JP2001100420A5 - - Google Patents
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- Publication number
- JP2001100420A5 JP2001100420A5 JP1999277016A JP27701699A JP2001100420A5 JP 2001100420 A5 JP2001100420 A5 JP 2001100420A5 JP 1999277016 A JP1999277016 A JP 1999277016A JP 27701699 A JP27701699 A JP 27701699A JP 2001100420 A5 JP2001100420 A5 JP 2001100420A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- acid
- general formula
- photoresist composition
- positive photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims 5
- -1 polysiloxane Polymers 0.000 claims 5
- 239000002253 acid Substances 0.000 claims 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 4
- 125000005647 linker group Chemical group 0.000 claims 4
- 229920001296 polysiloxane Polymers 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 2
- 125000000732 arylene group Chemical group 0.000 claims 2
- 125000002723 alicyclic group Chemical group 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
- 150000002989 phenols Chemical class 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27701699A JP3934289B2 (ja) | 1999-09-29 | 1999-09-29 | ポジ型フォトレジスト組成物 |
| KR1020000054065A KR100707767B1 (ko) | 1999-09-28 | 2000-09-14 | 포지티브 포토레지스트 조성물 |
| TW089120118A TWI225970B (en) | 1999-09-28 | 2000-09-28 | Positive-type photoresist composition |
| US09/671,177 US6387590B1 (en) | 1999-09-28 | 2000-09-28 | Positive photoresist composition |
| US10/020,958 US6479213B2 (en) | 1999-09-28 | 2001-12-19 | Positive photoresist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27701699A JP3934289B2 (ja) | 1999-09-29 | 1999-09-29 | ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001100420A JP2001100420A (ja) | 2001-04-13 |
| JP2001100420A5 true JP2001100420A5 (enExample) | 2005-07-07 |
| JP3934289B2 JP3934289B2 (ja) | 2007-06-20 |
Family
ID=17577606
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27701699A Expired - Fee Related JP3934289B2 (ja) | 1999-09-28 | 1999-09-29 | ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3934289B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4141625B2 (ja) * | 2000-08-09 | 2008-08-27 | 東京応化工業株式会社 | ポジ型レジスト組成物およびそのレジスト層を設けた基材 |
| JP4295937B2 (ja) * | 2000-12-05 | 2009-07-15 | 株式会社Ｋｒｉ | 活性成分及びそれを用いた感光性樹脂組成物 |
| JP2009286980A (ja) * | 2008-06-02 | 2009-12-10 | Nissan Chem Ind Ltd | アルカリ可溶性樹脂及び感光性樹脂組成物 |
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1999
- 1999-09-29 JP JP27701699A patent/JP3934289B2/ja not_active Expired - Fee Related