JP2002122882A - Thin film transistor liquid crystal display device and image display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a thin film transistor liquid crystal display device in which generation of corrosion caused by electric field can be suppressed at the connecting electrodes connected to inspection TFTs and a black matrix and an image display device using the above device. SOLUTION: The liquid crystal display device is made by hermetically sealing a liquid crystal between glass substrates using sealing material 11. On one of the glass substrates, plural gate wirings 2a, plural source wirings 5a, plural thin film transistors 16, pixel electrodes 8a, inspection thin film transistors 22b and inspection wirings (2b and 2c through 2e) are provided. The wirings (2c through 2e) and the transistors 22b are connected through connection electrodes 8b and the sealing material 11 is arranged to prevent the contact between the electrodes 8b and the liquid crystal.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film transistor liquid crystal display device in which a test thin film transistor is connected to a gate wiring and a source wiring.

[0002]

2. Description of the Related Art In recent years, liquid crystal display devices have been used as information terminals such as personal computers and mobile phones, and as display devices such as viewfinders for video cameras and digital cameras, and their development and commercialization have been actively pursued. I have. In particular, a thin film transistor liquid crystal display device (hereinafter, referred to as a “TFT liquid crystal display device”) driven by a thin film transistor (hereinafter, referred to as a “TFT”) has a feature that high contrast and stable and uniform display can be obtained. Demand is growing.

Next, a conventional TFT liquid crystal display device will be described. First, a manufacturing process of a conventional TFT array substrate will be described with reference to FIG. FIG. 4 is a cross-sectional view illustrating a configuration of a pixel portion of a conventional TFT liquid crystal display device. First, a plurality of gate wirings 2a are formed on a glass substrate 1a using a metal such as aluminum or chromium. The gate wiring 2a extends in the row direction. Next, a silicon nitride film 3 functioning as a gate insulating film is formed on the gate wiring 2a. Further, a semiconductor film 4 whose resistivity changes according to the potential of the gate electrode to make the TFT function as a switch, and an n + semiconductor film 14 for making ohmic contact between the semiconductor film 4 and the source electrode and the drain electrode are successively formed thereon. And a pattern composed of the semiconductor film 4 and the n + semiconductor film 14 is formed.

After that, a source electrode 5a and a drain electrode 5b are formed with a conductive material such as titanium or aluminum. At this time, a source wiring connected to the source electrode 5a is formed at the same time, and the source wiring extends in the column direction. Further, as shown in FIG. 4, using the source electrode 5a and the drain electrode 5b as a mask,
A part of the n + semiconductor film 14 and the semiconductor film 4 existing between b is removed by etching. Next, the protective insulating film 6
Then, an opening 7 is formed in the protective insulating film 6 on the drain electrode 5b so that a part of the drain electrode 5b is exposed. The pixel electrode 8a is formed so as to be connected to the drain electrode 5b through the opening 7. Through a series of these steps, a TFT array substrate is completed.

On the other hand, a black matrix 9 made of chromium is provided on a glass substrate 1b serving as a color filter substrate.
The color filter 13 and the transparent electrode 10 are sequentially formed. Thereafter, an alignment film (not shown) is printed on the respective sides of the TFT array substrate and the color filter substrate obtained above, and a seal pattern made of an insulating resin is printed. The spacer member is dispersed, and the two substrates are attached to each other. The seal pattern is solidified by giving a temperature of about 200 ° C.

Next, the bonded substrates are cut and separated into a plurality of display devices. Each display device is in a state where its periphery is surrounded by a sealing material (not shown). One or two openings (not shown) are provided in the periphery, and a liquid crystal material is vacuum-injected from these openings. After the injection, the opening is closed with a sealing resin. 12
Indicates a liquid crystal. Further, in the case of a transmission type liquid crystal display device, TF
A polarizing plate is attached to each of the T array substrate and the color filter substrate, and in the case of a reflection type liquid crystal display device, to the color filter substrate. Finally, image evaluation is performed to determine the quality of the obtained TFT liquid crystal display device.

Regarding the image evaluation of a TFT liquid crystal display device,
This will be described with reference to FIG. FIG. 5 is a diagram schematically showing a wiring configuration of the TFT liquid crystal display device shown in FIG. As shown in FIG. 5, the TFT liquid crystal display device has a configuration in which an inspection can be performed by sending an inspection signal from the inspection wiring (2b to 2g). The gate line 2a and the source line 5a are connected to inspection lines (2b to 2g) via inspection TFTs 22a and 22b, respectively. The inspection wiring (2b to 2g) is connected to the inspection pad electrode 24. The supply of a test signal from the outside is performed by bringing a probe needle (not shown) into contact with the test pad electrode 24. The inspection signal is supplied to the inspection TFTs 22a and 22a.
b, an ON signal, a signal to be supplied to the transparent electrode 10 on the color filter side, even and odd scanning signals, and R, G, B data signals.

First, by sending an ON signal from the test wiring 2b to the test TFTs 22a and 22b, the test TF
T22a and 22b are turned on. Next, a scanning signal is supplied from the inspection wiring (2f, 2g) to the gate wiring 2a via the inspection TFT 22a. Inspection wiring (2
From c to 2e), a data signal is supplied to the source line 5a via the inspection TFT 22b. And the gate wiring 2
a, the pixel section 2 at the intersection thereof via the source line 5a
1 is supplied with a data signal. The pixel unit 21 includes a TFT and a pixel electrode, and a data signal is supplied to the pixel electrode via the TFT.

As a result, when a defective TFT exists, no signal is normally supplied to the pixel electrode in that portion, and the pixel electrode is recognized as a point defect. If the gate wiring 2a and the source wiring 5a are disconnected, no signal is supplied after the disconnection, and the display on the wiring becomes abnormal and is recognized as a disconnection. After the inspection is completed, the inspection TFTs 22a, 22
An off signal is supplied from the outside to the gate electrode b through the inspection wiring 2b. In other words, the gate wiring 2a and the source wiring 5a are electrically separated from the inspection wirings 23a and 23b, and the gate wiring and the source wiring are all separated.

Thereafter, an actual driving scanning signal output IC
26a and a data signal output IC 26b are mounted, and an image is displayed by inputting a different signal from each IC to each of the gate wiring 2a and the source wiring 5a. 27 indicates an image display area.

FIG. 6 is a diagram showing a cross-sectional structure of a portion a indicated by a dotted line in FIG. Specifically, inspection wiring 2
FIG. 6 is a diagram showing a cross section of a connection portion between c, 2d, and 2e and the inspection TFT 22b shown in FIG. Inspection wiring 2c, 2
d and 2e are formed by the same process using the same material as the gate wiring 2a. The R, G, and B data signals are supplied to the inspection wires 2c, 2d, and 2e as described above. The drain electrode 5c of the inspection TFT is connected to the inspection wiring 2c via the connection electrode 8b, and is formed of the same material as the source wiring 5a shown in FIGS.
The drain electrode 5c is covered with an insulating film (not shown) so as not to contact the liquid crystal. The connection electrode 8b is formed of the same material and in the same process as the pixel electrode shown in the pixel section 21 shown in FIG. Reference numeral 11 denotes a sealing material for sealing the liquid crystal 12.

[0012]

As shown in FIG. 6, the drain electrode 5 is provided on the upper surface (upper layer) of the connection electrode 8b.
Unlike the case c, no insulating film is provided, and the film is exposed. Therefore, the connection electrode 8b is in contact with the liquid crystal. Further, a black matrix 9 and a transparent electrode 10 are present on the glass substrate 1b at a position facing the connection electrode 8b. Therefore, the black matrix 9, the transparent electrode 10, and the connection electrode 8b naturally have different potentials.

This potential difference generates an electric field between the black matrix 9 and the connection electrode 8b and between the transparent electrode 10 and the connection electrode 8b. For this reason, electric charges are exchanged via ions existing in the liquid crystal 12, which causes a problem that electrolytic corrosion occurs in the black matrix 9 and the connection electrode 8b.

An object of the present invention is to provide a thin film transistor liquid crystal display device capable of suppressing the occurrence of electric field corrosion in a connection electrode and a black matrix connected to a test TFT, and an image display device using the same.

[0015]

In order to achieve the above object, a first embodiment of a thin film transistor liquid crystal display device according to the present invention comprises a liquid crystal sealed between opposing glass substrates with a sealing material. On a surface of the substrate facing the other glass substrate, a plurality of gate wirings arranged in a row direction, a plurality of source wirings arranged in a column direction,
A plurality of thin film transistors and pixel electrodes arranged at each intersection of the gate wiring and the source wiring; a thin film transistor for inspection connected to the gate wiring or the source wiring; and a plurality of inspections for sending an inspection signal to the thin film transistor for inspection. And at least a part of the inspection wiring and the inspection thin film transistor are connected via the connection electrode, and the sealant is arranged so as to prevent contact between the connection electrode and the liquid crystal. Features.

According to this configuration, since the connection electrode cannot directly contact the liquid crystal, it is possible to prevent the transfer of charges between the black matrix and the transparent electrode on the color filter substrate side and the connection electrode on the TFT array substrate side. Therefore, it is possible to suppress the occurrence of electrolytic corrosion, which is a problem in the conventional TFT liquid crystal display device.

In the first aspect, the gate wiring and the inspection thin film transistor are connected via the second connection electrode, and the contact between the second connection electrode and the liquid crystal is also prevented by the sealing material. preferable.

Further, in the first aspect, the sealing material is a connection electrode (or a connection electrode and a second connection electrode).
It is preferably arranged to be in contact with In such a case, it is possible to suppress moisture or dust from entering the connection electrode from the outside, and it is possible to enhance the reliability of the TFT liquid crystal display device.

The first aspect is that the connection electrode (or the connection electrode and the second connection electrode) is formed of the same material as the pixel electrode in the same step, and is formed of a metal material containing aluminum as a main component. It is effective for.

Further, in order to achieve the above object, a second aspect of the thin film transistor liquid crystal display device according to the present invention is as follows.
The liquid crystal is sealed with a sealing material between the opposing glass substrates, and a plurality of gate wirings arranged in a row direction and arranged in a column direction on a surface of one glass substrate facing the other glass substrate. A plurality of source wirings, a plurality of thin film transistors and pixel electrodes arranged at respective intersections of the gate wiring and the source wiring, an inspection thin film transistor connected to the gate wiring or the source wiring, and an inspection thin film transistor for the inspection. At least a plurality of inspection wirings for transmitting signals, and a black matrix and a transparent electrode are provided at least on a surface of the other glass substrate facing one glass substrate, and a part of the inspection wirings is provided. Alternatively, the whole and the thin film transistor for inspection are connected via a connection electrode, and the connection electrode is formed of a black matrix and a transparent electrode. And it is located on the peripheral edge of the glass substrate than frequency.

According to this configuration, the distance between the black matrix and the transparent electrode on the color filter substrate side and the connection electrode on the TFT array substrate side can be increased, and the electric field therebetween can be weakened. Therefore, it is possible to suppress the movement of electric charges, and in this mode, it is also possible to suppress the occurrence of electric field corrosion which has been a problem in the conventional TFT liquid crystal display device.

In the second aspect, the gate wiring and the inspection thin-film transistor are connected via the second connection electrode, and the second connection electrode is also located on the outer peripheral side of the glass substrate with respect to the black matrix and the transparent electrode. Preferably.

Further, an image display device according to the present invention is characterized in that it has a display unit constituted by the above-mentioned thin film transistor liquid crystal display device. Therefore, in the image display device according to the present invention, since the occurrence of electric field corrosion in the display portion is suppressed, the durability of the device itself is improved.

[0024]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a TFT liquid crystal display device of the present invention will be described in detail with reference to the drawings.

FIGS. 1 and 2 are plan views partially showing an example of the TFT liquid crystal display device of the present invention. FIG.
The TFT liquid crystal display device of the present invention shown in FIG.
Are manufactured through the same steps as those of the conventional TFT liquid crystal display device shown in FIG. 1, and the wiring configuration is the same as that shown in FIG.
FIG. 1 shows a portion corresponding to the portion b in FIG. 5, that is, a connection portion between the inspection wiring for supplying a data signal and the inspection TFT. In FIG. 2, a portion corresponding to the portion c in FIG. 5,
That is, a connection portion between the inspection wiring for supplying the scanning signal and the inspection TFT is shown. FIG. 3 is a cross-sectional view partially showing the structure of the TFT liquid crystal display device of the present invention, and shows a cross section taken along line AA in FIG.

As shown in the examples of FIGS. 1 to 3, particularly the example of FIG. 3, the TFT liquid crystal display device of the present invention comprises a liquid crystal 12 sealed with a sealing material 11 between glass substrates (1a, 1b) facing each other. It is configured. The glass substrate 1a forms a TFT array substrate, and the glass substrate 1b forms a color filter substrate. In FIG. 3, reference numeral 3 denotes a gate film formed of a silicon nitride film, 6 denotes a protective insulating film formed of a silicon nitride film, and 7 denotes an opening for conduction provided in various insulating films. .

In the TFT liquid crystal display device of the present invention, the surface 15a of one glass substrate 1a shown in FIG. 3 facing the other glass substrate 1b is arranged in a row direction as shown in FIGS. A plurality of gate wirings 2a arranged
A plurality of source lines 5a arranged in the column direction; a plurality of TFTs 16 and pixel electrodes 8a arranged at intersections of the gate lines 2a and the source lines 5a;
Alternatively, the inspection TFT 22 connected to the source wiring 5a
a, 22b, and at least test wirings (2b to 2g) for sending a test signal to the test TFT.

The other glass substrate 1b shown in FIG.
In FIG. 3, at least a black matrix 9 and a transparent electrode 10 are provided on a surface 15b facing one glass substrate 1a. 1 and 2, only the periphery (9a, 9b) of the black matrix 9 is shown, and the formation region extends in the direction of the arrow. 4
Indicates a semiconductor film.

In this example, the inspection wirings (2b to 2g) are formed of the same material and in the same process as the gate wiring 2a. Inspection wiring 2b among inspection wirings (2b to 2g)
Outputs an ON signal of the inspection TFT (FIGS. 1 and 2). R, G, B for the inspection wirings 2c, 2d, 2e
Is output (FIG. 1). Inspection wiring 2f,
Even and odd scan signals are output to 2g (FIG. 2).

In the present invention, inspection wiring (2b to 2g)
A part or all of the TFT is connected to the inspection TFT via the connection electrode 8b.
22a and 22b. In this example, the inspection wiring 2
c to 2e are connected to the drain electrode 5c of the inspection TFT 22b via the connection electrode 8b (FIG. 1).
f and 2g are connected to the drain electrode 5c of the inspection TFT 22a via the connection electrode 8b (FIG. 2). Although an insulating film is provided on the surface of the drain electrode 5c shown in FIGS. 1 to 3, the insulating film is not provided on the surface of the connection electrode 8b. The drain electrode 5c and the source electrode 5d of the inspection TFTs 22a and 22b are formed of the same material and in the same process as the source wiring 5a.

In this example, the inspection TFT 22b is connected to the source wiring 5a (FIG. 1), and the inspection TFT 22a
Are connected to the gate wiring 2a (FIG. 2). Gate wiring 2
Since the electrode of the inspection TFT 22a connected to the gate electrode 2a is formed simultaneously with the source wiring 5a, the connection between the inspection TFT 22a and the gate wiring 2a is performed via the second connection electrode 8c as shown in FIG. ing. Second connection electrode 8c
Is formed in the same manner as the connection electrode 8b, and no insulating film is provided on the surface of the second connection electrode 8c.

When electric charges are exchanged between the liquid crystal and the connection electrode 8b and the second connection electrode 8c, electric field corrosion occurs as described above. Therefore, the TFT liquid crystal display device of the present invention has a first mode (FIGS. 1 to 3) in which the sealant 11 is arranged so as to prevent contact between the connection electrode 8b and the second connection electrode 8c and the liquid crystal. The connection electrode 8b and the second connection electrode 8c are located on the glass substrate (1) more than the region where the black matrix 9 and the transparent electrode 10 are formed.
It has one or both of the second aspect (FIGS. 1 to 3) arranged on the peripheral side of a and 1b).

In this example, the TFT liquid crystal display device includes both the first mode and the second mode. However, the present invention is not limited to this example, and TF
The T liquid crystal display device may include only one of the first mode and the second mode. When the second connection electrode 8c is not provided, only the connection electrode 8b may be considered.

In this embodiment, as shown in FIGS. 1 to 3, the sealing material 11 is arranged so as to be in contact with the connection electrode 8b and the second connection electrode 8c. For this reason, the contact between the connection electrode 8b and the second connection electrode 8c and the liquid crystal 12 is extremely unlikely to occur, and the exchange of charges is extremely unlikely to occur, so that the occurrence of electric field corrosion is suppressed. Further, in this case, intrusion of moisture from the outside into the connection electrode 8b and the second connection electrode 8c can be suppressed. In addition, in this invention, the aspect of the sealing material 11 is not limited to what is shown in the example of FIGS. For example, a sealing material wider than that shown in FIGS. 1 to 3 and configured to be able to contact the inspection TFTs (22a, 22b) can also be used.

In the present invention, the material constituting the sealing material 11 is not particularly limited, and materials conventionally used in TFT liquid crystal display devices can be used. The width and positional accuracy of the sealing material 11 are not particularly limited as long as the object of the present invention can be achieved. However, the aspect in which the sealing material 11 is in contact with and completely covers the connection electrode 8b and the connection electrode 8c has a high effect of suppressing electrolytic corrosion.
It is preferable that the width is longer than the total length of the connection electrode 8b and the second connection electrode 8c as shown in FIG.

Further, since the present embodiment also has the second mode, the connection electrode 8b and the second connection electrode 8c are not located immediately below the black matrix 9 and the transparent electrode 10 as in the related art. Therefore, the electric field generated between the black matrix 9 and the transparent electrode 10 and the connection electrode 8b and the second connection electrode 8c is weaker than in the related art. Therefore, the amount of charges exchanged is reduced, which also suppresses the occurrence of electrolytic corrosion. In the case where the second aspect is used, the connection electrodes 8b
And the distance h (see FIGS. 1 and 2) between the end of the second connection electrode 8c which is closest to the inside of the substrate and the periphery (9a, 9b) of the black matrix when these are assumed to be on the same plane. It is preferable to design so as to be at least 5 μm to 10 μm or more.

In the present invention, the material forming the connection electrode 8b and the second connection electrode 8c may be any conductive material, and is not particularly limited. However, sealing material 1
The first aspect in which 1 is in contact with connection electrode 8b and second connection electrode 8c is effective when connection electrode 8b and second connection electrode 8c are made of a metal material containing aluminum as a main component. It is. This is because when the connection electrode 8b and the second connection electrode 8c are made of a metal material containing aluminum as a main component, their corrosion proceeds very quickly against moisture.

The TFT liquid crystal display device of the present invention can be used as a display portion of an image display device, and is particularly effective for a display portion of a reflection type image display in which a pixel electrode is formed of a metal containing aluminum as a main component.

[0039]

As described above, when the TFT liquid crystal display device of the present invention is used, the electric field generated between the connection electrode on the TFT array substrate side and the black matrix and the transparent electrode on the color filter substrate side can be reduced. Therefore, the occurrence of electric field corrosion can be suppressed. Furthermore, compared with the conventional TFT liquid crystal display device in which the connection electrode is located inside the sealing material, static electricity enters the connection electrode, and thereby, the TFT for inspection and the TFT forming the pixel are formed.
The occurrence of a situation in which the FT is destroyed can also be suppressed.

The present invention also relates to a transmissive liquid crystal display device in which a pixel electrode is composed of a transparent electrode composed of ITO or the like, and a reflective liquid crystal in which a pixel electrode is composed of a reflective electrode composed of a metal mainly containing aluminum. It is effective in any display device. However, in a reflection type liquid crystal display device,
The connection electrode is formed of the same material as the pixel electrode in the same process, and the metal mainly composed of aluminum constituting the pixel electrode is susceptible to corrosion. The embodiment is effective.

[Brief description of the drawings]

FIG. 1 is a plan view partially showing an example of a TFT liquid crystal display device of the present invention.

FIG. 2 is a plan view partially showing an example of a TFT liquid crystal display device of the present invention.

FIG. 3 is a cross-sectional view showing a configuration of a TFT liquid crystal display device of the present invention.

FIG. 4 is a cross-sectional view showing a configuration of a pixel portion of a conventional TFT liquid crystal display device.

5 is a diagram schematically showing a wiring configuration of the TFT liquid crystal display device shown in FIG.

FIG. 6 is a diagram showing a cross-sectional configuration of a portion a indicated by a dotted line in FIG. 5;

[Explanation of symbols]

 1a. Glass substrate 1b. Glass substrate 2a. Gate wiring 2b. Inspection wiring (for outputting ON signal of inspection TFT) 2c. Inspection wiring (for outputting data signal of R) 2d. Inspection wiring (for outputting data signal of G) 2e. Inspection wiring (for outputting data signal of B) 2f. Inspection wiring (for outputting odd-numbered scanning signals) 2g. 2. Inspection wiring (for outputting even number of scanning signals) 3. Gate insulating film (silicon nitride film) Semiconductor film 5a. Source wiring 5b. Drain electrode 5c. Drain electrode of inspection TFT 5d. 5. Source electrode of inspection TFT 6. Protective insulating film (silicon nitride film) Opening 8a. Pixel electrode 8b. Connection electrode 8c. Second connection electrode 9. Black matrix 10. Transparent electrode 11. Seal material 12. Liquid crystal 13. Color filter 14. n + semiconductor film 21. Pixel section 24. Inspection pad electrode 25. Conductive paste part 26a. Scan signal output IC 26b. Data signal output IC 27. Indicated Area

 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Takashi Hirose 1006 Kazuma Kadoma, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (72) Inventor Yoshio Iwai 1006 Okadoma Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. 72) Inventor Hisanori Yamaguchi 1006 Kazuma Kadoma, Kadoma City, Osaka Prefecture F-term in Matsushita Electric Industrial Co., Ltd. (reference) EA03 EA04 EA05 EA07 EB02 ED03 FB12 FB14 FB15 5F110 AA24 AA26 BB01 CC07 DD02 FF03 HL03 NN02 NN24 NN72 NN77 NN80

Claims (9)

[Claims] A liquid crystal is sealed between opposing glass substrates with a sealing material, and a plurality of gate wirings arranged in a row direction are formed on a surface of one of the glass substrates facing the other glass substrate. A plurality of source wirings arranged in a column direction; a plurality of thin film transistors and pixel electrodes arranged at respective intersections of the gate wiring and the source wiring; a testing thin film transistor connected to the gate wiring or the source wiring; At least a plurality of inspection wirings for sending an inspection signal to the thin film transistor for inspection are provided, a part or all of the inspection wirings and the inspection thin film transistor are connected via a connection electrode, and the sealing material is connected to the connection electrode, the liquid crystal and the liquid crystal. A thin film transistor liquid crystal display device, wherein the liquid crystal display device is arranged so as to prevent contact with the liquid crystal display. 2. The thin film transistor liquid crystal display according to claim 1, wherein the gate wiring and the inspection thin film transistor are connected via a second connection electrode, and the contact between the second connection electrode and the liquid crystal is prevented by the sealing material. apparatus. 3. The thin film transistor liquid crystal display device according to claim 1, wherein the sealing material is arranged so as to be in contact with the connection electrode. 4. The thin film transistor liquid crystal display device according to claim 2, wherein the sealing material is arranged so as to be in contact with the connection electrode and the second connection electrode. 5. The thin film transistor liquid crystal display device according to claim 1, wherein the connection electrode is formed of the same material as the pixel electrode in the same step, and is formed of a metal material containing aluminum as a main component. 6. The thin film transistor liquid crystal display according to claim 2, wherein the second connection electrode is formed of the same material as the pixel electrode in the same step, and is made of a metal material containing aluminum as a main component. apparatus. 7. A plurality of gate wirings arranged in a row direction on a surface of one of the glass substrates facing the other glass substrate, wherein a liquid crystal is sealed between the facing glass substrates with a sealing material. A plurality of source wirings arranged in a column direction; a plurality of thin film transistors and pixel electrodes arranged at respective intersections of the gate wiring and the source wiring; a testing thin film transistor connected to the gate wiring or the source wiring; At least a plurality of test wirings for sending a test signal to the thin film transistor for use, and at least a black matrix and a transparent electrode are provided on a surface of the other glass substrate facing one of the glass substrates. A part or all of the wiring for inspection and the thin film transistor for inspection are connected via a connection electrode, and the connection electrode is a black matrix and A thin-film transistor liquid crystal display device, which is located closer to the periphery of the glass substrate than the region where the transparent electrode is formed. 8. The gate wiring and the inspection thin film transistor are connected via a second connection electrode, and the second connection electrode is also located on the outer peripheral side of the glass substrate with respect to the black matrix and the transparent electrode. A thin film transistor liquid crystal display device as described in the above. 9. An image display device comprising a display unit comprising the thin film transistor liquid crystal display device according to claim 1.