JP2001507997A5 - - Google Patents

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Publication number
JP2001507997A5
JP2001507997A5 JP1998531090A JP53109098A JP2001507997A5 JP 2001507997 A5 JP2001507997 A5 JP 2001507997A5 JP 1998531090 A JP1998531090 A JP 1998531090A JP 53109098 A JP53109098 A JP 53109098A JP 2001507997 A5 JP2001507997 A5 JP 2001507997A5
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JP
Japan
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JP1998531090A
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JP2001507997A (ja
JP4163756B2 (ja
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Priority claimed from PCT/US1998/000317 external-priority patent/WO1998030356A1/en
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Publication of JP2001507997A5 publication Critical patent/JP2001507997A5/ja
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Publication of JP4163756B2 publication Critical patent/JP4163756B2/ja
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Figure 2001507997
Figure 2001507997
Figure 2001507997
Figure 2001507997
Figure 2001507997
Figure 2001507997
Figure 2001507997
Figure 2001507997
Figure 2001507997
Figure 2001507997
Figure 2001507997
Figure 2001507997
Figure 2001507997
JP53109098A 1997-01-13 1998-01-12 ホトリソグラフィーによって形成された表面パターンを有するポリマー研磨パッド及びこれに関する方法 Expired - Lifetime JP4163756B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US3449297P 1997-01-13 1997-01-13
US60/034,492 1997-01-13
PCT/US1998/000317 WO1998030356A1 (en) 1997-01-13 1998-01-12 Polymeric polishing pad having photolithographically induced surface pattern(s) and methods relating thereto

Publications (3)

Publication Number Publication Date
JP2001507997A JP2001507997A (ja) 2001-06-19
JP2001507997A5 true JP2001507997A5 (ja) 2005-09-08
JP4163756B2 JP4163756B2 (ja) 2008-10-08

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Family Applications (1)

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JP53109098A Expired - Lifetime JP4163756B2 (ja) 1997-01-13 1998-01-12 ホトリソグラフィーによって形成された表面パターンを有するポリマー研磨パッド及びこれに関する方法

Country Status (6)

Country Link
US (2) US6036579A (ja)
EP (1) EP0984846B1 (ja)
JP (1) JP4163756B2 (ja)
KR (1) KR100487455B1 (ja)
DE (1) DE69827789T2 (ja)
WO (1) WO1998030356A1 (ja)

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