JP2001110601A - Resistor and manufacturing method therefor - Google Patents

Resistor and manufacturing method therefor

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Publication number
JP2001110601A
JP2001110601A JP29203699A JP29203699A JP2001110601A JP 2001110601 A JP2001110601 A JP 2001110601A JP 29203699 A JP29203699 A JP 29203699A JP 29203699 A JP29203699 A JP 29203699A JP 2001110601 A JP2001110601 A JP 2001110601A
Authority
JP
Japan
Prior art keywords
resistor
cover
metal oxide
electrode
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29203699A
Other languages
Japanese (ja)
Inventor
Naoki Shibuya
直樹 渋谷
Tadao Yagi
唯雄 八木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP29203699A priority Critical patent/JP2001110601A/en
Publication of JP2001110601A publication Critical patent/JP2001110601A/en
Pending legal-status Critical Current

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  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Non-Adjustable Resistors (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a resistor of high reliability, in which a thin-film resistor is not oxidized even when the resistor is used in an atmosphere of high temperature and high humidity or of corrosive gas like sulfur component, and moisture, gas, etc., permeate into the inside from a protective film, and a manufacturing method of the resistor. SOLUTION: This resistor is provided with an upper surface electrode 22 formed on the upper surface of a substrate 21, a thin-film resistor 24 formed in such a manner that both end portions overlap with the electrode 22, a metal oxide film 25 formed covering the thin-film resistor 24 and a part of the electrode 22, a protective film 26 which covers from the end surface of the thin-film resistor 24 to a part positioned outside it and the metal oxide film 25, and a side surface electrode 27 which is formed on the side surface of the substrate 21 and connected electrically with the upper surface electrode 22.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、各種電気機器の回
路に広く用いられる抵抗器およびその製造方法に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resistor widely used in circuits of various electric devices and a method of manufacturing the resistor.

【0002】[0002]

【従来の技術】近年、電子機器の小型化に伴い、電子部
品の実装面積を縮小するため、表面実装部品への要求が
高まっている。その中で、高精度部品であるチップ形の
抵抗器に対する要求も多岐にわたり、特殊な環境下にお
いても信頼性が確保できる薄膜チップ抵抗器の需要が高
まっている。
2. Description of the Related Art In recent years, as electronic devices have become smaller, the mounting area for electronic components has been reduced, and thus the demand for surface-mounted components has increased. Among them, demands for chip-type resistors, which are high-precision parts, are also diverse, and there is an increasing demand for thin-film chip resistors that can ensure reliability even under special environments.

【0003】図7は従来の抵抗器の断面図である。FIG. 7 is a sectional view of a conventional resistor.

【0004】図7において、1はアルミナ等の絶縁体か
らなる基板である。2は基板1の上面に設けられたNi
CrAl合金等の薄膜からなる薄膜抵抗体である。3は
薄膜抵抗体2の上面の端部に設けられ、Niを主成分と
する合金からなる中間電極である。4は薄膜抵抗体2お
よび中間電極3の一部を覆うように設けられた樹脂から
なる保護層である。5は薄膜抵抗体2および中間電極3
と電気的に接続されるように基板1の対向する側面に設
けられたNiCr等からなる側面電極である。6は少な
くとも側面電極5を覆うように基板1の対向する側面に
設けられたNiめっきである。7はNiめっき6を覆う
ように基板1の対向する側面に設けられたはんだめっき
である。
In FIG. 7, reference numeral 1 denotes a substrate made of an insulator such as alumina. Reference numeral 2 denotes Ni provided on the upper surface of the substrate 1.
This is a thin film resistor made of a thin film such as a CrAl alloy. Reference numeral 3 denotes an intermediate electrode provided at an end of the upper surface of the thin film resistor 2 and made of an alloy containing Ni as a main component. Reference numeral 4 denotes a protective layer made of a resin provided so as to cover the thin film resistor 2 and a part of the intermediate electrode 3. 5 is a thin film resistor 2 and an intermediate electrode 3
These are side electrodes made of NiCr or the like provided on opposite side surfaces of the substrate 1 so as to be electrically connected to the substrate 1. Reference numeral 6 denotes Ni plating provided on the opposite side surface of the substrate 1 so as to cover at least the side surface electrode 5. Reference numeral 7 denotes solder plating provided on the opposite side surface of the substrate 1 so as to cover the Ni plating 6.

【0005】以上のように構成された従来の抵抗器につ
いて、以下にその製造方法を説明する。
A method of manufacturing the conventional resistor having the above-described structure will be described below.

【0006】図8(a)〜(f)は従来の抵抗器の製造
方法を示す工程図である。
FIGS. 8A to 8F are process diagrams showing a conventional method for manufacturing a resistor.

【0007】まず、図8(a)に示すように、アルミナ
等の絶縁体からなる基板11の上面全体にスパッタリン
グ工法でNiCrAl合金を約500Åの厚さで着膜
し、薄膜抵抗体12を形成する。
First, as shown in FIG. 8A, a thin film resistor 12 is formed by depositing a NiCrAl alloy to a thickness of about 500.degree. I do.

【0008】次に、図8(b)に示すように、薄膜抵抗
体12の上面全体にスパッタリング工法でNiを主成分
とする合金を約0.5μm着膜する。この後、フォトリ
ソ工法により、この合金の一部を除去して基板11の両
端部に中間電極13を形成するとともに、所定の抵抗値
に近づけるため薄膜抵抗体12の一部を除去し、約30
0〜350℃で約3時間の加熱エージングを行う。
Next, as shown in FIG. 8B, an alloy containing Ni as a main component is deposited to a thickness of about 0.5 μm on the entire upper surface of the thin film resistor 12 by a sputtering method. Thereafter, a part of the alloy is removed by a photolithography method to form intermediate electrodes 13 at both ends of the substrate 11, and a part of the thin film resistor 12 is removed to approximate a predetermined resistance value.
Heat aging is performed at 0 to 350 ° C. for about 3 hours.

【0009】次に、図8(c)に示すように、薄膜抵抗
体12をレーザートリミングにより切削してトリミング
溝14を形成し、抵抗値修正を行う。
Next, as shown in FIG. 8C, the thin film resistor 12 is cut by laser trimming to form a trimming groove 14, and the resistance value is corrected.

【0010】次に、図8(d)に示すように、中間電極
13の一部と薄膜抵抗体12とを覆うように樹脂からな
る保護膜15を形成する。
Next, as shown in FIG. 8D, a protective film 15 made of resin is formed so as to cover a part of the intermediate electrode 13 and the thin film resistor 12.

【0011】次に、図8(e)に示すように、薄膜抵抗
体12および中間電極13と電気的に接続されるよう
に、基板11の側面にスパッタリング工法によりCrを
約200Åの厚さで着膜し、さらにNiVを約1μm着
膜して側面電極16を形成する。
Next, as shown in FIG. 8E, Cr is sputtered on the side surface of the substrate 11 to a thickness of about 200 ° so as to be electrically connected to the thin film resistor 12 and the intermediate electrode 13. Then, NiV is deposited to a thickness of about 1 μm to form the side electrode 16.

【0012】最後に、図8(f)に示すように、中間電
極13および側面電極16を覆うようにニッケルめっき
を約2μmおよびはんだめっきを約6μm着膜してめっ
き層17を形成することにより、従来の抵抗器を製造し
ていた。
Finally, as shown in FIG. 8F, a plating layer 17 is formed by depositing about 2 μm of nickel plating and about 6 μm of solder plating so as to cover the intermediate electrode 13 and the side electrodes 16. Manufacturing conventional resistors.

【0013】[0013]

【発明が解決しようとする課題】上記した従来の抵抗器
では、保護膜15と薄膜抵抗体12または中間電極13
とが樹脂と金属という異種材料であるため、密着力が低
下することがあった。特にこの抵抗器を高温高湿または
硫黄分などの腐食性のガスを含む雰囲気中で用いた場
合、保護膜15の密着力が低下した部分から湿気やガス
等が侵入し、薄膜抵抗体12を酸化させてしまうため、
信頼性が低下するという課題を有していた。
In the conventional resistor described above, the protective film 15 and the thin film resistor 12 or the intermediate electrode 13 are used.
Is a dissimilar material of resin and metal, so that the adhesion may be reduced. In particular, when this resistor is used in an atmosphere containing high-temperature, high-humidity or corrosive gas such as sulfur, moisture, gas, and the like enter from a portion where the adhesion of the protective film 15 is reduced, and the thin film resistor 12 To oxidize,
There was a problem that the reliability was reduced.

【0014】本発明は上記従来の課題を解決するもの
で、高温高湿または硫黄分などの腐食性のガスを含む雰
囲気中で用いた際に、湿気やガス等が保護膜より内部に
侵入したとしても、薄膜抵抗体を酸化させることがない
信頼性の高い抵抗器およびその製造方法を提供すること
を目的とするものである。
The present invention solves the above-mentioned conventional problems. When used in an atmosphere containing a corrosive gas such as high temperature and high humidity or sulfur, moisture, gas, and the like enter into the inside from the protective film. Another object of the present invention is to provide a highly reliable resistor that does not oxidize a thin film resistor and a method of manufacturing the same.

【0015】[0015]

【課題を解決するための手段】上記目的を達成するため
に本発明の抵抗器は、絶縁性の基板と、この基板の上面
の両端部に設けられた少なくとも一対の上面電極と、こ
の一対の上面電極に両端部が重なるように設けられた少
なくとも一つの薄膜抵抗体と、前記薄膜抵抗体および上
面電極の一部を覆うように設けられた金属酸化膜と、前
記薄膜抵抗体の端面より外側に位置する部分までを覆う
とともに前記金属酸化膜の端面より内側を覆うように設
けられた保護膜と、前記一対の上面電極と電気的に接続
されるように前記基板の側面に設けられた側面電極とを
備えたもので、この構成によれば、高温高湿または硫黄
分などの腐食性のガスを含む雰囲気中で用いた際に、湿
気やガス等が保護膜より内部に侵入したとしても、薄膜
抵抗体を酸化させることがない信頼性の高い抵抗器が得
られるものである。
In order to achieve the above object, a resistor according to the present invention comprises an insulating substrate, at least one pair of upper electrodes provided at both ends of the upper surface of the substrate, and a pair of upper electrodes. At least one thin-film resistor provided so that both ends thereof overlap the upper electrode, a metal oxide film provided so as to cover the thin-film resistor and a part of the upper electrode, and an outer side of an end face of the thin-film resistor And a side surface provided on a side surface of the substrate so as to be electrically connected to the pair of upper surface electrodes, while providing a protection film provided so as to cover a portion positioned at a position above the end surface of the metal oxide film. According to this configuration, when used in an atmosphere containing corrosive gas such as high temperature and high humidity or sulfur content, even if moisture or gas intrudes from the protective film, Oxidize the thin film resistor It is intended that there is no reliable resistors can be obtained.

【0016】[0016]

【発明の実施の形態】本発明の請求項1に記載の発明
は、絶縁性の基板と、この基板の上面の両端部に設けら
れた少なくとも一対の上面電極と、この一対の上面電極
に両端部が重なるように設けられた少なくとも一つの薄
膜抵抗体と、前記薄膜抵抗体および上面電極の一部を覆
うように設けられた金属酸化膜と、前記薄膜抵抗体の端
面より外側に位置する部分までを覆うとともに前記金属
酸化膜の端面より内側を覆うように設けられた保護膜
と、前記一対の上面電極と電気的に接続されるように前
記基板の側面に設けられた側面電極とを備えたもので、
この構成によれば、薄膜抵抗体および上面電極の一部を
覆うように金属酸化膜を設けているため、高温高湿また
は硫黄分などの腐食性のガスを含む雰囲気中で用いた際
に、湿気やガス等が保護膜より内部に侵入したとして
も、金属酸化膜の存在により、薄膜抵抗体の酸化を防止
することができるという作用を有するものである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The invention according to claim 1 of the present invention is directed to an insulating substrate, at least a pair of upper electrodes provided at both ends of an upper surface of the substrate, and a pair of upper electrodes provided at both ends of the pair of upper electrodes. At least one thin-film resistor provided so that portions overlap each other; a metal oxide film provided so as to cover the thin-film resistor and a part of an upper electrode; and a portion located outside an end face of the thin-film resistor. And a side surface electrode provided on a side surface of the substrate so as to be electrically connected to the pair of upper surface electrodes. That
According to this configuration, since the metal oxide film is provided so as to cover a part of the thin-film resistor and the upper surface electrode, when used in an atmosphere containing corrosive gas such as high temperature and high humidity or sulfur content, Even if moisture, gas or the like intrudes through the protective film, the presence of the metal oxide film has the effect of preventing oxidation of the thin film resistor.

【0017】請求項2に記載の発明は、絶縁性の基板
と、この基板の上面の両端部に設けられた少なくとも一
対の上面電極と、この一対の上面電極に両端部が重なる
ように設けられた少なくとも一つの薄膜抵抗体と、前記
薄膜抵抗体および上面電極の一部を覆うように設けられ
た金属酸化膜と、前記薄膜抵抗体を覆うとともに前記金
属酸化膜の端面より内側を覆うように設けられた保護膜
と、前記上面電極および金属酸化膜の上面を覆いかつ保
護膜に接するように設けられた導電性樹脂材料からなる
中間電極と、前記上面電極および中間電極と電気的に接
続されるように前記基板の側面に設けられた側面電極と
を備えたもので、この構成によれば、導電性材料からな
る中間電極に接するように保護膜を金属酸化膜上に設け
ているため、保護膜を金属酸化膜上のみに設けたものに
比べ、保護膜の密着力が向上するという作用を有するも
のである。
According to a second aspect of the present invention, there is provided an insulating substrate, at least a pair of upper electrodes provided on both ends of the upper surface of the substrate, and both ends provided to overlap the pair of upper electrodes. And at least one thin-film resistor, a metal oxide film provided so as to cover the thin-film resistor and a part of the top electrode, and so as to cover the thin-film resistor and to cover an inner side of an end face of the metal oxide film. A protective film provided, an intermediate electrode made of a conductive resin material provided so as to cover the upper surface of the upper electrode and the metal oxide film and to be in contact with the protective film, and electrically connected to the upper electrode and the intermediate electrode; And a side electrode provided on the side surface of the substrate as described above. According to this configuration, the protective film is provided on the metal oxide film so as to be in contact with the intermediate electrode made of a conductive material. Protective film Compared with those provided only on the metal oxide film, adhesion of the protective film is expected to have an effect of improving.

【0018】請求項3に記載の発明は、請求項2に記載
の発明において、保護膜を、薄膜抵抗体の端面より外側
に位置する部分までを覆うとともに金属酸化膜の端面よ
り内側を覆うように設けたもので、この構成によれば、
薄膜抵抗体の上面が金属酸化膜と保護膜とで完全に覆わ
れるため、上面からの湿気やガス等が薄膜抵抗体の内部
に侵入しにくいという作用を有するものである。
According to a third aspect of the present invention, in the second aspect of the present invention, the protective film covers the portion located outside the end face of the thin film resistor and also covers the inside from the end face of the metal oxide film. According to this configuration,
Since the upper surface of the thin-film resistor is completely covered with the metal oxide film and the protective film, the thin-film resistor has an effect that it is difficult for moisture, gas and the like from the upper surface to enter the inside of the thin-film resistor.

【0019】請求項4に記載の発明は、請求項2に記載
の発明において、保護膜を、薄膜抵抗体の端面より内側
を覆うとともに金属酸化膜の端面より内側を覆うように
設けたもので、この構成によれば、保護膜が薄膜抵抗体
の端面より内側に位置しているため、この保護膜に接す
るように設けられる導電性樹脂材料からなる中間電極層
を大きくすることができ、これにより、金属酸化膜と薄
膜抵抗体との密着力が向上するという作用を有するもの
である。
According to a fourth aspect of the present invention, in the second aspect, the protective film is provided so as to cover the inside from the end face of the thin film resistor and to cover the inside from the end face of the metal oxide film. According to this configuration, since the protective film is located inside the end face of the thin-film resistor, the intermediate electrode layer made of a conductive resin material provided so as to be in contact with the protective film can be enlarged. Thereby, the adhesion between the metal oxide film and the thin film resistor is improved.

【0020】請求項5に記載の発明は、絶縁性の基板の
上面の両端部に少なくとも一対の上面電極を形成し、こ
の一対の上面電極に両端部が重なるように少なくとも一
つの薄膜抵抗体を形成し、前記薄膜抵抗体および上面電
極の一部を覆うように金属酸化膜を形成し、前記薄膜抵
抗体の端面より外側に位置する部分までを覆うとともに
前記金属酸化膜の端面より内側を覆うように保護膜を形
成し、前記一対の上面電極と電気的に接続されるように
前記基板の側面に側面電極を形成するようにしたもの
で、この製造方法によれば、薄膜抵抗体および上面電極
の一部を覆うように金属酸化膜を形成しているため、高
温高湿または硫黄分などの腐食性のガスを含む雰囲気中
で用いた際に、湿気やガス等が保護膜より内部に侵入し
たとしても、金属酸化膜の存在により、薄膜抵抗体の酸
化を防止することができるという作用を有するものであ
る。
According to a fifth aspect of the present invention, at least one pair of upper electrodes is formed at both ends of the upper surface of the insulating substrate, and at least one thin film resistor is formed so that both ends overlap the pair of upper electrodes. Forming a metal oxide film so as to cover the thin film resistor and a part of the upper electrode, and to cover a portion located outside an end face of the thin film resistor and to cover an inside from an end face of the metal oxide film. A protective film is formed as described above, and a side electrode is formed on a side surface of the substrate so as to be electrically connected to the pair of upper electrodes. According to this manufacturing method, the thin film resistor and the upper surface are formed. Since a metal oxide film is formed to cover a part of the electrode, when used in an atmosphere containing corrosive gas such as high temperature and high humidity or sulfur, moisture and gas etc. Even if invaded, metal acid The presence of the film, and has an effect that it is possible to prevent oxidation of the thin film resistor.

【0021】請求項6に記載の発明は、絶縁性の基板の
上面の両端部に少なくとも一対の上面電極を形成し、こ
の一対の上面電極に両端部が重なるように少なくとも一
つの薄膜抵抗体を形成し、前記薄膜抵抗体および上面電
極の一部を覆うように金属酸化膜を形成し、前記金属酸
化膜の端面より内側を覆うように保護膜を形成し、前記
上面電極および金属酸化膜の上面を覆いかつ保護膜に接
するように導電性樹脂材料からなる中間電極を形成し、
前記上面電極および中間電極と電気的に接続されるよう
に前記基板の側面に側面電極を形成するようにしたもの
で、この製造方法によれば、導電性樹脂材料からなる中
間電極に接するように保護膜を金属酸化膜上に形成する
ようにしているため、保護膜を金属酸化膜上のみに形成
するようにしたものに比べ、保護膜の密着力が向上する
という作用を有するものである。
According to a sixth aspect of the present invention, at least one pair of upper electrodes is formed at both ends of the upper surface of the insulating substrate, and at least one thin film resistor is formed so that both ends overlap the pair of upper electrodes. Forming a metal oxide film so as to cover the thin film resistor and a part of the upper electrode; forming a protective film so as to cover an inner side of an end face of the metal oxide film; Forming an intermediate electrode made of a conductive resin material so as to cover the upper surface and contact the protective film,
A side electrode is formed on the side surface of the substrate so as to be electrically connected to the upper electrode and the intermediate electrode. According to this manufacturing method, the side electrode is formed so as to be in contact with the intermediate electrode made of a conductive resin material. Since the protective film is formed on the metal oxide film, it has an effect of improving the adhesion of the protective film as compared with the case where the protective film is formed only on the metal oxide film.

【0022】(実施の形態1)以下、本発明の実施の形
態1における抵抗器について、図面を参照しながら説明
する。
(Embodiment 1) Hereinafter, a resistor according to Embodiment 1 of the present invention will be described with reference to the drawings.

【0023】図1は本発明の実施の形態1における抵抗
器の断面図である。
FIG. 1 is a sectional view of a resistor according to the first embodiment of the present invention.

【0024】図1において、21は96%アルミナを含
有してなる絶縁性の基板である。22は基板21の上面
の両端部に少なくとも一対設けられたAu系等の金属か
らなる上面電極である。23は必要に応じて基板21の
下面の両端部に少なくとも一対設けられたAu系等の金
属からなる下面電極である。24は一対の上面電極22
に両端部が重なるように少なくとも一つ設けられたNi
Cr系等の金属からなる薄膜抵抗体である。25は薄膜
抵抗体24および上面電極22の一部を覆うように設け
られた酸化アルミ、酸化珪素または酸化チタン等からな
る金属酸化膜である。26は薄膜抵抗体24の端面より
外側に位置する部分までを覆うとともに金属酸化膜25
の端面より内側を覆うように設けられたエポキシ系の樹
脂からなる保護膜である。27は一対の上面電極22と
電気的に接続されるように基板21の側面に設けられた
側面電極である。28は露出した金属酸化膜25、上面
電極22および側面電極27を覆うように設けられたニ
ッケルめっきである。29はニッケルめっき28を覆う
ように設けられたはんだめっきである。
In FIG. 1, reference numeral 21 denotes an insulating substrate containing 96% alumina. Reference numeral 22 denotes an upper surface electrode made of a metal such as Au and provided at least as a pair at both ends of the upper surface of the substrate 21. Reference numeral 23 denotes a lower surface electrode made of an Au-based metal or the like provided at least as a pair on both ends of the lower surface of the substrate 21 as necessary. 24 is a pair of upper electrodes 22
Provided at least one so that both ends overlap
It is a thin film resistor made of a metal such as Cr. Reference numeral 25 denotes a metal oxide film made of aluminum oxide, silicon oxide, titanium oxide, or the like provided so as to cover the thin film resistor 24 and a part of the upper electrode 22. Reference numeral 26 denotes a metal oxide film 25 which covers a portion located outside the end face of the thin film resistor 24 and
Is a protective film made of an epoxy-based resin provided so as to cover the inside from the end face. Reference numeral 27 denotes a side electrode provided on a side surface of the substrate 21 so as to be electrically connected to the pair of upper electrodes 22. Reference numeral 28 denotes nickel plating provided so as to cover the exposed metal oxide film 25, upper surface electrode 22, and side electrode 27. Reference numeral 29 denotes solder plating provided so as to cover the nickel plating 28.

【0025】以上のように構成された抵抗器について、
以下にその製造方法を図面を参照しながら説明する。
With respect to the resistor configured as described above,
Hereinafter, the manufacturing method will be described with reference to the drawings.

【0026】図2(a)〜(g)は本発明の実施の形態
1における抵抗器の製造方法を示す工程図である。
FIGS. 2A to 2G are process diagrams showing a method of manufacturing the resistor according to the first embodiment of the present invention.

【0027】まず、図2(a)に示すように、96%ア
ルミナを含有してなる絶縁性の基板31の上面の両端部
にAuを主成分とする金属有機物からなるペーストをス
クリーン印刷して乾燥させる。さらにベルト式連続焼成
炉を用いて、約850℃で、ピーク時間約6分、IN−
OUT時間約45分のプロファイルで焼成することによ
り、少なくとも一対の上面電極32を形成する。なお、
必要により、上面電極32と同様の工法で基板31の下
面の両端部に下面電極(図示せず)を形成してもよい。
First, as shown in FIG. 2A, paste made of a metal organic material containing Au as a main component is screen-printed on both ends of the upper surface of an insulating substrate 31 containing 96% alumina. dry. Further, using a belt-type continuous firing furnace, at about 850 ° C., a peak time of about 6 minutes, and an IN-
By baking with an OUT time of about 45 minutes, at least one pair of upper electrodes 32 is formed. In addition,
If necessary, lower surface electrodes (not shown) may be formed on both ends of the lower surface of the substrate 31 by the same method as the upper surface electrode 32.

【0028】次に、図2(b)に示すように、一対の上
面電極32に両端部が重なるようにスパッタリング工法
でNiCr系の金属材料を着膜し、少なくとも一つの薄
膜抵抗体33を形成する。さらに所定の抵抗値に近づけ
るためにこの薄膜抵抗体33にフォトリソ工法により第
1の溝34を形成して抵抗値を調整する。
Next, as shown in FIG. 2B, a NiCr-based metal material is deposited by a sputtering method so that both ends overlap the pair of upper electrodes 32, and at least one thin-film resistor 33 is formed. I do. Further, a first groove 34 is formed in the thin film resistor 33 by a photolithography method so as to approach a predetermined resistance value, and the resistance value is adjusted.

【0029】次に、図2(c)に示すように、少なくと
も薄膜抵抗体33を覆うように酸化アルミ、酸化珪素ま
たは酸化チタン等をスパッタリング工法で約100〜5
00Åの厚さで着膜し、フォトリソ工法により所定のパ
ターンとして薄膜抵抗体33と上面電極32の一部を覆
う金属酸化膜35を形成する。さらに薄膜抵抗体33を
安定させるため、約250〜350℃で約5時間の熱エ
ージングを行う。
Next, as shown in FIG. 2C, aluminum oxide, silicon oxide, titanium oxide or the like is sputtered to a thickness of about 100 to 5 so as to cover at least the thin film resistor 33.
A metal oxide film 35 covering a part of the thin film resistor 33 and the upper electrode 32 is formed as a predetermined pattern by a photolithography method. Further, in order to stabilize the thin film resistor 33, thermal aging is performed at about 250 to 350 ° C. for about 5 hours.

【0030】次に、図2(d)に示すように、薄膜抵抗
体33の抵抗値を所定の抵抗値にするためにレーザート
リミングにより第2の溝36を形成し、抵抗値を調整す
る。
Next, as shown in FIG. 2D, a second groove 36 is formed by laser trimming to adjust the resistance value of the thin film resistor 33 to a predetermined resistance value, and the resistance value is adjusted.

【0031】次に、図2(e)に示すように、薄膜抵抗
体33の端面より外側に位置する部分までを覆うととも
に金属酸化膜35の端面より内側を覆うようにエポキシ
系樹脂ペーストをスクリーン印刷し、約200℃の乾燥
機内で約30分間乾燥させて保護膜37を形成する。
Next, as shown in FIG. 2E, an epoxy resin paste is screen-coated so as to cover the portion located outside the end face of the thin film resistor 33 and to cover the inside from the end face of the metal oxide film 35. Printing is performed and dried in a dryer at about 200 ° C. for about 30 minutes to form a protective film 37.

【0032】次に、図2(f)に示すように、一対の上
面電極32と電気的に接続されるように基板31の側面
にNiCr系の金属材料をスパッタリング工法で着膜
し、側面電極38を形成する。
Next, as shown in FIG. 2F, a NiCr-based metal material is deposited on the side surface of the substrate 31 by a sputtering method so as to be electrically connected to the pair of upper surface electrodes 32, and the side electrode is formed. 38 are formed.

【0033】最後に、図2(g)に示すように、露出し
た金属酸化膜35、上面電極32および側面電極38を
覆うようにニッケルめっきおよびはんだめっきからなる
めっき層39を形成して本発明の抵抗器を製造するもの
である。
Finally, as shown in FIG. 2G, a plating layer 39 made of nickel plating and solder plating is formed so as to cover the exposed metal oxide film 35, upper electrode 32 and side electrode 38. To manufacture resistors.

【0034】(実施の形態2)以下、本発明の実施の形
態2における抵抗器について、図面を参照しながら説明
する。
(Embodiment 2) Hereinafter, a resistor according to Embodiment 2 of the present invention will be described with reference to the drawings.

【0035】図3は本発明の実施の形態2における抵抗
器の断面図である。
FIG. 3 is a sectional view of a resistor according to the second embodiment of the present invention.

【0036】図3において、41は96%アルミナを含
有してなる絶縁性の基板である。42は基板41の上面
の両端部に少なくとも一対設けられたAu系等の金属か
らなる上面電極である。43は必要に応じて基板41の
下面の両端部に少なくとも一対設けられたAu系等の金
属からなる下面電極である。44は一対の上面電極42
に両端部が重なるように少なくとも一つ設けられたNi
Cr系等の金属からなる薄膜抵抗体である。45は薄膜
抵抗体44および上面電極42の一部を覆うように設け
られた酸化アルミ、酸化珪素または酸化チタン等からな
る金属酸化膜である。46は薄膜抵抗体44の端面より
外側に位置する部分までを覆うとともに金属酸化膜45
の端面より内側を覆うように設けられたエポキシ系の樹
脂からなる保護膜である。47は前記上面電極42およ
び金属酸化膜45の上面の一部を覆いかつ保護膜46に
接するように設けられた導電性樹脂材料からなる中間電
極である。48は上面電極42および中間電極47と電
気的に接続されるように基板41の側面に設けられた側
面電極である。49は露出した金属酸化膜45、上面電
極42および側面電極48を覆うように設けられたニッ
ケルめっきである。50はニッケルめっき49を覆うよ
うに設けられたはんだめっきである。
In FIG. 3, reference numeral 41 denotes an insulating substrate containing 96% alumina. Reference numeral 42 denotes an upper surface electrode made of a metal such as Au and provided at least in pairs at both ends of the upper surface of the substrate 41. Reference numeral 43 denotes a lower surface electrode made of a metal such as Au and provided at least as a pair at both ends of the lower surface of the substrate 41 as necessary. 44 is a pair of upper electrodes 42
Provided at least one so that both ends overlap
It is a thin film resistor made of a metal such as Cr. Reference numeral 45 denotes a metal oxide film made of aluminum oxide, silicon oxide, titanium oxide, or the like provided so as to cover the thin film resistor 44 and a part of the upper electrode 42. Reference numeral 46 denotes a metal oxide film 45 that covers a portion located outside the end face of the thin film resistor 44 and a metal oxide film 45.
Is a protective film made of an epoxy-based resin provided so as to cover the inside from the end face. Reference numeral 47 denotes an intermediate electrode made of a conductive resin material provided so as to cover a part of the upper surfaces of the upper electrode 42 and the metal oxide film 45 and to be in contact with the protective film 46. Reference numeral 48 denotes a side surface electrode provided on the side surface of the substrate 41 so as to be electrically connected to the upper surface electrode 42 and the intermediate electrode 47. Reference numeral 49 denotes nickel plating provided so as to cover the exposed metal oxide film 45, the upper electrode 42, and the side electrodes 48. 50 is a solder plating provided so as to cover the nickel plating 49.

【0037】以上のように構成された抵抗器について、
以下にその製造方法を図面を参照しながら説明する。
With respect to the resistor configured as described above,
Hereinafter, the manufacturing method will be described with reference to the drawings.

【0038】図4(a)〜(h)は本発明の実施の形態
2における抵抗器の製造方法を示す工程図である。
FIGS. 4A to 4H are process diagrams showing a method of manufacturing a resistor according to the second embodiment of the present invention.

【0039】まず、図4(a)に示すように、96%ア
ルミナを含有してなる絶縁性の基板51の上面の両端部
にAuを主成分とする金属有機物からなるペーストをス
クリーン印刷して乾燥させる。さらにベルト式連続焼成
炉を用いて、約850℃で、ピーク時間約6分、IN−
OUT時間約45分のプロファイルで焼成することによ
り、少なくとも一対の上面電極52を形成する。なお、
必要により、上面電極52と同様の工法で基板51の下
面の両端部に下面電極(図示せず)を形成してもよい。
First, as shown in FIG. 4A, paste made of a metal organic material containing Au as a main component is screen-printed on both ends of the upper surface of an insulating substrate 51 containing 96% alumina. dry. Further, using a belt-type continuous firing furnace, at about 850 ° C., a peak time of about 6 minutes, and an IN-
By baking with an OUT time profile of about 45 minutes, at least one pair of upper electrodes 52 is formed. In addition,
If necessary, lower surface electrodes (not shown) may be formed on both ends of the lower surface of the substrate 51 by the same method as the upper electrode 52.

【0040】次に、図4(b)に示すように、一対の上
面電極52に両端部が重なるようにスパッタリング工法
でNiCr系の金属材料を着膜し、少なくとも一つの薄
膜抵抗体53を形成する。さらに所定の抵抗値に近づけ
るためにこの薄膜抵抗体53にフォトリソ工法により第
1の溝54を形成して抵抗値を調整する。
Next, as shown in FIG. 4B, a NiCr-based metal material is deposited by a sputtering method so that both ends overlap the pair of upper electrodes 52, and at least one thin film resistor 53 is formed. I do. Further, a first groove 54 is formed in the thin film resistor 53 by a photolithography method so as to approach a predetermined resistance value, and the resistance value is adjusted.

【0041】次に、図4(c)に示すように、少なくと
も薄膜抵抗体53を覆うように酸化アルミ、酸化珪素ま
たは酸化チタン等をスパッタリング工法で約100〜1
0000Åの厚さで着膜し、フォトリソ工法により所定
のパターンとして薄膜抵抗体53と上面電極52の一部
を覆う金属酸化膜55を形成する。さらに薄膜抵抗体5
3を安定させるため、約250〜350℃で約5時間の
熱エージングを行う。
Next, as shown in FIG. 4C, aluminum oxide, silicon oxide, titanium oxide or the like is sputtered to a thickness of about 100 to 1 so as to cover at least the thin film resistor 53.
Then, a thin film resistor 53 and a metal oxide film 55 covering a part of the upper electrode 52 are formed as a predetermined pattern by a photolithography method. Furthermore, a thin film resistor 5
In order to stabilize 3, heat aging is performed at about 250 to 350 ° C. for about 5 hours.

【0042】次に、図4(d)に示すように、薄膜抵抗
体53の抵抗値を所定の抵抗値にするためにレーザート
リミングにより第2の溝56を形成し、抵抗値を調整す
る。
Next, as shown in FIG. 4D, a second groove 56 is formed by laser trimming to adjust the resistance of the thin film resistor 53 to a predetermined resistance, and the resistance is adjusted.

【0043】次に、図4(e)に示すように、薄膜抵抗
体53の端面より外側に位置する部分までを覆うととも
に金属酸化膜55の端面より内側を覆うようにエポキシ
系樹脂ペーストをスクリーン印刷し、約200℃の乾燥
機内で約30分間乾燥させて保護膜57を形成する。
Next, as shown in FIG. 4E, an epoxy resin paste is screen-coated so as to cover the portion located outside the end face of the thin film resistor 53 and to cover the inside from the end face of the metal oxide film 55. Printing is performed and dried in a dryer at about 200 ° C. for about 30 minutes to form a protective film 57.

【0044】次に、図4(f)に示すように、上面電極
52および金属酸化膜55の上面を覆いかつ保護膜57
に接するように導電性樹脂材料からなる中間電極58を
形成する。このとき、中間電極58を形成する導電性樹
脂材料として、保護膜57と同系の材料、例えばエポキ
シ系、フェノール系などの樹脂材料を用いると、中間電
極58と保護膜57との密着力が向上し、これにより、
湿気やガス等が薄膜抵抗体53の内部に侵入するのを防
止する効果がさらに高まるものである。また、前記金属
酸化膜55の厚みが500Åを越えても密着力は保たれ
るものである。
Next, as shown in FIG. 4F, the upper surface of the upper electrode 52 and the metal oxide film 55 are covered and the protective film 57 is formed.
An intermediate electrode 58 made of a conductive resin material is formed so as to be in contact with. At this time, if a material similar to the protective film 57, for example, a resin material such as an epoxy-based or phenol-based resin is used as the conductive resin material for forming the intermediate electrode 58, the adhesion between the intermediate electrode 58 and the protective film 57 is improved. And this
The effect of preventing moisture, gas, and the like from entering the inside of the thin film resistor 53 is further enhanced. Further, even if the thickness of the metal oxide film 55 exceeds 500 °, the adhesion is maintained.

【0045】次に、図4(g)に示すように、上面電極
52および中間電極58と電気的に接続されるように基
板51の側面にNiCr系の金属材料をスパッタリング
工法で着膜し、側面電極59を形成する。
Next, as shown in FIG. 4G, a NiCr-based metal material is deposited on the side surface of the substrate 51 by a sputtering method so as to be electrically connected to the upper electrode 52 and the intermediate electrode 58. A side electrode 59 is formed.

【0046】最後に、図4(h)に示すように、露出し
た金属酸化膜55、上面電極52および側面電極59を
覆うようにニッケルめっきおよびはんだめっきからなる
めっき層60を形成して本発明の抵抗器を製造するもの
である。
Finally, as shown in FIG. 4 (h), a plating layer 60 made of nickel plating and solder plating is formed so as to cover the exposed metal oxide film 55, the upper electrode 52 and the side electrode 59. To manufacture resistors.

【0047】なお、上記本発明の実施の形態2において
は、保護膜57を設けた後に中間電極58を形成する工
法としたが、これに限定されるものではなく、例えば金
属酸化膜55を形成し、そして熱エージングした後に中
間電極58を形成してもよいものである。
In the second embodiment of the present invention, the intermediate electrode 58 is formed after the protection film 57 is provided. However, the present invention is not limited to this. For example, the metal oxide film 55 may be formed. Then, after thermal aging, the intermediate electrode 58 may be formed.

【0048】また、図3においては、保護膜46を薄膜
抵抗体44の端面より外側に位置する部分までを覆うよ
うに設けたものについて説明したが、図5に示すよう
に、保護膜61を薄膜抵抗体62の端面より内側を覆う
とともに金属酸化膜63の端面より内側を覆うように設
けてもよいものである。この場合、保護膜61が薄膜抵
抗体62の端面より内側に位置しているため、この保護
膜61に接するように設けられる導電性樹脂材料からな
る中間電極64をさらに大きくすることができ、これに
より、金属酸化膜63と薄膜抵抗体62との密着力が向
上するものである。
In FIG. 3, the case where the protective film 46 is provided so as to cover the portion located outside the end face of the thin film resistor 44 has been described. However, as shown in FIG. It may be provided so as to cover the inside of the end face of the thin film resistor 62 and the inside of the end face of the metal oxide film 63. In this case, since the protective film 61 is located inside the end face of the thin film resistor 62, the intermediate electrode 64 made of a conductive resin material provided to be in contact with the protective film 61 can be further enlarged. Thereby, the adhesion between the metal oxide film 63 and the thin film resistor 62 is improved.

【0049】そしてまた、上記本発明の実施の形態にお
いては、一つの薄膜抵抗体と一対の上面電極で構成され
ている抵抗器に採用したものについて説明したが、図6
に示すような基板71の上面に薄膜抵抗体(図示せず)
と複数対の上面電極72とを備えた多連形の抵抗器に採
用した場合においても、本発明の実施の形態と同様の効
果が得られるものである。
Further, in the above-described embodiment of the present invention, the description has been given of the case where the present invention is applied to a resistor composed of one thin-film resistor and a pair of upper electrodes.
A thin film resistor (not shown) is provided on the upper surface of the substrate 71 as shown in FIG.
The same effects as those of the embodiment of the present invention can be obtained even when the present invention is employed in a multiple-type resistor having a plurality of pairs of upper electrodes 72.

【0050】[0050]

【発明の効果】以上のように本発明の抵抗器は、絶縁性
の基板と、この基板の上面の両端部に設けられた少なく
とも一対の上面電極と、この一対の上面電極に両端部が
重なるように設けられた少なくとも一つの薄膜抵抗体
と、前記薄膜抵抗体および上面電極の一部を覆うように
設けられた金属酸化膜と、前記薄膜抵抗体の端面より外
側に位置する部分までを覆うとともに前記金属酸化膜の
端面より内側を覆うように設けられた保護膜と、前記一
対の上面電極と電気的に接続されるように前記基板の側
面に設けられた側面電極とを備えたもので、この構成に
よれば、薄膜抵抗体および上面電極の一部を覆うように
金属酸化膜を設けているため、高温高湿または硫黄分な
どの腐食性のガスを含む雰囲気中で用いた際に、湿気や
ガス等が保護膜より内部に侵入したとしても、金属酸化
膜の存在により、薄膜抵抗体の酸化を防止することがで
き、これにより、信頼性の高い抵抗器を得ることができ
るというすぐれた効果を有するものである。
As described above, the resistor according to the present invention has an insulating substrate, at least a pair of upper electrodes provided at both ends of the upper surface of the substrate, and both ends overlapping the pair of upper electrodes. At least one thin-film resistor provided as described above, a metal oxide film provided so as to cover the thin-film resistor and a part of the upper electrode, and a portion located outside the end face of the thin-film resistor. A protective film provided so as to cover an inner side of an end face of the metal oxide film, and a side electrode provided on a side surface of the substrate so as to be electrically connected to the pair of upper electrodes. According to this configuration, since the metal oxide film is provided so as to cover the thin-film resistor and a part of the upper electrode, when used in an atmosphere containing corrosive gas such as high temperature and high humidity or sulfur content, Moisture, gas, etc. from the protective film Even invaded part, by the presence of a metal oxide film, it is possible to prevent oxidation of the thin film resistor, thereby, those having an excellent effect that it is possible to obtain a highly reliable resistors.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態1における抵抗器の断面図FIG. 1 is a sectional view of a resistor according to a first embodiment of the present invention.

【図2】(a)〜(g)同抵抗器の製造方法を示す工程
FIGS. 2A to 2G are process diagrams showing a method for manufacturing the resistor.

【図3】本発明の実施の形態2における抵抗器の断面図FIG. 3 is a sectional view of a resistor according to a second embodiment of the present invention.

【図4】(a)〜(h)同抵抗器の製造方法を示す工程
FIGS. 4A to 4H are process diagrams showing a method for manufacturing the resistor.

【図5】本発明の実施の形態2における他の例を示す抵
抗器の断面図
FIG. 5 is a sectional view of a resistor showing another example according to the second embodiment of the present invention;

【図6】本発明の実施の形態における多連形の抵抗器の
上面図
FIG. 6 is a top view of a multiple resistor according to the embodiment of the present invention.

【図7】従来の抵抗器の断面図FIG. 7 is a sectional view of a conventional resistor.

【図8】(a)〜(f)同抵抗器の製造方法を示す工程
FIGS. 8A to 8F are process diagrams showing a method for manufacturing the resistor.

【符号の説明】[Explanation of symbols]

21,31,41,51,71 基板 22,32,42,52,72 上面電極 24,33,44,53,62 薄膜抵抗体 25,35,45,55,63 金属酸化膜 26,37,46,57,61 保護膜 27,38,48,59 側面電極 47,58 中間電極 21, 31, 41, 51, 71 Substrate 22, 32, 42, 52, 72 Upper electrode 24, 33, 44, 53, 62 Thin film resistor 25, 35, 45, 55, 63 Metal oxide film 26, 37, 46 , 57, 61 Protective film 27, 38, 48, 59 Side electrode 47, 58 Intermediate electrode

フロントページの続き Fターム(参考) 5E032 BA12 BB01 CA02 CC14 CC16 TA13 TB02 5E033 AA02 BB02 BC01 BD01 BE02 BF05 BG02 BG03 BH02 Continued on the front page F term (reference) 5E032 BA12 BB01 CA02 CC14 CC16 TA13 TB02 5E033 AA02 BB02 BC01 BD01 BE02 BF05 BG02 BG03 BH02

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 絶縁性の基板と、この基板の上面の両端
部に設けられた少なくとも一対の上面電極と、この一対
の上面電極に両端部が重なるように設けられた少なくと
も一つの薄膜抵抗体と、前記薄膜抵抗体および上面電極
の一部を覆うように設けられた金属酸化膜と、前記薄膜
抵抗体の端面より外側に位置する部分までを覆うととも
に前記金属酸化膜の端面より内側を覆うように設けられ
た保護膜と、前記一対の上面電極と電気的に接続される
ように前記基板の側面に設けられた側面電極とを備えた
抵抗器。
1. An insulating substrate, at least one pair of upper electrodes provided at both ends of an upper surface of the substrate, and at least one thin-film resistor provided so that both ends overlap the pair of upper electrodes. And a metal oxide film provided so as to cover the thin film resistor and a part of the upper electrode, and a portion located outside an end face of the thin film resistor and also covers an inside from an end face of the metal oxide film. A protective film provided as described above, and side electrodes provided on side surfaces of the substrate so as to be electrically connected to the pair of upper electrodes.
【請求項2】 絶縁性の基板と、この基板の上面の両端
部に設けられた少なくとも一対の上面電極と、この一対
の上面電極に両端部が重なるように設けられた少なくと
も一つの薄膜抵抗体と、前記薄膜抵抗体および上面電極
の一部を覆うように設けられた金属酸化膜と、前記薄膜
抵抗体を覆うとともに前記金属酸化膜の端面より内側を
覆うように設けられた保護膜と、前記上面電極および金
属酸化膜の上面を覆いかつ保護膜に接するように設けら
れた導電性樹脂材料からなる中間電極と、前記上面電極
および中間電極と電気的に接続されるように前記基板の
側面に設けられた側面電極とを備えた抵抗器。
2. An insulating substrate, at least one pair of upper electrodes provided at both ends of an upper surface of the substrate, and at least one thin-film resistor provided so that both ends overlap the pair of upper electrodes. A metal oxide film provided so as to cover a part of the thin film resistor and the upper electrode, and a protective film provided so as to cover the thin film resistor and to cover an inner side of an end face of the metal oxide film, An intermediate electrode made of a conductive resin material provided to cover the upper surface of the upper electrode and the metal oxide film and to be in contact with the protective film; and a side surface of the substrate so as to be electrically connected to the upper electrode and the intermediate electrode. And a side electrode provided in the resistor.
【請求項3】 保護膜を、薄膜抵抗体の端面より外側に
位置する部分までを覆うとともに金属酸化膜の端面より
内側を覆うように設けた請求項2記載の抵抗器。
3. The resistor according to claim 2, wherein the protective film is provided so as to cover a portion located outside the end face of the thin film resistor and to cover the inside from the end face of the metal oxide film.
【請求項4】 保護膜を、薄膜抵抗体の端面より内側を
覆うとともに金属酸化膜の端面より内側を覆うように設
けた請求項2記載の抵抗器。
4. The resistor according to claim 2, wherein the protective film is provided so as to cover the inside from the end face of the thin film resistor and to cover the inside from the end face of the metal oxide film.
【請求項5】 絶縁性の基板の上面の両端部に少なくと
も一対の上面電極を形成し、この一対の上面電極に両端
部が重なるように少なくとも一つの薄膜抵抗体を形成
し、前記薄膜抵抗体および上面電極の一部を覆うように
金属酸化膜を形成し、前記薄膜抵抗体の端面より外側に
位置する部分までを覆うとともに前記金属酸化膜の端面
より内側を覆うように保護膜を形成し、前記一対の上面
電極と電気的に接続されるように前記基板の側面に側面
電極を形成するようにした抵抗器の製造方法。
5. At least one pair of upper electrodes is formed at both ends of an upper surface of an insulating substrate, and at least one thin film resistor is formed so that both ends overlap the pair of upper electrodes. A metal oxide film is formed so as to cover a part of the upper electrode, and a protective film is formed so as to cover a portion located outside an end face of the thin film resistor and to cover an inside from an end face of the metal oxide film. A method of manufacturing a resistor, wherein side electrodes are formed on side surfaces of the substrate so as to be electrically connected to the pair of upper electrodes.
【請求項6】 絶縁性の基板の上面の両端部に少なくと
も一対の上面電極を形成し、この一対の上面電極に両端
部が重なるように少なくとも一つの薄膜抵抗体を形成
し、前記薄膜抵抗体および上面電極の一部を覆うように
金属酸化膜を形成し、前記金属酸化膜の端面より内側を
覆うように保護膜を形成し、前記上面電極および金属酸
化膜の上面を覆いかつ保護膜に接するように導電性樹脂
材料からなる中間電極を形成し、前記上面電極および中
間電極と電気的に接続されるように前記基板の側面に側
面電極を形成するようにした抵抗器の製造方法。
6. At least one pair of upper electrodes is formed at both ends of an upper surface of an insulating substrate, and at least one thin film resistor is formed so that both ends overlap with the pair of upper electrodes. A metal oxide film is formed so as to cover a part of the upper electrode, and a protective film is formed so as to cover an inner side of an end face of the metal oxide film. A method of manufacturing a resistor, comprising: forming an intermediate electrode made of a conductive resin material so as to be in contact therewith; and forming a side electrode on a side surface of the substrate so as to be electrically connected to the upper electrode and the intermediate electrode.
JP29203699A 1999-10-14 1999-10-14 Resistor and manufacturing method therefor Pending JP2001110601A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29203699A JP2001110601A (en) 1999-10-14 1999-10-14 Resistor and manufacturing method therefor

Publications (1)

Publication Number Publication Date
JP2001110601A true JP2001110601A (en) 2001-04-20

Family

ID=17776710

Family Applications (1)

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Country Status (1)

Country Link
JP (1) JP2001110601A (en)

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WO2008109262A1 (en) * 2007-03-01 2008-09-12 Vishay Intertechnology, Inc. Sulfuration resistant chip resistor and method for making same
US8018318B2 (en) 2008-08-13 2011-09-13 Cyntec Co., Ltd. Resistive component and method of manufacturing the same
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WO2003046934A1 (en) * 2001-11-28 2003-06-05 Rohm Co.,Ltd. Chip resistor and method for producing the same
US7098768B2 (en) 2001-11-28 2006-08-29 Rohm Co., Ltd. Chip resistor and method for making the same
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JP2013219387A (en) * 2007-03-01 2013-10-24 Vishay Intertechnology Inc Sulfuration resistant chip resistor and method for making the same
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US7982582B2 (en) 2007-03-01 2011-07-19 Vishay Intertechnology Inc. Sulfuration resistant chip resistor and method for making same
US8514051B2 (en) 2007-03-01 2013-08-20 Vishay Intertechnology, Inc. Sulfuration resistant chip resistor and method for making same
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US8957756B2 (en) 2007-03-01 2015-02-17 Vishay Intertechnology, Inc. Sulfuration resistant chip resistor and method for making same
US8018318B2 (en) 2008-08-13 2011-09-13 Cyntec Co., Ltd. Resistive component and method of manufacturing the same
US9818512B2 (en) 2014-12-08 2017-11-14 Vishay Dale Electronics, Llc Thermally sprayed thin film resistor and method of making
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