JP2001139345A - Leadless low melting point glass and glass frit - Google Patents

Leadless low melting point glass and glass frit

Info

Publication number
JP2001139345A
JP2001139345A JP31999899A JP31999899A JP2001139345A JP 2001139345 A JP2001139345 A JP 2001139345A JP 31999899 A JP31999899 A JP 31999899A JP 31999899 A JP31999899 A JP 31999899A JP 2001139345 A JP2001139345 A JP 2001139345A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
glass
preferably
less
melting point
low melting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP31999899A
Other languages
Japanese (ja)
Inventor
Yasuko Douya
Tsuneo Manabe
Hiroshi Usui
Kazuhiko Yamanaka
康子 堂谷
一彦 山中
恒夫 真鍋
寛 臼井
Original Assignee
Asahi Glass Co Ltd
旭硝子株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/04Frit compositions, i.e. in a powdered or comminuted form containing zinc
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064Glass compositions containing silica with less than 40% silica by weight containing boron
    • C03C3/066Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc

Abstract

PROBLEM TO BE SOLVED: To obtain leadless low melting point glass which is usable for adhesive sealing, coating, etc. of plasma display panels, fluorescent display tubes, etc. and of which the fired matter is colorless or slightly coloring. SOLUTION: This leadless low melting point glass consists of, by molar %, 2 to 20 SiO2, 15 to 35 B2O, 20 to 50 ZnO, 1 to 18 Bi2O3, 2 to 15 Li2O+Na2O +K2O, 0 to 22 MgO+CaO+SrO+BaO and 0 to 8 Al2O3+ZrO2+SnO3+CeO2.

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【発明の属する技術分野】本発明は、プラズマディスプレイパネル(PDP)、蛍光表示管(VFD)等における封着、被覆、隔壁形成に好適な無鉛低融点ガラスおよびガラスフリットに関する。 The present invention relates to the plasma display panel (PDP), sealing in the fluorescent display tube (VFD) or the like, coated, of a preferred lead-free low-melting-point glass and glass frit septum formation.

【0002】 [0002]

【従来の技術】PDP、VFDの封着用、被覆用、または隔壁形成用のガラスフリットに用いられるガラス粉末のガラスとして、軟化点が560℃以下であり、焼成時に結晶化しにくく、焼成後のガラスが無色または低着色であり、また、鉛およびカドミウムのいずれも含まない低融点ガラスが求められている。 BACKGROUND ART PDP, sealing of VFD, as the glass of the glass powder used in the glass frit for coating or forming barrier ribs, and a softening point of 560 ° C. or less, hardly crystallize during firing, glass after firing There is a colorless or low color, also, low-melting glass has been required that does not contain any lead and cadmium. このような無鉛低融点ガラスとして、シリカホウ酸亜鉛系ガラスやホウ酸亜鉛ビスマス系ガラスが考えられる。 Such lead-free low-melting-point glass, it is considered Shirikahou zinc-based glass and zinc borate bismuth glass.

【0003】たとえば、特開平2−102147号公報に開示されているシリカホウ酸亜鉛系ガラスのアルカリ金属酸化物含有量を増加させて軟化点を低下させることが考えられるが、この場合、膨張係数が大きくなりすぎる、焼成時に結晶化しやすくなる、等の問題が起るおそれがある。 For example, it is conceivable to lower the softening point to increase the alkali metal oxide content of Shirikahou zinc-based glass disclosed in JP-A-2-102147, in this case, the expansion coefficient too large, tends to crystallize upon firing, there is a possibility that problems such occurs. また、特開平7−291656号公報に開示されているホウ酸亜鉛ビスマス系ガラスのBi 23含有量を増加させて軟化点を低下させることも考えられるが、この場合、濃い着色が起るおそれがある。 Moreover, it is conceivable to lower the softening point to increase the content of Bi 2 O 3 zinc borate bismuth glass disclosed in JP-A-7-291656, occurs in this case, dark colored I fear there is.

【0004】 [0004]

【発明が解決しようとする課題】本発明は、以上の課題を解決する無鉛低融点ガラスおよびガラスフリットの提供を目的とする。 [0008] The present invention has an object to provide a lead-free low-melting-point glass and glass frit to solve the above problems.

【0005】 [0005]

【課題を解決するための手段】本発明は、下記酸化物基準のモル%表示で、SiO 2 :2〜20、B 23 :15 SUMMARY OF THE INVENTION The present invention, in mol% based on the following oxides, SiO 2: 2~20, B 2 O 3: 15
〜35、ZnO:20〜50、Bi 23 :1〜18、L ~35, ZnO: 20~50, Bi 2 O 3: 1~18, L
2 O:0〜15、Na 2 O:0〜15、K 2 O:0〜1 i 2 O: 0~15, Na 2 O: 0~15, K 2 O: 0~1
5、MgO:0〜20、CaO:0〜20、SrO:0 5, MgO: 0~20, CaO: 0~20, SrO: 0
〜20、BaO:0〜20、Al 23 :0〜8、ZrO ~20, BaO: 0~20, Al 2 O 3: 0~8, ZrO
2 :0〜8、SnO 2 :0〜8、CeO 2 :0〜8、から実質的になり、Li 2 O+Na 2 O+K 2 Oが2〜15モル%であり、かつ、MgO+CaO+SrO+BaOが0〜22モル%であり、かつ、Al 23 +ZrO 2 +S 2: 0~8, SnO 2: 0~8 , CeO 2: 0~8, essentially made from, Li 2 O + Na 2 O + K 2 O is from 2 to 15 mol%, and, MgO + CaO + SrO + BaO is 0 to 22 mol a%, and, Al 2 O 3 + ZrO 2 + S
nO 2 +CeO 2が0〜8モル%である無鉛低融点ガラス、および、低膨張セラミックスフィラーおよび耐熱顔料の少なくともいずれか一方と、前記無鉛低融点ガラスの粉末を含有するガラスフリットを提供する。 nO 2 + lead-free low-melting-point glass CeO 2 is 0-8 mol%, and, one at least one of the low expansion ceramic filler and heat pigments, to provide a glass frit containing a powder of the lead-free low-melting-point glass.

【0006】 [0006]

【発明の実施の形態】本発明の無鉛低融点ガラス(以下単に本発明のガラスという。)を、封着、被覆、または隔壁形成に用いるときは、粉末化して使用される。 DETAILED DESCRIPTION OF THE INVENTION lead-free low-melting-point glass of the present invention (hereinafter simply referred to as the glass of the present invention.) The, when used for sealing, coating, or the partition wall formation is used in powdered. この粉末化されたガラスは通常、必要に応じて低膨張セラミックスフィラー、耐熱顔料、等と混合され、次にビヒクルと混練してペースト化される。 The powdered glass is usually low expansion ceramic filler if necessary, heat pigments, are mixed with an equal, it is then vehicle and kneaded to make a paste with. このガラスペーストは下地のガラスの所定部位に塗布され、焼成される。 This glass paste is applied to a predetermined portion of the glass base, it is fired. ここでいう下地のガラスは、ガラスの上に透明電導膜等が被覆されているものも含む。 Glass base mentioned here, including those transparent conductive film or the like on the glass is coated.

【0007】本発明のガラスの軟化点(T s )は560 [0007] The softening point of the glass of the present invention (T s) is 560
℃以下であることが好ましい。 ℃ that it is preferably less. 560℃超では、PD 560 ℃ in the greater, PD
P、VFD等の封着、被覆、または隔壁形成に用いることが困難になるおそれがある。 P, sealing etc. VFD, it may become difficult to use in the coating, or the partition wall formation. より好ましくは550℃ More preferably 550 ℃
以下である。 Less.

【0008】本発明のガラスの結晶化温度(T c )はT s [0008] The crystallization temperature of the glass of the present invention (T c) is T s
よりも50℃以上高いことが好ましい。 It is preferably higher than 50 ° C. than. ここで、T cは示差熱分析(DTA)によって得られる結晶化ピーク温度であり、結晶化ピークが認められない場合は、T c Here, T c is the peak crystallization temperature obtained by differential thermal analysis (DTA), if the crystallization peak is not observed, T c =
∞とする。 ∞ to. cとT sの差(T c −T s )が50℃未満では焼成時に結晶化しやすくなるおそれがある。 The difference between the T c and T s (T c -T s) may become easily crystallized during firing is less than 50 ° C.. (T c (T c -
T s )は60℃以上であることがより好ましく、80℃ s) of more preferably at 60 ° C. or higher, 80 ° C.
以上であることが特に好ましい。 By particularly preferably more. 前記結晶化ピークが認められず、(T c −T s )が∞となることが最も好ましい。 The crystallization peak is not observed, it is most preferable that the ∞ is (T c -T s).

【0009】本発明のガラスの50〜350℃における平均線膨張係数は120×10 -7 /℃以下であることが好ましい。 [0009] The average linear expansion coefficient at 50 to 350 ° C. of glass of the present invention is preferably not more than 120 × 10 -7 / ℃. 120×10 -7 /℃超では、後述の本発明のガラスフリットの焼成物の前記平均線膨張係数が大きくなりすぎるおそれがある。 The 120 × 10 -7 / ℃ greater, there is a possibility that the average coefficient of linear expansion of the burned material of the glass frit of the present invention described later is too large. より好ましくは110×10 More preferably 110 × 10
-7 /℃以下、特に好ましくは100×10 -7 /℃以下である。 -7 / ° C. or less, particularly preferably 100 × 10 -7 / ℃ or less. 以下、50〜350℃における平均線膨張係数を単に膨張係数という。 Hereinafter referred to simply as expansion coefficient average linear expansion coefficient at 50 to 350 ° C..

【0010】次に、本発明のガラスの組成について、モル%を単に%と記して以下に説明する。 [0010] Next, the composition of the glass of the present invention will be described below with marked simply% mol%. SiO 2はネットワークフォーマであり必須である。 SiO 2 is an essential a network former. 2%未満ではガラス化が困難になる。 Vitrification tends to be difficult with less than 2%. 好ましくは3%以上、より好ましくは4%以上、さらに好ましくは5%以上、特に好ましくは10%以上である。 Preferably 3% or more, more preferably 4% or more, more preferably 5% or more, particularly preferably 10% or more. 20%超では軟化点が高くなりすぎる。 If it exceeds 20%, the softening point is too high. 好ましくは19%以下、より好ましくは14%以下である。 Preferably 19% or less, more preferably 14% or less.

【0011】B 23はガラスを安定化し、また流動性を増加させる成分であり、必須である。 [0011] B 2 O 3 is to stabilize the glass, also a component that increases the fluidity and is essential. 15%未満ではガラス化が困難になる。 Vitrification tends to be difficult with less than 15%. 好ましくは18%以上、より好ましくは21%以上である。 Preferably 18% or more, more preferably 21% or more. 35%超では化学的耐久性が低下する。 Chemical durability is lowered by more than 35%. 好ましくは30%以下、より好ましくは25 Preferably 30% or less, more preferably 25
%以下である。 % Or less.

【0012】ZnOは軟化点を下げ、また失透を抑制する成分であり、必須である。 [0012] ZnO lowers the softening point, also is a component to suppress devitrification, is essential. 20%未満では軟化点が高くなりすぎ、また失透しやすくなる。 In less than 20% excessively high softening point, also it tends to be devitrified. 好ましくは30% Preferably 30%
以上、より好ましくは32%以上、特に好ましくは35 Or more, more preferably 32% or more, particularly preferably 35
%以上である。 Or more percent. 50%超ではガラス化が困難になる。 Vitrification tends to be difficult at greater than 50%. 好ましくは48%以下、より好ましくは45%以下である。 Preferably less 48%, more preferably 45% or less.

【0013】Bi 23は軟化点を下げ流動性を増加させる成分であり、必須である。 [0013] Bi 2 O 3 is a component to increase the flowability lowers the softening point, is essential. 1%未満では軟化点が高くなりすぎる。 Softening point becomes too high is less than 1%. 好ましくは2%以上、より好ましくは3% Preferably 2% or more, more preferably 3%
以上である。 Or more. 18%超では化学的耐久性が低下する、または濃い着色が起る。 In 18 percent decrease chemical durability, or dark coloration occurs. 好ましくは16%以下、より好ましくは15%以下、特に好ましくは14%以下である。 Preferably 16% or less, more preferably 15% or less, particularly preferably 14% or less.

【0014】Li 2 O、Na 2 OおよびK 2 Oはいずれも軟化点を下げ流動性を増加させる成分であり、これら3 [0014] Li 2 O, Na 2 O and K 2 O are components to both increase the fluidity lowers the softening point, these 3
成分のうちの1種以上を含有しなければならない。 It must contain one or more of the ingredients. Li Li
2 O、Na 2 OおよびK 2 Oの含有量はそれぞれ15%以下でなければならない。 2 O, the content of Na 2 O and K 2 O should be 15% or less, respectively. 15%超では膨張係数が大きくなりすぎる、または化学的耐久性が低下する。 In 15 percent expansion coefficient becomes too large, or the chemical durability is lowered. 好ましくは10%以下である。 Preferably 10% or less.

【0015】Li 2 O、Na 2 OおよびK 2 Oの含有量の合計(R 2 O計)は2〜15%の範囲になければならない。 [0015] Li 2 O, the total content of Na 2 O and K 2 O (R 2 O meter) should be in the range of 2-15%. 2%未満では軟化点が高くなりすぎる。 Softening point is less than 2% too high. 好ましくは4%以上である。 Preferably 4% or more. Bi 23の含有量が6%以下の場合には、R 2 O計が4%以上であることが特に望まれる。 If the content of Bi 2 O 3 is less than 6%, it is particularly desired R 2 O meter is 4% or more. 2 R 2
O計が15%超では膨張係数が大きくなりすぎる、または化学的耐久性が低下する。 O meter expansion coefficient becomes too large exceeds 15%, or the chemical durability is lowered. 好ましくは10%以下である。 Preferably 10% or less.

【0016】MgO、CaO、SrOおよびBaOはいずれも必須ではないが、失透を抑制するために、または焼成時の結晶化を抑制するために、それぞれ20%まで含有してもよい。 [0016] MgO, CaO, although SrO and BaO is not essential, but in order to suppress devitrification, or to suppress crystallization during firing, may contain up to 20%, respectively. 20%超ではガラス化が困難になるおそれがある、または軟化点が高くなりすぎるおそれがある。 If it exceeds 20% there is a risk that there is a possibility that vitrification tends to be difficult, or the softening point becomes too high. より好ましくは15%以下、特に好ましくは12% More preferably 15% or less, particularly preferably 12%
以下である。 Less.

【0017】MgO、CaO、SrO、BaOのうちの1種以上を含有する場合、その含有量の合計は22%以下でなければならない。 [0017] MgO, CaO, SrO, when containing one or more of BaO, the total content thereof must be less than 22%. 22%超ではガラス化が困難になるおそれがある、または軟化点が高くなりすぎるおそれがある。 22-percent there might be a risk that vitrification tends to be difficult, or the softening point becomes too high. より好ましくは20%以下、さらに好ましくは15%以下、特に好ましくは14%以下である。 More preferably 20% or less, more preferably 15% or less, particularly preferably 14% or less.

【0018】Al 23 、ZrO 2 、SnO 2およびCeO [0018] Al 2 O 3, ZrO 2, SnO 2 and CeO
2はいずれも必須ではないが、膨張係数を低下させる効果、または、化学的耐久性を高くする効果を有し、それぞれ8%まで含有してもよい。 Although 2 is not essential, but the effect to lower the coefficient of expansion, or has the effect of increasing the chemical durability may contain up to 8%, respectively. 8%超では軟化点が高くなりすぎるおそれがある。 In 8 percent there is a possibility that the softening point becomes too high. より好ましくは6%以下、特に好ましくは5%以下である。 More preferably 6% or less, particularly preferably 5% or less.

【0019】Al 23 、ZrO 2 、SnO 2 、CeO 2のうちの1種以上を含有する場合、その含有量の合計は8 [0019] Al 2 O 3, ZrO 2, SnO 2, if it contains one or more of CeO 2, the sum of the content 8
%以下でなければならない。 % Be must less. 8%超では軟化点が高くなりすぎるおそれがある。 In 8 percent there is a possibility that the softening point becomes too high. より好ましくは7%以下、特に好ましくは6%以下である。 More preferably 7% or less, particularly preferably not more than 6%. SnO 2およびCeO 2は、 SnO 2 and CeO 2 is,
上記効果の他にBi 23含有に伴なう着色を低減させる効果を有する。 It has the effect of reducing the accompanying colored Bi 2 O 3 contained in addition to the above effects. Bi 23の含有量が6%以上である場合、SnO 2およびCeO 2の少なくともいずれか一方を含有することが好ましい。 If the content of Bi 2 O 3 is at least 6%, preferably contains at least one of SnO 2 and CeO 2.

【0020】SnO 2およびCeO 2のうちの1種以上を含有する場合、その含有量の合計は0.1%以上であることが好ましい。 [0020] When containing one or more of SnO 2 and CeO 2, it is preferable that the total content is 0.1% or more. 0.1%未満では上記効果が小さくなりすぎるおそれがある。 If it is less than 0.1% there is a possibility that the effect is too small. より好ましくは0.3%以上、 More preferably 0.3% or more,
特に好ましくは0.5%以上である。 Particularly preferably at least 0.5%. SnO 2およびC SnO 2 and C
eO 2のいずれも含有しない場合、Bi 23の含有量は6%未満であることが好ましい。 If none of eO 2 free, the content of Bi 2 O 3 is preferably less than 6%. より好ましくは5%以下、特に好ましくは4%以下、最も好ましくは3%以下である。 More preferably 5% or less, particularly preferably 4% or less, and most preferably 3% or less.

【0021】本発明のガラスは実質的に上記成分からなるが、これ以外の成分を合計で5モル%まで含有してもよい。 The glass of the present invention consists essentially of the above components, but may contain up to 5 mol% in total of other components. このような成分として、La 23等の希土類酸化物、P 25 、TiO 2 、MnO、Fe 23 、CoO、N Such components include rare earth oxides such as La 2 O 3, P 2 O 5, TiO 2, MnO, Fe 2 O 3, CoO, N
iO、CuO、GeO 2 、Y 23 、MoO 3 、Rh 23 iO, CuO, GeO 2, Y 2 O 3, MoO 3, Rh 2 O 3,
Ag 2 O、In 23 、TeO 2 、WO 3 、ReO 2 、が例示される。 Ag 2 O, In 2 O 3 , TeO 2, WO 3, ReO 2, is illustrated. なお、PbO、CdO、V 25についてはいずれも実質的に含有せず、不純物レベル以下である。 Incidentally, PbO, CdO, without also contains essentially all for V 2 O 5, or less impurity levels.

【0022】本発明のガラスフリットは本発明のガラスの粉末を含有し、この他に、低膨張セラミックスフィラー、耐熱顔料のうちの少なくとも一方を含有する。 The glass frit of the present invention containing a powder of the glass of the present invention, In addition, the low expansion ceramic filler contains at least one of the heat-resistant pigment. ここでいう低膨張セラミックスフィラーは、膨張係数が70 Low expansion ceramic filler mentioned here, the expansion coefficient of 70
×10 -7 /℃以下であるセラミックスフィラーであり、 × a ceramic filler is 10 -7 / ° C. or less,
アルミナ、ムライト、ジルコン、コーディエライト、チタン酸アルミニウム、β−スポデュメン、α−石英、β Alumina, mullite, zircon, cordierite, aluminum titanate, beta-Supodeyumen, alpha-quartz, beta
−石英固溶体およびβ−ユークリプタイトから選ばれる1種以上の粉末であることが、取り扱いやすさまたは入手しやすさの点から好ましい。 - it is at least one powder selected from quartz solid solution and β- eucryptite is preferred from the viewpoint of easiness or easy availability handling. また、耐熱顔料として、 Further, as the heat-resistant pigment,
たとえばチタニア等の白色顔料、Fe−Mn複酸化物系、Fe−Co−Cr複酸化物系、Fe−Mn−Al複酸化物系等の黒色顔料が挙げられる。 For example a white pigment such as titania, Fe-Mn double oxide, Fe-Co-Cr mixed oxide systems include black pigment Fe-Mn-Al composite oxide system or the like.

【0023】本発明のガラスフリットを焼成して得られる焼成物の膨張係数は60×10 -7 〜90×10 -7 /℃ The expansion coefficient of the fired product obtained by firing the glass frit of the present invention is 60 × 10 -7 ~90 × 10 -7 / ℃
の範囲にあることが好ましい。 It is preferably in the range of. 膨張係数がこの範囲外では焼成物と下地のガラスとの膨張マッチングが困難になるおそれがある。 Expansion coefficient outside this range, there is a possibility that expansion matching with glass of the burned material and the underlying becomes difficult.

【0024】次に本発明のガラスフリットの組成について説明する。 [0024] Next will be described the composition of the glass frit of the present invention. 本発明のガラスの粉末は必須である。 Powder of the glass of the present invention is essential. その含有量は50〜99.9体積%であることが好ましい。 Its content is preferably 50 to 99.9% by volume.
50体積%未満ではガラスフリットの焼成時の流動性が小さくなりすぎるおそれがある。 There is a possibility that the fluidity at the time of firing the glass frit too small at less than 50% by volume. より好ましくは55体積%以上、特に好ましくは60体積%以上である。 More preferably 55% by volume or more, particularly preferably 60 vol% or more. また、その含有量が99.9体積%超では、低膨張セラミックスフィラーまたは耐熱顔料の含有量が小さくなりすぎる。 Moreover, its content is 99.9 vol%, the content of the low expansion ceramic filler or heat pigment becomes too small. より好ましくは99体積%以下、特に好ましくは98体積%以下である。 More preferably 99 vol% or less, particularly preferably not more than 98 vol%.

【0025】低膨張セラミックスフィラーは、膨張係数を小さくするために50体積%まで含有してもよい。 The low expansion ceramic filler may be contained up to 50% by volume in order to reduce the coefficient of expansion. 5
0体積%超では焼成時の流動性が小さくなりすぎるおそれがある。 0 The volume percent there is a possibility that fluidity at the time of firing becomes too small. より好ましくは45体積%以下、特に好ましくは40体積%以下である。 More preferably 45 vol% or less, particularly preferably not more than 40 vol%. また、低膨張セラミックスフィラーを含有する場合はその含有量は1体積%以上であることがより好ましく、2体積%以上であることが特に好ましい。 Further, the content case containing a low expansion ceramic filler is more preferably 1 vol% or more, and particularly preferably 2% by volume or more. 耐熱顔料は、必要に応じて40体積%まで含有してもよい。 Heat pigment may contain up to 40 vol% when necessary. 40体積%超では焼成時の流動性が小さくなりすぎるおそれがある。 The 40 volume percent there is a fear that fluidity at the time of firing becomes too small.

【0026】低膨張セラミックスフィラー、耐熱顔料のうちの少なくとも一方を含有しなければならないが、両者の含有量の合計は0.1〜50体積%であることが好ましい。 The low expansion ceramic filler, but must contain at least one of heat-resistant pigment, it is preferred that the total of both the content is 0.1 to 50% by volume. より好ましくは1〜45体積%、特に好ましくは2〜40体積%である。 More preferably 1 to 45% by volume, particularly preferably from 2 to 40% by volume.

【0027】本発明のガラスフリットは、通常はビヒクルと混合してガラスペーストとされる。 The glass frit of the present invention is usually a glass paste was mixed with a vehicle. ビヒクルとの混合は、乳鉢、三本ロール、等を用いて行われる。 Mixing with vehicle, mortar, it is performed using a three-roll, or the like. このガラスペーストをスクリーン印刷等の方法により下地のガラス、たとえばガラス基板またはガラス基板上に形成された薄膜の所定部位に塗布し、620℃以下、たとえば570℃で焼成し、封着、被覆、隔壁形成、等を行う。 The glass paste of a glass of the base by a method such as screen printing, applied for example to a predetermined portion of the thin film formed on a glass substrate or a glass substrate, 620 ° C. or less, for example, and fired at 570 ° C., sealing, coating, bulkhead formation, etc. carried out.
前記ビヒクルとしては、エチルセルロース、ニトロセルロース、等の樹脂を、α−テルピネオール、ブチルカルビトールアセテート、酢酸イソペンチル、等の溶剤に溶解したものが通常用いられる。 As the vehicle, ethyl cellulose, nitrocellulose, a resin etc., alpha-terpineol, butyl carbitol acetate, isopentyl acetate, is prepared by dissolving in a solvent like usually used.

【0028】 [0028]

【実施例】表のSiO 2 〜CeO 2の欄にモル%表示で示した組成となるように原料を調合、混合して白金るつぼに入れ、1300℃に加熱し30分間溶融した。 EXAMPLES Formulation raw materials so as to have the composition shown by mol% in the column of SiO 2 ~CeO 2 of table, placed in a platinum crucible and mixed, melted and heated to 1300 ° C. 30 min. 次いで溶融ガラスをステンレス製ローラに流し込んでフレーク化した。 Then flaked by pouring molten glass into a stainless steel roller. 得られたフレーク状のガラスをアルミナ製ボールミルで105分間粉砕してガラス粉末とした。 The obtained flaky glass was ground for 105 minutes in a ball mill made of alumina and glass powder.

【0029】得られたガラス粉末について、ガラス転移点T g (単位:℃)、軟化点T s (単位:℃)、結晶化ピーク温度T c (単位:℃)、膨張係数α(単位:10 -7 [0029] The glass powder obtained, the glass transition point T g (unit: ° C.), a softening point T s (unit: ° C.), crystallization peak temperature T c (unit: ° C.), the expansion coefficient alpha (unit: 10 -7
/℃)、溶出量Q d (%)、フローボタン径D(単位: / ° C.), elution amount Q d (%), the flow button diameter D (unit:
mm)、フローボタン外観、フローボタン着色性を測定・評価した。 mm), flow button appearance were measured and evaluated flow button colorability. その方法を以下に、結果を表に示す。 The method below, the results shown in the tables. 例1 Example 1
〜12は実施例、例13、14は比較例である。 12 embodiment, Examples 13 and 14 are Comparative Examples.

【0030】ガラス転移点、軟化点、結晶化ピーク温度:平均粒径が10〜20μmのガラス粉末を試料として示差熱分析により昇温速度10℃/分で室温から80 The glass transition point, softening point, crystallization peak temperature: 80 from room at a heating rate 10 ° C. / min by differential thermal analysis of the glass powder having an average particle diameter of 10~20μm as a sample
0℃までの範囲で測定した。 It was measured in the range of up to 0 ℃. なお、アルミナ粉末を標準物質とした。 Incidentally, the alumina powder as a standard substance. 結晶化ピークが認められないものの結晶化ピーク温度は∞とした。 Crystallization peak temperature of which crystallization peak is not observed was ∞.

【0031】膨張係数:前記溶融ガラスをステンレス製板の上に流し出し、ガラス転移点近傍で徐冷した。 The expansion coefficient: the molten glass was cast on a stainless steel plate, gradually cooled in the vicinity of glass transition point. 徐冷したガラスを直径2mm、長さ20mmの棒状に加工したものを試料とし、石英ガラスを標準試料として、示差熱膨張計により50〜350℃の範囲における平均線膨張係数を測定した。 Gradually cooled glass diameter 2 mm, a material obtained by machining a rod of length 20mm and a sample, a quartz glass as a standard sample was measured average linear expansion coefficient in the range of 50 to 350 ° C. by differential thermal dilatometer.

【0032】溶出量:膨張係数測定用試料と同じ試料を80℃の水に24時間浸漬し、浸漬前後の試料重量から重量減少率を算出し、これを%表示とした。 The elution amount: the same sample as expansion coefficient measurement sample was immersed for 24 hours in 80 ° C. water, to calculate the weight loss from the sample weight before and after immersion was to as percentages. この溶出量は化学的耐久性の指標であり、0.1%以下であることが好ましく、0.02%以下であることがより好ましく、0.01%未満であることが特に好ましい。 The elution volume is an indicator of chemical durability, preferably 0.1% or less, more preferably 0.02% or less, particularly preferably less than 0.01%.

【0033】フローボタン径:ガラス粉末4gを直径1 [0033] Flow button diameter: the glass powder 4g diameter 1
2.7mmの円柱状に加圧成形したものを試料とし、これを560℃に10分間保持した。 A material obtained by compression molding a sample into a cylindrical 2.7 mm, and held for 10 minutes to a 560 ° C.. この加熱処理後の試料の直径を測定した。 The diameter of the sample after the heat treatment were measured. この直径は12mm以上であることが好ましく、14mm以上であることがより好ましい。 Preferably this diameter is 12mm or more, and more preferably 14mm or more. なお、例14のガラスの粉末は前記加熱処理によっては焼結せず、フローボタン径を測定できなかった。 Incidentally, the powder of the glass of Example 14 was not sintered by the heat treatment, could not be measured flows button diameter.

【0034】フローボタン外観:フローボタン径の測定によって得られた前記加熱処理後の試料の外観を観察した。 [0034] Flow button Appearance: observing the appearance of the sample after the heat treatment obtained by measurement of the flow button diameter. 光沢があることが好ましい。 It is preferred that there is a gloss. 光沢があるものを○、 ○ what shiny,
不透明であり光沢がないものを×、でそれぞれ示した。 Opaque and × what matte, in respectively shown.

【0035】フローボタン着色性:フローボタン径の測定によって得られた前記加熱処理後の試料の着色の程度を観察した。 [0035] Flow button coloring: the degree of coloration was observed in the sample after the heat treatment obtained by measurement of the flow button diameter. 無色またはほとんど無色のものを○、少し着色が認められるものを△、でそれぞれ示した。 Colorless or nearly ○ a colorless ones, what is observed lightly colored △, in respectively shown.

【0036】 [0036]

【表1】 [Table 1]

【0037】 [0037]

【表2】 [Table 2]

【0038】次に、例5のガラスの粉末(平均粒径3. Next, the glass of Example 5 powder (average particle size 3.
5μm)、アルミナの粉末(平均粒径1μm)およびチタニア粉末(平均粒径0.5μm)を体積比74:2 5 [mu] m), alumina powder (average particle size 1 [mu] m) and titania powder (average particle size 0.5 [mu] m) at a volume ratio of 74: 2
1:5で混合したガラスフリット100gと、α−テルピネオールにエチルセルロースを溶解した有機ビヒクル25gとを混練しガラスペーストを作製した。 1: a glass frit 100g mixed with 5, and an organic vehicle 25g prepared by dissolving ethyl cellulose in α- terpineol were kneaded to prepare an glass paste. このガラスペーストを用いたPDPの隔壁形成を以下のようにして行った。 Forming barrier ribs of a PDP using the glass paste was performed as follows.

【0039】ソーダライムシリカガラス基板に前記ガラスペーストをブレードコートし、120℃で30分間乾燥して厚さ200μmの層を形成した。 [0039] A soda lime silica glass substrate to the glass paste blade coating to form a layer having a thickness of 200μm and dried for 30 minutes at 120 ° C.. この層の上にドライフィルムレジスト(東京応化工業社製 BF−60 Dry film resist on the layer (made by Tokyo Ohka Kogyo Co., Ltd. BF-60
3)をラミネートし、隔壁パターンの露光マスクをセットして、250mJ/cm 2で露光した。 3) was laminated, by setting the exposure mask barrier rib pattern was exposed at 250 mJ / cm 2. これを濃度3 This concentration of 3
g/Lの炭酸ナトリウム水溶液で現像し、次に、研磨剤(不二製作所社製 S4#600)を噴出圧力0.2M It developed in g / L sodium carbonate aqueous solution, then, abrasives (Fuji Manufacturing Co. S4 # 600) ejection pressure 0.2M
Paで吹き付けるサンドブラストにより切削した。 It was cut by sandblasting blowing in Pa. 切削後、残ったドライフィルムを10g/Lの水酸化ナトリウム水溶液で剥離した。 After cutting, peeling the remaining dry film in aqueous sodium hydroxide 10 g / L.

【0040】次に、570℃で10分間焼成し隔壁を形成した。 Next, barrier ribs were formed by firing at 570 ° C. 10 min. 隔壁が形成されたガラス基板を切断し、隔壁断面を電子顕微鏡で観察した。 Cutting the glass substrate which barrier rib was observed bulkhead section with an electron microscope. 断面には大きさが3μm以上の空隙は認められず、隔壁は緻密であった。 It is not observed or more voids 3μm size in cross-section, the partition wall was dense. また、隔壁形状も良好であった。 Further, the partition wall forms are preferable.

【0041】 [0041]

【発明の効果】本発明のガラスを用いることにより、P By using the glass of the present invention according to the present invention, P
DP、VFD、等における封着、被覆、隔壁形成、等に使用できる無色または低着色の焼成物が得られる。 DP, VFD, sealing the like, coating, forming barrier ribs, baked colorless or low color that can be used like can be obtained. また、本発明のガラスフリットを用いることにより、PD Further, by using the glass frit of the present invention, PD
P、VFD、等における封着、被覆、隔壁形成を、色調の自由度を維持しつつ行える。 P, VFD, sealing the like, allows the coating, the partition wall forming, while maintaining the flexibility of the shade.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 真鍋 恒夫 神奈川県横浜市神奈川区羽沢町1150番地 旭硝子株式会社内 Fターム(参考) 4G062 AA09 BB05 DA03 DA04 DB01 DB02 DB03 DC04 DC05 DD01 DE04 DE05 DF01 EA01 EA02 EA03 EA04 EB01 EB02 EB03 EB04 EC01 EC02 EC03 EC04 ED01 ED02 ED03 ED04 EE01 EE02 EE03 EE04 EF01 EF02 EF03 EF04 EG01 EG02 EG03 EG04 FA01 FB01 FC01 FC02 FC03 FD01 FE01 FE02 FE03 FF01 FG01 FH01 FJ01 FK01 FL01 FL02 FL03 GA03 GA04 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM08 MM31 NN32 ────────────────────────────────────────────────── ─── front page of the continuation (72) inventor Tsuneo Manabe Kanagawa Prefecture, Kanagawa-ku, Yokohama-shi Hazawa-cho, 1150 address by Asahi Glass Co., Ltd. in the F-term (reference) 4G062 AA09 BB05 DA03 DA04 DB01 DB02 DB03 DC04 DC05 DD01 DE04 DE05 DF01 EA01 EA02 EA03 EA04 EB01 EB02 EB03 EB04 EC01 EC02 EC03 EC04 ED01 ED02 ED03 ED04 EE01 EE02 EE03 EE04 EF01 EF02 EF03 EF04 EG01 EG02 EG03 EG04 FA01 FB01 FC01 FC02 FC03 FD01 FE01 FE02 FE03 FF01 FG01 FH01 FJ01 FK01 FL01 FL02 FL03 GA03 GA04 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM08 MM31 NN32

Claims (2)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】下記酸化物基準のモル%表示で、 SiO 2 2〜20、 B 23 15〜35、 ZnO 20〜50、 Bi 23 1〜18、 Li 2 O 0〜15、 Na 2 O 0〜15、 K 2 O 0〜15、 MgO 0〜20、 CaO 0〜20、 SrO 0〜20、 BaO 0〜20、 Al 23 0〜8、 ZrO 2 0〜8、 SnO 2 0〜8、 CeO 2 0〜8、 から実質的になり、Li 2 O+Na 2 O+K 2 Oが2〜1 In 1. A following oxides represented by mol%, SiO 2 2~20, B 2 O 3 15~35, ZnO 20~50, Bi 2 O 3 1~18, Li 2 O 0~15, Na 2 O 0~15, K 2 O 0~15 , MgO 0~20, CaO 0~20, SrO 0~20, BaO 0~20, Al 2 O 3 0~8, ZrO 2 0~8, SnO 2 0 ~8, CeO 2 0~8, essentially made from, Li 2 O + Na 2 O + K 2 O is 2-1
    5モル%であり、かつ、MgO+CaO+SrO+Ba 5 is the mole%, and, MgO + CaO + SrO + Ba
    Oが0〜22モル%であり、かつ、Al 23 +ZrO 2 O is 0 to 22 mol%, and, Al 2 O 3 + ZrO 2
    +SnO 2 +CeO 2が0〜8モル%である無鉛低融点ガラス。 + Lead-free low-melting-point glass SnO 2 + CeO 2 is 0-8 mol%.
  2. 【請求項2】低膨張セラミックスフィラーおよび耐熱顔料の少なくともいずれか一方と、請求項1に記載の無鉛低融点ガラスの粉末を含有するガラスフリット。 Wherein one of at least one of the low expansion ceramic filler and refractory pigments, glass frit containing a powder of lead-free low-melting-point glass according to claim 1.
JP31999899A 1999-11-10 1999-11-10 Leadless low melting point glass and glass frit Granted JP2001139345A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31999899A JP2001139345A (en) 1999-11-10 1999-11-10 Leadless low melting point glass and glass frit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31999899A JP2001139345A (en) 1999-11-10 1999-11-10 Leadless low melting point glass and glass frit

Publications (1)

Publication Number Publication Date
JP2001139345A true true JP2001139345A (en) 2001-05-22

Family

ID=18116619

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31999899A Granted JP2001139345A (en) 1999-11-10 1999-11-10 Leadless low melting point glass and glass frit

Country Status (1)

Country Link
JP (1) JP2001139345A (en)

Cited By (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003034550A (en) * 2001-07-24 2003-02-07 Asahi Glass Co Ltd Lead-free glass, glass frit, glass paste, electronic circuit part and electronic circuit
WO2005007591A1 (en) * 2003-07-18 2005-01-27 Asahi Glass Company, Limited Lead-free glass, glass powder of electrode coating, and plasma display
US6987358B2 (en) 2002-08-08 2006-01-17 Asahi Glass Company, Limited Glass for covering electrodes, colored powder for covering electrodes and plasma display device
EP1645548A1 (en) * 2003-08-04 2006-04-12 LG Electronics Inc. Composition of glass for plasma display panel and fabrication method thereof
JP2006182589A (en) * 2004-12-27 2006-07-13 Nihon Yamamura Glass Co Ltd Bismuth-based lead-free glass composition
WO2006118333A1 (en) * 2005-04-28 2006-11-09 Ohara Inc. Optical glass containing bismuth oxide
US7208430B2 (en) 2005-04-04 2007-04-24 Matsushita Electric Industrial Co., Ltd. Glass composition for covering electrodes and glass paste containing the same
WO2007058078A1 (en) 2005-11-21 2007-05-24 Matsushita Electric Industrial Co., Ltd. Glass composition and display panel employing the same
US7253560B2 (en) * 2002-05-09 2007-08-07 Fujitsu Hitachi Plasma Display Limited Triode surface discharge type plasma display panel
KR100753266B1 (en) 2006-06-29 2007-08-22 박영철 The sealing-material for metal heater and preparing method thereof
US7291573B2 (en) * 2004-11-12 2007-11-06 Asahi Techno Glass Corporation Low melting glass, sealing composition and sealing paste
KR100799544B1 (en) 2006-06-16 2008-01-31 (주)이그잭스 Non-lead seal paste composition for plane lamp and sealing method using the composition
EP1884500A1 (en) * 2005-04-04 2008-02-06 Matsushita Electric Industrial Co., Ltd. Plasma display panel and method for manufacturing same
US7341964B2 (en) * 2004-07-30 2008-03-11 Shepherd Color Company Durable glass and glass enamel composition for glass coatings
JP2008063160A (en) * 2006-09-05 2008-03-21 Nippon Electric Glass Co Ltd Glass composition for forming supporting frame and material for forming supporting frame
US7407902B2 (en) 2002-03-29 2008-08-05 Matsushita Electric Industrial Co., Ltd. Bismuth glass composition, and magnetic head and plasma display panel including the same as sealing member
JP2008297162A (en) * 2007-05-31 2008-12-11 Hoya Candeo Optronics株式会社 Glass composition for joining quartz glass body, glass paste for joining quartz glass body and method for joining quartz glass body
JP2009021205A (en) * 2007-06-15 2009-01-29 Nippon Electric Glass Co Ltd Dielectric material for plasma display panel
JP2009221099A (en) * 2001-08-02 2009-10-01 Three M Innovative Properties Co Method for manufacturing glass article containing rare earth oxide (reo) and glass article manufactured by the method
JP2009269770A (en) * 2008-04-30 2009-11-19 Ohara Inc Optical glass, preform for precision press molding and optical element
US7749929B2 (en) * 2005-10-05 2010-07-06 Asahi Glass Company, Limited Glass for covering electrodes and plasma display panel
JP2010198797A (en) * 2009-02-23 2010-09-09 Nippon Electric Glass Co Ltd Glass substrate for organic el element, and method of manufacturing the same
US7839088B2 (en) 2006-03-31 2010-11-23 Panasonic Corporation Glass composition and display panel using the same
US7847483B2 (en) 2005-09-07 2010-12-07 Panasonic Corporation Glass composition and display panel using same
US8058196B2 (en) 2005-09-06 2011-11-15 Ohara Inc. Optical glass
JP2012180261A (en) * 2011-02-10 2012-09-20 Central Glass Co Ltd Electroconductive paste and solar cell element obtained using the same
CN102741185A (en) * 2010-01-28 2012-10-17 日本电气硝子株式会社 Glass for semiconductor coating and material for semiconductor coating using the same
EP2589577A4 (en) * 2010-06-29 2014-04-16 Central Glass Co Ltd Low-melting-point glass composition and conductive paste material using same
KR101417009B1 (en) 2006-09-27 2014-07-08 지호우도쿠리츠교우세이호우징 도쿄토리츠 산교기주츠켄큐센타 Lead-free borosilicate glass frit for forming insulating layer and glass paste thereof
WO2014178515A1 (en) * 2013-04-30 2014-11-06 한국세라믹기술원 Yellow phosphor paste composition, method of manufacturing white light emitting diode device using same, and white light emitting diode device manufactured thereby
CN104277495A (en) * 2013-11-08 2015-01-14 京东方科技集团股份有限公司 Functional material and preparation method thereof, and organic light-emitting diode display panel
KR101482998B1 (en) * 2013-02-28 2015-01-14 한국과학기술연구원 Sealing composite for flat solid oxide fuel cell stack

Cited By (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003034550A (en) * 2001-07-24 2003-02-07 Asahi Glass Co Ltd Lead-free glass, glass frit, glass paste, electronic circuit part and electronic circuit
JP2009221099A (en) * 2001-08-02 2009-10-01 Three M Innovative Properties Co Method for manufacturing glass article containing rare earth oxide (reo) and glass article manufactured by the method
US7407902B2 (en) 2002-03-29 2008-08-05 Matsushita Electric Industrial Co., Ltd. Bismuth glass composition, and magnetic head and plasma display panel including the same as sealing member
US7253560B2 (en) * 2002-05-09 2007-08-07 Fujitsu Hitachi Plasma Display Limited Triode surface discharge type plasma display panel
US6987358B2 (en) 2002-08-08 2006-01-17 Asahi Glass Company, Limited Glass for covering electrodes, colored powder for covering electrodes and plasma display device
WO2005007591A1 (en) * 2003-07-18 2005-01-27 Asahi Glass Company, Limited Lead-free glass, glass powder of electrode coating, and plasma display
EP1645548A1 (en) * 2003-08-04 2006-04-12 LG Electronics Inc. Composition of glass for plasma display panel and fabrication method thereof
US7298085B2 (en) 2003-08-04 2007-11-20 Lg Electronics Inc. Composition of glass for plasma display panel and fabrication method thereof
US7341964B2 (en) * 2004-07-30 2008-03-11 Shepherd Color Company Durable glass and glass enamel composition for glass coatings
US7291573B2 (en) * 2004-11-12 2007-11-06 Asahi Techno Glass Corporation Low melting glass, sealing composition and sealing paste
JP2006182589A (en) * 2004-12-27 2006-07-13 Nihon Yamamura Glass Co Ltd Bismuth-based lead-free glass composition
US7208430B2 (en) 2005-04-04 2007-04-24 Matsushita Electric Industrial Co., Ltd. Glass composition for covering electrodes and glass paste containing the same
EP1878710A1 (en) * 2005-04-04 2008-01-16 Matsushita Electric Industrial Co., Ltd. Glass composition for electrode coating and glass paste containing same
EP1884500A4 (en) * 2005-04-04 2011-01-19 Panasonic Corp Plasma display panel and method for manufacturing same
EP1884500A1 (en) * 2005-04-04 2008-02-06 Matsushita Electric Industrial Co., Ltd. Plasma display panel and method for manufacturing same
US7834551B2 (en) 2005-04-04 2010-11-16 Panasonic Corporation Plasma display panel and method of producing the same
EP1878710A4 (en) * 2005-04-04 2011-01-19 Panasonic Corp Glass composition for electrode coating and glass paste containing same
WO2006118333A1 (en) * 2005-04-28 2006-11-09 Ohara Inc. Optical glass containing bismuth oxide
US7737064B2 (en) 2005-04-28 2010-06-15 O'hara, Inc. Optical glass containing bismuth oxide
US8273672B2 (en) 2005-09-06 2012-09-25 Ohara Inc. Optical glass
US8058196B2 (en) 2005-09-06 2011-11-15 Ohara Inc. Optical glass
US7847483B2 (en) 2005-09-07 2010-12-07 Panasonic Corporation Glass composition and display panel using same
US7749929B2 (en) * 2005-10-05 2010-07-06 Asahi Glass Company, Limited Glass for covering electrodes and plasma display panel
WO2007058078A1 (en) 2005-11-21 2007-05-24 Matsushita Electric Industrial Co., Ltd. Glass composition and display panel employing the same
US8004193B2 (en) 2005-11-21 2011-08-23 Panasonic Corporation Glass composition and display panel using the same
US7839088B2 (en) 2006-03-31 2010-11-23 Panasonic Corporation Glass composition and display panel using the same
KR100799544B1 (en) 2006-06-16 2008-01-31 (주)이그잭스 Non-lead seal paste composition for plane lamp and sealing method using the composition
KR100753266B1 (en) 2006-06-29 2007-08-22 박영철 The sealing-material for metal heater and preparing method thereof
JP2008063160A (en) * 2006-09-05 2008-03-21 Nippon Electric Glass Co Ltd Glass composition for forming supporting frame and material for forming supporting frame
KR101417009B1 (en) 2006-09-27 2014-07-08 지호우도쿠리츠교우세이호우징 도쿄토리츠 산교기주츠켄큐센타 Lead-free borosilicate glass frit for forming insulating layer and glass paste thereof
JP2008297162A (en) * 2007-05-31 2008-12-11 Hoya Candeo Optronics株式会社 Glass composition for joining quartz glass body, glass paste for joining quartz glass body and method for joining quartz glass body
JP2009021205A (en) * 2007-06-15 2009-01-29 Nippon Electric Glass Co Ltd Dielectric material for plasma display panel
JP2009269770A (en) * 2008-04-30 2009-11-19 Ohara Inc Optical glass, preform for precision press molding and optical element
JP2010198797A (en) * 2009-02-23 2010-09-09 Nippon Electric Glass Co Ltd Glass substrate for organic el element, and method of manufacturing the same
CN102741185A (en) * 2010-01-28 2012-10-17 日本电气硝子株式会社 Glass for semiconductor coating and material for semiconductor coating using the same
CN102741185B (en) * 2010-01-28 2015-11-25 日本电气硝子株式会社 The semiconductor is covered with a glass and the glass is formed using a semiconductor material covered with
US8808582B2 (en) 2010-06-29 2014-08-19 Central Glass Company, Limited Low-melting-point glass composition and conductive paste material using same
EP2589577A4 (en) * 2010-06-29 2014-04-16 Central Glass Co Ltd Low-melting-point glass composition and conductive paste material using same
JP2012180261A (en) * 2011-02-10 2012-09-20 Central Glass Co Ltd Electroconductive paste and solar cell element obtained using the same
KR101482998B1 (en) * 2013-02-28 2015-01-14 한국과학기술연구원 Sealing composite for flat solid oxide fuel cell stack
WO2014178515A1 (en) * 2013-04-30 2014-11-06 한국세라믹기술원 Yellow phosphor paste composition, method of manufacturing white light emitting diode device using same, and white light emitting diode device manufactured thereby
CN104277495B (en) * 2013-11-08 2016-04-20 京东方科技集团股份有限公司 Functional material and its preparation method, the organic light emitting diode display panel
CN104277495A (en) * 2013-11-08 2015-01-14 京东方科技集团股份有限公司 Functional material and preparation method thereof, and organic light-emitting diode display panel

Similar Documents

Publication Publication Date Title
US6497962B1 (en) Low melting point glass for covering electrodes, and plasma display device
US5578533A (en) Ceramic color composition and process for producing a curved surface glass sheet employing it
US20060128549A1 (en) Lead-free phosphate glasses
US5643636A (en) Ceramic color composition and method for producing a glass sheet
US5817586A (en) Colored ceramic composition
JP2000128574A (en) Bismuth-based glass composition
US5948537A (en) Substrate for a plasma display panel and low melting point glass composition
US20060276322A1 (en) Glass composition for covering electrodes and glass paste containing the same
US20030228471A1 (en) Lead-free low-melting glass
US20040018931A1 (en) Electronic device having lead and cadmium free electronic overglaze applied thereto
JP2003034550A (en) Lead-free glass, glass frit, glass paste, electronic circuit part and electronic circuit
JPH0340933A (en) Glass composition for substrate
US6355586B1 (en) Low melting point glass and glass ceramic composition
US6589894B1 (en) Composition containing lead-oxide free glass powder of low softening point useful for barrier rib in PDP
US7326666B2 (en) Glass for forming barrier ribs, and plasma display panel
JPH09278483A (en) Bismuth based glass composition
JP2003095697A (en) Sealing composition
JPH08133778A (en) Glass composition and substrate for plasma display
JP2004284934A (en) Lead-free low-melting point glass
CN101164943A (en) Leadless tellurate low melting glass used as cementation phase in electronic slurry
JPH11292564A (en) Tin borophosphate glass and sealing material
US4748137A (en) Low temperature melting frits
JPH10139478A (en) Composition for sealing
JP2008037740A (en) Glass composition for sealing and sealing material
DE19512847C1 (en) Lead- and cadmium-free glass compsn.

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050408

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20070417

A131 Notification of reasons for refusal

Effective date: 20070419

Free format text: JAPANESE INTERMEDIATE CODE: A131

A521 Written amendment

Effective date: 20070612

Free format text: JAPANESE INTERMEDIATE CODE: A523

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070614

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20071120

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080111

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20080604

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080801

A911 Transfer of reconsideration by examiner before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20080911

A912 Removal of reconsideration by examiner before appeal (zenchi)

Effective date: 20090313

Free format text: JAPANESE INTERMEDIATE CODE: A912

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110719

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20111013

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20141021

Year of fee payment: 3

R150 Certificate of patent (=grant) or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350