JP2001271198A - Copper-coated aluminum wire - Google Patents
Copper-coated aluminum wireInfo
- Publication number
- JP2001271198A JP2001271198A JP2000085100A JP2000085100A JP2001271198A JP 2001271198 A JP2001271198 A JP 2001271198A JP 2000085100 A JP2000085100 A JP 2000085100A JP 2000085100 A JP2000085100 A JP 2000085100A JP 2001271198 A JP2001271198 A JP 2001271198A
- Authority
- JP
- Japan
- Prior art keywords
- copper
- aluminum wire
- plating layer
- copper plating
- coated aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/028—Including graded layers in composition or in physical properties, e.g. density, porosity, grain size
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Non-Insulated Conductors (AREA)
- Metal Extraction Processes (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、電子機器に用いら
れるコイル等の線材に関し、更に詳しくは、アルミニウ
ムまたはアルミニウム合金を主導体として用い、この主
導体の外周に銅を被覆した銅被覆アルミニウム線に関す
るものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wire such as a coil used in electronic equipment, and more particularly, to a copper-coated aluminum wire in which aluminum or an aluminum alloy is used as a main conductor and the outer periphery of the main conductor is coated with copper. It is about.
【0002】[0002]
【従来の技術】近時、電子機器あるいは電子部品の軽薄
短小化に伴い、これらに用いられているコイル部品等の
導体においても細径化がなされ、また導体の軽量化要求
に対しては比重が銅の1/3以下であるアルミニウムま
たはアルミニウム合金導体(以下、アルミ導体と略記す
る)が採用されてきている。2. Description of the Related Art In recent years, as electronic devices and electronic components have become lighter, thinner and smaller, conductors such as coil components used in these devices have also been reduced in diameter. Aluminum or aluminum alloy conductor (hereinafter, abbreviated as aluminum conductor) whose copper content is 1/3 or less of copper.
【0003】しかし、アルミ導体は電気化学的に卑な電
位を有しており、例えば引き抜き加工等の塑性加工によ
り形成された新しい金属面が空気に触れると瞬時に表面
が酸化されるため、はんだ付けが困難な金属材料であ
る。アルミ導体が電子機器部品の線材として使用される
場合、アルミ導体を電子機器部品の端子と接続するに際
しては、加熱アルカリ液で表面の酸化皮膜を溶かしてか
ら酸で中和し、湯洗後、更に超音波洗浄を行ってからア
ルミはんだで接続しなければならず、端子接続作業が複
雑であった。また、アルミ導体自身の機械的強度不足も
あって、接続個所に対する十分な信頼性を保持させるに
は特別な接続技術を必要とした。However, an aluminum conductor has an electrochemically low electric potential. For example, when a new metal surface formed by plastic working such as drawing is exposed to air, the surface is instantaneously oxidized. It is a metal material that is difficult to attach. When an aluminum conductor is used as a wire for an electronic device component, when connecting the aluminum conductor to the terminal of the electronic device component, dissolve the oxide film on the surface with a heated alkaline solution, neutralize with an acid, wash with hot water, Furthermore, after ultrasonic cleaning, it was necessary to connect with aluminum solder, and the terminal connection work was complicated. In addition, due to the lack of mechanical strength of the aluminum conductor itself, a special connection technique was required to maintain sufficient reliability at the connection points.
【0004】このようにアルミ導体は端子接続の問題が
あるため、アルミ導体より若干比重が大きくなるが、ア
ルミ導体の外周に亜鉛薄膜を形成し、その外周に電解銅
めっきを連続被覆させ、所望のサイズに引き抜き加工を
施した銅被覆アルミニウム線がはんだ付け可能な軽量化
電線として上市されている。As described above, since the aluminum conductor has a problem of terminal connection, its specific gravity is slightly larger than that of the aluminum conductor. However, a zinc thin film is formed on the outer periphery of the aluminum conductor, and the outer periphery is continuously coated with electrolytic copper plating. A copper-coated aluminum wire that has been subjected to a drawing process to the size described above has been put on the market as a lighter electric wire that can be soldered.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、上述し
た構造の銅被覆アルミニウム線においては、電解銅めっ
きにより得られた銅めっき層が無光沢を呈しているもの
は表面の凹凸が大きく、引き抜き加工時にダイへのスト
レス(抵抗)が局所的に集中して微細なクラックとな
り、コイル巻線時等で所望の径に調整する際、アルミ導
体素地が露出し易い。反面、銅めっき層が光沢を呈して
いるものは表面の凹凸がないものの、銅めっき層の銅皮
膜が硬いことから、引き抜き加工時にダイへのストレス
が大きく微細なクラックとなる。また前記銅皮膜には延
性がないことから、段ロール・キャプスタン等の曲率
(例えば50mm)巻き付けでも微細なクラックが生じ
易く、コイル巻線時等で所望の径に調整する際、アルミ
導体素地が露出し易い。これら表面にアルミ導体が露出
したものは、はんだ付け接合に於いて、その部位のみは
んだが濡れず、十分な信頼性が保持できないという問題
を引き起こしてしまう。However, in the case of the copper-coated aluminum wire having the above-mentioned structure, a copper-plated layer obtained by electrolytic copper plating having a matte surface has large surface irregularities, and the copper-coated aluminum wire has a large surface unevenness. The stress (resistance) on the die is locally concentrated to form fine cracks, and the aluminum conductor base is easily exposed when adjusting to a desired diameter at the time of coil winding or the like. On the other hand, those having a glossy copper plating layer have no surface irregularities, but the copper coating of the copper plating layer is hard, so that a large stress is applied to the die at the time of the drawing process, resulting in fine cracks. In addition, since the copper film has no ductility, fine cracks are liable to be generated even when winding a step roll, a capstan, or the like with a curvature (for example, 50 mm). Is easily exposed. When the aluminum conductor is exposed on these surfaces, the solder is not wetted only at that portion in the soldering joint, causing a problem that sufficient reliability cannot be maintained.
【0006】本発明は、上記従来技術が有する各種問題
点を解決するためになされたものであり、引き抜き加工
時に銅皮膜が受けるストレスによる微細なクラックの発
生を防止し、コイル巻線時にアルミ導体が露出し易いと
いう問題を解決し、はんだ付け接合において十分な信頼
性が得られるとともに、軽薄短小化に好適な銅被覆アル
ミニウム線を提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned various problems of the prior art, and prevents the occurrence of minute cracks due to the stress applied to a copper film during drawing, and prevents the occurrence of aluminum conductors during coil winding. It is an object of the present invention to provide a copper-coated aluminum wire that can solve the problem that the aluminum wire is easily exposed and that can obtain sufficient reliability in soldering and joining and that is suitable for reduction in size and weight.
【0007】[0007]
【課題を解決するための手段】第1の観点として本発明
は、アルミニウムまたはアルミニウム合金からなる導体
(以下、アルミ導体と略記する)(1) の表面上に亜鉛置
換によって形成させた亜鉛薄膜(2) の外周に、電解銅め
っきによって銅めっき層(3) を連続被覆させた銅被覆ア
ルミニウム線であって、前記銅めっき層(3) が無光沢銅
めっき層(3a)と半光沢銅めっき層(3b)からなる銅被覆ア
ルミニウム線にある。前記アルミ導体(1) としては、ア
ルミニウム純度が99.0%以上の展伸用アルミニウ
ム、またはアルミニウム純度が99%以上のアルミニウ
ム合金、例えばAl−Mg合金、Al−Mg−Si合金
が用いられる。なお、アルミ導体(1) の外径は特に限定
されないが、φ1.00mm以下が好ましく、更に好ま
しくは0.10mm以上、0.90mm以下である。As a first aspect, the present invention relates to a zinc thin film (1) formed by zinc substitution on the surface of a conductor made of aluminum or aluminum alloy (hereinafter abbreviated as aluminum conductor) (1). 2) A copper-coated aluminum wire in which a copper plating layer (3) is continuously coated by electrolytic copper plating on an outer periphery of the copper-coated aluminum wire, wherein the copper plating layer (3) has a matte copper plating layer (3a) and a semi-bright copper plating. In the copper-coated aluminum wire consisting of layer (3b). As the aluminum conductor (1), wrought aluminum having an aluminum purity of 99.0% or more, or an aluminum alloy having an aluminum purity of 99% or more, for example, an Al-Mg alloy or an Al-Mg-Si alloy is used. The outer diameter of the aluminum conductor (1) is not particularly limited, but is preferably φ1.00 mm or less, more preferably 0.10 mm or more and 0.90 mm or less.
【0008】上記第1の観点の銅被覆アルミニウム線で
は、銅めっき層が無光沢銅めっき層と半光沢銅めっき層
から構成されているので、銅皮膜表面の凹凸が無光沢銅
めっき層と比較すると無い。そのため、引き抜き加工時
に銅皮膜が受けるストレスが緩和され、微細なクラック
の発生を防止できる。そして、コイル巻線時にアルミ導
体が露出しなくなる。従って、はんだ付け接合において
十分な信頼性が得られる。また、銅めっき層(3) の硬さ
をビッカース硬度計にて測定したところ、平均で、無光
沢銅めっき層が80Hv、半光沢銅めっき層が100H
v、光沢銅めっき層が150Hvであり、銅めっき層表
面の外観と硬度には、かなり相関性があることが分かっ
た。[0008] In the copper-coated aluminum wire of the first aspect, the copper plating layer is composed of a matte copper plating layer and a semi-glossy copper plating layer. No. Therefore, the stress applied to the copper film during the drawing process is reduced, and the occurrence of fine cracks can be prevented. Then, the aluminum conductor is not exposed during coil winding. Therefore, sufficient reliability can be obtained in soldering. When the hardness of the copper plating layer (3) was measured by a Vickers hardness tester, on average, the matte copper plating layer was 80 Hv, and the semi-gloss copper plating layer was 100 Hv.
v, the bright copper plating layer was 150 Hv, and it was found that there was considerable correlation between the appearance and hardness of the copper plating layer surface.
【0009】第2の観点として本発明は、前記半光沢銅
めっき層(3b)が、電解銅めっきの際にチオ尿素系添加
剤,ゼラチン系添加剤,或いはポリエチレングリコール
系添加剤の単独添加或いは併用添加により物性調整され
て形成されている銅被覆アルミニウム線にある。上記第
2の観点の銅被覆アルミニウム線では、前記半光沢銅め
っき層(3b)は、電解銅めっきの際にチオ尿素系添加剤等
の単独添加或いは併用添加により物性調整されて形成さ
れる。According to a second aspect of the present invention, the semi-bright copper plating layer (3b) is formed by adding a thiourea-based additive, a gelatin-based additive, or a polyethylene glycol-based additive alone during electrolytic copper plating. It is a copper-coated aluminum wire formed by adjusting the physical properties by adding it in combination. In the copper-coated aluminum wire according to the second aspect, the semi-bright copper plating layer (3b) is formed by adjusting the physical properties by adding a thiourea-based additive or the like alone or in combination during electrolytic copper plating.
【0010】第3の観点として本発明は、前記チオ尿素
系添加剤,ゼラチン系添加剤,或いはポリエチレングリ
コール系添加剤の添加量が10〜50ppmである銅被
覆アルミニウム線にある。上記第3の観点の銅被覆アル
ミニウム線では、前記チオ尿素系添加剤等の添加剤の添
加量を10〜50ppmとすることにより、特性のよい
半光沢銅めっき層が得られる。なお、更に好ましくは1
5〜40ppmである。According to a third aspect of the present invention, there is provided a copper-coated aluminum wire in which the amount of the thiourea-based additive, the gelatin-based additive or the polyethylene glycol-based additive is 10 to 50 ppm. In the copper-coated aluminum wire according to the third aspect, a semi-bright copper plating layer having good characteristics can be obtained by adjusting the amount of the additive such as the thiourea-based additive to 10 to 50 ppm. In addition, more preferably, 1
5 to 40 ppm.
【0011】第4の観点として本発明は、電解銅めっき
によって無光沢銅めっき層(3a)と半光沢銅めっき層(3b)
からなる銅めっき層(3) を連続被覆させた後、更に塑性
加工が施こされ、所定サイズに加工されている銅被覆ア
ルミニウム線にある。なお、塑性加工としては、冷間或
いは熱間の引き抜き加工(伸線加工)が通常用いられ
る。上記第4の観点の銅被覆アルミニウム線では、前記
第1から第3の観点の銅被覆アルミニウム線の銅皮膜表
面が半光沢であるため、更に塑性加工を施こし、所定サ
イズの銅被覆アルミニウム線に加工することが容易であ
るので、より軽量化に好適である。As a fourth aspect, the present invention provides a method for producing a matte copper plating layer (3a) and a semi-glossy copper plating layer (3b) by electrolytic copper plating.
After being continuously coated with a copper plating layer (3) made of, the copper-coated aluminum wire which has been further subjected to plastic working and processed to a predetermined size. As the plastic working, cold or hot drawing (drawing) is usually used. In the copper-coated aluminum wire according to the fourth aspect, since the surface of the copper coating of the copper-coated aluminum wire according to the first to third aspects is semi-glossy, the copper-coated aluminum wire having a predetermined size is further subjected to plastic working. Since it is easy to process the material, it is suitable for further weight reduction.
【0012】第5の観点として本発明は、前記第1から
第4の観点の銅被覆アルミニウム線の銅被覆率が20%
以下である銅被覆アルミニウム線にある。上記第5の観
点の銅被覆アルミニウム線は、前記第1から第4の観点
の銅被覆アルミニウム線の銅被覆率が20%以下である
ことによって、アルミ導体の持つ軽量化が十分維持さ
れ、且つ外周が銅皮膜であるため容易にはんだ付けが可
能となる。なお、銅被覆率が20%を超える線材に関し
ては、はんだ付けは容易であるものの銅の持つ比重から
軽量化には不向きであり、軽薄短小化には好適でない。According to a fifth aspect of the present invention, the copper-coated aluminum wire according to the first to fourth aspects has a copper coverage of 20%.
The following are the copper-coated aluminum wires. In the copper-coated aluminum wire according to the fifth aspect, since the copper-coated aluminum wire according to the first to fourth aspects has a copper coverage of 20% or less, the weight reduction of the aluminum conductor is sufficiently maintained, and Since the outer periphery is a copper film, soldering can be easily performed. It should be noted that a wire having a copper coverage of more than 20% is easy to solder, but is not suitable for reducing the weight due to the specific gravity of copper, and is not suitable for reducing the size and weight.
【0013】第6の観点として本発明は、前記第1から
第5の観点の銅被覆アルミニウム線の外周に、更に絶縁
被覆 (4)を施した銅被覆アルミニウム線にある。上記第
6の観点の銅被覆アルミニウム線では、前記第1から第
5の観点の銅被覆アルミニウム線の外周に絶縁被覆 (4)
を施すことによって、電子機器部品に用いられるコイル
等の線材として好適である。As a sixth aspect, the present invention resides in a copper-coated aluminum wire in which an insulation coating (4) is further provided on the outer periphery of the copper-coated aluminum wire according to the first to fifth aspects. In the copper-coated aluminum wire according to the sixth aspect, the outer periphery of the copper-coated aluminum wire according to the first to fifth aspects is covered with an insulating coating.
Is suitable as a wire material such as a coil used for electronic device parts.
【0014】[0014]
【発明の実施の形態】以下、本発明の内容を、図に示す
実施の形態により更に詳細に説明する。なお、これによ
り本発明が限定されるものではない。図1は本発明の銅
被覆アルミニウム線の一例を示す断面図である。また図
2は本発明の銅被覆アルミニウム線の他の例を示す断面
図であり、絶縁被覆を設けた銅被覆アルミニウム線であ
る。なお、比較例の銅被覆アルミニウム線の説明にも図
1,図2を参照する。前記図1,図2において、1はア
ルミニウムまたはアルミニウム合金導体(アルミ導
体)、2は亜鉛薄層、3は銅めっき層、3aは無光沢銅
めっき層,3bは半光沢銅めっき層、4は絶縁被覆、1
0は銅被覆アルミニウム線、10aは銅被覆アルミニウ
ム線(母線)、また20は絶縁被覆を設けた銅被覆アル
ミニウム線(以下、絶縁銅被覆アルミニウム線と略記す
る)である。DESCRIPTION OF THE PREFERRED EMBODIMENTS The contents of the present invention will be described below in more detail with reference to an embodiment shown in the drawings. Note that the present invention is not limited by this. FIG. 1 is a sectional view showing an example of the copper-coated aluminum wire of the present invention. FIG. 2 is a sectional view showing another example of the copper-coated aluminum wire of the present invention, which is a copper-coated aluminum wire provided with an insulating coating. In addition, FIG. 1 and FIG. 2 are also referred to for the description of the copper-coated aluminum wire of the comparative example. 1 and 2, 1 is an aluminum or aluminum alloy conductor (aluminum conductor), 2 is a zinc thin layer, 3 is a copper plating layer, 3a is a matte copper plating layer, 3b is a semi-glossy copper plating layer, 4 is Insulation coating, 1
0 is a copper-coated aluminum wire, 10a is a copper-coated aluminum wire (bus wire), and 20 is a copper-coated aluminum wire provided with an insulating coating (hereinafter abbreviated as an insulated copper-coated aluminum wire).
【0015】実施形態1(実施例1) アルミ導体(1) として、外径0.90mm,アルミニウ
ム純度99.7%のアルミニウム線を用い、該アルミ導
体(1) の表面を、脱脂,エッチング後、亜鉛置換によっ
て0.2μm厚さの亜鉛薄膜(2) を形成させた。続い
て、ピロリン酸銅50g/l,ピロリン酸カリウム36
0g/l、浴温40℃からなるピロリン酸銅めっき浴に
よって、ストライク銅めっきを2A/dm2 、1分の条
件によってめっき溶液中にディップさせ2μm厚さの無
光沢銅めっき層(3a)を亜鉛薄膜(2)の外周に連続コーテ
ィングさせた。続いて、硫酸銅100g/l,硫酸10
0g/l、浴温40℃からなる硫酸銅めっき浴に、添加
剤として、チオ尿素を20ppm添加し、10A/dm
2 の条件で18分通電し、40μm厚さの半光沢銅めっ
き層(3b)を設け、φ0.98mmの銅被覆アルミニウム
線(母線)(10a)とした。続いて、冷間引き抜き加工
を伸線機によって施し、仕上がり外径0.155mmの
銅被覆アルミニウム線(10)を製造した。更に、前記銅被
覆アルミニウム線(10)の外周にポリウレタン絶縁塗料を
塗布,焼付して5μm厚さの絶縁被覆 (4)を設け、絶縁
銅被覆アルミニウム線(20)を製造した。Embodiment 1 (Example 1) As an aluminum conductor (1), an aluminum wire having an outer diameter of 0.90 mm and an aluminum purity of 99.7% was used, and the surface of the aluminum conductor (1) was degreased and etched. Then, a zinc thin film (2) having a thickness of 0.2 μm was formed by zinc substitution. Subsequently, copper pyrophosphate 50 g / l, potassium pyrophosphate 36
The strike copper plating was dipped in a plating solution under the conditions of 2 A / dm 2 and 1 minute by a copper pyrophosphate plating bath having a bath temperature of 0 g / l and a bath temperature of 40 ° C. to form a 2 μm thick matte copper plating layer (3a). The outer periphery of the zinc thin film (2) was continuously coated. Subsequently, copper sulfate 100 g / l, sulfuric acid 10
20 g of thiourea was added as an additive to a copper sulfate plating bath having a bath temperature of 0 g / l and a bath temperature of 40 ° C., and 10 A / dm 2
Electric current was applied for 18 minutes under the conditions of 2 to provide a semi-bright copper plating layer (3b) having a thickness of 40 μm, thereby forming a copper-coated aluminum wire (bus) (10a) having a diameter of 0.98 mm. Subsequently, cold drawing was performed by a wire drawing machine to produce a copper-coated aluminum wire (10) having a finished outer diameter of 0.155 mm. Further, a polyurethane insulating paint was applied to the outer periphery of the copper-coated aluminum wire (10) and baked to provide an insulating coating (4) having a thickness of 5 μm, thereby producing an insulated copper-coated aluminum wire (20).
【0016】実施形態2(実施例2) アルミ導体(1) として、前記実施例1と同じ、外径0.
90mmアルミニウム線を用い、該導体(1) の外周に実
施例1と同様にして0.2μm厚さの亜鉛薄膜(2) およ
び2μm厚さの無光沢銅めっき層(3a)を連続コーティン
グさせた。続いて、無光沢銅めっき層(3a)まで設けたア
ルミ導体(1) を硫酸銅100g/l,硫酸100g/
l、浴温40℃からなる硫酸銅めっき浴に、添加剤とし
て、ゼラチン系添加剤のにかわを20ppm添加し、1
0A/dm2 で18分通電し、40μm厚さの半光沢銅
めっき層(3b)を設け、φ0.98mmの銅被覆アルミニ
ウム線(母線)(10a)とした。続いて、前記銅被覆ア
ルミニウム線母線に、冷間引き抜き加工を伸線機によっ
て施し、仕上がり外径0.155mmの銅被覆アルミニ
ウム線(10)を製造した。更に実施例1と同様にして、前
記銅被覆アルミニウム線(10)の外周にポリウレタン絶縁
塗料を塗布,焼付して5μm厚さの絶縁被覆 (4)を設
け、絶縁銅被覆アルミニウム線(20)を製造した。Embodiment 2 (Example 2) An aluminum conductor (1) having the same outer diameter as that of Example 1 was used.
Using a 90 mm aluminum wire, the outer periphery of the conductor (1) was continuously coated with a zinc thin film (2) having a thickness of 0.2 μm and a matte copper plating layer (3a) having a thickness of 2 μm in the same manner as in Example 1. . Subsequently, the aluminum conductor (1) provided up to the matte copper plating layer (3a) was coated with copper sulfate 100 g / l and sulfuric acid 100 g / l.
1, 20 ppm of gelatin-based glue was added as an additive to a copper sulfate plating bath having a bath temperature of 40 ° C.
A current of 0 A / dm 2 was applied for 18 minutes to provide a semi-bright copper plating layer (3b) having a thickness of 40 μm, thereby forming a copper-coated aluminum wire (bus) (10a) having a diameter of 0.98 mm. Subsequently, the copper-coated aluminum wire bus bar was subjected to cold drawing by a wire drawing machine to produce a copper-coated aluminum wire (10) having a finished outer diameter of 0.155 mm. Further, in the same manner as in Example 1, a polyurethane insulating paint was applied to the outer periphery of the copper-coated aluminum wire (10) and baked to provide an insulating coating (4) having a thickness of 5 μm. Manufactured.
【0017】実施形態3(実施例3) アルミ導体(1) として、アルミ成分が99%以上の加工
用のAl−Mg合金を用い、該導体(1) の外周に実施例
1と同様にして0.2μm厚さの亜鉛薄膜(2)および2
μm厚さの無光沢銅めっき層(3a)を連続コーティングさ
せた。続いて、無光沢銅めっき層(3a)まで設けたアルミ
導体(1) を、硫酸銅100g/l,硫酸100g/l、
浴温40℃からなる硫酸銅めっき浴に、添加剤としてポ
リエチレングリコールを20ppm添加し、10A/d
m2 の条件で18分通電し、40μm厚さの半光沢銅め
っき層(3b)を設け、φ0.98mmの銅被覆アルミニウ
ム線(母線)(10a)とした。続いて、前記銅被覆アル
ミニウム線母線に、冷間引き抜き加工を伸線機によって
施し、仕上がり外径0.155mmの銅被覆アルミニウ
ム線(10)を製造した。更に実施例1と同様にして、前記
銅被覆アルミニウム線(10)の外周にポリウレタン絶縁塗
料を塗布,焼付して5μm厚さの絶縁被覆 (4)を設け、
絶縁銅被覆アルミニウム線(20)を製造した。Embodiment 3 (Example 3) As an aluminum conductor (1), an Al-Mg alloy for processing having an aluminum component of 99% or more was used, and the outer periphery of the conductor (1) was formed in the same manner as in Example 1. 0.2 μm thick zinc thin films (2) and 2
A matte copper plating layer (3a) having a thickness of μm was continuously coated. Subsequently, the aluminum conductor (1) provided up to the matte copper plating layer (3a) was coated with copper sulfate 100 g / l, sulfuric acid 100 g / l,
20 ppm of polyethylene glycol was added as an additive to a copper sulfate plating bath having a bath temperature of 40 ° C., and 10 A / d
Electric current was applied for 18 minutes under the condition of m 2 to provide a semi-bright copper plating layer (3b) having a thickness of 40 μm, thereby forming a copper-coated aluminum wire (bus) (10a) having a diameter of 0.98 mm. Subsequently, the copper-coated aluminum wire bus bar was subjected to cold drawing by a wire drawing machine to produce a copper-coated aluminum wire (10) having a finished outer diameter of 0.155 mm. Further, in the same manner as in Example 1, a polyurethane insulating paint was applied to the outer periphery of the copper-coated aluminum wire (10) and baked to provide an insulating coating (4) having a thickness of 5 μm.
An insulated copper coated aluminum wire (20) was produced.
【0018】比較例 比較例1 アルミ導体(1) として、前記実施例1と同じ、外径0.
90mmアルミニウム線を用い、該導体(1) の外周に実
施例1と同様にして亜鉛薄膜(2) および2μm厚さの無
光沢銅めっき層(3a)を連続コーティングさせた。続い
て、無光沢銅めっき層(3a)まで設けたアルミ導体(1) を
硫酸銅100g/l,硫酸100g/l、浴温40℃か
らなる硫酸銅めっき浴に、添加剤を添加せず、10A/
dm2 の条件で18分通電し、40μm厚さの無光沢銅
めっき層(3b部位) を設け、φ0.98mmの銅被覆ア
ルミニウム線(母線)(10a相当)とした。続いて、前
記銅被覆アルミニウム線母線に、冷間引き抜き加工を伸
線機によって施し、仕上がり外径0.155mmの銅被
覆アルミニウム線(10 相当)を製造した。更に実施例1
と同様にして、銅被覆アルミニウム線(10 相当) の外周
に5μm厚さの絶縁被覆(4) を設け、絶縁銅被覆アルミ
ニウム線(20 相当) を製造した。Comparative Example Comparative Example 1 An aluminum conductor (1) having the same outer diameter as that of Example 1 was used.
Using a 90 mm aluminum wire, the outer periphery of the conductor (1) was continuously coated with a zinc thin film (2) and a 2 μm thick matte copper plating layer (3a) in the same manner as in Example 1. Subsequently, the aluminum conductor (1) provided up to the matte copper plating layer (3a) was added to a copper sulfate plating bath consisting of copper sulfate 100 g / l, sulfuric acid 100 g / l, and a bath temperature of 40 ° C., without adding any additives. 10A /
Electric current was supplied for 18 minutes under the condition of dm 2 to provide a 40 μm thick matte copper plating layer (3b portion) to form a copper-coated aluminum wire (bus) of φ0.98 mm (corresponding to 10a). Subsequently, the copper-coated aluminum wire bus bar was subjected to cold drawing by a wire drawing machine to produce a copper-coated aluminum wire (equivalent to 10) having a finished outer diameter of 0.155 mm. Example 1
In the same manner as described above, an insulating coating (4) having a thickness of 5 μm was provided on the outer periphery of the copper-coated aluminum wire (corresponding to 10) to produce an insulated copper-coated aluminum wire (corresponding to 20).
【0019】比較例2 アルミ導体(1) として、前記実施例1と同じ、外径0.
90mmアルミニウム線を用い、該導体(1) の外周に実
施例1と同様にして亜鉛薄膜(2) および2μm厚さの無
光沢銅めっき層(3a)を連続コーティングさせた。続い
て、硫酸銅100g/l,硫酸100g/l、浴温40
℃からなる硫酸銅めっき浴に、添加剤として、チオ尿素
を100ppm添加し、10A/dm2 の条件で18分
通電し、40μm厚さの光沢銅めっき層 (3b部位) を設
け、φ0.98mmの銅被覆アルミニウム線(母線)
(10a相当)とした。続いて、冷間引き抜き加工を伸線
機によって施し、仕上がり外径0.155mmの銅被覆
アルミニウム線(10 相当) を製造した。更に実施例1と
同様にして、銅被覆アルミニウム線(10 相当) の外周に
5μm厚さの絶縁被覆(4) を設け、絶縁銅被覆アルミニ
ウム線(20 相当) を製造した。Comparative Example 2 The same aluminum conductor (1) as in Example 1 was used, except that the outer diameter was 0.1 mm.
Using a 90 mm aluminum wire, the outer periphery of the conductor (1) was continuously coated with a zinc thin film (2) and a 2 μm thick matte copper plating layer (3a) in the same manner as in Example 1. Subsequently, copper sulfate 100 g / l, sulfuric acid 100 g / l, bath temperature 40
100 ppm of thiourea was added as an additive to a copper sulfate plating bath having a temperature of 10 ° C., and a current was applied for 18 minutes under the condition of 10 A / dm 2 to provide a 40 μm thick bright copper plating layer (3b portion). Copper-coated aluminum wire (bus bar)
(Equivalent to 10a). Subsequently, cold drawing was performed by a wire drawing machine to produce a copper-coated aluminum wire (equivalent to 10) having a finished outer diameter of 0.155 mm. Further, in the same manner as in Example 1, an insulating coating (4) having a thickness of 5 μm was provided on the outer periphery of the copper-coated aluminum wire (corresponding to 10) to produce an insulated copper-coated aluminum wire (corresponding to 20).
【0020】特性試験 前記実施例1〜3および比較例1,2により得られた絶
縁銅被覆アルミニウム線について、空芯コイルを巻線
し、それぞれのコイル100個を試験試料とし、コイル
表面(表と裏)のアルミ導体素地露出(アルミ露出)の
状態を20倍の顕微鏡にて観察した。その結果を下記表
1に示す。また、図3に銅めっき層表面の電子顕微鏡写
真(SEM)を示すが、同図(a)は比較例1の無光沢
銅めっき層、同図(b)は実施例1の半光沢銅めっき
層、また同図(c)は比較例2の光沢銅めっき層であ
る。また、銅めっき層の硬さをビッカース硬度計にて測
定したところ、実施例1〜3の半光沢銅めっき層が90
〜110Hv、比較例1の無光沢銅めっき層が70〜8
5Hv、また比較例2の光沢銅めっき層が90〜160
Hvであった。Characteristic test An air-core coil was wound on each of the insulated copper-coated aluminum wires obtained in Examples 1 to 3 and Comparative Examples 1 and 2, and 100 coils were used as test samples. And the back) of the exposed aluminum conductor base (exposed aluminum) were observed with a microscope of 20 times magnification. The results are shown in Table 1 below. FIG. 3 shows an electron micrograph (SEM) of the surface of the copper plating layer. FIG. 3 (a) shows the matte copper plating layer of Comparative Example 1, and FIG. 3 (b) shows the semi-glossy copper plating of Example 1. FIG. 3C shows the bright copper plating layer of Comparative Example 2. Further, when the hardness of the copper plating layer was measured with a Vickers hardness tester, the semi-glossy copper plating layers of Examples 1 to 3 were found to have a hardness of 90%.
~ 110Hv, 70 ~ 8 for the matte copper plating layer of Comparative Example 1
5Hv, and the bright copper plating layer of Comparative Example 2 was 90 to 160
Hv.
【0021】[0021]
【表1】アルミ露出状態試験結果 [Table 1] Aluminum exposure condition test results
【0022】上記表1より明らかなように、本発明の実
施例1〜3の銅被覆アルミニウム線は、コイル巻線後も
アルミ露出がないことが確認された。なお、比較例2の
試験試料では、目視によってもアルミ露出が確認でき
た。また、図3の写真から明らかなように、本発明の半
光沢銅めっき層の外観は明らかに無光沢銅めっき層や光
沢銅めっき層と異なることが分かる。As apparent from Table 1, it was confirmed that the copper-coated aluminum wires of Examples 1 to 3 of the present invention did not have aluminum exposure even after coil winding. In addition, in the test sample of Comparative Example 2, the aluminum exposure could be confirmed visually. In addition, as is apparent from the photograph of FIG. 3, the appearance of the semi-glossy copper plating layer of the present invention is clearly different from that of the matte copper plating layer or the bright copper plating layer.
【0023】[0023]
【発明の効果】本発明の銅被覆アルミニウム線は、亜鉛
薄膜の外周に電解めっきにより形成される銅めっき層が
無光沢銅めっき層と半光沢銅めっき層から構成されるこ
とによって、表面凹凸が無光沢銅めっき層と比較すると
無い。そのため、引き抜き加工時のストレスが緩和さ
れ、アルミ導体素地が露出しない。従って、はんだ付け
時の接続の信頼性が得られる。また、銅被覆率が20%
以下であることによってアルミ導体の持つ軽さを十分に
発揮し、そのことによって、電子機器部品等のコイル線
材に用いられる導体としての軽薄短小化が図れる。従っ
て、本発明は産業に寄与する効果が極めて大である。The copper-coated aluminum wire of the present invention has a surface unevenness because the copper plating layer formed by electrolytic plating on the outer periphery of the zinc thin film is composed of a matte copper plating layer and a semi-gloss copper plating layer. None compared to matte copper plating layer. Therefore, the stress at the time of drawing is reduced, and the aluminum conductor base is not exposed. Therefore, the reliability of connection at the time of soldering can be obtained. In addition, copper coverage is 20%
Due to the following, the lightness of the aluminum conductor is sufficiently exhibited, and as a result, it is possible to reduce the weight and thickness of the conductor used as a coil wire for electronic device parts and the like. Therefore, the present invention has an extremely large effect of contributing to industry.
【図1】本発明の銅被覆アルミニウム線の一例を示す断
面図である。FIG. 1 is a sectional view showing an example of a copper-coated aluminum wire of the present invention.
【図2】本発明の銅被覆アルミニウム線の他の例を示す
断面図であり、絶縁被覆を設けた銅被覆アルミニウム線
である。FIG. 2 is a sectional view showing another example of the copper-coated aluminum wire of the present invention, which is a copper-coated aluminum wire provided with an insulating coating.
【図3】銅めっき層表面の電子顕微鏡写真(SEM)で
あり、同図(a)は比較例1の無光沢銅めっき層、同図
(b)は実施例1の半光沢銅めっき層、また同図(c)
は比較例2の光沢銅めっき層である。3 is an electron micrograph (SEM) of the surface of a copper plating layer. FIG. 3 (a) is a matte copper plating layer of Comparative Example 1, FIG. 3 (b) is a semi-glossy copper plating layer of Example 1, In addition, FIG.
Denotes a bright copper plating layer of Comparative Example 2.
1 アルミニウムまたはアルミニウム合金導体(アルミ
導体) 2 亜鉛薄層 3 銅めっき層 3a 無光沢銅めっき層 3b 半光沢銅めっき層 4 絶縁被覆 10 銅被覆アルミニウム線 10a 銅被覆アルミニウム線(母線) 20 絶縁被覆を設けた銅被覆アルミニウム線(絶縁銅
被覆アルミニウム線)DESCRIPTION OF SYMBOLS 1 Aluminum or aluminum alloy conductor (aluminum conductor) 2 Zinc thin layer 3 Copper plating layer 3a Matte copper plating layer 3b Semi-gloss copper plating layer 4 Insulation coating 10 Copper-coated aluminum wire 10a Copper-coated aluminum wire (bus wire) 20 Insulation coating Provided copper-coated aluminum wire (insulated copper-coated aluminum wire)
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C25D 5/30 C25D 5/30 H01B 5/02 H01B 5/02 A 5/04 5/04 Fターム(参考) 4E096 EA05 EA13 EA26 GA03 KA04 KA09 4K023 AA19 BA06 BA12 CA04 CB05 CB40 4K024 AA09 AB02 AB17 BA06 BB09 BC03 CA02 DA08 DB06 GA14 4K044 AA06 AB04 BA21 BB04 BC08 CA53 5G307 BA04 BB03 BC03 BC07 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C25D 5/30 C25D 5/30 H01B 5/02 H01B 5/02 A 5/04 5/04 F term (reference 4E096 EA05 EA13 EA26 GA03 KA04 KA09 4K023 AA19 BA06 BA12 CA04 CB05 CB40 4K024 AA09 AB02 AB17 BA06 BB09 BC03 CA02 DA08 DB06 GA14 4K044 AA06 AB04 BA21 BB04 BC08 CA53 5G307 BA04 BB03 BC03 BC07
Claims (6)
らなる導体(1) の表面上に亜鉛置換によって形成させた
亜鉛薄膜(2) の外周に、電解銅めっきによって銅めっき
層(3) を連続被覆させた銅被覆アルミニウム線であっ
て、 前記銅めっき層(3) が無光沢銅めっき層(3a)と半光沢銅
めっき層(3b)からなることを特徴とする銅被覆アルミニ
ウム線。1. A copper coated with a copper plating layer (3) by electrolytic copper plating on the outer periphery of a zinc thin film (2) formed by zinc substitution on the surface of a conductor (1) made of aluminum or an aluminum alloy. A copper-coated aluminum wire, wherein the copper plating layer (3) comprises a matte copper plating layer (3a) and a semi-glossy copper plating layer (3b).
っきの際にチオ尿素系添加剤,ゼラチン系添加剤,或い
はポリエチレングリコール系添加剤の単独添加或いは併
用添加により物性調整されて形成されることを特徴とす
る請求項1記載の銅被覆アルミニウム線。2. The semi-bright copper plating layer (3b) is adjusted in physical properties by adding a thiourea-based additive, a gelatin-based additive, or a polyethylene glycol-based additive alone or in combination during electrolytic copper plating. The copper-coated aluminum wire according to claim 1, wherein the wire is formed.
剤,或いはポリエチレングリコール系添加剤の添加量が
10〜50ppmであることを特徴とする請求項1また
は2記載の銅被覆アルミニウム線。3. The copper-coated aluminum wire according to claim 1, wherein an amount of said thiourea-based additive, gelatin-based additive or polyethylene glycol-based additive is 10 to 50 ppm.
(3a)と半光沢銅めっき層(3b)からなる銅めっき層(3) を
連続被覆させた後、更に塑性加工が施こされ、所定サイ
ズに加工されていることを特徴とする請求項1から請求
項3に記載の銅被覆アルミニウム線。4. A matte copper plating layer formed by electrolytic copper plating.
2. The method according to claim 1, wherein after the copper plating layer (3) comprising the (3a) and the semi-bright copper plating layer (3b) is continuously coated, plastic working is further performed to obtain a predetermined size. The copper-coated aluminum wire according to claim 3.
ルミニウム線の銅被覆率が20%以下であることを構造
上の特徴とする銅被覆アルミニウム線。5. A copper-coated aluminum wire according to claim 1, wherein the copper-coated aluminum wire according to claim 1 has a copper coverage of 20% or less.
ルミニウム線の外周に、更に絶縁被覆 (4)を施こしたこ
とを構造上の特徴とする銅被覆アルミニウム線。6. A copper-coated aluminum wire, characterized in that an insulating coating (4) is further applied to the outer periphery of the copper-coated aluminum wire according to claim 1.
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