JP2001176854A - ドライエッチング排ガス処理装置 - Google Patents
ドライエッチング排ガス処理装置Info
- Publication number
- JP2001176854A JP2001176854A JP35735399A JP35735399A JP2001176854A JP 2001176854 A JP2001176854 A JP 2001176854A JP 35735399 A JP35735399 A JP 35735399A JP 35735399 A JP35735399 A JP 35735399A JP 2001176854 A JP2001176854 A JP 2001176854A
- Authority
- JP
- Japan
- Prior art keywords
- exhaust gas
- dry etching
- nitrogen
- vacuum
- vacuum generator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001312 dry etching Methods 0.000 title claims abstract description 102
- 239000007789 gas Substances 0.000 claims abstract description 246
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 138
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 69
- 238000010438 heat treatment Methods 0.000 claims abstract description 53
- 239000000126 substance Substances 0.000 abstract description 29
- 238000000151 deposition Methods 0.000 abstract description 6
- 229910052774 Proactinium Inorganic materials 0.000 abstract description 4
- 229910052745 lead Inorganic materials 0.000 abstract description 3
- 239000007787 solid Substances 0.000 description 25
- 238000011144 upstream manufacturing Methods 0.000 description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 20
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 19
- 239000000460 chlorine Substances 0.000 description 12
- 229910052801 chlorine Inorganic materials 0.000 description 12
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 11
- 239000007788 liquid Substances 0.000 description 11
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 238000005530 etching Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000001556 precipitation Methods 0.000 description 5
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 101001062854 Rattus norvegicus Fatty acid-binding protein 5 Proteins 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- -1 chlorine ions Chemical class 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000004993 emission spectroscopy Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000004868 gas analysis Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000004255 ion exchange chromatography Methods 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- Treating Waste Gases (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35735399A JP2001176854A (ja) | 1999-12-16 | 1999-12-16 | ドライエッチング排ガス処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35735399A JP2001176854A (ja) | 1999-12-16 | 1999-12-16 | ドライエッチング排ガス処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001176854A true JP2001176854A (ja) | 2001-06-29 |
| JP2001176854A5 JP2001176854A5 (enExample) | 2007-01-11 |
Family
ID=18453703
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP35735399A Pending JP2001176854A (ja) | 1999-12-16 | 1999-12-16 | ドライエッチング排ガス処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001176854A (enExample) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005296918A (ja) * | 2004-03-15 | 2005-10-27 | Tousetsu:Kk | 有毒ガスの除害方法及びその装置 |
| JP2007083135A (ja) * | 2005-09-21 | 2007-04-05 | Tousetsu:Kk | ガス無害化処理システム |
| WO2014147876A1 (ja) * | 2013-03-22 | 2014-09-25 | 株式会社テクノス | ドライ真空ポンプの内部で副生成物が凝固堆積することを防止する方法及び窒素ガス昇温装置 |
| WO2015141602A1 (ja) * | 2014-03-20 | 2015-09-24 | 株式会社テクノス | 窒素昇温ユニット |
| JP2020090922A (ja) * | 2018-12-05 | 2020-06-11 | 株式会社テクノス | 窒素昇温ユニット及び当該窒素昇温ユニットを利用してターボ分子ポンプの内部で昇華性物質が固形化すること又は堆積することを抑制又は防止する方法 |
| CN115836164A (zh) * | 2020-07-09 | 2023-03-21 | 普发真空公司 | 气体处理装置以及真空管线 |
| JP2024532466A (ja) * | 2021-09-02 | 2024-09-05 | エドワーズ バキューム リミテッド ライアビリティ カンパニー | 半導体処理用インライン水スクラバーシステム |
-
1999
- 1999-12-16 JP JP35735399A patent/JP2001176854A/ja active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005296918A (ja) * | 2004-03-15 | 2005-10-27 | Tousetsu:Kk | 有毒ガスの除害方法及びその装置 |
| JP2007083135A (ja) * | 2005-09-21 | 2007-04-05 | Tousetsu:Kk | ガス無害化処理システム |
| WO2014147876A1 (ja) * | 2013-03-22 | 2014-09-25 | 株式会社テクノス | ドライ真空ポンプの内部で副生成物が凝固堆積することを防止する方法及び窒素ガス昇温装置 |
| WO2015141602A1 (ja) * | 2014-03-20 | 2015-09-24 | 株式会社テクノス | 窒素昇温ユニット |
| JP2020090922A (ja) * | 2018-12-05 | 2020-06-11 | 株式会社テクノス | 窒素昇温ユニット及び当該窒素昇温ユニットを利用してターボ分子ポンプの内部で昇華性物質が固形化すること又は堆積することを抑制又は防止する方法 |
| CN115836164A (zh) * | 2020-07-09 | 2023-03-21 | 普发真空公司 | 气体处理装置以及真空管线 |
| JP2024532466A (ja) * | 2021-09-02 | 2024-09-05 | エドワーズ バキューム リミテッド ライアビリティ カンパニー | 半導体処理用インライン水スクラバーシステム |
| JP7749107B2 (ja) | 2021-09-02 | 2025-10-03 | エドワーズ バキューム リミテッド ライアビリティ カンパニー | 半導体処理用インライン水スクラバーシステム |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20061108 |
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| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20061108 |
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| A977 | Report on retrieval |
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| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080909 |
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| A02 | Decision of refusal |
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