JP2001042533A5 - - Google Patents
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- Publication number
- JP2001042533A5 JP2001042533A5 JP1999211368A JP21136899A JP2001042533A5 JP 2001042533 A5 JP2001042533 A5 JP 2001042533A5 JP 1999211368 A JP1999211368 A JP 1999211368A JP 21136899 A JP21136899 A JP 21136899A JP 2001042533 A5 JP2001042533 A5 JP 2001042533A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- positive photoresist
- solvent
- ultraviolet exposure
- photoresist composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002904 solvent Substances 0.000 claims 9
- 229920002120 photoresistant polymer Polymers 0.000 claims 7
- 125000004432 carbon atoms Chemical group C* 0.000 claims 3
- 125000002723 alicyclic group Chemical group 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims 1
- DOVZUKKPYKRVIK-UHFFFAOYSA-N 1-methoxypropan-2-yl propanoate Chemical compound CCC(=O)OC(C)COC DOVZUKKPYKRVIK-UHFFFAOYSA-N 0.000 claims 1
- BYVKCQBOHJQWIO-UHFFFAOYSA-N 2-ethoxyethyl propanoate Chemical compound CCOCCOC(=O)CC BYVKCQBOHJQWIO-UHFFFAOYSA-N 0.000 claims 1
- LZCLXQDLBQLTDK-UHFFFAOYSA-N Ethyl lactate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 claims 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N Propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 claims 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N Propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 229940116333 ethyl lactate Drugs 0.000 claims 1
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- YEJRWHAVMIAJKC-UHFFFAOYSA-N γ-lactone 4-hydroxy-butyric acid Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21136899A JP3929648B2 (ja) | 1999-07-26 | 1999-07-26 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21136899A JP3929648B2 (ja) | 1999-07-26 | 1999-07-26 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001042533A JP2001042533A (ja) | 2001-02-16 |
| JP2001042533A5 true JP2001042533A5 (zh) | 2005-07-07 |
| JP3929648B2 JP3929648B2 (ja) | 2007-06-13 |
Family
ID=16604818
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21136899A Expired - Fee Related JP3929648B2 (ja) | 1999-07-26 | 1999-07-26 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3929648B2 (zh) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7244542B2 (en) * | 2002-05-30 | 2007-07-17 | Shipley Company, L.L.C. | Resins and photoresist compositions comprising same |
| JP2007101715A (ja) * | 2005-09-30 | 2007-04-19 | Fujifilm Corp | パターン形成方法及びそれに用いるレジスト組成物 |
| JP4954576B2 (ja) * | 2006-03-15 | 2012-06-20 | 東京応化工業株式会社 | 厚膜レジスト積層体およびその製造方法、レジストパターン形成方法 |
| JP2010102336A (ja) * | 2008-09-29 | 2010-05-06 | Fujifilm Corp | パターン形成方法 |
| JP5427436B2 (ja) * | 2009-02-26 | 2014-02-26 | 富士フイルム株式会社 | 感活性光線性または感放射線性樹脂組成物及び該組成物を用いたパターン形成方法 |
| JP5277022B2 (ja) * | 2009-02-26 | 2013-08-28 | 富士フイルム株式会社 | 感活性光線性または感放射線性樹脂組成物及び該組成物を用いたパターン形成方法 |
| JP5537829B2 (ja) * | 2009-03-31 | 2014-07-02 | 富士フイルム株式会社 | 感活性光線性または感放射線性樹脂組成物、及び該組成物を用いたパターン形成方法 |
| JP6020361B2 (ja) | 2012-06-26 | 2016-11-02 | 信越化学工業株式会社 | 高分子化合物、ポジ型レジスト材料並びにこれを用いたパターン形成方法 |
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1999
- 1999-07-26 JP JP21136899A patent/JP3929648B2/ja not_active Expired - Fee Related