JP2001076989A5 - - Google Patents

Download PDF

Info

Publication number
JP2001076989A5
JP2001076989A5 JP1999246726A JP24672699A JP2001076989A5 JP 2001076989 A5 JP2001076989 A5 JP 2001076989A5 JP 1999246726 A JP1999246726 A JP 1999246726A JP 24672699 A JP24672699 A JP 24672699A JP 2001076989 A5 JP2001076989 A5 JP 2001076989A5
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
control data
control
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1999246726A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001076989A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP24672699A priority Critical patent/JP2001076989A/ja
Priority claimed from JP24672699A external-priority patent/JP2001076989A/ja
Publication of JP2001076989A publication Critical patent/JP2001076989A/ja
Publication of JP2001076989A5 publication Critical patent/JP2001076989A5/ja
Pending legal-status Critical Current

Links

JP24672699A 1999-08-31 1999-08-31 荷電粒子線露光装置及びその制御方法。 Pending JP2001076989A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24672699A JP2001076989A (ja) 1999-08-31 1999-08-31 荷電粒子線露光装置及びその制御方法。

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24672699A JP2001076989A (ja) 1999-08-31 1999-08-31 荷電粒子線露光装置及びその制御方法。

Publications (2)

Publication Number Publication Date
JP2001076989A JP2001076989A (ja) 2001-03-23
JP2001076989A5 true JP2001076989A5 (https=) 2006-06-01

Family

ID=17152742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24672699A Pending JP2001076989A (ja) 1999-08-31 1999-08-31 荷電粒子線露光装置及びその制御方法。

Country Status (1)

Country Link
JP (1) JP2001076989A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5873275B2 (ja) * 2011-09-12 2016-03-01 キヤノン株式会社 描画装置及び物品の製造方法
JP7729132B2 (ja) * 2021-09-14 2025-08-26 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画方法、マルチ荷電粒子ビーム描画装置及びプログラム

Similar Documents

Publication Publication Date Title
JPH10171409A5 (https=)
ATE206544T1 (de) Gerät und verfahren zum mit grosser zuverlässigkeit rekonstruieren eines beobachteten musters
EP1180784A3 (en) Method and apparatus for charged particle beam exposure
WO2004044943A3 (en) Retarding electron beams in multiple electron beam pattern generation
DE69901541D1 (de) Behandlungsplanungsverfahren und gerät für bestrahlungstherapie
JP2001168017A5 (ja) 荷電粒子線露光装置、荷電粒子線露光装置を用いたデバイス製造方法
Maes Explaining Dark Energy, Small Cosmological Constant and Inflation Without New Physics?
Zhou et al. High-brightness electron beam evolution following laser-based cleaning of a photocathode
JP2009117111A (ja) 粒子加速器の制御装置
US20140344769A1 (en) Method for correcting electronic proximity effects using the deconvolution of the pattern to be exposed by means of a probabilistic method
JP2001076989A5 (https=)
WO2008147095A1 (en) Method and apparatus for plasma ion implantation
JP2002534793A (ja) ビーム形状制御装置および方法
JP2011183437A (ja) レーザ出力情報生成装置およびレーザ加工システム
EP0779081A3 (en) Charged particle beam apparatus and method of operating the same
JPS5924538B2 (ja) パタ−ン形成方法
US6316164B1 (en) Proximity effect correction method through uniform removal of fraction of interior pixels
Lueangaramwong et al. Numerical simulations of early-stage dynamics of electron bunches emitted from plasmonic photocathodes
JPH11102853A (ja) 電子線描画装置
JPH11111595A5 (https=)
US20020038853A1 (en) Electron beam exposure apparatus
TW364157B (en) Method of manufacturing an EB mask for electron beam image drawing and device for manufacturing an EB mask
JP6453311B2 (ja) 複雑な成形に適用可能な放射エネルギーおよび形状の複合的な最適化によるリソグラフィ方法
JPS627689B2 (https=)
JP2011044464A (ja) 荷電粒子ビーム描画装置、荷電粒子ビーム描画方法、および、荷電粒子ビーム描画用データの処理装置