JP2002350264A - Package for pressure detector - Google Patents

Package for pressure detector

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Publication number
JP2002350264A
JP2002350264A JP2001155493A JP2001155493A JP2002350264A JP 2002350264 A JP2002350264 A JP 2002350264A JP 2001155493 A JP2001155493 A JP 2001155493A JP 2001155493 A JP2001155493 A JP 2001155493A JP 2002350264 A JP2002350264 A JP 2002350264A
Authority
JP
Japan
Prior art keywords
electrode
semiconductor element
capacitance
insulating
conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001155493A
Other languages
Japanese (ja)
Inventor
Koji Kinomura
浩司 木野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2001155493A priority Critical patent/JP2002350264A/en
Publication of JP2002350264A publication Critical patent/JP2002350264A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a compact and highly sensitive pressure detector capable of always accurately detecting an external pressure. SOLUTION: This package for the presser detector is provided with an insulated base body 1 for mounting a semiconductor element 3 on one main face, a plurality of wiring conductors 5 arranged in the insulated base body 1 for electrically connecting respective electrodes of the semiconductor element 3, an insulating board 2 connected to the insulated base body 1 flexibly for forming a sealed space between the other main face of the insulated base body 1 and itself, an electrostatic capacity formation first electrode 8 installed to the other main face of the insulated base body 1 and electrically connected to one conductor 5a in the wiring conductors 5, and an electrostatic capacity formation second electrode 9 installed on the inside main face of the insulating board 2 and electrically connected to the other conductor 5b of the wiring conductors 5. An electrostatic capacity value formed between the first electrode 8, the second electrode 9, and an earth conductor 6 is 50% or less of that formed between the first electrode 8 and the second electrode 9.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、圧力を検出するた
めの圧力検出装置に使用される圧力検出装置用パッケー
ジに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pressure detecting device package used for a pressure detecting device for detecting pressure.

【0002】[0002]

【従来の技術】従来、圧力を検出するための圧力検出装
置として静電容量型の圧力検出装置が知られている。こ
の静電容量型の圧力検出装置は、例えば図2に断面図で
示すように、セラミックス材料や樹脂材料から成る配線
基板21上に、静電容量型の感圧素子22と、パッケージ28
に収容された演算用の半導体素子29とを備えている。感
圧素子22は、例えばセラミックス材料等の電気絶縁材料
から成り、上面中央部に静電容量形成用の一方の電極23
が被着された凹部を有する絶縁基体24と、この絶縁基体
24の上面に絶縁基体24との間に密閉空間を形成するよう
にして可撓な状態で接合され、下面に静電容量形成用の
他方の電極25が被着された絶縁板26と、各静電容量形成
用の電極23・25をそれぞれ外部に電気的に接続するため
の外部リード端子27とから構成されており、外部の圧力
に応じて絶縁板26が撓むことにより各静電容量形成用の
電極23・25間に形成される静電容量が変化する。そし
て、この静電容量の変化を演算用の半導体素子29により
演算処理することにより外部の圧力を検出することがで
きる。
2. Description of the Related Art Conventionally, a capacitance type pressure detecting device has been known as a pressure detecting device for detecting pressure. As shown in a sectional view of FIG. 2, for example, a capacitance type pressure sensing device 22 and a package 28 are provided on a wiring board 21 made of a ceramic material or a resin material.
And a semiconductor element 29 for arithmetic operation accommodated in the computer. The pressure-sensitive element 22 is made of, for example, an electrically insulating material such as a ceramic material.
An insulating substrate 24 having a concave portion with
An insulating plate 26 which is joined in a flexible state on the upper surface of the insulating substrate 24 so as to form a sealed space between the insulating substrate 24 and the other electrode 25 for forming a capacitance on the lower surface; Each of the electrodes 23 and 25 for forming a capacitance includes an external lead terminal 27 for electrically connecting the electrode to the outside, and each of the capacitances is formed by bending the insulating plate 26 in response to an external pressure. The capacitance formed between the forming electrodes 23 and 25 changes. An external pressure can be detected by subjecting the change in capacitance to arithmetic processing by the arithmetic semiconductor element 29.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、この従
来の圧力検出装置によると、感圧素子22と半導体素子29
とを配線基板21上に個別に実装していることから、圧力
検出装置が大型化してしまうとともに圧力検出用の電極
23・25と半導体素子29との間の配線が長いものとなり、
この長い配線間に不要な静電容量が形成されるため感度
が低いという問題点を有していた。
However, according to the conventional pressure detecting device, the pressure-sensitive element 22 and the semiconductor element 29 are not provided.
Are individually mounted on the wiring board 21, which increases the size of the pressure detecting device and the pressure detecting electrode.
The wiring between 23 and 25 and the semiconductor element 29 becomes longer,
There is a problem that the sensitivity is low because an unnecessary capacitance is formed between the long wires.

【0004】そこで、本願出願人は、先に特願2000-178
618において、一方の主面に半導体素子が搭載される搭
載部を有する絶縁基体と、この絶縁基体の表面および内
部に配設され、半導体素子の各電極が電気的に接続され
る複数の配線導体と、絶縁基体の他方の主面の中央部に
被着され、配線導体の一つに電気的に接続された静電容
量形成用の第一電極と、絶縁基体の他方の主面に、この
主面の中央部との間に密閉空間を形成するように可撓な
状態で接合された絶縁板と、この絶縁板の内側主面に第
一電極に対向して被着され、配線導体の他の一つに電気
的に接続された静電容量形成用の第二電極とを具備する
圧力検出装置用パッケージを提案した。
Accordingly, the applicant of the present application has previously filed Japanese Patent Application No. 2000-178.
618, an insulating base having a mounting portion on one main surface on which a semiconductor element is mounted; and a plurality of wiring conductors disposed on and inside the insulating base and electrically connected to respective electrodes of the semiconductor element. A first electrode for forming a capacitance, which is attached to the center of the other main surface of the insulating base and is electrically connected to one of the wiring conductors; An insulating plate joined in a flexible state so as to form a sealed space with the central portion of the main surface; and an inner main surface of the insulating plate is attached to the first main surface so as to face the first electrode. A pressure detection device package including a second electrode for forming a capacitance electrically connected to another one has been proposed.

【0005】この圧力検出装置用パッケージによると、
一方の主面に半導体素子が搭載される搭載部を有する絶
縁基体の他方の主面に静電容量形成用の第一電極を設け
るとともに、この第一電極に対向する静電容量形成用の
第二電極を内側面に有する絶縁板を、絶縁基体の他方の
主面との間に密閉空間を形成するようにして可撓な状態
で接合させたことから、半導体素子を収容するパッケー
ジに感圧素子が一体に形成され、その結果、圧力検出装
置を小型とすることができるとともに圧力検出用の電極
と半導体素子とを接続する配線を短いものとして、これ
らの配線間に発生する不要な静電容量を小さなものとす
ることができる。
According to the pressure detecting device package,
A first electrode for forming a capacitance is provided on the other main surface of the insulating base having a mounting portion on which a semiconductor element is mounted on one main surface, and a first electrode for forming a capacitance opposing the first electrode is provided. Since the insulating plate having the two electrodes on the inner surface is joined in a flexible state so as to form a closed space between the insulating plate and the other main surface of the insulating base, the pressure-sensitive package is accommodated in the package containing the semiconductor element. The elements are formed integrally, which makes it possible to reduce the size of the pressure detecting device and to shorten the wiring connecting the electrode for pressure detection and the semiconductor element, thereby reducing unnecessary static electricity generated between these wirings. The capacity can be reduced.

【0006】なお、このような圧力検出装置用パッケー
ジにおいては、半導体素子に接地電位を供給するための
接地導体が絶縁基体に配設されている。
In such a package for a pressure detecting device, a ground conductor for supplying a ground potential to the semiconductor element is provided on the insulating base.

【0007】しかしながら、この特願2000-178618で提
案した圧力検出装置用パッケージによると、接地導体と
第一電極および第二電極との間に形成される静電容量に
ついては考慮されておらず、接地導体と第一電極および
第二電極との間に不要な静電容量が大きく形成され、そ
のため圧力の検出感度が低下してしまうという問題点を
有していた。
However, according to the pressure detecting device package proposed in Japanese Patent Application No. 2000-178618, the capacitance formed between the ground conductor and the first and second electrodes is not considered. Unnecessary capacitance is formed large between the ground conductor and the first and second electrodes, which causes a problem that the pressure detection sensitivity is reduced.

【0008】本発明は、かかる上述の問題点に鑑み完成
されたものであり、その目的は、小型でかつ感度が高
く、外部の圧力を正確に検出することが可能な圧力検出
装置を提供することにある。
The present invention has been completed in view of the above-mentioned problems, and an object of the present invention is to provide a pressure detecting device which is small, has high sensitivity, and can accurately detect an external pressure. It is in.

【0009】[0009]

【課題を解決するための手段】本発明の圧力検出装置用
パッケージは、一方の主面に半導体素子が搭載される搭
載部を有する絶縁基体と、この絶縁基体に配設され、半
導体素子の電極が電気的に接続される複数の配線導体お
よび接地導体と、絶縁基体の他方の主面との間に密閉空
間を形成するように可撓な状態で絶縁基体に接合された
絶縁板と、前記密閉空間内の前記他方の主面に被着さ
れ、配線導体の一つに電気的に接続された静電容量形成
用の第一電極と、絶縁板の内側主面に第一電極と対向す
るように被着され、配線導体の他の一つに電気的に接続
された静電容量形成用の第二電極とを具備して成る圧力
検出装置用パッケージであって、第一電極および第二電
極と接地導体との間に形成された静電容量値が第一電極
と第二電極との間に形成された静電容量値の50%以下で
あることを特徴とするものである。
A package for a pressure detecting device according to the present invention has an insulating base having a mounting portion on one of its main surfaces on which a semiconductor element is mounted, and an electrode provided on the insulating base for mounting the semiconductor element. A plurality of wiring conductors and a ground conductor electrically connected to each other, and an insulating plate joined to the insulating base in a flexible state so as to form a sealed space between the other main surface of the insulating base; A first electrode for forming a capacitance, which is attached to the other main surface in the closed space and is electrically connected to one of the wiring conductors, and faces the first electrode on the inner main surface of the insulating plate. And a second electrode for forming a capacitance electrically attached to another one of the wiring conductors. The capacitance value formed between the electrode and the ground conductor is between the first electrode and the second electrode. It is characterized in that made the more than 50% of the capacitance value.

【0010】本発明の圧力検出装置用パッケージによれ
ば、第一電極および第二電極と接地電極との間に形成さ
れた静電容量値が第一電極と第二電極との間に形成され
た静電容量値の50%以下であることから、これらの第一
電極および第二電極と接地電極との間に形成された静電
容量が圧力検出感度を大きく低下させることはない。
According to the pressure detection device package of the present invention, the capacitance value formed between the first electrode and the second electrode and the ground electrode is formed between the first electrode and the second electrode. Since the capacitance value is 50% or less of the capacitance value, the capacitance formed between the first electrode and the second electrode and the ground electrode does not significantly lower the pressure detection sensitivity.

【0011】[0011]

【発明の実施の形態】次に、本発明を添付の図面を基に
詳細に説明する。図1は、本発明の圧力検出装置用パッ
ケージの実施の形態の一例を示す断面図であり、図中、
1は絶縁基体、2は絶縁板、3は半導体素子である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view illustrating an example of an embodiment of a pressure detection device package according to the present invention.
1 is an insulating base, 2 is an insulating plate, and 3 is a semiconductor element.

【0012】絶縁基体1は、下面中央部に半導体素子3
を収容するための凹部1aを有するとともに上面中央部
に後述する絶縁板2との間に略円板状の密閉空間を形成
するための略円形の凹部1cを有する酸化アルミニウム
質焼結体や窒化アルミニウム質焼結体・ムライト質焼結
体・ガラス−セラミックス等のセラミックス材料から成
る積層体であり、例えば酸化アルミニウム質焼結体から
成る場合であれば、酸化アルミニウム・酸化珪素・酸化
マグネシウム・酸化カルシウム等のセラミック原料粉末
に適当な有機バインダ・溶剤・可塑剤・分散剤を添加混
合して泥漿状となすとともにこれを従来周知のドクタブ
レード法を採用してシート状に成形することにより複数
枚のセラミックグリーンシートを得、しかる後、これら
のセラミックグリーンシートに適当な打ち抜き加工・積
層加工・切断加工を施すことにより絶縁基体1用の生セ
ラミック成形体を得るとともにこの生セラミック成形体
を後述する絶縁板2用のセラミックグリーンシートとと
もに約1600℃の温度で焼成することにより製作される。
An insulating base 1 has a semiconductor element 3
Aluminum nitride-based sintered body having a concave portion 1a for accommodating therein and a substantially circular concave portion 1c for forming a substantially disk-shaped closed space between the upper surface and an insulating plate 2 described later. A laminate made of a ceramic material such as an aluminum sintered body, a mullite sintered body, or a glass-ceramic. For example, in the case of an aluminum oxide sintered body, aluminum oxide, silicon oxide, magnesium oxide, oxide An appropriate organic binder, a solvent, a plasticizer, and a dispersant are added to a ceramic raw material powder such as calcium and mixed to form a slurry, which is formed into a sheet by employing a well-known doctor blade method. Ceramic green sheets, and then these ceramic green sheets are properly punched, laminated and cut. It is manufactured by firing at a temperature of about 1600 ° C. with a ceramic green sheet for the insulating plate 2 with obtaining raw ceramic formed body later this green ceramic body insulating substrate 1 by performing.

【0013】絶縁基体1は、その下面中央部に形成され
た凹部1aの底面中央部が半導体素子3が搭載される搭
載部1bとなっており、この搭載部1bに半導体素子3
を搭載するとともに凹部1a内に例えばエポキシ樹脂等
の樹脂製封止材4を充填することにより半導体素子3が
封止される。なお、この例では半導体素子3は樹脂製封
止材4を凹部1a内に充填することにより封止される
が、半導体素子3は絶縁基体1の下面に金属やセラミッ
クスから成る蓋体を凹部1aを塞ぐように接合させるこ
とにより封止されてもよい。
The insulating substrate 1 has a mounting portion 1b on which the semiconductor element 3 is mounted at the center of the bottom surface of the concave portion 1a formed at the center of the lower surface, and the semiconductor element 3 is mounted on the mounting portion 1b.
And the semiconductor element 3 is sealed by filling the recess 1a with a resin sealing material 4 such as an epoxy resin. In this example, the semiconductor element 3 is sealed by filling a resin sealing material 4 into the concave portion 1a. However, the semiconductor element 3 is provided with a lid made of metal or ceramic on the lower surface of the insulating base 1 in the concave portion 1a. It may be sealed by joining so as to close.

【0014】また、搭載部1bには半導体素子3の電極
が接続される複数の配線導体5および接地導体6が導出
しており、半導体素子3を接地導体6上に導電性接合材
を介して接合するとともに配線導体5および接地導体6
と半導体素子3の各電極をボンディングワイヤ7等の電
気的接続手段を介して接続することにより半導体素子3
の各電極と各配線導体5および接地導体6とが電気的に
接続される。なお、この例では、半導体素子3の電極と
配線導体5および接地導体6とはボンディングワイヤ7
を介して接続されるが、半導体素子3の電極と配線導体
5および接地導体6とは半田バンプ等の他の種類の電気
的接続手段により接続されてもよい。
A plurality of wiring conductors 5 and ground conductors 6 to which electrodes of the semiconductor element 3 are connected are led out from the mounting portion 1b. The semiconductor element 3 is placed on the ground conductor 6 via a conductive bonding material. Joining, wiring conductor 5 and ground conductor 6
And the respective electrodes of the semiconductor element 3 are connected via electrical connection means such as bonding wires 7 so that the semiconductor element 3
Are electrically connected to the respective wiring conductors 5 and the ground conductor 6. In this example, the electrodes of the semiconductor element 3 are connected to the wiring conductors 5 and the grounding conductors 6 by bonding wires 7.
However, the electrodes of the semiconductor element 3 may be connected to the wiring conductor 5 and the ground conductor 6 by another kind of electrical connection means such as a solder bump.

【0015】配線導体5は、半導体素子3の各電極を外
部電気回路および後述する第一電極8・第二電極9に電
気的に接続するための導電路として機能し、その一部は
絶縁基体1の外周下面に導出し、別の一部は第一電極8
・第二電極9に電気的に接続されている。また、接地導
体6は、半導体素子3に接地電位を供給するとともに半
導体素子3を搭載部1bに固定するための下地金属とし
て機能し、搭載部1bから絶縁基体1の下面外周部にか
けて形成されている。そして、半導体素子3を接地導体
6に金−シリコン合金等の導電性接合材を介して接合す
るとともに半導体素子3の各電極を配線導体5および接
地導体6にボンディングワイヤ7等の電気的接続手段を
介して電気的に接続した後、半導体素子3を樹脂製封止
材4で封止し、しかる後、配線導体5および接地導体6
の絶縁基体1外周下面に導出した部位を外部電気回路基
板の配線導体に半田等の導電性接合材を介して接合する
ことにより、内部に収容する半導体素子3が外部電気回
路に電気的に接続されることとなる。
The wiring conductor 5 functions as a conductive path for electrically connecting each electrode of the semiconductor element 3 to an external electric circuit and a first electrode 8 and a second electrode 9, which will be described later. 1 and the other part is the first electrode 8
-It is electrically connected to the second electrode 9. The ground conductor 6 supplies a ground potential to the semiconductor element 3 and functions as a base metal for fixing the semiconductor element 3 to the mounting portion 1b. The ground conductor 6 is formed from the mounting portion 1b to the outer peripheral portion of the lower surface of the insulating base 1. I have. Then, the semiconductor element 3 is bonded to the ground conductor 6 via a conductive bonding material such as a gold-silicon alloy, and each electrode of the semiconductor element 3 is electrically connected to the wiring conductor 5 and the ground conductor 6 by a bonding wire 7 or the like. , The semiconductor element 3 is sealed with a resin sealing material 4, and then the wiring conductor 5 and the ground conductor 6 are sealed.
The semiconductor element 3 housed inside is electrically connected to the external electric circuit by joining the portion led out to the lower surface of the outer periphery of the insulating base 1 to the wiring conductor of the external electric circuit board via a conductive bonding material such as solder. Will be done.

【0016】このような配線導体5および接地導体6
は、タングステンやモリブデン・銅・銀等の金属粉末メ
タライズから成り、タングステン等の金属粉末に適当な
有機バインダ・溶剤・可塑剤・分散剤等を添加混合して
得たメタライズペーストを従来周知のスクリーン印刷法
を採用して絶縁基体1用のセラミックグリーンシートに
所定のパターンに印刷塗布し、これを絶縁基体1用の生
セラミック成形体とともに焼成することによって絶縁基
体1の内部および表面に所定のパターンに形成される。
なお、配線導体5および接地導体6の露出表面には、配
線導体5および接地導体6が酸化腐食するのを防止する
とともに配線導体5および接地導体6とボンディングワ
イヤ7や導電性接合材との接合を良好なものとするため
に、通常であれば、厚みが1〜10μm程度のニッケルめ
っき層と厚みが0.1〜3μm程度の金めっき層とが順次
被着されている。
Such a wiring conductor 5 and a ground conductor 6
Consists of metallized metal powders such as tungsten, molybdenum, copper, silver, and the like. By applying a printing method to a ceramic green sheet for the insulating substrate 1 in a predetermined pattern by printing, and firing this together with the green ceramic molded body for the insulating substrate 1, a predetermined pattern is formed inside and on the surface of the insulating substrate 1. Is formed.
The exposed surfaces of the wiring conductor 5 and the grounding conductor 6 are prevented from being oxidized and corroded by the wiring conductor 5 and the grounding conductor 6, and are bonded to the bonding wire 7 and the conductive bonding material. In order to obtain a good value, normally, a nickel plating layer having a thickness of about 1 to 10 μm and a gold plating layer having a thickness of about 0.1 to 3 μm are sequentially applied.

【0017】また、絶縁基体1の上面中央部に形成され
た凹部1c底面には静電容量形成用の第一電極8が被着
されている。この第一電極8は、後述する絶縁板2の第
二電極9とともに感圧素子用の静電容量を形成するため
のものである。そして、この第一電極8には配線導体5
の一つ5aが接続されており、それによりこの配線導体
5aに半導体素子3の電極をボンディングワイヤ7等の
電気的接続手段を介して接続すると半導体素子3の電極
と第一電極8とが電気的に接続されるようになってい
る。
A first electrode 8 for forming a capacitance is attached to the bottom of the concave portion 1c formed at the center of the upper surface of the insulating base 1. The first electrode 8 is for forming a capacitance for a pressure-sensitive element together with a second electrode 9 of the insulating plate 2 described later. The first electrode 8 has a wiring conductor 5
When the electrode of the semiconductor element 3 is connected to the wiring conductor 5a via an electrical connection means such as a bonding wire 7, the electrode of the semiconductor element 3 and the first electrode 8 are electrically connected. The connection is made.

【0018】このような第一電極8は、タングステンや
モリブデン・銅・銀等の金属粉末メタライズから成り、
タングステン等の金属粉末に適当な有機バインダ・溶剤
・可塑剤・分散剤を添加混合して得たメタライズペース
トを従来周知のスクリーン印刷法を採用して絶縁基体1
用のセラミックグリーンシートに印刷塗布し、これを絶
縁基体1用の生セラミック成形体とともに焼成すること
によって絶縁基体1の上面中央部に所定のパターンに形
成される。
The first electrode 8 is made of a metal powder of tungsten, molybdenum, copper, silver or the like.
A metallized paste obtained by adding a suitable organic binder, a solvent, a plasticizer, and a dispersant to a metal powder such as tungsten is mixed with the insulating substrate 1 by using a conventionally known screen printing method.
A ceramic green sheet for printing is applied and baked together with a green ceramic molded body for the insulating substrate 1 to form a predetermined pattern at the center of the upper surface of the insulating substrate 1.

【0019】また、絶縁基体1の上面には凹部1cを覆
う略平板状の絶縁板2が絶縁基体1の上面との間に略円
板状の密閉空間を形成するようにして可撓な状態で絶縁
基体1に焼結一体化されて接合されている。絶縁板2
は、酸化アルミニウム質焼結体や窒化アルミニウム質焼
結体・ムライト質焼結体・ガラス−セラミックス等のセ
ラミックス材料から成る厚みが0.01〜5mmの略四角ま
たは略八角あるいは円形等の平板であり、外部の圧力に
応じて絶縁基体1側に撓むいわゆる圧力検出用のダイア
フラムとして機能する。
A substantially flat insulating plate 2 covering the recess 1c is formed on the upper surface of the insulating substrate 1 so as to form a substantially disc-shaped closed space between the insulating substrate 1 and the upper surface of the insulating substrate 1. And is sintered and integrated with the insulating base 1 and joined. Insulating plate 2
Is a flat plate of about 0.01 to 5 mm in thickness of approximately square or approximately octagonal or circular made of a ceramic material such as aluminum oxide sintered body, aluminum nitride sintered body, mullite sintered body, glass-ceramics, It functions as a so-called pressure detecting diaphragm that bends toward the insulating base 1 in response to external pressure.

【0020】このような絶縁板2は、例えば酸化アルミ
ニウム質焼結体から成る場合であれば、酸化アルミニウ
ム・酸化珪素・酸化マグネシウム・酸化カルシウム等の
セラミック原料粉末に適当な有機バインダ・溶剤・可塑
剤・分散剤を添加混合して泥漿状となすとともにこれを
従来周知のドクタブレード法を採用してシート状に成形
することにより絶縁板2用のセラミックグリーンシート
を得、しかる後、このセラミックグリーンシートに適当
な打ち抜き加工や切断加工を施すとともに絶縁基体1用
の生セラミック成形体上に積層し、これを絶縁基体1用
の生セラミック成形体とともに約1600℃の温度で焼成
し、絶縁基体1と焼結一体化することにより製作され
る。
If the insulating plate 2 is made of, for example, an aluminum oxide sintered body, an organic binder, a solvent, and a plastic material suitable for ceramic raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide. A ceramic green sheet for the insulating plate 2 is obtained by adding and mixing an agent and a dispersant to form a slurry and forming the slurry into a sheet shape by employing a conventionally known doctor blade method. The sheet is subjected to an appropriate punching or cutting process and laminated on a green ceramic molded body for the insulating substrate 1, which is fired together with the green ceramic molded body for the insulating substrate 1 at a temperature of about 1600 ° C. It is manufactured by sintering and integration.

【0021】なお、絶縁板2は、その厚みが0.01mm未
満では、その機械的強度が小さいものとなってしまうた
め、これに大きな外部圧力が印加された場合に破壊され
てしまう危険性が大きなものとなり、他方、5mmを超
えると、小さな圧力では撓みにくくなり、圧力検出用の
ダイアフラムとしては不適となってしまう。したがっ
て、絶縁板2の厚みは0.01〜5mmの範囲が好ましい。
If the thickness of the insulating plate 2 is less than 0.01 mm, the mechanical strength of the insulating plate 2 becomes small, so that there is a great risk that the insulating plate 2 will be broken when a large external pressure is applied thereto. On the other hand, if it exceeds 5 mm, it becomes difficult to bend under a small pressure, and it becomes unsuitable as a diaphragm for pressure detection. Therefore, the thickness of the insulating plate 2 is preferably in the range of 0.01 to 5 mm.

【0022】また、絶縁板2の下面には静電容量形成用
の略円形の第二電極9が第一電極8と対向するようにし
て被着されている。この第二電極9は、前述の第一電極
8とともに感圧素子用の静電容量を形成するための電極
として機能する。そして、第二電極9には配線導体5の
他の一つ5bが接続されており、それにより配線導体5
bに半導体素子3の電極をボンディングワイヤ7等の電
気的接続手段を介して接続すると半導体素子3の電極と
第二電極9とが電気的に接続されるようになっている。
A substantially circular second electrode 9 for forming a capacitance is attached to the lower surface of the insulating plate 2 so as to face the first electrode 8. The second electrode 9 functions as an electrode for forming a capacitance for the pressure-sensitive element together with the first electrode 8 described above. The other one 5b of the wiring conductor 5 is connected to the second electrode 9, so that the wiring conductor 5
When the electrode of the semiconductor element 3 is connected to the electrode b via an electrical connection means such as a bonding wire 7, the electrode of the semiconductor element 3 and the second electrode 9 are electrically connected.

【0023】このとき、第一電極8と第二電極9とは、
絶縁基体1と絶縁板2との間に形成された密閉空間を挟
んで対向しており、これらの間には、第一電極8や第二
電極9の面積および第一電極8と第二電極9との間隔に
応じて所定の静電容量が形成される。そして、絶縁板2
の上面に外部の圧力が印加されると、その圧力に応じて
絶縁板2が絶縁基体1側に撓んで第一電極8と第二電極
9との間隔が変わり、それにより第一電極8と第二電極
9との間の静電容量が変化するので、外部の圧力の変化
を静電容量の変化として感知する感圧素子として機能す
る。そして、この静電容量の変化を凹部1a内に収容し
た半導体素子3に配線導体5a・5bを介して伝達し、
これを半導体素子3で演算処理することによって外部の
圧力の大きさを知ることができる。
At this time, the first electrode 8 and the second electrode 9
They face each other with a closed space formed between the insulating base 1 and the insulating plate 2 therebetween, between which the areas of the first electrode 8 and the second electrode 9 and the first electrode 8 and the second electrode A predetermined capacitance is formed in accordance with the distance from the capacitor 9. And the insulating plate 2
When an external pressure is applied to the upper surface of the first electrode 8, the insulating plate 2 bends toward the insulating base 1 in accordance with the external pressure, and the distance between the first electrode 8 and the second electrode 9 changes. Since the capacitance between the second electrode 9 and the second electrode 9 changes, it functions as a pressure-sensitive element that detects a change in external pressure as a change in capacitance. Then, the change in the capacitance is transmitted to the semiconductor element 3 housed in the recess 1a via the wiring conductors 5a and 5b,
The magnitude of the external pressure can be known by performing an arithmetic process on this in the semiconductor element 3.

【0024】なお、第二電極9は、タングステンやモリ
ブデン・銅・銀等の金属粉末メタライズから成り、タン
グステン等の金属粉末に適当な有機バインダ・溶剤・可
塑剤・分散剤を添加混合して得たメタライズペーストを
従来周知のスクリーン印刷法を採用して絶縁板2用のセ
ラミックグリーンシートに印刷塗布し、これを絶縁板2
用のセラミックグリーンシートとともに焼成することに
よって絶縁板2の下面に第一電極8と対向する所定の形
状に形成される。
The second electrode 9 is made of a metallized metal powder such as tungsten, molybdenum, copper, silver or the like, and is obtained by adding a suitable organic binder, solvent, plasticizer and dispersant to a metal powder such as tungsten. The metallized paste is applied by printing to a ceramic green sheet for the insulating plate 2 by using a conventionally known screen printing method, and this is applied to the insulating plate 2.
By firing together with the ceramic green sheet for use, a predetermined shape facing the first electrode 8 is formed on the lower surface of the insulating plate 2.

【0025】そして、本発明においては、第一電極8お
よび第二電極9と接地導体6との間に形成された静電容
量値が第一電極8と第二電極9との間に形成された静電
容量値の50%以下となっており、そのことが重要であ
る。このように、第一電極8および第二電極9と接地導
体6との間に形成された静電容量値が第一電極8と第二
電極9との間に形成された静電容量値の50%以下である
ことから、第一電極8および第二電極9と接地導体6と
の間に形成された静電容量が圧力の検出感度を大きく低
下させることはなく、したがって外部の圧力を感度よく
検出することができる。
In the present invention, the capacitance value formed between the first electrode 8 and the second electrode 9 and the ground conductor 6 is formed between the first electrode 8 and the second electrode 9. It is less than 50% of the capacitance value, which is important. As described above, the capacitance value formed between the first electrode 8 and the second electrode 9 and the ground conductor 6 is equal to the capacitance value formed between the first electrode 8 and the second electrode 9. Since it is 50% or less, the capacitance formed between the first electrode 8 and the second electrode 9 and the ground conductor 6 does not significantly lower the pressure detection sensitivity. It can be detected well.

【0026】なお、第一電極8および第二電極9と接地
導体6との間に形成された静電容量値が第一電極8と第
二電極9との間に形成された静電容量値の50%を超える
と、第一電極8および第二電極9と接地導体6との間に
形成された静電容量が圧力の検出感度を大きく低下させ
てしまう。したがって、第一電極8および第二電極9と
接地導体6との間に形成された静電容量値は、第一電極
8と第二電極9との間に形成された静電容量値の50%以
下に特定される。
The capacitance value formed between the first electrode 8 and the second electrode 9 and the ground conductor 6 is equal to the capacitance value formed between the first electrode 8 and the second electrode 9. Exceeds 50%, the capacitance formed between the first electrode 8 and the second electrode 9 and the ground conductor 6 greatly reduces the pressure detection sensitivity. Therefore, the capacitance value formed between the first electrode 8 and the second electrode 9 and the ground conductor 6 is 50 times the capacitance value formed between the first electrode 8 and the second electrode 9. % Or less.

【0027】なお、第一電極8および第二電極9と接地
導体6との間に形成される静電容量値を第一電極8と第
二電極9との間に形成される静電容量値の50%以下とす
るには、第一電極8および第二電極9と接地導体6とが
重なりあう面積を小さくするとともに第一電極8および
第二電極9と接地導体6との距離を大きくしたり、絶縁
基体1の誘電率を小さくしたりすれば良い。
The capacitance value formed between the first electrode 8 and the second electrode 9 and the ground conductor 6 is changed to the capacitance value formed between the first electrode 8 and the second electrode 9. In order to make it 50% or less, the overlapping area between the first electrode 8 and the second electrode 9 and the ground conductor 6 is reduced, and the distance between the first electrode 8 and the second electrode 9 and the ground conductor 6 is increased. Alternatively, the dielectric constant of the insulating base 1 may be reduced.

【0028】このように、本発明の圧力検出装置用パッ
ケージによれば、一方の主面に半導体素子3が搭載され
る絶縁基体1の他方の主面に静電容量形成用の第一電極
8を設けるとともに、この第一電極8に対向する静電容
量形成用の第二電極9を内側面に有する絶縁板2を絶縁
基体1の他方の主面との間に密閉空間を形成するように
可撓な状態で絶縁基体1に接合させたことから、半導体
素子3を収容する容器と感圧素子とが一体となり、その
結果、圧力検出装置を小型化することができる。また、
静電容量形成用の第一電極8および第二電極9を絶縁基
体1に配設された配線導体5a・5bを介して半導体素
子3に接続することから、第一電極8および第二電極9
を短い距離で半導体素子3に接続することができ、これ
らの配線導体5a・5b間に発生する不要な静電容量を
小さなものとして感度の高い圧力検出装置を提供するこ
とができる。
As described above, according to the pressure detecting device package of the present invention, the first electrode 8 for forming a capacitance is formed on the other main surface of the insulating base 1 on which the semiconductor element 3 is mounted on one main surface. And an insulating plate 2 having an inner surface on which an electrostatic capacity forming second electrode 9 facing the first electrode 8 forms an enclosed space between the insulating plate 2 and the other main surface of the insulating base 1. Since it is joined to the insulating base 1 in a flexible state, the container accommodating the semiconductor element 3 and the pressure-sensitive element are integrated, and as a result, the pressure detecting device can be downsized. Also,
Since the first electrode 8 and the second electrode 9 for forming the capacitance are connected to the semiconductor element 3 via the wiring conductors 5a and 5b provided on the insulating base 1, the first electrode 8 and the second electrode 9 are connected.
Can be connected to the semiconductor element 3 over a short distance, and unnecessary capacitance generated between these wiring conductors 5a and 5b can be reduced to provide a highly sensitive pressure detection device.

【0029】かくして、上述の圧力検出装置用パッケー
ジによれば、搭載部1bに半導体素子3を搭載するとと
もに半導体素子3の各電極と配線導体5および接地導体
6とを電気的に接続し、しかる後、半導体素子3を封止
することによって小型でかつ感度が高く、外部の圧力を
正確に検出することが可能な圧力検出装置となる。
Thus, according to the above-described package for a pressure detecting device, the semiconductor element 3 is mounted on the mounting portion 1b, and each electrode of the semiconductor element 3 is electrically connected to the wiring conductor 5 and the ground conductor 6. Thereafter, by sealing the semiconductor element 3, a compact and high-sensitivity pressure detection device capable of accurately detecting an external pressure is obtained.

【0030】なお、本発明は、上述の実施の形態の一例
に限定されるものではなく、本発明の要旨を逸脱しない
範囲であれば種々の変更は可能であり、例えば上述の実
施の形態の一例では、絶縁基体1と絶縁板2とを焼結一
体化させることにより接合したが、絶縁基体1と絶縁板
2とはろう付けにより接合してもよい。
It should be noted that the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the scope of the present invention. In one example, the insulating base 1 and the insulating plate 2 are joined by sintering and integration, but the insulating base 1 and the insulating plate 2 may be joined by brazing.

【0031】[0031]

【発明の効果】以上、説明したように、本発明の圧力検
出装置用パッケージによれば、一方の主面に半導体素子
が搭載される絶縁基体の他方の主面に静電容量形成用の
第一電極を設けるとともに、この第一電極に対向する静
電容量形成用の第二電極を有する絶縁板を絶縁基体の他
方の主面との間に密閉空間を形成するように可撓な状態
で接合したことから、半導体素子を収容する容器と感圧
素子とが一体となり、その結果、圧力検出装置を小型と
することができる。さらに第一電極および第二電極と接
地電極との間に形成された静電容量値が第一電極と第二
電極との間に形成された静電容量値の50%以下であるこ
とから、これらの第一電極および第二電極と接地電極と
の間に形成された静電容量が圧力の検出感度を大きく低
下させることがなく、その結果、外部の圧力を正確かつ
感度良く検出することが可能な圧力検出装置を提供する
ことができる。
As described above, according to the pressure detecting device package of the present invention, the first main surface of the insulating base on which the semiconductor element is mounted is provided with the second main surface for forming the capacitance. Along with providing one electrode, an insulating plate having a second electrode for capacitance formation facing the first electrode is formed in a flexible state so as to form a closed space between the insulating plate and the other main surface of the insulating base. Because of the joining, the container accommodating the semiconductor element and the pressure-sensitive element are integrated, and as a result, the pressure detection device can be reduced in size. Further, since the capacitance value formed between the first electrode and the second electrode and the ground electrode is 50% or less of the capacitance value formed between the first electrode and the second electrode, The capacitance formed between the first electrode and the second electrode and the ground electrode does not significantly reduce the pressure detection sensitivity, and as a result, it is possible to accurately and sensitively detect the external pressure. A possible pressure sensing device can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の圧力検出装置用パッケージの実施の形
態の一例を示す断面図である。
FIG. 1 is a cross-sectional view showing an example of an embodiment of a package for a pressure detecting device according to the present invention.

【図2】従来の圧力検出装置を示す断面図である。FIG. 2 is a cross-sectional view showing a conventional pressure detecting device.

【符号の説明】[Explanation of symbols]

1・・・・・絶縁基体 1b・・・・搭載部 2・・・・・絶縁板 3・・・・・半導体素子 5・・・・・配線導体 6・・・・・接地導体 8・・・・・第一電極 9・・・・・第二電極 1 ... insulating base 1 b ... mounting part 2 ... insulating plate 3 ... semiconductor element 5 ... wiring conductor 6 ... ground conductor 8 ... ... first electrode 9 ... second electrode

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 一方の主面に半導体素子が搭載される搭
載部を有する絶縁基体と、該絶縁基体に配設され、前記
半導体素子の電極が電気的に接続される複数の配線導体
および接地導体と、前記絶縁基体の他方の主面との間に
密閉空間を形成するように可撓な状態で前記絶縁基体に
接合された絶縁板と、前記密閉空間内の前記他方の主面
に被着され、前記配線導体の一つに電気的に接続された
静電容量形成用の第一電極と、前記絶縁板の内側主面に
前記第一電極と対向するように被着され、前記配線導体
の他の一つに電気的に接続された静電容量形成用の第二
電極とを具備して成る圧力検出装置用パッケージであっ
て、前記第一電極および前記第二電極と前記接地導体と
の間に形成された静電容量値が前記第一電極と前記第二
電極との間に形成された静電容量値の50%以下である
ことを特徴とする圧力検出装置用パッケージ。
An insulating base having a mounting portion on one main surface on which a semiconductor element is mounted, a plurality of wiring conductors disposed on the insulating base and electrically connected to electrodes of the semiconductor element, and a ground. An insulating plate joined to the insulating base in a flexible state so as to form a sealed space between the conductor and the other main surface of the insulating base; and an insulating plate covering the other main surface in the sealed space. A first electrode for forming a capacitance, which is electrically connected to one of the wiring conductors, and is attached to an inner main surface of the insulating plate so as to face the first electrode; A package for a pressure detecting device comprising: a second electrode for forming a capacitance electrically connected to another one of the conductors, wherein the first electrode, the second electrode, and the ground conductor Is formed between the first electrode and the second electrode. A package for a pressure detection device, wherein the package has a capacitance value of 50% or less.
JP2001155493A 2001-05-24 2001-05-24 Package for pressure detector Pending JP2002350264A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001155493A JP2002350264A (en) 2001-05-24 2001-05-24 Package for pressure detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001155493A JP2002350264A (en) 2001-05-24 2001-05-24 Package for pressure detector

Publications (1)

Publication Number Publication Date
JP2002350264A true JP2002350264A (en) 2002-12-04

Family

ID=18999671

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2002350264A (en)

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JP2006090846A (en) * 2004-09-24 2006-04-06 Denso Corp Pressure sensor
JP2010038916A (en) * 2008-07-31 2010-02-18 Sensata Technologies Inc Pressure sensor for measuring pressure in medium

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JP2000111434A (en) * 1998-10-06 2000-04-21 Hokuriku Electric Ind Co Ltd Capacitance type pressure sensor unit

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Publication number Priority date Publication date Assignee Title
JPH049727A (en) * 1990-04-27 1992-01-14 Toyoda Mach Works Ltd Capacity type pressure sensor
JPH04143628A (en) * 1990-10-05 1992-05-18 Yamatake Honeywell Co Ltd Capacitance type pressure sensor
JPH06288852A (en) * 1993-03-30 1994-10-18 Honda Motor Co Ltd Pressure sensor
JPH09133594A (en) * 1995-11-07 1997-05-20 Tokin Corp Semiconductor pressure sensor
JPH10300614A (en) * 1997-04-28 1998-11-13 Fuji Koki Corp Pressure sensor
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