JP2002251013A5 - - Google Patents
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- Publication number
- JP2002251013A5 JP2002251013A5 JP2001048880A JP2001048880A JP2002251013A5 JP 2002251013 A5 JP2002251013 A5 JP 2002251013A5 JP 2001048880 A JP2001048880 A JP 2001048880A JP 2001048880 A JP2001048880 A JP 2001048880A JP 2002251013 A5 JP2002251013 A5 JP 2002251013A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituent
- hydrocarbon group
- alkyl group
- independently represent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000217 alkyl group Chemical group 0.000 description 10
- 125000002723 alicyclic group Chemical group 0.000 description 9
- 125000001424 substituent group Chemical group 0.000 description 8
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 239000000203 mixture Substances 0.000 description 6
- 125000000753 cycloalkyl group Chemical group 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- 239000002253 acid Substances 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- -1 alicyclic hydrocarbon Chemical class 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- DIYFBIOUBFTQJU-UHFFFAOYSA-N 1-phenyl-2-sulfanylethanone Chemical group SCC(=O)C1=CC=CC=C1 DIYFBIOUBFTQJU-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000005415 substituted alkoxy group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001048880A JP4208422B2 (ja) | 2001-02-23 | 2001-02-23 | ポジ型レジスト組成物 |
| US10/079,414 US6858370B2 (en) | 2001-02-23 | 2002-02-22 | Positive photosensitive composition |
| TW91103178A TW548523B (en) | 2001-02-23 | 2002-02-22 | Positive photosensitive composition |
| KR1020020009638A KR100795109B1 (ko) | 2001-02-23 | 2002-02-22 | 포지티브 감광성 조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001048880A JP4208422B2 (ja) | 2001-02-23 | 2001-02-23 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002251013A JP2002251013A (ja) | 2002-09-06 |
| JP2002251013A5 true JP2002251013A5 (enExample) | 2006-01-19 |
| JP4208422B2 JP4208422B2 (ja) | 2009-01-14 |
Family
ID=18910071
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001048880A Expired - Fee Related JP4208422B2 (ja) | 2001-02-23 | 2001-02-23 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4208422B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000001684A1 (en) * | 1998-07-03 | 2000-01-13 | Nec Corporation | (meth)acrylate derivatives bearing lactone structure, polymers, photoresist compositions and process of forming patterns with the same |
| US7452655B2 (en) * | 2002-11-05 | 2008-11-18 | Jsr Corporation | Acrylic copolymer and radiation-sensitive resin composition |
| US7279265B2 (en) * | 2003-03-27 | 2007-10-09 | Fujifilm Corporation | Positive resist composition and pattern formation method using the same |
| JP6349407B2 (ja) * | 2014-09-29 | 2018-06-27 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、パターン形成方法、及び電子デバイスの製造方法 |
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2001
- 2001-02-23 JP JP2001048880A patent/JP4208422B2/ja not_active Expired - Fee Related