JP4056318B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4056318B2
JP4056318B2 JP2002219789A JP2002219789A JP4056318B2 JP 4056318 B2 JP4056318 B2 JP 4056318B2 JP 2002219789 A JP2002219789 A JP 2002219789A JP 2002219789 A JP2002219789 A JP 2002219789A JP 4056318 B2 JP4056318 B2 JP 4056318B2
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JP
Japan
Prior art keywords
group
general formula
carbon atoms
alkyl group
atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002219789A
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English (en)
Japanese (ja)
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JP2003162061A (ja
JP2003162061A5 (enExample
Inventor
亨 藤森
浩一 川村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Publication date
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Priority to JP2002219789A priority Critical patent/JP4056318B2/ja
Publication of JP2003162061A publication Critical patent/JP2003162061A/ja
Publication of JP2003162061A5 publication Critical patent/JP2003162061A5/ja
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Publication of JP4056318B2 publication Critical patent/JP4056318B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP2002219789A 2001-09-14 2002-07-29 ポジ型レジスト組成物 Expired - Fee Related JP4056318B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002219789A JP4056318B2 (ja) 2001-09-14 2002-07-29 ポジ型レジスト組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001-279708 2001-09-14
JP2001279708 2001-09-14
JP2002219789A JP4056318B2 (ja) 2001-09-14 2002-07-29 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2003162061A JP2003162061A (ja) 2003-06-06
JP2003162061A5 JP2003162061A5 (enExample) 2005-09-22
JP4056318B2 true JP4056318B2 (ja) 2008-03-05

Family

ID=26622236

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002219789A Expired - Fee Related JP4056318B2 (ja) 2001-09-14 2002-07-29 ポジ型レジスト組成物

Country Status (1)

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JP (1) JP4056318B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1491951A3 (en) * 2003-06-09 2010-03-31 FUJIFILM Corporation Positive-working resist composition
JP4551970B2 (ja) 2007-06-12 2010-09-29 富士フイルム株式会社 ネガ型現像用レジスト組成物及びこれを用いたパターン形成方法
WO2024190887A1 (ja) * 2023-03-16 2024-09-19 サンメディカル株式会社 歯科用重合キット
CN116751142A (zh) * 2023-06-09 2023-09-15 湖南方盛绿色合成制药有限公司 瑞舒伐他汀钙中间体的杂质及其制备工艺

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Publication number Publication date
JP2003162061A (ja) 2003-06-06

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