JP2001521120A - ガスパネル - Google Patents

ガスパネル

Info

Publication number
JP2001521120A
JP2001521120A JP2000518223A JP2000518223A JP2001521120A JP 2001521120 A JP2001521120 A JP 2001521120A JP 2000518223 A JP2000518223 A JP 2000518223A JP 2000518223 A JP2000518223 A JP 2000518223A JP 2001521120 A JP2001521120 A JP 2001521120A
Authority
JP
Japan
Prior art keywords
gas
manifold
gas panel
inlet
outlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000518223A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001521120A5 (https=
Inventor
リードマン,エリック・ジェイ
ヴ,キム・エヌ
Original Assignee
ユニット・インストゥルメンツ・インコーポレーテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25503189&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP2001521120(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by ユニット・インストゥルメンツ・インコーポレーテッド filed Critical ユニット・インストゥルメンツ・インコーポレーテッド
Publication of JP2001521120A publication Critical patent/JP2001521120A/ja
Publication of JP2001521120A5 publication Critical patent/JP2001521120A5/ja
Pending legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K11/00Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves
    • F16K11/10Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with two or more closure members not moving as a unit
    • F16K11/20Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with two or more closure members not moving as a unit operated by separate actuating members
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561Gas plumbing upstream of the reaction chamber
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K11/00Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves
    • F16K11/10Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with two or more closure members not moving as a unit
    • F16K11/20Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with two or more closure members not moving as a unit operated by separate actuating members
    • F16K11/22Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with two or more closure members not moving as a unit operated by separate actuating members with an actuating member for each valve, e.g. interconnected to form multiple-way valves
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00Construction of housing; Use of materials therefor
    • F16K27/003Housing formed from a plurality of the same valve elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0402Apparatus for fluid treatment
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/5109Convertible
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/8593Systems
    • Y10T137/877With flow control means for branched passages
    • Y10T137/87885Sectional block structure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Valve Housings (AREA)
  • Branch Pipes, Bends, And The Like (AREA)
  • Multiple-Way Valves (AREA)
JP2000518223A 1997-10-29 1998-10-28 ガスパネル Pending JP2001521120A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/960,464 1997-10-29
US08/960,464 US6293310B1 (en) 1996-10-30 1997-10-29 Gas panel
PCT/US1998/022912 WO1999022165A1 (en) 1997-10-29 1998-10-28 Gas panel

Publications (2)

Publication Number Publication Date
JP2001521120A true JP2001521120A (ja) 2001-11-06
JP2001521120A5 JP2001521120A5 (https=) 2006-01-05

Family

ID=25503189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000518223A Pending JP2001521120A (ja) 1997-10-29 1998-10-28 ガスパネル

Country Status (9)

Country Link
US (2) US6293310B1 (https=)
EP (2) EP1683994B1 (https=)
JP (1) JP2001521120A (https=)
KR (1) KR100706147B1 (https=)
CN (1) CN1105256C (https=)
AU (1) AU1285199A (https=)
CA (1) CA2307663A1 (https=)
DE (2) DE69839083T2 (https=)
WO (1) WO1999022165A1 (https=)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004051125A1 (ja) * 2002-12-02 2004-06-17 Fujikin Incorporated 流体制御装置
JP2005514561A (ja) * 2001-12-21 2005-05-19 フリースケール セミコンダクター インコーポレイテッド 流体の搬送装置及びベースプレート
WO2011040268A1 (ja) * 2009-09-30 2011-04-07 株式会社堀場エステック 流量算出システム、集積型ガスパネル装置及びベースプレート
JP2012197941A (ja) * 2012-05-21 2012-10-18 Ulvac Japan Ltd 流体制御装置およびこれを用いたガス処理装置
WO2015098333A1 (ja) * 2013-12-27 2015-07-02 株式会社フジキン 流体制御装置
JP2015519724A (ja) * 2012-03-27 2015-07-09 ラム リサーチ コーポレーションLam Research Corporation プラズマ処理システムにおける共有ガスパネル
KR20190122233A (ko) 2017-03-28 2019-10-29 가부시키가이샤 후지킨 이음매 블록 및 이것을 사용한 유체제어장치
JP2021505826A (ja) * 2017-12-05 2021-02-18 鑑鋒國際股▲ふん▼有限公司Siw Engineering Pte.,Ltd. 流体制御装置及び流体制御装置用の継手

Families Citing this family (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1289851C (zh) * 1998-03-05 2006-12-13 斯瓦戈洛克公司 歧管系统
US6546960B1 (en) * 2000-03-03 2003-04-15 Creative Pathways, Inc. Self-aligning SmartStrate™
DE10026086A1 (de) * 2000-05-26 2001-12-13 Audi Ag Vorrichtung zum Anordnen zumindest eines Fluidsteuerventiles
JP2002089798A (ja) * 2000-09-11 2002-03-27 Ulvac Japan Ltd 流体制御装置およびこれを用いたガス処理装置
US6550368B2 (en) * 2000-10-31 2003-04-22 Festo Corporation Fluid power interlock system
TW524944B (en) 2001-05-16 2003-03-21 Unit Instr Inc Fluid flow system
US7005268B2 (en) * 2002-03-13 2006-02-28 Agilent Technologies, Inc. Detection of biopolymers utilizing photo-initiated charge separation
JP2003280745A (ja) * 2002-03-25 2003-10-02 Stec Inc マスフローコントローラ
AU2003262953A1 (en) * 2002-08-27 2004-03-19 Celerity Group, Inc. Modular substrate gas panel having manifold connections in a common plane
US7178556B2 (en) * 2003-08-07 2007-02-20 Parker-Hannifin Corporation Modular component connector substrate assembly system
CN1887029A (zh) * 2003-11-07 2006-12-27 迅捷公司 表面安装的加热器
DE102004008490A1 (de) * 2004-02-20 2005-09-08 Sig Technology Ltd. Vorrichtung zur pneumatischen Steuerung
US20060070674A1 (en) * 2004-10-01 2006-04-06 Eidsmore Paul G Substrate with offset flow passage
US7610648B2 (en) * 2005-01-12 2009-11-03 Bon Tool Company Stainless steel tool and method of forming
US7628168B2 (en) 2005-06-10 2009-12-08 Lam Research Corporation Optimized activation prevention assembly for a gas delivery system and methods therefor
US7575616B2 (en) * 2006-02-10 2009-08-18 Entegris, Inc. Low-profile surface mount filter
JP4221425B2 (ja) * 2006-08-11 2009-02-12 シーケーディ株式会社 パージガスユニット及びパージガス供給集積ユニット
US20080072977A1 (en) * 2006-09-27 2008-03-27 Curtiss-Wright Flow Control Corporation Pilot-operated valves and manifold assemblies
US20080302426A1 (en) * 2007-06-06 2008-12-11 Greg Patrick Mulligan System and method of securing removable components for distribution of fluids
US7806143B2 (en) 2007-06-11 2010-10-05 Lam Research Corporation Flexible manifold for integrated gas system gas panels
US7784496B2 (en) * 2007-06-11 2010-08-31 Lam Research Corporation Triple valve inlet assembly
US7784497B2 (en) * 2007-07-12 2010-08-31 Eriksson Mark L MSM component and associated gas panel assembly
US8322380B2 (en) 2007-10-12 2012-12-04 Lam Research Corporation Universal fluid flow adaptor
US8307854B1 (en) 2009-05-14 2012-11-13 Vistadeltek, Inc. Fluid delivery substrates for building removable standard fluid delivery sticks
WO2010144541A2 (en) 2009-06-10 2010-12-16 Vistadeltek, Llc Extreme flow rate and/or high temperature fluid delivery substrates
WO2011047088A1 (en) * 2009-10-13 2011-04-21 Coast Pneumatics, Inc. Flow controller
US8327879B2 (en) * 2010-03-10 2012-12-11 Coast Pneumatics, Inc. Modular manifold with quick disconnect valve fittings
US8336573B2 (en) * 2010-03-10 2012-12-25 Coast Pneumatics, Inc. Modular manifold with quick disconnect valve fittings
US8333214B2 (en) * 2010-03-10 2012-12-18 Coast Pneumatics, Inc. Modular manifold with quick disconnect valve fittings
US8528399B2 (en) 2010-05-21 2013-09-10 The Mercury Iron and Steel Co. Methods and apparatuses for measuring properties of a substance in a process stream
US8950433B2 (en) 2011-05-02 2015-02-10 Advantage Group International Inc. Manifold system for gas and fluid delivery
US8746272B2 (en) * 2011-09-26 2014-06-10 Air Products And Chemicals, Inc. Solenoid bypass system for continuous operation of pneumatic valve
US10167975B2 (en) * 2012-06-25 2019-01-01 Norgren Gmbh Coupling system for an expandable fluid distribution system
CN103062494B (zh) * 2012-08-29 2014-10-08 北京理加联合科技有限公司 带侧向通孔的多通路阀板及其控制多个气路的方法
JP5616416B2 (ja) * 2012-11-02 2014-10-29 株式会社フジキン 集積型ガス供給装置
JP6054471B2 (ja) 2015-05-26 2016-12-27 株式会社日本製鋼所 原子層成長装置および原子層成長装置排気部
JP5990626B1 (ja) * 2015-05-26 2016-09-14 株式会社日本製鋼所 原子層成長装置
JP6054470B2 (ja) 2015-05-26 2016-12-27 株式会社日本製鋼所 原子層成長装置
US10460960B2 (en) * 2016-05-09 2019-10-29 Applied Materials, Inc. Gas panel apparatus and method for reducing exhaust requirements
US20180082870A1 (en) * 2016-09-16 2018-03-22 Applied Materials, Inc. Assemblies and methods of process gas flow control
PL3690293T3 (pl) * 2017-09-29 2024-03-11 Zhejiang Sanhua Intelligent Controls Co., Ltd. Blok i sterujące płynem urządzenie
US11662038B1 (en) * 2019-01-11 2023-05-30 Humphrey Products Company Modular valve assembly
CN113994460B (zh) * 2019-04-15 2025-05-20 朗姆研究公司 用于气体输送的模块部件系统
CN114729711A (zh) * 2019-12-20 2022-07-08 斯瓦戈洛克公司 具有泄漏测试通道的流体部件主体
CN111370744B (zh) * 2020-03-06 2021-07-02 武汉理工大学 一种用于燃料电池电堆组的分配歧管
WO2021231537A1 (en) * 2020-05-12 2021-11-18 Ichor Systems, Inc. Seal retainer for a component assembly and method of installing a component into an apparatus for controlling flow
CN111945136B (zh) * 2020-08-13 2022-10-21 北京北方华创微电子装备有限公司 半导体工艺设备及其集成供气系统
KR20220117150A (ko) 2021-02-16 2022-08-23 에이에스엠 아이피 홀딩 비.브이. 기판 처리 장치
WO2022186971A1 (en) 2021-03-03 2022-09-09 Ichor Systems, Inc. Fluid flow control system comprising a manifold assembly
US12140241B2 (en) * 2021-05-24 2024-11-12 Festo Se & Co. Kg Fluid control system
US12424414B2 (en) * 2021-10-19 2025-09-23 Applied Materials, Inc. Semiconductor processing system with a manifold for equal splitting and common divert architecture
US20230139688A1 (en) * 2021-10-29 2023-05-04 Applied Materials, Inc. Modular multi-directional gas mixing block
KR20240158338A (ko) 2022-03-10 2024-11-04 어플라이드 머티어리얼스, 인코포레이티드 모듈식 다방향 가스 혼합 블록
KR102893093B1 (ko) * 2023-06-02 2025-12-03 대동모벨시스템 주식회사 차량용 시트의 돌출량 조절용 에어 분배기
US20260029061A1 (en) * 2024-07-25 2026-01-29 Applied Materials, Inc. Gas panel enclosure
US20260096371A1 (en) * 2024-09-27 2026-04-02 Applied Materials, Inc. Modular multi-directional gas mixing block

Family Cites Families (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3025878A (en) 1959-06-02 1962-03-20 Robert C Hupp Mounting panel for fluid control components
AT255802B (de) 1964-09-29 1967-07-25 Zd Y Prumyslove Automatisace N Pneumatisches logisches System
US3476214A (en) * 1968-02-01 1969-11-04 Mccord Corp Divisional lubricant feeder with bypass means
DE2302267B1 (de) * 1973-01-18 1974-06-12 Abex Gmbh Denison, 4010 Hilden Leitungssäule für hydraulische Ventile
FR2257846B1 (https=) * 1973-07-03 1976-05-28 Legris France Sa
FR2250907A1 (en) 1973-11-09 1975-06-06 Bouteille Daniel Assembly baseplates for pneumatic or hydraulic distributors - tongue and groove are standard modules which connect with into rigid block
DE2413703C3 (de) * 1974-03-21 1979-01-04 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen Ventilanordnung für die Zuführung flüssiger oder gasförmiger Substanzen zu einem Verarbeitungsgefäß
FR2307151A1 (fr) * 1975-04-07 1976-11-05 Crouzet Sa Dispositif d'alimentation modulaire pour commande pneumatique
US4080752A (en) 1975-05-01 1978-03-28 Burge David A Toy blocks with conduits and fluid seal means
US3993091A (en) * 1975-10-06 1976-11-23 General Gas Light Company Manifold and valve system
DE2648751C2 (de) * 1976-10-27 1986-04-30 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Vorrichtung für die Zuführung flüssiger oder gasförmiger Substanzen zu einem Verarbeitungsgefäß
DE2704869C3 (de) 1977-02-05 1980-11-20 Festo-Maschinenfabrik Gottlieb Stoll, 7300 Esslingen In modularer Bauweise aus gleichen, logische Schaltungselemente enthaltenden Baugruppen zusammengesetzte fluidische Steuerschaltung
US4093329A (en) 1977-03-22 1978-06-06 Robertshaw Controls Company Manifolding means and system for electrical and/or pneumatic control devices and methods
DE2852685C2 (de) * 1978-12-06 1987-04-02 Wabco Westinghouse Fahrzeugbremsen GmbH, 3000 Hannover Einrichtung mit Grundplatten für eine Ventilbatterie
US4352532A (en) 1980-09-15 1982-10-05 Robertshaw Controls Company Manifolding means for electrical and/or pneumatic control units and parts and methods therefor
US4524807A (en) 1982-05-21 1985-06-25 Humphrey Products Company Snap-together modular manifold construction
US4558845A (en) * 1982-09-22 1985-12-17 Hunkapiller Michael W Zero dead volume valve
GB2176270B (en) * 1985-06-10 1989-08-23 Emcore Inc Modular gas handling apparatus
IT1222940B (it) 1987-10-19 1990-09-12 Dropsa Spa Distributore idraulico progressivo modulare per impianti di lubrificazione
DE8813778U1 (de) * 1988-11-04 1989-02-23 Colt International Holdings AG, Steinhausen Integrationsblock
EP0392072A1 (en) 1989-04-13 1990-10-17 Unit Instruments, Inc. Fluid mass flow control system
JP2633060B2 (ja) 1990-05-30 1997-07-23 ファナック株式会社 段積み式ワーク供給装置
US5178191A (en) 1990-09-05 1993-01-12 Newmatic Controls Inc. Modular pneumatic control systems
US5368062A (en) 1992-01-29 1994-11-29 Kabushiki Kaisha Toshiba Gas supplying system and gas supplying apparatus
AU5405694A (en) 1992-10-16 1994-05-09 Unit Instruments, Inc. Thermal mass flow controller having orthogonal thermal mass flow sensor
EP0619450A1 (en) * 1993-04-09 1994-10-12 The Boc Group, Inc. Zero Dead-Leg Gas Cabinet
JPH0778128A (ja) 1993-06-17 1995-03-20 Kanebo Ltd 逆離散コサイン変換方法および逆離散コサイン変換装置
FR2708702B1 (fr) * 1993-08-06 1995-10-20 Vygon Rampe de robinets.
JPH0758721A (ja) 1993-08-17 1995-03-03 Fujitsu Denso Ltd 多重伝送方式
JP2695745B2 (ja) * 1993-09-02 1998-01-14 シーケーディ株式会社 ガス供給装置
DE69427645T2 (de) 1993-10-06 2002-05-08 Unit Instruments, Inc. Apparat zur handhabung von prozess fluiden
US5730181A (en) 1994-07-15 1998-03-24 Unit Instruments, Inc. Mass flow controller with vertical purifier
US5653259A (en) 1994-10-17 1997-08-05 Applied Biosystems, Inc. Valve block
US5605179A (en) 1995-03-17 1997-02-25 Insync Systems, Inc. Integrated gas panel
EP0733810B1 (de) * 1995-03-24 2002-09-11 Rexroth Mecman GmbH Modulare Ventilanordnung
AU5386396A (en) 1995-05-05 1996-11-21 Insync Systems, Inc. Mfc-quick change method and apparatus
JP2832166B2 (ja) 1995-05-19 1998-12-02 シーケーディ株式会社 ガス供給集積ユニット
JP3546275B2 (ja) 1995-06-30 2004-07-21 忠弘 大見 流体制御装置
JP3605705B2 (ja) 1995-07-19 2004-12-22 株式会社フジキン 流体制御器
DE19535235A1 (de) * 1995-09-22 1997-03-27 Bosch Gmbh Robert Hydraulikaggregat
TW347460B (en) 1995-11-29 1998-12-11 Applied Materials Inc Flat bottom components and flat bottom architecture for fluid and gas systems
KR100232112B1 (ko) * 1996-01-05 1999-12-01 아마노 시게루 가스공급유닛
US5662143A (en) 1996-05-16 1997-09-02 Gasonics International Modular gas box system
US5720317A (en) * 1996-08-21 1998-02-24 Pgi International, Ltd. Low profile flanged manifold valve
US5992463A (en) 1996-10-30 1999-11-30 Unit Instruments, Inc. Gas panel
JP4022696B2 (ja) 1996-11-20 2007-12-19 忠弘 大見 遮断開放器
US6302141B1 (en) 1996-12-03 2001-10-16 Insync Systems, Inc. Building blocks for integrated gas panel
US5860676A (en) 1997-06-13 1999-01-19 Swagelok Marketing Co. Modular block assembly using angled fasteners for interconnecting fluid components
JP4378553B2 (ja) * 1997-10-13 2009-12-09 忠弘 大見 流体制御装置

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* Cited by examiner, † Cited by third party
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JP2005514561A (ja) * 2001-12-21 2005-05-19 フリースケール セミコンダクター インコーポレイテッド 流体の搬送装置及びベースプレート
WO2004051125A1 (ja) * 2002-12-02 2004-06-17 Fujikin Incorporated 流体制御装置
WO2011040268A1 (ja) * 2009-09-30 2011-04-07 株式会社堀場エステック 流量算出システム、集積型ガスパネル装置及びベースプレート
JP5669583B2 (ja) * 2009-09-30 2015-02-12 株式会社堀場エステック 流量算出システム、集積型ガスパネル装置及びベースプレート
JP2015519724A (ja) * 2012-03-27 2015-07-09 ラム リサーチ コーポレーションLam Research Corporation プラズマ処理システムにおける共有ガスパネル
JP2012197941A (ja) * 2012-05-21 2012-10-18 Ulvac Japan Ltd 流体制御装置およびこれを用いたガス処理装置
JP2015124851A (ja) * 2013-12-27 2015-07-06 株式会社フジキン 流体制御装置
WO2015098333A1 (ja) * 2013-12-27 2015-07-02 株式会社フジキン 流体制御装置
CN105431661A (zh) * 2013-12-27 2016-03-23 株式会社富士金 流体控制装置
CN105431661B (zh) * 2013-12-27 2017-07-28 株式会社富士金 流体控制装置
US9719599B2 (en) 2013-12-27 2017-08-01 Fujikin Incorporated Fluid control device
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JP2021505826A (ja) * 2017-12-05 2021-02-18 鑑鋒國際股▲ふん▼有限公司Siw Engineering Pte.,Ltd. 流体制御装置及び流体制御装置用の継手
JP6992183B2 (ja) 2017-12-05 2022-02-03 鑑鋒國際股▲ふん▼有限公司 流体制御装置及び流体制御装置用の継手

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DE69837218T2 (de) 2007-11-15
US6293310B1 (en) 2001-09-25
KR20010031546A (ko) 2001-04-16
EP1040292A4 (en) 2004-06-16
DE69839083D1 (de) 2008-03-20
EP1040292B1 (en) 2007-02-28
EP1683994A2 (en) 2006-07-26
AU1285199A (en) 1999-05-17
EP1683994B1 (en) 2008-01-30
HK1031756A1 (en) 2001-06-22
EP1683994A3 (en) 2006-08-16
US6374859B1 (en) 2002-04-23
CN1105256C (zh) 2003-04-09
EP1040292A1 (en) 2000-10-04
KR100706147B1 (ko) 2007-04-11
WO1999022165A1 (en) 1999-05-06
DE69837218D1 (de) 2007-04-12
CA2307663A1 (en) 1999-05-06
CN1280657A (zh) 2001-01-17

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