JP2003162061A5 - - Google Patents
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- Publication number
- JP2003162061A5 JP2003162061A5 JP2002219789A JP2002219789A JP2003162061A5 JP 2003162061 A5 JP2003162061 A5 JP 2003162061A5 JP 2002219789 A JP2002219789 A JP 2002219789A JP 2002219789 A JP2002219789 A JP 2002219789A JP 2003162061 A5 JP2003162061 A5 JP 2003162061A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- general formula
- alkyl group
- hydrocarbon group
- alicyclic hydrocarbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000217 alkyl group Chemical group 0.000 claims 10
- 125000002723 alicyclic group Chemical group 0.000 claims 9
- 125000004432 carbon atom Chemical group C* 0.000 claims 7
- 125000000753 cycloalkyl group Chemical group 0.000 claims 6
- 125000001424 substituent group Chemical group 0.000 claims 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 5
- 239000002253 acid Substances 0.000 claims 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims 3
- 125000005843 halogen group Chemical group 0.000 claims 3
- -1 alicyclic hydrocarbon Chemical class 0.000 claims 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000000623 heterocyclic group Chemical group 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 239000004215 Carbon black (E152) Substances 0.000 claims 1
- JHRWWRDRBPCWTF-OLQVQODUSA-N captafol Chemical group C1C=CC[C@H]2C(=O)N(SC(Cl)(Cl)C(Cl)Cl)C(=O)[C@H]21 JHRWWRDRBPCWTF-OLQVQODUSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 229930195733 hydrocarbon Natural products 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- 125000005415 substituted alkoxy group Chemical group 0.000 claims 1
- 125000000547 substituted alkyl group Chemical group 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 125000004434 sulfur atom Chemical group 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002219789A JP4056318B2 (ja) | 2001-09-14 | 2002-07-29 | ポジ型レジスト組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001-279708 | 2001-09-14 | ||
| JP2001279708 | 2001-09-14 | ||
| JP2002219789A JP4056318B2 (ja) | 2001-09-14 | 2002-07-29 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003162061A JP2003162061A (ja) | 2003-06-06 |
| JP2003162061A5 true JP2003162061A5 (enExample) | 2005-09-22 |
| JP4056318B2 JP4056318B2 (ja) | 2008-03-05 |
Family
ID=26622236
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002219789A Expired - Fee Related JP4056318B2 (ja) | 2001-09-14 | 2002-07-29 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4056318B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1491951A3 (en) * | 2003-06-09 | 2010-03-31 | FUJIFILM Corporation | Positive-working resist composition |
| JP4551970B2 (ja) | 2007-06-12 | 2010-09-29 | 富士フイルム株式会社 | ネガ型現像用レジスト組成物及びこれを用いたパターン形成方法 |
| WO2024190887A1 (ja) * | 2023-03-16 | 2024-09-19 | サンメディカル株式会社 | 歯科用重合キット |
| CN116751142A (zh) * | 2023-06-09 | 2023-09-15 | 湖南方盛绿色合成制药有限公司 | 瑞舒伐他汀钙中间体的杂质及其制备工艺 |
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2002
- 2002-07-29 JP JP2002219789A patent/JP4056318B2/ja not_active Expired - Fee Related