JP2001358206A - Method and apparatus for cooling board - Google Patents

Method and apparatus for cooling board

Info

Publication number
JP2001358206A
JP2001358206A JP2000174624A JP2000174624A JP2001358206A JP 2001358206 A JP2001358206 A JP 2001358206A JP 2000174624 A JP2000174624 A JP 2000174624A JP 2000174624 A JP2000174624 A JP 2000174624A JP 2001358206 A JP2001358206 A JP 2001358206A
Authority
JP
Japan
Prior art keywords
substrate
cooling
airflow
floating
injection ports
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000174624A
Other languages
Japanese (ja)
Other versions
JP3955937B2 (en
Inventor
Satoshi Konishi
聡 小西
Sukeaki Hamanaka
亮明 濱中
Atsumori Hashimoto
敦守 橋本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ritsumeikan Trust
Toray Engineering Co Ltd
Original Assignee
Ritsumeikan Trust
Toray Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ritsumeikan Trust, Toray Engineering Co Ltd filed Critical Ritsumeikan Trust
Priority to JP2000174624A priority Critical patent/JP3955937B2/en
Publication of JP2001358206A publication Critical patent/JP2001358206A/en
Application granted granted Critical
Publication of JP3955937B2 publication Critical patent/JP3955937B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B25/00Annealing glass products
    • C03B25/04Annealing glass products in a continuous way
    • C03B25/06Annealing glass products in a continuous way with horizontal displacement of the glass products
    • C03B25/08Annealing glass products in a continuous way with horizontal displacement of the glass products of glass sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063Transporting devices for sheet glass
    • B65G49/064Transporting devices for sheet glass in a horizontal position
    • B65G49/065Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B35/00Transporting of glass products during their manufacture, e.g. hot glass lenses, prisms
    • C03B35/14Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands
    • C03B35/22Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands on a fluid support bed, e.g. on molten metal
    • C03B35/24Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands on a fluid support bed, e.g. on molten metal on a gas support bed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/02Controlled or contamination-free environments or clean space conditions
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2225/00Transporting hot glass sheets during their manufacture
    • C03B2225/02Means for positioning, aligning or orientating the sheets during their travel, e.g. stops

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PROBLEM TO BE SOLVED: To uniformly cool and convey a glass board having a large size and being a thick plate to be cooled in non-contact in a short time. SOLUTION: A table of a flat plate equivalent to four sides of the glass board having the large size and being the thick plate is horizontally disposed. A plurality of jet ports each for injecting air flows in a vertical direction and an oblique direction are provided at everywhere on the table. The board is conveyed from a previous step in a state in which the cooling air flows are injected from the plurality of the ports, the board is levitated in a non-contact state, and the board is fluctuated at some times to uniformly air current cools the board in a short time, and sent to a next step when becoming a set temperature or lower.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、プラズマ・ディス
プレー・パネル(以下PDPと略す)に代表される大型
かつ厚板ガラス基板の製造工程に於いて、加熱された該
基板を室温まで短時間内に全面を均一にかつ非接触状態
でクリーンに冷却する方法およびその装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a process for manufacturing a large and thick glass substrate typified by a plasma display panel (hereinafter abbreviated as "PDP"). The present invention relates to a method and apparatus for uniformly and cleanly cooling the entire surface in a non-contact state.

【0002】[0002]

【従来の技術】例えば、大型かつ厚板のPDP用ガラス
基板(対角長:1.8m、厚さ:3mm)のリブ竪て工
程においては、印刷加熱乾燥を十数回繰り返すことが行
われる。その時、印刷精度保持のためには印刷時の上記
基板温度を25±2℃以内に保持する必要があるが、逆
に、印刷直後の乾燥時の温度は150℃にも加熱される
ことになる。この十数回の温度サイクルを品質・生産性
の両面から短時間かつ均一に行うことが要求される。
2. Description of the Related Art For example, in a process of vertically extending a rib of a large and thick PDP glass substrate (diagonal length: 1.8 m, thickness: 3 mm), printing, heating and drying are repeated more than ten times. . At that time, in order to maintain the printing accuracy, it is necessary to maintain the substrate temperature at the time of printing within 25 ± 2 ° C. On the contrary, the temperature at the time of drying immediately after printing is also heated to 150 ° C. . It is required that these dozens of temperature cycles be performed in a short time and uniformly from both aspects of quality and productivity.

【0003】この要求に対しては、公開特許公報特開平
11−43337号「ガラス基板の冷却装置」におい
て、複数枚の冷却パネルを一定間隔で同一レベルに配設
して、広い冷却ゾーンを形成すると共に各冷却パネル間
隙間に吸気ノズル及び上下動自在の搬送ローラを配置す
ることによりガラス基板を吸着して冷却パネルに接触さ
せて冷却後、冷却パネルの配設間の隙間領域で冷却され
なかったガラス基板の領域をガラス基板を垂直に持ち上
げた後、水平移動して隣の冷却パネル上に載置する事に
より短時間にかつ均一に冷却する方法と装置が公開され
ており、十数回の温度サイクルを品質及び生産性の両面
から短時間かつ均一に行うという目的を十分達成し広く
用いられて来た。
In response to this requirement, Japanese Patent Application Laid-Open No. H11-43337 entitled "Glass Substrate Cooling Apparatus" discloses that a plurality of cooling panels are arranged at regular intervals at the same level to form a wide cooling zone. In addition, by disposing an intake nozzle and a vertically movable transport roller between the cooling panel gaps, the glass substrate is sucked, brought into contact with the cooling panel, cooled, and is not cooled in the gap area between the cooling panel arrangements. After raising the glass substrate vertically in the area of the glass substrate that has been moved vertically and horizontally, it is placed on the next cooling panel and a method and apparatus for cooling uniformly in a short time has been disclosed. The objective of performing the temperature cycle in a short time and uniformly in terms of both quality and productivity has been sufficiently achieved and widely used.

【0004】[0004]

【発明が解決しようとする課題】しかし、上記の方法で
は、冷却する基板が、併設された冷却パネル配設間の隙
間部分では冷却されないので、1回の冷却工程に対し、
基板を複数回持ち上げて水平移動させることにより位相
をずらした後、降下させて冷却パネルへ接触させること
の繰り返しにより冷却するので、位相をずらす工程のロ
ス分として、冷却時間の他に約10秒程度余分な時間を
必要とした。
However, in the above-mentioned method, since the substrate to be cooled is not cooled in the gap between the adjacent cooling panels, a single cooling step is required.
The phase is shifted by lifting and horizontally moving the substrate a plurality of times, and then cooled by repeating descending and contacting the cooling panel. Therefore, as a loss in the step of shifting the phase, about 10 seconds in addition to the cooling time are required. Needed some extra time.

【0005】また、ガラス材の場合は金属と異なり熱伝
導性が低いために第1回目の冷却時には、基板面全体の
冷却された領域と冷却されていない領域とが交互に温度
分布の縞模様を形成する。特に、印刷形成されたリブの
方向が搬送方向と直交している場合よりも平行な場合に
は、リブの長さ方向で断続的に熱収縮量が異なることに
なり、リブにかかる応力や歪みの分布が不均一となり好
ましくない現象が生じていた。
Further, in the case of a glass material, unlike a metal, the thermal conductivity is low, so that during the first cooling, the cooled area and the uncooled area of the entire substrate surface alternately have a stripe pattern of temperature distribution. To form In particular, when the direction of the printed rib is more parallel than when it is orthogonal to the transport direction, the amount of heat shrinkage varies intermittently in the length direction of the rib, and the stress and strain applied to the rib Has become uneven and an undesirable phenomenon has occurred.

【0006】また、上記冷却方法および装置においては
ユティリティとして冷却用の水、基板吸着用の真空ポン
プさらに駆動制御の3者が必要となるため、配管と配線
が煩雑となり、装置コストが高くなっていた。特に、冷
却水の使用はクリ−ンルーム内での配管表面に結露水を
招き好ましくなかった。
In addition, the above-mentioned cooling method and apparatus require three utilities of cooling water, a vacuum pump for sucking the substrate, and drive control as utilities, so that piping and wiring are complicated, and the cost of the apparatus is increased. Was. In particular, the use of cooling water is not preferable because it causes dew condensation on the pipe surface in the clean room.

【0007】一方、空冷法として、従来からガラス基板
周辺や上方から冷気を当てる方法が知られているが、支
え台に上記基板が載置されている方法であり、上記基板
下面には空気が至らず送風量の割には冷却効率が悪く、
ガラス基板の周辺や上方の温度分布は不均一で、かつ冷
却に長時間を要していた。従って、殆ど採用されていな
い。
On the other hand, as a method of air cooling, a method of hitting cool air from around or above a glass substrate has been known. However, this is a method in which the substrate is placed on a support, and air is blown on the lower surface of the substrate. The cooling efficiency is poor for the air volume
The temperature distribution around and above the glass substrate was not uniform, and it took a long time to cool. Therefore, it is hardly adopted.

【0008】[0008]

【課題を解決するための手段】本発明にかかる手段と
は、上流工程で(例えば乾燥炉などで)高温に加熱され
た基板が、複数の空気噴射口を有する気流浮上兼冷却テ
ーブル上に移載されて、所定時間浮上した状態で滞留さ
れた後、所定温度までの冷却を温度監視カメラで確認
後、次工程(例えばPDPのリブ印刷)へ送り出され
る。この時各工程ごとの基板の重なり事故を防ぐ為、各
工程には、基板有無検知センサーを設け且つ工程間には
ストッパーを設け、次工程に送られる前に必ず基板有無
検知センサーで次工程に基板が無いことを確認して後、
ストッパーを開放して基板は送り出される。
According to the present invention, a substrate heated to a high temperature in an upstream process (for example, in a drying furnace) is transferred to an airflow floating / cooling table having a plurality of air injection ports. After being mounted and suspended in a state of floating for a predetermined time, the cooling to a predetermined temperature is confirmed by a temperature monitoring camera, and then sent out to the next process (for example, PDP rib printing). At this time, in order to prevent the accident of overlapping of the substrates in each process, a substrate presence / absence detection sensor is provided in each process and a stopper is provided between the processes, and before the next process is sent, the substrate presence / absence detection sensor must be used for the next process. After confirming that there is no substrate,
The substrate is sent out with the stopper opened.

【0009】ここで、空気噴射口を有する気流浮上兼冷
却テーブルは、基板より大きいサイズであり十分多数の
噴射口を有しており、かつ噴射口から出た冷却空気の出
口は基板周辺の4辺のみであるため、冷却空気は基板の
下面を舐めてから4辺で放出されるので、基板を気流浮
上兼冷却テーブル上で静止浮上させることだけで、基板
の全面に及んで均一に冷却することが可能となる。送る
気体を圧縮して送る段階で放圧することにより、かなり
の冷却効果が得られるか、さらに、積極的に冷却する
為、必要応じて気流浮上兼冷却テーブルに送る流路に送
る気体を冷却する熱交換器を設けることも出来る。
Here, the airflow floating / cooling table having an air injection port is larger in size than the substrate and has a sufficient number of injection ports, and the outlet of the cooling air coming out of the injection port is located at the periphery of the substrate. Since the cooling air is only on the sides, the cooling air is released on the four sides after licking the lower surface of the substrate, so that the substrate can be uniformly cooled over the entire surface of the substrate by simply floating the substrate on the airflow and cooling table. It becomes possible. By compressing the gas to be sent and releasing the pressure at the stage of sending, a considerable cooling effect can be obtained, or if necessary, to cool the air positively, cool the gas sent to the flow path to the air flow levitation and cooling table if necessary A heat exchanger can also be provided.

【0010】さらに、気流浮上兼冷却テーブル上に浮上
用の上方垂直噴射口に加えて、基板を前進および後退や
左右に揺動の為上方への傾斜噴射口を適時配設し、基板
を気流浮上兼冷却テーブル板上で揺動させて、基板下面
と噴射口の相対位置をずらせて、更に均一冷却と冷却時
間短縮化を図ることが出来た。
Further, in addition to the upper vertical injection port for air flow floating and cooling on the cooling table, an upwardly inclined injection port for appropriately moving the substrate forward and backward or swinging left and right is disposed at an appropriate time so that the substrate can be air-flowed. By swinging on the floating / cooling table plate, the relative position between the lower surface of the substrate and the injection port was shifted, so that the uniform cooling and the cooling time could be further reduced.

【0011】また、基板を前進および後退や左右に揺動
させるにおいては、シリンダーやリンク機構又はカム機
構などを用いて気流浮上兼冷却テーブルを前後左右斜め
に傾斜揺動することにより、基板の自重によって、基板
を揺動させ上記傾斜噴射口を設けたと同様、均一冷却と
冷却時間短縮化効果を得ることができた。
Further, when the substrate is moved forward and backward, and is swung right and left, the airflow floating and cooling table is tilted and swung obliquely back and forth and right and left by using a cylinder, a link mechanism or a cam mechanism, so that the weight of the substrate is reduced. As a result, as in the case where the substrate was oscillated and the inclined injection port was provided, uniform cooling and a reduction in cooling time could be obtained.

【0012】尚、この装置および冷却方法は、その他大
画面化傾向が進展する液晶表示パネルに用いられるガラ
ス基板、太陽電池のアモルファスシリコン蒸着基板、高
分子のフィルム基板、金属泊/高分子フィルムラミネー
ト材、塗装又は洗浄された金属薄板などの加熱板の冷却
工程にも適用される。
The apparatus and the cooling method are applicable to a glass substrate used for a liquid crystal display panel in which the trend toward larger screens is progressing, an amorphous silicon vapor-deposited substrate for a solar cell, a polymer film substrate, a metal film / polymer film laminate. The present invention is also applied to a cooling process of a heating plate such as a material, a painted or washed metal sheet.

【0013】[0013]

【発明の実施の形態】次に、実施例を用いて、発明の実
施の形態を説明する。
Next, embodiments of the present invention will be described with reference to examples.

【0014】[0014]

【実施例】(実施例1)図1は本発明である気流浮上兼
冷却テーブルを用いて基板冷却(場合によっては基板余
熱)を行う場合の前後工程を含めた平面図であり、図2
は、図1におけるA−A断面図である。その構成は、基
板の待機搬入工程部分(以下「ステーションI」とい
う)と基板冷却工程部分(以下「ステーションII」と
いう)と基板搬出部分(以下「ステーションIII」と
いう)から成る。ステーションIとステーションIII
では、搬送される基板の下面のレベルに、図示していな
いが動力モーターやチェーンやベルトなどの動力伝達系
機構により搬送ロール軸2を駆動し、それを介して同一
レベルで間欠旋回するローラー3が配設されている。ロ
ーラー3の両端には基板の落下防止用として一対のガー
ドレール6が取り付けられている。各ステーションI、
II、IIIの間には、停止している先行基板1に後続
の基板1が追突するのを防止するために上下昇降可能な
ストッパー4、5が配置されている。このストッパー
4、5は基板上面に設置された基板有無検知センサー1
6の指令を受けて上下作動する。また、同時にストッパ
ー5は、ステーションIIにおいて、温度監視カメラ1
7により測定された基板1の温度に基き指令を受けて上
下作動する。
(Embodiment 1) FIG. 1 is a plan view including a process before and after a case of cooling a substrate (in some cases, residual heat of a substrate) using an airflow floating and cooling table according to the present invention.
FIG. 2 is a sectional view taken along line AA in FIG. The configuration includes a standby loading step (hereinafter, referred to as “station I”), a substrate cooling step (hereinafter, “station II”), and a substrate unloading section (hereinafter, “station III”). Station I and Station III
Then, the transport roll shaft 2 is driven by a power transmission mechanism such as a power motor or a chain or a belt (not shown) at the lower surface level of the substrate to be transported, and the rollers 3 that rotate intermittently at the same level therethrough. Are arranged. A pair of guard rails 6 are attached to both ends of the roller 3 to prevent the board from falling. Each station I,
Between II and III, stoppers 4 and 5 which can move up and down in order to prevent the succeeding substrate 1 from colliding with the stopped preceding substrate 1 are arranged. The stoppers 4 and 5 are a substrate presence / absence detection sensor 1 installed on the upper surface of the substrate.
It moves up and down in response to the command of 6. At the same time, the stopper 5 is connected to the temperature monitoring camera 1 in the station II.
7 to move up and down in response to a command based on the temperature of the substrate 1 measured by the controller 7.

【0015】ステーションIIの構造は、配管を介して
圧縮機7に接続された気流浮上兼冷却テーブル8がロー
ラー3の上部表面で基板1を支える場合の基板1の下面
の水平線レベルと同等ないし低く設置されている。
(注:同等以上に高い場合には、ステーションIからの
搬入障害となる)この気流浮上兼冷却テーブル8の上面
には、垂直上方に所定経の垂直噴出口9が所定のヒ゜ッチで
設けられている。空気の排出は連続であっても良いが、
経済的には基板1がステーションIIに入る直前に噴出
を開始し、ステーションIIIへ搬出直後に噴射を停止
させるのが好ましい。
The structure of the station II is the same as or lower than the level of the horizontal line on the lower surface of the substrate 1 when the airflow floating and cooling table 8 connected to the compressor 7 through the pipe supports the substrate 1 on the upper surface of the roller 3. is set up.
(Note: If the height is equal to or higher than that, it will be an obstacle to loading from the station I.) On the upper surface of the airflow floating and cooling table 8, a vertical outlet 9 having a predetermined diameter is provided at a predetermined pitch vertically upward. I have. The air discharge may be continuous,
It is economically preferable to start the ejection immediately before the substrate 1 enters the station II and stop the ejection immediately after the substrate 1 is carried out to the station III.

【0016】また、圧縮機7から気流浮上兼冷却テーブ
ル8へ気体を送る段階で、放圧されることによりかなり
の冷却効果は得られるが、積極的に冷却する方法として
圧縮機7から気流浮上兼冷却テーブル8間の配管に冷却
した気体を送る為、熱交換器18を設けることも出来
る。
At the stage of sending the gas from the compressor 7 to the airflow floating / cooling table 8, a considerable cooling effect can be obtained by releasing the pressure. However, as a method of actively cooling, the airflow floating from the compressor 7 is performed. A heat exchanger 18 can also be provided to send the cooled gas to the pipe between the cooling tables 8.

【0017】冷却中の基板1の直上に設けられた例えば
赤外線感知式の温度監視カメラ17は基板温度が所定温
度域、所定均一度に到達したことを検知してストッパー
5の降下と図示していないが搬出プッシャーにより次ス
テーションIIIへ送り出す。
A temperature monitoring camera 17 of, for example, an infrared sensing type provided immediately above the substrate 1 being cooled detects that the substrate temperature has reached a predetermined temperature range and a predetermined uniformity, and indicates that the stopper 5 has dropped. No, but it is sent out to the next station III by the unloading pusher.

【0018】なお、実施例1では、ステーションIIの
領域内の任意の位置に基板1が位置することになるが、
噴射空気量と噴射口とが十分に多いこと、噴射された空
気は、ステーションIIの気流浮上兼冷却テーブル8上
面と基板1下面の隙間(通常0.2〜0.5mm程度)
の全域でガラス下面の全面を舐めて、基板1の4辺から
放出されるので、冷却効率が高いことに加えて冷却過程
での温度分布も均一となる。つまり、基板1の噴出口直
上部分(近辺)が冷点(コールド・スポット)となるこ
とはない。 (実施例2)図3は、ステーションIIの気流浮上兼冷
却テーブル8面に設けられた空気噴射口がすべて垂直方
向の垂直噴射口9である場合を示している実施例1の気
流浮上兼冷却テーブル8部分の拡大断面図であり、基板
1の下面に対する空気噴射口位置との相対関係が意図的
に移動させない例を示している。 (実施例3)図4は、気流の斜噴射方式による基板揺動
機構を備えた気流浮上兼冷却テーブルの実施例を示して
いる。ステーションIIの気流浮上兼冷却テーブル8面
の中央部には垂直噴射口9を周辺部には気流浮上兼冷却
テーブル8の中央に向かって、傾斜した斜め噴射口10
を設け、かつ垂直噴射口9と斜め噴射口10からの空気
噴射の噴射と停止を独立に制御するため、仕切板11、
12を設け気流浮上兼冷却テーブル8の中空体部分を室
A、室B、室Cと3分し、記載していないが室A、室
B、室Cへの空気を独立に配分することが可能とし、且
つ空気送付切替弁も独立させた構成となっている。図4
中、垂直噴射口9及び斜め噴射口10からの空気の流れ
に対して実線矢印の場合、即ち、室Bの垂直噴射口9か
ら空気噴射で、基板を浮上且つ冷却させている状態で、
室Aのみの斜め噴射口10から噴射を行うことにより、
基板1を右方向に移動させ、続いて、室Aの斜め噴射口
10からの噴射を止めて、室Cの斜め噴射口10から噴
射を行うことにより基板1を左方向に移動させる。この
繰り返しを行うことにより気流浮上兼冷却テーブル8上
で基板1を揺動させることが出来る。従って、基板1の
冷却の場合には、最も温度の低い冷却噴出口近辺へ基板
1の下面の相対位置を揺動によりずらせることにより、
(実施例1)、(実施例2)に記載した方法よりも更に
均一な基板冷却を可能とした。 (実施例4)本例は、基板冷却の均一化を図る他の実施
例であり、図5に基板の自重による傾斜滑落方式による
基板揺動機構を備えた気流浮上兼冷却テーブルの実施例
として示している。気流浮上兼冷却テーブル8上で浮上
している基板1が、微少な傾斜により自重で容易に移動
する原理を応用する。例えば、一端が旋回可能なヒンジ
13を用いた機構とし他端をヒンジ14及び空気又は油
圧シリンダーやリンクやカム機構を用いて昇降機構15
を微少量だけ上下させることで気流浮上兼冷却テーブル
8上面を前後、場合によっては左右に揺動させて垂直噴
射口9と基板1下面の相対位置をずらせる方法である。
In the first embodiment, the substrate 1 is located at an arbitrary position in the area of the station II.
The amount of the injection air and the injection port are sufficiently large, and the injected air is a gap between the upper surface of the airflow floating and cooling table 8 of the station II and the lower surface of the substrate 1 (typically about 0.2 to 0.5 mm).
Is licked over the entire surface of the lower surface of the glass and is released from the four sides of the substrate 1, so that the cooling efficiency is high and the temperature distribution in the cooling process becomes uniform. That is, the portion (near the area) immediately above the ejection port of the substrate 1 does not become a cold spot (cold spot). (Embodiment 2) FIG. 3 shows a case where all the air injection ports provided on the surface of the airflow floating and cooling table 8 of the station II are vertical injection ports 9 in the vertical direction. FIG. 4 is an enlarged cross-sectional view of a table 8 portion, showing an example in which a relative relationship between a position of an air injection port with respect to a lower surface of the substrate 1 is not intentionally moved. (Embodiment 3) FIG. 4 shows an embodiment of an airflow floating / cooling table provided with a substrate swinging mechanism by an oblique airflow injection method. A vertical injection port 9 is provided at the center of the surface of the airflow floating and cooling table 8 at the station II, and an oblique injection port 10 which is inclined toward the center of the airflow floating and cooling table 8 at the peripheral portion.
In order to independently control the injection and stop of the air injection from the vertical injection port 9 and the oblique injection port 10, the partition plate 11,
12 is provided to divide the hollow body portion of the airflow floating / cooling table 8 into three chambers A, B, and C. Although not described, air to the chambers A, B, and C can be independently distributed. It is configured to be possible, and the air sending switching valve is also independent. FIG.
In the case of a solid arrow with respect to the flow of air from the middle and vertical injection ports 9 and the oblique injection ports 10, that is, in a state where the substrate is floated and cooled by air injection from the vertical injection port 9 of the chamber B,
By performing injection from the oblique injection port 10 only in the chamber A,
The substrate 1 is moved rightward, and subsequently, the ejection from the oblique ejection port 10 of the chamber A is stopped, and the ejection is performed from the oblique ejection port 10 of the chamber C, whereby the substrate 1 is moved leftward. By repeating this, the substrate 1 can be swung on the airflow floating and cooling table 8. Therefore, in the case of cooling the substrate 1, the relative position of the lower surface of the substrate 1 is shifted by swinging to the vicinity of the cooling outlet having the lowest temperature.
More uniform substrate cooling was enabled than the methods described in (Example 1) and (Example 2). (Embodiment 4) This embodiment is another embodiment for achieving uniform cooling of a substrate. FIG. 5 shows an embodiment of an airflow levitation and cooling table provided with a substrate swinging mechanism by an inclined sliding method by the substrate's own weight. Is shown. The principle that the substrate 1 floating on the airflow floating and cooling table 8 easily moves by its own weight due to a slight inclination is applied. For example, a mechanism using a hinge 13 whose one end can be turned and a lifting mechanism 15 using the hinge 14 and a pneumatic or hydraulic cylinder, link or cam mechanism at the other end.
Is moved up and down by a very small amount to swing the upper surface of the airflow floating and cooling table 8 back and forth, and in some cases, left and right to shift the relative position between the vertical injection port 9 and the lower surface of the substrate 1.

【0019】[0019]

【発明の効果】従来の技術では、基板の冷却方法および
装置においてはユティリティとして冷却用の水、基板吸
着用の真空ポンプさらに駆動制御の3者が必要となるた
め、配管と配線が煩雑となり、装置コストが高くなって
いた。特に、冷却水の使用はクリ−ンルーム内での配管
表面に結露水を招き好ましくなかった。しかし本発明で
は、冷却水を用い無いので、装置の製作および組立が簡
素化され、また、冷却配管表面上での結露水対策も無く
なった。
According to the prior art, in the method and apparatus for cooling a substrate, water for cooling, a vacuum pump for sucking the substrate, and drive control are required as utilities, so that piping and wiring become complicated. The equipment cost was high. In particular, the use of cooling water is not preferable because it causes dew condensation on the pipe surface in the clean room. However, in the present invention, since no cooling water is used, the manufacture and assembly of the apparatus are simplified, and measures against dew condensation on the surface of the cooling pipe are eliminated.

【0020】従来の方法では、冷却する基板が併設され
た冷却パネル配設間の隙間部分では冷却されないので、
1回の冷却工程に対し、基板を複数回持ち上げて水平移
動させることにより位相をずらした後、降下させて冷却
パネルへ接触させることの繰り返しにより冷却するので
約10秒程度のロス時間を生じていた。また、ガラス材
の場合は金属と異なり熱伝導性が低いために第1回目の
冷却時には、ガラス基板面全体の冷却された領域と冷却
されていない領域とが交互に温度分布の縞模様を形成す
る。特に、印刷形成されたリブの方向が搬送方向と直交
している場合よりも平行な場合には、リブの長さ方向で
断続的に熱収縮量が異なることになり、リブにかかる応
力や歪みの分布が不均一となり好ましくない現象が生じ
ていた。上記に対し、基板下面の全面を一様に冷却空気
が接触する本発明による方法では、全面を均一に冷却で
き、基板を間欠的に移動させる必要が無くなり、ロス時
間が無く所定温度まで導く冷却時間を大幅に短縮でき
た。
In the conventional method, cooling is not performed in the gap between the cooling panels provided with the substrates to be cooled.
For a single cooling step, the substrate is lifted and moved horizontally for a plurality of times to shift the phase, and then cooled by repeating descending and contacting the cooling panel, resulting in a loss time of about 10 seconds. Was. Further, in the case of a glass material, unlike a metal, the thermal conductivity is low, so that during the first cooling, a cooled area and an uncooled area of the entire glass substrate surface alternately form a stripe pattern of a temperature distribution. I do. In particular, when the direction of the printed rib is more parallel than when it is orthogonal to the transport direction, the amount of heat shrinkage varies intermittently in the length direction of the rib, and the stress and strain applied to the rib Has become uneven and an undesirable phenomenon has occurred. On the other hand, in the method according to the present invention in which the cooling air uniformly contacts the entire lower surface of the substrate, the entire surface can be uniformly cooled, the substrate does not need to be intermittently moved, and there is no loss time, and cooling that leads to a predetermined temperature. The time was greatly reduced.

【0021】本発明では、均一冷却が可能となるので、
基板上に設けられた線膨張係数や形状の異なる物体
(例:PDP基板では、積層印刷されたリブなど)が施
工されている場合には、残留応力、歪み、基板との剥離
やリブ内の微細クラックなどの欠陥発生が激減する。従
って、リブの成形方向と搬送方向との依存関係は無くな
り、生産管理が容易になると共に、上記欠陥発生を回避
する為の施策としての基板の90度旋回テーブルを設け
るなどの必要も無くなった。
In the present invention, since uniform cooling is possible,
When an object having a different coefficient of linear expansion or a different shape provided on a substrate (for example, a PDP substrate has a laminated printed rib, etc.), residual stress, distortion, peeling from the substrate, and the inside of the rib may occur. The occurrence of defects such as fine cracks is drastically reduced. Accordingly, the dependency between the rib forming direction and the transport direction is eliminated, and the production control is facilitated, and the necessity of providing a 90-degree turning table of the substrate as a measure for avoiding the above-mentioned defect is eliminated.

【0022】気流浮上兼冷却テーブルの中空体を通じて
上面から噴出口を経由して噴射する圧空は、空気の断熱
膨張効果により、噴出時に温度が低下する効果があり、
基板の冷却効果をさらに高めている。平行して、図4、
図5に示す様に、気流冷却テーブルに基板揺動機構を設
けることにより、冷却の為の各噴射口と基板下面の相対
位置をずらせることにより、更に冷却時の均一化と短時
間化を計ることが出来た。
The compressed air injected from the upper surface via the air outlet through the hollow body of the airflow floating / cooling table has the effect of lowering the temperature at the time of injection due to the adiabatic expansion effect of air.
The cooling effect of the substrate is further enhanced. In parallel, FIG.
As shown in FIG. 5, by providing a substrate swinging mechanism on the airflow cooling table, the relative position between each injection port for cooling and the lower surface of the substrate is shifted, so that cooling can be made more uniform and shorter. I was able to measure.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明である気流浮上兼冷却テーブルを用いて
基板冷却(場合によっては基板余熱)を行う場合の前後
工程を含めた平面図。
FIG. 1 is a plan view including a process before and after a case of performing substrate cooling (in some cases, substrate residual heat) using an airflow floating and cooling table according to the present invention.

【図2】図1におけるA−A矢視図FIG. 2 is a view taken in the direction of arrows AA in FIG. 1;

【図3】図1における気流浮上兼冷却テーブルの詳細図FIG. 3 is a detailed view of an airflow floating and cooling table in FIG. 1;

【図4】気流の斜噴射方式による基板揺動機構を備えた
気流浮上兼冷却テーブルの実施例
FIG. 4 is an embodiment of an airflow floating and cooling table provided with a substrate swinging mechanism by an oblique airflow injection method.

【図5】基板の自重による傾斜滑落方式による基板揺動
機構を備えた気流浮上兼冷却テーブルの実施例
FIG. 5 is an embodiment of an airflow levitation and cooling table provided with a substrate swinging mechanism by an inclined sliding method by a substrate's own weight.

【符号の説明】[Explanation of symbols]

1:基板 2:搬送ロール軸 3:ローラー 4:ストッパー 5:ストッパー 6:ガードレール 7:圧縮機 8:気流浮上兼冷却テーブル 9:垂直噴射口 10:斜め噴射口 11:仕切板 12:仕切板 13:ヒンジ 14:ヒンジ 15:昇降機構 16:基板有無検知センサー 17:温度監視カメラ 18:熱交換器 1: Substrate 2: Transport roll shaft 3: Roller 4: Stopper 5: Stopper 6: Guard rail 7: Compressor 8: Air flow floating and cooling table 9: Vertical jet port 10: Oblique jet port 11: Partition plate 12: Partition plate 13 : Hinge 14: Hinge 15: Lifting mechanism 16: Board presence detection sensor 17: Temperature monitoring camera 18: Heat exchanger

───────────────────────────────────────────────────── フロントページの続き (72)発明者 橋本 敦守 滋賀県大津市大江一丁目1番45号 東レエ ンジニアリング株式会社内 Fターム(参考) 5F031 CA05 FA02 FA07 GA53 GA63 HA38 HA39 HA56 JA01 JA04 JA22 JA46 MA30 PA18  ──────────────────────────────────────────────────続 き Continuing from the front page (72) Inventor Atsushi Hashimoto 1-45-1, Oe, Otsu City, Shiga Prefecture Toray Engineering Co., Ltd. F-term (reference) 5F031 CA05 FA02 FA07 GA53 GA63 HA38 HA39 HA56 JA01 JA04 JA22 JA46 MA30 PA18

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】冷却すべき平面基板を、その基板面積より
も大きい面積を有する水平姿勢の平面に所定径、所定ピ
ッチで配設された複数の気体噴射口を有する中空体のテ
ーブル上面に載せ、気流を用いて浮かし且つ気流冷却す
ることを特徴とする基板の冷却方法。
1. A flat substrate to be cooled is placed on a table top surface of a hollow body having a plurality of gas injection ports provided at a predetermined diameter and a predetermined pitch on a horizontal attitude plane having an area larger than the substrate area. A method of cooling a substrate, wherein the substrate is floated by air flow and cooled by air flow.
【請求項2】気流浮上兼冷却テーブル上の基板の温度が
設定温度又はそれ以下に達した後、次工程へ基板を移載
することを特徴とする請求項1に記載の基板の冷却方
法。
2. The method for cooling a substrate according to claim 1, wherein the substrate is transferred to a next step after the temperature of the substrate on the airflow floating / cooling table reaches a set temperature or lower.
【請求項3】次工程に基板の存在が無いことを確認後、
気流浮上兼冷却テーブル上の基板を次工程へ移載するこ
とを特徴とする請求項1又は2に記載の基板の冷却方
法。
3. After confirming that there is no substrate in the next step,
3. The method for cooling a substrate according to claim 1, wherein the substrate on the airflow floating and cooling table is transferred to a next step.
【請求項4】気流浮上兼冷却テーブルの気体噴射口配列
として、少なくとも基板搬送方向の前後周辺部に対応す
る領域には気流浮上兼冷却テーブル中央部に向かって傾
斜する噴射口を設け、基板中央部では上方に向かう垂直
噴射口を設け、噴射を制御することにより、気流噴射の
方向を変化させ基板を揺動させることを特徴とする請求
項1、2又は3に記載の基板の冷却方法。
4. An arrangement of gas injection ports for the airflow floating and cooling table, wherein at least a region corresponding to the front and rear peripheral portions in the substrate transport direction is provided with an injection port inclined toward the airflow floating and cooling table center. 4. The method of cooling a substrate according to claim 1, wherein a vertical injection port is provided in an upper part, and the direction of the airflow injection is changed to swing the substrate by controlling the injection.
【請求項5】気流浮上兼冷却テーブル全体を少なくとも
基板の搬送方向の前後に傾斜させることにより基板の自
重と浮上力で基板を揺動させることを特徴とする請求項
1、2又は3に記載の基板の冷却方法。
5. The substrate according to claim 1, wherein the substrate is swung by its own weight and a levitation force by inclining the entire airflow floating / cooling table at least back and forth in the transport direction of the substrate. Substrate cooling method.
【請求項6】基板面積よりも大きい面積を有する水平姿
勢の平面に所定径、所定ピッチで配設された複数の気体
噴射口を有する中空体のテーブルからなることを特徴と
する、基板の冷却装置
6. A cooling device for a substrate, comprising: a table of a hollow body having a plurality of gas injection ports arranged at a predetermined diameter and a predetermined pitch on a horizontal attitude plane having an area larger than the substrate area. apparatus
【請求項7】気流浮上兼冷却するテーブル上の気体噴射
口配列として、少なくとも基板搬送方向の前後周辺部に
対応する領域には気流浮上兼冷却するテーブル中央部に
向かって傾斜する噴射口を設け、基板中央部では上方に
向かう垂直口を設けることを特徴とする請求項6に記載
の基板の冷却装置。
7. An array of gas injection ports on a table for airflow floating and cooling, which is provided at least in an area corresponding to the front and rear peripheral portions in the substrate transport direction, with injection ports inclined toward the center of the table for airflow floating and cooling. 7. The cooling device for a substrate according to claim 6, wherein a vertical opening directed upward is provided at a central portion of the substrate.
【請求項8】気流浮上兼冷却するテーブル全体を少なく
とも基板の搬送方向の前後に傾斜させる機構を設けたこ
とを特徴とする請求項6に記載の基板の冷却装置。
8. The apparatus for cooling a substrate according to claim 6, wherein a mechanism is provided for inclining the entire table for floating and cooling the airflow at least in the forward and backward directions in the direction of transport of the substrate.
JP2000174624A 2000-06-12 2000-06-12 Substrate cooling method and apparatus Expired - Fee Related JP3955937B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000174624A JP3955937B2 (en) 2000-06-12 2000-06-12 Substrate cooling method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000174624A JP3955937B2 (en) 2000-06-12 2000-06-12 Substrate cooling method and apparatus

Publications (2)

Publication Number Publication Date
JP2001358206A true JP2001358206A (en) 2001-12-26
JP3955937B2 JP3955937B2 (en) 2007-08-08

Family

ID=18676622

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000174624A Expired - Fee Related JP3955937B2 (en) 2000-06-12 2000-06-12 Substrate cooling method and apparatus

Country Status (1)

Country Link
JP (1) JP3955937B2 (en)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003340697A (en) * 2002-05-28 2003-12-02 Nakamura Tome Precision Ind Co Ltd Method and device for machining side surfaces of rigid brittle plate
JP2005308922A (en) * 2004-04-20 2005-11-04 Koyo Thermo System Kk Display panel cooling device
EP1577235A3 (en) * 2004-03-16 2006-08-23 Central Glass Company, Limited Method and apparatus for transferring glass sheets to predetermined positions
JP2008273729A (en) * 2007-05-07 2008-11-13 Myotoku Ltd Floating unit
JP2009080042A (en) * 2007-09-26 2009-04-16 Oht Inc Circuit pattern inspection device
JP2009302122A (en) * 2008-06-10 2009-12-24 Tokyo Ohka Kogyo Co Ltd Coating device, and coating method
JP2010003881A (en) * 2008-06-20 2010-01-07 Toppan Printing Co Ltd Substrate treatment apparatus
US7645111B2 (en) 2002-11-05 2010-01-12 Central Glass Company, Limited System for putting glass plates to target positions
US7758340B2 (en) 2006-01-06 2010-07-20 Tokyo Electron Limited Heating device and heating method
JP2010179985A (en) * 2009-02-03 2010-08-19 Wacom R & D Corp Levitation conveying apparatus and levitation conveying method
JP2012136340A (en) * 2010-12-27 2012-07-19 Taesung Engineering Co Ltd Air supply device
KR20130097843A (en) * 2012-02-27 2013-09-04 주성엔지니어링(주) Transferring apparatus for boards and controlling method for the same
CN103848211A (en) * 2012-12-04 2014-06-11 浚丰太阳能(江苏)有限公司 Lifting cooling assembly line unit for photovoltaic module
CN106587582A (en) * 2016-12-01 2017-04-26 武汉华星光电技术有限公司 Improving method for micro concave of glass pane surface caused by rapid thermal annealing
CN108349668A (en) * 2015-11-17 2018-07-31 旭硝子株式会社 The method for carrying of lamellar body, the manufacturing method of device and glass thin plate body product
CN108726861A (en) * 2018-09-03 2018-11-02 上海光和光学制造大丰有限公司 A kind of GPS glass production cooling devices

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103771133A (en) * 2014-01-23 2014-05-07 南通剑桥输送设备有限公司 Height adjustable pneumatic transmission device

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003340697A (en) * 2002-05-28 2003-12-02 Nakamura Tome Precision Ind Co Ltd Method and device for machining side surfaces of rigid brittle plate
US7645111B2 (en) 2002-11-05 2010-01-12 Central Glass Company, Limited System for putting glass plates to target positions
EP1577235A3 (en) * 2004-03-16 2006-08-23 Central Glass Company, Limited Method and apparatus for transferring glass sheets to predetermined positions
JP2005308922A (en) * 2004-04-20 2005-11-04 Koyo Thermo System Kk Display panel cooling device
JP4639628B2 (en) * 2004-04-20 2011-02-23 光洋サーモシステム株式会社 Display panel cooling system
US7758340B2 (en) 2006-01-06 2010-07-20 Tokyo Electron Limited Heating device and heating method
JP2008273729A (en) * 2007-05-07 2008-11-13 Myotoku Ltd Floating unit
JP2009080042A (en) * 2007-09-26 2009-04-16 Oht Inc Circuit pattern inspection device
JP2009302122A (en) * 2008-06-10 2009-12-24 Tokyo Ohka Kogyo Co Ltd Coating device, and coating method
JP2010003881A (en) * 2008-06-20 2010-01-07 Toppan Printing Co Ltd Substrate treatment apparatus
JP2010179985A (en) * 2009-02-03 2010-08-19 Wacom R & D Corp Levitation conveying apparatus and levitation conveying method
JP2012136340A (en) * 2010-12-27 2012-07-19 Taesung Engineering Co Ltd Air supply device
KR20130097843A (en) * 2012-02-27 2013-09-04 주성엔지니어링(주) Transferring apparatus for boards and controlling method for the same
KR101913300B1 (en) * 2012-02-27 2018-10-30 주성엔지니어링(주) Transferring Apparatus for Boards and Controlling Method for the same
CN103848211A (en) * 2012-12-04 2014-06-11 浚丰太阳能(江苏)有限公司 Lifting cooling assembly line unit for photovoltaic module
CN108349668A (en) * 2015-11-17 2018-07-31 旭硝子株式会社 The method for carrying of lamellar body, the manufacturing method of device and glass thin plate body product
CN106587582A (en) * 2016-12-01 2017-04-26 武汉华星光电技术有限公司 Improving method for micro concave of glass pane surface caused by rapid thermal annealing
CN108726861A (en) * 2018-09-03 2018-11-02 上海光和光学制造大丰有限公司 A kind of GPS glass production cooling devices
CN108726861B (en) * 2018-09-03 2024-03-12 上海光和光学制造大丰有限公司 Glass production cooling device for GPS

Also Published As

Publication number Publication date
JP3955937B2 (en) 2007-08-08

Similar Documents

Publication Publication Date Title
JP2001358206A (en) Method and apparatus for cooling board
JP4272230B2 (en) Vacuum dryer
JP4372182B2 (en) Substrate support mechanism, reduced-pressure drying apparatus, and substrate processing apparatus
JP4384686B2 (en) Normal pressure drying apparatus, substrate processing apparatus, and substrate processing method
JP2000128346A (en) Floating device, floating carrier and heat treatment device
JP2006019396A (en) Substrate processing device
JP2011056335A (en) Apparatus for pre-drying and method of pre-drying
JP2011124342A (en) Substrate processing device, substrate processing method, and recording medium recording program for implementing the substrate processing method
JP2001196438A (en) Apparatus for conveying thin plate-like material
JP5063712B2 (en) Substrate processing apparatus and substrate processing method
JP4638931B2 (en) Substrate processing equipment
JP2001233452A (en) Constant point carrying device for thin plate
JP2000327355A (en) Ring for supporting glass plate
JP4804567B2 (en) Substrate floating device
JP2010159164A (en) Vacuum processing device, vacuum processing system and processing method
JP3274089B2 (en) Hybrid type heat treatment equipment
JP5372695B2 (en) Substrate processing equipment
JPH11157859A (en) Cooling method of glass panel and apparatus therefor
JP3461434B2 (en) Glass substrate cooling device
JPH0891623A (en) Method and device for carrying substrate
KR20110066864A (en) Substrate processing apparatus, substrate processing method and recording medium storing program for executing the substrate processing method
JP4311992B2 (en) Substrate transfer device
JP2000128345A (en) Gas floating carrier, heat treatment device and heat treatment method
JP4360545B2 (en) Continuous heat treatment furnace
KR20140085947A (en) Substrate processing apparatus, and substrate processing method

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050930

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20051108

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060106

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060220

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060425

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060621

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060626

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060911

A072 Dismissal of procedure

Free format text: JAPANESE INTERMEDIATE CODE: A073

Effective date: 20061214

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070111

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070309

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20070410

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20070412

R150 Certificate of patent (=grant) or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100518

Year of fee payment: 3

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110518

Year of fee payment: 4

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120518

Year of fee payment: 5

LAPS Cancellation because of no payment of annual fees