TW496955B - Method and system for preventing deposition on an optical component in a spectroscopic sensor - Google Patents
Method and system for preventing deposition on an optical component in a spectroscopic sensor Download PDFInfo
- Publication number
- TW496955B TW496955B TW089114428A TW89114428A TW496955B TW 496955 B TW496955 B TW 496955B TW 089114428 A TW089114428 A TW 089114428A TW 89114428 A TW89114428 A TW 89114428A TW 496955 B TW496955 B TW 496955B
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Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 64
- 238000000034 method Methods 0.000 title claims abstract description 35
- 230000008021 deposition Effects 0.000 title claims abstract description 28
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
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- 239000000758 substrate Substances 0.000 claims description 6
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- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
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- 238000009434 installation Methods 0.000 claims description 2
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- 229910052754 neon Inorganic materials 0.000 claims 1
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- OYEHPCDNVJXUIW-UHFFFAOYSA-N plutonium atom Chemical compound [Pu] OYEHPCDNVJXUIW-UHFFFAOYSA-N 0.000 claims 1
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- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
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- 238000000041 tunable diode laser absorption spectroscopy Methods 0.000 description 4
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
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- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
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- 230000003749 cleanliness Effects 0.000 description 1
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- 239000012530 fluid Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
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- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
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- 238000001307 laser spectroscopy Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000004807 localization Effects 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
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- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
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- 239000013589 supplement Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B17/00—Methods preventing fouling
- B08B17/02—Preventing deposition of fouling or of dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0256—Compact construction
- G01J3/0259—Monolithic
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
- G01N2021/151—Gas blown
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Optics & Photonics (AREA)
- Optical Measuring Cells (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14418199P | 1999-07-19 | 1999-07-19 | |
| US09/613,806 US6421127B1 (en) | 1999-07-19 | 2000-07-11 | Method and system for preventing deposition on an optical component in a spectroscopic sensor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW496955B true TW496955B (en) | 2002-08-01 |
Family
ID=26841753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW089114428A TW496955B (en) | 1999-07-19 | 2000-07-19 | Method and system for preventing deposition on an optical component in a spectroscopic sensor |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6421127B1 (enExample) |
| EP (1) | EP1070943A1 (enExample) |
| JP (1) | JP2001153793A (enExample) |
| SG (1) | SG97896A1 (enExample) |
| TW (1) | TW496955B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI809442B (zh) * | 2017-01-05 | 2023-07-21 | 美商伊路米納有限公司 | 模組化的光學分析系統和方法 |
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| US20070133001A1 (en) * | 2001-09-12 | 2007-06-14 | Honeywell International Inc. | Laser sensor having a block ring activity |
| AU2003201911A1 (en) * | 2002-01-08 | 2003-07-24 | Mitsubishi Chemical Corporation | Method of preventing clogging of apparatus for handling (meth)acrylic acid and ester thereof |
| US7470894B2 (en) * | 2002-03-18 | 2008-12-30 | Honeywell International Inc. | Multi-substrate package assembly |
| CN101470072B (zh) * | 2002-09-06 | 2011-02-16 | Tdw特拉华有限公司 | 利用吸收光谱法检测气体的装置 |
| US7352463B2 (en) | 2002-09-06 | 2008-04-01 | Tdw Delaware, Inc. | Method and device for detecting gases by absorption spectroscopy |
| US7054008B2 (en) * | 2003-02-19 | 2006-05-30 | Mississippi State University | Method and apparatus for elemental and isotope measurements and diagnostics-microwave induced plasma-cavity ring-down spectroscopy |
| US7255836B2 (en) * | 2003-03-13 | 2007-08-14 | Trustees Of Princeton University | Analytical sensitivity enhancement by catalytic transformation |
| US7708859B2 (en) * | 2004-04-30 | 2010-05-04 | Lam Research Corporation | Gas distribution system having fast gas switching capabilities |
| DE102004028420B3 (de) | 2004-06-04 | 2006-02-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zur optischen Detektion von in Abgasen chemischer Prozesse enthaltenen Stoffen |
| US7902534B2 (en) * | 2004-09-28 | 2011-03-08 | Honeywell International Inc. | Cavity ring down system having a common input/output port |
| US7586114B2 (en) * | 2004-09-28 | 2009-09-08 | Honeywell International Inc. | Optical cavity system having an orthogonal input |
| FR2889204B1 (fr) * | 2005-07-26 | 2007-11-30 | Sidel Sas | Appareil pour le depot pecvd d'une couche barriere interne sur un recipient, comprenant une ligne de gaz isolee par electrovanne |
| JP4842582B2 (ja) * | 2005-08-04 | 2011-12-21 | トヨタ自動車株式会社 | ガス分析装置 |
| US7369242B2 (en) * | 2006-03-17 | 2008-05-06 | Honeywell International Inc. | Cavity ring-down spectrometer for semiconductor processing |
| US7656532B2 (en) * | 2006-04-18 | 2010-02-02 | Honeywell International Inc. | Cavity ring-down spectrometer having mirror isolation |
| US20070246512A1 (en) * | 2006-04-20 | 2007-10-25 | Shahabudin Kazi | Use of tunable diode lasers for controlling a brazing processes |
| US7649189B2 (en) * | 2006-12-04 | 2010-01-19 | Honeywell International Inc. | CRDS mirror for normal incidence fiber optic coupling |
| US7612885B2 (en) * | 2006-12-22 | 2009-11-03 | Honeywell International Inc | Spectroscopy method and apparatus for detecting low concentration gases |
| KR100877491B1 (ko) | 2008-04-29 | 2009-01-07 | 오희범 | 항온항습 기능을 구비하는 적외선 가스 감지기 |
| US20090323055A1 (en) * | 2008-06-25 | 2009-12-31 | Honeywell International Inc. | Crds brewster gas cell |
| US7663756B2 (en) * | 2008-07-21 | 2010-02-16 | Honeywell International Inc | Cavity enhanced photo acoustic gas sensor |
| US7864326B2 (en) | 2008-10-30 | 2011-01-04 | Honeywell International Inc. | Compact gas sensor using high reflectance terahertz mirror and related system and method |
| US8198590B2 (en) * | 2008-10-30 | 2012-06-12 | Honeywell International Inc. | High reflectance terahertz mirror and related method |
| DE102009035789A1 (de) * | 2009-07-31 | 2010-11-25 | Carl Zeiss Laser Optics Gmbh | Optisches System |
| US8267896B2 (en) | 2009-12-18 | 2012-09-18 | Tyco Healthcare Group Lp | Surgical instrument cleaning arrangement |
| US8269972B2 (en) | 2010-06-29 | 2012-09-18 | Honeywell International Inc. | Beam intensity detection in a cavity ring down sensor |
| US8437000B2 (en) | 2010-06-29 | 2013-05-07 | Honeywell International Inc. | Multiple wavelength cavity ring down gas sensor |
| US8322191B2 (en) | 2010-06-30 | 2012-12-04 | Honeywell International Inc. | Enhanced cavity for a photoacoustic gas sensor |
| FR2966931B1 (fr) * | 2010-10-27 | 2012-11-16 | Commissariat Energie Atomique | Cellule de caracterisation pour analyse de fumee |
| US9625374B2 (en) * | 2011-09-21 | 2017-04-18 | Hewlett-Packard Development Company, L.P. | Image forming apparatus having optical sensor system, optical sensor system having shields, and method thereof |
| US9759597B2 (en) | 2013-02-21 | 2017-09-12 | Golder Associates Ltd. | Methods for calibrating a fugitive emission rate measurement |
| US9335257B2 (en) * | 2013-06-20 | 2016-05-10 | Rosemount Analytical Inc. | Tunable diode laser absorption spectroscopy with water vapor determination |
| JP5973969B2 (ja) * | 2013-07-31 | 2016-08-23 | 国立大学法人徳島大学 | インライン型濃度計及び濃度検出方法 |
| JP5563132B2 (ja) * | 2013-08-05 | 2014-07-30 | 三菱重工業株式会社 | ガス分析装置 |
| CA2886213A1 (en) * | 2014-09-07 | 2015-05-27 | Unisearch Associates Inc. | Gas cell assembly and applications in absorption spectroscopy |
| US9689795B2 (en) * | 2015-03-25 | 2017-06-27 | General Electric Company | Methods and systems to analyze a gas-mixture |
| ITUB20153087A1 (it) * | 2015-08-12 | 2017-02-12 | Bofor S R L | Sistema di monitoraggio per la salvaguardia degli stampi nelle macchine di stampaggio. |
| US9709491B1 (en) * | 2016-03-28 | 2017-07-18 | The United States Of America | System and method for measuring aerosol or trace species |
| US10307803B2 (en) * | 2016-07-20 | 2019-06-04 | The United States Of America As Represented By Secretary Of The Navy | Transmission window cleanliness for directed energy devices |
| US10228324B2 (en) | 2016-07-25 | 2019-03-12 | Mks Instruments, Inc. | Gas measurement system |
| FR3058652B1 (fr) * | 2016-11-17 | 2021-10-15 | Valeo Systemes Dessuyage | Dispositif de protection d’un capteur optique, systeme d’assistance a la conduite et procede de nettoyage associes |
| US10302553B2 (en) * | 2017-08-30 | 2019-05-28 | Lam Research Corporation | Gas exhaust by-product measurement system |
| KR102874785B1 (ko) | 2017-12-01 | 2025-10-23 | 엠케이에스 인코포레이티드 | 라디칼 가스 및 단기 분자를 위한 다중 센서 가스 샘플링 검출 시스템 및 사용 방법 |
| FR3086705B1 (fr) | 2018-09-27 | 2020-10-23 | Pfeiffer Vacuum | Pompe a vide primaire de type seche et procede de controle de l'injection d'un gaz de purge |
| US10465995B1 (en) | 2018-10-03 | 2019-11-05 | Massachusetts Institute Of Technology | Deposition prevention by sweep gas |
| CN111122442A (zh) * | 2018-10-31 | 2020-05-08 | 高利通科技（深圳）有限公司 | 便于清洗的光谱气体测量池 |
| DE102018221190A1 (de) * | 2018-12-07 | 2020-06-10 | Carl Zeiss Smt Gmbh | Verfahren zum Bilden von Nanostrukturen an einer Oberfläche und Wafer-Inspektionssystem |
| KR20250068781A (ko) * | 2019-09-05 | 2025-05-16 | 쉔크 프로세스 엘엘씨 | 레이저 유도 분광 시스템 및 방법 |
| US11852807B2 (en) * | 2020-04-27 | 2023-12-26 | Baker Hughes Oilfield Operations Llc | Optical system and method for cleaning optical windows |
| US11781969B2 (en) * | 2020-11-18 | 2023-10-10 | Kidde Technologies, Inc. | Clean gas curtain to prevent particle buildup during concentration measurement |
| US12055477B2 (en) * | 2021-09-29 | 2024-08-06 | Kidde Technologies, Inc. | Compressed gas cleaning of windows in particle concentration measurement device |
| CN116879174A (zh) * | 2023-07-10 | 2023-10-13 | 江苏大学 | 一种高温气体辅助自疏水防液体飞溅试验观测装置及方法 |
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| JPS616429Y2 (enExample) * | 1979-02-13 | 1986-02-26 | ||
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-
2000
- 2000-07-11 US US09/613,806 patent/US6421127B1/en not_active Expired - Lifetime
- 2000-07-18 EP EP00402043A patent/EP1070943A1/en not_active Withdrawn
- 2000-07-19 SG SG200004043A patent/SG97896A1/en unknown
- 2000-07-19 JP JP2000219116A patent/JP2001153793A/ja active Pending
- 2000-07-19 TW TW089114428A patent/TW496955B/zh active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI809442B (zh) * | 2017-01-05 | 2023-07-21 | 美商伊路米納有限公司 | 模組化的光學分析系統和方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US6421127B1 (en) | 2002-07-16 |
| JP2001153793A (ja) | 2001-06-08 |
| EP1070943A1 (en) | 2001-01-24 |
| SG97896A1 (en) | 2003-08-20 |
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