JP2002131921A - Irradiation light distributing mechanism and exposure device equipped therewith - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exposure device capable of performing extremely stable exposure processing by preventing the deviation of the angle of a reflection mirror reflecting light and improving a cooling mechanism so that the peeling of a reflection film formed on the reflection mirror may be prevented in an irradiating light distributing mechanism for distributing the light radiated from a light source part included in the exposure device in a specified direction. SOLUTION: This irradiating light distributing mechanism 2 used in the exposure device 1 exposing both surfaces of a base plate W by radiating, with a light having specified wavelength through masks M1 and M2, one surface and the other surface of the base plate W, is equipped with two reflection mirrors (2A and 2B) reflecting the light radiated from the light source part 10, and the angles of the mirrors (2A and 2B) are held to be at a specified angle, and each of the reflection mirrors (2A and 2B) is arranged at a specified position by moving in the horizontal direction or a vertical direction.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an irradiation light distribution mechanism for distributing light emitted from a light source unit to one and the other, and an exposure apparatus having the same, which is used in a double-side exposure apparatus. Things.

[0002]

2. Description of the Related Art Heretofore, there have been proposed exposure apparatuses (hereinafter, simply referred to as "exposure apparatuses") for exposing both sides of a substrate, which are used for manufacturing a printed circuit board or the like, and have various mechanisms. I have. The basic configuration of such an exposure apparatus generally includes a light source unit, an optical system that guides light emitted from the light source unit to a substrate, an exposure processing unit that performs exposure of the substrate, and the exposure of the substrate. A substrate transfer mechanism for carrying in and out of the processing unit.

As a demand for such an exposure apparatus,
There are improvements in operating rates and reductions in running costs.
To meet such demands, Japanese Patent Publication No. 7-78630
Japanese Patent Application Publication No. JP-A-2003-115139 discloses an optical unit for converting light emitted from a light source unit into parallel rays, and a reflecting mirror whose angle can be changed. An exposure apparatus has been disclosed in which the operation rate and the running cost are improved to some extent by performing exposure processing on the image. FIG.
FIG. 1 schematically shows a configuration of a conventional example of the exposure apparatus 11.

[0004] As shown in FIG.
Exposure processing is performed in a state where the substrates W and W and the masks M1 and M2 are held in the vertical direction, respectively. A first exposure processing unit 17 that exposes one surface of the substrate W and a second exposure processing that exposes the other surface Parts 27 are located at the left and right ends of the apparatus housing 80, and each of the masks M held by the mask frames 30, 30, respectively.
1, M2 is located inside with respect to the corresponding substrate W, W,
The substrate W is configured to be exposed by light emitted from the light source unit 10 provided near the center.

The substrates W and W are held by a holder 60 having a suction plate, and the first exposure processing unit 17 and the second
The wafer W is reciprocated to and from the exposure processing unit 27 to perform exposure processing on one surface and the other surface of the substrate W. The light emitted from the light source unit 10 and the light source unit 10 is transmitted to the first light source unit 10.
The angle (reflecting mirror 20A or 20B) of the reflecting mirror for reflecting and distributing toward the first optical path leading to the exposure processing unit 17 or the second optical path leading to the second exposure processing unit 27 can be changed. A possible illumination light distribution mechanism 20 is provided.

As described above, the conventional exposure apparatus 11
By appropriately switching the angle of the reflecting mirror, light is guided toward the first exposure processing unit 17 or the second exposure processing unit 27 through the first optical path or the second optical path, and the light is guided to one surface of the substrate W. The exposure processing of the other surface is configured to be performed separately.

[0007]

However, in such an exposure apparatus 11, switching of the angle of the reflecting mirror (reflecting mirror 20A or 20B) included in the irradiation light distribution mechanism 20 rotates the reflecting mirror. Therefore, the angle of the reflecting mirror is relatively easily shifted, so that the work of correcting the setting position of the reflecting mirror and the angle of the reflecting mirror at the setting position at an appropriate frequency is performed. Needed. In addition, it is relatively difficult to strictly reproduce the angle of the reflecting mirror strictly constant, so that it is difficult to guarantee an extremely stable exposure process.

Further, since the reflecting mirror is arranged near the light source, it is relatively easy to receive the heat generated from the light source, and a cooling mechanism for cooling the reflecting mirror is provided. However, in the conventional irradiation light distribution mechanism in which the angle of the reflecting mirror is switched by rotating the reflecting mirror, the distance between the reflecting mirror and the cooling mechanism is set to be smaller than the turning radius of the reflecting mirror. Therefore, the cooling efficiency of the reflecting mirror was naturally limited. Therefore, when such a conventional exposure apparatus is operated continuously for a relatively long time, the cooling of the irradiation light distribution mechanism is likely to be insufficient,
As a result, there has been a problem that the temperature of the reflecting mirror rises to a relatively high temperature, and the reflecting film formed on the reflecting mirror is easily peeled off.

Further, in the conventional irradiation light distribution mechanism in which the angle of the reflecting mirror is switched by rotating the reflecting mirror, the reflecting mirror is damaged by the influence of vibration generated when rotating. The possibility of doing could not be completely wiped out. Further, when the cumulative time during which the reflector receives ultraviolet rays becomes longer, the vapor deposition material constituting the reflector is photochemically deteriorated, and vibration and insufficient cooling are synergistic there, and the vapor deposition material reflects the reflection. There has been a problem that it is easy to peel off from the mirror substrate.

Therefore, in view of the above-described problems, the present invention provides an irradiation light distribution mechanism for distributing light emitted from a light source unit included in an exposure apparatus in a predetermined direction. An object of the present invention is to provide an exposure apparatus capable of performing an extremely stable exposure process by preventing an angle shift and improving a cooling mechanism to prevent deterioration of a reflecting mirror.

[0011]

In order to solve the above-mentioned problems, the present inventors have proposed an irradiation light distribution mechanism for reflecting light in two predetermined directions by setting the angles of two reflecting mirrors respectively. While keeping the angle constant, the angle was switched to one of the angles, and the irradiation light distribution mechanism for improving the cooling efficiency of the reflecting mirror was studied diligently. As a result, by moving the two reflecting mirrors having a fixed angle in the horizontal direction or the vertical direction, each reflecting mirror can be arranged at a predetermined position where the light emitted from the light source unit is reflected. It has been found that it is possible to improve the cooling efficiency of the reflecting mirror by providing an independent cooling mechanism for the reflecting mirror, and the present invention has been completed.

That is, an irradiation light distribution mechanism according to a first aspect of the present invention for solving the above-mentioned problem is to irradiate one side and the other side of a substrate with light of a predetermined wavelength through a mask. In the irradiation light distribution mechanism used in the exposure apparatus for exposing both sides of the light, the irradiation light distribution mechanism, the light irradiated from the light source unit, a reflecting mirror to reflect one and the other,
It is characterized by comprising a holding unit for holding the angles of these reflecting mirrors at a fixed angle, respectively, and moving means for moving the holding unit in a horizontal direction or a vertical direction.

According to the first aspect, the angle at which the irradiation light distribution mechanism reflects the light emitted from the light source unit is always kept constant, and a stable exposure process can be performed. . Further, since the irradiation light distribution mechanism moves in the horizontal or vertical direction to dispose the reflecting mirror at a predetermined position, the conventional irradiation light distribution mechanism disposes the reflection mirror at a predetermined position by a rotation operation. Dust from the peripheral portion of the irradiation light distribution mechanism can be reduced as compared with the case where the irradiation is performed. In the present invention, the moving means that moves in the horizontal direction or the vertical direction includes movement in the x-axis or y-axis direction performed in a horizontal plane and rotation around the z-axis (rotation angle: θ). , Or z-axis movement performed in a vertical plane.

According to a second aspect of the present invention, in the irradiation light distribution mechanism according to the first aspect, the irradiation light distribution mechanism is provided with a cooling mechanism for cooling a reflecting mirror.

According to a second aspect of the present invention, in addition to the above-described effects, the cooling efficiency can be further improved, and the peeling of the reflecting film formed on the reflecting mirror can be suppressed as low as possible. It becomes possible.

An exposure apparatus according to a third aspect is provided with the irradiation light distribution mechanism according to the first or second aspect, and irradiates one surface and the other surface of the substrate with light of a predetermined wavelength through a mask. An exposure apparatus for exposing both sides of the substrate, wherein the light distributed to the first optical path by the irradiation light distribution mechanism is moved to a first exposure processing position where an exposure processing of one surface of the substrate is performed. A first optical unit for guiding the light, and a second optical processing unit for guiding the light distributed to the second optical path by the irradiation light distribution mechanism to a second exposure processing position where the other surface of the substrate is subjected to the exposure processing.
An optical unit, a transport unit that transports the substrate to each predetermined position, a first exposure processing unit that positions the substrate transported by the transport unit, and performs an exposure process through the first optical unit; The first exposure processing unit reverses the substrate on which one side has been exposed, and transports the substrate by the transport unit.
A second exposure processing section for positioning the transported substrate and performing exposure processing via the second optical means.

According to the third aspect of the present invention, the angle at which the irradiation light distribution mechanism reflects the light emitted from the light source unit is always kept constant, and a stable exposure process can be performed. An exposure apparatus that can further increase the cooling efficiency and can minimize the peeling of the reflection film formed on the reflection mirror as much as possible.

[0018]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, embodiments of the present invention will be described in detail with reference to the drawings. It should be noted that the present invention is not limited to only this embodiment, and can be appropriately changed as long as it is based on the technical idea of the present invention.

[First Embodiment] FIG. 1 schematically shows an exposure apparatus according to a first embodiment of the present invention. As shown in FIG. 1, an exposure apparatus 1 according to the present invention performs an exposure process in a state where substrates W and W and masks M1 and M2 are held by holders 6 and 16, respectively. A first exposure processing section 7 for exposing the substrate W and a second exposure processing section 70 for exposing the other surface of the substrate W are arranged inside the apparatus housing 8.

The masks M1 and M2 held by the mask frames 31 and 31 are disposed outside the corresponding one surface of the substrate W and the other surface of the substrate W, respectively.
The exposure processing is performed by the light from 1.

<< Optical System >> Next, each element constituting an optical system for exposure processing performed by the exposure apparatus according to the present invention will be described.

(Light Source Unit) As shown in FIG. 1, a light source unit 1 serving as an exposure light source is
0 is arranged vertically. The light source unit 10 is not particularly limited, and a light source that can emit light including predetermined ultraviolet light, which is conventionally known in the art, can be used. Such light sources include, for example,
Examples include a low-pressure mercury lamp, a long arc lamp, a short arc lamp, a xenon lamp, an excimer laser, a copper vapor laser, and the like.

The light emitted by the light source unit 10 is selectively distributed and reflected by the irradiation light distribution mechanism 2 toward the first optical path and the second optical path shown in FIG. .

(Irradiating Light Distributing Mechanism) The irradiating light distributing mechanism used in the exposure apparatus according to the present invention is not particularly limited as long as it can stably guide light in a predetermined direction. Good.

As such an irradiation light distribution mechanism, a reflecting mirror for reflecting light emitted from the light source unit is constituted by two reflecting mirrors set at a predetermined angle in advance corresponding to a predetermined optical path. Then, the above-described operation can be realized relatively easily and at low cost. For example, FIG.
(B), the reflecting mirrors 13 and 14 for irradiating light distribution shown in (c).
Any one of 15 can be applied to the irradiation light distribution mechanism according to the present invention, and such irradiation light distribution reflecting mirrors 13, 14, 15 can be appropriately used as needed. it can.

The irradiation light distribution reflecting mirror 13 shown in FIG.
Is such that a reflecting mirror 13A and a reflecting mirror 13B are arranged on a pedestal S1.
A cooling device C is provided in the vicinity of each of the side surfaces. Then, the light emitted from the light source unit 10 is reflected toward a first optical path and a second optical path which are opposite to each other and are directed to the left and right ends of the exposure apparatus 1.

In FIG. 2A, each of the reflecting mirrors 13A and 13B is configured to have a required angle α with respect to the pedestal S1. Note that, in order to efficiently cool the reflecting mirrors 13A and 13B by blowing air from the cooling device C, the lower portions of these reflecting mirrors may be appropriately hollowed as shown by phantom lines. Further, if necessary, the angle α formed by the reflecting mirrors 13A and 13B with respect to the base S1 is:
You may comprise so that it can be set variably.

The irradiation light distribution reflecting mirror 14 shown in FIG.
Is arranged such that the reflecting mirror 14A and the reflecting mirror 14B have an angle β with respect to the pedestal S2, and a cooling device C is provided in the vicinity of each side surface of the reflecting mirror 14A and the reflecting mirror 14B. It is configured. Then, the light emitted from the light source unit is reflected toward the first optical path and the second optical path in a direction crossing each other toward the inside of the exposure apparatus 1.

The reflecting mirrors 14A and 14A are also blown by the cooling device C in the same manner as the reflecting mirror 14 shown in FIG.
In order to efficiently cool B, as shown by the phantom line, the lower portion of these reflecting mirrors may be appropriately hollowed. Further, in the irradiation light distribution reflecting mirror 14, similarly to the irradiation light distribution reflection mirror 13 shown in FIG. 2A, if necessary, the reflection mirrors 14A and 14B are connected to the pedestal S2.
May be configured to be variably set.

The reflecting mirror 15 for irradiating light shown in FIG.
Are arranged such that the reflecting mirror 15A and the reflecting mirror 15B have an angle γ with respect to the pedestal S3.
5A, a cooling device C is provided near each side surface of the reflecting mirror 15B.
Is provided. Then, it has a function of reflecting light emitted from the light source unit toward the first optical path and the second optical path in parallel directions toward the outside of the exposure apparatus.

In the irradiation light distribution reflecting mirror 15 as well, similarly to the irradiation light distribution reflection mirrors 13 and 14 shown in FIGS. In order to cool the reflecting mirrors 15A and 15B efficiently, the lower portions of the reflecting mirrors may be appropriately hollowed as shown by phantom lines. Further, in the irradiation light distribution reflecting mirror 15, as necessary, similarly to the irradiation light distribution reflection mirrors 13 and 14 shown in FIGS. 2A and 2B, the reflection mirrors 15A and 15B. Is an angle γ with respect to the base S3.
However, it may be configured such that it can be set variably.

The setting of the predetermined angle of the reflecting mirror performed by the irradiation light distribution mechanism 2 included in the exposure apparatus 1 according to the present invention, as shown in FIG. The reflecting mirrors 2A (13A, 14A, 1A) reflecting toward the system
By moving the position 5A) and the position of the reflecting mirror 2B (13B, 14B, 15B) that reflects the light toward the second optical system in the horizontal direction (x-axis or y-axis direction), the reflection is achieved. The mirror 2A or 2B can be switched by setting it at a predetermined position. In FIG. 1, the irradiation light distribution mechanism 2
Has shown the case where the reflection mirror 2A or the reflection mirror 2B is switched in the horizontal direction (x-axis or y-axis direction), but the present invention is not limited to only such an embodiment. Absent.

For example, the irradiation light distribution mechanism 2 shown in FIG. 1 is rotated around the vertical direction (z-axis direction) to
Alternatively, the reflecting mirror 2B is configured to be switched, or an optical system that guides the light emitted from the light source unit 10 in the horizontal direction is provided, and the light from this optical system is vertically emitted by the irradiation light distribution mechanism. (Z-axis direction)
Switching between the two reflecting mirrors included in the irradiation light distribution mechanism is performed by moving in the vertical direction (z-axis direction), or rotating in the horizontal direction (x-axis or y-axis direction) or in the vertical direction. (Here, the x-axis direction, the y-axis direction, and the z-axis direction are referred to as “linear directions”).

As described above, by setting the driving method of the irradiation light distribution mechanism 2 to the operation in the horizontal direction or the vertical direction,
The irradiation light distribution mechanism 2 according to the present invention can prevent the generation of a spiral airflow, as compared with the conventional driving method of the irradiation light distribution mechanism 20 which is only a rotation operation. Can be kept lower.

Incidentally, a moving mechanism (not shown) for moving the pedestal S1 (S2, S3) includes the reflecting mirror 2 shown in FIG.
There is no particular limitation as long as A and 2B can be moved with required accuracy. Such a moving mechanism includes a servomotor or a stepping motor for driving the LM guide and the feed screw. Further, such a moving mechanism is provided so that the light emitted from the light source does not directly hit the pedestal S1 (S2,
It is desirable to be disposed below S3) or shielded by a cover (not shown).

The light emitted from the light source unit 10 is
In the case where light is selectively distributed and reflected toward the first optical system, the irradiation light distribution mechanism 2 is directed to a predetermined position on the right side in FIG. 1 by a driving mechanism (not shown) provided in the irradiation light distribution mechanism 2. The light is reflected toward the optical adjustment means 3 included in the first optical means located on the left side of FIG.

When light emitted from the light source unit 10 is selectively distributed and reflected toward the second optical system,
The irradiation light distribution mechanism 2 is moved toward a predetermined position on the left side of FIG. 1 by a driving mechanism (not shown) provided in the irradiation light distribution mechanism 2, and the second optical means located on the right side of FIG. The light is reflected toward the optical adjustment means 3 included in.

The irradiation light distribution mechanism 2 configured as described above
As shown in FIG. 1, since the reflecting mirrors 2A and 2B that reflect the light emitted from the light source unit 10 toward the first optical path and the second optical path are provided independently of each other, The reflecting mirrors 2A and 2B can be cooled independently. Thus, it is possible to prevent peeling of the film constituting the mirror surface formed on the surfaces of the reflecting mirrors 2A and 2B by vapor deposition or the like as much as possible.

When the irradiation light distribution reflecting mirrors 14 and 15 shown in FIGS. 2B and 2C are applied to the exposure apparatus according to the present invention, the irradiation light distribution mechanism 2 is used. Similarly to the above, each irradiation light distribution mechanism is moved in the horizontal direction or the vertical direction, and the reflection mirror of each irradiation light distribution mechanism is arranged at a predetermined position.

<< Cooling Mechanism >> FIGS. 2 (a), (b),
In the irradiation light distribution reflecting mirrors 13, 14, and 15 shown in (c), respective reflections for reflecting light emitted from the light source unit 10 toward the first optical path and the second optical path. Mirrors 13A and 13B, reflecting mirrors 14A and 14B, or reflecting mirrors 15A and 15B are provided independently of each other.
B or the reflecting mirrors 15A and 15B can be efficiently cooled by a cooling device described later. Thus, the reflecting mirrors 13A and 13B, the reflecting mirrors 14A and 1
It is possible to prevent peeling of the film constituting the mirror surface formed by vapor deposition or the like on the surface of 4B or the reflecting mirrors 15A and 15B as much as possible.

As shown in FIGS. 2A, 2B and 2C, the cooling device C used in the exposure apparatus according to the present invention has reflecting mirrors 13A and 13B, reflecting mirrors 14A and 14B,
Alternatively, it is possible to dispose it near the reflecting mirrors 15A and 15B. That is, in the irradiation light distribution mechanism according to the present invention, as described above, the plurality of reflection mirrors arranged at different angles from each other are, for example, irradiation light distribution reflection mirrors fixed on the same pedestal. In order to switch the angle of the irradiation light distribution reflecting mirror configured as described above by moving the irradiation light distribution reflecting mirror in the horizontal direction or the vertical direction, the cooling device C is provided with the reflecting mirrors 13A and 13A.
B, the reflecting mirrors 14A and 14B, or the reflecting mirrors 15A and 15B.

In order to maintain a constant cooling efficiency, such a cooling device C has reflecting mirrors 13A and 13B, reflecting mirrors 14A and 14A as shown in FIGS. 2 (a), 2 (b) and 2 (c). It is preferable to be fixed at a predetermined position on the same pedestal S1, S2, S3 as 14B or the reflecting mirrors 15A and 15B.

Then, by blowing air from the cooling device C,
Reflectors 13A and 13B, Reflectors 14A and 14
In order to more efficiently cool B or the reflecting mirrors 15A and 15B, as shown by phantom lines in FIGS. 2 (a), (b) and (c), the lower portions of these reflecting mirrors are appropriately hollowed out. You may comprise so that it may become. Further, if necessary, the reflecting mirrors 13A and 13B, the reflecting mirrors 14A and 14B, or the reflecting mirrors 15A and 15B are connected to the respective pedestals S1, S
2. It is also possible to configure so that angles, α, β, and γ formed with respect to S3 can be variably set.

The distance between the cooling device C used in the cooling mechanism according to the present invention and the reflecting mirrors 13A and 13B, the reflecting mirrors 14A and 14B, or the reflecting mirrors 15A and 15B is as follows.
It is not particularly limited, and does not hinder the operation of the irradiation light distribution mechanism, and reflects the reflection mirrors 13A and 13B,
Any material that satisfies the condition not to come into contact with the reflecting mirrors 14A and 14B or the reflecting mirrors 15A and 15B may be used. Further, as such a cooling device C, a conventionally known cooling device in the field can be applied as it is.

In the exposure apparatus according to the present invention, the light emitted from the irradiation light distribution mechanism 2 is included in the first optical means or the second optical means in order to further increase the resolution of the exposure processing. Are incident on optical adjusting means 3 and 3 for forming light having a predetermined illuminance distribution. The optical adjustment means 3, 3
Is configured with both or one of a focusing optical system and a polarizing optical system conventionally known in the art.

The light emitted from the irradiation light distribution mechanism 2 is formed by the optical adjustment means 3 into light having a predetermined illuminance distribution and / or a predetermined polarization. , The first optical means, and the plane optical mirrors X1, X1, X2, X included in each of the second optical means
2, and the mask M reflected by the curved reflecting mirror 41
Irradiation is performed on the substrate W via 1 and M2. The angle of each of the plane reflecting mirrors X1, X1, X2, X2 and the curved reflecting mirror is fixed to be constant. Therefore, the light guided through the optical adjustment unit can be more stably irradiated on the substrates W and W via the masks M1 and M2. Note that the first optical path and the second optical path shown in FIG. 1 include elements of the same optical system and will be described simultaneously.

(Optical Adjusting Means) The optical adjusting means included in the optical means used in the exposure apparatus according to the present invention adjusts the light emitted from the light source unit 10 and has a desired illuminance distribution or a desired illuminance distribution. It is shaped into light having illuminance distribution and polarized light (linearly polarized light, elliptically polarized light, circularly polarized light, etc.),
It is composed of only a focusing optical system or a focusing optical system and a polarizing optical system.

The focusing optical system may be constituted by a fly-eye lens and / or a cylindrical lens conventionally known in the art, if necessary.

As the polarizing optical system, it is convenient to use a columnar polarizing prism conventionally known in the art from the viewpoint of balancing cost and efficiency.

As described above, the light emitted from the light source unit 10 is adjusted to light having a desired illuminance distribution and polarization by the optical adjusting means 3 and 3, and then the plane reflecting mirrors X1, X1 and X
2. The light is reflected by X2 and further incident on the relatively large curved reflecting mirrors 41, 41, whereby the light is finally converted into parallel rays, and each of the first exposure processing unit 7 and the second exposure processing unit 70 Sent to

From the light source section 10 to the optical adjustment means 3,
Elements of the optical system up to 3 (including a fly-eye lens, a cylindrical lens, a columnar polarizing prism, and the like) are housed inside the apparatus housing 8 so that extra light does not leak outside. More preferably, between the plane reflecting mirrors X1 and X2 included in the first optical path and the optical adjustment means 3 and 3 (including a fly-eye lens, a cylindrical lens, a columnar polarizing prism, and the like), and Light is emitted between the plane reflecting mirrors X1 and X2 included in the two optical paths and the optical adjustment means 3 and 3 (including a fly-eye lens, a cylindrical lens, a columnar polarizing prism, and the like) or from the light source unit 10. The emission unit (not shown) is provided with an openable and closable shutter mechanism (not shown).

In the exposure apparatus 1 shown in FIG. 1, when performing exposure processing on the substrate W in the first exposure processing section 7,
The irradiation light distribution mechanism 2 moves rightward in FIG. 1 along the arrow, and a shutter mechanism (not shown) provided at a lower part of the light source unit 10 is opened, and the light emitted from the light source unit 10 is turned on in FIG. The light is reflected toward the left optical adjustment unit 3, and the light from the light source unit 10 is provided to the first exposure processing unit 7. At this time, a shutter mechanism (not shown) is in a closed state so that excess light does not leak to the second exposure processing unit 70.

On the other hand, when performing exposure processing on the substrate W in the second exposure processing section 70, the irradiation light distribution mechanism 2 moves leftward in FIG. The shutter mechanism (not shown) provided in the optical system is opened, and the light emitted from the light source unit 10 is transmitted to the optical adjustment unit 3 on the right side in FIG.
And a shutter mechanism (not shown) is opened,
Light from the light source unit 10 is given to the substrate W to the second furnace rear part 70. At this time, a shutter (not shown) is in a closed state.

<< Transport System >> The substrates W, W are suction surfaces 6a, 60a of the holders 6, 16 connected to the vacuum pump, respectively.
After that, the space between the substrates W, W and the suction surfaces 6a, 60a is formed in a negative pressure state, and is held in close contact. The holders 6 and 16 included in the first exposure mechanism 9 and the second exposure mechanism 90 respectively move in a direction perpendicular to the plane of FIG. 1 to carry in or carry out the substrates W and W. It is configured to reciprocate on the same straight line between a standby station (not shown) and each of the first exposure processing section 7 and the second exposure processing section 70.

In the first embodiment of the present invention shown in FIG. 1, one surface of the substrate is exposed by the first exposure processing unit, and then the substrate is reversed by the transport system to be transferred to the second exposure processing unit. The substrate is transported, and the other surface of the substrate is exposed by the second exposure processing unit. However, the present invention is not limited to only such a transport system. The present invention can be appropriately modified as long as the effects of the present invention are achieved, such as when a transport system provided separately from the above is used, or when a reversing machine for reversing the substrate is used.

In order to suppress the adhesion of foreign matter to the substrate in each of the first exposure mechanism 9 and the second exposure mechanism 90, the substrates W, W and the masks M1, M2 are placed on the holders 6, 16, respectively. It is preferable that the exposure processing is performed in a state of being held vertically.

As described above, in the exposure apparatus 1 according to the present invention, since the movement of the substrates W, W is reciprocated on the same straight line, the holders 6, 16 of the substrates W, W The moving time can be further shortened, and the tact time of the exposure processing of the substrates W and W can be further shortened.
In addition, since the configuration of the drive system to which the holders 6 and 16 for transporting the substrates W and W are connected can be further simplified, the manufacturing cost of the exposure apparatus 1 can be reduced.

[Second Embodiment] The preferred configuration of the exposure apparatus of the present invention has been described above with reference to the first embodiment. However, the present invention is also applicable to the configuration of a conventional exposure apparatus. It is also possible to apply.

For example, the irradiation light distribution mechanism according to the present invention can be applied to the conventional exposure apparatus 11 shown in FIG. That is, the conventional exposure apparatus 11 shown in FIG.
Can be applied in place of the irradiation light distribution mechanism 20 according to the present invention as shown in FIG. 2 (c). With this configuration, the light source unit 10
Although the work of switching the angle of the reflecting mirror that reflects the light emitted from the mirror has been performed by rotating the irradiation light distribution mechanism 20 about the rotation axis (the one-dot chain line shown in FIG. 3). On the other hand, since the irradiation light distribution mechanism can be moved by moving the irradiation light in the horizontal direction or the vertical direction, the angle of the reflecting mirror is always fixed at a constant value, and the exposure process can be performed more stably. Will be able to As described above, the present invention can be applied to the conventional exposure apparatus.

Although the preferred embodiment of the present invention has been described above, the exposure apparatus according to the present invention is not limited to only such an embodiment, and the exposure apparatus according to the present invention is not limited to the above. It can be changed as appropriate. For example, the exposure apparatus according to the present invention can be configured by connecting to peripheral devices, which can be easily realized by those skilled in the art, and can be automatically configured based on a predetermined program set in a computer system. It can be configured to perform the exposure processing in an appropriate manner.

[0061]

The present invention configured as described above has the following effects. According to the first aspect of the present invention, the angle at which the irradiation light distribution mechanism reflects the light emitted from the light source unit is always kept constant, and stable exposure processing can be performed. Further, since the irradiation light distribution mechanism moves in the horizontal or vertical direction to dispose the reflecting mirror at a predetermined position, the conventional irradiation light distribution mechanism disposes the reflection mirror at a predetermined position by a rotation operation. Dust from the peripheral portion of the irradiation light distribution mechanism can be reduced as compared with the case where the irradiation is performed.

According to the second aspect of the present invention, in addition to the above-described effects, the cooling efficiency can be further improved, and the peeling of the reflecting film formed on the reflecting mirror can be suppressed as low as possible. it can.

According to the third aspect of the present invention, the angle at which the irradiation light distribution mechanism reflects the light irradiated from the light source unit is always kept constant, and a stable exposure process can be performed. It is possible to provide an exposure apparatus capable of further improving the cooling efficiency and suppressing the peeling of the reflection film formed on the reflection mirror as low as possible.

[Brief description of the drawings]

FIG. 1 is a front view schematically showing a configuration of an exposure apparatus according to a first embodiment of the present invention.

FIG. 2 is a perspective view schematically showing an example of an irradiation light distribution mechanism applied to the exposure apparatus according to the present invention.

FIG. 3 is a front view schematically showing a configuration of a conventional example of an exposure apparatus.

[Explanation of symbols]

1 Exposure apparatus of the first embodiment of the present invention, 11
Example exposure apparatus, 2 example irradiation light distribution mechanism according to the present invention, 2A, 20A, 2B, 20B reflecting mirror, 3 optical adjustment means, 13, 14, 15 each of irradiation light distribution mechanism according to the present invention. Reflection mirror for irradiating light used, 13A, 1
3B, 14A, 14B, 15A, 15B The reflecting mirrors included in the reflecting mirror for irradiation light distribution used in the irradiation light distribution mechanisms 13, 14, 15 according to the present invention, respectively. 4 First optical means, 5 Second optical means , 6,16,60 Holder, 6a
Suction plate included in holder 6, 60a Suction plate included in holder 16, 7, 17 First exposure processing unit, 70, 27
Second exposure processing section, 8,80 apparatus housing, 9 first exposure mechanism, 90 second exposure mechanism, 10 light source section, C
A cooling device, a mask provided in the M1 first exposure processing unit,
M2 Mask provided in second exposure processing unit, 30, 31
Mask frame, X1, X2 plane reflecting mirror, 41 curved reflecting mirror, W substrate

Claims (3)

[Claims] 1. An irradiation light distribution mechanism used in an exposure apparatus for exposing both sides of a substrate by irradiating one side and the other side of the substrate with light of a predetermined wavelength through a mask. The splitting mechanism includes a reflecting mirror that reflects light emitted from the light source unit to one and the other, a holding unit that holds the angles of these reflecting mirrors at fixed angles, and horizontally holding the holding unit. And a moving means that moves in a vertical or vertical direction. 2. The irradiation light distribution mechanism according to claim 1, wherein the irradiation light distribution mechanism is provided with a cooling mechanism for cooling a reflecting mirror. 3. An irradiation light distribution mechanism according to claim 1, wherein one side and the other side of the substrate are irradiated with light of a predetermined wavelength via a mask to expose both sides of the substrate. An exposure apparatus for guiding light, which is distributed to a first optical path by the irradiation light distribution mechanism, to a first exposure processing position where exposure processing of one surface of the substrate is performed; A second optical unit that guides the light distributed to the second optical path by the irradiation light distribution mechanism to a second exposure processing position where exposure processing of the other surface of the substrate is performed; The transporting means for transporting and the substrate transported by the transporting means are positioned, and the first
A first exposure processing section for performing exposure processing via optical means, and the substrate exposed on one side thereof by the first exposure processing section is inverted, transported by the transport means, and the transported substrate is positioned. And a second exposure processing section for performing exposure processing via the second optical means.