JP2002107253A - Package for pressure detector - Google Patents

Package for pressure detector

Info

Publication number
JP2002107253A
JP2002107253A JP2000296028A JP2000296028A JP2002107253A JP 2002107253 A JP2002107253 A JP 2002107253A JP 2000296028 A JP2000296028 A JP 2000296028A JP 2000296028 A JP2000296028 A JP 2000296028A JP 2002107253 A JP2002107253 A JP 2002107253A
Authority
JP
Japan
Prior art keywords
electrode
insulating
semiconductor element
insulating plate
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000296028A
Other languages
Japanese (ja)
Other versions
JP4582889B2 (en
Inventor
Koji Kinomura
浩司 木野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2000296028A priority Critical patent/JP4582889B2/en
Publication of JP2002107253A publication Critical patent/JP2002107253A/en
Application granted granted Critical
Publication of JP4582889B2 publication Critical patent/JP4582889B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a small-sized and sensitive pressure detector capable of precisely detecting an external pressure without dispersion. SOLUTION: This package for pressure detector comprises a substantially square plate-like insulating base 1 having a mount part 1b for mounting a semiconductor element 3 on one main surface and an electrostatic capacitance forming first electrode 7 fixed to the center of the other main surface; a frame 1c with a circular inner circumference and a substantially square outer circumference, which is bonded to the other main surface circumferential part of the insulating base 1 so as to enclose the first electrode 7; and a substantially octagonal plate-like insulating plate 2 having, on one main surface, an electrostatic capacitance forming substantially circular second electrode 9 opposed to the first electrode 7 in the center part and blazed onto the frame 1c in the circumferential part, and mounted on the frame 1c in a flexible state so as to form a sealed space with the insulating base 1.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、圧力を検出するた
めの圧力検出装置に使用される圧力検出装置用パッケー
ジに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pressure detecting device package used for a pressure detecting device for detecting pressure.

【0002】[0002]

【従来の技術】従来、圧力を検出するための圧力検出装
置として静電容量型の圧力検出装置が知られている。こ
の静電容量型の圧力検出装置は、例えば図6に断面図で
示すように、セラミックス材料や樹脂材料から成る配線
基板21上に、静電容量型の感圧素子22と、パッケージ28
に収容された演算用の半導体素子29とを備えている。感
圧素子22は、例えばセラミックス材料等の電気絶縁材料
から成り、上面中央部に静電容量形成用の一方の電極23
が被着された凹部を有する絶縁基体24と、この絶縁基体
24の上面に絶縁基体24との間に密閉空間を形成するよう
にして可撓な状態で接合され、下面に静電容量形成用の
他方の電極25が被着された絶縁板26と、各静電容量形成
用の電極23・25をそれぞれ外部に電気的に接続するため
の外部リード端子27とから構成されており、外部の圧力
に応じて絶縁板26が撓むことにより各静電容量形成用の
電極23・25間に形成される静電容量が変化する。そし
て、この静電容量の変化を演算用の半導体素子29により
演算処理することにより外部の圧力を検出することがで
きる。
2. Description of the Related Art Conventionally, a capacitance type pressure detecting device has been known as a pressure detecting device for detecting pressure. As shown in a sectional view of FIG. 6, for example, a capacitance type pressure sensing element 22 and a package 28 are mounted on a wiring board 21 made of a ceramic material or a resin material.
And a semiconductor element 29 for arithmetic operation accommodated in the computer. The pressure-sensitive element 22 is made of, for example, an electrically insulating material such as a ceramic material.
An insulating substrate 24 having a concave portion with
An insulating plate 26 which is joined in a flexible state on the upper surface of the insulating substrate 24 so as to form a sealed space between the insulating substrate 24 and the other electrode 25 for forming a capacitance on the lower surface; Each of the electrodes 23 and 25 for forming a capacitance includes an external lead terminal 27 for electrically connecting the electrode to the outside, and each of the capacitances is formed by bending the insulating plate 26 in response to an external pressure. The capacitance formed between the forming electrodes 23 and 25 changes. An external pressure can be detected by subjecting the change in capacitance to arithmetic processing by the arithmetic semiconductor element 29.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、この従
来の圧力検出装置によると、感圧素子22と半導体素子29
とを配線基板21上に個別に実装していることから、圧力
検出装置が大型化してしまうとともに圧力検出用の電極
23・25と半導体素子29との間の配線が長いものとなり、
この長い配線間に不要な静電容量が形成されるため感度
が低いという問題点を有していた。
However, according to the conventional pressure detecting device, the pressure-sensitive element 22 and the semiconductor element 29 are not provided.
Are individually mounted on the wiring board 21, which increases the size of the pressure detecting device and the pressure detecting electrode.
The wiring between 23 and 25 and the semiconductor element 29 becomes longer,
There is a problem that the sensitivity is low because an unnecessary capacitance is formed between the long wires.

【0004】そこで、本願出願人は、先に特願2000−17
8618において、一方の主面に半導体素子が搭載される搭
載部を有する絶縁基体と、この絶縁基体の表面および内
部に配設され、半導体素子の各電極が電気的に接続され
る複数の配線導体と、絶縁基体の他方の主面の中央部に
被着され、配線導体の一つに電気的に接続された静電容
量形成用の第一電極と、絶縁基体の他方の主面に、この
主面の中央部との間に密閉空間を形成するように可撓な
状態で接合された絶縁板と、この絶縁板の内側主面に第
一電極と対向して被着され、配線導体の他の一つに電気
的に接続された静電容量形成用の第二電極とを具備する
圧力検出装置用パッケージを提案した。この圧力検出装
置用パッケージによると、一方の主面に半導体素子が搭
載される搭載部を有する絶縁基体の他方の主面に静電容
量形成用の第一電極を設けるとともに、この第一電極と
対向する静電容量形成用の第二電極を内側面に有する絶
縁板を、絶縁基体の他方の主面との間に密閉空間を形成
するようにして可撓な状態で接合させたことから、半導
体素子を収容するパッケージに感圧素子が一体に形成さ
れ、その結果、圧力検出装置を小型とすることができる
とともに圧力検出用の電極と半導体素子とを接続する配
線を短いものとして、これらの配線間に発生する不要な
静電容量を小さなものとすることができる。なお、この
特願2000-178618で提案した圧力検出装置用パッケージ
においては、絶縁基体の他方の主面の外周部にセラミッ
クスや金属から成る枠体を第一電極を取り囲むようにし
て設けておき、この枠体上に第二電極の外周部を銀−銅
ろう等のろう材を介してろう付けすることにより絶縁板
が絶縁基体に接合されていた。そして、通常、このよう
なパッケージにおいては、絶縁基体や絶縁板は、その生
産性を考慮してその外周が略四角形状であり、第一電極
は略円形に、第二電極は絶縁板の下面全面に形成されて
いた。枠体もこれに合わせて外周を略四角形状とし、内
周を第一電極に合わせた略円形としていた。
Accordingly, the applicant of the present application has previously filed Japanese Patent Application No. 2000-17.
8618, an insulating base having a mounting portion on which a semiconductor element is mounted on one main surface; and a plurality of wiring conductors disposed on and inside the insulating base and electrically connected to respective electrodes of the semiconductor element. A first electrode for forming a capacitance, which is attached to the center of the other main surface of the insulating base and is electrically connected to one of the wiring conductors; An insulating plate joined in a flexible state so as to form a sealed space with the central portion of the main surface; and an inner main surface of the insulating plate, which is attached to face the first electrode and faces the first electrode. A pressure detection device package including a second electrode for forming a capacitance electrically connected to another one has been proposed. According to this pressure detecting device package, a first electrode for forming a capacitance is provided on the other main surface of the insulating base having a mounting portion on which a semiconductor element is mounted on one main surface, and the first electrode is Since the insulating plate having the opposing second electrode for capacitance formation on the inner surface is joined in a flexible state so as to form a sealed space with the other main surface of the insulating base, The pressure-sensitive element is formed integrally with the package containing the semiconductor element. As a result, the pressure detection device can be made small, and the wiring connecting the electrode for pressure detection and the semiconductor element is shortened. Unnecessary capacitance generated between the wirings can be reduced. In the pressure sensing device package proposed in Japanese Patent Application No. 2000-178618, a frame made of ceramics or metal is provided on the outer peripheral portion of the other main surface of the insulating base so as to surround the first electrode, The outer peripheral portion of the second electrode was brazed on this frame via a brazing material such as silver-copper brazing to join the insulating plate to the insulating base. Usually, in such a package, the outer periphery of the insulating base or the insulating plate is substantially square in consideration of the productivity, the first electrode is substantially circular, and the second electrode is the lower surface of the insulating plate. It was formed on the entire surface. The frame also had a substantially square outer periphery and a substantially circular inner periphery corresponding to the first electrode.

【0005】しかしながら、この圧力検出装置用パッケ
ージによると、外周が略四角形で内周が円形の枠体の上
面に外周が略四角形の絶縁板の下面全面に形成した第二
電極をろう付けしたことから、ろう付けの幅が絶縁板の
各辺の中央部と各角部とで大きく異なり、そのため、枠
体上面に絶縁板をろう付けする際に溶融したろう材が絶
縁板の各角部に大きく集中してろう材の厚みが不均一と
なり、その結果、第一電極と第二電極との間に形成され
る静電容量が大きくばらついてしまい、そのため外部の
圧力を正確に検出することが困難であるという問題点を
有していた。
However, according to this pressure detecting device package, the second electrode formed on the entire lower surface of the insulating plate having a substantially rectangular outer periphery is brazed to the upper surface of a frame having a substantially rectangular outer periphery and a circular inner periphery. Therefore, the width of the brazing is greatly different between the center of each side of the insulating plate and each corner, so the brazing material melted when brazing the insulating plate on the top of the frame is placed on each corner of the insulating plate. The concentration of the brazing material becomes highly concentrated and the thickness of the brazing material becomes non-uniform, and as a result, the capacitance formed between the first electrode and the second electrode varies greatly, so that it is impossible to accurately detect the external pressure. There was a problem that it was difficult.

【0006】本発明は、かかる上述の問題点に鑑み完成
されたものであり、その目的は、小型でかつ感度が高
く、しかも外部の圧力をばらつきなく正確に検出するこ
とが可能な圧力検出装置を提供することにある。
The present invention has been completed in view of the above-mentioned problems, and has as its object to provide a pressure detecting device which is small in size, has high sensitivity, and is capable of accurately detecting external pressure without variation. Is to provide.

【0007】[0007]

【課題を解決するための手段】本発明の圧力検出装置用
パッケージは、一方の主面に半導体素子が搭載される搭
載部を有するとともに他方の主面の中央部に静電容量形
成用の第一電極が被着された略四角平板状の絶縁基体
と、この絶縁基体の他方の主面外周部に第一電極を囲繞
するようにして接合された内周が円形で外周が略四角形
の枠体と、一方の主面に中央部が第一電極に対向すると
ともに外周部が枠体上にろう付けされた静電容量形成用
の第二電極を有し、絶縁基体との間に密閉空間を形成す
るように可撓な状態で枠体に取着された略八角平板状の
絶縁板とから成ることを特徴とするものである。
A package for a pressure detecting device according to the present invention has a mounting portion on one side of which a semiconductor element is mounted, and a second portion for forming a capacitance at the center of the other main surface. A substantially square plate-shaped insulating base on which one electrode is attached, and a frame having a circular inner circumference and a substantially square outer circumference joined to the outer periphery of the other main surface of the insulating base so as to surround the first electrode; A closed space between the body and a second electrode for forming a capacitance whose central part is opposed to the first electrode on one main surface and whose outer peripheral part is brazed on a frame body; And a substantially octagonal flat insulating plate attached to the frame body in a flexible state so as to form.

【0008】本発明の圧力検出装置用パッケージによれ
ば、一方の主面に半導体素子が搭載される搭載部を有す
る略四角平板状の絶縁基体の他方の主面の中央部に静電
容量形成用の第一電極を設けるとともに、この第一電極
に対向する静電容量形成用の第二電極を有する略八角平
板状の絶縁板を、絶縁基体との間に密閉空間を形成する
ようにして可撓な状態で枠体に接合させたことから、半
導体素子を収容するパッケージに感圧素子が一体に形成
され、その結果、圧力検出装置を小型とすることができ
るとともに圧力検出用の電極と半導体素子とを接続する
配線を短いものとして、これらの配線間に発生する不要
な静電容量を小さなものとすることができる。さらに、
絶縁板が略八角形であることから、絶縁板の各辺の中央
部と角部とでろう付けの幅の差が小さく、そのため枠体
上面に第二電極をろう付けする際に、ろう材の厚みが略
均一となり、その結果、第一電極と第二電極との間に形
成される静電容量に大きなばらつきが発生することがな
い。
According to the pressure detecting device package of the present invention, a capacitance is formed at the center of the other main surface of the substantially rectangular flat insulating substrate having a mounting portion on which the semiconductor element is mounted on one main surface. While providing a first electrode for, the substantially octagonal plate-shaped insulating plate having a second electrode for capacitance formation facing this first electrode, so as to form a closed space between the insulating substrate and Since the semiconductor device is joined to the frame in a flexible state, the pressure-sensitive element is formed integrally with the package containing the semiconductor element. Unnecessary capacitance generated between these wirings can be reduced by shortening the wiring connecting the semiconductor element. further,
Since the insulating plate is substantially octagonal, the difference in the width of brazing between the center and the corner of each side of the insulating plate is small, and therefore, when brazing the second electrode to the upper surface of the frame, the brazing material is used. Is substantially uniform, and as a result, there is no large variation in the capacitance formed between the first electrode and the second electrode.

【0009】[0009]

【発明の実施の形態】次に、本発明を添付の図面を基に
詳細に説明する。図1は、本発明の圧力検出装置用パッ
ケージの実施の形態の一例を示す断面図であり、図2は
その上面図である。図中、1は絶縁基体、2は絶縁板で
ありこれらで本発明の圧力検出装置用パッケージが構成
される。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view illustrating an example of an embodiment of a pressure detection device package according to the present invention, and FIG. 2 is a top view thereof. In the figure, reference numeral 1 denotes an insulating base, and 2 denotes an insulating plate, which constitute a package for a pressure detecting device of the present invention.

【0010】絶縁基体1は、酸化アルミニウム質焼結体
や窒化アルミニウム質焼結体・ムライト質焼結体・炭化
珪素質焼結体・窒化珪素質焼結体・ガラス−セラミック
ス等のセラミックス材料から成る略四角平板状の積層体
であり、例えば酸化アルミニウム質焼結体から成る場合
であれば、酸化アルミニウム・酸化珪素・酸化マグネシ
ウム・酸化カルシウム等のセラミック原料粉末に適当な
有機バインダ・溶剤・可塑剤・分散剤を添加混合して泥
漿状となすとともにこれを従来周知のドクタブレード法
を採用してシート状に成形することにより複数枚のセラ
ミックグリーンシートを得、しかる後、これらのセラミ
ックグリーンシートに適当な打ち抜き加工・積層加工・
切断加工を施すことにより絶縁基体1用の生セラミック
成形体を得るとともにこの生セラミック成形体を約1600
℃の温度で焼成することにより製作される。
The insulating substrate 1 is made of a ceramic material such as a sintered body of aluminum oxide, a sintered body of aluminum nitride, a sintered body of mullite, a sintered body of silicon carbide, a sintered body of silicon nitride, and glass-ceramics. An aluminum oxide, silicon oxide, magnesium oxide, calcium oxide, or other suitable ceramic raw material powder for an organic binder, solvent, plastic An additive and dispersant are added and mixed to form a slurry, and this is formed into a sheet by employing a conventionally known doctor blade method to obtain a plurality of ceramic green sheets. Suitable for punching and lamination
By performing a cutting process, a green ceramic molded body for the insulating substrate 1 is obtained, and the green ceramic molded body
It is manufactured by firing at a temperature of ° C.

【0011】絶縁基体1は、その下面中央部に半導体素
子3を収容するための凹部1aが形成されており、これ
により半導体素子3を収容する容器として機能する。そ
して、この凹部1aの底面中央部が半導体素子3が搭載
される搭載部1bとなっており、この搭載部1bに半導
体素子3を搭載するとともに凹部1a内に例えばエポキ
シ樹脂等の樹脂製封止材4を充填することにより半導体
素子3が封止される。なお、この例では半導体素子3は
樹脂製封止材4を凹部1a内に充填することにより封止
されるが、半導体素子3は絶縁基体1の下面に金属やセ
ラミックスから成る蓋体を凹部1aを塞ぐように接合さ
せることにより封止されてもよい。
The insulating substrate 1 has a concave portion 1a for accommodating the semiconductor element 3 in the center of the lower surface thereof, and thereby functions as a container for accommodating the semiconductor element 3. The central portion of the bottom surface of the concave portion 1a is a mounting portion 1b on which the semiconductor element 3 is mounted. The semiconductor element 3 is mounted on the mounting portion 1b and a resin sealing such as an epoxy resin is formed in the concave portion 1a. The semiconductor element 3 is sealed by filling the material 4. In this example, the semiconductor element 3 is sealed by filling a resin sealing material 4 into the concave portion 1a. However, the semiconductor element 3 is provided with a lid made of metal or ceramic on the lower surface of the insulating base 1 in the concave portion 1a. It may be sealed by joining so as to close.

【0012】また、搭載部1bには半導体素子3の各電
極と接続される複数のメタライズ配線導体5が導出して
おり、このメタライズ配線導体5と半導体素子3の各電
極を半田バンプ6等の導電性材料から成る導電性接合部
材を介して接合することにより半導体素子3の各電極と
各メタライズ配線導体5とが電気的に接続されるととも
に半導体素子3が搭載部1bに固定される。なお、この
例では、半導体素子3の電極とメタライズ配線導体5と
は半田バンプ6を介して接続されるが、半導体素子3の
電極とメタライズ配線導体5とはボンディングワイヤ等
の他の種類の電気的接続手段により接続されてもよい。
A plurality of metallized wiring conductors 5 connected to the respective electrodes of the semiconductor element 3 are led out from the mounting portion 1b. The metallized wiring conductor 5 and the respective electrodes of the semiconductor element 3 are connected to the solder bumps 6 and the like. By bonding via a conductive bonding member made of a conductive material, each electrode of the semiconductor element 3 is electrically connected to each metallized wiring conductor 5, and the semiconductor element 3 is fixed to the mounting portion 1b. In this example, the electrodes of the semiconductor element 3 and the metallized wiring conductors 5 are connected via the solder bumps 6, but the electrodes of the semiconductor element 3 and the metallized wiring conductors 5 are connected to another type of electric wire such as a bonding wire. May be connected by a dynamic connection means.

【0013】メタライズ配線導体5は、半導体素子3の
各電極を外部電気回路および後述する第一電極7・第二
電極9に電気的に接続するための導電路として機能し、
その一部は絶縁基体1の外周下面に導出し、別の一部は
第一電極7・第二電極9に電気的に接続されている。そ
して、半導体素子3の各電極をこれらのメタライズ配線
導体5に導電性接合材6を介して電気的に接続するとと
もに半導体素子3を樹脂製封止材4で封止した後、メタ
ライズ配線導体5の絶縁基体1外周下面に導出した部位
を外部電気回路基板の配線導体に半田等の導電性接合材
を介して接合することにより、内部に収容する半導体素
子3が外部電気回路に電気的に接続されることとなる。
The metallized wiring conductor 5 functions as a conductive path for electrically connecting each electrode of the semiconductor element 3 to an external electric circuit and a first electrode 7 and a second electrode 9, which will be described later.
A part thereof is led out to the lower surface of the outer periphery of the insulating base 1, and another part is electrically connected to the first electrode 7 and the second electrode 9. Then, each electrode of the semiconductor element 3 is electrically connected to the metallized wiring conductor 5 via a conductive bonding material 6 and the semiconductor element 3 is sealed with a resin sealing material 4. The semiconductor element 3 housed inside is electrically connected to the external electric circuit by joining the portion led out to the lower surface of the outer periphery of the insulating base 1 to the wiring conductor of the external electric circuit board via a conductive bonding material such as solder. Will be done.

【0014】このようなメタライズ配線導体5は、タン
グステンやモリブデン・銅・銀等の金属粉末メタライズ
から成り、タングステン等の金属粉末に適当な有機バイ
ンダ・溶剤・可塑剤・分散剤等を添加混合して得たメタ
ライズペーストを従来周知のスクリーン印刷法を採用し
て絶縁基体1用のセラミックグリーンシートに所定のパ
ターンに印刷塗布し、これを絶縁基体1用の生セラミッ
ク成形体とともに焼成することによって絶縁基体1の内
部および表面に所定のパターンに形成される。なお、メ
タライズ配線導体5の露出表面には、メタライズ配線導
体5が酸化腐食するのを防止するとともにメタライズ配
線導体5と半田等の導電性接合材との接合を良好なもの
とするために、通常であれば、厚みが1〜10μm程度の
ニッケルめっき層と厚みが0.1〜3μm程度の金めっき
層とが順次被着されている。
The metallized wiring conductor 5 is made of metallized metal powder such as tungsten, molybdenum, copper, silver, etc., and is mixed with a metal powder such as tungsten by adding an appropriate organic binder, solvent, plasticizer, dispersant and the like. The metallized paste obtained as described above is applied to a ceramic green sheet for the insulating substrate 1 in a predetermined pattern by employing a conventionally known screen printing method, and is fired together with the green ceramic molded body for the insulating substrate 1 for insulation. A predetermined pattern is formed inside and on the surface of the base 1. In addition, in order to prevent the metallized wiring conductor 5 from being oxidized and corroded and to make the metallized wiring conductor 5 and a conductive bonding material such as solder good, the exposed surface of the metallized wiring conductor 5 is usually formed on the exposed surface. In this case, a nickel plating layer having a thickness of about 1 to 10 μm and a gold plating layer having a thickness of about 0.1 to 3 μm are sequentially applied.

【0015】また、絶縁基体1の上面外周部には絶縁基
体1と同一材料から成り、外形が絶縁基体1と略同一で
内周が円形の高さが0.01〜5mm程度の枠体1cが設け
られており、それにより上面中央部に底面が略平坦な円
形の凹部1dが形成されている。この凹部1dは、後述
するように、絶縁板2との間に密閉空間を形成するため
のものであり、この凹部1dの底面には静電容量形成用
の第一電極7が被着されている。
A frame 1c made of the same material as the insulating base 1 and having an outer shape substantially the same as that of the insulating base 1 and a circular inner periphery having a height of about 0.01 to 5 mm is provided on the outer periphery of the upper surface of the insulating base 1. As a result, a circular concave portion 1d having a substantially flat bottom surface is formed at the center of the upper surface. The concave portion 1d is for forming a closed space between the concave portion 1d and the insulating plate 2, and a first electrode 7 for forming a capacitance is attached to the bottom surface of the concave portion 1d. I have.

【0016】この第一電極7は、後述する第二電極9と
ともに感圧素子用の静電容量を形成するためのものであ
り、例えば略円形のパターンに形成されている。そし
て、この第一電極7にはメタライズ配線導体5の一つ5
aが接続されており、それによりこのメタライズ配線導
体5aに半導体素子3の電極を半田バンプ6等の導電性
接合材を介して接続すると半導体素子3の電極と第一電
極7とが電気的に接続されるようになっている。
The first electrode 7 is for forming a capacitance for a pressure-sensitive element together with a second electrode 9 to be described later, and is formed, for example, in a substantially circular pattern. The first electrode 7 is provided with one of the metallized wiring conductors 5.
When the electrode of the semiconductor element 3 is connected to the metallized wiring conductor 5a via a conductive bonding material such as a solder bump 6, the electrode of the semiconductor element 3 and the first electrode 7 are electrically connected. It is to be connected.

【0017】このような第一電極7は、タングステンや
モリブデン・銅・銀等の金属粉末メタライズから成り、
タングステン等の金属粉末に適当な有機バインダ・溶剤
・可塑剤・分散剤を添加混合して得たメタライズペース
トを従来周知のスクリーン印刷法を採用して絶縁基体1
用のセラミックグリーンシートに印刷塗布し、これを絶
縁基体1用の生セラミック成形体とともに焼成すること
によって絶縁基体1の凹部1d底面に略円形のパターン
に形成される。なお、第一電極7の露出表面には、第一
電極7が酸化腐食するのを防止するために、通常であれ
ば、厚みが1〜10μm程度のニッケルめっき層が被着さ
れている。
The first electrode 7 is made of a metal powder of tungsten, molybdenum, copper, silver, or the like.
A metallized paste obtained by adding a suitable organic binder, a solvent, a plasticizer, and a dispersant to a metal powder such as tungsten is mixed with an insulating substrate 1 by using a conventionally known screen printing method.
By printing and applying the ceramic green sheet for use with the green ceramic molded body for the insulating substrate 1 to form a substantially circular pattern on the bottom surface of the concave portion 1d of the insulating substrate 1. The exposed surface of the first electrode 7 is usually coated with a nickel plating layer having a thickness of about 1 to 10 μm in order to prevent the first electrode 7 from being oxidized and corroded.

【0018】また、絶縁基体1の枠体1cの上面にはそ
の略全面にわたり枠状の接合用メタライズ層8が被着さ
れており、この接合用メタライズ層8には、下面に第二
電極9を有する絶縁板2がこの第二電極9と接合用メタ
ライズ層8とを銀−銅ろう材等のろう材を介してろう付
けすることにより取着されている。なお、この例では、
接合用メタライズ層8は枠体1cの略全面にわたり設け
たが、内周が枠体1cの内周に略一致するとともに外周
縁が略円形や略八角形となるように設けてもよい。
On the upper surface of the frame 1c of the insulating base 1, a frame-shaped bonding metallization layer 8 is applied over substantially the entire surface thereof, and the bonding metallization layer 8 has a second electrode 9 on the lower surface. Is attached by brazing the second electrode 9 and the bonding metallized layer 8 via a brazing material such as a silver-copper brazing material. In this example,
Although the joining metallization layer 8 is provided over substantially the entire surface of the frame 1c, the metallization layer 8 may be provided so that the inner periphery substantially matches the inner periphery of the frame 1c and the outer periphery has a substantially circular or substantially octagonal shape.

【0019】この接合用メタライズ層8にはメタライズ
配線導体5の一つ5bが接続されており、それによりこ
のメタライズ配線導体5bに半導体素子3の電極を半田
バンプ6等の導電性接合材を介して電気的に接続すると
接合用メタライズ層8に接続された第二電極9と半導体
素子3の電極とが電気的に接続されるようになってい
る。
One of the metallized wiring conductors 5b is connected to the bonding metallized layer 8 so that the electrodes of the semiconductor element 3 are connected to the metallized wiring conductor 5b via a conductive bonding material such as a solder bump 6. When they are electrically connected, the second electrode 9 connected to the bonding metallization layer 8 and the electrode of the semiconductor element 3 are electrically connected.

【0020】接合用メタライズ層8は、タングステンや
モリブデン・銅・銀等の金属粉末メタライズから成り、
タングステン等の金属粉末に適当な有機バインダ・溶剤
・可塑剤・分散剤を添加混合して得たメタライズペース
トを従来周知のスクリーン印刷法を採用して絶縁基体1
用のセラミックグリーンシートに印刷塗布し、これを絶
縁基体1用の生セラミック成形体とともに焼成すること
によって絶縁基体1の枠体1c上面に枠状の所定のパタ
ーンに形成される。なお、接合用メタライズ層8の露出
表面には、接合用メタライズ層8が酸化腐食するのを防
止するとともに接合用メタライズ層8とろう材との接合
を強固なものとするために、通常であれば、厚みが1〜
10μm程度のニッケルめっき層が被着されている。
The bonding metallization layer 8 is made of a metal powder metallization such as tungsten, molybdenum, copper, silver or the like.
A metallized paste obtained by adding a suitable organic binder, a solvent, a plasticizer, and a dispersant to a metal powder such as tungsten is mixed with an insulating substrate 1 by using a conventionally known screen printing method.
A ceramic green sheet for printing is applied and baked together with a green ceramic molded body for the insulating substrate 1 to form a predetermined frame-like pattern on the upper surface of the frame 1c of the insulating substrate 1. The exposed surface of the metallizing layer 8 for bonding is usually formed on the exposed surface of the metallizing layer 8 for bonding in order to prevent the metallizing layer 8 for bonding from being oxidized and corroded and to strengthen the bonding between the metallizing layer 8 for bonding and the brazing material. If the thickness is 1
A nickel plating layer of about 10 μm is applied.

【0021】また、絶縁基体1の上面に取着された絶縁
板2は、図2に示すように、酸化アルミニウム質焼結体
や窒化アルミニウム質焼結体・ムライト質焼結体・窒化
珪素質焼結体・炭化珪素質焼結体・ガラス−セラミック
ス等のセラミックス材料から成る厚みが0.01〜5mmの
略八角平板であり、外部の圧力に応じて絶縁基体1側に
撓むいわゆる圧力検出用のダイアフラムとして機能す
る。
As shown in FIG. 2, the insulating plate 2 attached to the upper surface of the insulating base 1 is made of aluminum oxide sintered body, aluminum nitride sintered body, mullite sintered body, silicon nitride A substantially octagonal flat plate having a thickness of 0.01 to 5 mm and made of a ceramic material such as a sintered body, a silicon carbide sintered body, or a glass-ceramic, and is bent toward the insulating substrate 1 in response to an external pressure. Functions as a diaphragm.

【0022】なお、絶縁板2は、その厚みが0.01mm未
満では、その機械的強度が小さいものとなってしまうた
め、これに大きな外部圧力が印加された場合に破壊され
てしまう危険性が大きなものとなり、他方、5mmを超
えると、小さな圧力では撓みにくくなり、圧力検出用の
ダイアフラムとしては不適となってしまう。したがっ
て、絶縁板2の厚みは0.01〜5mmの範囲が好ましい。
If the thickness of the insulating plate 2 is less than 0.01 mm, the mechanical strength of the insulating plate 2 is small, and there is a great risk that the insulating plate 2 will be broken when a large external pressure is applied thereto. On the other hand, if it exceeds 5 mm, it becomes difficult to bend under a small pressure, and it becomes unsuitable as a diaphragm for pressure detection. Therefore, the thickness of the insulating plate 2 is preferably in the range of 0.01 to 5 mm.

【0023】このような絶縁板2は、例えば酸化アルミ
ニウム質焼結体から成る場合であれば、酸化アルミニウ
ム・酸化珪素・酸化マグネシウム・酸化カルシウム等の
セラミック原料粉末に適当な有機バインダ・溶剤・可塑
剤・分散剤を添加混合して泥漿状となすとともにこれを
従来周知のドクタブレード法を採用してシート状に成形
することによりセラミックグリーンシートを得、しかる
後、このセラミックグリーンシートに適当な打ち抜き加
工や切断加工を施すことにより絶縁板2用の生セラミッ
ク成形体を得るとともにこの生セラミック成形体を約16
00℃の温度で焼成することにより製作される。この場
合、絶縁板2は、略八角平板状であることから、図3に
平面図で示すように、絶縁板2用のセラミックグリーン
シートを焼成してなる広面積の母基板11に多数の絶縁板
2を縦横の並びに一体的に配列して形成し、この母基板
11を各絶縁板2毎に分割することによって多数個を同時
集約的に製作することができる。したがって、例えば絶
縁板2を円形平板状とする場合に比較してその製作が極
めて容易であるとともに効率良く製作することができ
る。なお、母基板11の分割は、母基板11の上下面に分割
用の溝12を予め形成しておき、この分割用の溝12に沿っ
て母基板11を各絶縁板2毎に分割すればよい。
If the insulating plate 2 is made of, for example, an aluminum oxide sintered body, an organic binder, a solvent, and a plastic suitable for ceramic raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide. A ceramic green sheet is obtained by adding and mixing a dispersing agent and a dispersing agent to form a slurry, and forming this into a sheet by employing a well-known doctor blade method. Thereafter, the ceramic green sheet is appropriately punched. By processing and cutting, a green ceramic molded body for the insulating plate 2 is obtained, and this green ceramic molded body is
It is manufactured by firing at a temperature of 00 ° C. In this case, since the insulating plate 2 has a substantially octagonal flat plate shape, as shown in a plan view in FIG. 3, a large number of insulating substrates 2 are formed by firing a ceramic green sheet for the insulating plate 2. The board 2 is formed by arranging vertically and horizontally and integrally.
By dividing 11 for each insulating plate 2, a large number can be manufactured simultaneously and intensively. Therefore, for example, as compared with the case where the insulating plate 2 is formed in a circular flat plate shape, the manufacturing thereof is extremely easy and the manufacturing can be performed efficiently. The mother substrate 11 can be divided by forming division grooves 12 on the upper and lower surfaces of the mother substrate 11 in advance, and dividing the mother substrate 11 for each insulating plate 2 along the division grooves 12. Good.

【0024】また、絶縁板2の下面には静電容量形成用
の第二電極9が略全面にわたり被着されている。この第
二電極9は、前述の第一電極7とともに感圧素子用の静
電容量を形成するための電極として機能するとともに絶
縁板2を絶縁基体1に接合するための接合用下地金属層
として機能する。
On the lower surface of the insulating plate 2, a second electrode 9 for forming a capacitance is attached over substantially the entire surface. The second electrode 9 functions as an electrode for forming a capacitance for a pressure-sensitive element together with the above-described first electrode 7, and serves as a bonding base metal layer for bonding the insulating plate 2 to the insulating base 1. Function.

【0025】このような第二電極9は、タングステンや
モリブデン・銅・銀等の金属粉末メタライズから成り、
タングステン等の金属粉末に適当な有機バインダ・溶剤
・可塑剤・分散剤を添加混合して得たメタライズペース
トを従来周知のスクリーン印刷法を採用して絶縁板2用
のセラミックグリーンシートに所定のパターンに印刷塗
布し、これを絶縁板2用の生セラミック成形体とともに
焼成することによって絶縁板2の下面の略全面に形成さ
れる。
The second electrode 9 is made of a metal powder of tungsten, molybdenum, copper, silver or the like.
A metallized paste obtained by adding a suitable organic binder, a solvent, a plasticizer, and a dispersant to a metal powder such as tungsten is mixed with a predetermined pattern on a ceramic green sheet for the insulating plate 2 by using a conventionally known screen printing method. Is formed on the entire surface of the lower surface of the insulating plate 2 by sintering it with a green ceramic molded body for the insulating plate 2.

【0026】この第二電極9と接合用メタライズ層8と
は銀−銅ろう材等のろう材を介して接合されており、そ
れにより、絶縁基体1上面と絶縁板2下面との間に密閉
空間が形成されるとともに接合用メタライズ層8と第二
電極9とが電気的に接続される。
The second electrode 9 and the metallizing layer 8 for bonding are bonded via a brazing material such as a silver-copper brazing material, so that the upper surface of the insulating base 1 and the lower surface of the insulating plate 2 are sealed. A space is formed, and the bonding metallization layer 8 and the second electrode 9 are electrically connected.

【0027】このとき、第一電極7と第二電極9とは、
絶縁基体1と絶縁板2との間に形成された空間を挟んで
対向しており、これらの間には、第一電極7や第二電極
9の面積および第一電極7と第二電極9との間隔に応じ
て所定の静電容量が形成される。そして、絶縁板2の上
面に外部の圧力が印加されると、その圧力に応じて絶縁
板2が絶縁基体1側に撓んで第一電極7と第二電極9と
の間隔が変わり、それにより第一電極7と第二電極9と
の間の静電容量が変化するので、外部の圧力の変化を静
電容量の変化として感知する感圧素子として機能する。
そして、この静電容量の変化を凹部1a内に収容した半
導体素子3にメタライズ配線導体5a・5bを介して伝
達し、これを半導体素子3で演算処理することによって
外部の圧力の大きさを知ることができる。
At this time, the first electrode 7 and the second electrode 9
The space between the insulating base 1 and the insulating plate 2 is opposed to each other with a space formed therebetween. The areas of the first electrode 7 and the second electrode 9 and the first electrode 7 and the second electrode 9 A predetermined capacitance is formed in accordance with the distance between. When an external pressure is applied to the upper surface of the insulating plate 2, the insulating plate 2 bends toward the insulating base 1 according to the pressure, and the distance between the first electrode 7 and the second electrode 9 changes. Since the capacitance between the first electrode 7 and the second electrode 9 changes, it functions as a pressure-sensitive element that detects a change in external pressure as a change in capacitance.
Then, the change of the capacitance is transmitted to the semiconductor element 3 housed in the recess 1a via the metallized wiring conductors 5a and 5b, and the magnitude of the external pressure is known by performing arithmetic processing on the semiconductor element 3. be able to.

【0028】このように、本発明の圧力検出装置用パッ
ケージによれば、一方の主面に半導体素子3が搭載され
る絶縁基体1の他方の主面に、静電容量形成用の第一電
極7を設けるとともにこの第一電極7と対向する静電容
量形成用の第二電極9を内側面に有する絶縁板2を絶縁
基体1との間に密閉空間を形成するように可撓な状態で
接合させたことから、半導体素子3を収容する容器と感
圧素子とが一体となり、その結果、圧力検出装置を小型
化することができる。また、静電容量形成用の第一電極
7および第二電極9を、絶縁基体1に設けたメタライズ
配線導体5a・5bを介して半導体素子3に接続するこ
とから、第一電極7および第二電極9を短い距離で半導
体素子3に接続することができ、その結果、これらのメ
タライズ配線導体5a・5b間に発生する不要な静電容
量を小さなものとして感度の高い圧力検出装置を提供す
ることができる。
As described above, according to the pressure sensing device package of the present invention, the first electrode for forming the capacitance is provided on the other main surface of the insulating base 1 on which the semiconductor element 3 is mounted on one main surface. And an insulating plate 2 having an inner surface facing the first electrode 7 and having a second electrode 9 for forming a capacitance in a flexible state so as to form a closed space between the insulating plate 2 and the insulating substrate 1. Because of the joining, the container accommodating the semiconductor element 3 and the pressure-sensitive element are integrated, and as a result, the size of the pressure detection device can be reduced. Further, since the first electrode 7 and the second electrode 9 for forming the capacitance are connected to the semiconductor element 3 via the metallized wiring conductors 5a and 5b provided on the insulating base 1, the first electrode 7 and the second electrode 9 are formed. The electrode 9 can be connected to the semiconductor element 3 over a short distance, and as a result, an unnecessary capacitance generated between these metallized wiring conductors 5a and 5b is reduced to provide a highly sensitive pressure detecting device. Can be.

【0029】なお、第一電極7と第二電極9との間隔が
1気圧中において0.01mm未満の場合、絶縁板2に大き
な圧力が印加された際に、第一電極7と第二電極9とが
接触して圧力を検出することができなくなってしまう危
険性があり、他方、5mmを超えると、第一電極7と第
二電極9との間に形成される静電容量が小さなものとな
り、圧力を検出する感度が低いものとなる傾向にある。
したがって、第一電極7と第二電極9との間隔は、1気
圧中において0.01〜5mmの範囲が好ましい。
When the distance between the first electrode 7 and the second electrode 9 is less than 0.01 mm at 1 atm, when a large pressure is applied to the insulating plate 2, the first electrode 7 and the second electrode 9 There is a danger that the pressure cannot be detected due to contact with the electrode. On the other hand, if the distance exceeds 5 mm, the capacitance formed between the first electrode 7 and the second electrode 9 becomes small. , The sensitivity of detecting pressure tends to be low.
Therefore, the distance between the first electrode 7 and the second electrode 9 is preferably in the range of 0.01 to 5 mm at 1 atm.

【0030】また、絶縁基体1の枠体1c上に絶縁板2
を接合するには、枠体1c上の接合用メタライズ層8お
よび第二電極9の表面に予め1〜10μmの厚みのニッケ
ルめっき層をそれぞれ被着させておくとともに、接合用
メタライズ層8と第二電極9との間に厚みが10〜200μ
m程度の銀−銅ろうから成るろう材箔を挟んで絶縁基体
1と絶縁板2とを重ね合わせ、これらを還元雰囲気中、
約850℃の温度に加熱してろう材箔を溶融させて接合用
メタライズ層8と第二電極9の外周部とをろう付けする
方法が採用される。
The insulating plate 2 is placed on the frame 1c of the insulating base 1.
In order to bond the metallized layer 8 and the second metallized layer 9 on the frame 1 c, a nickel plating layer having a thickness of 1 to 10 μm is previously applied to the surfaces thereof. 10-200μ thickness between two electrodes 9
The insulating base 1 and the insulating plate 2 are overlapped with each other with a brazing material foil made of silver-copper brazing having a thickness of about m.
A method is adopted in which the brazing material foil is melted by heating to a temperature of about 850 ° C., and the joining metallized layer 8 and the outer peripheral portion of the second electrode 9 are brazed.

【0031】このとき、絶縁板2は略八角形であること
から、絶縁板2の各辺の中央部と角部とでろう付けの幅
の差が小さく、そのため枠体1c上面に第二電極をろう
付けする際に、ろう材が一部分に大きく集中することな
く、ろう材の厚みが略均一となる。したがって、本発明
の圧力センサ素子収納用パッケージによれば、第一電極
7と第二電極9との間に形成される静電容量が大きくば
らつくことがない。
At this time, since the insulating plate 2 is substantially octagonal, the difference in the width of brazing between the center and the corner of each side of the insulating plate 2 is small, so that the second electrode is provided on the upper surface of the frame 1c. When brazing is performed, the thickness of the brazing material becomes substantially uniform without the brazing material concentrating largely on a part. Therefore, according to the pressure sensor element housing package of the present invention, the capacitance formed between the first electrode 7 and the second electrode 9 does not vary greatly.

【0032】かくして、上述の圧力検出装置用パッケー
ジによれば、搭載部1bに半導体素子3を搭載するとと
もに半導体素子3の各電極とメタライズ配線導体5とを
電気的に接続し、しかる後、半導体素子3を封止するこ
とによって小型でかつ感度が高く、しかも外部の圧力を
ばらつきなく正確に検出することが可能な圧力検出装置
となる。
Thus, according to the above-described package for a pressure detecting device, the semiconductor element 3 is mounted on the mounting portion 1b, and each electrode of the semiconductor element 3 and the metallized wiring conductor 5 are electrically connected. By sealing the element 3, a pressure detecting device which is small in size, has high sensitivity, and is capable of accurately detecting external pressure without variation.

【0033】なお、本発明は、上述の実施の形態の一例
に限定されるものではなく、本発明の要旨を逸脱しない
範囲であれば種々の変更は可能である。例えば図4に断
面図で示すように、第二電極9のろう付けされた外周部
と第一電極7に対向する中央部との間の表面に略円形の
枠状の絶縁層10を被着させてもよい。このような絶縁層
10を設けることにより第二電極9と接合用メタライズ層
8とを接合するろう材が第二電極の中央部に流出するこ
とを防止し、それにより第一電極7と第二電極9との間
に形成される静電容量のばらつきをさらに小さいものと
することができる。このような絶縁層10は、絶縁板2と
実質的に同一の材料で形成すれば良く、絶縁板2用の生
セラミック成形体に塗布した第二電極9用のメタライズ
ペーストの表面に絶縁層10用の絶縁ペーストを公知のス
クリーン印刷法により所定のパターンに印刷塗布し、こ
れを絶縁板2用の生セラミック成形体および第二電極9
用のメタライズペーストとともに焼成することによって
形成される。なお、このようなろう材流出防止用の絶縁
層10を設ける場合、絶縁層10はその厚みが5μm未満で
は、枠体1c上面に第二電極9の外周部をろう付けする
際、ろう材が第二電極9の中央部に流出することを防止
することができなくなる恐れがあり、他方、500μmを
超えると、絶縁板2の良好な撓みを阻害する恐れがあ
る。したがって、絶縁層10の厚みは、5〜500μmの範
囲が好ましい。また、絶縁層10は、その幅が0.1mm未
満では、枠体1c上面に第二電極9の外周部をろう付け
する際、ろう材が第二電極の中央部に流出することを防
止することができなくなる恐れがある。したがって絶縁
層10の幅は、0.1mm以上であることが好ましい。
The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the scope of the present invention. For example, as shown in the sectional view of FIG. 4, a substantially circular frame-shaped insulating layer 10 is applied to the surface between the brazed outer peripheral portion of the second electrode 9 and the central portion facing the first electrode 7. May be. Such an insulating layer
By providing 10, it is possible to prevent the brazing material joining the second electrode 9 and the joining metallized layer 8 from flowing out to the center of the second electrode. In this case, the variation in the capacitance formed on the substrate can be further reduced. Such an insulating layer 10 may be formed of substantially the same material as that of the insulating plate 2. The insulating layer 10 is applied to the surface of the metallized paste for the second electrode 9 applied to the green ceramic molded body for the insulating plate 2. An insulating paste for the insulating plate 2 is printed and applied in a predetermined pattern by a known screen printing method.
Formed by firing together with a metallizing paste for use. In the case where the insulating layer 10 for preventing the outflow of the brazing material is provided, if the thickness of the insulating layer 10 is less than 5 μm, when the outer peripheral portion of the second electrode 9 is brazed to the upper surface of the frame 1c, the brazing material is It may not be possible to prevent the outflow to the central part of the second electrode 9. On the other hand, if it exceeds 500 μm, there is a possibility that good bending of the insulating plate 2 may be hindered. Therefore, the thickness of the insulating layer 10 is preferably in the range of 5 to 500 μm. When the width of the insulating layer 10 is less than 0.1 mm, when the outer peripheral portion of the second electrode 9 is brazed to the upper surface of the frame 1c, the brazing material is prevented from flowing to the central portion of the second electrode. May not be possible. Therefore, the width of the insulating layer 10 is preferably 0.1 mm or more.

【0034】また、上述の実施の形態の一例では、絶縁
板2は正八角形であったが、絶縁板2は正八角形に限ら
ず、例えば図5に平面図で示すように、各辺が一つおき
に、隣接する辺から直角方向に0.1〜0.5mm程度窪でお
り、全体として見れば略八角形となるものであってもよ
い。この場合、絶縁板2用の母基板11を分割して絶縁板
2を得る際に分割溝12の位置が多少ずれたとしても絶縁
板2の各角部に角度が90゜未満の鋭角が形成されること
がないので絶縁板2に欠けが発生しにくい。
Further, in the above-described embodiment, the insulating plate 2 is a regular octagon, but the insulating plate 2 is not limited to a regular octagon. For example, as shown in a plan view of FIG. Every other side is depressed by about 0.1 to 0.5 mm in a direction perpendicular to the adjacent side, and may be substantially octagonal as a whole. In this case, an acute angle of less than 90 ° is formed at each corner of the insulating plate 2 even if the position of the division groove 12 is slightly shifted when the mother substrate 11 for the insulating plate 2 is divided to obtain the insulating plate 2. Since the insulating plate 2 is not broken, chipping of the insulating plate 2 hardly occurs.

【0035】[0035]

【発明の効果】以上、説明したように、本発明の圧力検
出装置用パッケージによれば、一方の主面に半導体素子
が搭載される搭載部を有する略四角平板状の絶縁基体の
他方の主面の中央部に静電容量形成用の第一電極を設け
るとともに、この第一電極に対向する静電容量形成用の
第二電極を有する略八角平板状の絶縁板を、絶縁基体と
の間に密閉空間を形成するようにして可撓な状態で接合
させたことから、半導体素子を収容するパッケージに感
圧素子が一体に形成され、その結果、圧力検出装置を小
型とすることができるとともに圧力検出用の電極と半導
体素子とを接続する配線を短いものとして、これらの配
線間に発生する不要な静電容量を小さなものとすること
ができる。さらに、絶縁板が略八角平板状であることか
ら、絶縁板の各辺の中央部と角部とでろう付けの幅の差
が小さく、そのため枠体上面に第二電極をろう付けする
際に、ろう材の厚みが略均一となり、その結果、第一電
極と第二電極との間に形成される静電容量にばらつきが
発生することがなく、外部の圧力をばらつきなく正確に
検出することが可能な圧力検出装置を提供することがで
きる。
As described above, according to the pressure detecting device package of the present invention, the other main body of the substantially square plate-shaped insulating base having the mounting portion on which the semiconductor element is mounted on one main surface. A first electrode for forming a capacitance is provided at the center of the surface, and a substantially octagonal plate-shaped insulating plate having a second electrode for forming a capacitance opposed to the first electrode is placed between the insulating base and the insulating plate. The pressure sensing element is formed integrally with the package accommodating the semiconductor element since the pressure sensing element is integrally formed in the package accommodating the semiconductor element, so that the pressure detection device can be downsized. By shortening the wiring connecting the pressure detecting electrode and the semiconductor element, unnecessary capacitance generated between these wirings can be reduced. Furthermore, since the insulating plate has a substantially octagonal flat plate shape, the difference in the width of brazing between the central portion and the corners of each side of the insulating plate is small, so when brazing the second electrode to the upper surface of the frame, Therefore, the thickness of the brazing material becomes substantially uniform, and as a result, there is no variation in the capacitance formed between the first electrode and the second electrode, and the external pressure can be accurately detected without variation. Can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の圧力検出装置用パッケージの実施の形
態の一例を示す断面図である。
FIG. 1 is a cross-sectional view showing an example of an embodiment of a package for a pressure detecting device according to the present invention.

【図2】図1に示す圧力検出装置用パッケージの上面図
である。
FIG. 2 is a top view of the pressure detection device package shown in FIG.

【図3】図1および図2に示す圧力検出装置用パッケー
ジの絶縁板2を製作する方法を説明するための平面図で
ある。
FIG. 3 is a plan view for explaining a method of manufacturing the insulating plate 2 of the package for a pressure detecting device shown in FIGS. 1 and 2.

【図4】本発明の圧力検出装置用パッケージの実施形態
の他の例を示す断面図である。
FIG. 4 is a cross-sectional view showing another example of the embodiment of the pressure detection device package of the present invention.

【図5】本発明の圧力検出装置用パッケージの実施形態
のさらに他の例における絶縁板2を示す平面図である。
FIG. 5 is a plan view showing an insulating plate 2 in still another example of the embodiment of the pressure detection device package according to the present invention.

【図6】従来の圧力検出装置を示す断面図である。FIG. 6 is a sectional view showing a conventional pressure detecting device.

【符号の説明】[Explanation of symbols]

1・・・・・絶縁基体 1c・・・・枠体 2・・・・・絶縁板 3・・・・・半導体素子 7・・・・・第一電極 9・・・・・第二電極 1 ... insulating base 1c ... frame 2 ... insulating plate 3 ... semiconductor element 7 ... first electrode 9 ... second electrode

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 一方の主面に半導体素子が搭載される搭
載部を有するとともに他方の主面の中央部に静電容量形
成用の第一電極が被着された略四角平板状の絶縁基体
と、該絶縁基体の前記他方の主面外周部に前記第一電極
を囲繞するようにして接合された内周が円形で外周が略
四角形の枠体と、一方の主面に中央部が前記第一電極に
対向するとともに外周部が前記枠体上にろう付けされた
静電容量形成用の第二電極を有し、前記絶縁基体との間
に密閉空間を形成するように可撓な状態で前記枠体に取
着された略八角平板状の絶縁板とから成ることを特徴と
する圧力検出装置用パッケージ。
1. A substantially square-plate-shaped insulating base having a mounting portion on one of its main surfaces on which a semiconductor element is mounted, and a first electrode for forming a capacitance formed on the center of the other main surface. And a frame body whose inner periphery is joined to the outer periphery of the other main surface of the insulating base so as to surround the first electrode and whose outer periphery is circular and whose outer periphery is substantially square, A second electrode for forming a capacitance, which is opposed to the first electrode and whose outer peripheral portion is brazed on the frame, and is in a flexible state so as to form a closed space between the second electrode and the insulating base; And a substantially octagonal flat insulating plate attached to the frame.
JP2000296028A 2000-09-28 2000-09-28 Package for pressure detection device Expired - Fee Related JP4582889B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000296028A JP4582889B2 (en) 2000-09-28 2000-09-28 Package for pressure detection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000296028A JP4582889B2 (en) 2000-09-28 2000-09-28 Package for pressure detection device

Publications (2)

Publication Number Publication Date
JP2002107253A true JP2002107253A (en) 2002-04-10
JP4582889B2 JP4582889B2 (en) 2010-11-17

Family

ID=18778366

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP4582889B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011519032A (en) * 2008-04-24 2011-06-30 カスタム センサーズ アンド テクノロジーズ インコーポレイテッド Sensing element assembly and method

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS522581A (en) * 1975-06-18 1977-01-10 Bunker Ramo Pressureesensitive converter and method of manufacturing the same
JPS5880540U (en) * 1981-11-28 1983-05-31 松下電器産業株式会社 Capacitive pressure sensor
JPS6056233A (en) * 1983-09-08 1985-04-01 Matsushita Electric Ind Co Ltd Pressure sensor unit
JPH01182729A (en) * 1988-01-16 1989-07-20 Ngk Insulators Ltd Pressure sensor
JPH09304206A (en) * 1996-05-14 1997-11-28 Yamatake Honeywell Co Ltd Semiconductor pressure transducer
JPH10300609A (en) * 1997-05-01 1998-11-13 Fuji Koki Corp Electrostatic capacitance type pressure sensor
JPH11295176A (en) * 1998-04-14 1999-10-29 Nagano Keiki Co Ltd Differential pressure sensor

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS522581A (en) * 1975-06-18 1977-01-10 Bunker Ramo Pressureesensitive converter and method of manufacturing the same
JPS5880540U (en) * 1981-11-28 1983-05-31 松下電器産業株式会社 Capacitive pressure sensor
JPS6056233A (en) * 1983-09-08 1985-04-01 Matsushita Electric Ind Co Ltd Pressure sensor unit
JPH01182729A (en) * 1988-01-16 1989-07-20 Ngk Insulators Ltd Pressure sensor
JPH09304206A (en) * 1996-05-14 1997-11-28 Yamatake Honeywell Co Ltd Semiconductor pressure transducer
JPH10300609A (en) * 1997-05-01 1998-11-13 Fuji Koki Corp Electrostatic capacitance type pressure sensor
JPH11295176A (en) * 1998-04-14 1999-10-29 Nagano Keiki Co Ltd Differential pressure sensor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011519032A (en) * 2008-04-24 2011-06-30 カスタム センサーズ アンド テクノロジーズ インコーポレイテッド Sensing element assembly and method

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