JP2001239143A5 - - Google Patents

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Publication number
JP2001239143A5
JP2001239143A5 JP2000052666A JP2000052666A JP2001239143A5 JP 2001239143 A5 JP2001239143 A5 JP 2001239143A5 JP 2000052666 A JP2000052666 A JP 2000052666A JP 2000052666 A JP2000052666 A JP 2000052666A JP 2001239143 A5 JP2001239143 A5 JP 2001239143A5
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JP
Japan
Prior art keywords
vacuum
chamber
vacuum apparatus
variable
angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000052666A
Other languages
English (en)
Japanese (ja)
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JP2001239143A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000052666A priority Critical patent/JP2001239143A/ja
Priority claimed from JP2000052666A external-priority patent/JP2001239143A/ja
Publication of JP2001239143A publication Critical patent/JP2001239143A/ja
Publication of JP2001239143A5 publication Critical patent/JP2001239143A5/ja
Pending legal-status Critical Current

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JP2000052666A 2000-02-29 2000-02-29 排気速度調整機能付き防着バッフル搭載真空装置 Pending JP2001239143A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000052666A JP2001239143A (ja) 2000-02-29 2000-02-29 排気速度調整機能付き防着バッフル搭載真空装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000052666A JP2001239143A (ja) 2000-02-29 2000-02-29 排気速度調整機能付き防着バッフル搭載真空装置

Publications (2)

Publication Number Publication Date
JP2001239143A JP2001239143A (ja) 2001-09-04
JP2001239143A5 true JP2001239143A5 (enExample) 2006-11-09

Family

ID=18574147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000052666A Pending JP2001239143A (ja) 2000-02-29 2000-02-29 排気速度調整機能付き防着バッフル搭載真空装置

Country Status (1)

Country Link
JP (1) JP2001239143A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005320594A (ja) * 2004-05-10 2005-11-17 Showa Shinku:Kk 真空槽の変形防止補強構造
JP4700706B2 (ja) * 2008-03-06 2011-06-15 月島機械株式会社 真空成膜装置
WO2014085497A1 (en) * 2012-11-30 2014-06-05 Applied Materials, Inc Process chamber gas flow apparatus, systems, and methods
US9490149B2 (en) * 2013-07-03 2016-11-08 Lam Research Corporation Chemical deposition apparatus having conductance control

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6043774U (ja) * 1983-09-02 1985-03-27 日電アネルバ株式会社 可変コンダクタンス装置
JPS62174367A (ja) * 1986-01-29 1987-07-31 Toray Ind Inc 高真空装置
JPH1096074A (ja) * 1996-09-19 1998-04-14 Nissin Electric Co Ltd 基板処理装置

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