JP2001510738A5 - - Google Patents

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Publication number
JP2001510738A5
JP2001510738A5 JP2000501874A JP2000501874A JP2001510738A5 JP 2001510738 A5 JP2001510738 A5 JP 2001510738A5 JP 2000501874 A JP2000501874 A JP 2000501874A JP 2000501874 A JP2000501874 A JP 2000501874A JP 2001510738 A5 JP2001510738 A5 JP 2001510738A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000501874A
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Japanese (ja)
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JP2001510738A (ja
JP4354630B2 (ja
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Priority claimed from US09/094,930 external-priority patent/US5921856A/en
Application filed filed Critical
Publication of JP2001510738A publication Critical patent/JP2001510738A/ja
Publication of JP2001510738A5 publication Critical patent/JP2001510738A5/ja
Application granted granted Critical
Publication of JP4354630B2 publication Critical patent/JP4354630B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000501874A 1997-07-10 1998-07-02 研磨パッドコンディショニングヘッドのｃｖｄダイヤモンド被覆基材及びその作製方法 Expired - Fee Related JP4354630B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US5214597P 1997-07-10 1997-07-10
US60/052,145 1997-07-10
US09/094,930 US5921856A (en) 1997-07-10 1998-06-15 CVD diamond coated substrate for polishing pad conditioning head and method for making same
US09/094,930 1998-06-15
PCT/US1998/013865 WO1999002309A1 (en) 1997-07-10 1998-07-02 Cvd diamond coated substrate for polishing pad conditioning head and method for making same

Publications (3)

Publication Number Publication Date
JP2001510738A JP2001510738A (ja) 2001-08-07
JP2001510738A5 true JP2001510738A5 ( ) 2006-01-05
JP4354630B2 JP4354630B2 (ja) 2009-10-28

Family

ID=26730242

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000501874A Expired - Fee Related JP4354630B2 (ja) 1997-07-10 1998-07-02 研磨パッドコンディショニングヘッドのｃｖｄダイヤモンド被覆基材及びその作製方法

Country Status (5)

Country Link
US (1) US5921856A ( )
JP (1) JP4354630B2 ( )
KR (1) KR100528678B1 ( )
TW (1) TW411302B ( )
WO (1) WO1999002309A1 ( )

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US9238207B2 (en) 1997-04-04 2016-01-19 Chien-Min Sung Brazed diamond tools and methods for making the same
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US9868100B2 (en) 1997-04-04 2018-01-16 Chien-Min Sung Brazed diamond tools and methods for making the same
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US9221154B2 (en) 1997-04-04 2015-12-29 Chien-Min Sung Diamond tools and methods for making the same
US9409280B2 (en) 1997-04-04 2016-08-09 Chien-Min Sung Brazed diamond tools and methods for making the same
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US6679243B2 (en) 1997-04-04 2004-01-20 Chien-Min Sung Brazed diamond tools and methods for making
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US6632127B1 (en) 2001-03-07 2003-10-14 Jerry W. Zimmer Fixed abrasive planarization pad conditioner incorporating chemical vapor deposited polycrystalline diamond and method for making same
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US7037184B2 (en) * 2003-01-22 2006-05-02 Raytech Innovation Solutions, Llc Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same
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US7762872B2 (en) * 2004-08-24 2010-07-27 Chien-Min Sung Superhard cutters and associated methods
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US7658666B2 (en) * 2004-08-24 2010-02-09 Chien-Min Sung Superhard cutters and associated methods
US9724802B2 (en) 2005-05-16 2017-08-08 Chien-Min Sung CMP pad dressers having leveled tips and associated methods
US8398466B2 (en) 2006-11-16 2013-03-19 Chien-Min Sung CMP pad conditioners with mosaic abrasive segments and associated methods
US9138862B2 (en) 2011-05-23 2015-09-22 Chien-Min Sung CMP pad dresser having leveled tips and associated methods
US8393934B2 (en) 2006-11-16 2013-03-12 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
US8974270B2 (en) 2011-05-23 2015-03-10 Chien-Min Sung CMP pad dresser having leveled tips and associated methods
US8678878B2 (en) * 2009-09-29 2014-03-25 Chien-Min Sung System for evaluating and/or improving performance of a CMP pad dresser
US8622787B2 (en) 2006-11-16 2014-01-07 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
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JP2007152493A (ja) * 2005-12-05 2007-06-21 Ebara Corp 研磨パッドのドレッサー及びその製造方法
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US20080153398A1 (en) * 2006-11-16 2008-06-26 Chien-Min Sung Cmp pad conditioners and associated methods
KR20100106328A (ko) * 2007-11-13 2010-10-01 치엔 민 성 Ｃｍｐ 패드 드레서
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US8252263B2 (en) * 2008-04-14 2012-08-28 Chien-Min Sung Device and method for growing diamond in a liquid phase
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CN102484054A (zh) * 2009-06-02 2012-05-30 圣戈班磨料磨具有限公司 耐腐蚀性cmp修整工件及其制造和使用方法
SG178605A1 (en) 2009-09-01 2012-04-27 Saint Gobain Abrasives Inc Chemical mechanical polishing conditioner
KR101091030B1 (ko) * 2010-04-08 2011-12-09 이화다이아몬드공업 주식회사 감소된 마찰력을 갖는 패드 컨디셔너 제조방법
CN103221180A (zh) 2010-09-21 2013-07-24 铼钻科技股份有限公司 具有基本平坦颗粒尖端的超研磨工具及其相关方法
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US9457450B2 (en) * 2013-03-08 2016-10-04 Tera Xtal Technology Corporation Pad conditioning tool
GB201305217D0 (en) * 2013-03-21 2013-05-01 For Your Diamonds Only Ltd Cleaning method
JP5824182B1 (ja) 2015-06-29 2015-11-25 ジャスト株式会社 把持具の把持面のめっき処理方法及び把持具
JP2018032745A (ja) * 2016-08-24 2018-03-01 東芝メモリ株式会社 ドレッサー、ドレッサーの製造方法、及び半導体装置の製造方法
JP7198801B2 (ja) 2017-07-11 2023-01-04 スリーエム イノベイティブ プロパティズ カンパニー 適合性コーティングを含む研磨物品及びそれによる研磨システム
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