498458 A7 B7 五、發明説明（i ) 【技術領域】 本發明係有關設置單結晶拉晶機之拉單晶室。 【技術背景】 以往，作爲半導体材料之基板用的半導体單結晶的拉 單晶機，係將數台至數十台配置於一間拉單晶室內。拉單 晶室分爲，要求乾淨度的上階層，及配置真空泵、控制裝 置、排氣管、冷卻水回水配管等附屬機器的下階層，並具 備有從拉單晶室的上部向下階層供給乾淨氣流的空調系統 〇 如第2圖所示爲二階層的拉單晶室，係在拉單晶室1 內設置數台至數十台單結晶拉晶機1 1 ，並以具有柵欄通 風口 6之上階層地板，分隔成上階層及下階層之二階層。 該拉單晶室具備有循環型空調系統2，在上階層的天花板 附近有濾淸器8，從其吹出口 1 0吹出乾淨空氣，通過柵 欄通風口 6，從配置於下階層的側壁和周圍天花板的回風 管4吸回污染氣流，經熱交換器9調節溫度後，以送風機 7送進送風管3。真空泵1 2、電源裝置1 3等拉單晶機 1 1的附屬機器設備，通常配置於拉單晶機1 1的架台周 邊。 近年’隨著拉單晶機的大型化，附屬機器也以同樣的 趨勢大型化，尤其真空泵隨著動力增強發熱量也增大，以 致真空泵近旁產生上升氣流。而這種功能上會發熱的機器 設備，如果設置在遠離空調系統回風管的場所的話，上升 I紙張尺度適用中Ϊ國家標準（CNS ) A4規格（210 χ297公羡) " ~ -4- (請先閱讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 498458 A7 B7 五、發明説明（2 ) 氣流不會流向回風管，會通過上階層的柵欄通風口向上吹 ，惡化上階層的乾淨度。 (請先閲讀背面之注意事項再填寫本頁) 又，在配置各種大型附屬機器及裝置基座的下階層中 ，氣流容易產生沉滯，形成局部高溫區域，使附屬機器的 維修作業環境惡化，對拉單晶機所具備的精密機器也有不 良影響。 爲解決此等問題，曾進行過變更附屬機器的配置和引 進局部空調機，但卻有維修作業性的惡化和營運成本增加 的缺點。 一方面，設置多數像真空泵等會發出驅動噪音的裝置 時’經常有作業人員存在的上階層或要進行維修的下階層 的噪音値會上升，因此曾有在拉單晶室周邊另設真空泵專 用室的作法，但需要配設另外的空調系統，而有增加營運 成本的缺點。 經濟部智慧財產局員工消費合作社印製 拉單晶室上階層需要維持成無塵室（clean room)來 管理’因此曾檢討氣流的各種控制方法（例如，參考特開 平6 — 159751號公報），但是，仍有下階層產生的 發熱或排氣不會被回風管吸回，局部產生上升氣流，下階 層中沉滯熱氣流使作業環境惡化等有.待解決的課題。尤其 • ’超過1 0 0 0 m 2的寬大拉單晶室的空調系統，一旦啓動 達到正常運轉後，欲大幅度變更氣流的風速、風量、風向 等頗爲困難，不得不以如上述的局部性處置來因應。 【發明的揭露】 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -5- 498458 A7 B7 五、發明説明（3 ) (請先閲讀背面之注意事項再填寫本頁) 因此，本發明係爲解決此等問題而硏發，主要目的在 於提供，可排除肇因於功能上會發熱的機器設備而發生的 上升氣流及下降氣流的亂流，並且不妨礙拉單晶機附屬機 器的維修作業，維持拉單晶室之乾淨度及最適溫度狀態， 提升單結晶之生產率，能夠製造高品質單結晶棒，而且備 有空調系統的拉單晶室。 爲解決上述課題，有關本發明的拉單晶室之特徵爲， 在備有從上階層的吹出口吹出乾淨空氣，從下階層的回風 管吸入的循環型空調系統，且構成至少二層以上之多階層 構造的拉單晶室內，將附帶於單結晶拉晶機而設置於下階 層的機器設備中，其常用溫度較拉單晶室之室溫高1 Ο ϋ C 以上之機器設備，設置於回風管近旁，或在前述機器設備 的上部設置誘導風管。 經濟部智慧財產局員工消費合作社印製 上述結構的拉單晶室，係將功能上會發熱的機器設備 中，其常用溫度較拉單晶室之室溫高1 0 ° C以上之機器設 備，設置在設於拉單晶室下階層之側壁或周圍天花板的回 風管近旁，亦即，在風管吸入口近旁或風管內部，或在該 等機器設備的上部，設置誘導風管，俾將該等機器設備的 發熱，立刻吸入回風管或誘導風管，以排除下階層產生的 污濁上升氣流，充分予以排熱，防止上階層乾淨度的降低 ，因此不需降低上階層的室溫，即能將下階層的室溫調節 成適合維修作業環境的溫度，並且可避免對機器精度及機 器運轉環境的不良影響。 而且，在此情形下，至少真空泵是設置於回風管近旁 紙張尺度適用中國國家標準（CNS ) Α4規格（210X297公釐） -6 - 498458 經濟部智慧財產局員工消費合作社印製 A7 B7五、發明説明（4 ) 的機器設備爲佳。 真空泵爲隨著拉單晶機的大型化而明顯大型化的機器 ，其發熱量也增大，因而在其近旁產生上升氣流。所以在 拉單晶室下階層之側壁或周圍天花板設置回風管，在其吸 入口近旁或風管內部配置真空泵，將所產生的上升氣流立 即吸入回風管，以排除流往上階層的上升氣流，充分提升 排熱效果。 又，在此情形下，需在上部設置誘導風管的機器設備 爲電源裝置、控制裝置、排氣管、冷卻水回水配管等。 電源裝置、控制裝置、排氣管、冷卻水回水配管等， 雖功能上也會發熱，但特性上需限定其設置場所。因此在 其特定位置的上部設置誘導風管，效果良好地配置吸入口 .。其結果可將此等機器設備所產生的上升氣流有效率地吸 引，以防止因排熱造成下階層作業環境的惡化，也可防止 污濁的上升氣流造成上階層乾淨度的惡化。 再‘者此情形下，在誘導風管中間配備送風機爲宜。 此誘導風管，係以各種形狀與大小的機器設備爲對象 ，因此風管的形狀與大小也是各種各樣，以致空氣阻力容 易變大，所以.在風管中間設置送風機，俾有效率地吸引上 升氣流。 力卩之，如果常用溫度較室溫高的機器設備會產生噪音 時，可在噪音產生源的上游側設置遮音牆。 如此作法，拉單晶室的噪音對策容易有效地實施。 再者，拉單晶室的地板面積可作成1 5 0 m 2以上。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閱讀背面之注意事項再填寫本頁) .^衣· 訂 498458 A7 B7 經濟部智慧財產局員工消費合作杜印製 五、發明説明（5 ) 由於本發明作成如上述之結構，因而能產生整流過的 下降氣流，不但減少相鄰接的拉單晶機之間的熱干擾，並 且因爲下階層的機器設備的配置經過整理，所以能夠縮短 單結晶拉晶機之間的間隔，而可提高拉單晶室內的拉單晶 機的裝設密度。又，上階層與下階層的溫差變小，而不需 局部空調。因此，由於本發明而可減低設備成本及營運成 本。例如8英吋直徑的單結晶拉晶機時，能設置至少5台 拉單晶機的拉單晶室的地板面積可縮小到1 5 0 m 2 (每台 3 0m2)。 又，超過1 0 0 〇m2的寬大拉單晶室的空調系統，一 旦啓動達到正常運轉後，欲大幅度變更或調整氣流的風速 、風量、風向等頗爲困難，然而採用本發明之結構，因爲 能產生整流過的下降氣流，而能有效率地進行空調，可達 到設備的低成本化、省能源化。 依照本發明，可以將擾亂乾淨下降氣流之原因的功能 上會發熱的機器設備所發生的上升氣流，迅速地吸入回風 管或誘導風管，而能夠維持拉單晶室上階層的乾淨度，及 阻止下階層的室溫上升。尤其，不必爲了不讓下階層的室 溫上升而降低上階層的溫度，並能夠實現兩階層皆舒適的 作業環境。又因爲上階層與下階層的溫差變小，不需局部 空調，而可減低設備成本及營運成本。再者如係會產生驅 動音的機器時，在機器的上游側設置遮音牆，即可提升防 止噪音的效果。 (請先閱讀背面之注意事項再填寫本頁) 本纸張尺度適用中國國家標準（CNS ) A4規格（21〇><297公釐） -8- 498458 A 7 B7五、發明説明（6 ) 【圖面的簡單說明】 第1圖：本發明之拉單晶室之一例之槪略圖。 第2圖：以往之拉單晶室之槪略圖。 【圖號說明】 經濟部智慧財產局員工消費合作社印製 1 拉 單 晶 室 2 空 調 系 統 3 送 風 管 4 回 風 管 5 誘 導 風 管 5 a 誘 導 風 管 6 柵 欄 通 風 □ 7 送 風 機 7 a 送 風 機 8 濾 淸 器 9 熱 交 換 器 1 〇 1吹 出 □ 1 1 單 結 晶 拉 晶 機 1 2 真 空 泵 1 3 電 源 裝 置 1 4 冷 卻 水 回 水 配管 1 5 遮 音 牆 1 6 迴 廊 通 氣 □ (請先閱讀背面之注意事項再填寫本頁) 訂 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -9- 498458 A7 __B7_ 五、發明説明（7 ) 【發明的最佳實施形態】 以下說明本發明的實施形態，惟本發明並不受限於此 等實施形態。 本發明者等，有鑒於欲排除因功能上會發熱的機器設 備而發生的上升氣流及因此造成氣流的亂流，並且不妨礙 拉單晶機附屬機器的維修作業，而能維持拉單晶室之乾淨 度及最適溫度狀態的話，將此等機器設備的設置場所，設 在回風管近旁，或在此等機器設備上部配設誘導風管，即 可能達成上述目的，故究明各種條件完成本發明。 如上所述，本發明之拉單晶室，係備有從上階層的吹 出口吹出乾淨空氣，從下階層的回風管吸回的循環型空調 系統，而構成至少二層以上之多階層結構。在拉單晶室內 設置數台至數十台單結晶拉晶機，附屬於此等拉單晶機之 附屬機器設備類，則通常設置於下階層。 本發明將此等附屬機器設備中，作爲對象者規定如下 〇 亦即指，設置於下階層之機器設備中，其常用溫度較 拉單晶室之室溫高1 0 ° C以上之機器設備。像這樣的機器 設備，在運轉中會發熱，隨著這種發熱，在機器設備周邊 會產生上升氣流，因這種上升氣流會將下階層的污染物質 捲入並往上吹，損害上階層的乾淨度，又由於室溫上升， 而惡化下階層的作業環境。機器設備的常用溫度高於拉單 晶室之室溫未達1 〇 ° C的程度時，幾乎不會產生對上階層 有不良影響的上升氣流。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） — -- (請先閱讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 -10- 498458 A7 B7 五、發明説明（8 ) 本發明爲阻止此等由於功能上會發熱的機器設備造成 的上述弊害，乃將此等機器設備設置於回風管近旁，或在 此等機器設備的上部設置誘導風管。所謂回風管近旁，係 指設於拉單晶室下階層之側壁或周圍天花板的回風管的吸 入口近旁，或在風管內部也可以。 由於作成如此的結構，而能夠將功能上會發熱的機器 設備的發熱，立刻吸入回風管或誘導風管，以排除下階層 產生的污濁上升氣流，充分予以排熱，防止上階層乾淨度 的降低，不需降低上階層的室溫，即能將下階層的室溫調 節成適合維修作業環境的溫度，並且可避免對機器精度及 機器運轉環境的不良影響。 而且，在此情形下，至少真空泵是設置於回風管近旁 .的機器設備爲佳。 亦即，真空泵爲隨著拉單晶機的大型化而明顯大型化 的機器，其發熱量也增大，因而在其近旁產生上升氣流。 故在拉單晶室下階層之側壁或周圍天花板設置回風管，在 其吸入口近旁配置真空泵，將其發熱立刻吸入回風管，以 除去上升氣流，可以充分提升排熱效果。而且，即使真空 泵大型化，也有比較容易移設的優點。 其次，在其上部設置誘導風管的機器設備爲電源裝置 、控制裝置、排氣管及冷卻水回水配管等。 此等電源裝置、控制裝置、排氣管及冷卻水回水配管 等，因其功能及特性上，須限定其設置場所，故不一定配 置在回風管近旁。因此在其特定位置的上部設置誘導風管 玉紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閱讀背面之注意事項再填寫本頁) 衣·498458 A7 B7 V. Description of the Invention (i) [Technical Field] The present invention relates to a pulling single crystal chamber provided with a single crystal pulling crystal machine. [Technical Background] Conventionally, a single crystal pulling machine for semiconductor single crystals used as a substrate for a semiconductor material has several to dozens of them arranged in a single crystal pulling chamber. The pull single crystal chamber is divided into an upper layer that requires cleanliness, and a lower layer equipped with auxiliary equipment such as a vacuum pump, a control device, an exhaust pipe, and a cooling water return pipe. The air-conditioning system for supplying clean air flow. As shown in FIG. 2, it is a two-stage single-crystal pulling room. Several to dozens of single-crystal pulling machines 1 1 are installed in the single-drawing single room 1 and are ventilated with a fence. The upper floor of mouth 6 is divided into upper and lower layers. This single crystal room is provided with a circulation type air-conditioning system 2. A filter 8 is provided near the ceiling of the upper floor, and clean air is blown out from the air outlet 10, and it is arranged on the side walls and surroundings of the lower floor through the grille vent 6. The return air duct 4 of the ceiling sucks back the polluted air flow, and after the temperature is adjusted by the heat exchanger 9, it is sent into the air duct 3 by a blower 7. Ancillary equipment such as the vacuum pump 1 2, the power supply device 1 3, and the like are usually arranged around the stand of the single crystal machine 1 1. In recent years, with the increase in the size of single crystal machines, the size of attached machines has also increased. In particular, the heat generation of vacuum pumps has increased with the increase of power, so that an upward air current is generated near the vacuum pump. And if this kind of functioning heat-generating equipment is installed in a place far away from the air return pipe of the air-conditioning system, the paper size rises to apply the Chinese National Standard (CNS) A4 specification (210 χ297 public envy) " ~ -4- (Please read the precautions on the back before filling out this page.) Ordered by the Intellectual Property Bureau of the Ministry of Economic Affairs, printed by the employee consumer cooperative of 498458 A7 B7 V. Description of the invention (2) The air flow will not flow to the return duct, it will pass through the upper level fence vent Blowing upwards deteriorates the cleanliness of the upper class. (Please read the precautions on the back before filling this page.) Also, in the lower level where various large auxiliary equipment and device bases are installed, the air flow is prone to stagnation, forming a local high temperature area, which deteriorates the maintenance environment of the auxiliary equipment. The precision equipment of the single crystal pulling machine also has an adverse effect. In order to solve these problems, changes have been made to the configuration of auxiliary equipment and the introduction of local air conditioners, but they have the disadvantages of deterioration of maintenance workability and increase of operating costs. On the one hand, when many devices that emit driving noise such as vacuum pumps are installed, the noise of the upper and lower levels where operators often exist will increase. Therefore, a vacuum pump was installed around the single crystal chamber. Room, but it needs to be equipped with another air-conditioning system, which has the disadvantage of increasing operating costs. The upper stratum of the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs ’s printed cooperatives needs to be maintained as a clean room for management. Therefore, various control methods for air flow have been reviewed (for example, refer to Japanese Patent Laid-Open No. 6-159751) However, there is still a problem to be solved, such as that the heat or exhaust gas generated by the lower stage will not be sucked back by the return air duct, and an updraft is locally generated, and the stagnant hot air in the lower stage deteriorates the working environment. In particular, the air-conditioning system of a wide single-crystal room with a width of more than 1000 m 2 is difficult to change the wind speed, volume, and direction of the airflow once it is started and reaches normal operation. To deal with sexually. [Disclosure of invention] This paper size is in accordance with Chinese National Standard (CNS) A4 specification (210X297 mm) -5- 498458 A7 B7 V. Description of invention (3) (Please read the notes on the back before filling this page) Therefore, The present invention has been developed in order to solve these problems, and the main purpose is to provide a method that can eliminate the turbulent flow of the updraft and downdraft caused by the functional equipment that generates heat, and does not hinder the attached equipment of the single crystal machine. Maintenance operations, maintain the cleanliness and optimal temperature of the single crystal chamber, improve the productivity of the single crystal, can produce high quality single crystal rods, and is equipped with an air conditioning system for the single crystal chamber. In order to solve the above-mentioned problems, the present invention is characterized in that the single-pull single crystal chamber is provided with a circulation type air-conditioning system that blows clean air from a blow-out port of an upper stage and sucks in a return pipe of a lower stage, and constitutes at least two or more floors. The multi-layer structure of the single-crystal pulling chamber is equipped with a single-crystal pulling crystal machine and is installed in the lower-level equipment. The common temperature is higher than the room temperature of the single-crystal pulling chamber by 1 Ο ϋ C or higher. An induction duct is installed near the return air duct or on the upper part of the aforementioned equipment. The above-structured single-crystal room is printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, which is a machine and equipment that can generate heat, and its commonly used temperature is more than 10 ° C higher than the room temperature of the single-crystal room. It is set near the return air duct on the side wall or the surrounding ceiling of the lower layer of the single crystal chamber, that is, near the air inlet of the air duct or inside the air duct, or on the upper part of these machines and equipment. The heat of these machines and equipment is immediately sucked into the return air duct or induced air duct to eliminate the fouling updraft generated by the lower stratum and fully exhaust the heat to prevent the cleanliness of the upper stratum from decreasing, so there is no need to lower the room temperature of the upper stratum. That is, the room temperature of the lower class can be adjusted to a temperature suitable for the maintenance operation environment, and the adverse effects on the accuracy of the machine and the operating environment of the machine can be avoided. Moreover, in this case, at least the vacuum pump is set near the return air pipe. The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) -6-498458 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 5. Invention equipment (4) is preferred. The vacuum pump is a device that is significantly enlarged as the size of the pull single crystal machine increases, and its heat generation is also increased, so an updraft is generated near it. Therefore, a return air duct is installed on the side wall or the surrounding ceiling of the lower layer of the single crystal chamber. A vacuum pump is arranged near the suction port or inside the air duct, and the generated updraft is immediately sucked into the return air duct to eliminate the rise to the upper level. Air flow to fully improve the heat removal effect. In addition, in this case, the equipment to be provided with an induction duct in the upper part is a power supply device, a control device, an exhaust pipe, a cooling water return pipe, and the like. Although the power supply device, control device, exhaust pipe, cooling water return pipe, etc. may also generate heat in terms of function, it is necessary to limit the installation place by its characteristics. Therefore, the induction duct is installed at the upper part of the specific position, and the suction port is effectively arranged. As a result, the updraft generated by these machines and equipment can be efficiently attracted to prevent the deterioration of the working environment of the lower stage due to the exhaust heat, and the deterioration of the cleanliness of the upper stage due to the dirty updraft. Furthermore, in this case, it is advisable to provide a blower in the middle of the induction duct. This induction duct is targeted at machines of various shapes and sizes. Therefore, the shape and size of the duct are also various, so that the air resistance is easy to increase. Therefore, a blower is installed in the middle of the duct to attract it efficiently. Updraft. To cope with this, if the commonly used equipment and equipment with a temperature higher than room temperature generates noise, a soundproof wall can be installed on the upstream side of the noise generation source. In this way, noise countermeasures for pulling a single crystal chamber can be easily and effectively implemented. In addition, the floor area of the single crystal pulling chamber can be made more than 150 m 2. This paper size applies Chinese National Standard (CNS) A4 (210X297 mm) (Please read the precautions on the back before filling out this page). ^ Clothes · Order 498458 A7 B7 Consumption Cooperation between Employees and Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (5) Because the present invention is structured as described above, it can generate a rectified downflow, not only reducing the thermal interference between adjacent pull single crystal machines, but also because of the configuration of the lower-level equipment Finishing, so that the interval between the single crystal pulling crystal machines can be shortened, and the installation density of the single crystal pulling machine in the single crystal pulling chamber can be increased. In addition, the temperature difference between the upper and lower tiers becomes smaller without the need for local air conditioning. Therefore, the present invention can reduce equipment cost and operating cost. For example, when an 8-inch diameter single crystal pulling crystal machine is used, the floor area of the pulling single crystal chamber capable of installing at least 5 single crystal pulling machines can be reduced to 150 m 2 (30 m2 each). In addition, once the air-conditioning system of a large single-crystal room exceeding 100 m2 is started and reaches normal operation, it is quite difficult to change or adjust the wind speed, volume, and direction of the airflow. However, using the structure of the present invention, Because rectified downflow can be generated and air conditioning can be performed efficiently, the equipment can be reduced in cost and energy. According to the present invention, the updraft generated by the functionally-heating machinery and equipment that causes the clean downdraft can be quickly sucked into the return duct or the induction duct, and the cleanliness of the upper stage of the single crystal chamber can be maintained. And prevent lower room temperature from rising. In particular, it is not necessary to lower the temperature of the upper stage in order not to increase the room temperature of the lower stage, and it is possible to realize a comfortable working environment for both stages. And because the temperature difference between the upper and lower classes becomes smaller, local air conditioning is not required, which can reduce equipment costs and operating costs. Furthermore, if it is a machine that generates driving noise, a noise barrier can be installed on the upstream side of the machine to improve the noise prevention effect. (Please read the precautions on the back before filling out this page) This paper size applies Chinese National Standard (CNS) A4 specification (21〇 > < 297mm) -8- 498458 A 7 B7 V. Description of the invention (6 ) [Brief description of the drawing] Fig. 1: A schematic diagram of an example of the single crystal pulling chamber of the present invention. Figure 2: Sketch of a conventional single crystal chamber. [Illustration of the drawing number] Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 1 Pull single crystal room 2 Air-conditioning system 3 Air supply duct 4 Return air duct 5 Induction duct 5 a Induction duct 6 Fence ventilation □ 7 Air blower 7 a Air blower 8 Filter 9 器 9 Heat exchanger 1 〇1 blowing out □ 1 1 single crystal pulling crystal machine 1 2 vacuum pump 1 3 power supply unit 1 4 cooling water return pipe 1 5 soundproof wall 1 6 corridor ventilation □ (Please read the precautions on the back before (Fill in this page) The size of the paper is applicable to the Chinese National Standard (CNS) A4 (210X297 mm) -9-498458 A7 __B7_ V. Description of the invention (7) [Best embodiment of the invention] The following describes the embodiment of the invention However, the present invention is not limited to these embodiments. The inventors of the present invention have been able to maintain the pulling single crystal chamber in view of eliminating the updraft caused by functionally heating equipment and the turbulent flow of the airflow, and without interfering with the maintenance operation of the auxiliary equipment of the pulling single crystal machine. If the cleanliness and the optimal temperature state of the machine and equipment are located near the return air duct, or if an induction duct is installed on the upper part of the machine and equipment, the above-mentioned purpose may be achieved. invention. As described above, the pull single crystal chamber of the present invention is provided with a circulation type air-conditioning system that blows clean air from a blower outlet of an upper stage and sucks it back from a return pipe of a lower stage, and constitutes a multi-stage structure of at least two or more floors. . Several to dozens of single crystal crystal pulling machines are installed in the single crystal pulling room. The auxiliary equipment and equipment attached to these single crystal pulling machines are usually installed in the lower level. In the present invention, the subject equipment is specified as follows: That is, the equipment installed in the lower-level equipment has a temperature that is generally higher than the room temperature of the single crystal chamber by 10 ° C or more. Machines and equipment like this generate heat during operation, and with this heat, an updraft is generated around the machine and equipment. This updraft will entrain and blow up pollutants from the lower stratum, damaging the upper stratum. Cleanliness, as the room temperature rises, deteriorates the working environment of the lower class. When the normal temperature of the equipment is higher than the room temperature of the single crystal chamber to less than 10 ° C, there will be almost no updraft that has an adverse effect on the upper stage. This paper size applies to China National Standard (CNS) A4 specification (210X297 mm) —-(Please read the precautions on the back before filling this page) Order printed by the Intellectual Property Bureau of the Ministry of Economic Affairs Consumer Cooperatives -10- 498458 A7 B7 V. Description of the invention (8) In order to prevent the above-mentioned disadvantages caused by the functional devices that generate heat, the present invention is to install such devices near the return air duct, or to install induced wind on the top of these devices tube. The vicinity of the return air duct refers to the inlet of the return air duct located on the side wall of the lower stage of the single crystal chamber or the surrounding ceiling, or inside the air duct. Due to such a structure, the heat of the equipment that can generate heat can be immediately sucked into the return air duct or the induction air duct, so as to eliminate the fouling updraft generated by the lower stage and fully exhaust the heat to prevent the upper stage from being clean. Lowering, without lowering the room temperature of the upper stratum, that is, the room temperature of the lower stratum can be adjusted to a temperature suitable for the maintenance work environment, and adverse effects on the accuracy of the machine and the operating environment of the machine can be avoided. Moreover, in this case, at least the vacuum pump is preferably installed near the return air pipe. In other words, the vacuum pump is a device that becomes significantly larger as the size of the pulling single crystal machine increases, and its heat generation also increases, so that an updraft is generated in the vicinity. Therefore, return air ducts are installed on the side walls of the lower level of the single crystal chamber or the surrounding ceiling, and a vacuum pump is arranged near the suction port, and the heat is immediately sucked into the return air ducts to remove the upward airflow, which can fully improve the heat removal effect. Moreover, even if the vacuum pump becomes large, it has the advantage of being relatively easy to move. Secondly, the devices and equipment that set the induction duct on the upper part are power supply unit, control device, exhaust pipe and cooling water return pipe. These power supply devices, control devices, exhaust pipes, and cooling water return piping, etc., must be limited to their place of installation due to their functions and characteristics, so they may not be placed near the return air pipe. Therefore, the induction duct is set on the upper part of its specific position. The jade paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling this page).
、1T 經濟部智慧財產局員工消費合作社印製 -11 - 498458 A7 B7_ 五、發明説明（9 ) (請先閱讀背面之注意事項再填寫本頁) ，效果良好地配置吸入口。結果可將上升氣流吸引，以防 止因排熱造成下階層作業環境的惡化’也可防止污濁的上 升氣流造成上階層乾淨度的惡化。 再者，排氣管及冷卻水回水配管，也有在中途裝設壓 力控制裝置者，在這種壓力控制裝置的上部也要設置誘導 風管爲宜。 誘導風管係爲了誘導、吸引從對象的機器設備產生的 上升氣流，所以配置成覆蓋或包圍在該等機器設備的上部 爲宜，惟側部設有開口部也無妨。 再者，就誘導風管而言，在其中間配備送風機爲宜。 此誘導風管，係以具有各種形狀、大小、位置的機器 設備爲對象，因此風管的形狀、大小、位置也是各種各樣 ，以致空氣阻力容易變大，所以最好在風管中間設置送風 機，俾有效率地吸引上升氣流。 經濟部智慧財產笱員工消費合作社印製 又，如前述之真空泵，功能上會發熱的機器設備也會 產生噪音。此情形下，在噪音產生源的上游側設置遮音牆 ，即可容易而有效地執行有關本拉單晶室的噪音對策。這 是由於將像真空泵這種會產生噪音的機器，配置在回風管 近旁，而不配置在各拉單晶機的近旁，因此得以實現。 再者，欲有效率地使用本發明如上述結構之拉單晶室 ，其地板面積要有1 5 0 m 2以上爲宜。 由於本發明作成如上述之結構，因而.產生整流過的下 降氣流，不但減少相鄰接的拉單晶機之間的熱干擾，並且 因爲下階層的機器設備的配置經過整理，所以能夠縮短單 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） ' -12- 498458 A7 B7 五、發明説明（10) (請先閱讀背面之注意事項再填寫本頁) 結晶拉晶機之間的間隔，而可提高拉單晶室內的拉單晶機 的裝設密度。又，上階層與下階層的溫差變小，而不需局 部空調。因此，由於本發明可望減低設備成本及營運成本 。例如8英吋直徑的單結晶拉晶機時，能設置至少5台的 拉單晶室的地板面積可縮小到1 5 0 m 2 (每台3 0 m 2 ) 〇 又，地板面積超過1 0 〇 〇m2的寬大拉單晶室的空調 系統’一旦啓動達到正常運轉後，欲大幅度變更或調整氣 流的風速、風量、風向等頗爲困難，然而採用本發明之結 構’因爲能產生整流過的下降氣流，而能有效率地進行空 調，不必加設局部排器或空調，可達到設備的低成本化、 省能源化。 茲舉一例闡示設置複數台單結晶拉晶機之本發明之拉 單晶室。第1圖爲拉單晶室之槪略圖。. 第1圖之拉單晶室1爲由上階層及下階層之二階層所 構成的拉單晶室，在拉單晶室1內設置數台至數十台單結 晶拉晶機1 1 ，並以具有柵攔通風口 6之上階層地板分隔 經濟部智慧財產^員工消費合作社印製 爲一階層。該拉單晶室具備有循環型空調系統2，在上階 層的天花板附·近有瀘淸器8，從其吹出口 1 〇吹出乾淨空 氣’通過柵欄通風口 6，從配置於下階層的側壁和周圍天 花板的回風管4吸回污染氣流，經熱交換器9調節溫度後 ’以送風機7送進送風管3。真空泵1 2配置於回風管4 的吸入口近旁，使其排熱和上升氣流直接被回風管4吸回 。又’電源裝置1 3則在其上部配置誘導風管5 a ，以吸 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -13- 498458 A7 B7__ 五、發明説明（11) (請先閱讀背面之注意事項再填寫本頁) 入排熱和上升氣流。在此例中，冷卻水回水配管1 4係配 置於誘導風管5的內部。又，在誘導風管5中間，設置送 風機7 a ，以提升風管的吸引效率。噪音對策則在真空泵 1 2的上游側設置遮音牆1 5。 在誘導風管5的上部，也可以設置迴廊通氣口 1 6， 將上階層的下降氣流倂入風管內的氣流。設置迴廊通氣口 1 6的位置，以設置在柵欄逋風口 6的正下方，而且其下 部沒有產生上升氣流的機器設備的地點爲宜。 又，第1圖中，雖在拉單晶室的單側（第1圖左側） 設置回風管4，超過1 0 0 0m2的‘大面積拉單晶室，則 在相對向的壁面（第1圖右側）也宜設置回風管4。 再者，本發明並不受限於上述實施形態。上述實施形 .態僅爲一例，任何具有與本發明申請專利範圍所記載之技 術構想實質上相同之結構，能達到相同作用效果者，皆包 括於本發明的技術範圍。 經濟部智慧財產局員工消費合作社印製 例如，在上述實施形態，係舉設置C Z法單結晶拉晶 機的拉單晶室爲例予以說明，但本發明並不受限於此，也 適用於設置M C Z法拉單晶機或F Z法單結晶培育裝置的 拉單晶室。 又，在上述實施形態，係以例示二層構造的拉單晶室 予以說明，但本發明並不受限於此，配置近年的大型拉單 晶機時，爲了大重量對策或高場所作業對策，而將地板設 爲3層或4層的3層構造、4層構造時，也適用於爲防止 肇因於功能上會發熱的機器設備而發生的上升氣流等，則 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） -14- 498458 A7 B7 五、發明説明（12) 毋庸贅言。 (請先閱讀背面之注意事項再填寫本頁) 今 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -15Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs of 1T -11-498458 A7 B7_ V. Description of Invention (9) (Please read the precautions on the back before filling this page), and configure the suction port with good results. As a result, the updraft can be attracted to prevent deterioration of the working environment of the lower stage due to heat exhaustion ', and the cleanliness of the upper stage can be prevented from being deteriorated by the dirty updraft. In addition, there is also a pressure control device installed in the exhaust pipe and the cooling water return pipe, and it is advisable to install an induction duct on the upper part of the pressure control device. The induction duct is designed to cover and surround the upper part of the equipment in order to induce and attract the updraft generated from the target equipment, but it is also possible to provide an opening on the side. Furthermore, for the induction duct, it is advisable to provide a blower in the middle. This induction duct is aimed at equipment with various shapes, sizes, and positions. Therefore, the shape, size, and position of the duct are also various, so that air resistance is easy to increase. Therefore, it is best to install a blower in the middle of the duct. , 俾 efficiently attracts updraft. Printed by the Intellectual Property of the Ministry of Economic Affairs and the Consumers' Cooperatives. Also, as in the vacuum pumps mentioned above, the functions and equipment that generate heat can also generate noise. In this case, by installing a sound insulation wall on the upstream side of the noise generation source, it is possible to easily and effectively implement noise countermeasures for the single crystal chamber. This is because a noise-producing machine such as a vacuum pump is placed near the return air duct, instead of being placed near each pull single crystal machine. Furthermore, in order to use the drawn single crystal chamber of the above structure of the present invention efficiently, its floor area should be more than 150 m 2. Due to the structure of the present invention as described above, a rectified downflow is generated, which not only reduces the thermal interference between the adjacent single crystal pulling machines, but also can reduce the unit time because the arrangement of the lower-level equipment is organized. This paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) '-12- 498458 A7 B7 V. Description of the invention (10) (Please read the precautions on the back before filling this page) Between crystal pulling machine The interval can increase the installation density of the single crystal pulling machine in the single crystal pulling chamber. In addition, the temperature difference between the upper and lower classes becomes smaller without the need for local air conditioning. Therefore, the present invention is expected to reduce equipment costs and operating costs. For example, when an 8-inch diameter single crystal puller is used, the floor area of at least 5 pull single crystal chambers can be reduced to 150 m 2 (30 m 2 each). Also, the floor area exceeds 10 Once the air-conditioning system of the wide single-crystal room with a width of 〇m2 'is started and reaches normal operation, it is very difficult to change or adjust the wind speed, volume, and direction of the airflow. However, the structure of the present invention is used because it can produce rectification. It can efficiently perform air conditioning without the need to install a local exhauster or air conditioner, which can reduce the cost and energy of the equipment. An example is given to illustrate the single-crystal pulling chamber of the present invention provided with a plurality of single-crystal pulling crystal machines. Figure 1 is a schematic drawing of a single crystal chamber. The single crystal pulling chamber 1 shown in FIG. 1 is a single crystal pulling chamber composed of upper and lower layers, and several to dozens of single crystal pulling crystal pulling machines 1 1 are installed in the single crystal pulling chamber 1, It is printed with a floor above the grille vent 6 to separate the intellectual property of the Ministry of Economic Affairs ^ employee consumer cooperatives printed as a class. This single crystal room is provided with a circulation type air-conditioning system 2. A ceiling 8 is located near the ceiling of the upper floor, and clean air is blown out from the air outlet 10. The air is passed through the grille vent 6 and is disposed on the side wall of the lower floor. And the return air duct 4 of the surrounding ceiling sucks back the polluted airflow, and after the temperature is adjusted by the heat exchanger 9, it is sent into the air duct 3 by the air blower 7. The vacuum pump 12 is arranged near the suction port of the return air pipe 4, so that the exhaust heat and the updraft are directly sucked back by the return air pipe 4. Moreover, the power supply device 1 3 is equipped with an induction duct 5 a on the upper part, in order to absorb the paper size and apply the Chinese National Standard (CNS) A4 specification (210X297 mm) -13- 498458 A7 B7__ V. Description of the invention (11) ( (Please read the notes on the back before filling out this page). In this example, the cooling water return pipe 14 is placed inside the induction duct 5. In addition, a blower 7 a is provided in the middle of the induction duct 5 to improve the suction efficiency of the duct. For noise countermeasures, a sound insulation wall 15 is provided on the upstream side of the vacuum pump 12. In the upper part of the induction duct 5, a corridor ventilation port 16 may also be provided, so that the descending airflow of the upper stage is drawn into the airflow in the duct. The location of the corridor ventilation openings 16 should be set directly under the fence 逋 air outlet 6 and there should be no equipment or equipment that generates updrafts in the lower part. In Fig. 1, although the return air duct 4 is provided on one side (left side in Fig. 1) of the single crystal chamber, a large-area single crystal chamber having a large area exceeding 100 m2 is placed on the opposite wall surface (the first The right side of the figure (1) should also be equipped with a return air pipe 4. The present invention is not limited to the embodiments described above. The above implementation form is only an example. Anyone having a structure that is substantially the same as the technical concept described in the patent application scope of the present invention and can achieve the same effect is included in the technical scope of the present invention. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. For example, in the above-mentioned embodiment, the description is given by taking the pulling single crystal chamber of the CZ method single crystal pulling crystal machine as an example, but the present invention is not limited to this, and it is also applicable A pull single crystal chamber of an MCZ far single crystal machine or an FZ single single crystal incubator is set. In the above-mentioned embodiment, a single-layered single crystal chamber having a two-layer structure is described as an example. However, the present invention is not limited to this. When a large-sized single-crystallized machine in recent years is deployed, it is necessary to take measures for heavy weight or high-location operations. When setting the floor to a 3- or 4-layer 3-layer structure or 4-layer structure, it is also suitable for preventing updrafts caused by functional equipment that generates heat, etc., this paper standard applies to China Standard (CNS) A4 specification (210 × 297 mm) -14-498458 A7 B7 V. Description of the invention (12) Needless to say. (Please read the precautions on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper is sized to the Chinese National Standard (CNS) A4 (210X297 mm) -15