JP2002232094A - Multilayer interconnection board - Google Patents

Multilayer interconnection board

Info

Publication number
JP2002232094A
JP2002232094A JP2001025283A JP2001025283A JP2002232094A JP 2002232094 A JP2002232094 A JP 2002232094A JP 2001025283 A JP2001025283 A JP 2001025283A JP 2001025283 A JP2001025283 A JP 2001025283A JP 2002232094 A JP2002232094 A JP 2002232094A
Authority
JP
Japan
Prior art keywords
layer
recognition
wiring board
multilayer wiring
recognition mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001025283A
Other languages
Japanese (ja)
Inventor
Shigehiro Kawaura
茂裕 河浦
Hisanobu Murata
寿伸 村田
Takehiro Nakaseki
武浩 中関
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Carbide Industries Co Inc
Original Assignee
Nippon Carbide Industries Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Carbide Industries Co Inc filed Critical Nippon Carbide Industries Co Inc
Priority to JP2001025283A priority Critical patent/JP2002232094A/en
Publication of JP2002232094A publication Critical patent/JP2002232094A/en
Pending legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Structure Of Printed Boards (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a multilayer interconnection board of high workability in assembling process and high accuracy at assembling. SOLUTION: The multilayer interconnection board is provided which is an aggregate of a plurality of chips and where a plurality of identification marks provided to each of interconnection layers are recognized from a surface.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明が属する技術分野】本発明は、電子部品を搭載す
る多層配線基板に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multilayer wiring board on which electronic components are mounted.

【0002】[0002]

【従来の技術】近年、電子部品を搭載する多層配線基板
においてより薄く、より小型化、より多層化、より高精
度、等が求められている。セラミック系、樹脂系、にお
いて複数個のチップの集合である多層配線基板が各々の
配線層毎のシートをガイドピンにより位置合わせされ、
プレス成形して作成され、焼成または硬化され、チップ
に分割される。分割したチップの配線を認識し、位置補
正をし、補正データ位置に電子部品を搭載し、ときには
ワイヤボンディングがなされる。
2. Description of the Related Art In recent years, a multilayer wiring board on which electronic components are mounted has been required to be thinner, smaller, more multilayered, more accurate, and the like. In a ceramic or resin system, a multi-layer wiring board, which is a set of a plurality of chips, is aligned with a sheet for each wiring layer by guide pins,
Press-formed, fired or cured and divided into chips. The wiring of the divided chips is recognized, the position is corrected, electronic components are mounted at correction data positions, and sometimes wire bonding is performed.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、分割し
たチップをもちいて電子部品を搭載することは作業性が
悪い。より薄く、より小型化がなされるにつれ自動組み
立ての工程で近距離間の位置補正のため不精確となると
いう問題点がある。
However, mounting electronic components using divided chips is inferior in workability. As the thickness is reduced and the size is reduced, there is a problem that the position is corrected in a short distance in an automatic assembling process, which causes inaccuracy.

【0004】[0004]

【課題を解決するための手段】複数個のチップの集合で
あり部品搭載用の開口部及び配線層を有する多層配線基
板において、各々の配線層毎に設けられた複数個の認識
マークが多層配線基板の表面から認識することができる
多層配線基板である。該多層配線基板は、複数個のチッ
プの集合である状態で該認識マークを認識して位置補正
し、補正データ位置に電子部品を搭載し、補正データ位
置にワイヤボンディングをほどこす等の組み立て工程の
ため作業性がよく、また、離れた距離にある複数の認識
マークで位置補正するために精確性が増す、等の問題を
解決する多層配線基板を提供することができる。
SUMMARY OF THE INVENTION In a multilayer wiring board which is a set of a plurality of chips and has an opening for mounting a component and a wiring layer, a plurality of recognition marks provided for each wiring layer have a multi-layer wiring structure. This is a multilayer wiring board that can be recognized from the surface of the board. The multi-layer wiring board is an assembly process of recognizing the recognition mark in a state of being a set of a plurality of chips, correcting the position, mounting an electronic component at the correction data position, and performing wire bonding at the correction data position. Therefore, it is possible to provide a multi-layer wiring board that solves the problem that the workability is good and the accuracy is increased because the position is corrected by using a plurality of distant recognition marks.

【0005】[0005]

【発明の実施の形態】以下、本発明に係る多層配線基板
について詳述する。以下に説明する形態・層数に限定さ
れるものでなく各々の配線層毎に配線回路と同時に設け
られた複数の認識マークが、積層された多層配線基板の
表面から認識することができる複数個のチップの集合状
態(シート状態)の多層配線基板である。(図1,図2
を参照に説明する。)
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a multilayer wiring board according to the present invention will be described in detail. The present invention is not limited to the form and the number of layers described below, and a plurality of recognition marks provided simultaneously with the wiring circuit for each wiring layer can be recognized from the surface of the laminated multilayer wiring board. Is a multi-layer wiring board in an aggregated state (sheet state) of chips. (FIGS. 1 and 2
Will be described with reference to FIG. )

【0006】多層配線基板は、セラミック系、ガラス
系、樹脂系、等を限定するものでない。樹脂系のサブト
ラクティブ方法においては、各々配線層毎に配線回路を
エッチングで残すと同時に認識マークを残し、各々配線
層をガイドピン穴6で位置合わせし、真空加熱積層す
る。認識マーク1−1が表面から認識することができる
ようにザグリ加工により樹脂層を除去し認識窓1−11
を形成してもよく、積層する前に認識マーク位置の上面
に位置する配線層の樹脂を認識マーク1−1より大きく
除去し認識窓1−11を形成して積層することにより表
面から認識することができる多層配線基板とする。樹脂
系のアディティブ方法においては、配線層に配線回路を
形成すると同時に認識マーク1−1を形成し、樹脂層を
塗布し、認識マーク位置の樹脂を認識マークより大きく
除去して認識窓1−11を形成する。更に配線層を形成
する場合は、配線回路と同時に認識マーク2−1を形成
し、樹脂層を塗布し、認識マーク位置の樹脂を認識マー
クより大きく除去して認識窓2−11を形成する。必要
回数繰り返して表面から各々の配線層の認識マークが認
識窓から認識できる多層配線基板とする。樹脂系におい
て、プッシュバック方法、分割溝形成方法、等で個別チ
ップ化の準備がされたシート状態の多数個チップの集合
体である多層配線基板とすることができる。
The multilayer wiring board is not limited to ceramic, glass, resin, and the like. In the resin-based subtractive method, a wiring circuit is left for each wiring layer by etching, and at the same time, a recognition mark is left, and the wiring layers are aligned with the guide pin holes 6 and laminated by vacuum heating. The resin layer is removed by counterbore processing so that the recognition mark 1-1 can be recognized from the surface, and the recognition window 1-11 is formed.
Before the lamination, the resin of the wiring layer located on the upper surface of the recognition mark position is removed to a greater extent than the recognition mark 1-1, and the recognition window 1-11 is formed and laminated. And a multi-layer wiring board that can be used. In the resin-based additive method, the recognition mark 1-1 is formed at the same time when the wiring circuit is formed in the wiring layer, the resin layer is applied, and the resin at the recognition mark position is removed to a greater extent than the recognition mark to make the recognition window 1-11. To form When a wiring layer is further formed, the recognition mark 2-1 is formed simultaneously with the wiring circuit, a resin layer is applied, and the resin at the position of the recognition mark is removed to a greater extent than the recognition mark to form the recognition window 2-11. A multi-layer wiring board in which the recognition marks of the respective wiring layers can be recognized from the recognition window from the front surface by repeating the required number of times. In the resin system, a multilayer wiring board which is an aggregate of a large number of chips in a sheet state prepared for individual chip formation by a pushback method, a division groove forming method, or the like can be provided.

【0007】セラミック系の多層配線基板は、セラミッ
ク粉末、焼結助剤、有機バインダー、溶剤または水、等
を分散させたスラリーをドクターブレードで支持体の上
に一定の厚みにキャスティングし、乾燥した可塑性をも
つ柔らかなセラミックグリーンシートを作製し(ドクタ
ーブレード方法)、Aセラミックグリーンシートにガイ
ドピン穴6等を形成し導電性ペーストを印刷塗布して第
一配線層(配線回路)を形成する工程と同時に第一層認
識マーク1−1を形成する。Bセラミックグリーンシー
トにガイドピン穴6、開口部8、第一層認識窓1−1
1、等を形成し導電性ペーストを印刷塗布して第二配線
層3と共に第二層認識マーク2−1を形成する。Cセラ
ミックグリーンシートにガイドピン穴6,開口部8,第
一層認識窓、第二層認識窓、等を形成する。前記A、
B、Cのセラミックグリーンシートの3層または構成に
必要な層数のセラミックグリーンシートを位置合わせ
し、加熱・加圧・積層し、後で複数個のチップに分割可能
ならしめるブレイク溝5を縦・横に形成し、水素附加の
窒素雰囲気炉で焼結してシート状態であり各々配線層毎
に設けられた認識マークが表面から認識することができ
る多層配線基板とすることができる。
A ceramic multilayer wiring board is prepared by casting a slurry in which ceramic powder, a sintering aid, an organic binder, a solvent or water, or the like is dispersed on a support with a doctor blade to a predetermined thickness, and then drying the slurry. Step of forming a soft ceramic green sheet having plasticity (doctor blade method), forming guide pin holes 6 and the like on the ceramic green sheet A, and printing and applying a conductive paste to form a first wiring layer (wiring circuit). At the same time, the first layer recognition mark 1-1 is formed. Guide pin hole 6, opening 8, first layer recognition window 1-1 in B ceramic green sheet
1 and the like, and a conductive paste is printed and applied to form the second layer recognition mark 2-1 together with the second wiring layer 3. A guide pin hole 6, an opening 8, a first layer recognition window, a second layer recognition window, and the like are formed in a C ceramic green sheet. A,
The three or more ceramic green sheets of B and C or the number of ceramic green sheets required for the configuration are aligned, heated, pressed and laminated, and the break grooves 5 which can be divided into a plurality of chips later are formed vertically. Formed horizontally and sintered in a nitrogen atmosphere furnace with hydrogen added to form a multi-layer wiring board in a sheet state, in which recognition marks provided for each wiring layer can be recognized from the surface.

【0008】このように製作された多層配線基板は、多
数個チップの集合体(シート状態)であり各々配線層毎
に該配線層の形成と同時に設けられた認識マークが該多
層配線基板の表面から認識することができるため、該認
識マーク(一般には3個)位置を認識し、設計位置との
関係を補正計算し、補正計算値を基に電子部品を組立る
ことができる。多数個チップの集合体であるシート状態
で組立を行うため作業性が良く、また、シート状態に設
けられた複数の認識マーク間の距離が大きいため補正計
算値の精確性が格段に良くなる。認識マークを多層配線
基板の周りにより多く配置することによりセラミックの
焼結による収縮、樹脂基板の工程歪みを特定方向性補正
することができて更に精確性が良くなる。
The multilayer wiring board manufactured in this manner is an aggregate (sheet state) of a large number of chips, and a recognition mark provided for each wiring layer simultaneously with the formation of the wiring layer is provided on the surface of the multilayer wiring board. Therefore, the position of the recognition mark (generally three) can be recognized, the relationship with the design position can be corrected and calculated, and the electronic component can be assembled based on the corrected calculated value. Workability is good because assembly is performed in a sheet state, which is an aggregate of a large number of chips, and the accuracy of correction calculation values is significantly improved because the distance between a plurality of recognition marks provided in the sheet state is large. By arranging more recognition marks around the multilayer wiring substrate, shrinkage due to sintering of the ceramic and process distortion of the resin substrate can be corrected in a specific direction, and the accuracy is further improved.

【0009】[0009]

【実施例】(実施例1)アルミナセラミック基板が焼結
して通称アルミナ96%となる配合にアルミナ粉末及び
MgO、SiO、CaO及びTiOを配合し、ポリ
ビニルブチラール樹脂及びトルエン/メタノール/ME
K混合溶液を添加し、ボールミルで混合・粉砕・分散し、
ドクターブレード方法で可塑性をもつアルミナセラミッ
クグリーンシートを作製した。(厚さ0.3mm、0.
2mmの2種類)
(Example 1) Alumina ceramic substrate was sintered to give a so-called alumina of 96%, and alumina powder and MgO, SiO 2 , CaO and TiO 2 were mixed, and polyvinyl butyral resin and toluene / methanol / ME were mixed.
Add the K mixed solution, mix / pulverize / disperse with a ball mill,
Alumina ceramic green sheets having plasticity were prepared by a doctor blade method. (Thickness 0.3 mm, 0.
2mm)

【0010】第一層目になる100*80mmサイズ、
0.3mm厚のアルミナセラミックグリーンシートに設
計に従って裏面電極穴7及びガイドピン穴6をパンチン
グマシーン方法で形成し、複数の第一配線層4、第一層
認識マーク(直径0.6mmである1−1、1−2、1
−3の3個を周辺のダミー部に形成)及び端面電極(積
層体のチップにしたときの取り出し電極で裏面電極穴7
に形成)を電極用タングステンペーストで同時にスクリ
ーン印刷塗布し、乾燥してシートAとした。
[0010] 100 * 80mm size to be the first layer,
A back electrode hole 7 and a guide pin hole 6 are formed on a 0.3 mm-thick alumina ceramic green sheet according to design by a punching machine method, and a plurality of first wiring layers 4 and first layer recognition marks (1 mm having a diameter of 0.6 mm) are formed. -1, 1-2, 1
-3 are formed in the peripheral dummy portion) and the end surface electrode (the extraction electrode when a chip of a laminated body is formed, the back surface electrode hole 7).
) Was simultaneously screen-printed and coated with a tungsten paste for an electrode, and dried to obtain a sheet A.

【0011】第二層目になる0.2mmのアルミナセラ
ミックグリーンシートに設計に従って裏面電極穴7、ガ
イドピン穴6、開口部8及び第一層認識窓(1−11、
1−22、1−33の3個を第一層の第一層認識マーク
位置で直径2mmの貫通穴)をパンチングマシーン方法
で形成し、複数の第二配線層3、第二層認識マーク(直
径0.6mmである2−1、2−2、2−3の3個を周
辺ダミー部に形成)及び端面電極(積層チップにしたと
きの取り出し電極で裏面電極穴7に形成)を電極用タン
グステンペーストで同時にスクリーン印刷塗布し、乾燥
してシートBとした。
According to the design, a backside electrode hole 7, a guide pin hole 6, an opening 8 and a first layer recognition window (1-11,
Three holes 1-22 and 1-33 are formed at the position of the first layer recognition mark of the first layer by a punching machine method, and a plurality of second wiring layers 3 and second layer recognition marks ( Three 2-1, 2-2, and 2-3 pieces having a diameter of 0.6 mm are formed in the peripheral dummy portion) and an end surface electrode (formed in the back surface electrode hole 7 with an extraction electrode when a laminated chip is formed) is used for the electrode. Sheet B was simultaneously applied by screen printing with a tungsten paste and dried.

【0012】第三層目になる0.3mmのアルミナセラ
ミックグリーンシートに設計に従ってガイドピン穴6、
開口部8、第一層認識窓(1−11、1−22、1−3
3の3個を第一層の第一認識マーク位置で直径3mmの
貫通穴)、第二認識窓(2−11、2−22、2−33
の3個を第二層の第二層認識マーク位置で3mm貫通角
穴)をパンチングマシーン方法で形成してシートCとし
た。
According to the design, guide pin holes 6 are formed on a 0.3 mm alumina ceramic green sheet serving as a third layer.
Opening 8, first layer recognition window (1-11, 1-22, 1-3)
3 at the position of the first recognition mark of the first layer and a through-hole having a diameter of 3 mm) and the second recognition window (2-11, 2-22, 2-33)
Were formed by punching machine method at the position of the second layer recognition mark of the second layer to form a sheet C.

【0013】該シートA、該シートB及び該シートCを
ガイドピン穴6を基準に位置決め積み重ねし、加熱・加
圧により一体化した積層アルミナセラミックグリーンシ
ートを作製し(加熱温度:70℃、加圧力:7.06M
Pa、加圧時間:2分)、上面からタングステンペース
トをチップのぐるりにスクリーン印刷方法で印刷塗布し
乾燥して蓋体取付用のメタライズ層を形成し、積層アル
ミナセラミックグリーンシートの上面から約0.25m
mの深さまで縦・横にチップ分割用のV字型したブレイ
ク溝5を形成し、また裏面からブレイク溝5に相対する
位置に0.15mmの深さまでブレイク溝を形成した。
縦・横の複数本のブレイク溝は、チップを囲み、シート
の周りに認識マーク、認識窓、ガイドピン穴、等の構成
を可能ならしめるダミー部をスペースとして確保してい
る。
The sheet A, the sheet B and the sheet C are positioned and stacked with reference to the guide pin hole 6, and a laminated alumina ceramic green sheet is integrated by heating and pressing (heating temperature: 70 ° C., heating temperature: 70 ° C.). Pressure: 7.06M
Pa, pressurization time: 2 minutes), a tungsten paste is printed and coated by a screen printing method from the upper surface around the chip and dried to form a metallized layer for attaching the lid, and is approximately 0 mm from the upper surface of the laminated alumina ceramic green sheet. .25m
A V-shaped break groove 5 for chip division was formed vertically and horizontally to a depth of m, and a break groove was formed at a position opposite to the break groove 5 from the back surface to a depth of 0.15 mm.
A plurality of vertical and horizontal break grooves surround the chip, and secure a dummy portion around the sheet as a space for enabling a configuration of a recognition mark, a recognition window, a guide pin hole, and the like.

【0014】ブレイク溝が形成された積層アルミナセラ
ミックグリーンシートを還元雰囲気炉(水素22%、窒
素78%、ピーク温度1600℃、120分)で焼結し
てアルミナ製の多層配線基板を作製し、更に、酸化防
止、ボンディング性の向上のために該多層配線基板の表
面の配線層、電極に通常の方法による無電解Niメッ
キ、無電解Auメッキ表面処理を施して多層配線基板を
製作した。(図1、図2)
The laminated alumina ceramic green sheet having the break grooves formed therein is sintered in a reducing atmosphere furnace (22% hydrogen, 78% nitrogen, peak temperature 1600 ° C., 120 minutes) to produce a multilayer wiring board made of alumina. Further, in order to prevent oxidation and improve the bonding property, a wiring layer and electrodes on the surface of the multilayer wiring board were subjected to electroless Ni plating and electroless Au plating surface treatment by a usual method to produce a multilayer wiring board. (FIGS. 1 and 2)

【0015】このように製作された多層配線基板は、各
々の配線層毎に設けられた認識マークが該多層配線基板
の各々の認識窓から認識することができ、部品の搭載・
アッセンブリにさいして、認識カメラで認識マークを読
みとり、セラミック焼結のさいに収縮して変形を起こし
た配線層のターゲット座標を認識マーク読みとりデータ
ーで補正(設計値とのズレを補正、)し、補正されたデ
ーターによりチップ毎に電子部品の搭載・アッセンブリ
などを行うことができる。また、該認識マークを利用し
て電子部品が搭載・アッセンブリされたチップに蓋体を
精確に配置・封着することができる。更に、ブレイク溝
に従って個別のチップ(例えば、水晶製品を搭載するた
めの5.0*3.2mmサイズ、2.5*2.0mm、
半導体搭載のための7*7mmサイズ、等)に分割でき
る。このように製作された多層配線基板は、シート状態
(1シートには、数十〜数百のチップを形成できる。)
で扱うことができるため組立の作業性がよい。このよう
に製作された多層配線基板は、離れた距離にある3個の
認識マークで位置補正するために精確性が一段と増す。
また、本実施例では、3層であるがより多くの層による
多層配線基板でも同様の効果が達成される。
In the multilayer wiring board manufactured as described above, the recognition mark provided for each wiring layer can be recognized from each recognition window of the multilayer wiring board, and the mounting and mounting of components can be performed.
For the assembly, read the recognition mark with the recognition camera, correct the target coordinates of the wiring layer that has shrunk and deformed during ceramic sintering with the recognition mark reading data (correct the deviation from the design value), Electronic components can be mounted and assembled for each chip using the corrected data. Further, the lid can be accurately placed and sealed on the chip on which the electronic component is mounted and assembled by using the recognition mark. In addition, individual chips (e.g., 5.0 * 3.2 mm size, 2.5 * 2.0 mm for mounting quartz products,
(7 * 7mm size for semiconductor mounting, etc.). The multilayer wiring board manufactured as described above is in a sheet state (several dozens to hundreds of chips can be formed on one sheet).
The workability of assembly is good. The multilayer wiring board manufactured in this way is further improved in accuracy because the position is corrected by three recognition marks at a distance.
Further, in the present embodiment, although the number of layers is three, the same effect can be achieved even with a multilayer wiring board having more layers.

【0016】(実施例2)両面に18μm厚の銅箔を張
り合わせた厚さ0.3mmのガラスエポキシ基板に設計
に従って裏面電極穴7及びガイドピン穴6をNCドリル
マシーンで形成し、裏面電極穴に無電解銅メッキ方法及
び電解銅メッキ方法でスルホールを形成し、フォトエッ
チング方法で複数の第一配線層4及び3個の第一層認識
マーク(周辺ダミー部に形成)を残すパターンを形成
し、アディティブ方法[(第一配線層側に約100μm
の感光性樹脂フィルムをラミネートし、設計に従って露
光、硬化、剥離により裏面電極穴7、ガイドピン穴6、
開口部8及び第一層認識窓に該当する樹脂を除去して絶
縁樹脂層を形成し)、(該絶縁樹脂層にフォトレジスト
フィルムをラミネートし、設計に従って複数の第二配線
層3、第二層認識マーク及び端面電極を露光、現像、メ
ッキにより形成し)]で端面電極、第二配線層、第二層
認識マーク、等を形成し、更に、アディティブ方法で開
口部、第一層認識窓、第二層認識窓、ガイドピン穴、等
を有する絶縁樹脂層を形成した。更に、プッシュバック
用の金型をもちいてサイズ7*7mmの多数個チップよ
り成る多層配線基板を製作した。(本実施例のシートデ
ザインは、図1、図2と若干異なりチップ−チップ間に
ダミー部が形成され、裏面電極穴の位置は、チップ・エ
リア内に形成される。)
(Example 2) A back electrode hole 7 and a guide pin hole 6 are formed on a glass epoxy substrate having a thickness of 0.3 mm with an 18 μm thick copper foil bonded on both sides by an NC drill machine according to design, and a back electrode hole is formed. Then, a through hole is formed by an electroless copper plating method and an electrolytic copper plating method, and a pattern that leaves a plurality of first wiring layers 4 and three first layer recognition marks (formed on peripheral dummy portions) is formed by a photo etching method. , Additive method [(approximately 100 μm
Laminated photosensitive resin film, and exposed, cured and peeled according to design, back electrode hole 7, guide pin hole 6,
The resin corresponding to the opening 8 and the first layer recognition window is removed to form an insulating resin layer), (a photoresist film is laminated on the insulating resin layer, and a plurality of second wiring layers 3 and 2 The layer recognition mark and the end surface electrode are formed by exposure, development, and plating)] to form the end surface electrode, the second wiring layer, the second layer recognition mark, and the like, and further, the opening and the first layer recognition window are formed by an additive method. And an insulating resin layer having a second layer recognition window, guide pin holes, and the like. Further, a multilayer wiring board composed of a large number of chips having a size of 7 * 7 mm was manufactured using a mold for pushback. (The sheet design of the present embodiment is slightly different from FIGS. 1 and 2 in that a dummy portion is formed between chips and the position of the back surface electrode hole is formed in the chip area.)

【0017】このように製作された樹脂系多層配線基板
は、実施例1と同様に各々の認識マークにより搭載・ア
ッセンブリされるため精確には位置・封着することがで
き、シート状態で扱うことができるので組立作業性がよ
く、精確性が一段と良い。
The resin-based multilayer wiring board manufactured as described above is mounted and assembled with each recognition mark as in the first embodiment, so that it can be accurately positioned and sealed, and can be handled in a sheet state. As a result, assembling workability is good and accuracy is further improved.

【0018】[0018]

【発明の効果】本発明に係る多層配線基板は、多数個チ
ップの集合体(シート状態)であり各々配線層毎に該配
線層と同時に設けられた認識マークが該多層配線基板の
表面から認識することができるため、該認識マーク位置
を認識し、設計値との関係を補正計算し、補正計算値を
基に電子部品を組み立てることができる。多数個チップ
の集合体であるシート状態で組立を行うため作業性がよ
い。また、シート状態に設けられた複数の認識マーク間
の距離が大きいため補正計算値の精確性が格段に良くな
る。
The multilayer wiring board according to the present invention is an aggregate (sheet state) of a large number of chips, and the recognition mark provided simultaneously with the wiring layer for each wiring layer is recognized from the surface of the multilayer wiring board. Therefore, the position of the recognition mark can be recognized, the relationship with the design value can be corrected and calculated, and the electronic component can be assembled based on the corrected calculated value. Workability is good because assembly is performed in a sheet state, which is an aggregate of many chips. Further, since the distance between the plurality of recognition marks provided in the sheet state is large, the accuracy of the correction calculation value is significantly improved.

【0019】[0019]

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る多層配線基板の一実施態様を示す
概略上面視図である。
FIG. 1 is a schematic top view showing one embodiment of a multilayer wiring board according to the present invention.

【図2】図1のA−A’断面の概略図である。FIG. 2 is a schematic view of an A-A ′ section of FIG. 1;

【0020】[0020]

【符号の説明】[Explanation of symbols]

1−1,1−2,1−3 第一層認識マーク 1−11,1−22,1−33 第一層認識窓 2−1,2−2,2−3 第二層認識マーク 2−11,2−22,2−33 第二層認識窓 3 第二配線層 4 第一配線層 5 ブレイク溝 6 ガイドピン穴 7 裏面電極穴 8 開口部 1-1, 1-2, 1-3 First-layer recognition mark 1-11, 1-22, 1-33 First-layer recognition window 2-1, 2-2, 2-3 Second-layer recognition mark 2- 11, 22, 22-33 Second layer recognition window 3 Second wiring layer 4 First wiring layer 5 Break groove 6 Guide pin hole 7 Back electrode hole 8 Opening

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 複数個のチップの集合であり部品搭載用
の開口部及び配線層を有する多層配線基板において、各
々の配線層毎に設けられた複数個の認識マークが多層配
線基板の表面から認識することができることを特徴とす
る多層配線基板。
1. A multilayer wiring board, which is a set of a plurality of chips and has an opening for mounting components and a wiring layer, wherein a plurality of recognition marks provided for each wiring layer are arranged from the surface of the multilayer wiring board. A multilayer wiring board characterized by being recognizable.
JP2001025283A 2001-02-01 2001-02-01 Multilayer interconnection board Pending JP2002232094A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001025283A JP2002232094A (en) 2001-02-01 2001-02-01 Multilayer interconnection board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001025283A JP2002232094A (en) 2001-02-01 2001-02-01 Multilayer interconnection board

Publications (1)

Publication Number Publication Date
JP2002232094A true JP2002232094A (en) 2002-08-16

Family

ID=18890305

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001025283A Pending JP2002232094A (en) 2001-02-01 2001-02-01 Multilayer interconnection board

Country Status (1)

Country Link
JP (1) JP2002232094A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006185965A (en) * 2004-12-24 2006-07-13 Kyocera Corp Multiple patterning wiring substrate and electronic device
KR101070916B1 (en) 2006-02-24 2011-10-06 삼성테크윈 주식회사 Board scrip and manufacturing method for semiconductor package using the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006185965A (en) * 2004-12-24 2006-07-13 Kyocera Corp Multiple patterning wiring substrate and electronic device
JP4511336B2 (en) * 2004-12-24 2010-07-28 京セラ株式会社 Multi-cavity wiring board and method for manufacturing electronic device
KR101070916B1 (en) 2006-02-24 2011-10-06 삼성테크윈 주식회사 Board scrip and manufacturing method for semiconductor package using the same

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