioxide, cerium oxide, zirconium oxide, zinc oxide, tantalum oxide, niobate pentoxide, silicon dioxide, silicon nitride, aluminum oxide, magnesium fluoride, and magnesium oxide. At least one compound selected from the group consisting of: In particular, those containing indium oxide as a main component and a small amount of titanium dioxide, tin oxide, and cerium oxide not only have an effect of preventing the deterioration of the metal thin film, but also have an electrical conductivity, and thus have an electrical connection with the metal thin film. This is preferable in that conduction can be easily achieved. These transparent thin films can be formed by using a vacuum drying process such as a sputtering method, a vacuum evaporation method, or an ion plating method, or a wet method. From the viewpoint of controllability of film thickness and uniformity, a sputtering method is particularly preferable. . The thickness of the transparent thin film is 10 to 150 nm, particularly preferably 40 to 150 nm.
The thickness is preferably 90 nm. The thickness of each layer does not need to be particularly equal, but may be a value calculated by optical design.

The transparent laminate 100 shown in FIG. 1 is a particularly preferred embodiment of the transparent laminate of the present invention.
On the surface of the sample, the combination of the metal thin film / the transparent thin film is defined as one unit, and four units (1A, 1B), (2A, 2B), (3
A, 3B) and (4A, 4B) are repeatedly bonded to form a transparent layered block 200 having a visible light transmittance of 5%.
0% or more, surface resistance of the conductive surface is 3Ω / □ or less, 800 to
20% light transmittance in the 1,200 nm wavelength range
(= The light cut rate in the above wavelength range, that is, the near-infrared cut rate is 80% or more).
Only the metal thin film 1A adjacent to 0 is formed so as not to have a continuous film structure. That is, the metal thin film 1A adjacent to the transparent substrate 10 is formed under different film forming conditions from those of the other metal thin films 2A, 3A, and 4A, and is formed so as not to have a continuous film structure.

The metal thin film 1A appropriately absorbs light in the red region due to light absorption caused by surface plasma resonance absorption, and acts so that the tint of the transparent laminate exhibits a neutral bleed. It also has the function of improving the adhesion between the metal film and the metal thin film, and improving the electromagnetic wave shielding property and near-infrared cut property with the increase of the metal thin film. In addition, in the case of optical design, there is an advantage that as the number of layers increases, the degree of freedom increases, and a configuration having desired characteristics can be easily designed. As described above, the thickness of each film may be determined using optical design software or the like so as to obtain desired characteristics.

In the present invention, the transparent laminate described above is
When used as a filter for P, it is not preferable to use the transparent laminate directly, because the metal thin film may be deteriorated by external moisture or salt contained in fingerprints. Further, in order to prevent reflection of external light and provide a PDP filter with good visibility, it is preferable to provide an antireflection layer and / or a reflection prevention layer on the outermost layer. Further, in order to improve the shielding property of the electromagnetic wave, it is preferable to provide an electrode for electrically connecting the conductive surface of the transparent laminate and the casing of the PDP to the peripheral portion of the surface, which is a non-display portion.

FIG. 2 shows the transparent laminate 100 shown in FIG.
1 shows an embodiment that can be suitably used as a PDP filter. That is, this PDP filter 3
00 is the back surface of the transparent substrate 10 (the transparent layered block 200).
On the side where no is formed), an anti-reflection layer and / or an anti-glare layer 20 is provided, and electrodes 30 are formed on the periphery of the surface of the transparent layered block 200, for example, on four sides to avoid the electrodes 30. That is, the transparent adhesive layer 40 is provided on the surface of the transparent layered block 200 so as not to cover the electrode 30.

The anti-reflection layer 20 is for reducing surface reflection of the transparent substrate 10 and has a reflectance of 2% or less on the surface.
It is preferable to exhibit a performance of preferably 1% or less, more preferably 0.5% or less. A material having a value close to the square root of the refractive index of the transparent substrate 10 has a one-layer structure with an optical film thickness corresponding to １ ／ wavelength, and a material in which a plurality of thin films having different refractive indexes are laminated. The one-layer structure has a simple configuration and is easy to manufacture, but is inferior in antireflection performance as compared with a multilayer structure. Materials for the antireflection layer 20 include metal oxides, fluorides, silicides, nitrides, sulfides, borides,
Inorganic compounds such as carbides, and organic compounds such as silicon-based resins, acrylic resins, and fluorine-based resins are used. The antireflection layer 20 can be formed by a sputtering method, a vacuum deposition method, an ion plating method, a wet coating method, or the like. The configuration, material, and manufacturing method of the antireflection layer 20 are not particularly limited, and the antireflection layer 20 can be formed by a known technique as long as the reflectance of the transparent substrate 10 can be reduced.

In the configuration in which the anti-reflection layer 20 is the outermost surface, it is desirable that the anti-reflection layer 20 has surface scratch resistance and stain resistance. Antireflection layer 2 of transparent substrate 10
If the above-mentioned hard coat layer is formed on the surface where 0 is formed, the surface scratch resistance and pencil hardness are improved. Further, a contamination prevention layer may be formed on the surface of the antireflection layer 20. Examples of the material of the anti-staining layer include a cured product composed of an organic polysiloxane-based polymer, a perfluoroalkyl-containing polymer, an alkoxysilane compound having a perfluoroalkyl group, and a reactivity with a perfluoropolyether group. Compounds having a silyl group, mono- and disilane compounds containing a polyfluoroalkyl group, and the like can be mentioned. The thickness of the contamination prevention layer is preferably 0.001 to 0.5 μm, and particularly preferably 0.002 to 0.1 μm. The contamination prevention layer may be formed by wet coating or a dry process such as vacuum deposition.

The antireflection layer 20 has a thickness of 0.1 to 1
A layer having transparency of visible light having a surface state of minute irregularities of about 0 μm and having antiglare properties can be suitably used. Specifically, silica, melamine, acrylic or other inorganic or organic compound particles dispersed in a thermosetting or ultraviolet curable resin such as an acrylic resin, a silicone resin, a melamine resin, or a urethane resin. Can be formed by coating and curing.

The anti-reflection layer and / or the anti-glare layer 20 can be formed directly on the transparent substrate 10 as described above, or can be formed on the transparent film substrate in the same manner as described above. It is also possible to use a functional film on which the anti-penetration layer 20 is formed, and to bond this to the transparent substrate 10 via the transparent adhesive layer. The method of directly forming the film on the transparent substrate 10 as in the former method does not require the steps of manufacturing and laminating the film as compared with the latter method using a functional film, thereby reducing the manufacturing cost and improving the yield. Is more preferable.

The PDP filter 3 thus configured
The transparent substrate 10 and the anti-reflection layer and / or the anti-glare layer 20 provided on the back surface of the transparent substrate 10
The metal thin film (1A, 2A)
A, 3A, and 4A) are effectively prevented. In manufacturing such a PDP filter 300,
After forming the anti-reflection layer and / or the anti-glare layer 20 on the back surface of the transparent substrate 10, a transparent layered block 200 or the like can be formed on the surface of the transparent substrate 10 or in the reverse order. . Antireflection layer and / or
In the case where the reflection preventing layer 20 is directly formed by a wet coating method, the production speed is high, but the yield is generally low. Therefore, it is more preferable to form the reflection prevention layer 20 in the former order.

The transparent adhesive layer 40 is made of a base polymer such as acrylic polymer, silicone polymer, polyester, polyurethane, polyether, synthetic rubber, polyamide, polyolefin, ethylene-vinyl acetate copolymer and the like. -A transparent adhesive is preferably used. In addition to this adhesive, an appropriate adhesive such as a hot melt adhesive can also be used. In short, what is necessary is just to be excellent in transparency and durability. The thickness of the transparent adhesive layer 40 may be appropriately determined, but is preferably 2 to 200 μm, more preferably 5 to 100 μm.

The material used for the electrode 30 may be any material as long as it is conductive, has good corrosion resistance, good moisture and heat storage stability, and has good adhesion to the transparent layered block 200.
There are no particular restrictions. Specifically, in addition to silver paste,
One metal or two or more alloys of gold, silver, copper, platinum, palladium, etc., an organic coating agent mixed with the same metal or alloy as described above, and a copper mesh impregnated with an adhesive And the like, and a conductive double-sided tape produced by such a method. As a method of forming the electrode 30, in the case of a conductive double-sided tape, the electrode 30 may be directly bonded to four sides of the surface periphery of the transparent layered block 200, and in the case of silver paste, various alloy materials, alloy mixed materials, and the like. A known method such as a wet process formed by screen printing or microgravure coating, a vacuum process, a dry process such as a sputtering, and a plating process can be used. Although the thickness of the electrode 30 is not particularly limited, it is generally desirable that the thickness be 10 to 100 μm.

FIG. 3 shows the transparent laminate 100 shown in FIG.
This shows another embodiment that can be suitably used as a PDP filter. This PDP filter 300
Is to form a transparent adhesive layer 40 on the back surface of the transparent substrate 10 and form electrodes 30 on the periphery of the surface of the transparent layered block 200, for example, on four sides, and avoid the electrodes 30 on the surface of the transparent layered block 200. A functional film 20 a having an anti-reflection layer and / or an anti-glare layer or another transparent protective layer formed on a transparent film substrate is bonded via a transparent adhesive layer 40.

Here, the electrode 30 and the transparent adhesive layer 40 are
The same one as described in FIG. 2 is used. The functional film 20a refers to a transparent substrate 1 as a transparent film substrate.
The same anti-reflection layer and / or reflection as described with reference to FIG. 2 is formed on this film substrate by using the same material as that described in FIG. 0, for example, an optically transparent material such as polyethylene terephthalate. This is one in which a prevention layer is formed. The above-described anti-reflection layer and / or anti-glare layer has not only an original function of anti-reflection and anti-glare but also a function as a protective layer of the transparent layered block 200. For the purpose of imparting only the function as this protective layer, as the functional film 20a, a film obtained by forming a transparent protective layer other than the antireflection layer and the antireflection layer on the same film base as described above may be used. . In addition, such a functional film 20
Instead of a, the above-described antireflection layer and / or antireflection layer or another transparent protective layer may be provided directly on the surface of the transparent layered block 200 by a coating method or the like.

FIG. 4 shows that the PDP filter 300 shown in FIG. 3 is bonded to the front surface of the transparent molded body 50 by the transparent adhesive layer 40 provided on the back surface of the transparent substrate 10.
The front plate 400 is used. The PDP front panel 400 is provided as a PDP display device by being disposed on the front side of the PDP via an air layer at an appropriate interval. In the above arrangement, the transparent molded body 50 side may be located on the PDP side, and conversely, the PDP filter 300 side, that is, the functional film 20 which is the outermost surface thereof.
The a side may be located on the PDP side.

The material of the transparent molded body 50 may be any material that satisfies mechanical strength, resistance to cracking, lightness, and transparency to a certain extent. Specific examples include glass, acrylic resin such as polymethyl methacrylate, and polycarbonate. -Bone resin, transparent ABS
Resin or the like is used. The thickness is usually preferably about 1 to 10 mm. In the same manner as described above, an anti-reflection layer and / or an anti-glare layer is directly formed on the surface of the transparent molded body 50, or the functional film on which each of the above layers is formed is bonded via a transparent adhesive layer. By these processes, reflection of external light and reflection at the interface with the PDP can be reduced, and the front panel 400 for a PDP having excellent visibility can be obtained.

In the present invention, the above-mentioned FIG.
By joining the PDP filter 300 shown in (1) to the front display glass part of the PDP with the transparent adhesive layer 40, a direct bonding type PDP display device can be obtained. At that time, in the PDP filter 300 shown in FIG.
The electrode 30 side is located on the PDP side, and in the PDP filter 300 shown in FIG.
The electrode 30 side located on the P side is exposed on the outermost surface. Such a PDP display device prevents glass from scattering,
It is possible to contribute to the weight reduction, thinning, cost reduction, etc. of the PDP itself, and it is possible to eliminate an air layer having a low refractive index as compared with the case where the PDP front plate 400 is provided. Problems such as an increase in visible light reflectance and double reflection due to interfacial reflection can be solved, and visibility can be further improved.

In the direct bonding type PDP display device, insufficient strength of the front display glass portion of the PDP may cause a problem. In order to avoid such a problem, the transparent adhesive layer 40 should be made as thick as possible. Is desirable. For the same purpose,
The front display glass part and the shock absorbing film
It may be interposed between the DP filter 300 and the DP filter 300 as an impact protection layer. These impact protective layers can be widely used as long as they have optical transparency and have an effect of absorbing and mitigating impact.

In the present invention, in such a direct-attached PDP display device or a PDP display device in which the above-described PDP front plate 400 is disposed via an air layer, etc., the periphery of the surface of the transparent layered block 200 is not provided. It is particularly desirable to electrically connect the electrode 30 formed in the portion and the housing of the PDP. Thus, the electromagnetic shielding effect of the PDP display device can be significantly improved.

[0056]

Next, the present invention will be described more specifically with reference to examples. The present invention is not limited only to the following examples. In the following, the film thickness was controlled by using a surface roughness meter (DEKTAK) to measure a sample formed into a thick film for a long time under the same film forming conditions, and to obtain a predetermined thickness from a calibration curve. Value (mass film thickness). The substrate temperature during film formation is room temperature unless otherwise specified.

Example 1 A transparent polyethylene terephthalate (hereinafter referred to as PET) film having a thickness of 125 μm was used as a transparent substrate.
On one side, a combination of a metal thin film / a transparent thin film was defined as one unit by a DC magnetron sputter method,
Units are repeatedly laminated to form a transparent layered block,
A transparent laminate was produced. In ₂ O ₃ -12.6 wt% TiO ₂ was used as a target material for forming a transparent thin film, and Ag-3 was used as a target material for forming a metal thin film.
Weight% Au was used.

The thus prepared transparent laminate was formed from the transparent substrate side with the transparent substrate (PET film) / metal thin film (6).
nm) / transparent thin film (65 nm) / metal thin film (14 nm)
/ Transparent thin film (70 nm) / metal thin film (14 nm) / transparent thin film (70 nm) / metal thin film (12 nm) / transparent thin film (35 nm). The numbers in parentheses above are
It shows the thickness of each thin film. In forming the transparent layered block, a metal thin film (6
nm) was formed at a deposition rate of 0.25 nm / sec, and other metal thin films were formed at a deposition rate of 1.5 nm / sec. The transparent thin films were all formed at a deposition rate of 2.0 nm / sec. The deposition rate was controlled by changing the power applied to the target.

Comparative Example 1 A metal thin film (6 nm) adjacent to a transparent substrate was formed at a deposition rate of 1.5 nm / sec as in the case of other metal thin films, except that the metal thin film (6 nm) was formed. A transparent layered block similar to that described above was formed to produce a transparent laminate.

Example 2 According to the same operation as in Example 1, from the transparent substrate side, the transparent substrate (PET film) / transparent thin film (35 nm) / metal thin film (13 nm) / transparent thin film (70 nm) / metal thin film (1)
3nm) / transparent thin film (70nm) / metal thin film (13n
m) / transparent thin film (35 nm) was produced. The numerical values in parentheses indicate the thickness of each thin film. In forming the transparent layered block, only the metal thin film (13 nm) closest to the transparent substrate was used.
The transparent substrate was formed at a deposition rate of 0.25 nm / sec while maintaining the temperature of the transparent substrate at 50 ° C. The temperature of the transparent substrate was controlled by circulating a warm medium through the substrate of the sputtering device. Other metal thin films were formed at a deposition rate of 1.5 nm / sec. For the transparent thin film, all were 2.0 nm
/ Sec.

Example 3 A transparent layered block similar to Example 2 except that all of the metal thin films were formed at a deposition rate of 0.5 nm / sec while maintaining the temperature of the transparent substrate at 50 ° C. Was formed to produce a transparent laminate.

Comparative Example 2 A transparent layered block was formed in the same manner as in Example 2 except that all of the metal thin films were formed at a film forming rate of 1.5 nm / sec.

Comparative Example 3 By the same operation as in Example 1, from the transparent substrate side, the transparent substrate (PET film) / transparent thin film (30 nm) / metal thin film (13 nm) / transparent thin film (60 nm) / metal thin film (1
3nm) / transparent thin film (60nm) / metal thin film (13n
m) / Transparent laminate (30 nm) was produced. The numerical values in parentheses indicate the thickness of each thin film. In forming the transparent layered block, all of the metal thin films were formed at a deposition rate of 1.5 nm / sec. For the transparent thin film, all were 2.0 nm
/ Sec.

Each of the transparent laminates of Examples 1 to 3 and Comparative Examples 1 to 3 was cut out by a focused ion beam method using gallium ion beam, and the cross section was observed by a transmission electron microscope. As a result, the metal thin film adjacent to the transparent substrate of Example 1, the metal thin film closest to the transparent substrate of Example 2, and the metal thin film of Example 3 are all partially discontinuous. Was observed. The other metal thin films were completely continuous films, and the average surface roughness was as smooth as about 2 nm.

Separately, a copper mesh 3 mmφ mesh (3
A transparent thin film having a thickness of 20 nm was formed on a grid having a carbon support film (approximately 10 nm) vapor-deposited thereon on a grid having a thickness of 20 nm. Samples on which the metal thin films were formed under the same conditions as in Comparative Examples 1 to 3 and Comparative Examples 1 to 3 were surface-observed with a transmission electron microscope. As a result, with respect to the metal thin film formed under the condition where the discontinuous portion was observed in the cross-sectional observation, it was observed that islands were connected to form a network structure.
In addition, for those that were continuous in the above cross-section observation,
No network structure was observed, and it was observed that the film grew uniformly.

Next, the surface resistance, the visible light transmittance, the visible light reflectance, the near infrared cut rate and the color tone of the transparent laminates of Examples 1 to 3 and Comparative Examples 1 to 3 were determined by the following methods. Examined. Table 1 and Table 2 show these results.
It was shown to.

<Surface Resistance>"Lorest" manufactured by Mitsubishi Yuka
er SP "and the four-point needle method (JIS K719).
According to 4), the surface resistance value (Ω / □) was measured.

<Visible Light Transmittance and Visible Light Reflectance> An instantaneous multiphotometer “MCPD-3000” manufactured by Otsuka Electronics Co., Ltd.
0 ° incident transmission and reflection spectra were measured, and from the obtained transmission and reflection spectra, JIS R-3016
The visible light transmittance and the visible light reflectance were calculated according to.

<Near-infrared cut rate>"U" manufactured by Hitachi, Ltd.
-3410 "was used to measure the cut rate of light having a wavelength in the range of 800 to 1,200 nm. In the same manner, the cut ratio of only the light having a wavelength of 850 nm was measured.

<Color Tone> The obtained transmission spectrum (wavelength 3
80 to 780 nm) based on the XYZ color system chromaticity diagram (J
Chromaticity coordinates (X, Y) calculated according to ISZ8701) were obtained. Further, the color of the transparent laminate when placed on white paper was observed.

[0071]

[0072]

As is clear from the results in Tables 1 and 2, each of the transparent laminates of Examples 1 to 3
It has the characteristics of low surface resistance required for DP filters, high visible light transmittance, low visible light reflectance, and high near-infrared cut rate. It is a gray system or a blue system, and there is no tendency that red reflection is strong compared to other wavelength regions.

On the other hand, the transparent laminates of Comparative Example 1 and Comparative Example 2 had high visible light transmittance and other characteristics equivalent to those of Examples 1 to 3, but had a greenish tint. Yes,
Neither color tone was preferable as a filter for PDP. In addition, the transparent laminate of Comparative Example 3 had a blue color because the transmittance in the red region was lower than that in the other color regions, but at the same time, the reflectance of red was high, and the reflection of external light was high. In addition to the strong intrusion, it looked red and impaired the visibility of the PDP.

These results indicate that the transparent laminates of Examples 1 to 3 are different from the transparent laminates of Comparative Examples 1 to 3,
It is based on the fact that at least one of the metal thin films does not have a continuous film structure, as is clear from the above-mentioned cross-sectional observation. That is, due to the above-mentioned unique film structure, subtle light absorption caused by surface plasma resonance absorption was exhibited, and the color tone suitable for a PDP filter could be obtained without sacrificing other characteristics. Things. In addition, even if it is not a continuous film structure, as described above, since it has a mesh-like film structure, the electric conductivity in the film direction can be kept sufficiently high, and therefore, a low surface resistance value can be obtained. It can be seen that it can be maintained.

Example 4 A hard coat layer having a thickness of 5 μm was formed on the back surface of the transparent substrate in the transparent laminate of Example 1. This hardcore
The layer is made of 100 parts by weight of an ultraviolet curable resin made of an acrylic urethane resin (“KZ788B” manufactured by JSR Corporation) and 10 parts of “KAYAMER” manufactured by Nippon Kayaku Co., Ltd.
Parts by weight and diluting with methyl isobutyl ketone to obtain a solution for a hard coat layer. This solution is coated on the back surface of the transparent substrate with a wire bar # 6 and dried at 80 ° C. ,
It is cured by irradiating it with an ultraviolet ray at an irradiation amount of 200 J / cm ² by an ultra-high pressure mercury lamp.

Next, TiO is formed on the hard coat layer.
_Two thin films were formed to a thickness of 13 nm and a SiO ₂ thin film was formed to a thickness of 110 nm to form an antireflection layer. The TiO ₂ thin film uses Ti for the target, and the SiO ₂ thin film uses Si for the target, and is pulsed in a mixed gas of argon gas and oxygen gas.
These were formed by a reactive sputtering method using a C power source. Thereafter, a perfluoroalkylsilane-based material (“KP801M” manufactured by Shin-Etsu Chemical Co., Ltd.) was applied as a pollution preventive agent on the SiO ₂ thin film to form a pollution preventive layer having a thickness of 5 nm.

Next, a silver paste (“Dotite FA-301CA” manufactured by Fujikura Kasei Co., Ltd.) was screen-printed on the periphery (four sides) of the surface of the transparent layered block in the transparent laminate. And cured at 100 ° C. for 20 minutes to form an electrode having a thickness of 25 μm. Further, on the surface of the transparent layered block, an acrylic pressure-sensitive adhesive layer having a thickness of 25 μm previously formed by coating on a PET separator was attached in a frame shape so as not to cover the electrodes, and the PDP was formed.
A filter was prepared.

Example 5 A silver paste (“Dotite FA-301CA” manufactured by Fujikura Kasei Co., Ltd.) was screened around the surface (four sides) of the transparent layered block in the transparent laminate of Example 1. Printing was performed and cured at 100 ° C. for 20 minutes to form an electrode having a thickness of 25 μm. Further, on the surface of this transparent layered block, a commercially available anti-reflection film (trade name “Realtuk 2200” manufactured by Nippon Oil & Fats Co., Ltd.) was coated with the above electrode via an acrylic pressure-sensitive adhesive layer formed in the same manner as in Example 4. It was stuck in a frame shape so as not to be. On the back surface of the transparent substrate in this transparent laminate, a thickness of 25 μm was formed in the same manner as in Example 4.
m of the acrylic pressure-sensitive adhesive layer was laminated to produce a PDP filter.

The filters for PDPs of the above Examples 4 and 5 were
Through the acrylic pressure-sensitive adhesive layer, bonded to a slide glass, to prepare a test sample, as described above,
The visible light transmittance, the visible light reflectance, the near infrared cut rate (wavelength 850 nm), and the color of the transmitted color were examined. The measurement of the visible light reflectance was performed by painting the surface of the slide glass opposite to the surface to which the filter for PDP was attached in black. Further, the test samples described above were subjected to a moist heat resistance test and a surface scratch resistance test by the following methods. These results
The results were as shown in Table 3.

<Moisture and Heat Resistance Test>
The sample was placed in a thermo-hygrostat at a relative humidity of 90% for 1,000 hours, and appearance deterioration and changes in optical characteristics were observed.

<Surface Scratch Resistance Test> A # 0000 steel wall was reciprocated 10 times under a load of 2.45 N / cm ^{2 on} the surface of the test sample, and the sample was visually inspected for the presence or absence of scratches.

[0083]

As is evident from the results in Table 3, the filters for PDPs of Examples 4 and 5 maintain the characteristics of the transparent laminate almost as they are, and furthermore, in the wet heat resistance test, such as deterioration of appearance and change of optical characteristics. No deterioration was observed, and no remarkable scratch was observed in the surface scratch resistance test. From these results, it can be seen that the processing of the transparent laminate of the present invention as in Examples 4 and 5 provides an electromagnetic wave shield.
Properties, near-infrared cut, low reflection, transparency, blue
It can be seen that moisture and heat resistance and surface abrasion resistance can be imparted without obstructing the characteristic of tint, and a PDP filter in which required characteristics and functions are integrated into one film can be obtained.

For reference, a test sample was prepared in the same manner as above for a PDP filter in which the same acrylic pressure-sensitive adhesive layer was formed on the back side of the transparent substrate in the transparent laminate of Example 1 and The same heat and moisture resistance test and surface abrasion resistance test were performed. As a result, in the wet heat resistance test, white spot-like deterioration began to occur about 100 hours after the start of the test, and scratches were also observed in the surface scratch resistance test.

Example 6 The filter for PDP of Example 5 was applied to one surface of a 3 mm-thick polymethyl methacrylate (PMMA) plate as a transparent molded product via the acrylic pressure-sensitive adhesive layer. Then, a commercially available anti-reflection film (trade name "Realtuk 2200" manufactured by Nippon Oil & Fats Co., Ltd.) was attached to the other surface of the transparent molded body via an acrylic pressure-sensitive adhesive layer to obtain a front panel for PDP. This front plate is arranged via an air layer so that the electrode forming surface side of the transparent layered block is located on the PDP side, and is fixed with a fixing jig so that the PDP housing and the entire surface of the electrode are completely in contact. , PDP display device.

Example 7 The PDP filter of Example 5 was directly bonded to the front glass display of the PDP via the acrylic pressure-sensitive adhesive layer. Also, in order to have sufficient conduction with the PDP case,
A fixing jig made of aluminum was formed, and was fixed with a fixing jig such that the entire surface of the four electrodes on the opposite side of the PDP was completely in contact with the above-mentioned housing, to obtain a PDP display device.

With respect to the PDP display devices of Examples 6 and 7, the electromagnetic shielding effect was measured in an anechoic chamber in the following manner. The results were as shown in Table 4.
Table 4 also shows the regulated value of the VCCl class A as “Control Example 1” and the radiated electric field intensity when no PDP filter is installed as “Control Example 2”.

<Electromagnetic Wave Shielding Characteristics> A 42-inch wide plasma display PDS-42 manufactured by Fujitsu General Limited
21-JH ", the PDP front panel that was conventionally attached was removed, and a PDP filter was installed in an anechoic chamber as in Examples 6 and 7 (one that was not installed in Comparative Example 2). , The electric field strength of the interfering wave
It was detected and measured with an antenna installed 10 m away from the PDP over the range of 00 MHz.

[0090]

As is clear from the results in Table 4 above, the PDP display devices of Examples 6 and 7 have a sufficient electromagnetic wave shielding effect, and are capable of sufficiently meeting the VCCl class A standard. It was confirmed that the radiation level was electromagnetic radiation. For reference, the same electromagnetic shielding effect as described above was measured on a PDP display device manufactured in the same manner as in Example 7 except that the electrode on the opposite side of the PDP and the housing were not electrically connected. As a result, an electromagnetic shielding effect was observed at a frequency of 100 MHz or more, but the radiation intensity was high in PDPs, and a problem of 30 to 100 MHz was observed.
In the low frequency range of Hz, the electromagnetic shielding effect was hardly observed.

[0092]

As described above, the present invention joins a transparent thin-film block formed by repeatedly laminating a metal thin film and a transparent thin film on the surface of a transparent substrate so that at least one metal thin film does not have a continuous film structure. By configuring,
Without using an absorbing material such as a dye, the desired color tone of a new neutral gray or a new neutral blue can be expressed with a relatively simple structure, and it is possible to achieve electromagnetic shielding, near infrared cut properties, and visible light. A transparent laminate having excellent transparency, low visible light reflectivity, surface scratch resistance, and moisture and heat storage stability, and a PDP filter, a PDP front panel, and a light and thin PDP using the same, which have good visibility, A PDP display device can be provided.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view showing one example of a transparent laminate of the present invention.

FIG. 2 is a sectional view showing an example of a PDP filter of the present invention.

FIG. 3 is a sectional view showing another example of the PDP filter of the present invention.

FIG. 4 is a cross-sectional view illustrating an example of a front panel for a PDP of the present invention.

[Explanation of symbols]

 1A, 2A, 3A, 4A Metal thin film 1B, 2B, 3B, 4B Transparent thin film 10 Transparent substrate 20 Anti-reflection layer and / or anti-glare layer 20a Functional film 30 Electrode 40 Transparent adhesive layer 50 Transparent molded article 100 Transparent laminate Body 200 Transparent layered block 300 Filter for PDP 400 Front panel for PDP

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) G09F 9/00 309 H01J 11/02 E 5G435 313 H05K 9/00 V H01J 11/02 G02B 1/10 A H05K 9/00 Z (72) Inventor Kazuhiko Miyauchi 1-1-2 Shimohozumi, Ibaraki-shi, Osaka Nitto Denko Corporation (72) Inventor Yukiko Azumi 1-1-2 Shimohozumi, Ibaraki-shi, Osaka Nitto Denko stock In-house F-term (reference) 2H048 CA01 CA05 CA12 CA19 CA24 2K009 AA02 AA15 BB13 BB14 BB24 BB28 CC03 CC06 CC14 CC24 CC26 CC33 CC34 CC35 CC42 DD04 EE00 EE03 4F100 AB01B AK42 AT00A AT00E BA05 BA08 J10CBA10D01 J02D01 JN06E YY00B 5C040 GH10 MA02 MA04 MA08 5E321 AA04 BB23 BB25 CC16 GG05 GH01 5G435 AA09 AA13 BB06 GG11 GG33 HH03

Claims (8)

[Claims] 1. A transparent substrate, comprising a metal thin film having a thickness of 1 to 30 nm and a transparent thin film having a thickness of 10 to 150 nm repeatedly laminated and joined to a transparent layered block joined to the surface of the transparent substrate, A transparent laminate, wherein at least one of the metal thin films in the transparent layered block does not have a continuous film structure. 2. The combination of a metal thin film and a transparent thin film as one
A transparent layered block is constituted by 4 units, the visible light transmittance is 50% or more, the surface resistance of the conductive surface is 3Ω / □ or less, and the light transmittance in the wavelength range of 800 to 1,200 nm is 20%. 2. The transparent laminate according to claim 1, wherein only the metal thin film adjacent to the transparent substrate does not have a continuous film structure. 3. An antireflection layer and / or an antireflection layer is provided on the back surface of the transparent substrate in the transparent laminate according to claim 1 or 2, and an electrode is formed around the surface of the transparent layered block. A filter for a plasma display panel, wherein a transparent adhesive layer is provided on the surface of a transparent layered block avoiding an electrode. 4. The transparent laminate according to claim 1 or 2, wherein a transparent adhesive layer is provided on the back surface of the transparent substrate, and an electrode is formed around the surface of the transparent layered block. A filter for a plasma display panel, wherein an anti-reflection layer and / or an anti-glare layer or another transparent protective layer is provided on the surface of a block. 5. A front panel for a plasma display panel, wherein the filter for a plasma display panel according to claim 4 is joined to a front surface of the transparent molded body by a transparent adhesive layer on a back surface thereof. 6. A plasma display panel display device, wherein the filter for a plasma display panel according to claim 3 is bonded to a front display glass portion of the plasma display panel by a transparent adhesive layer. 7. A plasma display panel display device, wherein the front panel for a plasma display panel according to claim 5 is provided on the front side of the plasma display panel via an air layer. 8. A housing for a plasma display panel,
8. The plasma display panel display device according to claim 6, wherein an electrode of the plasma display panel filter is electrically connected.