JP2001237165A5 - - Google Patents

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Publication number
JP2001237165A5
JP2001237165A5 JP2000046323A JP2000046323A JP2001237165A5 JP 2001237165 A5 JP2001237165 A5 JP 2001237165A5 JP 2000046323 A JP2000046323 A JP 2000046323A JP 2000046323 A JP2000046323 A JP 2000046323A JP 2001237165 A5 JP2001237165 A5 JP 2001237165A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2000046323A
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JP2001237165A (ja
JP4532647B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2000046323A priority Critical patent/JP4532647B2/ja
Priority claimed from JP2000046323A external-priority patent/JP4532647B2/ja
Priority to EP01301632A priority patent/EP1128218A3/en
Priority to US09/790,865 priority patent/US6707532B2/en
Publication of JP2001237165A publication Critical patent/JP2001237165A/ja
Priority to US10/764,530 priority patent/US7038761B2/en
Publication of JP2001237165A5 publication Critical patent/JP2001237165A5/ja
Application granted granted Critical
Publication of JP4532647B2 publication Critical patent/JP4532647B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000046323A 2000-02-23 2000-02-23 露光装置 Expired - Fee Related JP4532647B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2000046323A JP4532647B2 (ja) 2000-02-23 2000-02-23 露光装置
EP01301632A EP1128218A3 (en) 2000-02-23 2001-02-22 Projection exposure apparatus
US09/790,865 US6707532B2 (en) 2000-02-23 2001-02-23 Projection exposure apparatus
US10/764,530 US7038761B2 (en) 2000-02-23 2004-01-27 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000046323A JP4532647B2 (ja) 2000-02-23 2000-02-23 露光装置

Publications (3)

Publication Number Publication Date
JP2001237165A JP2001237165A (ja) 2001-08-31
JP2001237165A5 true JP2001237165A5 (ja) 2007-03-29
JP4532647B2 JP4532647B2 (ja) 2010-08-25

Family

ID=18568757

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000046323A Expired - Fee Related JP4532647B2 (ja) 2000-02-23 2000-02-23 露光装置

Country Status (3)

Country Link
US (2) US6707532B2 (ja)
EP (1) EP1128218A3 (ja)
JP (1) JP4532647B2 (ja)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4532647B2 (ja) * 2000-02-23 2010-08-25 キヤノン株式会社 露光装置
TW575904B (en) * 2001-08-21 2004-02-11 Asml Us Inc Optical projection for microlithography
US7136220B2 (en) * 2001-08-21 2006-11-14 Carl Zeiss Smt Ag Catadioptric reduction lens
DE10146499B4 (de) 2001-09-21 2006-11-09 Carl Zeiss Smt Ag Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie Verfahren zur Optimierung der Abbildungseigenschaften von mindestens drei optischen Elementen
US6757110B2 (en) * 2002-05-29 2004-06-29 Asml Holding N.V. Catadioptric lithography system and method with reticle stage orthogonal to wafer stage
JP2004158786A (ja) * 2002-11-08 2004-06-03 Canon Inc 投影光学系及び露光装置
US7869121B2 (en) * 2003-02-21 2011-01-11 Kla-Tencor Technologies Corporation Small ultra-high NA catadioptric objective using aspheric surfaces
JP2004281697A (ja) * 2003-03-14 2004-10-07 Canon Inc 露光装置及び収差補正方法
EP1759248A1 (en) * 2004-06-04 2007-03-07 Carl Zeiss SMT AG Projection system with compensation of intensity variatons and compensation element therefor
JP4980922B2 (ja) * 2004-11-18 2012-07-18 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置及びマイクロリソグラフィ投影露光装置の像面湾曲を修正するための方法
KR100674959B1 (ko) 2005-02-23 2007-01-26 삼성전자주식회사 비축상 프로젝션 광학계 및 이를 적용한 극자외선 리소그래피 장치
US20060238732A1 (en) * 2005-04-21 2006-10-26 Mercado Romeo I High-NA unit-magnification projection optical system having a beamsplitter
WO2007017089A1 (en) 2005-07-25 2007-02-15 Carl Zeiss Smt Ag Projection objective of a microlithographic projection exposure apparatus
US7605914B2 (en) 2005-09-29 2009-10-20 Carl Zeiss Smt Ag Optical system and method for improving imaging properties thereof
WO2008040494A1 (en) * 2006-10-02 2008-04-10 Carl Zeiss Smt Ag Method for improving the imaging properties of an optical system, and such an optical system
US9409255B1 (en) 2011-01-04 2016-08-09 Nlight, Inc. High power laser imaging systems
US9429742B1 (en) * 2011-01-04 2016-08-30 Nlight, Inc. High power laser imaging systems
US10095016B2 (en) 2011-01-04 2018-10-09 Nlight, Inc. High power laser system
JP5787662B2 (ja) * 2011-08-04 2015-09-30 キヤノン株式会社 結像光学系、および、画像投射装置
US9720244B1 (en) 2011-09-30 2017-08-01 Nlight, Inc. Intensity distribution management system and method in pixel imaging
US9310248B2 (en) 2013-03-14 2016-04-12 Nlight, Inc. Active monitoring of multi-laser systems
US9709810B2 (en) 2014-02-05 2017-07-18 Nlight, Inc. Single-emitter line beam system

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5311362A (en) * 1989-04-20 1994-05-10 Nikon Corporation Projection exposure apparatus
JP3085481B2 (ja) * 1991-09-28 2000-09-11 株式会社ニコン 反射屈折縮小投影光学系、及び該光学系を備えた露光装置
JP3243818B2 (ja) * 1992-02-14 2002-01-07 株式会社ニコン 投影露光装置及び方法、並びに素子製造方法
JP2750062B2 (ja) * 1992-12-14 1998-05-13 キヤノン株式会社 反射屈折型光学系及び該光学系を備える投影露光装置
US5537260A (en) 1993-01-26 1996-07-16 Svg Lithography Systems, Inc. Catadioptric optical reduction system with high numerical aperture
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JPH1010431A (ja) * 1996-06-20 1998-01-16 Nikon Corp 反射屈折光学系
JPH1020195A (ja) * 1996-06-28 1998-01-23 Nikon Corp 反射屈折光学系
JPH1020197A (ja) * 1996-06-28 1998-01-23 Nikon Corp 反射屈折光学系及びその調整方法
TW398029B (en) * 1997-04-18 2000-07-11 Nikon Corp Exposure device, method of manufacturing the same and the electric circuit
JP4182304B2 (ja) * 1998-05-18 2008-11-19 株式会社ニコン 走査型投影露光装置及び該露光装置に好適な投影光学系
DE19824030A1 (de) * 1998-05-29 1999-12-02 Zeiss Carl Fa Katadioptrisches Projektionsobjektiv mit adaptivem Spiegel und Projektionsbelichtungsverfahren
JP2000021765A (ja) * 1998-07-03 2000-01-21 Nikon Corp 照明装置及びそれを用いた投影露光装置
JP2001060546A (ja) * 1999-08-20 2001-03-06 Nikon Corp 露光方法及び露光装置
JP4532647B2 (ja) * 2000-02-23 2010-08-25 キヤノン株式会社 露光装置

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