JP2001153793A - 吸収分光器の光学部材への沈積を防ぐための方法並びに装置 - Google Patents

吸収分光器の光学部材への沈積を防ぐための方法並びに装置

Info

Publication number
JP2001153793A
JP2001153793A JP2000219116A JP2000219116A JP2001153793A JP 2001153793 A JP2001153793 A JP 2001153793A JP 2000219116 A JP2000219116 A JP 2000219116A JP 2000219116 A JP2000219116 A JP 2000219116A JP 2001153793 A JP2001153793 A JP 2001153793A
Authority
JP
Japan
Prior art keywords
gas
cell
purge gas
optical component
critical surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000219116A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001153793A5 (enExample
Inventor
James J F Mcandrew
ジェームズ，ジェイ・エフ・マックアンドリュー
Benjamin Jurcik
ベンジャミン・ジュルシク
Carol Schnepper
キャロル・シュネッパー
Ronald Inman
ロナルド・インマン
Dmitry Znamensky
ドミトリー・ズナメンスキー
Tracey Jacksier
トレーシー・ジャックシール
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide SA, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical Air Liquide SA
Publication of JP2001153793A publication Critical patent/JP2001153793A/ja
Publication of JP2001153793A5 publication Critical patent/JP2001153793A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00—Methods preventing fouling
    • B08B17/02—Preventing deposition of fouling or of dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0256—Compact construction
    • G01J3/0259—Monolithic
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
    • G01N2021/151—Gas blown

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optical Measuring Cells (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2000219116A 1999-07-19 2000-07-19 吸収分光器の光学部材への沈積を防ぐための方法並びに装置 Pending JP2001153793A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US14418199P 1999-07-19 1999-07-19
US09/613806 2000-07-11
US09/613,806 US6421127B1 (en) 1999-07-19 2000-07-11 Method and system for preventing deposition on an optical component in a spectroscopic sensor
US60/144181 2000-07-11

Publications (2)

Publication Number Publication Date
JP2001153793A true JP2001153793A (ja) 2001-06-08
JP2001153793A5 JP2001153793A5 (enExample) 2007-08-09

Family

ID=26841753

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000219116A Pending JP2001153793A (ja) 1999-07-19 2000-07-19 吸収分光器の光学部材への沈積を防ぐための方法並びに装置

Country Status (5)

Country Link
US (1) US6421127B1 (enExample)
EP (1) EP1070943A1 (enExample)
JP (1) JP2001153793A (enExample)
SG (1) SG97896A1 (enExample)
TW (1) TW496955B (enExample)

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* Cited by examiner, † Cited by third party
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JP2006520458A (ja) * 2003-03-13 2006-09-07 トラスティーズ オブ プリンストン ユニバーシティ 入力ガス流中の不純物の濃度レベルを測定する装置およびその方法、入力ガス流中の酸素の濃度レベルを測定する装置およびその方法
JP2007040891A (ja) * 2005-08-04 2007-02-15 Toyota Motor Corp ガス分析装置
KR100877491B1 (ko) 2008-04-29 2009-01-07 오희범 항온항습 기능을 구비하는 적외선 가스 감지기
JP2013224969A (ja) * 2013-08-05 2013-10-31 Mitsubishi Heavy Ind Ltd ガス分析装置
KR20200037872A (ko) * 2017-08-30 2020-04-09 램 리써치 코포레이션 가스 배기 부산물 측정 시스템

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US7352463B2 (en) 2002-09-06 2008-04-01 Tdw Delaware, Inc. Method and device for detecting gases by absorption spectroscopy
EP1647820B1 (en) * 2002-09-06 2006-12-20 Tdw Delaware, Inc. Method and device for detecting gases by absorption spectroscopy
US7054008B2 (en) * 2003-02-19 2006-05-30 Mississippi State University Method and apparatus for elemental and isotope measurements and diagnostics-microwave induced plasma-cavity ring-down spectroscopy
US7708859B2 (en) * 2004-04-30 2010-05-04 Lam Research Corporation Gas distribution system having fast gas switching capabilities
DE102004028420B3 (de) 2004-06-04 2006-02-09 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren zur optischen Detektion von in Abgasen chemischer Prozesse enthaltenen Stoffen
US7586114B2 (en) * 2004-09-28 2009-09-08 Honeywell International Inc. Optical cavity system having an orthogonal input
US7902534B2 (en) * 2004-09-28 2011-03-08 Honeywell International Inc. Cavity ring down system having a common input/output port
FR2889204B1 (fr) * 2005-07-26 2007-11-30 Sidel Sas Appareil pour le depot pecvd d'une couche barriere interne sur un recipient, comprenant une ligne de gaz isolee par electrovanne
US7369242B2 (en) * 2006-03-17 2008-05-06 Honeywell International Inc. Cavity ring-down spectrometer for semiconductor processing
US7656532B2 (en) * 2006-04-18 2010-02-02 Honeywell International Inc. Cavity ring-down spectrometer having mirror isolation
US20070246512A1 (en) * 2006-04-20 2007-10-25 Shahabudin Kazi Use of tunable diode lasers for controlling a brazing processes
US7649189B2 (en) * 2006-12-04 2010-01-19 Honeywell International Inc. CRDS mirror for normal incidence fiber optic coupling
US7612885B2 (en) 2006-12-22 2009-11-03 Honeywell International Inc Spectroscopy method and apparatus for detecting low concentration gases
US20090323055A1 (en) * 2008-06-25 2009-12-31 Honeywell International Inc. Crds brewster gas cell
US7663756B2 (en) * 2008-07-21 2010-02-16 Honeywell International Inc Cavity enhanced photo acoustic gas sensor
US7864326B2 (en) 2008-10-30 2011-01-04 Honeywell International Inc. Compact gas sensor using high reflectance terahertz mirror and related system and method
US8198590B2 (en) * 2008-10-30 2012-06-12 Honeywell International Inc. High reflectance terahertz mirror and related method
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US8269972B2 (en) 2010-06-29 2012-09-18 Honeywell International Inc. Beam intensity detection in a cavity ring down sensor
US8437000B2 (en) 2010-06-29 2013-05-07 Honeywell International Inc. Multiple wavelength cavity ring down gas sensor
US8322191B2 (en) 2010-06-30 2012-12-04 Honeywell International Inc. Enhanced cavity for a photoacoustic gas sensor
FR2966931B1 (fr) * 2010-10-27 2012-11-16 Commissariat Energie Atomique Cellule de caracterisation pour analyse de fumee
US9625374B2 (en) * 2011-09-21 2017-04-18 Hewlett-Packard Development Company, L.P. Image forming apparatus having optical sensor system, optical sensor system having shields, and method thereof
CA2843753C (en) 2013-02-21 2020-08-11 Colin Irvin Wong Methods for calibrating a fugitive emission rate measurement
US9335257B2 (en) * 2013-06-20 2016-05-10 Rosemount Analytical Inc. Tunable diode laser absorption spectroscopy with water vapor determination
JP5973969B2 (ja) * 2013-07-31 2016-08-23 国立大学法人徳島大学 インライン型濃度計及び濃度検出方法
CA2886213A1 (en) * 2014-09-07 2015-05-27 Unisearch Associates Inc. Gas cell assembly and applications in absorption spectroscopy
US9689795B2 (en) 2015-03-25 2017-06-27 General Electric Company Methods and systems to analyze a gas-mixture
ITUB20153087A1 (it) * 2015-08-12 2017-02-12 Bofor S R L Sistema di monitoraggio per la salvaguardia degli stampi nelle macchine di stampaggio.
US9709491B1 (en) * 2016-03-28 2017-07-18 The United States Of America System and method for measuring aerosol or trace species
US10307803B2 (en) * 2016-07-20 2019-06-04 The United States Of America As Represented By Secretary Of The Navy Transmission window cleanliness for directed energy devices
US10228324B2 (en) 2016-07-25 2019-03-12 Mks Instruments, Inc. Gas measurement system
FR3058652B1 (fr) * 2016-11-17 2021-10-15 Valeo Systemes Dessuyage Dispositif de protection d’un capteur optique, systeme d’assistance a la conduite et procede de nettoyage associes
GB201704771D0 (en) * 2017-01-05 2017-05-10 Illumina Inc Modular optical analytic systems and methods
SG11202006380UA (en) 2017-12-01 2020-08-28 Mks Instr Multi-sensor gas sampling detection system for radical gases and short-lived molecules and method of use
FR3086705B1 (fr) 2018-09-27 2020-10-23 Pfeiffer Vacuum Pompe a vide primaire de type seche et procede de controle de l'injection d'un gaz de purge
WO2020072097A1 (en) * 2018-10-03 2020-04-09 Massachusetts Institute Of Technology Deposition prevention by sweep gas
CN111122442A (zh) * 2018-10-31 2020-05-08 高利通科技（深圳）有限公司 便于清洗的光谱气体测量池
DE102018221190A1 (de) * 2018-12-07 2020-06-10 Carl Zeiss Smt Gmbh Verfahren zum Bilden von Nanostrukturen an einer Oberfläche und Wafer-Inspektionssystem
WO2021045911A1 (en) * 2019-09-05 2021-03-11 Schenck Process Llc Laser-induced spectroscopy system and process
US11852807B2 (en) * 2020-04-27 2023-12-26 Baker Hughes Oilfield Operations Llc Optical system and method for cleaning optical windows
US11781969B2 (en) * 2020-11-18 2023-10-10 Kidde Technologies, Inc. Clean gas curtain to prevent particle buildup during concentration measurement
US20220305584A1 (en) * 2021-03-24 2022-09-29 Fei Company In-situ laser redeposition reduction by a controlled gas flow and a system for reducing contamination
US12055477B2 (en) * 2021-09-29 2024-08-06 Kidde Technologies, Inc. Compressed gas cleaning of windows in particle concentration measurement device
US12504369B1 (en) 2022-11-04 2025-12-23 Ecotec Solutions, Inc. Vertical emissions monitoring manifold
US12638367B2 (en) 2022-12-20 2026-05-26 Ecotec Solutions, Inc. Multipoint gas input switching
CN116879174A (zh) * 2023-07-10 2023-10-13 江苏大学 一种高温气体辅助自疏水防液体飞溅试验观测装置及方法
US12686645B2 (en) 2024-11-14 2026-07-21 Fourth Power, Inc Graphite-based infrastructures for handling molten metals and methods of forming thereof
CN121655702B (zh) * 2026-02-06 2026-04-24 北京航空航天大学 红外辐射计旋流吹扫装置及设计方法

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JPS55116239U (enExample) * 1979-02-13 1980-08-16
JPS59120825A (ja) * 1982-12-27 1984-07-12 Shimadzu Corp 分光光度計のガスパ−ジ機構
JPS61122554A (ja) * 1984-11-20 1986-06-10 Hitachi Plant Eng & Constr Co Ltd 光透過式ダスト濃度計
JPH02115151U (enExample) * 1989-03-02 1990-09-14
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JPH07167778A (ja) * 1993-07-12 1995-07-04 L'air Liquide 分光セル構造
JPH09203707A (ja) * 1995-10-10 1997-08-05 L'air Liquide 室の流出物のモニターシステム、および吸着分光測定からなる半導体加工システム、およびその使用方法
WO1999002969A1 (en) * 1997-07-10 1999-01-21 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude In-line cell for absorption spectroscopy
JPH11295213A (ja) * 1998-04-10 1999-10-29 Nippon Steel Corp 光学式検出器用透過面の汚染防止装置

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JPS59120825A (ja) * 1982-12-27 1984-07-12 Shimadzu Corp 分光光度計のガスパ−ジ機構
JPS61122554A (ja) * 1984-11-20 1986-06-10 Hitachi Plant Eng & Constr Co Ltd 光透過式ダスト濃度計
JPH02115151U (enExample) * 1989-03-02 1990-09-14
JPH02118855U (enExample) * 1989-03-13 1990-09-25
JPH07167778A (ja) * 1993-07-12 1995-07-04 L'air Liquide 分光セル構造
JPH09203707A (ja) * 1995-10-10 1997-08-05 L'air Liquide 室の流出物のモニターシステム、および吸着分光測定からなる半導体加工システム、およびその使用方法
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JPH11295213A (ja) * 1998-04-10 1999-10-29 Nippon Steel Corp 光学式検出器用透過面の汚染防止装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006520458A (ja) * 2003-03-13 2006-09-07 トラスティーズ オブ プリンストン ユニバーシティ 入力ガス流中の不純物の濃度レベルを測定する装置およびその方法、入力ガス流中の酸素の濃度レベルを測定する装置およびその方法
JP2011149954A (ja) * 2003-03-13 2011-08-04 Trustees Of Princeton Univ 入力ガス流中の不純物の濃度レベルを測定する装置およびその方法、入力ガス流中の酸素の濃度レベルを測定する装置およびその方法
JP2007040891A (ja) * 2005-08-04 2007-02-15 Toyota Motor Corp ガス分析装置
KR100877491B1 (ko) 2008-04-29 2009-01-07 오희범 항온항습 기능을 구비하는 적외선 가스 감지기
JP2013224969A (ja) * 2013-08-05 2013-10-31 Mitsubishi Heavy Ind Ltd ガス分析装置
KR20200037872A (ko) * 2017-08-30 2020-04-09 램 리써치 코포레이션 가스 배기 부산물 측정 시스템
JP2020532712A (ja) * 2017-08-30 2020-11-12 ラム リサーチ コーポレーションＬａｍ Ｒｅｓｅａｒｃｈ Ｃｏｒｐｏｒａｔｉｏｎ ガス排気副生成物測定システム
KR102554542B1 (ko) * 2017-08-30 2023-07-11 램 리써치 코포레이션 가스 배기 부산물 측정 시스템

Also Published As

Publication number Publication date
US6421127B1 (en) 2002-07-16
SG97896A1 (en) 2003-08-20
TW496955B (en) 2002-08-01
EP1070943A1 (en) 2001-01-24

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