JP2002243937A5 - - Google Patents

Download PDF

Info

Publication number
JP2002243937A5
JP2002243937A5 JP2001037511A JP2001037511A JP2002243937A5 JP 2002243937 A5 JP2002243937 A5 JP 2002243937A5 JP 2001037511 A JP2001037511 A JP 2001037511A JP 2001037511 A JP2001037511 A JP 2001037511A JP 2002243937 A5 JP2002243937 A5 JP 2002243937A5
Authority
JP
Japan
Prior art keywords
film
forming
sacrificial layer
reflective film
anchor hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001037511A
Other languages
English (en)
Japanese (ja)
Other versions
JP3858606B2 (ja
JP2002243937A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001037511A priority Critical patent/JP3858606B2/ja
Priority claimed from JP2001037511A external-priority patent/JP3858606B2/ja
Publication of JP2002243937A publication Critical patent/JP2002243937A/ja
Publication of JP2002243937A5 publication Critical patent/JP2002243937A5/ja
Application granted granted Critical
Publication of JP3858606B2 publication Critical patent/JP3858606B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2001037511A 2001-02-14 2001-02-14 干渉フィルタの製造方法、干渉フィルタ、波長可変干渉フィルタの製造方法及び波長可変干渉フィルタ Expired - Fee Related JP3858606B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001037511A JP3858606B2 (ja) 2001-02-14 2001-02-14 干渉フィルタの製造方法、干渉フィルタ、波長可変干渉フィルタの製造方法及び波長可変干渉フィルタ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001037511A JP3858606B2 (ja) 2001-02-14 2001-02-14 干渉フィルタの製造方法、干渉フィルタ、波長可変干渉フィルタの製造方法及び波長可変干渉フィルタ

Publications (3)

Publication Number Publication Date
JP2002243937A JP2002243937A (ja) 2002-08-28
JP2002243937A5 true JP2002243937A5 (enrdf_load_stackoverflow) 2005-01-27
JP3858606B2 JP3858606B2 (ja) 2006-12-20

Family

ID=18900627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001037511A Expired - Fee Related JP3858606B2 (ja) 2001-02-14 2001-02-14 干渉フィルタの製造方法、干渉フィルタ、波長可変干渉フィルタの製造方法及び波長可変干渉フィルタ

Country Status (1)

Country Link
JP (1) JP3858606B2 (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8963159B2 (en) 2011-04-04 2015-02-24 Qualcomm Mems Technologies, Inc. Pixel via and methods of forming the same
US9134527B2 (en) 2011-04-04 2015-09-15 Qualcomm Mems Technologies, Inc. Pixel via and methods of forming the same

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7297471B1 (en) 2003-04-15 2007-11-20 Idc, Llc Method for manufacturing an array of interferometric modulators
US7550794B2 (en) 2002-09-20 2009-06-23 Idc, Llc Micromechanical systems device comprising a displaceable electrode and a charge-trapping layer
TW557395B (en) * 2003-01-29 2003-10-11 Yen Sun Technology Corp Optical interference type reflection panel and the manufacturing method thereof
TW570896B (en) 2003-05-26 2004-01-11 Prime View Int Co Ltd A method for fabricating an interference display cell
US7221495B2 (en) 2003-06-24 2007-05-22 Idc Llc Thin film precursor stack for MEMS manufacturing
JP3812550B2 (ja) 2003-07-07 2006-08-23 セイコーエプソン株式会社 波長可変光フィルタ
JP2005045976A (ja) * 2003-07-25 2005-02-17 Matsushita Electric Works Ltd 静電アクチュエータ
JP3770326B2 (ja) 2003-10-01 2006-04-26 セイコーエプソン株式会社 分析装置
JP2005165067A (ja) 2003-12-03 2005-06-23 Seiko Epson Corp 波長可変フィルタおよび波長可変フィルタの製造方法
JP4634057B2 (ja) * 2004-03-17 2011-02-16 アンリツ株式会社 光キャビティ
JP4296974B2 (ja) * 2004-03-24 2009-07-15 株式会社村田製作所 ファブリペロー型波長可変フィルタおよび多チャンネルファブリペロー型波長可変フィルタ
US7087134B2 (en) * 2004-03-31 2006-08-08 Hewlett-Packard Development Company, L.P. System and method for direct-bonding of substrates
JP4210245B2 (ja) 2004-07-09 2009-01-14 セイコーエプソン株式会社 波長可変フィルタ及び検出装置
EP2246726B1 (en) 2004-07-29 2013-04-03 QUALCOMM MEMS Technologies, Inc. System and method for micro-electromechanical operating of an interferometric modulator
US20060066932A1 (en) * 2004-09-27 2006-03-30 Clarence Chui Method of selective etching using etch stop layer
US7492502B2 (en) 2004-09-27 2009-02-17 Idc, Llc Method of fabricating a free-standing microstructure
US7429334B2 (en) 2004-09-27 2008-09-30 Idc, Llc Methods of fabricating interferometric modulators by selectively removing a material
CN100410723C (zh) * 2005-01-28 2008-08-13 精工爱普生株式会社 可变波长滤光器以及可变波长滤光器的制造方法
TW200628877A (en) 2005-02-04 2006-08-16 Prime View Int Co Ltd Method of manufacturing optical interference type color display
KR101375337B1 (ko) 2005-07-22 2014-03-18 퀄컴 엠이엠에스 테크놀로지스, 인크. 지지 구조물들을 가지는 전자기계 장치들 및 그 제조방법들
EP2495212A3 (en) 2005-07-22 2012-10-31 QUALCOMM MEMS Technologies, Inc. Mems devices having support structures and methods of fabricating the same
EP1910216A1 (en) 2005-07-22 2008-04-16 QUALCOMM Incorporated Support structure for mems device and methods therefor
US7795061B2 (en) 2005-12-29 2010-09-14 Qualcomm Mems Technologies, Inc. Method of creating MEMS device cavities by a non-etching process
US7382515B2 (en) 2006-01-18 2008-06-03 Qualcomm Mems Technologies, Inc. Silicon-rich silicon nitrides as etch stops in MEMS manufacture
US7547568B2 (en) 2006-02-22 2009-06-16 Qualcomm Mems Technologies, Inc. Electrical conditioning of MEMS device and insulating layer thereof
US7450295B2 (en) 2006-03-02 2008-11-11 Qualcomm Mems Technologies, Inc. Methods for producing MEMS with protective coatings using multi-component sacrificial layers
US7623287B2 (en) 2006-04-19 2009-11-24 Qualcomm Mems Technologies, Inc. Non-planar surface structures and process for microelectromechanical systems
US7527996B2 (en) 2006-04-19 2009-05-05 Qualcomm Mems Technologies, Inc. Non-planar surface structures and process for microelectromechanical systems
US7321457B2 (en) 2006-06-01 2008-01-22 Qualcomm Incorporated Process and structure for fabrication of MEMS device having isolated edge posts
US7763546B2 (en) 2006-08-02 2010-07-27 Qualcomm Mems Technologies, Inc. Methods for reducing surface charges during the manufacture of microelectromechanical systems devices
US7733552B2 (en) 2007-03-21 2010-06-08 Qualcomm Mems Technologies, Inc MEMS cavity-coating layers and methods
US7719752B2 (en) 2007-05-11 2010-05-18 Qualcomm Mems Technologies, Inc. MEMS structures, methods of fabricating MEMS components on separate substrates and assembly of same
US7569488B2 (en) 2007-06-22 2009-08-04 Qualcomm Mems Technologies, Inc. Methods of making a MEMS device by monitoring a process parameter
US7864403B2 (en) 2009-03-27 2011-01-04 Qualcomm Mems Technologies, Inc. Post-release adjustment of interferometric modulator reflectivity
US8547626B2 (en) 2010-03-25 2013-10-01 Qualcomm Mems Technologies, Inc. Mechanical layer and methods of shaping the same
JP5625614B2 (ja) 2010-08-20 2014-11-19 セイコーエプソン株式会社 光フィルター、光フィルターモジュール、分光測定器および光機器
JP5577983B2 (ja) * 2010-09-21 2014-08-27 株式会社デンソー ファブリペロー干渉計の製造方法
US8659816B2 (en) 2011-04-25 2014-02-25 Qualcomm Mems Technologies, Inc. Mechanical layer and methods of making the same
JP5906640B2 (ja) * 2011-09-29 2016-04-20 セイコーエプソン株式会社 波長可変干渉フィルター、光学フィルターデバイス、光学モジュール、及び電子機器
JP6035768B2 (ja) 2012-02-16 2016-11-30 セイコーエプソン株式会社 干渉フィルター、光学モジュール、および電子機器
FI125612B (en) * 2012-05-08 2015-12-15 Teknologian Tutkimuskeskus Vtt Oy Fabry-Perot Interferometer
US9638913B2 (en) * 2013-11-26 2017-05-02 Inphenix, Inc. Wavelength tunable MEMS-Fabry Perot filter
CN110954981A (zh) * 2018-09-27 2020-04-03 精工爱普生株式会社 光学装置及电子设备
JP7238385B2 (ja) * 2018-12-20 2023-03-14 セイコーエプソン株式会社 分光フィルターモジュール、分光カメラおよび電子機器

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8963159B2 (en) 2011-04-04 2015-02-24 Qualcomm Mems Technologies, Inc. Pixel via and methods of forming the same
US9134527B2 (en) 2011-04-04 2015-09-15 Qualcomm Mems Technologies, Inc. Pixel via and methods of forming the same

Similar Documents

Publication Publication Date Title
JP2002243937A5 (enrdf_load_stackoverflow)
FR2824643A1 (fr) Dispositif de modulation de lumiere
JP2002243937A (ja) 干渉フィルタの製造手段、干渉フィルタ、波長可変干渉フィルタ製造手段、波長可変干渉フィルタ、及び、波長選択フィルタ
CN101051096B (zh) 光学可调滤光器及其制造方法
JP3311680B2 (ja) 微小機械装置に固着された光ファイバを含む製品
TWI276847B (en) Wavelength-variable filter and method of manufacturing the same
JP2010505249A5 (enrdf_load_stackoverflow)
JP2001331120A5 (enrdf_load_stackoverflow)
JP2005501405A5 (enrdf_load_stackoverflow)
KR20050105383A (ko) 와이어 그리드 편광자 및 그 제조 방법
JP2008546197A5 (enrdf_load_stackoverflow)
JP2009534859A5 (enrdf_load_stackoverflow)
KR100980284B1 (ko) 접착력이 향상된 나노 와이어 그리드 편광자 및 그 제조방법
US8863890B2 (en) Coated speaker dome and coated diamond products
CN114830017A (zh) 一种可调光学滤波器件
TW555687B (en) Method of manufacturing MEMS Fabry-Perot device
JP5543525B2 (ja) 光学デバイスおよびその製造方法
JP2010541222A5 (enrdf_load_stackoverflow)
JP5545190B2 (ja) 波長可変干渉フィルターの製造方法
US20110228379A1 (en) Optical Tag
Park et al. A bulk-micromachined corner cube retroreflector with piezoelectric micro-cantilevers
KR100601481B1 (ko) 회절형 박막 압전 광변조기 및 그 제조방법
CN1248019C (zh) 微机电式法布里－珀罗装置制造方法
KR100446731B1 (ko) 광스위치용 압전구동형 미소거울 및 그 제조방법
JP2005024825A (ja) 干渉フィルタ、波長可変干渉フィルタ及びそれらの製造方法