JP2001074423A - 微少突起物の高さ検出方法、高さ検出装置および欠陥検出装置 - Google Patents

微少突起物の高さ検出方法、高さ検出装置および欠陥検出装置

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Publication number
JP2001074423A
JP2001074423A JP24830199A JP24830199A JP2001074423A JP 2001074423 A JP2001074423 A JP 2001074423A JP 24830199 A JP24830199 A JP 24830199A JP 24830199 A JP24830199 A JP 24830199A JP 2001074423 A JP2001074423 A JP 2001074423A
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JP
Japan
Prior art keywords
scanning
height
detection
defect
light
Prior art date
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Pending
Application number
JP24830199A
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English (en)
Japanese (ja)
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JP2001074423A5 (enExample
Inventor
Ryoji Matsunaga
良治 松永
Takahito Tabata
高仁 田畑
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
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Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP24830199A priority Critical patent/JP2001074423A/ja
Publication of JP2001074423A publication Critical patent/JP2001074423A/ja
Publication of JP2001074423A5 publication Critical patent/JP2001074423A5/ja
Pending legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)
JP24830199A 1999-09-02 1999-09-02 微少突起物の高さ検出方法、高さ検出装置および欠陥検出装置 Pending JP2001074423A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24830199A JP2001074423A (ja) 1999-09-02 1999-09-02 微少突起物の高さ検出方法、高さ検出装置および欠陥検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24830199A JP2001074423A (ja) 1999-09-02 1999-09-02 微少突起物の高さ検出方法、高さ検出装置および欠陥検出装置

Publications (2)

Publication Number Publication Date
JP2001074423A true JP2001074423A (ja) 2001-03-23
JP2001074423A5 JP2001074423A5 (enExample) 2006-10-19

Family

ID=17176050

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Application Number Title Priority Date Filing Date
JP24830199A Pending JP2001074423A (ja) 1999-09-02 1999-09-02 微少突起物の高さ検出方法、高さ検出装置および欠陥検出装置

Country Status (1)

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JP (1) JP2001074423A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007225481A (ja) * 2006-02-24 2007-09-06 Hitachi High-Technologies Corp ボールバンプウエハ検査装置
JP2008032669A (ja) * 2006-07-27 2008-02-14 Oputouea Kk 光走査式平面外観検査装置
CN106292180A (zh) * 2015-06-26 2017-01-04 信越化学工业株式会社 光掩模坯的缺陷检查方法、分选方法和制备方法
JP2017015692A (ja) * 2015-06-26 2017-01-19 信越化学工業株式会社 フォトマスクブランクの欠陥検査方法、選別方法及び製造方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007225481A (ja) * 2006-02-24 2007-09-06 Hitachi High-Technologies Corp ボールバンプウエハ検査装置
JP2008032669A (ja) * 2006-07-27 2008-02-14 Oputouea Kk 光走査式平面外観検査装置
CN106292180A (zh) * 2015-06-26 2017-01-04 信越化学工业株式会社 光掩模坯的缺陷检查方法、分选方法和制备方法
JP2017015692A (ja) * 2015-06-26 2017-01-19 信越化学工業株式会社 フォトマスクブランクの欠陥検査方法、選別方法及び製造方法
JP2020024224A (ja) * 2015-06-26 2020-02-13 信越化学工業株式会社 フォトマスクブランクの欠陥検査方法、選別方法及び製造方法
CN106292180B (zh) * 2015-06-26 2021-05-11 信越化学工业株式会社 光掩模坯的缺陷检查方法、分选方法和制备方法

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