JP2001319910A5 - - Google Patents

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Publication number
JP2001319910A5
JP2001319910A5 JP2000135224A JP2000135224A JP2001319910A5 JP 2001319910 A5 JP2001319910 A5 JP 2001319910A5 JP 2000135224 A JP2000135224 A JP 2000135224A JP 2000135224 A JP2000135224 A JP 2000135224A JP 2001319910 A5 JP2001319910 A5 JP 2001319910A5
Authority
JP
Japan
Prior art keywords
processed
wraparound
peripheral edge
treatment liquid
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000135224A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001319910A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000135224A priority Critical patent/JP2001319910A/ja
Priority claimed from JP2000135224A external-priority patent/JP2001319910A/ja
Priority to US09/849,880 priority patent/US6827814B2/en
Priority to TW090110840A priority patent/TWI263259B/zh
Priority to KR1020010024792A priority patent/KR100787067B1/ko
Publication of JP2001319910A publication Critical patent/JP2001319910A/ja
Publication of JP2001319910A5 publication Critical patent/JP2001319910A5/ja
Pending legal-status Critical Current

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JP2000135224A 2000-05-08 2000-05-08 液処理装置 Pending JP2001319910A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2000135224A JP2001319910A (ja) 2000-05-08 2000-05-08 液処理装置
US09/849,880 US6827814B2 (en) 2000-05-08 2001-05-04 Processing apparatus, processing system and processing method
TW090110840A TWI263259B (en) 2000-05-08 2001-05-07 Processing apparatus, processing system and processing method
KR1020010024792A KR100787067B1 (ko) 2000-05-08 2001-05-08 처리 장치, 처리 시스템 및 처리 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000135224A JP2001319910A (ja) 2000-05-08 2000-05-08 液処理装置

Publications (2)

Publication Number Publication Date
JP2001319910A JP2001319910A (ja) 2001-11-16
JP2001319910A5 true JP2001319910A5 (enExample) 2007-06-21

Family

ID=18643341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000135224A Pending JP2001319910A (ja) 2000-05-08 2000-05-08 液処理装置

Country Status (1)

Country Link
JP (1) JP2001319910A (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7531039B2 (en) 2002-09-25 2009-05-12 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus and substrate processing system
TWI373804B (en) * 2007-07-13 2012-10-01 Lam Res Ag Apparatus and method for wet treatment of disc-like articles
TWI348934B (en) * 2007-08-30 2011-09-21 Lam Res Ag Apparatus for wet treatment of plate-like articles
JP5098964B2 (ja) * 2008-11-13 2012-12-12 東京エレクトロン株式会社 ウエハの洗浄方法及び記憶媒体
US9748120B2 (en) 2013-07-01 2017-08-29 Lam Research Ag Apparatus for liquid treatment of disc-shaped articles and heating system for use in such apparatus
JP6246749B2 (ja) * 2015-01-28 2017-12-13 東京エレクトロン株式会社 ウエットエッチング方法、基板液処理装置および記憶媒体
WO2016194285A1 (ja) * 2015-06-03 2016-12-08 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置、膜形成ユニット、基板処理方法および膜形成方法
JP6618334B2 (ja) * 2015-06-03 2019-12-11 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置、膜形成ユニット、基板処理方法および膜形成方法
JP6603487B2 (ja) 2015-06-22 2019-11-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP6737436B2 (ja) * 2015-11-10 2020-08-12 株式会社Ｓｃｒｅｅｎホールディングス 膜処理ユニットおよび基板処理装置
JP6503279B2 (ja) 2015-11-10 2019-04-17 株式会社Ｓｃｒｅｅｎホールディングス 膜処理ユニット、基板処理装置および基板処理方法
JP2017098367A (ja) * 2015-11-20 2017-06-01 東京エレクトロン株式会社 基板処理方法
JP7202960B2 (ja) * 2019-04-16 2023-01-12 東京エレクトロン株式会社 塗布膜形成方法及び塗布膜形成装置
JP7779688B2 (ja) * 2021-09-24 2025-12-03 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法、および、基板処理装置
WO2023204017A1 (ja) * 2022-04-18 2023-10-26 東京エレクトロン株式会社 基板処理装置、および基板処理方法

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