JP2001153793A - 吸収分光器の光学部材への沈積を防ぐための方法並びに装置 - Google Patents
吸収分光器の光学部材への沈積を防ぐための方法並びに装置Info
- Publication number
- JP2001153793A JP2001153793A JP2000219116A JP2000219116A JP2001153793A JP 2001153793 A JP2001153793 A JP 2001153793A JP 2000219116 A JP2000219116 A JP 2000219116A JP 2000219116 A JP2000219116 A JP 2000219116A JP 2001153793 A JP2001153793 A JP 2001153793A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- cell
- purge gas
- optical component
- critical surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 51
- 238000000034 method Methods 0.000 title claims abstract description 48
- 238000010521 absorption reaction Methods 0.000 title claims description 12
- 230000008021 deposition Effects 0.000 title claims description 5
- 238000010926 purge Methods 0.000 claims abstract description 56
- 238000004847 absorption spectroscopy Methods 0.000 claims abstract description 33
- 238000012545 processing Methods 0.000 claims abstract description 28
- 238000005259 measurement Methods 0.000 claims abstract description 27
- 239000007789 gas Substances 0.000 claims description 171
- 239000004065 semiconductor Substances 0.000 claims description 18
- 238000002347 injection Methods 0.000 claims description 14
- 239000007924 injection Substances 0.000 claims description 14
- 238000000746 purification Methods 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 229910052734 helium Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 239000001307 helium Substances 0.000 claims description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 2
- 229910052754 neon Inorganic materials 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims 1
- 210000004027 cell Anatomy 0.000 description 80
- 239000000523 sample Substances 0.000 description 31
- 239000012535 impurity Substances 0.000 description 7
- 238000011144 upstream manufacturing Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 6
- 241000894007 species Species 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 238000002310 reflectometry Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000012625 in-situ measurement Methods 0.000 description 3
- 238000001285 laser absorption spectroscopy Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000004088 simulation Methods 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000005094 computer simulation Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 240000002989 Euphorbia neriifolia Species 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 241000282320 Panthera leo Species 0.000 description 1
- 238000011481 absorbance measurement Methods 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 235000013405 beer Nutrition 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000000180 cavity ring-down spectroscopy Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000000050 ionisation spectroscopy Methods 0.000 description 1
- 238000001307 laser spectroscopy Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000004807 localization Effects 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 238000009420 retrofitting Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B17/00—Methods preventing fouling
- B08B17/02—Preventing deposition of fouling or of dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0256—Compact construction
- G01J3/0259—Monolithic
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
- G01N2021/151—Gas blown
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Optical Measuring Cells (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14418199P | 1999-07-19 | 1999-07-19 | |
| US60/144181 | 2000-07-11 | ||
| US09/613806 | 2000-07-11 | ||
| US09/613,806 US6421127B1 (en) | 1999-07-19 | 2000-07-11 | Method and system for preventing deposition on an optical component in a spectroscopic sensor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001153793A true JP2001153793A (ja) | 2001-06-08 |
| JP2001153793A5 JP2001153793A5 (enExample) | 2007-08-09 |
Family
ID=26841753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000219116A Pending JP2001153793A (ja) | 1999-07-19 | 2000-07-19 | 吸収分光器の光学部材への沈積を防ぐための方法並びに装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6421127B1 (enExample) |
| EP (1) | EP1070943A1 (enExample) |
| JP (1) | JP2001153793A (enExample) |
| SG (1) | SG97896A1 (enExample) |
| TW (1) | TW496955B (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006520458A (ja) * | 2003-03-13 | 2006-09-07 | トラスティーズ オブ プリンストン ユニバーシティ | 入力ガス流中の不純物の濃度レベルを測定する装置およびその方法、入力ガス流中の酸素の濃度レベルを測定する装置およびその方法 |
| JP2007040891A (ja) * | 2005-08-04 | 2007-02-15 | Toyota Motor Corp | ガス分析装置 |
| KR100877491B1 (ko) | 2008-04-29 | 2009-01-07 | 오희범 | 항온항습 기능을 구비하는 적외선 가스 감지기 |
| JP2013224969A (ja) * | 2013-08-05 | 2013-10-31 | Mitsubishi Heavy Ind Ltd | ガス分析装置 |
| KR20200037872A (ko) * | 2017-08-30 | 2020-04-09 | 램 리써치 코포레이션 | 가스 배기 부산물 측정 시스템 |
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| US20070133001A1 (en) * | 2001-09-12 | 2007-06-14 | Honeywell International Inc. | Laser sensor having a block ring activity |
| CN100413841C (zh) * | 2002-01-08 | 2008-08-27 | 三菱化学株式会社 | 防止处理(甲基)丙烯酸及其酯的设备堵塞的方法 |
| US7470894B2 (en) * | 2002-03-18 | 2008-12-30 | Honeywell International Inc. | Multi-substrate package assembly |
| US7352463B2 (en) | 2002-09-06 | 2008-04-01 | Tdw Delaware, Inc. | Method and device for detecting gases by absorption spectroscopy |
| WO2004023114A1 (en) * | 2002-09-06 | 2004-03-18 | Tdw Delaware, Inc. | Method and device for detecting gases by absorption spectroscopy |
| US7054008B2 (en) * | 2003-02-19 | 2006-05-30 | Mississippi State University | Method and apparatus for elemental and isotope measurements and diagnostics-microwave induced plasma-cavity ring-down spectroscopy |
| US7708859B2 (en) * | 2004-04-30 | 2010-05-04 | Lam Research Corporation | Gas distribution system having fast gas switching capabilities |
| DE102004028420B3 (de) | 2004-06-04 | 2006-02-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zur optischen Detektion von in Abgasen chemischer Prozesse enthaltenen Stoffen |
| US7902534B2 (en) * | 2004-09-28 | 2011-03-08 | Honeywell International Inc. | Cavity ring down system having a common input/output port |
| US7586114B2 (en) * | 2004-09-28 | 2009-09-08 | Honeywell International Inc. | Optical cavity system having an orthogonal input |
| FR2889204B1 (fr) * | 2005-07-26 | 2007-11-30 | Sidel Sas | Appareil pour le depot pecvd d'une couche barriere interne sur un recipient, comprenant une ligne de gaz isolee par electrovanne |
| US7369242B2 (en) * | 2006-03-17 | 2008-05-06 | Honeywell International Inc. | Cavity ring-down spectrometer for semiconductor processing |
| US7656532B2 (en) * | 2006-04-18 | 2010-02-02 | Honeywell International Inc. | Cavity ring-down spectrometer having mirror isolation |
| US20070246512A1 (en) * | 2006-04-20 | 2007-10-25 | Shahabudin Kazi | Use of tunable diode lasers for controlling a brazing processes |
| US7649189B2 (en) * | 2006-12-04 | 2010-01-19 | Honeywell International Inc. | CRDS mirror for normal incidence fiber optic coupling |
| US7612885B2 (en) * | 2006-12-22 | 2009-11-03 | Honeywell International Inc | Spectroscopy method and apparatus for detecting low concentration gases |
| US20090323055A1 (en) * | 2008-06-25 | 2009-12-31 | Honeywell International Inc. | Crds brewster gas cell |
| US7663756B2 (en) * | 2008-07-21 | 2010-02-16 | Honeywell International Inc | Cavity enhanced photo acoustic gas sensor |
| US7864326B2 (en) | 2008-10-30 | 2011-01-04 | Honeywell International Inc. | Compact gas sensor using high reflectance terahertz mirror and related system and method |
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| DE102009035789A1 (de) * | 2009-07-31 | 2010-11-25 | Carl Zeiss Laser Optics Gmbh | Optisches System |
| US8267896B2 (en) | 2009-12-18 | 2012-09-18 | Tyco Healthcare Group Lp | Surgical instrument cleaning arrangement |
| US8269972B2 (en) | 2010-06-29 | 2012-09-18 | Honeywell International Inc. | Beam intensity detection in a cavity ring down sensor |
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| US8322191B2 (en) | 2010-06-30 | 2012-12-04 | Honeywell International Inc. | Enhanced cavity for a photoacoustic gas sensor |
| FR2966931B1 (fr) * | 2010-10-27 | 2012-11-16 | Commissariat Energie Atomique | Cellule de caracterisation pour analyse de fumee |
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|---|---|---|---|---|
| JPS55116239U (enExample) * | 1979-02-13 | 1980-08-16 | ||
| JPS59120825A (ja) * | 1982-12-27 | 1984-07-12 | Shimadzu Corp | 分光光度計のガスパ−ジ機構 |
| JPS61122554A (ja) * | 1984-11-20 | 1986-06-10 | Hitachi Plant Eng & Constr Co Ltd | 光透過式ダスト濃度計 |
| JPH02115151U (enExample) * | 1989-03-02 | 1990-09-14 | ||
| JPH02118855U (enExample) * | 1989-03-13 | 1990-09-25 | ||
| JPH07167778A (ja) * | 1993-07-12 | 1995-07-04 | L'air Liquide | 分光セル構造 |
| JPH09203707A (ja) * | 1995-10-10 | 1997-08-05 | L'air Liquide | 室の流出物のモニターシステム、および吸着分光測定からなる半導体加工システム、およびその使用方法 |
| WO1999002969A1 (en) * | 1997-07-10 | 1999-01-21 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | In-line cell for absorption spectroscopy |
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|---|---|---|---|---|
| US4443072A (en) | 1982-04-05 | 1984-04-17 | The United States Of America As Represented By The United States Department Of Energy | Purged window apparatus utilizing heated purge gas |
| EP0596605A1 (en) | 1992-11-06 | 1994-05-11 | Nicolet Instrument Corporation | Precision gas cell for infrared spectrometers and the like |
| US5360980A (en) | 1993-02-26 | 1994-11-01 | High Yield Technology | Structure and method for providing a gas purge for a vacuum particle sensor installed in a corrosive or coating environment |
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- 2000-07-11 US US09/613,806 patent/US6421127B1/en not_active Expired - Lifetime
- 2000-07-18 EP EP00402043A patent/EP1070943A1/en not_active Withdrawn
- 2000-07-19 SG SG200004043A patent/SG97896A1/en unknown
- 2000-07-19 JP JP2000219116A patent/JP2001153793A/ja active Pending
- 2000-07-19 TW TW089114428A patent/TW496955B/zh active
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006520458A (ja) * | 2003-03-13 | 2006-09-07 | トラスティーズ オブ プリンストン ユニバーシティ | 入力ガス流中の不純物の濃度レベルを測定する装置およびその方法、入力ガス流中の酸素の濃度レベルを測定する装置およびその方法 |
| JP2011149954A (ja) * | 2003-03-13 | 2011-08-04 | Trustees Of Princeton Univ | 入力ガス流中の不純物の濃度レベルを測定する装置およびその方法、入力ガス流中の酸素の濃度レベルを測定する装置およびその方法 |
| JP2007040891A (ja) * | 2005-08-04 | 2007-02-15 | Toyota Motor Corp | ガス分析装置 |
| KR100877491B1 (ko) | 2008-04-29 | 2009-01-07 | 오희범 | 항온항습 기능을 구비하는 적외선 가스 감지기 |
| JP2013224969A (ja) * | 2013-08-05 | 2013-10-31 | Mitsubishi Heavy Ind Ltd | ガス分析装置 |
| KR20200037872A (ko) * | 2017-08-30 | 2020-04-09 | 램 리써치 코포레이션 | 가스 배기 부산물 측정 시스템 |
| JP2020532712A (ja) * | 2017-08-30 | 2020-11-12 | ラム リサーチ コーポレーションＬａｍ Ｒｅｓｅａｒｃｈ Ｃｏｒｐｏｒａｔｉｏｎ | ガス排気副生成物測定システム |
| KR102554542B1 (ko) * | 2017-08-30 | 2023-07-11 | 램 리써치 코포레이션 | 가스 배기 부산물 측정 시스템 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW496955B (en) | 2002-08-01 |
| US6421127B1 (en) | 2002-07-16 |
| EP1070943A1 (en) | 2001-01-24 |
| SG97896A1 (en) | 2003-08-20 |
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