JP2001250758A - 半導体露光装置 - Google Patents

半導体露光装置

Info

Publication number
JP2001250758A
JP2001250758A JP2000058872A JP2000058872A JP2001250758A JP 2001250758 A JP2001250758 A JP 2001250758A JP 2000058872 A JP2000058872 A JP 2000058872A JP 2000058872 A JP2000058872 A JP 2000058872A JP 2001250758 A JP2001250758 A JP 2001250758A
Authority
JP
Japan
Prior art keywords
chuck
photosensitive substrate
exposure apparatus
semiconductor exposure
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000058872A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001250758A5 (enExample
Inventor
Kazunari Funayoshi
一成 船吉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000058872A priority Critical patent/JP2001250758A/ja
Publication of JP2001250758A publication Critical patent/JP2001250758A/ja
Publication of JP2001250758A5 publication Critical patent/JP2001250758A5/ja
Withdrawn legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2000058872A 2000-03-03 2000-03-03 半導体露光装置 Withdrawn JP2001250758A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000058872A JP2001250758A (ja) 2000-03-03 2000-03-03 半導体露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000058872A JP2001250758A (ja) 2000-03-03 2000-03-03 半導体露光装置

Publications (2)

Publication Number Publication Date
JP2001250758A true JP2001250758A (ja) 2001-09-14
JP2001250758A5 JP2001250758A5 (enExample) 2007-04-19

Family

ID=18579403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000058872A Withdrawn JP2001250758A (ja) 2000-03-03 2000-03-03 半導体露光装置

Country Status (1)

Country Link
JP (1) JP2001250758A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008298870A (ja) * 2007-05-29 2008-12-11 Orc Mfg Co Ltd 描画装置
CN104516207A (zh) * 2013-09-27 2015-04-15 北大方正集团有限公司 一种侦测感应系统及控制曝光机工作的方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008298870A (ja) * 2007-05-29 2008-12-11 Orc Mfg Co Ltd 描画装置
CN104516207A (zh) * 2013-09-27 2015-04-15 北大方正集团有限公司 一种侦测感应系统及控制曝光机工作的方法

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