JP4208422B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4208422B2
JP4208422B2 JP2001048880A JP2001048880A JP4208422B2 JP 4208422 B2 JP4208422 B2 JP 4208422B2 JP 2001048880 A JP2001048880 A JP 2001048880A JP 2001048880 A JP2001048880 A JP 2001048880A JP 4208422 B2 JP4208422 B2 JP 4208422B2
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JP
Japan
Prior art keywords
group
carbon atoms
alkyl group
atom
general formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001048880A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002251013A5 (enExample
JP2002251013A (ja
Inventor
健一郎 佐藤
邦彦 児玉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2001048880A priority Critical patent/JP4208422B2/ja
Priority to US10/079,414 priority patent/US6858370B2/en
Priority to TW91103178A priority patent/TW548523B/zh
Priority to KR1020020009638A priority patent/KR100795109B1/ko
Publication of JP2002251013A publication Critical patent/JP2002251013A/ja
Publication of JP2002251013A5 publication Critical patent/JP2002251013A5/ja
Application granted granted Critical
Publication of JP4208422B2 publication Critical patent/JP4208422B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP2001048880A 2001-02-23 2001-02-23 ポジ型レジスト組成物 Expired - Fee Related JP4208422B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2001048880A JP4208422B2 (ja) 2001-02-23 2001-02-23 ポジ型レジスト組成物
US10/079,414 US6858370B2 (en) 2001-02-23 2002-02-22 Positive photosensitive composition
TW91103178A TW548523B (en) 2001-02-23 2002-02-22 Positive photosensitive composition
KR1020020009638A KR100795109B1 (ko) 2001-02-23 2002-02-22 포지티브 감광성 조성물

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001048880A JP4208422B2 (ja) 2001-02-23 2001-02-23 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2002251013A JP2002251013A (ja) 2002-09-06
JP2002251013A5 JP2002251013A5 (enExample) 2006-01-19
JP4208422B2 true JP4208422B2 (ja) 2009-01-14

Family

ID=18910071

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001048880A Expired - Fee Related JP4208422B2 (ja) 2001-02-23 2001-02-23 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP4208422B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000001684A1 (en) * 1998-07-03 2000-01-13 Nec Corporation (meth)acrylate derivatives bearing lactone structure, polymers, photoresist compositions and process of forming patterns with the same
US7452655B2 (en) * 2002-11-05 2008-11-18 Jsr Corporation Acrylic copolymer and radiation-sensitive resin composition
US7279265B2 (en) * 2003-03-27 2007-10-09 Fujifilm Corporation Positive resist composition and pattern formation method using the same
JP6349407B2 (ja) * 2014-09-29 2018-06-27 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、パターン形成方法、及び電子デバイスの製造方法

Also Published As

Publication number Publication date
JP2002251013A (ja) 2002-09-06

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