JP2001279485A - Solder plating method for printed circuit board - Google Patents

Solder plating method for printed circuit board

Info

Publication number
JP2001279485A
JP2001279485A JP2000091066A JP2000091066A JP2001279485A JP 2001279485 A JP2001279485 A JP 2001279485A JP 2000091066 A JP2000091066 A JP 2000091066A JP 2000091066 A JP2000091066 A JP 2000091066A JP 2001279485 A JP2001279485 A JP 2001279485A
Authority
JP
Japan
Prior art keywords
solder
solder plating
plating
printed circuit
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000091066A
Other languages
Japanese (ja)
Other versions
JP3480828B2 (en
Inventor
Mikihiko Ishibashi
幹彦 石橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP2000091066A priority Critical patent/JP3480828B2/en
Publication of JP2001279485A publication Critical patent/JP2001279485A/en
Application granted granted Critical
Publication of JP3480828B2 publication Critical patent/JP3480828B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a solder plating method for a printed circuit board in which, in a printed circuit board having the two kinds of connecting uses for a solder packaging connecting terminal part and a contact point connecting terminal part, a shielding board is not required contact point connecting terminal part in a reflowing stage of solder packaging, and also a smooth surface can be maintained even after solder reflowing. SOLUTION: In this solder plating method for a printed circuit board, a solder plating solution in which the contains tin metal ions 10 to 100 g/L, lead metal ions 5 to 50 g/L, and organic acids 100 to 200 g/L, and solder plating is performed in such a manner that current density is controlled to 1/10 to 0.1 (A/dm2) of the concentration of the tin metal ions.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、半田実装接続端子部と
接点接続端子部が混在するプリント配線板において、接
続信頼性及び生産性に優れた半田メッキ処理方法に関す
るものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solder plating method which is excellent in connection reliability and productivity in a printed wiring board in which solder mounting connection terminals and contact connection terminals are mixed.

【0002】[0002]

【従来の技術】一般に、エポキシ樹脂プリント配線板、
フレキシブルプリント配線板等の硬質、又は軟質のプリ
ント配線板には、複数の電子部品を電気的に接続するた
め、接続端子部が設けられており、その接続方法や接続
用途が異なるものが混在することが多い。これらの接続
端子部は、接続の目的、用途に応じて表面処理が施され
るが、通常半田実装接続端子部には、スズ:鉛の含有量
が6:4の共晶半田メッキが、接点接続端子部には、光
沢ニッケルー硬質金メッキが最適であるとされている。
ところが、接続方法に合わせて表面処理を複数にする
と、メッキレジスト等の工程が増え、生産性の低下によ
るコスト増加となる。このためプリント配線板は、組立
て段階のみに使用されるような比較的抜き差しの少ない
接点接続端子部であれば、半田実装接続端子部の表面処
理を優先し、スズ:鉛の含有量が6:4の共晶半田メッ
キを用いることが多い。近年、半田実装技術の目覚しい
発達により、半田ペーストを印刷して電子部品を搭載
し、半田リフロー処理をする方法が一般的となってきて
いるが、このような半田実装方法で前記のプリント配線
板を処理すると以下のような問題点があった。即ち、半
田溶融温度以上で半田リフロー処理(通常、リフローピ
ーク温度200〜240℃で、1〜4秒処理)をするた
めに、接点接続端子部の共晶半田メッキも溶融し、接点
接続に要求される平滑性を阻害する場合があった。この
ため、このようなプリント配線板の半田実装には、接点
接続端子部に熱遮蔽板を設置し、半田メッキの溶融を防
いでいたが、生産性が低下し、半田リフロー条件の管理
も困難であった。
2. Description of the Related Art Generally, an epoxy resin printed wiring board,
A hard or soft printed wiring board such as a flexible printed wiring board is provided with a connection terminal portion for electrically connecting a plurality of electronic components, and ones having different connection methods and connection uses are mixed. Often. These connection terminals are subjected to surface treatment according to the purpose and use of the connection. Usually, however, the eutectic solder plating having a tin: lead content of 6: 4 is applied to the solder-mounted connection terminals. It is considered that bright nickel-hard gold plating is optimal for the connection terminal portion.
However, when a plurality of surface treatments are performed in accordance with the connection method, the number of steps for plating resist and the like increases, and the cost increases due to a decrease in productivity. For this reason, if the printed wiring board is a contact connection terminal part which is used only in the assembling stage and has relatively few insertion / removal, the surface treatment of the solder mounting connection terminal part is prioritized, and the tin: lead content is 6: 4, eutectic solder plating is often used. In recent years, due to the remarkable development of solder mounting technology, a method of printing an electronic component by printing a solder paste and performing a solder reflow process has become common. Has the following problems. That is, in order to perform a solder reflow treatment at a temperature higher than the solder melting temperature (usually, a treatment at a reflow peak temperature of 200 to 240 ° C. for 1 to 4 seconds), the eutectic solder plating of the contact connection terminal portion is also melted and required for contact connection. In some cases, the resulting smoothness may be impaired. For this reason, when soldering such a printed wiring board, a heat shield plate was installed at the contact connection terminal part to prevent melting of the solder plating, but the productivity decreased and it was difficult to manage the solder reflow conditions. Met.

【0003】[0003]

【発明が解決しようとする課題】本発明は、半田実装接
続端子部と接点接続端子部の2種類の接続用途を有する
プリント配線板において、半田実装のリフロー処理工程
で接点接続端子部上に遮蔽板を必要せず、半田リフロー
後も平滑な表面状態を維持できるプリント配線板の半田
メッキ処理方法を提供ものである。
SUMMARY OF THE INVENTION The present invention relates to a printed wiring board having two kinds of connection purposes, a solder mounting connection terminal portion and a contact connection terminal portion, which is shielded on the contact connection terminal portion in a solder mounting reflow process. It is an object of the present invention to provide a method for solder plating a printed wiring board which does not require a board and can maintain a smooth surface state even after solder reflow.

【0004】[0004]

【課題を解決するための手段】本発明は、スズ金属イオ
ン濃度が10〜100g/L、鉛金属イオン濃度が5〜
50g/L、有機酸濃度が100〜200g/Lからな
る半田メッキ液を用いて、電流密度がスズ金属イオン濃
度値の1/10〜0.1(A/dm2)でメッキ処理
し、半田メッキ膜を形成することを特徴とするプリント
配線板の半田メッキ処理方法で、特に半田メッキ膜の厚
さは1〜4μmである。
According to the present invention, a tin metal ion concentration is 10 to 100 g / L, and a lead metal ion concentration is 5 to 100 g / L.
Using a solder plating solution having a concentration of 50 g / L and an organic acid concentration of 100 to 200 g / L, plating with a current density of 1/10 to 0.1 (A / dm 2 ) of the tin metal ion concentration value, A method for solder plating a printed wiring board, wherein a plating film is formed. In particular, the thickness of the solder plating film is 1 to 4 μm.

【0005】[0005]

【発明の実施の形態】以下に、本発明について説明す
る。本発明に用いるスズ金属イオン濃度が10〜100
g/L、鉛金属イオン濃度が5〜50g/L、有機酸1
00〜200g/Lを必須成分とする半田メッキ液に
は、必要によりその他の成分として、添加剤、光沢剤等
を含んでもよい。スズ金属イオン濃度としては、10〜
100g/Lが好ましく、この範囲を外れると析出皮膜
の光沢、物性、メッキ液の寿命が著しく低下するため好
ましくない。プリント配線板のようなパネルにメッキ処
理をする場合には、メッキ浴槽の外へのメッキ液の持ち
出しによるランニングコスト、電流分布によるメッキ膜
の厚さのバラツキを考慮すると、スズ金属イオン濃度
は、好ましくは15〜60g/Lが望ましい。これに対
し、鉛金属イオン濃度は、より好ましくは7〜30g/
Lが望ましく、この範囲を外れると共晶半田の析出比率
を著しく外れるため好ましくない。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below. The tin metal ion concentration used in the present invention is 10 to 100.
g / L, lead metal ion concentration 5-50 g / L, organic acid 1
The solder plating solution having an essential component of 00 to 200 g / L may contain an additive, a brightener, and the like as other components as necessary. The tin metal ion concentration is
100 g / L is preferable, and if it is out of this range, the gloss and physical properties of the deposited film, and the life of the plating solution are significantly reduced, which is not preferable. When plating a panel such as a printed wiring board, considering the running cost due to the removal of the plating solution out of the plating bath and the variation in the thickness of the plating film due to the current distribution, the tin metal ion concentration is Preferably, it is 15 to 60 g / L. On the other hand, the lead metal ion concentration is more preferably 7 to 30 g /
L is desirable, and if it is out of this range, the precipitation ratio of the eutectic solder is remarkably deviated.

【0006】有機酸は、アルカノールスルホン酸等の有
機酸であり、有機酸濃度は100〜200g/Lが好ま
しい。この範囲を外れると上記スズ金属イオン濃度、鉛
金属イオン濃度が不安定になり好ましくない。添加剤、
光沢剤としては、一般にノニオン系界面活性剤、有機ア
ミン、アルデヒド、ケトン、アルコール類等があるが、
一般にスズ:鉛の含有量が6:4の共晶半田メッキ液用
に市販されているものであれば、特に限定されない。前
記半田メッキ液を用いて半田メッキ処理する場合の電流
密度としては、スズ金属イオン濃度値の1/10〜0.
1(A/dm2)が好ましい。この範囲を外れると、リ
フロー後のメッキ表面に凹凸を生じ、又は十分な光沢が
得られないいため好ましくない。光沢剤を含む半田メッ
キ液の場合、各光沢剤の光沢範囲により、最適の電流密
度を設定すればよい。本発明でのスズ金属イオン濃度値
とは、使用時のメッキ液中のスズ金属イオン濃度の値を
指す。本発明に用いるメッキ液を用いて、前記電流密度
でメッキ処理することにより、得られる半田メッキの析
出粒子は、メッキ液中の水の電気分解が発生しにくいた
めに、水素原子のメッキ皮膜中の共析がなく、スズと鉛
粒子からなる安定した結晶が得られる。得られるメッキ
膜の厚さは、半田リフローの処理条件であるピーク温度
200〜240℃で1〜4秒間の処理において、熱によ
る半田溶融時の表面張力の流動性を考慮し、1〜4μm
に設定することが望ましい。これにより半田リフロー後
も平滑な表面状態のメッキ膜を得ることができる。1〜
4μmのメッキ膜の厚さは、2〜6m/分の揺動又は噴
流攪拌を行いながら、上記メッキ液中で、上記処理電流
で0.2〜80分処理を行うことにより得ることができ
る。
[0006] The organic acid is an organic acid such as alkanolsulfonic acid, and the organic acid concentration is preferably 100 to 200 g / L. Outside of this range, the tin metal ion concentration and the lead metal ion concentration become unstable, which is not preferable. Additive,
As the brightener, there are generally nonionic surfactants, organic amines, aldehydes, ketones, alcohols, etc.
Generally, it is not particularly limited as long as it is commercially available for a eutectic solder plating solution having a tin: lead content of 6: 4. When the solder plating is performed using the solder plating solution, the current density is 1/10 to 0. 0 of the tin metal ion concentration value.
1 (A / dm 2 ) is preferred. Outside this range, unevenness is generated on the plated surface after reflow, or sufficient gloss cannot be obtained, which is not preferable. In the case of a solder plating solution containing a brightener, an optimum current density may be set according to the gloss range of each brightener. The tin metal ion concentration value in the present invention refers to a tin metal ion concentration value in a plating solution during use. By using the plating solution used in the present invention and performing plating treatment at the current density, the resulting precipitated particles of solder plating are unlikely to cause electrolysis of water in the plating solution, so that the hydrogen atom plating film And a stable crystal comprising tin and lead particles is obtained. The thickness of the plating film to be obtained is 1 to 4 μm in consideration of the surface tension fluidity when the solder is melted by heat in the processing at a peak temperature of 200 to 240 ° C. for 1 to 4 seconds, which is the processing condition of solder reflow.
It is desirable to set to. As a result, a plated film having a smooth surface state can be obtained even after solder reflow. 1 to
The thickness of the plating film of 4 μm can be obtained by performing the treatment at the treatment current in the plating solution for 0.2 to 80 minutes while rocking or jet stirring with 2 to 6 m / min.

【0007】本発明を、以下実施例で具体的に説明す
る。表1に示す薬液濃度の半田メッキ液を用いて、表1
の電流密度条件でフレキシブルプリント配線板を処理
し、3〜4μmの半田メッキ膜を形成し、ピーク温度2
40℃で、4秒間の半田リフロー後の半田メッキ表面の
外観の観察をした。なお、用いた有機酸は、アルカノー
ルスルホン酸である。 ・半田リフロー後、 半田メッキの表面に凹凸の発生のないもの:○ 半田メッキの表面の一部に凹凸の発生が認められるも
の:△ 半田メッキの全面に凹凸が認められるもの:× で表し
た。 この結果から、スズ金属イオン濃度値の1/10の電流
密度(A/dm2)で処理された半田メッキ膜は、半田
リフロー後のメッキ膜表面の凹凸の発生がないことが分
かる。
[0007] The present invention will be specifically described with reference to the following examples. Using the solder plating solution having the chemical concentration shown in Table 1,
The flexible printed wiring board is processed under the current density conditions described above, a solder plating film of 3 to 4 μm is formed, and the peak temperature is 2
The appearance of the solder plating surface was observed after solder reflow at 40 ° C. for 4 seconds. The organic acid used was alkanolsulfonic acid.・ After solder reflow, no unevenness on the solder plating surface: ○ Some unevenness on the solder plating surface: △ Unevenness on the entire surface of the solder plating: × . From this result, it can be seen that the solder plating film treated at a current density (A / dm 2 ) of 1/10 of the tin metal ion concentration value has no unevenness on the plating film surface after the solder reflow.

【表1】 [Table 1]

【0008】[0008]

【発明の効果】本発明は、半田実装接続端子部と接点接
続端子部の接続用途を有するプリント配線板において、
半田実装の半田リフロー処理工程で接点接続端子部上に
半田メッキの溶融を遮蔽する遮蔽板を用いなくとも、半
田リフロー後も平滑な表面状態のメッキ膜を有するプリ
ント配線板の半田メッキ処理方法であり、接続信頼性、
生産性に優れている。
According to the present invention, there is provided a printed wiring board having a connection application between a solder mounting connection terminal portion and a contact connection terminal portion.
Even without using a shielding plate to shield the melting of the solder plating on the contact connection terminal part in the solder reflow processing step of solder mounting, the solder plating method of the printed wiring board having a plating film with a smooth surface state even after solder reflow Yes, connection reliability,
Excellent productivity.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 スズ金属イオン濃度が10〜100g/
L、鉛金属イオン濃度が5〜50g/L、及び有機酸濃
度100〜200g/Lからなる半田メッキ液を用い
て、電流密度がスズ金属イオン濃度値の1/10〜0.
1(A/dm2)でメッキ処理し、半田メッキ膜を形成
することを特徴とするプリント配線板の半田メッキ処理
方法。
1. The method according to claim 1, wherein the tin metal ion concentration is 10 to 100 g /
L, using a solder plating solution having a lead metal ion concentration of 5 to 50 g / L and an organic acid concentration of 100 to 200 g / L, the current density is 1/10 to 0.1.
A solder plating method for a printed wiring board, wherein a plating process is performed at 1 (A / dm 2 ) to form a solder plating film.
【請求項2】 半田メッキ膜が、厚さ1〜4μmである
請求項1記載のプリント配線板の半田メッキ処理方法。
2. The method according to claim 1, wherein the thickness of the solder plating film is 1 to 4 μm.
JP2000091066A 2000-03-29 2000-03-29 Solder plating method for printed wiring boards Expired - Fee Related JP3480828B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000091066A JP3480828B2 (en) 2000-03-29 2000-03-29 Solder plating method for printed wiring boards

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000091066A JP3480828B2 (en) 2000-03-29 2000-03-29 Solder plating method for printed wiring boards

Publications (2)

Publication Number Publication Date
JP2001279485A true JP2001279485A (en) 2001-10-10
JP3480828B2 JP3480828B2 (en) 2003-12-22

Family

ID=18606578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000091066A Expired - Fee Related JP3480828B2 (en) 2000-03-29 2000-03-29 Solder plating method for printed wiring boards

Country Status (1)

Country Link
JP (1) JP3480828B2 (en)

Also Published As

Publication number Publication date
JP3480828B2 (en) 2003-12-22

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