JP2002164253A5 - - Google Patents

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Publication number
JP2002164253A5
JP2002164253A5 JP2001250322A JP2001250322A JP2002164253A5 JP 2002164253 A5 JP2002164253 A5 JP 2002164253A5 JP 2001250322 A JP2001250322 A JP 2001250322A JP 2001250322 A JP2001250322 A JP 2001250322A JP 2002164253 A5 JP2002164253 A5 JP 2002164253A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001250322A
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JP2002164253A (ja
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Publication date
Priority claimed from US09/644,959 external-priority patent/US6657849B1/en
Application filed filed Critical
Publication of JP2002164253A publication Critical patent/JP2002164253A/ja
Publication of JP2002164253A5 publication Critical patent/JP2002164253A5/ja
Pending legal-status Critical Current

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JP2001250322A 2000-08-24 2001-08-21 電子部品に埋設するキャパシタ層を形成するために用いる薄い誘電層を備えたキャパシタ材料及びその製造方法 Pending JP2002164253A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/644959 2000-08-24
US09/644,959 US6657849B1 (en) 2000-08-24 2000-08-24 Formation of an embedded capacitor plane using a thin dielectric

Publications (2)

Publication Number Publication Date
JP2002164253A JP2002164253A (ja) 2002-06-07
JP2002164253A5 true JP2002164253A5 (ja) 2006-08-31

Family

ID=24587071

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001250322A Pending JP2002164253A (ja) 2000-08-24 2001-08-21 電子部品に埋設するキャパシタ層を形成するために用いる薄い誘電層を備えたキャパシタ材料及びその製造方法

Country Status (9)

Country Link
US (1) US6657849B1 (ja)
EP (1) EP1191555A3 (ja)
JP (1) JP2002164253A (ja)
KR (1) KR100816626B1 (ja)
CN (1) CN1374666A (ja)
CA (1) CA2354753C (ja)
MY (1) MY134733A (ja)
SG (1) SG115394A1 (ja)
TW (1) TW557463B (ja)

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