JP2002048370A - Lifting chamber - Google Patents

Lifting chamber

Info

Publication number
JP2002048370A
JP2002048370A JP2000230894A JP2000230894A JP2002048370A JP 2002048370 A JP2002048370 A JP 2002048370A JP 2000230894 A JP2000230894 A JP 2000230894A JP 2000230894 A JP2000230894 A JP 2000230894A JP 2002048370 A JP2002048370 A JP 2002048370A
Authority
JP
Japan
Prior art keywords
equipment
pulling
room
duct
air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000230894A
Other languages
Japanese (ja)
Inventor
Michiaki Oda
道明 小田
Hideaki Matsushima
秀明 松嶋
Kazuya Nakagawa
和也 中川
Toshiro Hayashi
俊郎 林
Hidetoshi Seki
秀俊 関
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Handotai Co Ltd
Original Assignee
Shin Etsu Handotai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Handotai Co Ltd filed Critical Shin Etsu Handotai Co Ltd
Priority to JP2000230894A priority Critical patent/JP2002048370A/en
Priority to PCT/JP2001/006432 priority patent/WO2002010651A1/en
Priority to TW090118619A priority patent/TW498458B/en
Publication of JP2002048370A publication Critical patent/JP2002048370A/en
Pending legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24FAIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F3/00Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
    • F24F3/12Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
    • F24F3/16Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
    • F24F3/167Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Ventilation (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a lifting chamber provided with an air-conditioning system capable of enhancing productivity and yield of single crystals and enabling manufacture of single crystal rods with high quality, by eliminating generation of an ascending air current caused by instruments and facilities producing heat functionally and disturbance of a descending air current and keeping cleanliness and temperature of a lifting chamber at an optimum state without damaging maintainability of implements attached to a lifting device. SOLUTION: The lifting chamber has a multi-layered structure with at least two layers having a circulating air conditioning system blowing cleaned air from an outlet provided in the uppermost layer and sucking air from a return duct in the lowermost layer. Among the instruments and facilities attached to a single crystal lifting device and installed in the lowermost layer, the instruments and facilities having working temperature higher by 10 deg.C than a room temperature of the lifting chamber are installed in the vicinity of the return duct, or an induction duct is provided above the instruments and facilities.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、単結晶引上げ機を
設置する引上げ室に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pulling room for installing a single crystal pulling machine.

【0002】[0002]

【従来の技術】従来、半導体材料の基板として用いられ
る半導体単結晶の引上げ機は、1引上げ室に数台から数
十台が配置されている。そして、引上げ室はクリーン度
を必要とされる上層階と真空ポンプ、電源装置、制御装
置、排ガス管、冷却水戻り配管等の付帯機器を配置した
下層階に分けられ、引上げ室の上部から下層階に向かう
クリーンな気流を供給する空調システムを具備してい
る。
2. Description of the Related Art Conventionally, several to several tens of single crystal pulling machines have been arranged in a single pulling chamber. The lifting room is divided into an upper floor where cleanliness is required and a lower floor where auxiliary equipment such as a vacuum pump, power supply, control unit, exhaust gas pipe, cooling water return pipe, etc. are arranged. It has an air conditioning system that supplies a clean airflow to the floor.

【0003】例えば、図2に示したものは2層階の引上
げ室であって、引上げ室1内に数台ないし数十台の単結
晶引上げ機11が設置され、グレーチング通風口6を有
する上層階床で上層階と下層階の2層に分かれている。
一方、上層階の天井付近にはフィルタ8があって、その
吹出し口10からクリーンエアを吹出し、グレーチング
通風口6を通って下層階の側壁あるいは周辺の天井に配
置したリターンダクト4から汚染気流を吸引し、熱交換
器9で温度調節を行い、送風機7で送風ダクト3へ送り
出す循環型の空調システム2を備えている。そして真空
ポンプ12、電源装置13等の引上げ機11に付帯する
機器・設備類は通常引上げ機11の架台周辺に配置され
ている。
For example, what is shown in FIG. 2 is a two-story pulling room, in which several to several tens of single crystal pulling machines 11 are installed in a pulling room 1 and an upper layer having a grating ventilation port 6. The floor is divided into two floors, an upper floor and a lower floor.
On the other hand, there is a filter 8 near the ceiling of the upper floor, and clean air is blown out from the outlet 10 thereof. The air conditioner is provided with a circulation type air conditioning system 2 that sucks air, adjusts the temperature with a heat exchanger 9, and sends the air to a blow duct 3 with a blower 7. In addition, equipment and facilities such as the vacuum pump 12 and the power supply device 13 that are attached to the pulling machine 11 are usually arranged around the gantry of the pulling machine 11.

【0004】近年、引上げ機の大型化に伴い、付帯機器
も同様な傾向で大型化し、特に真空ポンプは動力の増強
により発熱量が増大し、真空ポンプの近傍では上昇気流
が発生するようになってきた。そして、このようなその
機能上発熱する機器・設備が、空調システムのリターン
ダクトより離れた場所に設置されていると、上昇気流は
リターンダクトに向かわず、上層階のグレーチング通風
口を通って吹き上がり、上層階のクリーン度を悪化させ
ることがあった。
In recent years, with the increase in the size of the pulling machine, the size of the auxiliary equipment has been increasing in the same tendency. In particular, the calorific value of the vacuum pump has increased due to the increase in power, and an ascending airflow has been generated near the vacuum pump. Have been. If such equipment / equipment that generates heat in a function is installed in a place away from the return duct of the air conditioning system, the rising airflow does not go to the return duct, but blows through the grating ventilation holes on the upper floor. Climbing up and lowering the cleanliness of the upper floors.

【0005】また、種々の大型付帯機器や装置基礎を配
置した下層階では気流の澱みが生じ易く、局部的に高温
なエリアを形成し、付帯機器のメンテナンス作業環境を
悪化させたり、引上げ機に具備された精密機器に悪影響
を及ぼすことがあった。
[0005] In addition, on the lower floor where various large-scale ancillary equipment and equipment foundations are arranged, air currents tend to stagnate, forming a locally high-temperature area, deteriorating the maintenance work environment of the ancillary equipment, and improving the lifting equipment. The installed precision equipment could be adversely affected.

【0006】これらの問題点を解決するため、付帯機器
の配置変更や局所空調機の導入を行ってきたが、メンテ
ナンス作業牲の悪化や、ランニングコストが増加する欠
点があった。
[0006] In order to solve these problems, the arrangement of ancillary equipment has been changed or a local air conditioner has been introduced. However, there have been disadvantages in that maintenance work is deteriorated and running costs are increased.

【0007】一方、真空ポンプのように駆動音を発する
装置を多数設置すると、常時作業者のいる上層階やメン
テナンスを行う下層階の騒音レベルが上昇するため、引
上げ室周辺に真空ポンプ専用室を設けることがあった
が、別系統の空調システムを設ける必要があり、ランニ
ングコストが増加する欠点があった。
On the other hand, when a large number of devices that emit driving noise such as vacuum pumps are installed, the noise level of the upper floor where workers are constantly located or the lower floor where maintenance is performed is increased. In some cases, however, a separate air conditioning system must be provided, which has the disadvantage of increasing running costs.

【0008】[0008]

【発明が解決しようとする課題】引上げ室の上層階はク
リーンルームとして維持管理するため、気流を制御する
方法が種々検討されてきた(例えば、特開平6−159
751号公報参照)。しかし、下層階で生じる発熱や排
熱が引上げ室のリターンダクトに吸引されず、局部的に
上昇気流を発生させたり、下層階に熱気流が澱んで作業
環境を悪化させることが課題として残っていた。特に1
000m2 を超えるような広い引上げ室の空調システム
は、一旦立ち上げると気流の風速、風量、風向等の大幅
な変更は困難となり、上述したような局所的な処置で対
応せざるを得なかった。
In order to maintain the upper floor of the pulling room as a clean room, various methods of controlling the air flow have been studied (for example, Japanese Patent Laid-Open No. 6-159).
No. 751). However, heat and waste heat generated in the lower floor are not sucked into the return duct of the pulling room, and locally generated ascending air currents or hot air currents in the lower floors deteriorating the working environment remain problems. Was. Especially 1
Once the air-conditioning system of a large pulling room exceeding 000 m 2 is started, it is difficult to change the wind speed, air volume, wind direction, etc. of the air current drastically, and it has to be dealt with by the local treatment as described above. .

【0009】そこで、本発明は、これらの問題点を解決
するためになされたもので、その機能上発熱する機器・
設備による上昇気流の発生とこれに伴う下降流の乱れを
排除するとともに、引上げ機付帯機器のメンテナンス作
業性を損なうことなく、引上げ室のクリーン度と温度を
最適な状態に維持することで単結晶の生産性と歩留りの
向上を図り、高品質の単結晶棒を製造することができる
空調システムを備えた引上げ室を提供することを主たる
目的とするものである。
Accordingly, the present invention has been made to solve these problems, and has been described as an apparatus / device which generates heat due to its function.
Eliminates the generation of updrafts by the equipment and the resulting turbulence of downdrafts, while maintaining the optimal degree of cleanliness and temperature in the pulling room without impairing the maintenance workability of the equipment attached to the pulling machine. It is an object of the present invention to provide a pulling room equipped with an air conditioning system capable of improving the productivity and yield of the steel and producing a high-quality single crystal rod.

【0010】[0010]

【課題を解決するための手段】上記課題を解決するため
本発明の引上げ室に係る発明は、上層階の吹き出し口か
らクリーンエアを吹き出し、下層階のリターンダクトか
ら吸引する循環型の空調システムを備えた少なくとも2
層以上の多層階構造をなす引上げ室において、単結晶引
上げ機に付帯し、下層階に設置される機器・設備であっ
て、その常用温度が引上げ室の室温より10℃以上高い
機器・設備をリターンダクト近傍に設置するか、あるい
は前記機器・設備の上部に誘導ダクトを設置したことを
特徴としている(請求項1)。
SUMMARY OF THE INVENTION In order to solve the above problems, the invention relating to the pulling room of the present invention is directed to a circulation type air conditioning system which blows clean air from an outlet on an upper floor and sucks it from a return duct on a lower floor. With at least 2
In a pulling room with a multi-story structure with more than one layer, equipment / equipment that is attached to the single crystal pulling machine and installed on the lower floor and whose normal temperature is at least 10 ° C higher than the room temperature of the pulling room. The present invention is characterized in that it is installed near a return duct or an induction duct is installed above the device / equipment (claim 1).

【0011】上記構成の引上げ室によれば、引上げ室の
下層階の側壁または周囲の天井に設置したリターンダク
トの近傍、すなわち、ダクト吸引口の近傍あるいはダク
ト内部にその機能上発熱する機器・設備であって、その
常用温度が引上げ室の室温より10℃以上高い機器・設
備を設置するか、あるいこれらの機器・設備の上部に誘
導ダクトを設置し、これらからの発熱を直ちにリターン
ダクトあるいは誘導ダクトに吸引させることで、下層階
で発生する汚れた上昇気流を排除し、排熱を十分行っ
て、上層階のクリーン度低下を防ぎ、上層階の室温を下
げることなく、下層階の室温をメンテナンス作業環境に
適した温度にすることができるとともに、機器の精度、
機器の動作環境に対する悪影響を回避することができ
る。
According to the pulling room having the above-mentioned structure, the equipment / equipment which generates heat in the vicinity of the return duct installed on the side wall of the lower floor of the pulling room or the surrounding ceiling, ie, near the duct suction port or inside the duct. And installing equipment or facilities whose normal temperature is at least 10 ° C higher than the room temperature of the lifting room, or installing an induction duct above these equipment or facilities, and immediately returning heat from these to the return duct or By sucking the air into the induction duct, the dirty updraft generated on the lower floor is eliminated, sufficient heat is removed, the cleanliness of the upper floor is prevented, and the room temperature on the lower floor is maintained without lowering the room temperature on the upper floor. The temperature suitable for the maintenance work environment,
An adverse effect on the operating environment of the device can be avoided.

【0012】そしてこの場合、リターンダクト近傍に設
置する機器・設備は、少なくとも真空ポンプとするのが
好ましい(請求項2)。ここで真空ポンプは、単結晶引
上げ機の大型化に伴って著しく大型化した機器で、その
発熱量も増大し、その近傍で上昇気流が発生するように
なった。そこで引上げ室の下層階の側壁または周囲の天
井にリターンダクトを設置し、その吸引口近傍あるいは
ダクト内部に真空ポンプを配置し、これからの上昇気流
を直ちにリターンダクトに吸引させることで、上層階に
達するような上昇気流を排除し、排熱効果を十分挙げる
ことができる。
[0012] In this case, it is preferable that at least the vacuum pump be used for the equipment and facilities installed near the return duct. Here, the vacuum pump is a device that has been significantly increased in size with the increase in the size of the single crystal pulling machine. The calorific value has also increased, and an ascending air current has been generated near the vacuum pump. Therefore, a return duct is installed on the side wall of the lower floor of the lifting room or on the surrounding ceiling, and a vacuum pump is placed near the suction port or inside the duct, and the updraft from here on is immediately sucked into the return duct, so that the upper floor is It is possible to eliminate the ascending airflow that can be reached and to sufficiently raise the exhaust heat effect.

【0013】またこの場合、上部に誘導ダクトを設置す
る機器・設備が、電源装置、制御装置、排ガス管および
冷却水戻り配管とすることができる(請求項3)。この
ように、電源装置、制御装置、排ガス管および冷却水戻
り配管等もその機能上発熱するが、その特性上設置場所
が限定される。そこでその特定位置において、その上部
に誘導ダクトを設置し、吸引口を効果的に配置するよう
にする。その結果、これらから発生する上昇気流を効率
よく吸引して、排熱による下層階の作業環境の悪化を防
止し、汚れた上昇気流による上層階のクリーン度悪化を
防ぐことができる。
[0013] In this case, the equipment and facilities for installing the guide duct at the top can be a power supply device, a control device, an exhaust gas pipe, and a cooling water return pipe. As described above, the power supply device, the control device, the exhaust gas pipe, the cooling water return pipe, and the like also generate heat due to their functions, but their installation locations are limited due to their characteristics. Therefore, at the specific position, a guide duct is installed above the specific position to effectively arrange the suction port. As a result, it is possible to efficiently suck the upward airflow generated from these, prevent the lower floor from deteriorating the work environment due to exhaust heat, and prevent the cleanliness of the upper floor from deteriorating due to the dirty upward airflow.

【0014】さらにこの場合、誘導ダクトの中間に送風
機を備えることが好ましい(請求項4)。この誘導ダク
トは、様々の形状、大きさを有する機器・設備をその対
象としているので、ダクトの形状、大きさも様々で空気
抵抗も大きくなり易いのでダクトの中間に送風機を設け
て上昇気流を効率よく吸引するようにする。
Further, in this case, it is preferable to provide a blower in the middle of the guide duct. Since this guide duct is intended for equipment and facilities with various shapes and sizes, the duct shape and size are various and the air resistance is likely to be large, so a blower is installed in the middle of the duct to reduce the ascending airflow efficiently. Make sure to aspirate well.

【0015】加えて、常用温度が室温より高い機器・設
備が騒音を発する場合、騒音発生源の上流側に遮音壁を
設けることができる(請求項5)。このようにすること
で、引上げ室の騒音対策が容易に効果的に行える。
[0015] In addition, when equipment or equipment whose normal temperature is higher than room temperature emits noise, a sound insulation wall can be provided upstream of the noise source. This makes it possible to easily and effectively take measures against noise in the pulling room.

【0016】さらに、引上げ室の床面積は、150平方
メートル以上であるものとすることができる(請求項
6)。上記したように本発明を構成したことにより、整
流されたダウンフローが生じ、隣接する引上げ機同士間
の熱の干渉が減少すると共に、下層階の機器・設備の配
置が整理されたので、単結晶引上げ機間の間隔を短縮す
ることが可能となり、引上げ室における引上げ機の充填
密度を上げることができる。また、上層階と下層階の温
度差が小さくなり、局所空調の必要もない。従って、本
発明により、設備コスト、ランニングコストの低減が図
られる。例えば直径8インチ単結晶引上げ機の場合、少
なくとも5台設置可能な引上げ室の床面積は150m2
(1台当たり30m2 )まで縮小させることができた。
Further, the floor area of the pulling room can be 150 square meters or more. By configuring the present invention as described above, a rectified downflow occurs, the heat interference between adjacent lifting machines is reduced, and the arrangement of the equipment and facilities on the lower floor is arranged. The interval between the crystal pullers can be reduced, and the packing density of the pullers in the pulling chamber can be increased. Further, the temperature difference between the upper floor and the lower floor becomes smaller, and there is no need for local air conditioning. Therefore, according to the present invention, equipment costs and running costs can be reduced. For example, in the case of an 8-inch diameter single crystal pulling machine, the floor area of a pulling room in which at least 5 units can be installed is 150 m 2.
(30 m 2 per vehicle).

【0017】また1000m2 を越えるような広大な引
上げ室の空調システムでは、一旦立ち上げると気流の風
速、風量、風向等の大幅な変更や調整は困難となるが、
本発明の構成を適用することにより、整流された下降流
が生じるので効率的な空調を行うことができ、設備の低
コスト化、省エネルギー化を図ることができる。
In an air conditioning system for a large pulling room exceeding 1000 m 2 , it is difficult to significantly change or adjust the wind speed, air volume, wind direction, etc. of the air flow once it is started up.
By applying the configuration of the present invention, a rectified downflow is generated, so that efficient air conditioning can be performed, and cost reduction and energy saving of equipment can be achieved.

【0018】[0018]

【発明の実施の形態】以下、本発明の実施の形態を説明
するが、本発明はこれらに限定されるものではない。以
下、本発明について詳細に説明する。本発明者らは、そ
の機能上発熱する機器・設備による上昇気流の発生とこ
れによる気流の乱れを排除するとともに、引上げ機付帯
機器のメンテナンス作業性を損なうことなく、引上げ室
のクリーン度と温度を最適な状態に維持するには、これ
らの機器・設備の設置場所をリターンダクトの近傍にし
たり、その上部に誘導ダクトを設けることで上記目的を
達成可能であることを知見し、諸条件を見極めて本発明
を完成させた。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below, but the present invention is not limited to these embodiments. Hereinafter, the present invention will be described in detail. The inventors of the present invention eliminate the occurrence of updrafts and turbulence of the airflow caused by the devices and equipment that generate heat in their functions, and also maintain the cleanliness and temperature of the pulling room without impairing the maintenance workability of the equipment attached to the pulling machine. In order to maintain the optimum condition, it was found that the above-mentioned purpose could be achieved by placing these devices and equipment near the return duct or by providing a guide duct above the return duct. The present invention has been completed.

【0019】上記のように、本発明の引上げ室は、例え
ば上層階の吹き出し口からクリーンエアを吹き出し、下
層階のリターンダクトから吸引する循環型の空調システ
ムを備えた少なくとも2層以上の多層階から構成されて
いる。そして引上げ室内には数台ないし数十台の単結晶
引上げ機が設置され、それらに付帯する付帯機器・設備
類は通常下層階に設置されている。
As described above, the pulling room of the present invention comprises at least two or more multi-layered floors provided with a circulation type air-conditioning system which blows clean air from, for example, an outlet on an upper floor and sucks air from a return duct on a lower floor. It is composed of In the pulling room, several to several tens of single crystal pulling machines are installed, and the accompanying equipment and facilities are usually installed on the lower floor.

【0020】本発明では、これらの付帯機器・設備の
内、その対象となるものを次のように規定した。すなわ
ち、下層階に設置される機器・設備であって、その常用
温度が引上げ室の室温より10℃以上高い機器・設備を
指す。このような機器・設備は、作動中にその機能上発
熱し、この発熱に伴って機器・設備周辺から上昇気流を
発生し、これが下層階の汚染物質を巻き込んで吹上がる
ため、上層階のクリーン度を阻害し、また室温上昇によ
って下層階の作業環境を悪化させていた。機器・設備の
常用温度が引上げ室の室温より10℃未満高い程度であ
ると上層階に悪影響を及ぼすような上昇気流は殆ど発生
しない。
In the present invention, of these auxiliary devices and equipment, the target ones are defined as follows. That is, it refers to equipment / equipment installed on the lower floor, the equipment / equipment whose normal temperature is higher than the room temperature of the pulling room by 10 ° C. or more. Such equipment and facilities generate heat due to their function during operation, and this heat generates an updraft from around the equipment and facilities, which entrains contaminants on the lower floor and blows up. The work environment on the lower floors was deteriorated due to the increase in room temperature. If the normal temperature of the equipment / apparatus is lower than the room temperature of the pulling room by less than 10 ° C., almost no updraft which adversely affects the upper floor is generated.

【0021】そこで本発明では、これらのその機能上発
熱する機器・設備による上記弊害を阻止するため、これ
らの機器・設備をリターンダクト近傍に設置するか、あ
るいはこれらの機器・設備の上部に誘導ダクトを設置し
た。ちなみに、リターンダクト近傍とは、引上げ室の下
層階の側壁または周囲の天井に設置したリターンダクト
の吸引口の近傍であって、ダクトの内部であっても良
い。
Therefore, in the present invention, in order to prevent the above-mentioned adverse effects due to the equipment / equipment that generates heat due to its function, the equipment / equipment is installed near the return duct or guided above the equipment / equipment. A duct was installed. Incidentally, the vicinity of the return duct may be near the suction port of the return duct installed on the side wall of the lower floor of the pulling room or the surrounding ceiling, and may be inside the duct.

【0022】このような構成とすることによって、その
機能上発熱する機器・設備からの発熱を直ちにリターン
ダクトあるいは誘導ダクトに吸引させることができ、下
層階で発生する汚れた上昇気流を排除し、排熱を十分行
って、上層階のクリーン度低下を防ぎ、上層階の室温を
下げることなく下層階の室温をメンテナンス作業環境に
適した温度に調節することができるようになった。ま
た、機器の精度、機器の動作環境に対する悪影響を回避
することもできるようになった。
By adopting such a configuration, the heat generated by the equipment and facilities that generate heat can be immediately sucked into the return duct or the guide duct, and the dirty updraft generated on the lower floor can be eliminated. By exhausting heat sufficiently, the cleanliness of the upper floor was prevented from lowering, and the room temperature of the lower floor could be adjusted to a temperature suitable for the maintenance work environment without lowering the room temperature of the upper floor. In addition, it is possible to avoid adverse effects on the accuracy of the device and the operating environment of the device.

【0023】そしてこの場合、リターンダクト近傍に設
置する機器・設備は、少なくとも真空ポンプとすること
が必要である。すなわち真空ポンプは、単結晶引上げ機
の大型化に伴って著しく大型化した機器で、その発熱量
も増大し、その近傍で上昇気流が発生するようになっ
た。そこで引上げ室の下層階の側壁または周囲の天井に
リターンダクトを設置し、その吸引口近傍に真空ポンプ
を配置し、これからの発熱を直ちにリターンダクトに吸
引させることで、上昇気流を除去し、排熱効果を十分挙
げることができる。また、真空ポンプは大型化しても比
較的容易に移設できる利点もある。
In this case, it is necessary that the equipment and facilities installed near the return duct be at least a vacuum pump. That is, the vacuum pump is a device that has been significantly increased in size with the increase in the size of the single crystal pulling machine. Therefore, a return duct is installed on the side wall of the lower floor of the pulling room or on the surrounding ceiling, and a vacuum pump is placed near the suction port. The heat effect can be sufficiently raised. In addition, there is an advantage that the vacuum pump can be relatively easily relocated even if it is enlarged.

【0024】次に、上部に誘導ダクトを設置する機器・
設備としては、電源装置、制御装置、排ガス管および冷
却水戻り配管等を挙げることができる。これら電源装
置、制御装置、排ガス管および冷却水戻り配管等はその
機能や特性上設置場所が限定されるので、必ずしもリタ
ーンダクト近傍に配置できるとは限らない。そこでその
特定位置において、その上部に誘導ダクトを設置し、吸
引口を効果的に配置するようにする。その結果、上昇気
流を吸引して、排熱による下層階の作業環境の悪化を防
止し、汚れた上昇気流による上層階のクリーン度悪化を
防ぐことができる。尚、排ガス管や冷却水配管には、途
中に圧力制御装置が設けられていることがあるが、こう
した圧力制御装置の上部にも誘導ダクトを設置すること
が好ましい。誘導ダクトは、対象とする機器・設備から
の上昇気流を誘導・吸引するためのものであるから、こ
れら機器・設備の上部を覆うまたは囲うように設置する
ことが好ましいが、側部に開口部が設けられていても構
わない。
Next, a device for installing an induction duct at the top
The equipment includes a power supply device, a control device, an exhaust gas pipe, a cooling water return pipe, and the like. Since the power supply device, the control device, the exhaust gas pipe, the cooling water return pipe, and the like are limited in their installation locations due to their functions and characteristics, they cannot always be arranged near the return duct. Therefore, at the specific position, a guide duct is installed above the specific position to effectively arrange the suction port. As a result, it is possible to prevent the deterioration of the work environment of the lower floor due to the exhaust heat by sucking the ascending airflow, and to prevent the deterioration of the cleanliness of the upper floor due to the dirty ascending airflow. Note that a pressure control device may be provided in the exhaust gas pipe or the cooling water pipe in some cases, but it is preferable to provide an induction duct also above the pressure control device. Since the guide duct is for guiding and sucking updrafts from the target equipment / equipment, it is preferable to install it so as to cover or surround the upper part of these equipment / equipment. May be provided.

【0025】さらに、誘導ダクトについては、その中間
に送風機を備えることが好ましい。この誘導ダクトは、
種々の形状、大きさ、位置を有する機器・設備をその対
象としているので、ダクトの形状、大きさ、位置も種々
になり、ダクトの空気抵抗も大きくなり易いので誘導ダ
クトの中間に送風機を設けて上昇気流を効率よく吸引す
るようにするのが良い。
Further, it is preferable to provide a blower in the middle of the guide duct. This guide duct is
Since equipment and facilities with various shapes, sizes, and positions are targeted, the shape, size, and position of the ducts are also various, and the air resistance of the ducts tends to increase, so a blower is installed in the middle of the induction duct. It is good to suck up the airflow efficiently.

【0026】また、前記真空ポンプのように、その機能
上発熱する機器・設備が騒音を発する場合がある。この
場合には、騒音発生源の上流側に遮音壁を設けること
で、本引上げ室に係る騒音対策を容易に効果的に行うこ
とができる。これは、真空ポンプのような騒音を発する
機器を、各引上げ機の近傍ではなく、リターンダクトの
近傍に配置したことにより実現したものである。
Further, there is a case where a device or equipment which generates heat due to its function, such as the vacuum pump, generates noise. In this case, by providing a sound insulation wall on the upstream side of the noise generation source, noise countermeasures relating to the pulling room can be easily and effectively performed. This is realized by disposing a device that emits noise, such as a vacuum pump, near the return duct, not near each pulling machine.

【0027】さらに、上記のように構成した本発明の引
上げ室を効果的に使用するには、その床面積が150平
方メートル以上であることが望ましい。上記したように
本発明を構成したことにより、整流されたダウンフロー
が生じ、隣接する引上げ機同士間の熱の干渉が減少する
と共に、下層階の機器・設備の配置が整理されたので、
単結晶引上げ機間の間隔を短縮することが可能となり、
引上げ室における引上げ機の充填密度を上げることがで
きる。また、上層階と下層階の温度差が小さくなり、局
所空調の必要もない。従って、本発明により、設備コス
ト、ランニングコストの低減が図られる。例えば直径8
インチ単結晶引上げ機の場合、少なくとも5台設置可能
な引上げ室の床面積は150m2 (1台当たり30m
2 )まで縮小させることができた。
Furthermore, in order to effectively use the pulling room of the present invention constructed as described above, it is desirable that the floor area is 150 square meters or more. By configuring the present invention as described above, a rectified downflow occurs, heat interference between the adjacent lifting machines is reduced, and the arrangement of the equipment and facilities on the lower floor is arranged.
It is possible to shorten the interval between single crystal pulling machines,
The packing density of the pulling machine in the pulling chamber can be increased. Further, the temperature difference between the upper floor and the lower floor becomes smaller, and there is no need for local air conditioning. Therefore, according to the present invention, equipment costs and running costs can be reduced. For example, diameter 8
In the case of an inch single crystal pulling machine, the floor area of at least five pulling rooms that can be installed has a floor area of 150 m 2 (30 m per unit).
2 ) could be reduced.

【0028】また床面積が1000m2 を越えるような
広大な引上げ室の空調システムでは、一旦立ち上げると
気流の風速、風量、風向等の大幅な変更や調整は困難と
なるが、本発明の構成を適用することにより、整流され
た下降流が生じるので効率的な空調を行うことができ、
局所排気や空調を設ける必要がなく、設備の低コスト
化、省エネルギー化を図ることができる。
In an air-conditioning system for a large pulling room having a floor area exceeding 1000 m 2 , it is difficult to significantly change or adjust the wind speed, flow rate, direction, etc. of the air flow once it is started up. By applying, a rectified downflow occurs, so that efficient air conditioning can be performed,
There is no need to provide local exhaust or air conditioning, so that the equipment can be reduced in cost and energy can be saved.

【0029】ここで本発明の複数の単結晶引上げ機を設
置した引上げ室の一例を示す。図1は引上げ室の概略図
である。図1の引上げ室1は、上層階と下層階の2層階
から成る引上げ室であって、引上げ室1内に数台ないし
数十台の単結晶引上げ機11が設置され、グレーチング
通風口6を有する上層階床で2層階に分かれている。一
方、上層階の天井付近には、フィルタ8があってその吹
出し口10からクリーンエアを吹出し、グレーチング通
風口6を通って下層階の側壁あるいは周辺の天井に配置
したリターンダクト4で汚染気流を吸引し、熱交換器9
で温度調節を行い、送風機7で送風ダクト3へ送り出す
循環型の空調システム2を備えている。そして真空ポン
プ12は、リターンダクト4の吸引口近傍に配置され、
その排熱や上昇気流は直接リターンダクト4に吸引され
るようになっている。また、電源装置13はその上部に
誘導ダクト5aを配置して排熱と上昇気流を吸引するよ
うにしている。冷却水戻り配管14は、この例では誘導
ダクト5の内部に配置した。さらに、誘導ダクト5の中
間に送風機7aを設置してダクトの吸引効率の向上を図
った。そして、騒音対策として、真空ポンプ12の上流
側に遮音壁15を設置した。誘導ダクト6の上部には、
ガラリー通気口16を設けて、上層階からのダウンフロ
ー気流をダクト内の気流に同伴することも可能である。
ガラリー通気口16を設ける位置は、グレーチング通風
口6の直下で、その下部に上昇気流を発生させるような
機器・設備のないところに設けることが好ましい。ま
た、図1では引上げ室の片側(図1の左側)にリターン
ダクト4が設置されているが、1000m2 を越えるよ
うな大面積の引上げ室においては、対向する壁面(図1
の右側)にもリターンダクト4を設置することが好まし
い。
Here, an example of a pulling chamber in which a plurality of single crystal pulling machines of the present invention are installed is shown. FIG. 1 is a schematic diagram of the pulling chamber. The pulling room 1 shown in FIG. 1 is a pulling room composed of two floors, an upper floor and a lower floor, in which several to several tens of single crystal pulling machines 11 are installed. And is divided into two floors. On the other hand, near the ceiling of the upper floor, there is a filter 8 which blows clean air through the outlet 10 and passes through the grating ventilation port 6 to remove the polluted air current by the return duct 4 arranged on the side wall of the lower floor or on the surrounding ceiling. Suction and heat exchanger 9
And a circulation type air-conditioning system 2 in which the temperature is adjusted by an air blower 7 and sent to an air duct 3 by an air blower 7. And the vacuum pump 12 is arranged near the suction port of the return duct 4,
The exhaust heat and the rising airflow are directly sucked into the return duct 4. In addition, the power supply device 13 has an induction duct 5a disposed at an upper portion thereof so as to suck exhaust heat and an upward airflow. The cooling water return pipe 14 is arranged inside the guide duct 5 in this example. Further, a blower 7a is installed in the middle of the guide duct 5 to improve the suction efficiency of the duct. Then, as a noise countermeasure, a sound insulation wall 15 was installed on the upstream side of the vacuum pump 12. In the upper part of the induction duct 6,
It is also possible to provide a gallery vent 16 to entrain downflow airflow from the upper floor with airflow in the duct.
It is preferable that the gallery opening 16 is provided immediately below the grating ventilation opening 6 in a place where there is no equipment or equipment that generates an upward airflow thereunder. In FIG. 1, the return duct 4 is installed on one side of the pulling chamber (left side in FIG. 1). However, in a pulling chamber having a large area exceeding 1000 m 2 , the opposite wall surface (FIG.
It is preferable to install the return duct 4 also on the right side of the drawing).

【0030】なお、本発明は、上記実施形態に限定され
るものではない。上記実施形態は、例示であり、本発明
の特許請求の範囲に記載された技術的思想と実質的に同
一な構成を有し、同様な作用効果を奏するものは、いか
なるものであっても本発明の技術的範囲に包含される。
The present invention is not limited to the above embodiment. The above embodiment is an exemplification, and has substantially the same configuration as the technical idea described in the scope of the claims of the present invention. It is included in the technical scope of the invention.

【0031】例えば、上記実施形態においては、単結晶
引上げ機としてCZ法の引上げ機が設置されている引上
げ室につき例を挙げて説明したが、本発明はこれには限
定されず、MCZ法の引上げ機あるいはFZ法単結晶育
成装置が設置されている引上げ室にも適用できる。
For example, in the above embodiment, a pulling chamber in which a pulling machine of the CZ method is installed as a single crystal pulling machine has been described by way of example. However, the present invention is not limited to this. The present invention can also be applied to a pulling room in which a pulling machine or an FZ single crystal growing apparatus is installed.

【0032】[0032]

【発明の効果】本発明によれば、クリーン下降流の乱れ
の原因となるその機能上発熱する機器・設備から発生す
る上昇気流を速やかにリターンダクトあるいは誘導ダク
トに吸引させることができ、引上げ室上層階内のクリー
ン度維持と下層階の室温上昇を阻止することができる。
特に、下層階の室温を上昇させないため、上層階の温度
を下げることなく、両階層とも快適な作業環境を実現す
ることができた。また上層階と下層階の温度差が小さく
なるため、局所空調の必要もなく、設備コストとともに
ランニングコストの低減が図られる。さらに駆動音を発
する機器の場合、機器の上流側に遮音壁を設けることで
騒音防止に効果を挙げることができた。
According to the present invention, the updraft generated from the equipment / equipment that generates heat due to its function, which causes the turbulence of the clean downflow, can be quickly sucked into the return duct or the guide duct, and the pulling chamber can be pulled up. It is possible to maintain the cleanliness in the upper floor and prevent the lower floor from raising the room temperature.
In particular, since the room temperature on the lower floor was not raised, a comfortable working environment could be realized on both floors without lowering the temperature on the upper floor. Further, since the temperature difference between the upper floor and the lower floor becomes small, there is no need for local air conditioning, and the running cost as well as the facility cost can be reduced. Furthermore, in the case of a device that emits driving noise, the effect of preventing noise can be improved by providing a sound insulation wall upstream of the device.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の引上げ室の一例を示す概略図である。FIG. 1 is a schematic view showing an example of a pulling chamber of the present invention.

【図2】従来の引上げ室を示す概略図である。FIG. 2 is a schematic view showing a conventional pulling chamber.

【符号の説明】[Explanation of symbols]

1…引上げ室、 2…空調システム、 3…送風ダク
ト、4…リターンダクト、 5…誘導ダクト、 6…グ
レーチング通風口、7…送風機、 8…フィルタ、 9
…熱交換器、 10…吹出し口、11…単結晶引上げ
機、 12…真空ポンプ、 13…電源装置、14…冷
却水戻り配管、 15…遮音壁、 16…ガラリー通気
口。
DESCRIPTION OF SYMBOLS 1 ... Pulling room, 2 ... Air conditioning system, 3 ... Air duct, 4 ... Return duct, 5 ... Induction duct, 6 ... Grating ventilation port, 7 ... Blower, 8 ... Filter, 9
... heat exchanger, 10 ... outlet, 11 ... single crystal puller, 12 ... vacuum pump, 13 ... power supply unit, 14 ... cooling water return pipe, 15 ... sound insulation wall, 16 ... gallery outlet.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 中川 和也 福井県武生市北府2丁目13番50号 信越半 導体株式会社武生工場内 (72)発明者 林 俊郎 東京都千代田区丸の内1丁目4番2号 信 越半導体株式会社本社内 (72)発明者 関 秀俊 福島県西白河郡西郷村大字小田倉字大平 150番地 信越半導体株式会社半導体白河 研究所内 Fターム(参考) 3L058 BE02 BF01 BF06 BG01 BG02 5F053 AA12 AA48 RR04  ──────────────────────────────────────────────────続 き Continued on the front page (72) Kazuya Nakagawa 2-13-50 Kitafu, Takefu-shi, Fukui Prefecture Inside the Takefu Plant of Shin-Etsu Semiconductor Co., Ltd. (72) Toshio Hayashi 1-4-4 Marunouchi, Chiyoda-ku, Tokyo No.2 Shin-Etsu Semiconductor Co., Ltd. Head Office (72) Inventor Hidetoshi Seki 150 Odakura Odaikura, Nishigo-mura, Nishishirakawa-gun, Fukushima Prefecture F-term in the Semiconductor Shirakawa Research Laboratory, Shin-Etsu Semiconductor Co., Ltd. 3L058 BE02 BF01 BF01 BF06 BG01 BG02 5F053 AA12 AA48 RR04

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 上層階の吹き出し口からクリーンエアを
吹き出し、下層階のリターンダクトから吸引する循環型
の空調システムを備えた少なくとも2層以上の多層階構
造をなす引上げ室において、単結晶引上げ機に付帯し、
下層階に設置される機器・設備であって、その常用温度
が引上げ室の室温より10℃以上高い機器・設備をリタ
ーンダクト近傍に設置するか、あるいは前記機器・設備
の上部に誘導ダクトを設置したことを特徴とする引上げ
室。
1. A single crystal pulling machine in a pulling room having at least two or more layers of a multi-layer structure provided with a circulation type air-conditioning system that blows clean air from an outlet on an upper floor and sucks air from a return duct on a lower floor. Incidental to
Install equipment / equipment that is installed on the lower floor and whose normal temperature is at least 10 ° C higher than the room temperature of the lifting room near the return duct, or install an induction duct above the equipment / equipment. Lifting room characterized by doing.
【請求項2】 前記リターンダクト近傍に設置する機器
・設備は、少なくとも真空ポンプであることを特徴とす
る請求項1に記載した引上げ室。
2. The pulling room according to claim 1, wherein the equipment and facilities installed near the return duct are at least vacuum pumps.
【請求項3】 前記上部に誘導ダクトを設置する機器・
設備が、電源装置、制御装置、排ガス管および冷却水戻
り配管であることを特徴とする請求項1または請求項2
に記載した引上げ室。
3. An apparatus for installing an induction duct on the upper part.
3. The equipment according to claim 1, wherein the equipment is a power supply device, a control device, an exhaust gas pipe, and a cooling water return pipe.
Pulling room described in.
【請求項4】 前記誘導ダクトの中間に送風機を備えた
ことを特徴とする請求項1ないし請求項3のいずれか1
項に記載した引上げ室。
4. The air conditioner according to claim 1, wherein a blower is provided in the middle of the guide duct.
Pulling room described in section.
【請求項5】 前記機器・設備が騒音を発する場合、騒
音発生源の上流側に遮音壁を設けることを特徴とする請
求項1ないし請求項4のいずれか1項に記載した引上げ
室。
5. The pull-up room according to claim 1, wherein when the equipment / equipment emits noise, a sound insulation wall is provided on an upstream side of the noise source.
【請求項6】 前記引上げ室の床面積が、150平方メ
ートル以上であることを特徴とする請求項1ないし請求
項5のいずれか1項に記載した引上げ室。
6. The pulling room according to claim 1, wherein a floor area of the pulling room is 150 square meters or more.
JP2000230894A 2000-07-31 2000-07-31 Lifting chamber Pending JP2002048370A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2000230894A JP2002048370A (en) 2000-07-31 2000-07-31 Lifting chamber
PCT/JP2001/006432 WO2002010651A1 (en) 2000-07-31 2001-07-26 Pull-up chamber
TW090118619A TW498458B (en) 2000-07-31 2001-07-31 Single-crystal pulling chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000230894A JP2002048370A (en) 2000-07-31 2000-07-31 Lifting chamber

Publications (1)

Publication Number Publication Date
JP2002048370A true JP2002048370A (en) 2002-02-15

Family

ID=18723791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000230894A Pending JP2002048370A (en) 2000-07-31 2000-07-31 Lifting chamber

Country Status (3)

Country Link
JP (1) JP2002048370A (en)
TW (1) TW498458B (en)
WO (1) WO2002010651A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002138620A (en) * 2000-10-31 2002-05-17 Shin Etsu Handotai Co Ltd Drawing-up room
JP2008266058A (en) * 2007-04-18 2008-11-06 Shin Etsu Handotai Co Ltd Pulling room
CN113048600A (en) * 2021-03-03 2021-06-29 通用空气(辽宁)有限公司 Adjustable indoor air purification device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009002634A (en) * 2007-06-25 2009-01-08 Unitec Inc Unit type clean room

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0745945B2 (en) * 1988-12-13 1995-05-17 日立プラント建設株式会社 Clean room underfloor two-layer structure
JP3078697B2 (en) * 1994-02-07 2000-08-21 高砂熱学工業株式会社 Clean room, air purification method for clean room and substrate transfer system
JP3354849B2 (en) * 1997-11-13 2002-12-09 松下電器産業株式会社 Clean room

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002138620A (en) * 2000-10-31 2002-05-17 Shin Etsu Handotai Co Ltd Drawing-up room
JP2008266058A (en) * 2007-04-18 2008-11-06 Shin Etsu Handotai Co Ltd Pulling room
CN113048600A (en) * 2021-03-03 2021-06-29 通用空气(辽宁)有限公司 Adjustable indoor air purification device

Also Published As

Publication number Publication date
WO2002010651A1 (en) 2002-02-07
TW498458B (en) 2002-08-11

Similar Documents

Publication Publication Date Title
KR20130107671A (en) Ventilation system and control method for underground parking lots
US20120295530A1 (en) Backflow prevention apparatus of clean room
JP2002048370A (en) Lifting chamber
CN2694153Y (en) Integral air conditioner
JP2007127114A (en) Pneumatic device station and pneumatic device storing box
CN108954648A (en) A kind of interlayer wind pushing air circulatory system
KR20100072584A (en) Ventilation structure for windowless swine housing
JP2012072937A (en) Air conditioner
CN214370742U (en) Ventilating and heat-dissipating structure of factory building
CN205904186U (en) Be used for clear blower of cast member
MXPA03009969A (en) Method and apparatus for guiding air in air-cooled condensers.
JP4349583B2 (en) Hazardous gas exposure prevention device for anatomy laboratory
CN207900272U (en) A kind of multilayer coil pipe or so end plate processing drilling device
JP2002138620A (en) Drawing-up room
JP2007178065A (en) Air returning device for clean room
JP2010242763A (en) Air pressure device station and storage box of air pressure device
CN214949587U (en) Integral ventilation dust removal system
JP2000346416A (en) Circulating clean room
JP5511519B2 (en) Control method of clean room and its air supply device
CN220711903U (en) Protective equipment for ventilation device of machine room
CN209978644U (en) Cross-flow type double-layer cooling tower
JP2005263120A (en) Outside air supplying structure of vehicle
CN209583307U (en) A kind of machine room installation part cooling device
JP2930768B2 (en) Smoke induction device used for smoke induction type ventilation system
KR200321864Y1 (en) Motor Cooling System With Venturi Effect

Legal Events

Date Code Title Description
A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20041221

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050209

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050308

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050428

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20050607

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050727