JP2002110763A - Method for transferring substrate, and apparatus thereof - Google Patents

Method for transferring substrate, and apparatus thereof

Info

Publication number
JP2002110763A
JP2002110763A JP2000292569A JP2000292569A JP2002110763A JP 2002110763 A JP2002110763 A JP 2002110763A JP 2000292569 A JP2000292569 A JP 2000292569A JP 2000292569 A JP2000292569 A JP 2000292569A JP 2002110763 A JP2002110763 A JP 2002110763A
Authority
JP
Japan
Prior art keywords
substrate
roller
state
cleaning
edge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000292569A
Other languages
Japanese (ja)
Inventor
Takashi Shimizu
孝志 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd filed Critical Daikin Industries Ltd
Priority to JP2000292569A priority Critical patent/JP2002110763A/en
Publication of JP2002110763A publication Critical patent/JP2002110763A/en
Pending legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PROBLEM TO BE SOLVED: To maintain a space between a substrate and rollers to be constant, and reduce the time required until completion of transfer of the substrate. SOLUTION: A carry- and carry-out transfer controller transfers the substrate 2 into a space between a pair of rollers 3, so as to be in a perpendicularly state the substrate with a drive roller chucks 1a and driven roller chucks 1b installed at prescribed positions of the lower part of an apparatus, and the driven roller chucks installed at the prescribed positions of upper part of the apparatus and in vertically movable manner with a hoisting and lowering mechanism.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は基板搬送方法およ
びその装置に関し、さらに詳細にいえば、 氷粒を含む
純水の流れ方向を規定すべく一方向に回転されるローラ
に対して所定の間隙で基板を正対させることにより基板
の洗浄を行う基板洗浄装置に対して基板を搬入、搬出す
るための新規な方法およびその装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for transporting a substrate, and more particularly, to a predetermined gap between a roller which is rotated in one direction to define a flow direction of pure water containing ice particles. The present invention relates to a novel method for loading and unloading a substrate into and out of a substrate cleaning apparatus that cleans a substrate by directly facing the substrate, and an apparatus therefor.

【0002】[0002]

【従来の技術】従来から、氷粒を含む純水を用いて基板
を洗浄する基板洗浄装置が提案されている(特開平5−
267261号公報、特開平11−151467号公報
参照)。
2. Description of the Related Art Conventionally, a substrate cleaning apparatus for cleaning a substrate using pure water containing ice particles has been proposed (Japanese Unexamined Patent Publication No. Hei.
267261, JP-A-11-151467).

【0003】特開平5−267261号公報に記載され
た基板洗浄装置は、1枚の基板を左右から1対のフィン
ガーにより把持し、この状態において、噴射ノズルから
微細凍結粒子を噴射して基板に吹き付けるものである。
A substrate cleaning apparatus described in Japanese Patent Application Laid-Open No. 5-267261 grasps a single substrate with a pair of fingers from the left and right, and in this state, ejects fine frozen particles from an ejection nozzle to the substrate. It sprays.

【0004】特開平11−151467号公報に記載さ
れた基板洗浄装置は、基板の表面に近接するようにスク
リュウを配置するとともに、スクリュウに純水または純
水と薬液との混合液を供給する液体供給ノズルおよび雪
氷を供給する雪氷供給ノズルを配置し、スクリュウによ
り純水または純水と薬液との混合液および雪氷を回転さ
せて基板の表面に押圧することにより、基板の表面を洗
浄するものである。
In the substrate cleaning apparatus described in Japanese Patent Application Laid-Open No. H11-151467, a screw is arranged so as to be close to the surface of a substrate, and a liquid for supplying pure water or a mixture of pure water and a chemical to the screw. A supply nozzle and a snow / ice supply nozzle for supplying snow and ice are arranged, and pure water or a mixture of pure water and a chemical solution and snow and ice are rotated by a screw and pressed against the surface of the substrate to clean the surface of the substrate. is there.

【0005】[0005]

【発明が解決しようとする課題】しかし、氷粒を含む純
水を用いて基板を洗浄する基板洗浄装置として、基板に
対して所定の間隙を存してローラを配置し、この状態で
氷粒を含む純水を供給するようにした基板洗浄装置は全
く提案されていない。
However, as a substrate cleaning apparatus for cleaning a substrate using pure water containing ice particles, a roller is disposed at a predetermined gap from the substrate, and in this state, the ice particles are removed. There is no proposal at all for a substrate cleaning apparatus for supplying pure water containing.

【0006】したがって、このような基板洗浄装置に対
して基板を搬入、搬出する基板搬送装置も全く提案され
ていない。
Therefore, there has been no proposal at all for a substrate transfer apparatus for loading and unloading a substrate into and from such a substrate cleaning apparatus.

【0007】[0007]

【発明の目的】この発明は、氷粒を含む純水の流れ方向
を規定すべく一方向に回転されるローラに対して所定の
間隙で基板を正対させることにより基板の洗浄を行う基
板洗浄装置に対して基板を搬入、搬出するための方法お
よびその装置を提供することを目的としている。
SUMMARY OF THE INVENTION The present invention is directed to a substrate cleaning method for cleaning a substrate by directing the substrate at a predetermined gap to a roller which is rotated in one direction to define the flow direction of pure water containing ice particles. It is an object of the present invention to provide a method for loading and unloading a substrate to and from a device and a device therefor.

【0008】[0008]

【課題を解決するための手段】請求項1の基板搬送方法
は、氷粒を含む純水の流れ方向を規定すべく一方向に回
転されるローラに対して所定の間隙で基板を正対させる
ことにより基板の洗浄を行う基板洗浄装置に対して基板
を搬入、搬出する方法であって、ローラに対応する位置
を基準として上方に位置する端縁部と下方に位置する端
縁部とにおいて基板を保持し、この基板保持状態を維持
したままで基板をローラの中心軸と平行な方向に移動さ
せる方法である。
According to a first aspect of the present invention, there is provided a method for transporting a substrate, wherein the substrate is directly opposed to a roller which is rotated in one direction to define a flow direction of pure water containing ice particles. A method of loading and unloading a substrate into and out of a substrate cleaning apparatus for cleaning a substrate, wherein the substrate is positioned at an upper edge and a lower edge relative to a position corresponding to a roller. And moving the substrate in a direction parallel to the central axis of the roller while maintaining the substrate holding state.

【0009】請求項2の基板搬送方法は、氷粒を含む純
水の流れ方向を規定すべく一方向に回転されるローラに
対して所定の間隙で基板を正対させることにより基板の
洗浄を行う基板洗浄装置に対して基板を搬入、搬出する
装置であって、ローラに対応する位置を基準として上方
に位置する端縁部と下方に位置する端縁部とにおいて基
板を保持する基板保持手段と、この基板保持状態を維持
したままで基板をローラの中心軸と平行な方向に移動さ
せる移動手段とを含むものである。
According to a second aspect of the present invention, the substrate is washed by directing the substrate at a predetermined gap with respect to a roller which is rotated in one direction to define a flow direction of pure water containing ice particles. An apparatus for loading and unloading a substrate to and from a substrate cleaning apparatus, wherein the substrate holding means holds the substrate at an upper edge and a lower edge based on a position corresponding to a roller. And moving means for moving the substrate in a direction parallel to the central axis of the roller while maintaining the substrate holding state.

【0010】請求項3の基板搬送装置は、前記基板保持
手段として、ローラとの干渉を阻止すべくコ字状に形成
された枠体と、枠体の下辺部材に設けられ、かつ基板の
下部の端縁部を収容状態で支持する下部ローラチャック
と、枠体の上辺部材に設けられ、かつ基板の上部の端縁
部を収容状態で支持する上部ローラチャックとを含むも
のを採用するものである。
According to a third aspect of the present invention, in the substrate transfer apparatus, the substrate holding means is provided on a U-shaped frame for preventing interference with a roller, and is provided on a lower side member of the frame, and the lower portion of the substrate is provided. A lower roller chuck that supports the edge portion of the substrate in a housed state, and an upper roller chuck that is provided on the upper edge member of the frame and supports the upper edge portion of the substrate in a housed state. is there.

【0011】請求項4の基板搬送装置は、前記上部ロー
ラチャックを、基板の上部の端縁部を収容状態で支持す
る状態と基板から離れた状態との間で往復動させる昇降
機構をさらに含むものである。
According to a fourth aspect of the present invention, the substrate transfer apparatus further includes an elevating mechanism for reciprocating the upper roller chuck between a state in which the upper edge of the substrate is supported in a housed state and a state in which the upper edge is separated from the substrate. It is a thing.

【0012】[0012]

【作用】請求項1の基板搬送方法であれば、氷粒を含む
純水の流れ方向を規定すべく一方向に回転されるローラ
に対して所定の間隙で基板を正対させることにより基板
の洗浄を行う基板洗浄装置に対して基板を搬入、搬出す
るに当たって、ローラに対応する位置を基準として上方
に位置する端縁部と下方に位置する端縁部とにおいて基
板を保持し、この基板保持状態を維持したままで基板を
ローラの中心軸と平行な方向に移動させるのであるか
ら、ローラの配置位置を変化させる必要がなく、基板と
ローラとの間隙を一定に保持することができるととも
に、基板搬送を完了するまでの所要時間を短縮すること
ができる。
According to the first aspect of the present invention, the substrate is confronted at a predetermined gap with respect to a roller which is rotated in one direction to define the flow direction of pure water containing ice particles. In loading and unloading the substrate from and to the substrate cleaning apparatus for cleaning, the substrate is held at an upper edge portion and a lower edge portion with respect to a position corresponding to the roller, and the substrate is held. Since the substrate is moved in a direction parallel to the central axis of the roller while maintaining the state, there is no need to change the arrangement position of the roller, and the gap between the substrate and the roller can be kept constant, The time required for completing the substrate transfer can be reduced.

【0013】請求項2の基板搬送方法であれば、氷粒を
含む純水の流れ方向を規定すべく一方向に回転されるロ
ーラに対して所定の間隙で基板を正対させることにより
基板の洗浄を行う基板洗浄装置に対して基板を搬入、搬
出するに当たって、基板保持手段によって、ローラに対
応する位置を基準として上方に位置する端縁部と下方に
位置する端縁部とにおいて基板を保持し、移動手段によ
って、この基板保持状態を維持したままで基板をローラ
の中心軸と平行な方向に移動させることができる。
According to the second aspect of the present invention, the substrate is confronted at a predetermined gap with respect to a roller which is rotated in one direction to define the flow direction of pure water containing ice particles. In loading and unloading a substrate to and from the substrate cleaning apparatus for cleaning, the substrate holding means holds the substrate at an edge located above and an edge located below with reference to a position corresponding to the roller. The moving means can move the substrate in a direction parallel to the central axis of the roller while maintaining the substrate holding state.

【0014】したがって、ローラの配置位置を変化させ
る必要がなく、基板とローラとの間隙を一定に保持する
ことができるとともに、基板搬送を完了するまでの所要
時間を短縮することができる。
Therefore, it is not necessary to change the arrangement position of the rollers, the gap between the substrate and the rollers can be kept constant, and the time required for completing the substrate transfer can be shortened.

【0015】請求項3の基板搬送装置であれば、前記基
板保持手段として、ローラとの干渉を阻止すべくコ字状
に形成された枠体と、枠体の下辺部材に設けられ、かつ
基板の下部の端縁部を収容状態で支持する下部ローラチ
ャックと、枠体の上辺部材に設けられ、かつ基板の上部
の端縁部を収容状態で支持する上部ローラチャックとを
含むものを採用するのであるから、基板を安定に保持
し、しかも請求項2と同様の作用を達成することができ
る。
According to a third aspect of the present invention, as the substrate transfer device, the substrate holding means is provided on a U-shaped frame for preventing interference with a roller, and is provided on a lower side member of the frame. A lower roller chuck that supports the lower edge of the substrate in a housed state, and an upper roller chuck that is provided on the upper side member of the frame and supports the upper edge of the substrate in a housed state. Therefore, it is possible to stably hold the substrate and to achieve the same effect as the second aspect.

【0016】請求項4の基板搬送装置であれば、前記上
部ローラチャックを、基板の上部の端縁部を収容状態で
支持する状態と基板から離れた状態との間で往復動させ
る昇降機構をさらに含むのであるから、基板保持手段に
対する基板の供給、取り出しを簡単に行うことができる
ほか、請求項3と同様の作用を達成することができる。
According to a fourth aspect of the present invention, there is provided the substrate transfer apparatus, wherein the upper roller chuck reciprocates between a state in which the upper edge portion of the substrate is supported in a housed state and a state in which the upper edge is separated from the substrate. Since it further includes, it is possible to easily supply and take out the substrate to and from the substrate holding means, and it is possible to achieve the same operation as the third aspect.

【0017】[0017]

【発明の実施の形態】以下、添付図面を参照して、この
発明の基板搬送方法およびその装置の実施の態様を詳細
に説明する。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view of a substrate transfer method and apparatus according to an embodiment of the present invention;

【0018】図1はこの発明の基板搬送装置の一実施態
様が適用された基板洗浄装置を示す概略側面図、図2は
同概略正面図である。
FIG. 1 is a schematic side view showing a substrate cleaning apparatus to which an embodiment of the substrate transfer apparatus according to the present invention is applied, and FIG. 2 is a schematic front view thereof.

【0019】この基板洗浄装置は、コ字状の枠体1の下
辺部材の所定位置に設けた駆動ローラチャック1aおよ
び従動ローラチャック1bと、上辺部材の所定位置に昇
降機構1eにより昇降可能に設けた従動ローラチャック
1cとで鉛直状態となるように支持された基板2の各表
面に対して所定の間隙hを存して対向され、かつ中心軸
が水平方向を向くように1対のローラ3が設けられてい
る。ここで、間隙hを小さくすることが好ましく(例え
ば、5/100〜1mm程度)、氷粒を含む純水と基板
洗浄用薬液との混合液の必要量を少なくし、しかも洗浄
性能を高めることができる。
This substrate cleaning apparatus is provided with a drive roller chuck 1a and a driven roller chuck 1b provided at predetermined positions of a lower side member of a U-shaped frame 1, and a vertically movable mechanism 1e at a predetermined position of an upper side member. A pair of rollers 3 are opposed to each surface of the substrate 2 supported vertically by the driven roller chuck 1c with a predetermined gap h, and the center axis of the roller 2 is oriented horizontally. Is provided. Here, it is preferable to reduce the gap h (for example, about 5/100 to 1 mm), to reduce the required amount of a mixed solution of pure water containing ice particles and a substrate cleaning chemical solution, and to improve the cleaning performance. Can be.

【0020】そして、基板2に近い部分を除いてローラ
3の外表面の大半を包囲するように包囲部材(ステー
タ)4を設け、各ステータ4の所定位置に氷粒を含む純
水を供給するための純水供給口4aを設けているととも
に、純水供給口4aよりも上流側の所定位置に、ローラ
洗浄用薬液を供給するためのローラ洗浄用薬液供給口4
bを設けている。
A surrounding member (stator) 4 is provided so as to surround most of the outer surface of the roller 3 except for a portion close to the substrate 2, and pure water containing ice particles is supplied to a predetermined position of each stator 4. Cleaning liquid supply port 4a for supplying a roller cleaning chemical liquid at a predetermined position upstream of the pure water supply port 4a.
b is provided.

【0021】また、ローラ3と基板2との間隙よりも上
方の所定位置に基板洗浄用薬液供給ノズル5を設けてい
る。
A substrate cleaning chemical supply nozzle 5 is provided at a predetermined position above the gap between the roller 3 and the substrate 2.

【0022】なお、1dは駆動ローラチャック1aを駆
動するためのモータ、6は薬液供給源、7は氷粒を含む
純水を供給するための純水供給源である。
1d is a motor for driving the drive roller chuck 1a, 6 is a chemical supply source, and 7 is a pure water supply source for supplying pure water containing ice particles.

【0023】また、ローラ3の回転方向は、氷粒を含む
純水および各薬液を基板2の表面に沿って鉛直下方に導
くことができる方向(図1中矢印参照)に設定されてい
る。
The direction of rotation of the roller 3 is set in a direction (see arrows in FIG. 1) in which pure water containing ice particles and each chemical can be guided vertically downward along the surface of the substrate 2.

【0024】そして、純水供給口4aよりも下流側にお
けるローラ3とステータ4との間隙がローラ3と基板2
との間隙hよりも小さく設定されている。
The gap between the roller 3 and the stator 4 downstream of the pure water supply port 4a is
Is set to be smaller than the gap h.

【0025】前記昇降機構1eは、空気圧、油圧などに
より動作するものであってもよいが、磁力などによって
動作するものであってもよい。そして、外部からの指示
に応答して上昇動作、下降動作を行うものであってもよ
いが、外部からの指示に応答して上昇動作のみを行い、
上昇動作状態が解除されたことに応答して重力により下
降するものであってもよい。
The elevating mechanism 1e may be operated by air pressure, hydraulic pressure or the like, or may be operated by magnetic force or the like. Then, in response to an external instruction, the ascent operation and the descending operation may be performed, but only the ascent operation is performed in response to the external instruction,
It may be one that descends by gravity in response to the lifting operation state being released.

【0026】前記コ字状の枠体1は、洗浄位置に対する
基板2の搬入、搬出を行うべく搬入・搬出制御部8によ
り往復移動するものである。
The U-shaped frame 1 is reciprocated by the carry-in / carry-out controller 8 to carry the substrate 2 in and out of the cleaning position.

【0027】上記の構成の基板洗浄装置の作用は次のと
おりである。
The operation of the above-structured substrate cleaning apparatus is as follows.

【0028】コ字状の枠体1を移動させることにより基
板2を1対のローラ3の間に位置させ、この状態におい
て、基板2を自転させるとともに、1対のローラ3を矢
印方向に回転させながら、純水供給口4aから氷粒を含
む純水を、基板洗浄用薬液供給ノズル5から基板洗浄用
薬液(アルコール、アンモニア水など)を供給する。こ
の場合には、1対のローラ3の位置は全く変化しないの
であるから、基板2とローラ3との間隙hを正確に再現
することができる。また、ローラ3を移動させる場合と
比較して、洗浄動作開始までの所要時間を短縮すること
ができ、ひいては一定時間当たりの基板処理枚数を増加
させることができる。
By moving the U-shaped frame 1, the substrate 2 is positioned between the pair of rollers 3. In this state, the substrate 2 is rotated and the pair of rollers 3 is rotated in the direction of the arrow. Then, pure water containing ice particles is supplied from the pure water supply port 4a, and a substrate cleaning chemical (alcohol, ammonia water, etc.) is supplied from the substrate cleaning chemical supply nozzle 5. In this case, since the position of the pair of rollers 3 does not change at all, the gap h between the substrate 2 and the rollers 3 can be accurately reproduced. Further, as compared with the case where the roller 3 is moved, the time required until the start of the cleaning operation can be reduced, and the number of substrates processed per fixed time can be increased.

【0029】この結果、氷粒を含む純水と基板洗浄用薬
液との混合液が基板2とローラ3との間隙を通って鉛直
下方に流れ、基板2の表面の全範囲を均一に洗浄するこ
とができる。また、氷粒を含む純水と基板洗浄用薬液と
の混合液は一方向に流れるだけであるから、パーティク
ルの再付着が発生するおそれはない。したがって、基板
2の洗浄性能を高めることができる。
As a result, a mixed solution of pure water containing ice particles and a substrate cleaning chemical flows vertically downward through the gap between the substrate 2 and the roller 3, thereby uniformly cleaning the entire surface of the substrate 2. be able to. Further, since the mixed solution of pure water containing ice particles and the chemical solution for cleaning the substrate flows only in one direction, there is no possibility that particles will be reattached. Therefore, the cleaning performance of the substrate 2 can be improved.

【0030】次いで、図3から図8を参照して基板搬送
動作を説明する。なお、各図において、(A)が横断平
面図を、(B)が正面図を、それぞれ示している。
Next, the substrate transfer operation will be described with reference to FIGS. In each of the drawings, (A) shows a cross-sectional plan view, and (B) shows a front view.

【0031】先ず、図3に示すように、昇降機構1eに
よって従動ローラチャック1cを上昇させ、この状態に
おいて、基板2を駆動ローラチャック1aおよび従動ロ
ーラチェック1bにより支持させる。
First, as shown in FIG. 3, the driven roller chuck 1c is raised by the elevating mechanism 1e, and in this state, the substrate 2 is supported by the drive roller chuck 1a and the driven roller check 1b.

【0032】次いで、図4に示すように、昇降機構1e
の動作状態を解除して従動ローラ1cを自重で下降させ
ることにより、基板2を確実に保持する。
Next, as shown in FIG. 4, the lifting mechanism 1e
Is released, and the driven roller 1c is lowered by its own weight, whereby the substrate 2 is securely held.

【0033】基板2を確実に保持した後は、図5に示す
ように、搬入・搬出制御部8によって枠体1を基板洗浄
装置まで移動させ、基板2をローラ3と正対させる。
After the substrate 2 has been securely held, the frame 1 is moved to the substrate cleaning device by the carry-in / carry-out control unit 8 as shown in FIG.

【0034】この状態において、図5に示すように、駆
動ローラチャック1aを回転させて基板2を自転させる
とともに、ローラ3を回転させながら、氷粒を含む純水
を基板2とローラ3との間隙に供給することによって、
基板2の表面を洗浄する。
In this state, as shown in FIG. 5, while rotating the driving roller chuck 1a to rotate the substrate 2 and rotating the roller 3, pure water containing ice particles is supplied between the substrate 2 and the roller 3. By feeding into the gap,
The surface of the substrate 2 is cleaned.

【0035】基板2の表面の洗浄が終了した後は、図7
に示すように、搬入・搬出制御部8によって枠体1を基
板洗浄装置から離れる方向に移動させ、基板2を基板洗
浄装置から搬出する。
After the cleaning of the surface of the substrate 2 is completed, FIG.
As shown in (2), the loading / unloading control unit 8 moves the frame 1 in a direction away from the substrate cleaning apparatus, and unloads the substrate 2 from the substrate cleaning apparatus.

【0036】その後、昇降機構1eによって従動ローラ
チャック1cを上昇させ、この状態において、図8に示
すように、基板を取り出し、次の基板の搬送に備える。
Thereafter, the driven roller chuck 1c is raised by the elevating mechanism 1e. In this state, as shown in FIG. 8, the substrate is taken out and prepared for the next substrate transport.

【0037】以上の説明から分かるように、基板2を基
板洗浄装置に対して搬入、搬出する場合に、ローラ3を
移動させることがないのであるから、基板2とローラ3
との間隙を正確に確保することができる。また、ローラ
3の移動を伴わないので、基板2の洗浄を開始するまで
の所要時間を短縮することができる。
As can be seen from the above description, the roller 3 is not moved when the substrate 2 is carried in and out of the substrate cleaning apparatus.
Can be accurately secured. Further, since the movement of the roller 3 is not involved, the time required for starting the cleaning of the substrate 2 can be reduced.

【0038】[0038]

【発明の効果】請求項1の発明は、ローラの配置位置を
変化させる必要がなく、基板とローラとの間隙を一定に
保持することができるとともに、基板搬送を完了するま
での所要時間を短縮することができるという特有の効果
を奏する。
According to the first aspect of the present invention, there is no need to change the position of the roller, the gap between the substrate and the roller can be kept constant, and the time required for completing the substrate transfer can be reduced. It has a specific effect that it can be performed.

【0039】請求項2の発明は、ローラの配置位置を変
化させる必要がなく、基板とローラとの間隙を一定に保
持することができるとともに、基板搬送を完了するまで
の所要時間を短縮することができるという特有の効果を
奏する。
According to a second aspect of the present invention, there is no need to change the position of the rollers, the gap between the substrate and the rollers can be kept constant, and the time required to complete the substrate transfer can be shortened. It has a unique effect that it can be performed.

【0040】請求項3の発明は、基板を安定に保持し、
しかも請求項2と同様の効果を奏する。
According to a third aspect of the present invention, the substrate is stably held,
In addition, the same effect as that of the second aspect is obtained.

【0041】請求項4の発明は、基板保持手段に対する
基板の供給、取り出しを簡単に行うことができるほか、
請求項3と同様の効果を奏する。
According to the fourth aspect of the present invention, it is possible to easily supply and take out the substrate to and from the substrate holding means.
The same effect as the third aspect is achieved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の基板搬送装置の一実施態様が適用さ
れた基板洗浄装置を示す概略側面図である。
FIG. 1 is a schematic side view showing a substrate cleaning apparatus to which an embodiment of a substrate transfer apparatus according to the present invention is applied.

【図2】同上の概略正面図である。FIG. 2 is a schematic front view of the same.

【図3】基板搬送のための基板搬入動作を説明する図で
ある。
FIG. 3 is a diagram illustrating a substrate loading operation for transporting a substrate.

【図4】基板保持動作を説明する図である。FIG. 4 is a diagram illustrating a substrate holding operation.

【図5】基板洗浄部への基板搬送を説明する図である。FIG. 5 is a view for explaining substrate transfer to a substrate cleaning unit.

【図6】基板洗浄状態を説明する図である。FIG. 6 is a diagram illustrating a substrate cleaning state.

【図7】基板洗浄部からの基板搬送を説明する図であ
る。
FIG. 7 is a view for explaining substrate transfer from a substrate cleaning unit.

【図8】基板搬送部からの基板搬出を説明する図であ
る。
FIG. 8 is a view for explaining the unloading of a substrate from a substrate transport unit.

【符号の説明】[Explanation of symbols]

1 枠体 1a 駆動ローラチャック 1b、1c 従動ローラチャック 1e 昇降機構 2 基板 3 ローラ 8 搬入・搬出制御部 Reference Signs List 1 frame 1a drive roller chuck 1b, 1c driven roller chuck 1e lifting mechanism 2 substrate 3 roller 8 carry-in / carry-out controller

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 氷粒を含む純水の流れ方向を規定すべく
一方向に回転されるローラ(3)に対して所定の間隙を
存して基板(2)を正対させることにより基板(2)の
洗浄を行う基板洗浄装置に対して基板(2)を搬入、搬
出する基板搬送方法であって、 ローラ(3)に対応する位置を基準として上方に位置す
る端縁部と下方に位置する端縁部とにおいて基板(2)
を保持し、 この基板保持状態を維持したままで基板(2)をローラ
(3)の中心軸と平行な方向に移動させることを特徴と
する基板搬送方法。
1. A substrate (2) facing a roller (3) which is rotated in one direction to define a flow direction of pure water containing ice particles, with a predetermined gap therebetween. A substrate transport method for loading and unloading a substrate (2) to and from a substrate cleaning apparatus that performs the cleaning of (2), wherein the edge is located at an upper position with respect to a position corresponding to a roller (3) and is positioned at a lower position The edge of the substrate (2)
And transferring the substrate (2) in a direction parallel to the central axis of the roller (3) while maintaining the substrate holding state.
【請求項2】 氷粒を含む純水の流れ方向を規定すべく
一方向に回転されるローラ(3)に対して所定の間隙を
存して基板(2)を正対させることにより基板(2)の
洗浄を行う基板洗浄装置に対して基板(2)を搬入、搬
出する基板搬送装置であって、 ローラ(3)に対応する位置を基準として上方に位置す
る端縁部と下方に位置する端縁部とにおいて基板(2)
を保持する基板保持手段(1)(1a)(1b)(1
c)と、 この基板保持状態を維持したままで基板(2)をローラ
(3)の中心軸と平行な方向に移動させる移動手段
(8)とを含むことを特徴とする基板搬送装置。
2. A substrate (2) facing a roller (3) which is rotated in one direction to define a flow direction of pure water containing ice particles, with a predetermined gap therebetween. A substrate transport device for loading and unloading a substrate (2) from and into a substrate cleaning device for performing the cleaning of (2), wherein the edge is located above and below the edge corresponding to the position corresponding to the roller (3). The edge of the substrate (2)
(1) (1a) (1b) (1)
c) and a moving means (8) for moving the substrate (2) in a direction parallel to the central axis of the roller (3) while maintaining the substrate holding state.
【請求項3】 前記基板保持手段(1)(1a)(1
b)(1c)は、ローラ(3)との干渉を阻止すべくコ
字状に形成された枠体(1)と、枠体(1)の下辺部材
に設けられ、かつ基板(2)の下部の端縁部を収容状態
で支持する下部ローラチャック(1a)(1b)と、枠
体(1)の上辺部材に設けられ、かつ基板(2)の上部
の端縁部を収容状態で支持する上部ローラチャック(1
c)とを含む請求項2に記載の基板搬送装置。
3. The substrate holding means (1) (1a) (1
b) (1c) is provided on a U-shaped frame (1) for preventing interference with the roller (3), and on a lower side member of the frame (1), and is provided on the substrate (2). Lower roller chucks (1a) and (1b) for supporting the lower edge portion in the accommodated state, and provided on the upper side member of the frame (1) and supporting the upper edge portion of the substrate (2) in the accommodated state. Upper roller chuck (1
3. The substrate transfer device according to claim 2, comprising: c).
【請求項4】 前記上部ローラチャック(1c)を、基
板(2)の上部の端縁部を収容状態で支持する状態と基
板(2)から離れた状態との間で往復動させる昇降機構
(1e)をさらに含む請求項3に記載の基板搬送装置。
4. An elevating mechanism for reciprocating the upper roller chuck (1c) between a state in which an upper edge of the substrate (2) is supported in a housed state and a state in which the upper edge is separated from the substrate (2). The substrate transfer apparatus according to claim 3, further comprising 1e).
JP2000292569A 2000-09-26 2000-09-26 Method for transferring substrate, and apparatus thereof Pending JP2002110763A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000292569A JP2002110763A (en) 2000-09-26 2000-09-26 Method for transferring substrate, and apparatus thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000292569A JP2002110763A (en) 2000-09-26 2000-09-26 Method for transferring substrate, and apparatus thereof

Publications (1)

Publication Number Publication Date
JP2002110763A true JP2002110763A (en) 2002-04-12

Family

ID=18775490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000292569A Pending JP2002110763A (en) 2000-09-26 2000-09-26 Method for transferring substrate, and apparatus thereof

Country Status (1)

Country Link
JP (1) JP2002110763A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1973154A1 (en) 2007-03-13 2008-09-24 Applied Materials, Inc. Device for moving a carrier in a chamber, in particular in a vacuum chamber

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05267261A (en) * 1992-03-19 1993-10-15 Mitsubishi Electric Corp Semiconductor-wafer cleaning apparatus
JPH0917835A (en) * 1995-04-27 1997-01-17 Sony Corp Method of carrying flat work
JPH1119609A (en) * 1997-07-08 1999-01-26 Syst Seiko Kk Method and device for treating surface of rotary disk
JP2001334217A (en) * 2000-03-21 2001-12-04 Supurauto:Kk Method for cleaning substrate, cleaning device, method for manufacturing sherbet for cleaning substrate and device using this method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05267261A (en) * 1992-03-19 1993-10-15 Mitsubishi Electric Corp Semiconductor-wafer cleaning apparatus
JPH0917835A (en) * 1995-04-27 1997-01-17 Sony Corp Method of carrying flat work
JPH1119609A (en) * 1997-07-08 1999-01-26 Syst Seiko Kk Method and device for treating surface of rotary disk
JP2001334217A (en) * 2000-03-21 2001-12-04 Supurauto:Kk Method for cleaning substrate, cleaning device, method for manufacturing sherbet for cleaning substrate and device using this method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1973154A1 (en) 2007-03-13 2008-09-24 Applied Materials, Inc. Device for moving a carrier in a chamber, in particular in a vacuum chamber
CN101270473B (en) * 2007-03-13 2012-03-07 应用材料公司 Arrangement for moving a carrier in a vacuum chamber

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