JP2002251013A5 - - Google Patents
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- Publication number
- JP2002251013A5 JP2002251013A5 JP2001048880A JP2001048880A JP2002251013A5 JP 2002251013 A5 JP2002251013 A5 JP 2002251013A5 JP 2001048880 A JP2001048880 A JP 2001048880A JP 2001048880 A JP2001048880 A JP 2001048880A JP 2002251013 A5 JP2002251013 A5 JP 2002251013A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituent
- hydrocarbon group
- alkyl group
- independently represent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001048880A JP4208422B2 (ja) | 2001-02-23 | 2001-02-23 | ポジ型レジスト組成物 |
TW91103178A TW548523B (en) | 2001-02-23 | 2002-02-22 | Positive photosensitive composition |
US10/079,414 US6858370B2 (en) | 2001-02-23 | 2002-02-22 | Positive photosensitive composition |
KR1020020009638A KR100795109B1 (ko) | 2001-02-23 | 2002-02-22 | 포지티브 감광성 조성물 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001048880A JP4208422B2 (ja) | 2001-02-23 | 2001-02-23 | ポジ型レジスト組成物 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002251013A JP2002251013A (ja) | 2002-09-06 |
JP2002251013A5 true JP2002251013A5 (zh) | 2006-01-19 |
JP4208422B2 JP4208422B2 (ja) | 2009-01-14 |
Family
ID=18910071
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001048880A Expired - Fee Related JP4208422B2 (ja) | 2001-02-23 | 2001-02-23 | ポジ型レジスト組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4208422B2 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100382960B1 (ko) | 1998-07-03 | 2003-05-09 | 닛뽕덴끼 가부시끼가이샤 | 락톤 구조를 갖는 (메트)아크릴레이트 유도체, 중합체,포토레지스트 조성물, 및 이것을 사용한 패턴 형성 방법 |
AU2003280710A1 (en) * | 2002-11-05 | 2004-06-07 | Jsr Corporation | Acrylic copolymer and radiation-sensitive resin composition |
US7279265B2 (en) * | 2003-03-27 | 2007-10-09 | Fujifilm Corporation | Positive resist composition and pattern formation method using the same |
JP6349407B2 (ja) * | 2014-09-29 | 2018-06-27 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、パターン形成方法、及び電子デバイスの製造方法 |
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2001
- 2001-02-23 JP JP2001048880A patent/JP4208422B2/ja not_active Expired - Fee Related