JP2001180972A - Lead free glass with low melting point - Google Patents
Lead free glass with low melting pointInfo
- Publication number
- JP2001180972A JP2001180972A JP36946699A JP36946699A JP2001180972A JP 2001180972 A JP2001180972 A JP 2001180972A JP 36946699 A JP36946699 A JP 36946699A JP 36946699 A JP36946699 A JP 36946699A JP 2001180972 A JP2001180972 A JP 2001180972A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- free glass
- lead free
- low melting
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/17—Silica-free oxide glass compositions containing phosphorus containing aluminium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
- C03C8/08—Frit compositions, i.e. in a powdered or comminuted form containing phosphorus
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Transforming Electric Information Into Light Information (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、プラズマディスプ
レイパネル(PDP)、蛍光表示管(VFD)等のフラ
ットディスプレイパネルにおける封着、被覆または隔壁
形成に用いられる無鉛低融点ガラスに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a lead-free low-melting glass used for sealing, coating or forming partition walls in a flat display panel such as a plasma display panel (PDP) and a fluorescent display tube (VFD).
【0002】[0002]
【従来の技術】PDP、VFD等の封着、被覆、または
隔壁形成に用いられる低融点ガラス粉末として、近年鉛
を含有しないものが求められている。このような無鉛低
融点ガラスとして従来Bi2O3系ガラスが使用されてい
るが、軟化点が600℃以下のものを得るためにはBi
2O3の含有量を増加させる必要があり、高価なBi原料
を大量に使用しなければならない問題があった。2. Description of the Related Art In recent years, low-melting glass powder used for sealing, coating, or forming partition walls of PDPs, VFDs and the like has been required to contain no lead. Conventionally, Bi 2 O 3 -based glass has been used as such a lead-free low-melting glass.
There is a problem that it is necessary to increase the content of 2 O 3 and that a large amount of expensive Bi raw material must be used.
【0003】[0003]
【発明が解決しようとする課題】本発明は以上の課題を
解決し、Bi2O3を含有しなくても軟化点を600℃以
下にできる無鉛低融点ガラスの提供を目的とする。SUMMARY OF THE INVENTION An object of the present invention is to solve the above problems and to provide a lead-free low-melting glass which can have a softening point of 600 ° C. or less without containing Bi 2 O 3 .
【0004】[0004]
【課題を解決するための手段】本発明は、下記酸化物基
準のモル%表示で、P2O5:55〜62、ZnO:20
〜39、Al2O3:3〜15、Li2O:0〜20、N
a2O:0〜20、K2O:0〜20、MgO:0〜2
0、CaO:0〜20、SrO:0〜20、BaO:0
〜20、から実質的になり、Li2O+Na2O+K2O
が2〜20モル%、MgO+CaO+SrO+BaOが
0〜20モル%である無鉛低融点ガラスを提供する。SUMMARY OF THE INVENTION The present invention, in mol% based on the following oxides, P 2 O 5: 55~62, ZnO: 20
~39, Al 2 O 3: 3~15 , Li 2 O: 0~20, N
a 2 O: 0~20, K 2 O: 0~20, MgO: 0~2
0, CaO: 0 to 20, SrO: 0 to 20, BaO: 0
20, essentially made from, Li 2 O + Na 2 O + K 2 O
Provides a lead-free low-melting glass in which MgO + CaO + SrO + BaO is 0 to 20 mol%.
【0005】[0005]
【発明の実施の形態】本発明の無鉛低融点ガラス(以下
単に本発明のガラスという。)を、封着、被覆、または
隔壁形成に用いるときは、粉末化して使用される。この
粉末化されたガラスは通常、必要に応じて低膨張セラミ
ックスフィラー、耐熱顔料、等と混合され、次にビヒク
ルと混練してペースト化される。このガラスペーストは
下地のガラスの所定部位に塗布され、焼成される。ここ
でいう下地のガラスは、ガラスの上に透明電導膜等が被
覆されているものも含む。BEST MODE FOR CARRYING OUT THE INVENTION When the lead-free low-melting glass of the present invention (hereinafter simply referred to as the glass of the present invention) is used for sealing, coating, or forming partition walls, it is used in the form of powder. This powdered glass is usually mixed with a low-expansion ceramic filler, a heat-resistant pigment, or the like, if necessary, and then kneaded with a vehicle to form a paste. This glass paste is applied to a predetermined portion of the underlying glass and fired. The base glass referred to here includes those in which a transparent conductive film or the like is coated on the glass.
【0006】本発明のガラスの軟化点(Ts)は580
℃以下であることが好ましい。580℃超では、PD
P、VFD、等の封着、被覆、または隔壁形成に用いる
ことが困難になるおそれがある。より好ましくは560
℃以下、特に好ましくは550℃以下である。また、T
sは500℃以上であることが好ましい。500℃未満
では、PDP、VFD、等における被覆または隔壁形成
に用いることが困難になるおそれがある。より好ましく
は510℃以上、特に好ましくは520℃以上、最も好
ましくは530℃以上である。The softening point (T s ) of the glass of the present invention is 580
It is preferable that the temperature is not higher than ° C. If the temperature exceeds 580 ° C, PD
It may be difficult to use P, VFD, or the like for sealing, coating, or forming a partition. More preferably 560
° C or lower, particularly preferably 550 ° C or lower. Also, T
s is preferably 500 ° C. or higher. If the temperature is lower than 500 ° C., it may be difficult to use it for coating or forming a partition in PDP, VFD, and the like. It is more preferably at least 510 ° C, particularly preferably at least 520 ° C, most preferably at least 530 ° C.
【0007】本発明のガラスの結晶化温度(Tc)はTs
よりも40℃以上高いことが好ましい。TcとTsの差
(Tc−Ts)が40℃未満では焼成時に結晶化しやすく
なるおそれがある。ここで、Tcは示差熱分析(DT
A)によって得られる結晶化ピーク温度であり、結晶化
ピークが認められない場合は、Tc=∞とする。(Tc−
T s)は50℃以上であることがより好ましい。さらに
好ましくは60℃以上、特に好ましくは70℃以上、最
も好ましくは80℃以上である。The crystallization temperature (T) of the glass of the present inventionc) Is Ts
It is preferable that the temperature is higher by 40 ° C. or more than that. TcAnd TsDifference
(Tc-Ts) Is less than 40 ° C, it tends to crystallize during firing.
Could be. Where TcIndicates differential thermal analysis (DT
A) is the crystallization peak temperature obtained by A)
If no peak is observed, Tc= ∞. (Tc−
T s) Is more preferably 50 ° C. or higher. further
Preferably at least 60 ° C, particularly preferably at least 70 ° C, most preferably
Is also preferably 80 ° C. or higher.
【0008】本発明のガラスの50〜250℃における
線膨張係数は120×10-7/℃以下であることが好ま
しい。120×10-7/℃超では、後述のガラスフリッ
トの焼成物の前記線膨張係数が大きくなりすぎるおそれ
がある。より好ましくは110×10-7/℃以下、特に
好ましくは100×10-7/℃以下である。また、前記
線膨張係数は60×10-7/℃以上であることが好まし
い。以下、50〜250℃における線膨張係数を単に膨
張係数という。The linear expansion coefficient of the glass of the present invention at 50 to 250 ° C. is preferably 120 × 10 −7 / ° C. or less. If it exceeds 120 × 10 −7 / ° C., the coefficient of linear expansion of a fired product of glass frit described below may be too large. It is more preferably at most 110 × 10 −7 / ° C., particularly preferably at most 100 × 10 −7 / ° C. Further, the coefficient of linear expansion is preferably 60 × 10 −7 / ° C. or more. Hereinafter, the coefficient of linear expansion at 50 to 250 ° C. is simply referred to as an expansion coefficient.
【0009】次に、本発明のガラスの組成について、モ
ル%を単に%と記して以下に説明する。P2O5はネット
ワークフォーマであり必須である。55%未満では軟化
点が高くなりすぎる。62%超では化学的耐久性、特に
耐水性が低下する。好ましくは60%以下、より好まし
くは59%以下、特に好ましくは58%以下である。Next, the composition of the glass of the present invention will be described below by simply writing mol% as%. P 2 O 5 is a network former and is essential. If it is less than 55%, the softening point becomes too high. If it exceeds 62%, the chemical durability, particularly the water resistance, is reduced. It is preferably at most 60%, more preferably at most 59%, particularly preferably at most 58%.
【0010】ZnOは、ガラスを安定化させる効果、化
学的耐久性、特に耐水性を向上させる効果、膨張係数を
低下させる効果、または、軟化点を下げる効果を有し、
必須である。20%未満では前記効果が小さすぎる。好
ましくは21%以上である。39%超では焼成時に結晶
化しやすくなる、または軟化点が高くなりすぎる。好ま
しくは35%以下、より好ましくは32%以下である。ZnO has an effect of stabilizing glass, an effect of improving chemical durability, particularly water resistance, an effect of lowering an expansion coefficient, or an effect of lowering a softening point,
Required. If it is less than 20%, the effect is too small. It is preferably at least 21%. If it exceeds 39%, it tends to crystallize during firing, or the softening point is too high. It is preferably at most 35%, more preferably at most 32%.
【0011】Al2O3は化学的耐久性、特に耐水性を高
くする効果を有し、必須である。3%未満では前記効果
が小さい。好ましくは4%以上である。15%超では軟
化点が高くなりすぎる。好ましくは10%以下である。Al 2 O 3 has an effect of increasing chemical durability, particularly water resistance, and is essential. If it is less than 3%, the effect is small. It is preferably at least 4%. If it exceeds 15%, the softening point becomes too high. Preferably it is 10% or less.
【0012】Li2O、Na2OおよびK2Oはいずれも
軟化点を下げ流動性を高める効果を有し、これら3成分
のうちの1種以上を含有しなければならない。Li
2O、Na2OおよびK2Oのそれぞれの含有量は20%
以下でなければならない。20%超では化学的耐久性が
低下する。好ましくは10%以下である。Li 2 O, Na 2 O and K 2 O all have the effect of lowering the softening point and increasing the fluidity, and must contain at least one of these three components. Li
The content of each of 2 O, Na 2 O and K 2 O is 20%
Must be: If it exceeds 20%, the chemical durability decreases. Preferably it is 10% or less.
【0013】Li2O、Na2OおよびK2Oの含有量の
合計は2〜20%である。2%未満では軟化点が高くな
りすぎる。好ましくは4%以上である。20%超では化
学的耐久性が低下する、または膨張係数が大きくなりす
ぎる。好ましくは15%以下、より好ましくは10%以
下である。The total content of Li 2 O, Na 2 O and K 2 O is 2 to 20%. If it is less than 2%, the softening point becomes too high. It is preferably at least 4%. If it exceeds 20%, the chemical durability is reduced or the expansion coefficient is too large. Preferably it is 15% or less, more preferably 10% or less.
【0014】MgO、CaO、SrOおよびBaOはい
ずれも必須ではないが、ガラスを安定化するために、そ
れぞれ20%まで含有してもよい。20%超では失透し
やすくなるおそれがある。より好ましくは15%以下、
特に好ましくは12%以下である。Each of MgO, CaO, SrO and BaO is not essential, but each may contain up to 20% in order to stabilize the glass. If it exceeds 20%, devitrification may easily occur. More preferably 15% or less,
It is particularly preferably at most 12%.
【0015】MgO、CaO、SrOおよびBaOのう
ちの1種以上を含有する場合、その含有量の合計は20
%以下であることが好ましい。20%超では失透しやす
くなるおそれがある。より好ましくは15%以下、特に
好ましくは12%以下である。When one or more of MgO, CaO, SrO and BaO are contained, the total content thereof is 20%.
% Is preferable. If it exceeds 20%, devitrification may easily occur. It is more preferably at most 15%, particularly preferably at most 12%.
【0016】本発明のガラスは実質的に上記成分からな
るが、これ以外の成分を合計で10モル%までの範囲
で、より好ましくは5モル%までの範囲で含有してもよ
い。このような成分として、La2O3、CeO2、等の
希土類酸化物、B2O3、SiO2、TiO2、MnO、F
e2O3、CoO、NiO、CuO、Y2O3、ZrO2、
MoO3、Rh2O3、PdO、Ag2O、In2O3、Te
O2、WO3、Bi2O3が例示される。The glass of the present invention consists essentially of the above components, but may contain other components in a total amount of up to 10 mol%, more preferably up to 5 mol%. Such components include rare earth oxides such as La 2 O 3 and CeO 2 , B 2 O 3 , SiO 2 , TiO 2 , MnO, F
e 2 O 3 , CoO, NiO, CuO, Y 2 O 3 , ZrO 2 ,
MoO 3 , Rh 2 O 3 , PdO, Ag 2 O, In 2 O 3 , Te
O 2 , WO 3 and Bi 2 O 3 are exemplified.
【0017】なお、Bi2O3は軟化点を下げる効果を有
するが着色成分でもあり、着色が問題となる用途では好
ましくは4モル%以下、より好ましくは2モル%以下で
ある。このような用途では実質的に含有しないこと、す
なわち不純物レベル以下であることが最も好ましい。Bi 2 O 3 has the effect of lowering the softening point, but is also a coloring component, and is preferably at most 4 mol%, more preferably at most 2 mol% in applications where coloring is a problem. In such an application, it is most preferable that it is not substantially contained, that is, it is not more than the impurity level.
【0018】また、本発明のガラスはPbO、CdOお
よびV2O5のいずれも実質的に含有しない。さらに、本
発明のガラスはF、Cl、等のハロゲン元素も実質的に
含有しないことが好ましい。ハロゲン元素は焼成時にガ
ス化し、PDP、VFD、等における蛍光体と反応して
蛍光体を劣化させたり、また、VFDのフィラメントに
付着してエミッション低下を起したりするおそれがあ
る。Further, the glass of the present invention contains substantially no PbO, CdO or V 2 O 5 . Further, the glass of the present invention preferably does not substantially contain a halogen element such as F or Cl. The halogen element gasifies during firing, and may react with the phosphor in PDP, VFD, etc. to degrade the phosphor, or may adhere to the VFD filament to lower the emission.
【0019】本発明のガラスの粉末をPDP、VFD等
の封着、被覆または隔壁形成に用いる場合、低膨張セラ
ミックスフィラーまたは耐熱顔料と混合してガラスセラ
ミックス組成物として用いてもよい。以下、低膨張セラ
ミックスフィラーまたは耐熱顔料の少なくともいずれか
一方と本発明のガラスの粉末を含有する粉体をガラスセ
ラミックス組成物という。前記低膨張セラミックスフィ
ラーは、膨張係数が70×10-7/℃以下であるセラミ
ックスフィラーであり、ガラスセラミックス組成物を焼
成して得られる焼成物の膨張係数を低下させる成分であ
る。アルミナ、ムライト、ジルコン、コーディエライ
ト、チタン酸アルミニウム、β−スポデュメン、α−石
英、β−石英固溶体およびβ−ユークリプタイトから選
ばれる1種以上の粉末であることが、取り扱いやすさま
たは入手しやすさの点から好ましい。When the glass powder of the present invention is used for sealing, coating, or forming partition walls of PDP, VFD, etc., it may be mixed with a low expansion ceramic filler or a heat-resistant pigment to be used as a glass ceramic composition. Hereinafter, a powder containing at least one of the low expansion ceramic filler and the heat-resistant pigment and the glass powder of the present invention is referred to as a glass ceramic composition. The low expansion ceramic filler is a ceramic filler having an expansion coefficient of 70 × 10 −7 / ° C. or less, and is a component that reduces the expansion coefficient of a fired product obtained by firing a glass ceramic composition. One or more powders selected from alumina, mullite, zircon, cordierite, aluminum titanate, β-spodumene, α-quartz, β-quartz solid solution and β-eucryptite may be easily handled or obtained. It is preferable from the viewpoint of easiness.
【0020】また、耐熱顔料としては、たとえばチタニ
ア等の白色顔料、Fe−Mn複酸化物系、Fe−Co−
Cr複酸化物系、Fe−Mn−Al複酸化物系等の黒色
顔料が挙げられる。Examples of heat-resistant pigments include white pigments such as titania, Fe-Mn double oxides, Fe-Co-
Black pigments such as Cr double oxides and Fe-Mn-Al double oxides are exemplified.
【0021】前記ガラスセラミックス組成物における低
膨張セラミックスフィラーおよび耐熱顔料の含有量の合
計は、本発明のガラスの粉末100質量部に対し100
質量部以下であることが好ましい。100質量部超では
流動性が低下するおそれがある。より好ましくは90質
量部以下、特に好ましくは80質量部以下である。The total content of the low expansion ceramic filler and the heat-resistant pigment in the glass ceramic composition is 100 parts by mass with respect to 100 parts by mass of the glass powder of the present invention.
It is preferable that the amount is not more than part by mass. If it exceeds 100 parts by mass, the fluidity may decrease. It is more preferably at most 90 parts by mass, particularly preferably at most 80 parts by mass.
【0022】前記ガラスセラミックス組成物を焼成して
得られる焼成物の膨張係数は60×10-7〜90×10
-7/℃の範囲にあることが好ましい。膨張係数がこの範
囲外では焼成物と下地のガラスとの膨張マッチングが困
難になるおそれがある。The expansion coefficient of the fired product obtained by firing the glass ceramic composition is 60 × 10 -7 to 90 × 10
It is preferably in the range of -7 / ° C. If the expansion coefficient is out of this range, expansion matching between the fired material and the underlying glass may be difficult.
【0023】前記ガラスセラミックス組成物は、通常は
ビヒクルと混合してガラスペーストとされる。ビヒクル
との混合は、乳鉢、三本ロール、等を用いて行われる。
このガラスペーストをスクリーン印刷等の方法により下
地のガラス、たとえばガラス基板またはガラス基板上に
形成された薄膜の所定部位に塗布し、たとえば600℃
以下で焼成し、封着、被覆、隔壁形成、等を行う。前記
ビヒクルとしては、エチルセルロース、ニトロセルロー
ス、等の樹脂を、α−テルピネオール、ブチルカルビト
ールアセテート、酢酸イソペンチル、等の溶剤に溶解し
たものが通常用いられる。The glass ceramic composition is usually mixed with a vehicle to form a glass paste. Mixing with the vehicle is performed using a mortar, a three-roll mill, or the like.
The glass paste is applied to a predetermined portion of an underlying glass, for example, a glass substrate or a thin film formed on the glass substrate, by a method such as screen printing.
Baking is performed below, and sealing, coating, partition wall formation, and the like are performed. As the vehicle, those obtained by dissolving a resin such as ethyl cellulose or nitrocellulose in a solvent such as α-terpineol, butyl carbitol acetate, or isopentyl acetate are generally used.
【0024】[0024]
【実施例】表のP2O5〜CaOの欄にモル%表示で示し
た組成となるように原料を調合、混合した。なお、P2
O5に関する原料としてはオルトリン酸水溶液またはピ
ロリン酸亜鉛を使用した。前記混合原料を白金ルツボに
入れ1250℃で30分間溶融した。次いで、溶融ガラ
スをステンレス鋼製ローラに流し込んでフレーク化し
た。得られたフレーク状のガラスをアルミナ製ボールミ
ルで105分間粉砕してガラス粉末とした。EXAMPLES Raw materials were prepared and mixed so as to have the composition shown in mol% in the column of P 2 O 5 to CaO in the table. Note that P 2
As a raw material for O 5, an aqueous solution of orthophosphoric acid or zinc pyrophosphate was used. The mixed raw material was put in a platinum crucible and melted at 1250 ° C. for 30 minutes. Next, the molten glass was poured into a stainless steel roller and flaked. The obtained flaky glass was pulverized with an alumina ball mill for 105 minutes to obtain glass powder.
【0025】得られたガラス粉末について、ガラス転移
点Tg(単位:℃)、軟化点Ts(単位:℃)、結晶化ピ
ーク温度Tc(単位:℃)、膨張係数α(単位:10-7
/℃)、溶出量Qd(%)、フローボタン径D(単位:
mm)、フローボタン外観、を測定・評価した。その方
法を以下に、結果を表に示す。With respect to the obtained glass powder, glass transition point T g (unit: ° C.), softening point T s (unit: ° C.), crystallization peak temperature T c (unit: ° C.), expansion coefficient α (unit: 10) -7
/ ° C), elution amount Q d (%), flow button diameter D (unit:
mm) and flow button appearance were measured and evaluated. The method is described below, and the results are shown in the table.
【0026】ガラス転移点、軟化点、結晶化ピーク温
度:平均粒径が10〜20μmのガラス粉末を試料とし
て示差熱分析により昇温速度10℃/分で室温から80
0℃までの範囲で測定した。なお、アルミナ粉末を標準
物質とした。560℃で焼成する場合は、軟化点が56
0℃以下かつ結晶化ピーク温度が620℃以上であるこ
とが好ましい。580℃で焼成する場合は、軟化点が5
80℃以下かつ結晶化ピーク温度が650℃以上である
ことが好ましい。例1、2、4については結晶化ピーク
が認められず、表には∞と記す。Glass transition point, softening point, crystallization peak temperature: A glass powder having an average particle size of 10 to 20 μm is used as a sample and subjected to differential thermal analysis at a temperature rising rate of 10 ° C./min.
It was measured in the range up to 0 ° C. Alumina powder was used as a standard substance. When firing at 560 ° C., the softening point is 56
It is preferable that the crystallization peak temperature is 0 ° C or lower and the crystallization peak temperature is 620 ° C or higher. When firing at 580 ° C., the softening point is 5
It is preferable that the crystallization peak temperature is not higher than 650 ° C and not higher than 80 ° C. For Examples 1, 2, and 4, no crystallization peak was observed, and the results are indicated by Δ in the table.
【0027】膨張係数:前記溶融ガラスをステンレス鋼
製板の上に流し出し、ガラス転移点近傍で徐冷した。徐
冷したガラスを直径2mm、長さ20mmの棒状に加工
したものを試料とし、石英ガラスを標準試料として、示
差熱膨張計により50〜250℃の範囲における平均線
膨張係数を測定した。例5の膨張係数は測定しなかっ
た。Expansion coefficient: The molten glass was poured onto a stainless steel plate and gradually cooled near the glass transition point. A sample obtained by processing the slowly cooled glass into a rod having a diameter of 2 mm and a length of 20 mm was used as a sample, and the average linear expansion coefficient in the range of 50 to 250 ° C. was measured with a differential thermal dilatometer using quartz glass as a standard sample. The expansion coefficient of Example 5 was not measured.
【0028】溶出量:膨張係数測定用試料と同じ試料を
80℃の水に24時間浸漬し、浸漬前後の試料重量から
重量減少率を算出し、%表示とした。この溶出量は耐水
性の指標であり1%以下であることが好ましい。例2、
5、6の溶出量は測定しなかった。Elution amount: The same sample as the sample for measuring the expansion coefficient was immersed in water at 80 ° C. for 24 hours, and the weight loss rate was calculated from the weight of the sample before and after immersion, and expressed as%. This elution amount is an index of water resistance and is preferably 1% or less. Example 2,
The elution amounts of 5 and 6 were not measured.
【0029】フローボタン径:ガラス粉末3gを直径1
2.7mmの円柱状に加圧成形したものを試料とした。
この試料を、例1〜4については560℃に10分間、
例5、6については580℃に10分間、それぞれ保持
した。この加熱処理後の試料の直径を測定した。この直
径は13mm以上であることが好ましく、14mm以上
であることがより好ましい。Flow button diameter: 3 g of glass powder and diameter of 1
A sample formed by pressure-forming into a 2.7 mm cylindrical shape was used as a sample.
This sample was placed at 560 ° C. for 10 minutes for Examples 1-4,
Examples 5 and 6 were kept at 580 ° C. for 10 minutes, respectively. The diameter of the sample after the heat treatment was measured. This diameter is preferably at least 13 mm, more preferably at least 14 mm.
【0030】[0030]
【表1】 [Table 1]
【0031】[0031]
【発明の効果】本発明のガラスを用いることにより、P
DP、VFD、等における封着、被覆、隔壁形成、等を
焼成温度600℃以下で行える。また、本発明のガラス
においてはBi2O3の含有量を抑制でき、高価なBi原
料の使用量を削減できる。By using the glass of the present invention, P
Sealing, coating, partition wall formation, and the like in DP, VFD, and the like can be performed at a firing temperature of 600 ° C. or lower. Further, in the glass of the present invention, the content of Bi 2 O 3 can be suppressed, and the amount of expensive Bi raw material used can be reduced.
フロントページの続き Fターム(参考) 4G062 AA09 BB09 CC10 DA01 DB03 DB04 DC01 DD06 DE04 DE05 DF01 EA01 EA02 EA03 EA04 EB01 EB02 EB03 EB04 EC01 EC02 EC03 EC04 ED01 ED02 ED03 ED04 EE01 EE02 EE03 EE04 EF01 EF02 EF03 EF04 EG01 EG02 EG03 EG04 FA01 FA10 FB01 FC01 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM08 MM25 MM27 NN32 5C032 AA06 AA07 BB18 5C040 GF18 KA08 MA30 5C058 AA11 AA14 BA35 Continued on front page F term (reference) 4G062 AA09 BB09 CC10 DA01 DB03 DB04 DC01 DD06 DE04 DE05 DF01 EA01 EA02 EA03 EA04 EB01 EB02 EB03 EB04 EC01 EC02 EC03 EC04 ED01 ED02 ED03 ED04 EE01 EE02 EF03 EF03 EF03 FA10 FB01 FC01 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 MM03 KK03 KK05 KK05 KK05 KK05 KK05 KK05 KK05 KK05 KK05 KK05 KK03 KK05 KK05 KK05 KK05 AA11 AA14 BA35
Claims (1)
0モル%、MgO+CaO+SrO+BaOが0〜20
モル%である無鉛低融点ガラス。In 1. A following oxides in mol%, P 2 O 5 55~62, ZnO 20~39, Al 2 O 3 3~15, Li 2 O 0~20, Na 2 O 0~20, K 2 O 0~20, MgO 0~20, CaO 0~20, SrO 0~20, BaO 0~20, essentially made from, Li 2 O + Na 2 O + K 2 O is 2-2
0 mol%, MgO + CaO + SrO + BaO is 0 to 20
Lead-free low melting glass which is mol%.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP36946699A JP2001180972A (en) | 1999-12-27 | 1999-12-27 | Lead free glass with low melting point |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP36946699A JP2001180972A (en) | 1999-12-27 | 1999-12-27 | Lead free glass with low melting point |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2001180972A true JP2001180972A (en) | 2001-07-03 |
Family
ID=18494499
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP36946699A Pending JP2001180972A (en) | 1999-12-27 | 1999-12-27 | Lead free glass with low melting point |
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Country | Link |
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JP (1) | JP2001180972A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003128434A (en) * | 2001-10-19 | 2003-05-08 | Matsushita Electric Ind Co Ltd | Plasma display panel and method for manufacturing the same and glass composition |
JP2004075491A (en) * | 2002-08-22 | 2004-03-11 | Toyo Glass Co Ltd | Glass having resistance to hydrofluoric acid |
JP2005063835A (en) * | 2003-08-13 | 2005-03-10 | Fujitsu Hitachi Plasma Display Ltd | Glass composition for plasma display panel formation and plasma display panel using it |
JP2006036570A (en) * | 2004-07-26 | 2006-02-09 | Asahi Glass Co Ltd | Low melting point glass for covering electrode |
JP2007008777A (en) * | 2005-07-01 | 2007-01-18 | Alps Electric Co Ltd | Phosphate-based glass, joining material using the same, magnetic head using the joining material, and plasma display panel |
KR100743986B1 (en) | 2005-12-09 | 2007-07-30 | 주식회사 휘닉스피디이 | Glass composition for forming dielectric of plazma display panel |
KR101166234B1 (en) | 2009-11-16 | 2012-07-16 | (주)세라 | Frit composition for oled display panel sealing and paste composotion comprising said frit composition |
JP2018150216A (en) * | 2017-03-15 | 2018-09-27 | 石塚硝子株式会社 | Method for producing zinc-containing oxide glass and zinc-containing oxide glass member |
CN108996910A (en) * | 2018-09-07 | 2018-12-14 | 苏州融睿电子科技有限公司 | A kind of assembly, mixture, seal glass and preparation method thereof |
-
1999
- 1999-12-27 JP JP36946699A patent/JP2001180972A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003128434A (en) * | 2001-10-19 | 2003-05-08 | Matsushita Electric Ind Co Ltd | Plasma display panel and method for manufacturing the same and glass composition |
JP2004075491A (en) * | 2002-08-22 | 2004-03-11 | Toyo Glass Co Ltd | Glass having resistance to hydrofluoric acid |
JP2005063835A (en) * | 2003-08-13 | 2005-03-10 | Fujitsu Hitachi Plasma Display Ltd | Glass composition for plasma display panel formation and plasma display panel using it |
JP2006036570A (en) * | 2004-07-26 | 2006-02-09 | Asahi Glass Co Ltd | Low melting point glass for covering electrode |
JP2007008777A (en) * | 2005-07-01 | 2007-01-18 | Alps Electric Co Ltd | Phosphate-based glass, joining material using the same, magnetic head using the joining material, and plasma display panel |
JP4597794B2 (en) * | 2005-07-01 | 2010-12-15 | アルプス電気株式会社 | Phosphate glass, bonding material using phosphate glass, magnetic head using the bonding material, and plasma display panel |
KR100743986B1 (en) | 2005-12-09 | 2007-07-30 | 주식회사 휘닉스피디이 | Glass composition for forming dielectric of plazma display panel |
KR101166234B1 (en) | 2009-11-16 | 2012-07-16 | (주)세라 | Frit composition for oled display panel sealing and paste composotion comprising said frit composition |
JP2018150216A (en) * | 2017-03-15 | 2018-09-27 | 石塚硝子株式会社 | Method for producing zinc-containing oxide glass and zinc-containing oxide glass member |
CN108996910A (en) * | 2018-09-07 | 2018-12-14 | 苏州融睿电子科技有限公司 | A kind of assembly, mixture, seal glass and preparation method thereof |
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