JP2001176854A5 - - Google Patents
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- Publication number
- JP2001176854A5 JP2001176854A5 JP1999357353A JP35735399A JP2001176854A5 JP 2001176854 A5 JP2001176854 A5 JP 2001176854A5 JP 1999357353 A JP1999357353 A JP 1999357353A JP 35735399 A JP35735399 A JP 35735399A JP 2001176854 A5 JP2001176854 A5 JP 2001176854A5
- Authority
- JP
- Japan
- Prior art keywords
- exhaust gas
- nitrogen
- heated
- pipe
- gas passage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 30
- 239000007789 gas Substances 0.000 description 24
- 238000010438 heat treatment Methods 0.000 description 17
- 229910052757 nitrogen Inorganic materials 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000001312 dry etching Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35735399A JP2001176854A (ja) | 1999-12-16 | 1999-12-16 | ドライエッチング排ガス処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35735399A JP2001176854A (ja) | 1999-12-16 | 1999-12-16 | ドライエッチング排ガス処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001176854A JP2001176854A (ja) | 2001-06-29 |
| JP2001176854A5 true JP2001176854A5 (enExample) | 2007-01-11 |
Family
ID=18453703
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP35735399A Pending JP2001176854A (ja) | 1999-12-16 | 1999-12-16 | ドライエッチング排ガス処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001176854A (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005296918A (ja) * | 2004-03-15 | 2005-10-27 | Tousetsu:Kk | 有毒ガスの除害方法及びその装置 |
| JP2007083135A (ja) * | 2005-09-21 | 2007-04-05 | Tousetsu:Kk | ガス無害化処理システム |
| JP2014185584A (ja) * | 2013-03-22 | 2014-10-02 | Technos:Kk | ドライ真空ポンプの内部で副生成物が凝固堆積することを防止する方法及び窒素ガス昇温装置 |
| JP2015185568A (ja) * | 2014-03-20 | 2015-10-22 | 株式会社テクノス | 窒素昇温ユニット |
| JP2020090922A (ja) * | 2018-12-05 | 2020-06-11 | 株式会社テクノス | 窒素昇温ユニット及び当該窒素昇温ユニットを利用してターボ分子ポンプの内部で昇華性物質が固形化すること又は堆積することを抑制又は防止する方法 |
| FR3112086B1 (fr) * | 2020-07-09 | 2022-07-08 | Pfeiffer Vacuum | Dispositif de traitement des gaz et ligne de vide |
| KR20240058851A (ko) * | 2021-09-02 | 2024-05-07 | 에드워즈 배큠 엘엘시 | 반도체 처리용 인라인 워터 스크러버 시스템 |
-
1999
- 1999-12-16 JP JP35735399A patent/JP2001176854A/ja active Pending
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