JP2001142212A5 - - Google Patents

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Publication number
JP2001142212A5
JP2001142212A5 JP1999321347A JP32134799A JP2001142212A5 JP 2001142212 A5 JP2001142212 A5 JP 2001142212A5 JP 1999321347 A JP1999321347 A JP 1999321347A JP 32134799 A JP32134799 A JP 32134799A JP 2001142212 A5 JP2001142212 A5 JP 2001142212A5
Authority
JP
Japan
Prior art keywords
group
positive photoresist
alicyclic hydrocarbon
photoresist composition
composition according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999321347A
Other languages
English (en)
Japanese (ja)
Other versions
JP3948506B2 (ja
JP2001142212A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP32134799A priority Critical patent/JP3948506B2/ja
Priority claimed from JP32134799A external-priority patent/JP3948506B2/ja
Publication of JP2001142212A publication Critical patent/JP2001142212A/ja
Publication of JP2001142212A5 publication Critical patent/JP2001142212A5/ja
Application granted granted Critical
Publication of JP3948506B2 publication Critical patent/JP3948506B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP32134799A 1999-11-11 1999-11-11 ポジ型フォトレジスト組成物 Expired - Lifetime JP3948506B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32134799A JP3948506B2 (ja) 1999-11-11 1999-11-11 ポジ型フォトレジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32134799A JP3948506B2 (ja) 1999-11-11 1999-11-11 ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JP2001142212A JP2001142212A (ja) 2001-05-25
JP2001142212A5 true JP2001142212A5 (zh) 2005-07-14
JP3948506B2 JP3948506B2 (ja) 2007-07-25

Family

ID=18131578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32134799A Expired - Lifetime JP3948506B2 (ja) 1999-11-11 1999-11-11 ポジ型フォトレジスト組成物

Country Status (1)

Country Link
JP (1) JP3948506B2 (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4358940B2 (ja) * 1999-08-26 2009-11-04 丸善石油化学株式会社 シクロヘキサンラクトン構造を有する重合性化合物及び重合体
TW581941B (en) * 2001-06-21 2004-04-01 Fuji Photo Film Co Ltd Positive resist composition
JP4727092B2 (ja) * 2001-09-10 2011-07-20 東京応化工業株式会社 化学増幅型レジスト組成物
JP4149154B2 (ja) * 2001-09-28 2008-09-10 富士フイルム株式会社 ポジ型レジスト組成物
JP3827290B2 (ja) * 2001-10-03 2006-09-27 富士写真フイルム株式会社 ポジ型感光性組成物
JP3836359B2 (ja) 2001-12-03 2006-10-25 東京応化工業株式会社 ポジ型レジスト組成物及びレジストパターン形成方法
KR100979871B1 (ko) 2002-04-01 2010-09-02 다이셀 가가꾸 고교 가부시끼가이샤 ArF 엑시머 레이저 레지스트용 중합체 용액의 제조 방법
US7338740B2 (en) 2003-03-27 2008-03-04 Fujifilm Corporation Positive resist composition
US7279265B2 (en) 2003-03-27 2007-10-09 Fujifilm Corporation Positive resist composition and pattern formation method using the same
JP4347110B2 (ja) 2003-10-22 2009-10-21 東京応化工業株式会社 電子線又はeuv用ポジ型レジスト組成物
JP2006030532A (ja) * 2004-07-15 2006-02-02 Tokyo Ohka Kogyo Co Ltd レジスト組成物およびレジストパターン形成方法
JP5148882B2 (ja) * 2007-01-18 2013-02-20 株式会社ダイセル レジスト組成物

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